CN111769062A - Inductive coupling reactor and working method thereof - Google Patents

Inductive coupling reactor and working method thereof Download PDF

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Publication number
CN111769062A
CN111769062A CN202010733754.3A CN202010733754A CN111769062A CN 111769062 A CN111769062 A CN 111769062A CN 202010733754 A CN202010733754 A CN 202010733754A CN 111769062 A CN111769062 A CN 111769062A
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China
Prior art keywords
antenna
radio frequency
reaction chamber
antenna terminal
inductively coupled
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CN202010733754.3A
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Chinese (zh)
Inventor
吴堃
杨猛
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Shanghai Bangxin Semiconductor Equipment Co ltd
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Shanghai Bangxin Semiconductor Equipment Co ltd
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Priority to CN202010733754.3A priority Critical patent/CN111769062A/en
Publication of CN111769062A publication Critical patent/CN111769062A/en
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32651—Shields, e.g. dark space shields, Faraday shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/327—Arrangements for generating the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Plasma Technology (AREA)

Abstract

An inductive coupling reactor and a working method thereof, the inductive coupling reactor comprises: a reaction chamber body; the inductive coupling radio frequency unit is positioned above the reaction cavity main body; the inductively coupled radio frequency unit includes: a shield case; the side wall of the reaction chamber medium pipe is inclined, and the top cross section of the reaction chamber medium pipe is smaller than the bottom cross section; the radio frequency antennas are positioned in the shielding cover and distributed on the side part of the reaction chamber dielectric tube, each radio frequency antenna comprises an effective radio frequency antenna, and the height of each effective radio frequency antenna is adjustable. The inductively coupled reactor can enhance the control of the plasma distribution.

