CN111694465A - Manufacturing method of touch display panel, touch display panel and display device - Google Patents
Manufacturing method of touch display panel, touch display panel and display device Download PDFInfo
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- CN111694465A CN111694465A CN202010579799.XA CN202010579799A CN111694465A CN 111694465 A CN111694465 A CN 111694465A CN 202010579799 A CN202010579799 A CN 202010579799A CN 111694465 A CN111694465 A CN 111694465A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 239000010410 layer Substances 0.000 claims abstract description 322
- 239000012044 organic layer Substances 0.000 claims abstract description 118
- 238000000059 patterning Methods 0.000 claims abstract description 33
- 238000005260 corrosion Methods 0.000 claims abstract description 10
- 230000007797 corrosion Effects 0.000 claims abstract description 10
- 239000010408 film Substances 0.000 claims description 69
- 239000010409 thin film Substances 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 34
- 230000000149 penetrating effect Effects 0.000 claims description 23
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 14
- 239000001301 oxygen Substances 0.000 claims description 14
- 239000011368 organic material Substances 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 9
- 238000001312 dry etching Methods 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- 230000000903 blocking effect Effects 0.000 claims description 4
- 238000002955 isolation Methods 0.000 claims description 3
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 3
- 239000002184 metal Substances 0.000 description 16
- 229920002120 photoresistant polymer Polymers 0.000 description 13
- 238000005538 encapsulation Methods 0.000 description 10
- 238000002834 transmittance Methods 0.000 description 7
- 150000001555 benzenes Chemical class 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000031700 light absorption Effects 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 230000008054 signal transmission Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/042—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by opto-electronic means
- G06F3/0421—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by opto-electronic means by interrupting or reflecting a light beam, e.g. optical touch-screen
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/042—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by opto-electronic means
- G06F3/0425—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by opto-electronic means using a single imaging device like a video camera for tracking the absolute position of a single or a plurality of objects with respect to an imaged reference surface, e.g. video camera imaging a display or a projection screen, a table or a wall surface, on which a computer generated image is displayed or projected
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Multimedia (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The invention provides a manufacturing method of a touch display panel, the touch display panel and a display device, and relates to the technical field of display. The embodiment of the invention provides a display panel, which comprises a display area, a light-shielding area and a light-transmitting area, wherein the display area comprises a through hole area and a light-shielding area surrounding the through hole area; forming an organic layer on the light-shielding region of the display panel; carrying out corrosion treatment on the organic layer to enable the surface, far away from the display panel, of the organic layer to be provided with a plurality of concave structures; forming a touch electrode film on the organic layer; patterning the touch electrode film to form a light shielding layer in the recessed structure; the shading layer is a touch electrode film remained in the concave structure after patterning processing. The organic layer is subjected to corrosion treatment, so that the surface of the organic layer is provided with a plurality of concave structures, a light shielding layer is formed in the concave structures, and the light is absorbed by the light shielding layer so as to reduce the influence of light from the inside of the display panel on the through hole area.
Description
Technical Field
The invention relates to the technical field of display, in particular to a manufacturing method of a touch display panel, the touch display panel and a display device.
Background
At present, the front camera device or the infrared scanning device is arranged inside the display area, which becomes a very popular display panel manufacturing method in the current display panel manufacturing, and the display panel manufactured by adopting the method needs to be provided with a through hole area in the display area of the display panel, but due to the influence of effective display area light rays in the display panel and external natural light, the problems of light leakage, poor imaging quality and the like can occur at the position of the through hole area.
In the prior art, in order to solve the problem, in an FMLOC (Film multi-layer on cell touch) process, when an active display area is used to fabricate an inductive electrode and an emissive electrode, a metal light shielding layer is formed on the periphery of a through hole area.
However, in the conventional metal light-shielding layer with a flat surface, light from the inside of the display panel is reflected, and the generated reflected light enters the position of the through hole region, so that more stray light appears at the position of the through hole region, and the light-emitting effect of the functional device in the through hole region is further affected.
Disclosure of Invention
The invention provides a manufacturing method of a touch display panel, the touch display panel and a display device, and aims to solve the problem of light leakage in the process of realizing shading by adopting a metal shading layer and black ink together.
In order to solve the above problems, the present invention discloses a method for manufacturing a touch display panel, comprising:
providing a display panel, wherein the display panel comprises a display area, and the display area comprises a through hole area and a light shielding area surrounding the through hole area;
forming an organic layer on the light-shielding region of the display panel;
carrying out corrosion treatment on the organic layer, so that the surface of the organic layer, which is far away from the display panel, is provided with a plurality of concave structures;
forming a touch electrode film on the organic layer;
patterning the touch electrode film to form a light shielding layer in the recessed structure;
and the light shielding layer is the residual touch electrode thin film in the concave structure after the patterning treatment.
Optionally, the organic layer is made of an organic material having a benzene ring as a main chain molecular structure.
Optionally, the display panel further includes a non-display area, the display area further includes an effective display area, and before the step of forming the organic layer on the light-shielding area of the display panel, the method further includes:
forming a buffer film on the display area and the non-display area of the display panel;
patterning the buffer film to form buffer layers in the effective display area and the non-display area, and removing the buffer film in the shading area;
and forming an electrode connection layer on the buffer layer of the effective display region.
