CN111736426A - Cleaning device and cleaning method - Google Patents

Cleaning device and cleaning method Download PDF

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Publication number
CN111736426A
CN111736426A CN202010600032.0A CN202010600032A CN111736426A CN 111736426 A CN111736426 A CN 111736426A CN 202010600032 A CN202010600032 A CN 202010600032A CN 111736426 A CN111736426 A CN 111736426A
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China
Prior art keywords
cleaning
vibrator
mask
cleaned
residue
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Pending
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CN202010600032.0A
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Chinese (zh)
Inventor
袁亚鸿
杨阳
古春笑
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Kunshan Govisionox Optoelectronics Co Ltd
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Kunshan Govisionox Optoelectronics Co Ltd
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Priority to CN202010600032.0A priority Critical patent/CN111736426A/en
Publication of CN111736426A publication Critical patent/CN111736426A/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/04—Analysing solids
    • G01N29/07—Analysing solids by measuring propagation velocity or propagation time of acoustic waves
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00—Indexing codes associated with group G01N29/00
    • G01N2291/10—Number of transducers
    • G01N2291/106—Number of transducers one or more transducer arrays

Abstract

The embodiment of the invention relates to the technical field of cleaning equipment, and discloses a cleaning device and a cleaning method, wherein the cleaning device comprises: the washing tank is provided with a detection vibrator and a washing vibrator which are positioned in the washing tank, and a controller connected with the detection vibrator and the washing vibrator; the detection vibrator is used for detecting the position of residues on the mask to be cleaned; the controller is used for controlling the cleaning vibrator to clean the mask to be cleaned according to the position of the residues, so that the cleaning efficiency of the mask is improved while the mask is prevented from being washed excessively.

Description

Cleaning device and cleaning method
Technical Field
The embodiment of the invention relates to the technical field of cleaning equipment, in particular to a cleaning device and a cleaning method.
Background
The mask needs to be cleaned before being used for manufacturing the chip. In the conventional cleaning mode, the mask is placed in a groove body, cleaning liquid is contained in the groove body, the groove body is rectangular, the bottom and four side walls connected with the bottom are planes, vibrators capable of generating ultrasonic waves are placed at the bottom of the groove body, the ultrasonic waves are alternately arranged on a transmission path, cavitation can be generated between density parts, small bubbles are generated one by one and are broken, and the mask can be cleaned by explosive force generated when the bubbles are broken.
However, the inventor finds that in the prior art, the cleaning time cannot be accurately adjusted for different masks, so that the cleaning efficiency of the masks is not high, or the masks are washed excessively to cause loss.
Disclosure of Invention
The embodiment of the invention aims to provide a cleaning device and a cleaning method, which can improve the cleaning efficiency of a mask plate while avoiding the over-cleaning of the mask plate.
In order to solve the above technical problem, an embodiment of the present invention provides a cleaning apparatus, including: the washing tank is provided with a detection vibrator and a washing vibrator which are positioned in the washing tank, and a controller connected with the detection vibrator and the washing vibrator; the detection vibrator is used for detecting the position of residues on the mask to be cleaned; the controller is used for controlling the cleaning vibrator to clean the mask to be cleaned according to the position of the residue.
In addition, the detection vibrator includes: a plurality of ultrasonic wave transmitting and receiving devices.
In addition, the plurality of ultrasonic transmitting and receiving devices are distributed on the side wall of the cleaning tank and/or the bottom surface of the cleaning tank; preferably, the plurality of ultrasonic transceivers are uniformly arranged in an array. A plurality of ultrasonic transceiver of this scheme are array and evenly arrange, realize treating the comprehensive detection of wasing the mask version, avoid lou examining and lead to waiting to wash that the mask version washs unclean.
In addition, the ultrasonic wave transmitting and receiving device is used for transmitting ultrasonic waves to the surface of the mask plate and receiving the reflected ultrasonic waves; the detection vibrator further includes: a processor connected to the plurality of ultrasonic transceivers and the controller; the processor is used for detecting an included angle between the reflected ultrasonic wave and the bottom surface of the cleaning groove and determining the reflection position of the ultrasonic wave on the mask plate to be cleaned according to the included angle; the detection vibrator is also used for determining the time difference between the time of receiving the reflected ultrasonic wave and the emission time of the last recorded ultrasonic wave in advance, and determining whether the reflection position has residues or not according to the time difference. The scheme provides a specific implementation mode for detecting the position of the residue on the mask to be cleaned by the detection probe.