Description

Inductive coupling reactor and working method thereof
Technical Field
The invention relates to the field of semiconductor manufacturing, in particular to an inductive coupling reactor and a working method thereof.
Background
In semiconductor manufacturing, a plurality of processes are involved, each of which is performed by a certain apparatus and process. Among them, the etching process is an important process in semiconductor manufacturing, such as a plasma etching process. The plasma etching process is to utilize reaction gas to generate plasma after obtaining energy, wherein the plasma comprises charged particles such as ions and electrons, neutral atoms, molecules and free radicals with high chemical activity, and an etching object is etched through physical and chemical reactions.
However, during plasma etching, the etching conditions at the edge of the wafer and the etching conditions at the center of the wafer are greatly different, and the etching conditions include: plasma density distribution, radio frequency electric field, temperature distribution, etc. Where plasma density distribution is a very important etching condition. For example, the plasma density distributed over the center region of the wafer is typically greater than the plasma density distributed over the edge region of the wafer, and such a distribution is difficult to adjust.
Therefore, it is desirable to provide an inductively coupled reactor with controllable adjustment of the plasma distribution to meet the needs.
Disclosure of Invention
The invention aims to provide an inductive coupling reactor and a working method thereof, which can enhance the control capability of plasma distribution.
In order to solve the above technical problems, the present invention provides an inductive coupling reactor, comprising: a reaction chamber body; the inductive coupling radio frequency unit is positioned above the reaction cavity main body; the inductively coupled radio frequency unit includes: a shield case; the side wall of the reaction chamber medium pipe is inclined, and the top cross section of the reaction chamber medium pipe is smaller than the bottom cross section; the radio frequency antennas are positioned in the shielding cover and distributed on the side part of the reaction chamber dielectric tube, each radio frequency antenna comprises an effective radio frequency antenna, and the height of each effective radio frequency antenna is adjustable.
Optionally, the longitudinal section of the reaction chamber medium pipe is trapezoidal.
Optionally, the rf antenna is identical to the effective rf antenna; the inductively coupled radio frequency unit further comprises: an antenna height adjuster located inside the shield, the antenna height adjuster being adapted to adjust the position of the radio frequency antenna in a longitudinal direction.
Optionally, the radio frequency antenna surrounds the reaction chamber dielectric tube and has a multi-turn continuous coil; the radio frequency antenna is provided with a first antenna terminal and a second antenna terminal; the inductively coupled radio frequency unit further comprises: a radio frequency source; one end of the radio frequency matcher is connected with the radio frequency source, and the other end of the radio frequency matcher is connected with the first antenna terminal; and one end of the voltage balance capacitor is connected with the second antenna terminal, and the other end of the voltage balance capacitor is grounded.
Optionally, the radio frequency antenna surrounds the reaction chamber dielectric tube and has a multi-turn continuous coil; the radio frequency antenna has a first antenna terminal and a second antenna terminal and a plurality of intermediate connection ends between the first antenna terminal and the second antenna terminal; the first antenna terminal is the input end of the effective radio frequency antenna, and the second antenna terminal or any middle connecting end is the output end of the effective radio frequency antenna.
Optionally, the inductively coupled radio frequency unit further includes: a radio frequency source; one end of the radio frequency matcher is connected with the radio frequency source, and the other end of the radio frequency matcher is connected with the first antenna terminal; and one end of the voltage balance capacitor is connected with the second antenna terminal or any one of the plurality of intermediate connecting ends, and the other end of the voltage balance capacitor is grounded.
Optionally, the first antenna terminal is higher than the second antenna terminal; or the second antenna terminal is higher than the first antenna terminal.
Optionally, the method further includes: the wafer clamping platform is positioned at the bottom in the reaction cavity main body; the effective radio frequency antenna is used for generating plasma inside the reaction chamber dielectric tube, and the plasma is suitable for entering between the wafer clamping platform and the reaction chamber dielectric tube through the reaction chamber dielectric tube.
Optionally, the inductively coupled radio frequency unit further includes: and the gas inlet channel is positioned at the top of the reaction chamber medium pipe and is suitable for introducing etching gas for etching the wafer into the reaction chamber medium pipe.
