CN111799395B - Display panel and manufacturing method thereof - Google Patents
Display panel and manufacturing method thereof Download PDFInfo
- Publication number
- CN111799395B CN111799395B CN202010718112.6A CN202010718112A CN111799395B CN 111799395 B CN111799395 B CN 111799395B CN 202010718112 A CN202010718112 A CN 202010718112A CN 111799395 B CN111799395 B CN 111799395B
- Authority
- CN
- China
- Prior art keywords
- layer
- substrate
- black matrix
- pattern
- pattern layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
- H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/40—OLEDs integrated with touch screens
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Abstract
The invention provides a display panel and a manufacturing method thereof. The method comprises the following steps: forming a pattern layer on one side of the substrate, wherein the surface of the pattern layer far away from the substrate has hydrophilicity; coating a black matrix material layer on the surface of the pattern layer far away from the substrate, wherein the material forming the black matrix material layer comprises carbon black; the black matrix material layer is baked and developed to obtain a patterned black matrix layer. The manufacturing method provided by the invention can form the patterned black matrix layer without exposure by utilizing the strong bonding force between the carbon black in the black matrix material and the pattern layer with a large number of hydrophilic groups on the surface, does not need to use a mask plate, can completely avoid the phenomenon of chamfer angle, and meets the use requirement of all substrates.
Description
Technical Field
The invention relates to the field of display structure design, in particular to a display panel and a manufacturing method thereof.
Background
Color Filters (CFs) are widely used for Color rendering under white backlights, such as Liquid Crystal Displays (LCDs), white Organic Light Emitting Diodes (OLEDs) +color film (CF) displays, and the like. In addition, the red, green and blue (RGB) color film layer is matched with the black matrix layer (BM) to realize the functions of shading and filtering. The gradient angle (taper) of the BM layer can affect the edge morphology and straightness of the BM layer image, the reliability of RGB process glue coating technology, high temperature and high humidity storage of the display device, and the falling off or breaking of the deposited metal layer or inorganic layer, so it is very important to control the gradient angle of the BM layer.
However, the color film BM for OLED is different from that for LCD in that: firstly, the BM material for self-luminous OLED needs low temperature process (controlling process temperature <90 ℃), and the curing temperature of BM for conventional LCD is above 200 ℃; secondly, the BM of the LCD is directly used for manufacturing a pattern on the white glass substrate, so that the development time is less regulated, the BM of the OLED is used for manufacturing the pattern on the packaging layer, the bottom plate pattern is complex, and the requirement on the development regulating allowance is high; third, the BM for OLED requires to adapt to different substrates (metal layer, inorganic layer, organic layer of high temperature or low temperature process).
Therefore, the BM material for LCD has very short development time, can combine high temperature process and solidification technology, and the slope angle is positive angle, no undercut phenomenon. The particularity of the low-temperature BM material for the OLED makes the phenomenon of cross section undercut exist on different substrates with different sizes and more serious, and the problems cannot be avoided by changing the BM material formula.
Disclosure of Invention
The present invention has been completed based on the following findings by the inventors:
the inventor of the invention provides a manufacturing method for avoiding chamfer angles of a black matrix layer for low temperature, which utilizes strong bonding force between carbon black in a black matrix material and a pattern layer with a large number of hydrophilic groups on the surface, can avoid exposure to form a patterned black matrix layer, does not need to use a Mask plate (Mask), reduces patterning steps and cost, can completely avoid chamfer angles, and meets the requirement of using all substrates. Meanwhile, the pattern layer with the boss is formed by using the gray mask plate, so that the black matrix layer is also provided with the boss, the function of a color film separation wall can be achieved, the problems of crosstalk, light leakage or glue overflow and the like of adjacent pixel color films are prevented, and the display effect of the manufactured display panel is better. In addition, the color film material can be used for manufacturing the sensor area filter and integrating the columnar isolation column.
In a first aspect of the present invention, a method of manufacturing a display panel is provided.