Optionally, the step of forming an organic layer on the light-shielding region of the display panel includes:
forming an organic thin film covering the buffer layer, the electrode connection layer, and the display panel in the light-shielding region;
patterning the organic thin film to form organic layers in the effective display area, the non-display area and the light shielding area;
the organic thin film in the pixel region in the effective display region is removed, a first contact hole penetrating through the organic layer is formed in the effective display region, and a second contact hole penetrating through the organic layer is formed in the non-display region.
Optionally, the step of performing etching treatment on the organic layer to make the surface of the organic layer away from the display panel have a plurality of concave structures includes:
etching the buffer layer at the position of the second contact hole to form a third contact hole penetrating through the buffer layer, and enabling the surface of the organic layer far away from the display panel to be provided with a plurality of concave structures, wherein the concave structures are positioned in the effective display area, the isolation area and the non-display area;
wherein an orthographic projection of the second contact hole on the display panel is at least partially overlapped with an orthographic projection of the third contact hole on the display panel.
Optionally, the buffer layer at the position of the second contact hole is etched by using a dry etching process, wherein etching gas used by the dry etching process includes oxygen and carbon tetrafluoride.
Optionally, the step of patterning the touch electrode thin film to form a light shielding layer in the recessed structure further includes:
patterning the touch electrode thin films positioned in the effective display area and the shading area to form an electrode layer and a reflection reducing layer in the effective display area and form a shading layer in the recessed structure of the shading area;
wherein orthographic projections of the electrode layer and the reflection reducing layer on the display panel are not overlapped, and the reflection reducing layer is the residual touch electrode thin film in the concave structure of the effective display area after the patterning treatment; the electrode layer is connected with the electrode connecting layer through the first contact hole, and the electrode layer is connected with the display panel through the second contact hole and the third contact hole.
Optionally, after the step of patterning the touch electrode thin film to form a light shielding layer in the recessed structure, the method further includes:
forming a flat layer covering the electrode layer, the light-shielding layer, the antireflection layer, and the buffer layer.
In order to solve the above problem, the present invention also discloses a touch display panel, including:
a display panel including a display area including a through hole region and a light blocking region surrounding the through hole region;
the organic layer is arranged on the light shielding area of the display panel and provided with a plurality of concave structures on the surface far away from the display panel;
a light shielding layer disposed within the recessed structure;
the shading layer is a touch electrode film.
Optionally, the display panel further includes a non-display area, the display area further includes an effective display area, and the touch display panel further includes:
a buffer layer disposed on the effective display region and the non-display region of the display panel;
an electrode connection layer disposed on the buffer layer of the effective display region.
Optionally, the organic layer is further located in the active display region and the non-display region, and covers the buffer layer and the electrode connection layer;
wherein the organic layer of the effective display area and the non-display area has a plurality of concave structures on the surface far away from the display panel.
Optionally, the touch display panel further includes:
the electrode layer and the antireflection layer are arranged in the effective display area;
the electrode layer and the reflection reducing layer are not overlapped in orthographic projection on the display panel, and the reflection reducing layer is a touch electrode film in a concave structure of the effective display area; the electrode layer is connected with the electrode connecting layer through a first contact hole penetrating through the organic layer; in the non-display area, the electrode layer is connected with the display panel through a second contact hole penetrating through the organic layer and a third contact hole penetrating through the buffer layer, and the orthographic projection of the second contact hole on the display panel is at least partially overlapped with the orthographic projection of the third contact hole on the display panel.
Optionally, the touch display panel further includes: a flat layer covering the electrode layer, the light-shielding layer, the antireflection layer, and the buffer layer.
In order to solve the above problem, the present invention further discloses a display device, including the touch display panel.
Compared with the prior art, the invention has the following advantages:
in an embodiment of the present invention, a display panel is provided, the display panel including a display area, the display area including a through hole region and a light shielding region surrounding the through hole region; forming an organic layer on the light-shielding region of the display panel; carrying out corrosion treatment on the organic layer to enable the surface, far away from the display panel, of the organic layer to be provided with a plurality of concave structures; forming a touch electrode film on the organic layer; patterning the touch electrode film to form a light shielding layer in the recessed structure; the shading layer is a touch electrode film remained in the concave structure after patterning processing. The organic layer of the shading area of the display panel is corroded to enable the surface, far away from the display panel, of the organic layer to be provided with a plurality of concave structures, then the touch electrode film on the organic layer is patterned to enable the touch electrode film to remain in the concave structures to form a shading layer, when light inside the display panel irradiates the shading layer in the concave structures, the light is continuously reflected and refracted in the concave structures with the shading layer and is finally absorbed, so that the light irradiating the periphery of the through hole area inside the display panel can be absorbed, stray light of the through hole area can be reduced, and the light emitting effect of a functional device located in the through hole area is improved; and the shading layer positioned in the concave structure can also absorb external natural light, so that the influence of the external natural light on the through hole area is reduced.