Optionally, the method further includes: and the cooling device is positioned at the top of the shielding case and used for cooling the radio frequency antenna and the reaction chamber medium pipe.
The invention also provides a working method of the inductive coupling reactor, which adopts any one of the inductive coupling reactors and comprises the following steps: placing a wafer in the reaction chamber body; adjusting the position of the active radio frequency antenna in the shield; after the position of the effective radio frequency antenna in the shielding case is adjusted, the effective radio frequency antenna generates plasma inside the reaction chamber dielectric tube, and the plasma enters the reaction cavity body to etch the wafer.
Optionally, the rf antenna is identical to the effective rf antenna; the inductively coupled radio frequency unit further comprises: an antenna height adjuster located inside the shield case; and longitudinally adjusting the position of the effective radio frequency antenna in the shielding case by adopting the antenna height adjuster.
Optionally, the radio frequency antenna surrounds the reaction chamber dielectric tube and has a multi-turn continuous coil; the radio frequency antenna has a first antenna terminal and a second antenna terminal and a plurality of intermediate connection ends between the first antenna terminal and the second antenna terminal; the first antenna terminal is the input end of the effective radio frequency antenna, and the second antenna terminal or any middle connecting end is the output end of the effective radio frequency antenna; adjusting the position of the active radio frequency antenna in the shield, comprising: and selecting the second antenna terminal or any middle connecting end as the output end of the effective radio frequency antenna.
Compared with the prior art, the technical scheme of the invention has the following beneficial effects:
in the inductive coupling reactor provided by the technical scheme of the invention, the effective radio frequency antenna is used for generating plasma in the reaction chamber medium pipe. Because the side wall of the reaction chamber medium tube is inclined, the top cross section of the reaction chamber medium tube is smaller than the bottom cross section, and the height of the effective radio frequency antenna is adjustable, the density distribution of the plasma inside the reaction chamber medium tube can be adjusted through the change of the position of the effective radio frequency antenna, the distribution of the plasma after entering the reaction cavity main body is well controlled, and then the wafer in the reaction cavity main body is correspondingly and controllably etched. In summary, the inductively coupled reactor can enhance the control capability of plasma distribution.
Drawings
FIG. 1 is a schematic cross-sectional view of an inductively coupled reactor;
FIG. 2 is a schematic cross-sectional view of an inductively coupled reactor according to an embodiment of the present invention;
FIG. 3 is a schematic cross-sectional view of an inductively coupled reactor according to another embodiment of the present invention;
FIG. 4 is a schematic diagram of a method for operating an inductively coupled reactor according to another embodiment of the present invention;
FIG. 5 is a schematic cross-sectional view of an inductively coupled reactor according to another embodiment of the present invention.
Detailed Description
As described in the background, it is difficult to controllably adjust the distribution of the generated plasma in existing inductively coupled reactors.
An inductively coupled reactor, referring to fig. 1, includes an inductively coupled radio frequency unit, where the inductively coupled radio frequency unit includes a shielding case 1000, a reaction chamber dielectric tube 1001 located inside the shielding case 1000, and a coil-shaped radio frequency antenna 1002 located on a side wall of the reaction chamber dielectric tube 1001, the reaction chamber dielectric tube 1001 is cylindrical, the coil-shaped radio frequency antenna 1002 surrounds the reaction chamber dielectric tube 1001, and a position of the coil-shaped radio frequency antenna 1002 is fixed.
In the inductive coupling reactor, gas is introduced into the reaction chamber medium pipe 1001 from the gas inlet pipe 1003 at the top of the reaction chamber medium pipe 1001 and is mixed in the columnar reaction chamber medium pipe 1001, the radio frequency antenna 1002 generates plasma in the reaction chamber medium pipe 1001, the plasma is diffused into the reaction cavity main body, the wafer is positioned in the reaction cavity main body and is opposite to the inductive coupling radio frequency unit, the density distribution of the plasma above the wafer has the characteristic of high middle and low edge and is not adjustable, and the etching is not uniform.
Secondly, a cooling fan 1004 is disposed on the top of the shielding case 1000, but since the reaction chamber medium pipe 1001 is cylindrical, the cooling fan 1004 does not cool the top and the side wall of the reaction chamber medium pipe 1001 uniformly, which causes uneven plasma density distribution in the reaction chamber medium pipe 1001 and further causes uneven plasma density distribution above the wafer.