According to an embodiment of the invention, the method comprises: forming a pattern layer on one side of a substrate, wherein the surface of the pattern layer, which is far away from the substrate, has hydrophilicity; coating a black matrix material layer on the surface of the pattern layer, which is far away from the substrate, wherein the material forming the black matrix material layer comprises carbon black; and baking and developing the black matrix material layer to obtain a patterned black matrix layer.
The inventor finds through researches that by adopting the manufacturing method of the embodiment of the invention, the patterned black matrix layer can be formed without exposure by utilizing the strong bonding force between the carbon black in the black matrix material and the pattern layer with a large number of hydrophilic groups on the surface, a mask plate is not required, the phenomenon of chamfer angle can be completely avoided, and the use of all substrates is satisfied.
In addition, the manufacturing method according to the above embodiment of the present invention may further have the following additional technical features:
according to the embodiment of the invention, the process temperature for forming the graph layer and the black matrix material layer is less than 90 ℃, and the material for forming the graph layer is carbon-based organic material.
According to the embodiment of the invention, the pattern layer is formed by a gray mask plate, and a boss is arranged on the surface of the pattern layer, which is far away from the substrate; and the method further comprises: and filling and forming a color film layer between the bosses.
According to an embodiment of the invention, the method further comprises: forming a first touch electrode, an insulating layer, a second touch electrode material layer and a pattern material layer on one side of the substrate; and forming the pattern layer and the second touch electrode with the same pattern through the gray mask plate.
According to an embodiment of the invention, the method further comprises: forming a pixel defining material layer on one side of the substrate, and the pixel defining material layer is formed of a positive photoresist; performing first exposure on the pixel defining material layer through a first mask plate; forming a columnar support material layer on a side of the pixel defining material layer away from the substrate, and the columnar support material layer is formed of a negative photoresist having a color; performing second exposure on the columnar support material layer through a second mask plate; the layer of pixel defining material and the layer of column support material are co-developed and cured, and the temperature of the curing is greater than 200 degrees celsius.
In a second aspect of the present invention, a display panel is provided.
According to an embodiment of the present invention, the display panel includes: a substrate; a pattern layer which is arranged on one side of the substrate, and the surface of the pattern layer, which is far away from the substrate, has hydrophilicity; and the black matrix layer is arranged on the surface of the pattern layer, which is far away from the substrate, and the material forming the black matrix layer comprises carbon black.
The inventor finds that the display panel of the embodiment of the invention has strong bonding force between a large number of hydrophilic groups on the surface of the pattern layer and carbon black in the black matrix layer, can avoid exposure to form the patterned black matrix layer, and avoids the chamfer phenomenon of the black matrix layer, thereby leading the display panel to have higher manufacturing yield and lower cost.
In addition, the display panel according to the above embodiment of the present invention may further have the following additional technical features:
according to an embodiment of the invention, the orthographic projection of the black matrix layer on the substrate is completely coincident with the orthographic projection of the graphic layer on the substrate, and the roughness of the surface of the black matrix layer away from the graphic layer is greater than 0.02 micrometers.
According to the embodiment of the invention, the surface of the graphic layer, which is far away from the substrate, is provided with the bosses, and the color film layer is arranged between the bosses.
According to the embodiment of the invention, the first touch electrode, the insulating layer and the second touch electrode are arranged between the substrate and the pattern layer, and the orthographic projection of the second touch electrode on the substrate is completely overlapped with the orthographic projection of the pattern layer on the substrate.
According to an embodiment of the present invention, the display panel further includes: a pixel defining layer disposed between the substrate and the pattern layer and formed of a positive photoresist; a columnar support disposed between the pixel defining layer and the pattern layer and formed of a negative photoresist having a color; an encapsulation layer disposed between the columnar support and the pixel defining layer and the graphics layer; the display area, the infrared emission area and the infrared receiving area are defined on the substrate, the color film layer in the infrared emission area is red, the color film layer in the infrared receiving area is one of red and blue, the columnar support is the other of red and blue, and the orthographic projection of the color film layer in the infrared receiving area on the substrate is overlapped with the orthographic projection part of the columnar support in the infrared receiving area on the substrate.
Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above aspects of the invention are explained in connection with the description of the embodiments of the invention with the following drawings, in which:
FIG. 1 is a flow chart of a method for fabricating a display panel according to an embodiment of the invention;
FIG. 2 is an electron micrograph of the inventors found that the chamfer phenomenon is more serious as the development time of the black matrix layer increases;
fig. 3 is a picture of black matrix layer falling off (a), optical defect after falling off (b) and chamfer causing color film gumming bubbles (c) found by the inventors;
FIG. 4 is a schematic cross-sectional view of a product of the steps of the method of making an embodiment of the present invention;
FIG. 5 is a schematic cross-sectional view of a product of steps of a method of making another embodiment of the present invention;
FIG. 6 is a schematic cross-sectional view of a product at each step of a method of making another embodiment of the invention;
FIG. 7 is a schematic cross-sectional view of a product at each step of a method of making another embodiment of the invention.
Reference numerals
100. Substrate and method for manufacturing the same
200. Graphic layer
201. Protrusions
210. Graphic material layer
300. Black matrix layer
310. Black matrix material layer
321. First step
322. Second step
400. Color film layer
510. First touch electrode
520. Insulating layer
530. Second touch electrode
531. Second touch electrode material layer
600. Display structure
601. Thin film transistor
602. Infrared emission layer
603. Infrared absorbing layer
610. Dielectric layer
620. Anode
630. Pixel defining layer
631. Pixel defining material layer
640. Columnar support
641. Columnar support material layer
650. Light-emitting layer
660. Cathode electrode
670. Encapsulation layer
Detailed Description
The following examples are set forth in detail, and it will be understood by those skilled in the art that the following examples are intended to illustrate the invention and should not be construed as limiting the invention. Unless specifically stated otherwise, specific techniques or conditions are not explicitly described in the following examples, and may be performed according to techniques or conditions commonly used in the art or according to product specifications by those skilled in the art.
In one aspect, the present invention provides a method of fabricating a display panel. According to an embodiment of the present invention, referring to fig. 1, the manufacturing method includes:
s100: a patterned layer is formed on one side of the substrate.
In this step, referring to (b) of fig. 4, a pattern layer 200 is formed on one side of the substrate 100, and a surface of the pattern layer 200 remote from the substrate 100 has hydrophilicity. In some embodiments of the present invention, one side of the substrate 100 may be a metal layer, an inorganic layer, an organic layer of a high temperature or low temperature process, which is used as a substrate layer, and is suitable for the subsequent fabrication of the pattern layer 200 and the black matrix layer 300.
The present inventors have long studied and found that the layout of an OLED is more complex than that of an LCD, the film layer is not at the same height and the drop height can be more than 10 μm, and the thickness of the non-AA region after the black matrix layer (BM) is coated is much larger than that of the display region (AA region). Therefore, in order to ensure no residue in the non-AA region, the development time of BM must be increased, but since BM is black, ultraviolet light of the exposure machine cannot penetrate (365 nm transmittance <0.1% and OD > 3), the material at the bottom cannot react with light, and referring to fig. 2, the longer the development time, the more severe the chamfer phenomenon of BM, so that the increase of the development time inevitably results in the severe undercut phenomenon at the bottom. In addition, the temperature of the low temperature process is generally controlled below 90 degrees, so that the slope angle cannot be corrected, the low temperature BM material used by the OLED has obvious chamfer phenomenon, and the problems cannot be completely avoided by changing the formula of the photoresist material.
The inventors have found that the suspended portion of BM is not adhered to the substrate after the chamfer is formed, thereby affecting the adhesion of the whole, and even easily causing edge drop (pealing, as shown by the dotted line circle in fig. 3 (a)), and that the linearity is poor, and that there is a significant optical defect after lighting (as indicated by the arrow in fig. 3 (b)); in addition, bubbles are formed in the chamfer area when the RGB photoresist is coated (see the solid circles in (c) of FIG. 3), which can affect the process and even the reliability test of the subsequent display screen; when the integration process is carried out subsequently, the deposition of the inorganic layer and the metal layer is broken; in particular, bending is prone to risk of breakage.