Drawings
FIG. 1 is a schematic cross-sectional view illustrating an effective display area and a light-shielding area of a touch display panel in the prior art;
fig. 2 is a flowchart illustrating a method for manufacturing a touch display panel according to a first embodiment of the invention;
FIG. 3 is a schematic cross-sectional view of a touch display panel in a light-shielding region according to an embodiment of the invention;
FIG. 4 shows a molecular structure in which a main chain molecular structure adopted by an organic layer of an embodiment of the present invention is a benzene ring;
FIG. 5 shows a molecular structure in which a main chain molecular structure adopted by an organic layer in the prior art is silicon;
fig. 6 is a schematic cross-sectional view illustrating a buffer layer formed in an active display region and a non-display region according to an embodiment of the present invention;
fig. 7 is a schematic sectional view showing an embodiment of the present invention after an electrode connection layer is formed in an active display area and a non-display area;
fig. 8 is a schematic cross-sectional view showing an embodiment of the present invention after forming an organic layer in an active display area and a non-display area;
fig. 9 is a schematic cross-sectional view illustrating a recess structure formed on an organic layer of an active display area and a non-display area according to an embodiment of the present invention;
FIG. 10 is a schematic cross-sectional view illustrating a touch electrode film formed in an active display area and a non-display area according to an embodiment of the present invention;
FIG. 11 is a schematic cross-sectional view illustrating a touch electrode film patterned in an active display area and a non-display area according to an embodiment of the invention;
FIG. 12 is a schematic diagram illustrating the absorption of natural light by a light-shielding layer or a reflection reducing layer according to an embodiment of the present invention;
fig. 13 is a schematic cross-sectional view showing a flat layer formed in an active display region and a non-display region in an embodiment of the present invention.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in further detail below.
In the prior art, shading a through hole region in a touch display panel is performed according to the following processes: as shown in fig. 1, a display panel 1 is provided, a display area of the display panel 1 includes an effective display area a, a through hole area (not shown in fig. 1), and a light shielding area B surrounding the through hole area, and a buffer layer 2 is formed in the effective display area a of the display panel 1; forming a patterned first electrode layer 3 on the buffer layer 2; forming a first organic layer 4 covering the first electrode layer 3 and the buffer layer 2 in the effective display area A, simultaneously forming the first organic layer 4 on the display panel 1 of the shading area B surrounding the through hole area, patterning the first organic layer 4, and forming a via hole structure penetrating through the first organic layer 4 on the first electrode layer 3 in the effective display area A, wherein the via hole structure is used for realizing the lap joint of the first electrode layer 3 and a subsequently formed second electrode layer 5; forming a second electrode layer 5 on the first organic layer 4 of the effective display area through a patterning process, wherein the second electrode layer 5 comprises an induction electrode and an emission electrode, and simultaneously forming a metal shading layer 7 in the shading area B; then, a flat layer 6 covering the first organic layer 4, the second electrode layer 5 and the metal light shielding layer 7 is formed, the metal light shielding layer 7 shields the influence of the external light on the through hole region, however, because the surface of the traditional metal light shielding layer 7 is flat, the external light is reflected, so that stray light appears at the through hole region, when a camera is arranged in the through hole region, the imaging quality of the camera is affected, in the prior art, after a display module is formed, black ink 8 is coated at the position of the flat layer 6 corresponding to the metal light shielding layer 7 in the structure, the influence of the external light on the functional device positioned in the through hole region is reduced by the black ink 8, but because the black ink 8 is positioned at the side of the metal light shielding layer 7 far away from the display panel 1, the black ink can only shield the external natural light, and because the surface of the metal light shielding layer 7 is flat, therefore, when light from the effective display area a in the display panel 1 is irradiated onto the metal light shielding layer 7, the metal light shielding layer 7 reflects the light, and the reflected light enters the through hole area, thereby affecting the functional device located in the through hole area.
Therefore, in the embodiment of the invention, the organic layer in the light shielding region of the display panel is subjected to corrosion treatment, so that the surface of the organic layer, which is far away from the display panel, is provided with a plurality of concave structures, then the touch electrode film on the organic layer is subjected to patterning treatment, so that the touch electrode film is remained in the concave structures, so as to form the light shielding layer, when light inside the display panel irradiates on the light shielding layer in the concave structures, the light is continuously reflected and refracted in the concave structures with the light shielding layer, and is finally absorbed, so that the light irradiating the periphery of the through hole region inside the display panel can be absorbed, further stray light in the through hole region can be reduced, and the light emitting effect of the functional device positioned in the through hole region can be improved.
Example one
Referring to fig. 2, a flowchart of a method for manufacturing a touch display panel according to an embodiment of the present invention is shown, which may specifically include the following steps:
In an embodiment of the present invention, a display panel 100 is provided, as shown in fig. 3, the display panel 100 includes a substrate 1001, a PI Film (Polyimide Film) 102, a barrier layer 103, an interlayer dielectric layer 104, a source/drain electrode layer 105, a planarization layer 106, an anode 107, a pixel defining layer 108, an organic functional layer 109, and an encapsulation layer 110 sequentially formed on the substrate 101, wherein an active layer and a gate electrode located on the active layer are further included between the barrier layer 103 and the interlayer dielectric layer 104, a thin Film encapsulation is adopted in the embodiment of the present invention, a material of the encapsulation layer 110 may be an inorganic material, an organic material, or a combination of an inorganic material and an organic material, for example, the encapsulation layer 110 includes a first encapsulation layer and a second encapsulation layer, and the materials of the first encapsulation layer and the second encapsulation layer are both inorganic materials, the encapsulation layer 110 may be specifically configured according to actual needs, the embodiment of the present invention is not limited thereto.