In order to solve the above technical problem, an embodiment of the present invention provides an inductive coupling reactor, referring to fig. 2 and 3, including:
a reaction chamber body 10;
an inductively coupled RF unit 20 located above the main reaction chamber body 10;
the inductively coupled radio frequency unit 20 includes: a shield case 201; the reaction chamber medium pipe 202 is positioned in the shielding case 201, the side wall of the reaction chamber medium pipe 202 is inclined, and the top cross section of the reaction chamber medium pipe 202 is smaller than the bottom cross section; and the radio frequency antenna 203 is positioned in the shielding case 201 and distributed on the side part of the reaction chamber medium pipe 202, the radio frequency antenna 203 comprises an effective radio frequency antenna, and the height of the effective radio frequency antenna is adjustable.
In this embodiment, the reaction chamber medium pipe 202 has a trapezoidal longitudinal cross-section.
In other embodiments, the reaction chamber media tube 202 may also be tapered.
In this embodiment, the rf antenna 203 is identical to the effective rf antenna, that is, all of the rf antenna 203 constitutes the effective rf antenna.
In this embodiment, the inductively coupled rf unit 20 further includes: an antenna height adjuster 204 located inside the shielding can 201, the antenna height adjuster 204 being adapted to adjust the position of the rf antenna 203 in the longitudinal direction.
In this embodiment, the shape of the rf antenna 203 is a incense coil.
In this embodiment, the rf antenna 203 surrounds the reaction chamber dielectric tube 202 and has a plurality of turns of continuous coil. Each turn of the coil is equidistant from the reaction chamber medium tube 202.
In this embodiment, the rf antenna 203 has a first antenna terminal 2031 and a second antenna terminal 2032.
In this embodiment, the inductively coupled rf unit 20 further includes: a radio frequency source 205; a radio frequency matcher 206, wherein one end of the radio frequency matcher 206 is connected to the radio frequency source 205, and the other end of the radio frequency matcher 206 is connected to the first antenna terminal 2031; a voltage balance capacitor 207, wherein one end of the voltage balance capacitor 207 is connected to the second antenna terminal 2032, and the other end of the voltage balance capacitor 207 is grounded.
The voltage balance capacitor 207 has the following functions: the second antenna terminal 2032 is kept at a certain voltage, and the voltage difference between the first antenna terminal 2031 and the second antenna terminal 2032 is small, so that the impact of the plasma on the sidewall of the reaction chamber dielectric tube 202 is reduced.
In this embodiment, the second antenna terminal 2032 is higher than the first antenna terminal 2031. In other embodiments, the first antenna terminal is higher than the second antenna terminal.
In this embodiment, the method further includes: a wafer holding platform 103 located at the bottom of the reaction chamber body 10.
In this embodiment, the effective rf antenna is configured to generate plasma inside the reaction chamber dielectric tube 202, and the plasma is suitable to enter between the wafer clamping platform 103 and the reaction chamber dielectric tube 202 through the reaction chamber dielectric tube 202.
In this embodiment, the inductively coupled rf unit 20 further includes: and the gas inlet channel 208 is positioned at the top of the reaction chamber medium pipe 202, and the gas inlet channel 208 is suitable for introducing etching gas for etching wafers into the reaction chamber medium pipe 202.
In this embodiment, the method further includes: and the cooling device 209 is positioned at the top of the shielding case 201, and the cooling device 209 is used for cooling the radio frequency antenna 203 and the reaction chamber medium pipe 202.
Fig. 2 is a state in which the height adjuster 204 adjusts the position of the rf antenna 203 to the upper limit, and fig. 3 is a state in which the height adjuster 204 adjusts the position of the rf antenna 203 to the lower limit. It should be noted that the height adjuster 204 can also adjust the position of the rf antenna 203 to other positions according to actual needs.
The height adjuster 204 comprises a spring.
The inductive coupling reactor of fig. 2 and 3 operates on the following principle: radio frequency power provided by a radio frequency source 205 is fed into a first antenna terminal 2031 of a radio frequency antenna 203 through a radio frequency matcher 206, the height of the radio frequency antenna 203 is freely adjusted by an antenna height adjuster 204, voltage distribution on a second antenna terminal 2032 of the radio frequency antenna 203 is distributed and controlled by a voltage balancing capacitor 207, an RF current in the radio frequency antenna 203 generates an alternating magnetic field H perpendicular to a current plane in a trapezoidal reaction chamber dielectric tube 202, and the alternating magnetic field H induces an angular electric field E parallel to the coil current direction in the reaction chamber dielectric tube 202; the reaction gas generates high-density plasma under the action of the angular electric field E, and the radial density distribution of the plasma can be regulated and controlled by the up-and-down movement of the position of the radio-frequency antenna 203; the regulated plasma is gradually accelerated by the bias voltage applied to the wafer clamping platform 103 to reach the surface of the wafer, thereby completing the etching process of the wafer. Obviously, when the tunable antenna is at the upper position limit (fig. 2), the plasma distribution appears to be high in the middle density and low in the edge density; when the adjustable antenna is at the lower end of the position (fig. 3), the plasma distribution appears to be approximately uniform in the middle and at the edges.