Therefore, in order to avoid the chamfer phenomenon of the low-temperature BM material used by the OLED caused by exposure, the inventor adopts an exposure-free method to pattern a black matrix layer (BM), and particularly utilizes the fact that the BM has different adsorption forces on different materials, particularly the carbon black type BM has strong bonding force with a pattern layer with a large amount of hydrophilic groups on the surface, for example, the surface of a low-temperature cured organic adhesive contains a large amount of hydrophilic free radicals, so that the BM can realize Mask-free patterning of the BM on a substrate of the type through longer development time.
In some embodiments of the present invention, the process temperature for forming the patterning layer 200 may be less than 90 degrees celsius, and the material for forming the patterning layer 200 may be a carbon-based organic material (the number of c—si bonds is very small). Thus, the pattern layer 200 using the low-temperature carbon-based organic material has a surface which is not completely passivated due to a low curing temperature, and the surface contains a large amount of free radicals, such as N-H, O-H, S-H, -COOH, etc., so that strong force (including electrostatic attraction, pi-structural force, hydrogen bonding, etc.) is formed with the carbon black having strong adsorptivity in the BM material. Instead inorganic layer (SiN) x 、SiO x ITO, si, etc.), a metal layer (Mo, al, ag, ti, etc.), a high-temperature cured organic layer (substrate PI, photosensitive PI, etc.), surface groups are dehydrated at high temperature, completely passivated, and do not contain a large number of free radicals, so that the action force with carbon black of BM material is weak and the adsorption capacity is weak. In some embodiments, the pattern layer 200 may be selected from a low temperature process, transparent or translucent, positive or negative photoresist, so that the cross-sectional gradient angle of the pattern layer 200 is positive and controllable, and the gradient angle of the BM is controlled by using strong force between the BM and the pattern layer.
In some embodiments of the present invention, referring to fig. 5 (a), the pattern layer 200 may be formed by a gray-scale Mask (Half-tone Mask) H, and referring to fig. 5 (b), the surface of the pattern layer 200 remote from the substrate 100 may further have a boss 201. Thus, the pattern layer 200 with a convex structure can be manufactured through a Mask process, and the boss 201 can play a role of a color film separation wall to prevent the problem of luminous crosstalk of adjacent color film pixels.
In some specific examples, before step S100, referring to (a) of fig. 6, a first touch electrode 510, an insulating layer 520, a second touch electrode material layer 531, and a pattern material layer 210 may be sequentially formed on one side of the substrate 100 in advance; referring to fig. 6 (b), the pattern layer 200 and the second touch electrode 530 are formed in the same pattern through the gray mask. Thus, the patterning of the graphic layer 200 and the second touch electrode layer can be simultaneously completed by using one Mask process of the graphic layer 200, thereby reducing the number of Mask processes and reducing the manufacturing cost.
In other specific examples, before step S100, the method may further include: s510 forming a pixel defining material layer 631 on one side of the substrate 100, the pixel defining material layer 631 being formed of a positive photoresist; s520 first exposing the pixel defining material layer 631 through the first mask plate M1, and referring to an exposure region shown by a dotted line in (a) of fig. 7; s530 forming a column support material layer 641 at a side of the pixel defining material layer 631 remote from the substrate 100, and the column support material layer 641 being formed of negative photoresist having a color; s540 performs a second exposure of the column-shaped support material layer 641 by the second mask plate M2, and refers to an exposure region shown by a dotted line in (b) of fig. 7; s550 collectively develops and cures the pixel defining material layer 631 and the pillar-shaped support material layer 641, referring to (c) of fig. 7, and the temperature of curing may be greater than 200 degrees celsius. Here, if the column support material layer 641 is also formed of a positive photoresist, which has high transmittance at 365nm, the pixel defining material layer 631 is inevitably subjected to a secondary exposure, so that the isolated column shape cannot be achieved, and therefore, the inventors purposely used a negative photoresist (e.g., red photoresist) opaque to ultraviolet rays as the column support material layer 641. Therefore, the support layer and the filter layer of the non-display area are directly integrated in the color film process section to replace the traditional Cover Glass (ink on Cover Glass), so that the full-face screen is realized.