In addition, the cleaning vibrator includes: an ultrasonic transmitter. Preferably, the controller increases the cleaning intensity by increasing the ultrasonic frequency or power of the ultrasonic transmitter, or decreases the cleaning intensity by decreasing the ultrasonic frequency or power of the ultrasonic transmitter.
In addition, the cleaning oscillator is a plurality of.
In addition, the controller is used for determining the cleaning vibrator closest to the position of the residue and enhancing the cleaning strength of the cleaning vibrator closest to the position of the residue. The scheme enhances the cleaning strength of the cleaning vibrator closest to the position of the residue, and accelerates the cleaning speed of the residue on the mask to be cleaned.
Preferably, the controller is further configured to weaken the cleaning intensity of the cleaning vibrators except for the cleaning vibrator closest to the position of the residue. The scheme weakens the cleaning strength of the mask to be cleaned without residues, thereby avoiding the mask to be cleaned from over-cleaning.
The embodiment of the invention provides a cleaning method, which is applied to the cleaning device; detecting the position of a residue on the mask to be cleaned by using a detection vibrator; and controlling the cleaning vibrator to clean the mask to be cleaned according to the position of the residue.
In addition, before the position of the residue on the mask to be cleaned is detected by the detection vibrator, the method further comprises the following steps: and cleaning the mask plate to be cleaned by using cleaning liquid medicine. In the scheme, after the mask to be cleaned is cleaned by using the cleaning liquid medicine for a period of time, the detection vibrator is used for detecting, so that the cleaning speed is improved.
In addition, in the process of detecting the position of the residue on the mask to be cleaned by using the detection vibrator, the cleaning vibrator is controlled to be in a closed or standby state; and controlling the detection vibrator to be in a closed or standby state in the process of controlling the cleaning vibrator to clean the mask to be cleaned according to the position of the residue. According to the scheme, the cleaning vibrator is not started when the detection vibrator is started, and the detection vibrator is not started when the cleaning vibrator is started, so that the use effect is prevented from being influenced mutually.
Embodiments of the present invention provide a cleaning device, relative to the prior art, comprising: the detection oscillator and the washing oscillator that are located the washing tank, still including connecting the controller that detects the oscillator and wash the oscillator, detect the oscillator and detect the position of waiting to wash the residue on the mask version, the controller is used for washing the oscillator washing according to the position control of residue and waits to wash the mask version, can realize treating the fixed point of washing the mask version and wash, and can detect while wasing to the not equidimension mask version of waiting to wash, thereby finish wasing when not detecting the residue, avoid waiting to wash the mask version and wash excessively, the while has also avoided waiting to wash the mask version and has washd unclean and carry out the secondary and wash, the cleaning efficiency of mask version has been promoted.
Drawings
One or more embodiments are illustrated by way of example in the accompanying drawings, which correspond to the figures in which like reference numerals refer to similar elements and which are not to scale unless otherwise specified.
FIG. 1 is a schematic structural view of a cleaning apparatus according to a first embodiment of the present invention;
FIG. 2 is a schematic view showing the arrangement of ultrasonic transmitters and receivers according to a first embodiment of the present invention;
FIG. 3 is a schematic diagram of determining the reflection position of the reflected ultrasonic waves on the reticle to be cleaned according to the first embodiment of the present invention;
fig. 4 is a schematic flow chart of a cleaning method according to a second embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the embodiments of the present invention will be described in detail below with reference to the accompanying drawings. However, it will be appreciated by those of ordinary skill in the art that numerous technical details are set forth in order to provide a better understanding of the present application in various embodiments of the present invention. However, the technical solution claimed in the present application can be implemented without these technical details and various changes and modifications based on the following embodiments.
A first embodiment of the present invention relates to a cleaning apparatus including: the detection oscillator and the washing oscillator that are located the washing tank, still including connecting the controller that detects the oscillator and wash the oscillator, detect the oscillator and detect the position of waiting to wash the residue on the mask version, the controller is used for washing the oscillator washing according to the position control of residue and waits to wash the mask version, can realize treating the fixed point of washing the mask version and wash, and can detect while wasing to the not equidimension mask version of waiting to wash, thereby finish wasing when not detecting the residue, avoid waiting to wash the mask version and wash excessively, the while has also avoided waiting to wash the mask version and has washd unclean and carry out the secondary and wash, the cleaning efficiency of mask version has been promoted.