The display panel 100 includes a display region including a through hole region and a light shielding region 10 surrounding the through hole region, the through hole region is a region for mounting a functional device such as a camera or an infrared scanning device, and the light shielding region 10 is used for subsequently disposing a light shielding layer to shield the through hole region from light.
In the embodiment of the present invention, after the display panel 100 is obtained, the organic layer 203 is formed on the light-shielding region 10 of the display panel 100, the material of the organic layer 203 is an organic material whose main chain molecular structure is a benzene ring, as shown in fig. 4, while the material of the conventional organic layer is an organic material whose main chain molecular structure is silicon, as shown in fig. 5, the organic material whose main chain molecular structure is a benzene ring is more easily corroded by oxygen in the subsequent corrosion treatment process, so that the required surface topography of the organic layer 203 can be obtained.
In an alternative embodiment of the present invention, the display panel 100 further includes a non-display area 30, and the display area further includes an active display area 20, as shown in fig. 6, before step 220, further includes: forming a buffer film on the display area and the non-display area of the display panel; patterning the buffer film to form buffer layers in the effective display area and the non-display area, and removing the buffer film in the shading area; and forming an electrode connection layer on the buffer layer of the effective display region.
In the embodiment of the present invention, a buffer film is formed on the display region and the non-display region 30 of the display panel 100, the buffer film may be silicon nitride, silicon oxide or a combination of silicon nitride and silicon oxide, a first photoresist is formed on the buffer film, the first photoresist is exposed and developed, the buffer film which is not covered by the first photoresist after development is etched, so that the buffer film of the light-shielding region 10 is etched, and a buffer layer 201 is formed on the effective display region 20 and the non-display region 30, since the light-shielding region 10 is disposed around the through hole region, the through hole region is used for mounting a functional device, the film structure of the through hole region is to be cut off, and if the buffer film of the light-shielding region 10 is not etched, a crack may be generated due to a stress when the film structure of the through hole region is cut off.
After the buffer layer 201 is formed, a first metal film is formed on the buffer layer 201, a second photoresist is formed on the metal film, the second photoresist is exposed and developed, the first metal film which is not covered by the second photoresist after the development is etched to form an electrode connection layer 202, and then the second photoresist remaining on the electrode connection layer 202 is removed, as shown in fig. 7, the electrode connection layer 202 is only located in the effective display area 20, wherein the first metal film is made of Ti/Al/Ti, and the electrode connection layer 202 is used for connecting with a subsequently formed electrode layer to transmit an electrical signal.
In an alternative embodiment of the present invention, step 220 may specifically include sub-step S2201 and sub-step S2202:
a substep S2201 of forming an organic thin film covering the buffer layer, the electrode connection layer, and the display panel in the light-shielding region;
a substep S2202 of performing patterning processing on the organic thin film to form organic layers located in the effective display region, the non-display region, and the light-shielding region; the organic thin film in the pixel region in the effective display region is removed, a first contact hole penetrating through the organic layer is formed in the effective display region, and a second contact hole penetrating through the organic layer is formed in the non-display region.
In the embodiment of the present invention, after the electrode connection layer 202 is formed on the buffer layer 201 of the effective display area 20, the organic thin film covering the buffer layer 201, the electrode connection layer 202, and the display panel 100 located in the light-shielding area 10 is formed, the organic thin film is exposed and developed, and the organic thin film in the pixel area in the effective display area 20 is removed by the development to form the organic layer 203 in the effective display area 20, the non-display area 30, and the light-shielding area 10, as shown in fig. 8, and the first contact hole 2032 penetrating the organic layer 203 is formed in the effective display area 20 and the second contact hole 2033 penetrating the organic layer 203 is formed in the non-display area 30. The first contact hole 2032 may be used for connecting the electrode connection layer 202 with a subsequently formed electrode layer, and the second contact hole 2033 may be used for connecting a subsequently formed signal transmission electrode with the display panel 100.
In the embodiment of the invention, after the organic layer 203 is formed in the effective display area 20, the non-display area 30 and the light shielding area 10, the organic layer 203 is etched to form a plurality of concave structures 2031 on the surface of the organic layer 203 away from the display panel 100.
In this embodiment of the present invention, step 230 may specifically include: etching the buffer layer at the position of the second contact hole to form a third contact hole penetrating through the buffer layer, and enabling the surface of the organic layer far away from the display panel to be provided with a plurality of concave structures, wherein the concave structures are positioned in the effective display area, the isolation area and the non-display area; wherein an orthographic projection of the second contact hole on the display panel is at least partially overlapped with an orthographic projection of the third contact hole on the display panel.
In the embodiment of the present invention, the non-display region 30 has the second contact hole 2033 penetrating through the organic layer 203, and since the organic layer 203 in the non-display region 30 is located on the buffer layer 201, the second contact hole 2033 is also located on the buffer layer 201, the buffer layer 201 at the location of the second contact hole 2033 is etched to form a third contact hole penetrating through the buffer layer 201, as shown in fig. 9, while the buffer layer 201 is etched to form the third contact hole, the surface of the organic layer 203 far away from the display panel 100 is etched into a plurality of concave structures 2031, the concave structures 2031 are located in the effective display region 20, the light-shielding region 10 and the non-display region 30, and the concave structures 2031 located in the light-shielding region 10 can make the light-shielding layer formed thereon subsequently present an uneven surface, so as to achieve absorption of light incident thereon.