S200: and coating a black matrix material layer on the surface of the pattern layer far away from the substrate.
In this step, referring to fig. 4 (c), a black matrix material layer 310 is coated on a surface of the pattern layer 200 remote from the substrate 100, and a material forming the black matrix material layer 310 includes carbon black. In this way, the black matrix material is selected to have a strong force on the pattern layer 200 containing a large amount of free radicals, so that the pattern layer 200 is kept away from the black matrix layer 300 on the surface of the substrate 100 during the subsequent baking and developing processes, thereby realizing the exposure-free patterning of the black matrix layer 300.
In some embodiments of the present invention, the process temperature for forming the black matrix material layer 310 may be less than 90 degrees celsius, so that the yield of the finally manufactured OLED display panel is higher.
In some embodiments of the present invention, referring to (c) of fig. 5, for the pattern layer 200 having the boss 201, the black matrix material layer 310 formed by coating is also provided with protrusions. Therefore, the color film separation wall can play a role in preventing crosstalk, light leakage or glue overflow and other problems of adjacent pixel color films, and further the display effect of the manufactured display panel is better.
S300: the black matrix material layer is baked and developed to obtain a patterned black matrix layer.
In this step, referring to (d) of fig. 4, the black matrix material layer 310 is baked and developed to obtain the patterned black matrix layer 300. In this manner, the patterned black matrix layer 300 is realized by binding the black matrix material layer 310 of the pattern layer 200 away from the surface of the substrate 100 by strong force of the hydrophilic surface of the pattern layer 200 against the carbon black in the black matrix material layer 310, and developing and removing the black matrix material layer 310 at the remaining position. In addition, the black matrix layer 300 after patterning in the exposure-free mode can completely avoid the chamfering phenomenon, save the step of Mask and the consumable cost, and avoid the alignment problem of Mask exposure.
In some embodiments of the present invention, the roughness of the surface of the black matrix layer 300, which is formed in an exposure-free manner, away from the substrate 100 is greater than 0.02 μm, specifically, for example, 20 to 300 nm. In this way, the surface of the black matrix layer 300 is roughened without additional plasma treatment, and the degree of roughening is formed to be far superior to that of the plasma treatment.
In some embodiments of the present invention, the manufacturing method may further include, after step S300:
s400: and filling the color film layer between the bosses.
In this step, referring to (c) of fig. 5, the color film layer 400 is filled between the bosses 201 covered with the black matrix layer 300. Therefore, the first step 321 is used as an area of the color film layer expanding outwards relative to the BM and is a boundary (Margin) area of optical design and process, so that the color film can be ensured to completely cover the BM, the BM surface is rough, the contact force between the edge of the color film and the BM can be increased, and the color film falling risk is reduced; the second step 322 plays a role of a color film spacer wall to prevent the problem of light emitting crosstalk of adjacent color film pixels.
In summary, according to the embodiment of the present invention, a manufacturing method is provided, which uses a strong bonding force between carbon black in a black matrix material and a pattern layer having a large number of hydrophilic groups on a surface, so that a patterned black matrix layer can be formed without exposure, a mask plate is not required, a chamfer phenomenon can be completely avoided, and the use of all substrates is satisfied.
In another aspect of the present invention, a display panel is provided.
Referring to (d) of fig. 4, the display panel includes a substrate 100, a graphic layer 200, and a black matrix layer 300 according to an embodiment of the present invention; wherein the pattern layer 200 is disposed on one side of the substrate 100, and a surface of the pattern layer 200 remote from the substrate 100 has hydrophilicity; and the black matrix layer 300 is disposed on a surface of the pattern layer 200 remote from the substrate 100, and a material forming the black matrix layer 300 includes carbon black. In this way, the hydrophilic surface of the pattern layer 200 formed by the low-temperature process and the carbon black in the black matrix layer 300 have strong force, and the patterning of the black matrix layer 300 can be formed in a non-exposure manner, so that the manufactured black matrix layer 300 avoids various adverse problems caused by chamfer angles, and meanwhile, the yield of the display panel is higher, the manufacturing cost is lower, and the display effect is better.