The following is a detailed description of the implementation of the cleaning device of the present embodiment, and the following is provided only for the sake of understanding and is not necessary to implement the present embodiment.
The structure of the cleaning device in this embodiment is schematically shown in fig. 1 and fig. 2 (in fig. 1, all the side walls of the cleaning tank are not drawn for convenience of showing the structure inside the cleaning tank), and includes: the washing tank 1, locate at detecting oscillator 2 and washing oscillator 3 in washing tank 1, connect detecting oscillator 2 and controller 4 to wash oscillator 3; the detection vibrator 2 is used for detecting the position of residues on the mask 10 to be cleaned; the controller 4 is used for controlling the cleaning vibrator 3 to clean the mask plate 10 to be cleaned according to the position of the residues.
Specifically, the detection vibrator 2 and the cleaning vibrator 3 are provided in the cleaning tank 1, the controller 4 may be provided outside the cleaning tank 1, and the detection vibrator 2 and the cleaning vibrator 3 are connected to the external controller 4 through a line (not shown). Be provided with the fixed dead lever 01 who treats washing mask version 10 in the washing tank 1, the figure of dead lever 01 is at least four, still is provided with two at least fixed part 02 in the washing tank 1, is provided with the fixed plate 03 who treats washing mask version 10 on dead lever 01 and the fixed part 02, is provided with the opening in the middle of the fixed plate 03, treats that washing mask version 10 is fixed in the opening part of fixed plate 03 when wasing.
The detection oscillator 2 detects the position of the residue on the mask plate 10 to be cleaned, the controller 4 is used for controlling the cleaning oscillator 3 to clean the mask plate 10 to be cleaned according to the position of the residue, fixed-point cleaning of the mask plate 10 to be cleaned can be achieved, the mask plate 10 to be cleaned in different sizes can be detected and cleaned at the same time, therefore, cleaning is finished when the residue is not detected, over-cleaning of the mask plate 10 to be cleaned is avoided, meanwhile, the problem that the mask plate 10 to be cleaned is not cleaned completely and secondary cleaning is carried out is avoided, and the cleaning efficiency of the mask plate is improved.
In the present embodiment, the detection oscillator 2 includes: a plurality of ultrasonic transmitters/receivers 21. A plurality of ultrasonic transmitters/receivers 21 are distributed on the side wall of the cleaning tank 1 and/or on the bottom surface of the cleaning tank 1.
Specifically, if the mask 10 to be cleaned is vertically placed in the cleaning tank 1 when the mask 10 to be cleaned is cleaned, and the mask 10 to be cleaned is parallel to the side wall of the cleaning tank 1, the plurality of ultrasonic transceivers 21 may be only disposed on the side wall of the cleaning tank 1 parallel to the surface of the mask 10 to be cleaned, without disposing the ultrasonic transceivers 21 on the bottom surface of the cleaning tank 1; if the mask 10 to be cleaned is to be cleaned, the mask 10 to be cleaned is horizontally placed in the cleaning tank 1, and at this time, the mask 10 to be cleaned is parallel to the bottom surface of the cleaning tank 1, the plurality of ultrasonic transceivers 21 may be only disposed on the bottom surface of the cleaning tank 1 parallel to the surface of the mask 10 to be cleaned, and the ultrasonic transceivers 21 need not be disposed on the side wall of the cleaning tank 1. It should be noted that the plurality of ultrasonic transceivers 21 are disposed on the side wall of the cleaning tank in the present embodiment only for convenience of drawing, and should not be limited thereto.
As shown in fig. 2, the plurality of ultrasonic transceivers 21 are uniformly arranged in an array. Therefore, the ultrasonic transmitter-receiver 21 can realize the comprehensive detection of the mask 10 to be cleaned, and the incomplete cleaning of the mask 10 to be cleaned caused by missed detection is avoided. It should be noted that, for the masks 10 to be cleaned with different sizes, if the size of the mask 10 to be cleaned is smaller, the number of the enabled ultrasonic wave emitting/receiving devices 21 can be reduced, and the cost can be reduced; if the size of the mask 10 to be cleaned is large, the number of the enabled ultrasonic transmitters/receivers 21 can be increased, and incomplete detection can be avoided.