Here, an orthographic projection of the second contact hole 2033 on the display panel 100 and an orthographic projection of the third contact hole on the display panel 100 are at least partially overlapped, so that a subsequently formed signal transmission electrode can be connected to the display panel 100 through the second contact hole 2033 and the third contact hole.
Further, the buffer layer 201 at the position of the second contact hole 2033 is etched by using a dry etching process, wherein etching gases used by the dry etching process include oxygen and carbon tetrafluoride. Therefore, the principle of forming the concave structure on the surface of the organic layer 203 is as follows: since the organic layer 203 formed by the organic material having the main chain molecular structure of a benzene ring is easily corroded by oxygen, when the buffer layer 201 at the position of the second contact hole 2033 is dry-etched to form a third contact hole, the etching gas contacts the surface of the organic layer 203 far from the display panel 100, the oxygen in the etching gas corrodes the surface of the organic layer 203, and thus a plurality of concave structures 2031 appears on the surface of the organic layer 203.
And step 240, forming a touch electrode film on the organic layer.
In the embodiment of the present invention, after the recess structure 2031 is formed on the surface of the organic layer 203, the touch electrode film 2040 is deposited on the organic layer 203, and the touch electrode film 2040 is located in the light shielding region 10, the effective display region 20 and the non-display region 30, as shown in fig. 10, since the organic layer 203 includes the first contact hole 2032 and the second contact hole 2033, and the orthogonal projection of the second contact hole 2033 and the third contact hole in the buffer layer 201 on the display panel 100 at least partially coincide with each other, after the touch electrode film 2040 is deposited on the surface of the organic layer 203, the touch electrode film 2040 will contact the electrode connecting layer 202 through the first contact hole 2032, the touch electrode film 2040 will contact the display panel 100 through the second contact hole 2033 and the third contact hole, and since the organic film in the pixel region in the effective display region 20 has been removed, the touch electrode film 2040 located in the pixel region will also contact the buffer layer 201, the touch electrode film 2040 is made of Ti/Al/Ti.
In the embodiment of the invention, after the touch electrode thin film 2040 is formed, the touch electrode thin film 2040 is patterned to form the light-shielding layer 207 in the recess structure 2031 in the light-shielding region 10, as shown in fig. 3 and 11.
In the embodiment of the present invention, the touch electrode film 2040 is further located on the organic layer 203 of the effective display area 20, and the step 250 specifically includes: patterning the touch electrode thin films positioned in the effective display area and the shading area to form an electrode layer and a reflection reducing layer in the effective display area and form a shading layer in the recessed structure of the shading area; wherein orthographic projections of the electrode layer and the reflection reducing layer on the display panel are not overlapped, and the reflection reducing layer is the residual touch electrode thin film in the concave structure of the effective display area after the patterning treatment; the electrode layer is connected with the electrode connecting layer through the first contact hole, and the electrode layer is connected with the display panel through the second contact hole and the third contact hole.
Specifically, a third photoresist is formed on the touch electrode thin film 2040, and the third photoresist is exposed and developed, the touch electrode film 2040 which is not covered by the third photoresist after development is etched, since the touch electrode film 2040 is formed on the organic layer 203 having the recess structure 2031, after etching the touch electrode thin film 2040 uncovered by the third photoresist after development, a touch electrode thin film material remains in the recess structure 2031, the touch electrode thin film 2040 remaining in the recess structure 2031 of the light-shielding region 10 forms a light-shielding layer 207, after the touch electrode film 2040 is etched in the effective display area 20, the touch electrode film covered by the third photoresist forms an electrode layer 204, the touch electrode film 2040 except the electrode layer 204 on the organic layer 203 in the effective display area 20 is etched to form the antireflection layer 205, as shown in fig. 11.
Further, the touch electrode film 2040 is also located in the non-display area 30, the anti-reflection layer 205 and the signal transmission electrode 208 are formed after the touch electrode film 2040 in the non-display area 30 is etched, and finally, the third photoresist remaining on the electrode layer 204 and the signal transmission electrode 208 is stripped.
Wherein, the orthographic projections of the electrode layer 204 and the reflection reducing layer 205 on the display panel 100 are not overlapped, the electrode layer 204 located in the effective display area 20 includes an emitting electrode and an induction electrode, and the reflection reducing layer 205 is a touch electrode thin film 2040 remaining in the recessed structure 2031 of the effective display area 20 after patterning processing; the electrode layer 204 located in the effective display area 20 is connected to the electrode connection layer 202 through the first contact hole 2032, the electrode layer 204 and the electrode connection layer 202 are disposed in different layers, the electrode layer 204 includes a plurality of sensing electrodes and a plurality of driving electrodes, and the sensing electrodes and the driving electrodes are disposed in the same layer and are crossed with each other, so that the driving electrodes and the sensing electrodes may not be connected to each other in the same layer, otherwise, a short circuit may occur, and therefore, the driving electrodes or the sensing electrodes need to be bridged by the electrode connection layer 202, that is, when the sensing electrodes are connected to each other in the same layer, the driving electrodes are connected to each other through the electrode connection layer 202 disposed in different layers, or, when the driving electrodes are connected to each other in the same layer, the sensing electrodes are connected to each other through the electrode connection layer 202 disposed in different layers. The signal transfer electrode 208 located in the non-display region 30 is connected to the display panel 100 through the second contact hole 2032 and the third contact hole, and is used to transfer a driving signal from a chip of the display panel 100 to the driving electrode and transfer a sensing signal from the sensing electrode to the chip of the display panel 100.
In an alternative embodiment of the present invention, since the surface of the organic layer 203 has a plurality of concave structures 2031, two adjacent concave structures 2031 are connected together by the organic layer 203, and the connection surface of the organic layer 203 connecting two adjacent concave structures 2031 is a planar structure, as shown in fig. 12.
Alternatively, the connection surface of the organic layer 203 connecting two adjacent concave structures 2031 may also be a convex surface structure.
In another alternative embodiment of the present invention, the plurality of concave structures 2031 are directly connected in series without a planar or convex connecting surface therebetween.
In the embodiment of the present invention, after the touch electrode thin film 2040 is etched, part of the material of the touch electrode thin film 2040 remains in the recessed structure 2031, and after the light enters the recessed structure 2031, the light is continuously reflected and refracted in the recessed structure 2031 and finally absorbed, and for the light shielding layer 207 formed in the light shielding region 10, when the external natural light enters the light shielding layer 207, the external natural light is absorbed by the light shielding layer 207, so that the influence of the external natural light on the functional device in the through hole region surrounded by the light shielding layer 207 can be reduced; when the transverse light in the effective display area 20 inside the display panel 100 irradiates onto the light-shielding layer 207 of the light-shielding area 10, as shown in fig. 3, the light-shielding layer 207 also absorbs the transverse light from the effective display area 20, so as to reduce the influence of the transverse light from the effective display area 20 on the functional device located in the through hole area; moreover, when the buffer layer 201 of the non-display area 30 in the display panel 100 is etched to form the third contact hole, the plurality of concave structures 2031 are formed on the surface of the organic layer 203 at the same time, and then the touch electrode thin film 2040 is etched to form the remaining touch electrode thin film 2040 in the concave structures 2031, so as to form the light shielding layer 207, and no additional process is required for forming the light shielding layer 207.
Further, for the reflection reducing layers 205 of the effective display area 20 and the non-display area 30, when the external natural light irradiates the touch display panel, the reflection reducing layers 205 of the effective display area 20 and the non-display area 30 absorb the external natural light, so that the overall reflectivity of the touch display panel can be effectively reduced.
In addition, in the embodiment of the present invention, compared to the conventional organic material having a main chain molecular structure of a benzene ring, the organic material having a main chain molecular structure of a benzene ring is more easily corroded by oxygen, and after the organic layer 203 formed by the organic material having a main chain molecular structure of a benzene ring is corroded to form the recessed structure 2031 and the light shielding layer 207 or the reflection reducing layer 205 is formed in the recessed structure 2031, it is found that the transmittance of the formed light shielding layer 207 or the reflection reducing layer 205 and the oxygen flow rate used when the buffer layer 201 is etched to form the third contact hole have a close relationship, and as the oxygen flow rate increases, the optical density value of the light shielding layer 207 or the reflection reducing layer 205 gradually increases, the light absorption capability of the light shielding layer 207 or the reflection reducing layer 205 gradually increases, and further the light transmittance of the light shielding layer 207 or the reflection reducing layer 205 becomes smaller and smaller, as shown in table 1, when the wavelength is 550nm, the oxygen flow rate used when the buffer layer 201 is etched to form the third contact hole and the light density of the light shielding The relationship between the value and the transmittance, for example, when the oxygen flow rate is 0, the optical density value of the corresponding light shielding layer 207 or antireflection layer 205 is 0.013, and at this time, the transmittance of the antireflection layer 207 or light shielding layer 205 is 94.76%, and the light absorption capability of the light shielding layer 207 or antireflection layer 205 is very weak; when the oxygen flow rate is 60, the optical density value of the corresponding light shielding layer 207 or the antireflection layer 205 is 0.12, and at this time, the transmittance of the light shielding layer 207 or the antireflection layer 205 is 74.87%, so that the light absorption capability of the light shielding layer 207 or the antireflection layer 205 is enhanced; when the oxygen flow rate is 150, the optical density value of the corresponding light shielding layer 207 or antireflection layer 205 is 0.99, and at this time, the transmittance of the light shielding layer 207 or antireflection layer 205 is 10.32%, and the light shielding layer 207 or antireflection layer 205 has strong light absorption capability.
| Flow rate of oxygen | 150 | 60 | 0 |
| Optical Density (@550nm) | 0.99 | 0.12 | 0.013 |
| Average transmittance | 10.32％ | 74.87％ | 94.76％ |
In another optional embodiment of the present invention, after step 205, further comprising: and forming a flat layer covering the electrode layer, the light-shielding layer, the antireflection layer and the buffer layer.
In the embodiment of the present invention, after the touch electrode thin film 2040 is patterned, a planarization layer 206 is formed, as shown in fig. 13, the planarization layer 206 covers the electrode layer 204, the light shielding layer 207, the reflection reducing layer 205, and the buffer layer 201, the planarization layer 206 is made of an organic material, for example, a resin material, and the planarization layer 206 is used for planarizing the film structure located below the planarization layer.
In the embodiment of the invention, the organic layer in the shading area of the display panel is subjected to corrosion treatment, so that the surface of the organic layer, which is far away from the display panel, is provided with a plurality of concave structures, then the touch electrode film on the organic layer is subjected to patterning treatment, so that the touch electrode film is remained in the concave structures to form the shading layer, and when light inside the display panel irradiates on the shading layer in the concave structures, the light is continuously reflected and refracted in the concave structures with the shading layer and is finally absorbed, so that the light irradiating the periphery of the through hole area inside the display panel can be absorbed, further stray light in the through hole area can be reduced, and the light emitting effect of a functional device positioned in the through hole area can be improved; and the shading layer positioned in the concave structure can also absorb external natural light, so that the influence of the external natural light on the through hole area is reduced.
Example two
An embodiment of the present invention provides a touch display panel, including:
a display panel 100, the display panel 100 including a display area including a through hole region and a light-shielding region 10 surrounding the through hole region;
an organic layer 203 disposed on the light-shielding region 10 of the display panel 100, wherein the organic layer 203 has a plurality of recessed structures 2031 on a surface away from the display panel 100;
a light-shielding layer 207 disposed within the recessed structure 2031;
the light-shielding layer 207 is a touch electrode thin film, the touch electrode thin film is made of Ti/Al/Ti, and the organic layer 203 is made of an organic material having a main chain molecular structure of a benzene ring.
Specifically, the light-shielding layer 207 is a touch electrode film remaining in the recess structure 2031 after patterning the touch electrode film 2040 formed on the organic layer 203.
In addition, the display panel 100 includes a substrate 101, a PI Film (Polyimide Film) 102, a blocking layer 103, an interlayer dielectric layer 104, a source/drain electrode layer 105, a planarization layer 106, an anode 107, a pixel defining layer 108, an organic functional layer 109, and an encapsulation layer 110, which are sequentially formed on the substrate 101, wherein an active layer and a gate electrode located on the active layer are further included between the blocking layer 103 and the interlayer dielectric layer 104.
In the embodiment of the present invention, the display panel 100 further includes a non-display area 30, the display area further includes an effective display area 20, and the touch display panel further includes:
a buffer layer 201 disposed on the effective display region 20 and the non-display region 30 of the display panel 100;
an electrode connection layer 202 disposed on the buffer layer 201 of the effective display area 20.
Wherein, the organic layer 203 is also positioned in the effective display region 20 and the non-display region 30, and covers the buffer layer 201 and the electrode connection layer 202;
the organic layer 203 of the effective display area 20 and the non-display area 30 has a plurality of concave structures 2031 on a surface away from the display panel 100.
Further, the touch display panel further includes:
an electrode layer 204 and a reflection reducing layer 205 provided in the effective display region 20;
wherein, the orthographic projections of the electrode layer 204 and the reflection reducing layer 205 on the display panel 100 are not overlapped, and the reflection reducing layer 205 is a touch electrode film 2040 in the recess structure 2031 of the effective display area 20; the electrode layer 204 is connected to the electrode connection layer 202 through a first contact hole 2032 penetrating the organic layer 203; in the non-display region 30, the electrode layer 204 is connected to the display panel 100 through a second contact hole 2033 penetrating the organic layer 203 and a third contact hole penetrating the buffer layer 201, an orthogonal projection of the second contact hole 2033 on the display panel 100 and an orthogonal projection of the third contact hole on the display panel 100 at least partially overlap, and the material of the electrode layer is Ti/Al/Ti.
Specifically, the plurality of concave structures 2031 are formed when etching the buffer layer 201 at the position of the second contact hole 2033 in the non-display area 30, two adjacent concave structures 2031 are connected together by the organic layer 203, and the connection surface of the organic layer 203 connecting the two adjacent concave structures 2031 is a planar structure or a convex structure.
Alternatively, the plurality of concave structures 2031 may be directly connected in sequence without a connecting surface of a planar structure or a convex structure therebetween.
In addition, the touch display panel further includes:
a planarization layer 206 covering the electrode layer 204, the light-shielding layer 207, the antireflection layer 205, and the buffer layer 201.
The touch display panel in the embodiment of the invention is manufactured by the manufacturing method of the touch display panel in the first embodiment.
The embodiment of the invention also provides a display device which comprises the touch display panel.
In the embodiment of the invention, the organic layer in the shading area of the display panel is subjected to corrosion treatment, so that the surface of the organic layer, which is far away from the display panel, is provided with a plurality of concave structures, then the touch electrode film on the organic layer is subjected to patterning treatment, so that the touch electrode film is remained in the concave structures to form the shading layer, and when light inside the display panel irradiates on the shading layer in the concave structures, the light is continuously reflected and refracted in the concave structures with the shading layer and is finally absorbed, so that the light irradiating the periphery of the through hole area inside the display panel can be absorbed, further stray light in the through hole area can be reduced, and the light emitting effect of a functional device positioned in the through hole area can be improved; and the shading layer positioned in the concave structure can also absorb external natural light, so that the influence of the external natural light on the through hole area is reduced.
While, for purposes of simplicity of explanation, the foregoing method embodiments have been described as a series of acts or combination of acts, it will be appreciated by those skilled in the art that the present invention is not limited by the illustrated ordering of acts, as some steps may occur in other orders or concurrently with other steps in accordance with the invention. Further, those skilled in the art should also appreciate that the embodiments described in the specification are preferred embodiments and that the acts and modules referred to are not necessarily required by the invention.
The embodiments in the present specification are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other.