In some embodiments of the present invention, the orthographic projection of the black matrix layer 300 on the substrate 100 may completely coincide with the orthographic projection of the pattern layer 200 on the substrate 100, and the roughness of the surface of the black matrix layer 300 away from the pattern layer 200 may be greater than 0.02 micrometers, specifically, for example, 20 to 300 nanometers. In this way, the surface roughening of the black matrix layer 300 does not require additional plasma treatment, thereby achieving a longer service life of the display panel and lower manufacturing costs.
In some embodiments of the present invention, referring to fig. 5 (c), the surface of the graphic layer 200 remote from the substrate 100 has a boss 201, and a color film layer 400 is disposed between the bosses 201. Thus, the first step 321 is used as an area of the color film layer, which is expanded relative to the black matrix layer, so that the color film can be ensured to completely cover the BM, and the BM with rough surface can also increase the contact force between the edge of the color film and the BM, thereby reducing the falling risk of the color film; the second step 322 plays a role of a color film spacer wall to prevent the problem of light emitting crosstalk of adjacent color film pixels.
According to an embodiment of the present invention, referring to fig. 6 (d), a first touch electrode 510, an insulating layer 530, and a second touch electrode 530 may be further disposed between the substrate 100 and the graphic layer 200, and an orthographic projection of the second touch electrode 530 on the substrate 100 and an orthographic projection of the graphic layer 200 on the substrate 100 may completely coincide. Therefore, the touch control function of the display panel can be realized, and meanwhile, the manufacturing cost of the display panel can be reduced.
Referring to (d) of fig. 7, the display panel may further include a pixel defining layer 630, a column support 640, and an encapsulation layer 670 according to an embodiment of the present invention; wherein the pixel defining layer 630 is disposed between the substrate 100 and the pattern layer 200, and the pixel defining layer 630 is formed of a positive photoresist; the column support 640 is disposed between the pixel defining layer 630 and the pattern layer 200, and the column support 640 is formed of negative photoresist having a color; the encapsulation layer 670 is disposed between the column support 640 and the pixel defining layer 630 and the graphics layer 200; further, the display area a, the infrared emission area C1, and the infrared receiving area C2 are defined on the substrate 100, and the color film layer 400 in the infrared emission area C1 may be red, the color film layer 400 in the infrared receiving area C2 may be one of red and blue (for example, blue B in (d) of fig. 7), and the columnar support 640 may be the other of red and blue (for example, red R in (d) of fig. 7), and the orthographic projection of the color film layer 400 in the infrared receiving area C2 on the substrate 100 coincides with the orthographic projection portion of the columnar support 640 in the infrared receiving area C2 on the substrate 100. Thus, the red or blue column support 640 is used as a first color block of the infrared receiver, and the blue or red color film layer is used as a second color block, and the two blocks are overlapped to realize the function of the infrared filter; the filter photoresistor of the infrared emission unit is replaced by a red color film layer, so that the infrared filtering function of the emission unit is completed; and BM replaces black ink on the original cover glass.
In summary, according to the embodiments of the present invention, a display panel is provided, in which a large amount of hydrophilic groups on the surface of a graphics layer and carbon black in a black matrix layer have strong bonding force, so that the graphics black matrix layer can be formed without exposure, and the chamfer phenomenon of the black matrix layer is avoided, thereby enabling the display panel to have higher manufacturing yield and lower cost.
In the description of the present invention, it should be understood that the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In the description of the present invention, the meaning of "plurality" means at least two, for example, two, three, etc., unless specifically defined otherwise.
In the description of the present specification, a description referring to terms "one embodiment," "some embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.
While embodiments of the present invention have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the invention, and that variations, modifications, alternatives and variations may be made to the above embodiments by one of ordinary skill in the art within the scope of the invention.