The present invention further provides a working method of an inductive coupling reactor, which adopts the above inductive coupling reactor, please refer to fig. 4, and includes the following steps:
s01, placing the wafer in the reaction chamber main body 10;
s02, adjusting the position of the effective radio frequency antenna in the shielding case 201;
s03, after the position of the effective radio frequency antenna in the shielding case 201 is adjusted, the effective radio frequency antenna generates plasma inside the reaction chamber dielectric tube 202, and the plasma enters the reaction cavity main body 10 to etch the wafer.
In this embodiment, the rf antenna is identical to the effective rf antenna, and the antenna height adjuster is used to longitudinally adjust the position of the effective rf antenna in the shield case.
Specifically, the wafer is placed on the wafer holding plate 103, the antenna height adjuster is used to adjust the position of the effective rf antenna in the shielding case 201, the rf power provided by the rf source 205 is fed into the first antenna terminal 2031 of the rf antenna 203 through the rf matcher 206, the rf antenna 203 generates a high-density plasma in the reaction chamber dielectric tube 202, and the radial density distribution of the plasma can be adjusted by the up-and-down movement of the rf antenna 203.
Referring to fig. 5, the difference between the inductive coupling reactor in this embodiment and the inductive coupling reactor in the previous embodiment is that the rf antenna 203a has a first antenna terminal 2031a and a second antenna terminal 2032a and a plurality of intermediate connection terminals 2033a and 2033b between the first antenna terminal 2031a and the second antenna terminal 2032 a; the first antenna terminal 2031a is an input terminal of the effective rf antenna, and the second antenna terminal 2032a or any of the intermediate connection terminals 2033a, 2033b is an output terminal of the effective rf antenna.
Referring to fig. 5, the inductively coupled radio frequency unit 20a further includes: a radio frequency source 205 a; a radio frequency matcher 206a, wherein one end of the radio frequency matcher 206a is connected to the radio frequency source 205a, and the other end of the radio frequency matcher 206a is connected to the first antenna terminal 2031 a; a voltage balance capacitor 207a, one end of the voltage balance capacitor 207a is connected to the second antenna terminal 2032a or to any one of the intermediate connection terminals 2033a and 2033b, and the other end of the voltage balance capacitor 207a is grounded.
In this embodiment, the first antenna terminal 2031a is higher than the second antenna terminal 2032 a.
In other embodiments, the second antenna terminal is higher than the first antenna terminal.
The same contents in this embodiment as in the previous embodiment will not be described in detail.
In this embodiment, when the voltage balancing capacitor 207a is connected to the second antenna terminal 2032a, the rf antenna 203a extending from the second antenna terminal 2032a to the first antenna terminal 2031a is used as an effective rf antenna. When the voltage balancing capacitor 207a is connected to any one of the intermediate connection terminals 2033a and 2033b, the rf antenna 203a, which is connected to the voltage balancing capacitor 207a and whose intermediate connection terminal extends to the first antenna terminal 2031a, serves as an effective rf antenna.
In this embodiment, the rf antenna surrounds the reaction chamber dielectric tube and has a multi-turn continuous coil, and the control of the effective rf antenna position is achieved by controlling the effective number of turns of the rf antenna 203 a.
The embodiment further provides a working method of the inductive coupling reactor, wherein a wafer is placed in the reaction chamber main body 10; adjusting the position of the active rf antenna in the shielding cage 201; after the position of the effective rf antenna in the shielding case 201 is adjusted, the effective rf antenna generates plasma inside the reaction chamber dielectric tube 202, and the plasma enters the reaction chamber main body 10 to etch the wafer.
In this embodiment, adjusting the position of the effective rf antenna in the shielding case 201 includes: the second antenna terminal 2032a or any of the intermediate connection ends 2033a, 2033b is selected as the output of the active rf antenna. Specifically, one end of the voltage balancing capacitor 207a is selectively connected to the second antenna terminal 2032a or one of the intermediate connection terminals 2033a and 2033 b.
Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.