Further, the ultrasonic wave transmitter-receiver 21 is used for transmitting an ultrasonic wave to the surface of the mask and receiving the reflected ultrasonic wave; the detecting element 2 further includes: a processor 22 connected to the plurality of ultrasonic transmitters/receivers 21 and the controller 4; the processor 22 is used for determining the reflection position of the reflected ultrasonic wave on the mask plate 10 to be cleaned; the detecting vibrator 2 is also used for determining the time difference between the time of receiving the reflected ultrasonic wave and the emission time of the last ultrasonic wave recorded in advance, and determining whether the reflecting position has residues or not according to the time difference.
Specifically, the detection oscillator 2 further includes: a processor 22 connected to the plurality of ultrasonic transmitters/receivers 21 and the controller 4. The processor 22 may be disposed outside the cleaning tank 1 and connected to the plurality of cleaning vibrators 3 in the cleaning tank 1 through wires. The ultrasonic wave transmitter-receiver 21 is used for transmitting ultrasonic waves (the frequency of the transmitted ultrasonic waves is 40 KHZ-170 KHZ) to the surface of the mask plate and receiving the reflected ultrasonic waves, and the processor 22 can determine the position of residues on the mask plate 10 to be cleaned according to the reflected ultrasonic waves.
If the mask 10 to be cleaned is parallel to the side wall of the cleaning tank 1, the processor 22 is configured to determine an included angle between the reflected ultrasonic wave and the bottom surface of the cleaning tank 1, and determine an included angle between the reflected ultrasonic wave and the side wall of the cleaning tank 1 perpendicular to the mask, and if it is determined that the included angle between the reflected ultrasonic wave and the side wall of the cleaning tank 1 perpendicular to the mask is 0 degree, at this time, a reflection position of the reflected ultrasonic wave on the mask 10 to be cleaned may be determined according to the included angle between the reflected ultrasonic wave and the bottom surface of the cleaning tank 1, a position of the ultrasonic wave transceiver 21, and a perpendicular distance between the ultrasonic transceiver 21 receiving the reflected ultrasonic wave and the mask 10 to be cleaned.
For example, as shown in fig. 2, a three-dimensional coordinate system is established with a vertex of a bottom surface of the cleaning tank 1 as an origin O, a side where a width of the cleaning tank 1 is located as an x-axis, a side where a length of the cleaning tank 1 is located as a y-axis, and a side where a height is located as a z-axis, assuming that the ultrasonic transmitter/receiver 21 is disposed at a position of a B point on a sidewall of the cleaning tank 1 located on the y-axis, the mask 10 to be cleaned is parallel to a sidewall surface of the cleaning tank 1 located on the y-axis, if an included angle between the reflected ultrasonic wave and the bottom surface of the cleaning tank 1 is α, a position B (x, y, z) where the ultrasonic transmitter/receiver 21 is located, and a vertical distance between the ultrasonic transmitter/receiver 21 receiving the reflected ultrasonic wave and the mask 10 to be cleaned is D, a reflection position a of the reflected ultrasonic wave on the mask 10 to be cleaned is (x + D.
If the mask 10 to be cleaned is parallel to the bottom surface of the cleaning tank 1, the processor 22 is configured to determine an included angle between the reflected ultrasonic wave and the side wall of the cleaning tank 1, and determine an included angle between the reflected ultrasonic wave and the bottom surface of the cleaning tank 1, and if the included angle between the reflected ultrasonic wave and the side wall of the cleaning tank 1 is determined to be 0, at this time, a reflection position of the ultrasonic wave on the mask 10 to be cleaned may be determined according to the included angle between the reflected ultrasonic wave and the bottom surface of the cleaning tank 1, a position of the ultrasonic wave transceiver 21 that receives the reflected ultrasonic wave, and a vertical distance between the ultrasonic transceiver 21 that receives the reflected ultrasonic wave and the mask 10 to be cleaned.
Then, the processor 22 of the detecting vibrator 2 is also used for determining the time difference between the time of receiving the reflected ultrasonic wave and the time of transmitting the last ultrasonic wave recorded in advance, and determining whether the reflection position has the residue according to the time difference.
Specifically, all the ultrasonic transmitters/receivers 21 emit ultrasonic waves at the same time. The mask 10 to be cleaned is made of a special low-expansion iron-nickel alloy invar36 with an ultralow expansion coefficient or high-carbon chromium stainless steel SUS 440; the material of the residue on the mask 10 to be cleaned is mostly organic matter. Because the reflection rate of the ultrasonic waves on the iron-nickel alloy is greater than that of the ultrasonic waves on the organic matters, a preset threshold value can be set, and when the time difference is greater than the preset threshold value, organic residues exist at the reflection position; when the time difference is smaller than the preset threshold, it indicates that no organic residue exists at the reflection position, so that whether the mask 10 to be cleaned has the residue and the position of the residue can be determined. It should be noted that the preset threshold value in the present application can be experimentally measured.
Further, the cleaning vibrator 3 includes: an ultrasonic transmitter. When the mask plate 10 to be cleaned is cleaned, cleaning liquid medicine is contained in the cleaning tank 1, and the mask plate 10 to be cleaned is immersed in the cleaning liquid medicine. When the cleaning vibrator 3 at the bottom of the cleaning tank 1 filled with the cleaning liquid medicine emits ultrasonic waves, tens of thousands of micro bubbles, i.e., cavitation bubbles, are generated due to the vibration of the liquid. These bubbles grow in the negative pressure zone formed by the longitudinal propagation of the ultrasound waves and rapidly close in the positive pressure zone, thus being compressed and stretched under alternating positive and negative pressures. The bubbles are compressed until collapse, and the mask can be cleaned by the explosive force generated when the bubbles are broken.
In the present embodiment, the number of the cleaning vibrators 3 is plural, and the plural cleaning vibrators 3 may be distributed on the side wall of the cleaning tank 1 and/or the bottom surface of the cleaning tank 1. If the mask 10 to be cleaned is cleaned, the mask 10 to be cleaned is vertically placed in the cleaning tank 1, and the mask 10 to be cleaned is parallel to the side wall of the cleaning tank 1, a plurality of cleaning vibrators 3 can be only arranged on the side wall of the cleaning tank 1 parallel to the surface of the mask 10 to be cleaned, and the cleaning vibrators 3 do not need to be arranged on the bottom surface of the cleaning tank 1; if the mask 10 to be cleaned is cleaned, the mask 10 to be cleaned is horizontally placed in the cleaning tank 1, and at this time, the mask 10 to be cleaned is parallel to the bottom surface of the cleaning tank 1, so that the plurality of cleaning vibrators 3 can be only arranged on the bottom surface of the cleaning tank 1 parallel to the surface of the mask 10 to be cleaned, and the cleaning vibrators 3 do not need to be arranged on the side wall of the cleaning tank 1. In the present embodiment, the plurality of cleaning vibrators 3 are disposed on the bottom surface of the cleaning tank only for convenience of drawing, and should not be limited thereto.
It should be noted that in the present embodiment, only the transmitting function of the ultrasonic transceiver 21 of the detecting vibrator 2 may be turned on, and at this time, the detecting vibrator 2 may be used as the cleaning vibrator 3 to clean the mask 10 to be cleaned, and it is not necessary to separately provide the cleaning vibrator 3 in the cleaning tank 1, which saves the cost of the cleaning apparatus.
Preferably, the controller 4 increases the cleaning intensity by increasing the ultrasonic frequency or power of the ultrasonic transmitter or decreases the cleaning intensity by decreasing the ultrasonic frequency or power of the ultrasonic transmitter.
Specifically, the lower the ultrasonic frequency, the easier it is to generate cavitation in the liquid, and the greater the number of cavitation bubbles obtained; the higher the ultrasonic frequency, the smaller the number of cavitation bubbles obtained. The controller 4 in this embodiment may increase or decrease the cleaning intensity by controlling the ultrasonic frequency of the ultrasonic transmitter. Specifically, the ultrasonic frequency can be adjusted according to the correspondence between the frequency and the size of the residual particulate matter to be targeted, as shown in the following table (1).
TABLE 1
Figure BDA0002558315270000061
Figure BDA0002558315270000071
The ultrasonic intensity refers to the ultrasonic power per unit area, and the generation of cavitation is related to the ultrasonic intensity. When the ultrasonic intensity of general liquid is increased, the cavitation intensity is increased, but after the ultrasonic intensity reaches a certain value, the cavitation tends to be saturated, and then the ultrasonic intensity is increased, a large amount of useless bubbles are generated, so that the scattering attenuation is increased, and the cavitation intensity is reduced. In the scheme, the cleaning intensity can be increased by increasing the power (0-500W) of the ultrasonic wave with the same frequency, namely increasing the ultrasonic wave intensity, or the cleaning intensity can be weakened by reducing the power of the ultrasonic wave with the same frequency.
Further, the controller 4 is configured to determine the cleaning vibrator 3 closest to the position of the residue, and enhance the cleaning strength of the cleaning vibrator 3 closest to the position of the residue.
Specifically, after the position of the residue on the mask 10 to be cleaned is determined, the controller 4 determines the cleaning vibrator 3 closest to the position of the residue according to the position of the residue, enhances the cleaning strength of the cleaning vibrator 3 closest to the position of the residue, and accelerates the cleaning speed of the residue on the mask 10 to be cleaned. Meanwhile, the controller 4 is also configured to weaken the cleaning strength of the other cleaning vibrators 3 except the cleaning vibrator 3 closest to the position of the residue, that is, weakening the cleaning strength at the mask to be cleaned 10 where no residue exists, so as to avoid over-cleaning of the mask to be cleaned 10.
It should be noted that, since the detection oscillator 2 and the cleaning oscillator 3 both emit ultrasonic waves when they are activated, the cleaning oscillator 3 is not activated when the detection oscillator 2 is activated and the detection oscillator 2 is not activated when the cleaning oscillator 3 is activated in order to avoid mutual influence on the use effect.
Compared with the prior art, the embodiment of the invention provides a cleaning device, which comprises: the detection oscillator 2 and the washing oscillator 3 that are located washing tank 1, still including connecting detection oscillator 2 and the controller 4 who washs oscillator 3, detect oscillator 2 and detect the position of waiting to wash the residue on mask version 10, controller 4 is used for washing oscillator 3 and washs and wait to wash mask version 10 according to the position control of residue, can realize treating the fixed point of washing mask version 10 and wash, and wait to equidimension to wash mask version 10 and can detect while wasing, thereby finish wasing when not detecting the residue, avoid waiting to wash mask version 10 and wash, also avoided waiting to wash mask version 10 and washed unclean and carry out the secondary simultaneously and wash, the cleaning efficiency of mask version has been promoted.
A second embodiment of the present invention relates to a cleaning method applied to the cleaning apparatus in the first embodiment, including: the washing tank 1 includes a detection vibrator 2 and a washing vibrator 3 located in the washing tank 1, and a controller 4 connected to the detection vibrator 2 and the washing vibrator 3.
A schematic flow chart of the cleaning method in this embodiment is shown in fig. 4, and specifically includes:
step 101: and cleaning the mask plate 10 to be cleaned by using the cleaning liquid medicine.
Specifically, the cleaning tank 1 contains cleaning liquid medicine, when the mask plate 10 to be cleaned is cleaned, the detection vibrator 2 and the cleaning vibrator 3 are not started, the detection vibrator 2 is started to detect after the mask plate 10 to be cleaned is cleaned for a period of time by directly using the cleaning liquid medicine in the cleaning tank 1, and the cleaning vibrator 3 is started to position and clean, so that the cleaning speed of the mask plate 10 to be cleaned is improved.
Step 102: the position of the residue on the mask 10 to be cleaned is detected by the detection vibrator 2.
Step 103: and controlling the cleaning vibrator 3 to clean the mask plate 10 to be cleaned according to the position of the residues.
Specifically, after the mask 10 to be cleaned is cleaned by the cleaning solution in the cleaning tank 1 for a period of time in the steps 102 and 103, the controller 4 may start the detection vibrator 2 to detect the position of the residue on the mask 10 to be cleaned, so as to control the cleaning vibrator 3 to clean the residue on the mask 10 to be cleaned according to the position of the residue, thereby implementing fixed-point cleaning.
It is worth to be noted that, in the process of detecting the position of the residue on the mask 10 to be cleaned by using the detection vibrator 2, the cleaning vibrator 3 is controlled to be in a closed or standby state; in the process of controlling the cleaning vibrator 3 to clean the mask plate 10 to be cleaned according to the position of the residues, the detection vibrator 2 is controlled to be in a closed or standby state. Specifically, if the detection vibrator 2 is an ultrasonic transmitter-receiver, the cleaning vibrator 3 is an ultrasonic transmitter, and both the detection vibrator 2 and the cleaning vibrator 3 emit ultrasonic waves when they are activated, the cleaning vibrator 3 can be controlled to be in an off or standby state when the detection vibrator 2 is activated, and the detection vibrator 2 can be controlled to be in an off or standby state when the cleaning vibrator 3 is activated, in order to avoid mutual influence on the use effect.
This embodiment is a method example corresponding to the first embodiment, and the implementation details in the first embodiment may be applied to this embodiment, and the implementation details in this embodiment may also be applied to the first embodiment.
It will be understood by those of ordinary skill in the art that the foregoing embodiments are specific examples for carrying out the invention, and that various changes in form and details may be made therein without departing from the spirit and scope of the invention in practice.

Claims (10)

1. A cleaning device, comprising:
the washing tank is provided with a detection vibrator and a washing vibrator which are positioned in the washing tank, and a controller connected with the detection vibrator and the washing vibrator;
the detection vibrator is used for detecting the position of residues on the mask to be cleaned;
the controller is used for controlling the cleaning vibrator to clean the mask to be cleaned according to the position of the residue.
2. The cleaning device of claim 1, wherein the detection vibrator comprises: a plurality of ultrasonic wave transmitting and receiving devices.
3. The cleaning device according to claim 2, wherein the plurality of ultrasonic transceivers are distributed on the side wall of the cleaning tank and/or on the bottom surface of the cleaning tank;
preferably, the plurality of ultrasonic transceivers are uniformly arranged in an array.
4. The cleaning device according to claim 2, wherein the ultrasonic wave transmitter-receiver is used for transmitting ultrasonic waves to the surface of the mask and receiving the reflected ultrasonic waves;
the detection vibrator further includes: a processor connected to the plurality of ultrasonic transceivers and the controller; the processor is used for determining the reflection position of the reflected ultrasonic wave on the mask to be cleaned;
the detection vibrator is also used for determining the time difference between the time of receiving the reflected ultrasonic wave and the emission time of the last recorded ultrasonic wave in advance, and determining whether the reflection position has residues or not according to the time difference.
5. The cleaning device of claim 1, wherein the cleaning vibrator comprises: an ultrasonic transmitter;
preferably, the controller increases the cleaning intensity by increasing the ultrasonic frequency or power of the ultrasonic transmitter, or decreases the cleaning intensity by decreasing the ultrasonic frequency or power of the ultrasonic transmitter.
6. The cleaning device according to claim 1, wherein the cleaning vibrator is plural.
7. The cleaning device according to claim 6, wherein the controller is configured to determine the cleaning vibrator closest to the position of the residue and enhance the cleaning intensity of the cleaning vibrator closest to the position of the residue;
preferably, the controller is further configured to weaken the cleaning intensity of the cleaning vibrators except for the cleaning vibrator closest to the position of the residue.
8. A cleaning method characterized by being applied to the cleaning apparatus of any one of the above claims 1 to 8;
detecting the position of a residue on the mask to be cleaned by using a detection vibrator;
and controlling the cleaning vibrator to clean the mask to be cleaned according to the position of the residue.
9. The cleaning method according to claim 8, wherein before the detecting the position of the residue on the mask to be cleaned by the detecting vibrator, the method further comprises:
and cleaning the mask plate to be cleaned by using cleaning liquid medicine.
10. The cleaning method according to claim 8, wherein the cleaning vibrator is controlled to be in a closed or standby state in the process of detecting the position of the residue on the mask to be cleaned by using the detection vibrator;
and controlling the detection vibrator to be in a closed or standby state in the process of controlling the cleaning vibrator to clean the mask to be cleaned according to the position of the residue.
CN202010600032.0A 2020-06-28 2020-06-28 Cleaning device and cleaning method Pending CN111736426A (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0810732A (en) * 1994-07-04 1996-01-16 Sharp Corp Ultrasonic washing device
JPH08318237A (en) * 1995-05-26 1996-12-03 Nikon Corp Substrate washing apparatus
CN206500403U (en) * 2017-01-19 2017-09-19 昆山国显光电有限公司 Ultrasonic cleaner

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0810732A (en) * 1994-07-04 1996-01-16 Sharp Corp Ultrasonic washing device
JPH08318237A (en) * 1995-05-26 1996-12-03 Nikon Corp Substrate washing apparatus
CN206500403U (en) * 2017-01-19 2017-09-19 昆山国显光电有限公司 Ultrasonic cleaner

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