Claims (8)
1. A method of making a display panel, comprising:
forming a pattern layer on one side of a substrate, wherein the surface of the pattern layer, which is far away from the substrate, has hydrophilicity;
coating a black matrix material layer on the surface of the pattern layer, which is far away from the substrate, wherein the material forming the black matrix material layer comprises carbon black;
baking and developing the black matrix material layer to obtain a patterned black matrix layer,
the pattern layer is formed through a gray mask plate, and a boss is arranged on the surface, away from the substrate, of the pattern layer; and the method further comprises: a color film layer is filled between the bosses,
the orthographic projection of the black matrix layer on the substrate is completely coincident with the orthographic projection of the pattern layer on the substrate.
2. The method of claim 1, wherein the process temperature for forming the pattern layer and the black matrix material layer is less than 90 degrees celsius, and the material for forming the pattern layer is a carbon-based organic material.
3. The method as recited in claim 1, further comprising:
forming a first touch electrode, an insulating layer, a second touch electrode material layer and a pattern material layer on one side of the substrate;
and forming the pattern layer and the second touch electrode with the same pattern through the gray mask plate.
4. The method as recited in claim 1, further comprising:
forming a pixel defining material layer on one side of the substrate, and the pixel defining material layer is formed of a positive photoresist;
performing first exposure on the pixel defining material layer through a first mask plate;
forming a columnar support material layer on a side of the pixel defining material layer away from the substrate, and the columnar support material layer is formed of a negative photoresist having a color;
performing second exposure on the columnar support material layer through a second mask plate;
the layer of pixel defining material and the layer of column support material are co-developed and cured, and the temperature of the curing is greater than 200 degrees celsius.
5. A display panel, comprising:
a substrate;
a pattern layer which is arranged on one side of the substrate, and the surface of the pattern layer, which is far away from the substrate, has hydrophilicity;
a black matrix layer disposed on a surface of the pattern layer remote from the substrate, and a material forming the black matrix layer including carbon black,
the surface of the pattern layer far away from the substrate is provided with a boss, a color film layer is arranged between the bosses,
the orthographic projection of the black matrix layer on the substrate is completely coincident with the orthographic projection of the pattern layer on the substrate.
6. The display panel of claim 5, wherein a roughness of a surface of the black matrix layer remote from the graphic layer is greater than 0.02 microns.
7. The display panel of claim 5, wherein a first touch electrode, an insulating layer, and a second touch electrode are disposed between the substrate and the graphics layer, and wherein an orthographic projection of the second touch electrode on the substrate is completely coincident with an orthographic projection of the graphics layer on the substrate.
8. The display panel of claim 5, further comprising:
a pixel defining layer disposed between the substrate and the pattern layer and formed of a positive photoresist;
a columnar support disposed between the pixel defining layer and the pattern layer and formed of a negative photoresist having a color;
an encapsulation layer disposed between the columnar support and the pixel defining layer and the graphics layer;
the display area, the infrared emission area and the infrared receiving area are defined on the substrate, the color film layer in the infrared emission area is red, the color film layer in the infrared receiving area is one of red and blue, the columnar support is the other of red and blue, and the orthographic projection of the color film layer in the infrared receiving area on the substrate is overlapped with the orthographic projection part of the columnar support in the infrared receiving area on the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010718112.6A CN111799395B (en) | 2020-07-23 | 2020-07-23 | Display panel and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010718112.6A CN111799395B (en) | 2020-07-23 | 2020-07-23 | Display panel and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111799395A CN111799395A (en) | 2020-10-20 |
| CN111799395B true CN111799395B (en) | 2023-09-19 |
Family