Claims (13)

1. An inductively coupled reactor, comprising:
a reaction chamber body;
the inductive coupling radio frequency unit is positioned above the reaction cavity main body;
the inductively coupled radio frequency unit includes: a shield case; the side wall of the reaction chamber medium pipe is inclined, and the top cross section of the reaction chamber medium pipe is smaller than the bottom cross section; the radio frequency antennas are positioned in the shielding cover and distributed on the side part of the reaction chamber dielectric tube, each radio frequency antenna comprises an effective radio frequency antenna, and the height of each effective radio frequency antenna is adjustable.
2. The inductive coupling reactor of claim 1, wherein said reaction chamber medium pipe has a trapezoidal longitudinal cross-sectional shape.
3. The inductive coupling reactor of claim 1, wherein said rf antenna is identical to said active rf antenna; the inductively coupled radio frequency unit further comprises: an antenna height adjuster located inside the shield, the antenna height adjuster being adapted to adjust the position of the radio frequency antenna in a longitudinal direction.
4. The inductive coupling reactor of claim 3, wherein said RF antenna surrounds said reaction chamber dielectric tube and has a continuous coil of a plurality of turns; the radio frequency antenna is provided with a first antenna terminal and a second antenna terminal;
the inductively coupled radio frequency unit further comprises: a radio frequency source; one end of the radio frequency matcher is connected with the radio frequency source, and the other end of the radio frequency matcher is connected with the first antenna terminal; and one end of the voltage balance capacitor is connected with the second antenna terminal, and the other end of the voltage balance capacitor is grounded.
5. The inductive coupling reactor of claim 1, wherein said rf antenna surrounds said reaction chamber dielectric tube and has a continuous coil of a plurality of turns; the radio frequency antenna has a first antenna terminal and a second antenna terminal and a plurality of intermediate connection ends between the first antenna terminal and the second antenna terminal; the first antenna terminal is the input end of the effective radio frequency antenna, and the second antenna terminal or any middle connecting end is the output end of the effective radio frequency antenna.
6. The inductively coupled reactor of claim 5, wherein the inductively coupled RF unit further comprises: a radio frequency source; one end of the radio frequency matcher is connected with the radio frequency source, and the other end of the radio frequency matcher is connected with the first antenna terminal; and one end of the voltage balance capacitor is connected with the second antenna terminal or any one of the plurality of intermediate connecting ends, and the other end of the voltage balance capacitor is grounded.
7. An inductive coupling reactor according to claim 4 or 5, wherein said first antenna terminal is higher than said second antenna terminal; or the second antenna terminal is higher than the first antenna terminal.
8. The inductive coupling reactor of claim 1, further comprising: the wafer clamping platform is positioned at the bottom in the reaction cavity main body;
the effective radio frequency antenna is used for generating plasma inside the reaction chamber dielectric tube, and the plasma is suitable for entering between the wafer clamping platform and the reaction chamber dielectric tube through the reaction chamber dielectric tube.
9. The inductively coupled reactor of claim 1, wherein the inductively coupled radio frequency unit further comprises: and the gas inlet channel is positioned at the top of the reaction chamber medium pipe and is suitable for introducing etching gas for etching the wafer into the reaction chamber medium pipe.
10. The inductive coupling reactor of claim 1, further comprising: and the cooling device is positioned at the top of the shielding case and used for cooling the radio frequency antenna and the reaction chamber medium pipe.
11. A method of operating an inductively coupled reactor using the inductively coupled reactor of any one of claims 1-10, comprising:
placing a wafer in the reaction chamber body;
adjusting the position of the active radio frequency antenna in the shield;
after the position of the effective radio frequency antenna in the shielding case is adjusted, the effective radio frequency antenna generates plasma inside the reaction chamber dielectric tube, and the plasma enters the reaction cavity body to etch the wafer.
12. The method of claim 11, wherein said rf antenna is identical to said active rf antenna; the inductively coupled radio frequency unit further comprises: an antenna height adjuster located inside the shield case;
and longitudinally adjusting the position of the effective radio frequency antenna in the shielding case by adopting the antenna height adjuster.
13. The method of claim 11, wherein said rf antenna surrounds said reaction chamber dielectric tube and has a multi-turn continuous coil; the radio frequency antenna has a first antenna terminal and a second antenna terminal and a plurality of intermediate connection ends between the first antenna terminal and the second antenna terminal; the first antenna terminal is the input end of the effective radio frequency antenna, and the second antenna terminal or any middle connecting end is the output end of the effective radio frequency antenna;
adjusting the position of the active radio frequency antenna in the shield, comprising: and selecting the second antenna terminal or any middle connecting end as the output end of the effective radio frequency antenna.
CN202010733754.3A 2020-07-27 2020-07-27 Inductive coupling reactor and working method thereof Pending CN111769062A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010733754.3A CN111769062A (en) 2020-07-27 2020-07-27 Inductive coupling reactor and working method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010733754.3A CN111769062A (en) 2020-07-27 2020-07-27 Inductive coupling reactor and working method thereof

Publications (1)

Publication Number Publication Date
CN111769062A true CN111769062A (en) 2020-10-13

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010733754.3A Pending CN111769062A (en) 2020-07-27 2020-07-27 Inductive coupling reactor and working method thereof

Country Status (1)

Country Link
CN (1) CN111769062A (en)

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