Finally, it should also be noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises the element.
The above detailed description is made on the manufacturing method of the touch display panel, the touch display panel and the display device provided by the invention, and a specific example is applied in the text to explain the principle and the implementation of the invention, and the description of the above embodiment is only used to help understanding the method and the core idea of the invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present invention.
Claims (14)
1. A manufacturing method of a touch display panel is characterized by comprising the following steps:
providing a display panel, wherein the display panel comprises a display area, and the display area comprises a through hole area and a light shielding area surrounding the through hole area;
forming an organic layer on the light-shielding region of the display panel;
carrying out corrosion treatment on the organic layer, so that the surface of the organic layer, which is far away from the display panel, is provided with a plurality of concave structures;
forming a touch electrode film on the organic layer;
patterning the touch electrode film to form a light shielding layer in the recessed structure;
and the light shielding layer is the residual touch electrode thin film in the concave structure after the patterning treatment.
2. The method according to claim 1, wherein the material of the organic layer is an organic material having a benzene ring as a main chain molecular structure.
3. The method of claim 1, wherein the display panel further comprises a non-display area, wherein the display area further comprises an effective display area, and wherein before the step of forming the organic layer on the light-shielding area of the display panel, further comprising:
forming a buffer film on the display area and the non-display area of the display panel;
patterning the buffer film to form buffer layers in the effective display area and the non-display area, and removing the buffer film in the shading area;
and forming an electrode connection layer on the buffer layer of the effective display region.
4. The method of claim 3, wherein the step of forming an organic layer on the light-shielding region of the display panel comprises:
forming an organic thin film covering the buffer layer, the electrode connection layer, and the display panel in the light-shielding region;
patterning the organic thin film to form organic layers in the effective display area, the non-display area and the light shielding area;
the organic thin film in the pixel region in the effective display region is removed, a first contact hole penetrating through the organic layer is formed in the effective display region, and a second contact hole penetrating through the organic layer is formed in the non-display region.
5. The method according to claim 4, wherein the step of performing the etching process on the organic layer so that the surface of the organic layer away from the display panel has a plurality of concave structures comprises:
etching the buffer layer at the position of the second contact hole to form a third contact hole penetrating through the buffer layer, and enabling the surface of the organic layer far away from the display panel to be provided with a plurality of concave structures, wherein the concave structures are positioned in the effective display area, the isolation area and the non-display area;
wherein an orthographic projection of the second contact hole on the display panel is at least partially overlapped with an orthographic projection of the third contact hole on the display panel.
6. The method as claimed in claim 5, wherein the buffer layer at the position of the second contact hole is etched by a dry etching process using an etching gas including oxygen and carbon tetrafluoride.
7. The method of claim 5, wherein the touch electrode film is further located on the organic layer of the active display area, and the step of patterning the touch electrode film to form a light shielding layer in the recessed structure comprises:
patterning the touch electrode thin films positioned in the effective display area and the shading area to form an electrode layer and a reflection reducing layer in the effective display area and form a shading layer in the recessed structure of the shading area;
wherein orthographic projections of the electrode layer and the reflection reducing layer on the display panel are not overlapped, and the reflection reducing layer is the residual touch electrode thin film in the concave structure of the effective display area after the patterning treatment; the electrode layer is connected with the electrode connecting layer through the first contact hole, and the electrode layer is connected with the display panel through the second contact hole and the third contact hole.
8. The method as claimed in claim 7, wherein after the step of patterning the touch electrode thin film to form a light shielding layer in the recess structure, the method further comprises:
forming a flat layer covering the electrode layer, the light-shielding layer, the antireflection layer, and the buffer layer.
9. A touch display panel, comprising:
a display panel including a display area including a through hole region and a light blocking region surrounding the through hole region;
the organic layer is arranged on the light shielding area of the display panel and provided with a plurality of concave structures on the surface far away from the display panel;
a light shielding layer disposed within the recessed structure;
the shading layer is a touch electrode film.
10. The touch display panel of claim 9, wherein the display panel further comprises a non-display area, wherein the display area further comprises an active display area, and wherein the touch display panel further comprises:
a buffer layer disposed on the effective display region and the non-display region of the display panel;
an electrode connection layer disposed on the buffer layer of the effective display region.
11. The touch display panel according to claim 10, wherein the organic layer is further located in the active display region and the non-display region, and covers the buffer layer and the electrode connection layer;
wherein the organic layer of the effective display area and the non-display area has a plurality of concave structures on the surface far away from the display panel.
12. The touch display panel according to claim 11, further comprising:
the electrode layer and the antireflection layer are arranged in the effective display area;
the electrode layer and the reflection reducing layer are not overlapped in orthographic projection on the display panel, and the reflection reducing layer is a touch electrode film in a concave structure of the effective display area; the electrode layer is connected with the electrode connecting layer through a first contact hole penetrating through the organic layer; in the non-display area, the electrode layer is connected with the display panel through a second contact hole penetrating through the organic layer and a third contact hole penetrating through the buffer layer, and the orthographic projection of the second contact hole on the display panel is at least partially overlapped with the orthographic projection of the third contact hole on the display panel.
13. The touch display panel according to claim 12, further comprising:
a flat layer covering the electrode layer, the light-shielding layer, the antireflection layer, and the buffer layer.
14. A display device comprising the touch display panel according to any one of claims 9 to 13.
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