ID=72828936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010718112.6A Active CN111799395B (en) | 2020-07-23 | 2020-07-23 | Display panel and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111799395B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115696999A (en) * | 2020-12-22 | 2023-02-03 | 湖北长江新型显示产业创新中心有限公司 | Display panel, manufacturing method thereof and display device |
| CN112820837B (en) * | 2021-01-05 | 2022-09-09 | 武汉华星光电半导体显示技术有限公司 | Display panel |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004338350A (en) * | 2003-05-19 | 2004-12-02 | Nof Corp | Thermosensitive type polarity changing material and pattern forming method using the same |
| CN101785363A (en) * | 2007-06-28 | 2010-07-21 | 住友化学株式会社 | Method for forming thin film, method for manufacturing organic electroluminescent device, method for manufacturing semiconductor device, and method for manufacturing optical device |
| CN105161621A (en) * | 2015-09-01 | 2015-12-16 | 华南理工大学 | Film patterning preparation method |
| CN110246872A (en) * | 2019-04-26 | 2019-09-17 | 昆山工研院新型平板显示技术中心有限公司 | Display panel and display device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003307610A (en) * | 2002-04-15 | 2003-10-31 | Dainippon Printing Co Ltd | Method of manufacturing light shielding layer pattern, and light shielding layer pattern product |
| JP5360737B2 (en) * | 2008-02-29 | 2013-12-04 | 大日本印刷株式会社 | Organic transistor manufacturing method and organic transistor |
-
2020
- 2020-07-23 CN CN202010718112.6A patent/CN111799395B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004338350A (en) * | 2003-05-19 | 2004-12-02 | Nof Corp | Thermosensitive type polarity changing material and pattern forming method using the same |
| CN101785363A (en) * | 2007-06-28 | 2010-07-21 | 住友化学株式会社 | Method for forming thin film, method for manufacturing organic electroluminescent device, method for manufacturing semiconductor device, and method for manufacturing optical device |
| CN105161621A (en) * | 2015-09-01 | 2015-12-16 | 华南理工大学 | Film patterning preparation method |
| CN110246872A (en) * | 2019-04-26 | 2019-09-17 | 昆山工研院新型平板显示技术中心有限公司 | Display panel and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN111799395A (en) | 2020-10-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100445821C (en) | Method for transferring substrate and method for fabricating flexible display using the same | |
| CN104965333B (en) | COA type liquid crystal display panels and preparation method thereof | |
| CN111799395B (en) | Display panel and manufacturing method thereof | |
| US7956537B2 (en) | Display device with cooperating groove and insert sealing structure and manufacturing method therefor | |
| US20070157839A1 (en) | Black matrix of color filter and method of manufacturing the black matrix | |
| CN107819017B (en) | Pixel defining structure, display substrate, manufacturing method of display substrate and display device | |
| CN107807468A (en) | Display module and display device | |
| CN109300910A (en) | Organic LED display panel and its manufacturing method | |
| CN105353567A (en) | VA type liquid crystal display panel adopting black-matrix-free technique and manufacturing method thereof | |
| WO2015192517A1 (en) | Color film substrate and manufacturing method therefor, organic light-emitting display panel, and display apparatus | |
| US20100244668A1 (en) | Organic el device and method for manufacturing the same | |
| US8724058B2 (en) | Color filter substrate with black matrix on undercut groove and fabricating method thereof | |
| CN101398570A (en) | LCD device and method for manufacturing same | |
| EP3719843A1 (en) | Pixel defining layer, display substrate, display device and inkjet printing method | |
| WO2021227205A1 (en) | Oled panel and manufacturing method therefor | |
| US7335450B2 (en) | Liquid crystal display panel and manufacturing method of color filter and liquid crystal display panel | |
| CN111969024A (en) | OLED display panel, display device and display panel preparation method | |
| CN104765191A (en) | Array substrate and preparation method thereof and display device | |
| CN110364638A (en) | The preparation method and display module of high-resolution Micro-OLED | |
| KR20030058760A (en) | Printing system and printing method for fabricating of liquid crystal display | |
| CN107785401B (en) | Manufacturing method of color film substrate, color film substrate and display panel | |
| JP2007047495A (en) | Reflective display device and method for manufacturing reflective display device | |
| JP2020533626A (en) | Manufacturing method of TFT substrate and its structure | |
| CN108646490B (en) | COA type array substrate and manufacturing method thereof | |
| TWI391026B (en) | Dual-screen display and manufacturing method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |