CN111679559A - UVLED light source of high-light-intensity table-board parallel exposure machine - Google Patents

UVLED light source of high-light-intensity table-board parallel exposure machine Download PDF

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Publication number
CN111679559A
CN111679559A CN202010588918.8A CN202010588918A CN111679559A CN 111679559 A CN111679559 A CN 111679559A CN 202010588918 A CN202010588918 A CN 202010588918A CN 111679559 A CN111679559 A CN 111679559A
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CN
China
Prior art keywords
light source
exposure machine
movable
adjusting bolt
frame structure
Prior art date
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Pending
Application number
CN202010588918.8A
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Chinese (zh)
Inventor
陈建军
尹韶云
江海波
谭军
黄小祥
朱凯
顾海霞
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ZHANGJIAGANG QIDIAN OPTOELECTRONIC TECHNOLOGY Co.,Ltd.
Chongqing Institute of Green and Intelligent Technology of CAS
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Zhangjiagang Qidian Optoelectronic Technology Co ltd
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Publication date
Application filed by Zhangjiagang Qidian Optoelectronic Technology Co ltd filed Critical Zhangjiagang Qidian Optoelectronic Technology Co ltd
Priority to CN202010588918.8A priority Critical patent/CN111679559A/en
Publication of CN111679559A publication Critical patent/CN111679559A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention discloses a high-light-intensity parallel exposure machine UVLED light source which comprises an exposure machine body, a connecting steel rod, an adjusting plate, a first adjusting bolt, a fly-eye lens, an adjustable frame structure, a reflector module and an adjustable irradiation frame structure, wherein the connecting steel rod is respectively installed on the periphery of the outer side of the adjusting plate through bolts, and the bolts are installed on the left lower portion of the inner wall of the exposure machine body. The invention has the beneficial effects that: through the arrangement of the adjustable irradiation frame structure, the UVLED light source module replaces the traditional mercury lamp light source in the exposure process, so that the power is greatly reduced, and the energy consumption is saved to a great extent; meanwhile, the lamp has longer service life and is more environment-friendly, and the UVLED light source module (86) has no infrared rays compared with the traditional mercury lamp light source, so that the film expansion and shrinkage are avoided; compared with the traditional mercury lamp, the UVLED light source has no risk of explosion of the mercury lamp and is safer.

Description

UVLED light source of high-light-intensity table-board parallel exposure machine
Technical Field
The invention belongs to the technical field of PCB circuit manufacturing processes, and particularly relates to a UVLED light source of a high-light-intensity parallel exposure machine with a table top.
Background
In the circuit manufacturing process of the PCB, an important link is to utilize an optical exposure method to carry out image transfer between a film and a printed board, an exposure machine is a key device for realizing the image transfer, the quality, the precision and other problems of the printed board depend on the exposure quality to a great extent, the parallelism and the energy uniformity of ultraviolet rays determine the exposure quality of a system in an effective exposure area of an illuminated table, the exposure light source form of the exposure machine is divided into scattered light and parallel light, in fact, a complete ideal parallel light exposure machine does not exist, but the performance of the exposure machine is often determined by the incident angle and the scattering angle of the light source of the exposure machine. The definition of a common parallel light exposure machine is that the angle between an incident angle and a scattering angle is less than or equal to 3 degrees, the light source of the parallel light exposure machine on the current market mainly comprises a short-arc xenon mercury lamp and a UVLED integrated lamp cap, in order to achieve the purpose of parallel light, the optical system of the parallel light exposure machine mainly comprises a light source (a high-pressure spherical mercury lamp), an ellipsoidal light collector, a plane reflector, a compound eye lens group and a spherical collimating reflector, light emitted by the light source is focused by the ellipsoidal light collector, reflected to the compound eye lens group through the plane reflector to reach the position of the reflector, and finally collimated and reflected to a illuminated table top by the spherical reflector to expose a PCB.
The existing exposure machine light source also has the problems of higher power, increased energy consumption, infrared ray and film expansion and contraction.
Therefore, it is necessary to provide a UVLED light source for a high-light-intensity parallel exposure machine.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: the utility model provides a parallel exposure machine UVLED light source of high light intensity mesa to solve current exposure machine light source power great and increased the power consumption, have the problem of infrared ray and film breathing.
In order to solve the technical problems, the invention adopts the technical scheme that: a UVLED light source of a high-light-intensity parallel table-board exposure machine comprises an exposure machine body, a connecting steel rod, an adjusting plate, a first adjusting bolt, a fly-eye lens, an adjustable frame structure, a reflector module and an adjustable irradiation frame structure, wherein the connecting steel rod is respectively installed on the periphery of the outer side of the adjusting plate through bolts, and the bolts are installed on the lower left portion of the inner wall of the exposure machine body; the first adjusting bolt penetrates through the adjusting plate and is in threaded connection with the fly-eye lens; the adjustable frame structure is arranged at the right upper side in the exposure machine body, and the lower part of the adjustable frame structure is provided with a reflector module; the adjustable irradiation frame structure is arranged at the right lower side in the exposure machine body; the adjustable irradiation frame structure comprises a supporting plate frame, a fastening nut, a screw rod, a movable plate frame structure, a supporting plate and a UVLED light source module, wherein the supporting plate frame is integrally arranged at the right lower side inside the exposure machine body; the fastening nut is in threaded connection with the outer wall of the screw rod; the screw rods are arranged at the lower part of the movable plate frame structure and are respectively inserted into the left side and the right side above the inner part of the supporting plate frame; the support plate is arranged on the upper part of the movable plate frame structure.
Preferably, the movable plate frame structure comprises a connecting plate, a movable cross rod, a first movable block, a second adjusting bolt and a third adjusting bolt, wherein the connecting plate is integrally arranged on the left side and the right side of the lower part of the supporting plate respectively; the movable cross rods are respectively welded at the front part and the rear part between the connecting plates; the first movable block and the second movable block are respectively sleeved on the movable cross rod, and the lower sides of the interiors of the first movable block and the second movable block are inserted with screws; and the second adjusting bolt and the third adjusting bolt are respectively in threaded connection with the upper side and the lower side inside the first movable block and the second movable block.
Preferably, the adjustable frame structure comprises an assembly ring, a sleeve pipe, a telescopic rod, a fourth adjusting bolt, a movable inclined seat and a fifth adjusting bolt, wherein the assembly ring is welded on the upper part of the outer wall of the sleeve pipe, and the bolt is arranged on the right upper part of the inner wall of the exposure machine body; one end of the telescopic rod is welded with a movable inclined seat, and the other end of the telescopic rod is inserted into the sleeve pipe; the fourth adjusting bolt is in threaded connection with the sleeve pipe; a reflector module is inserted in the movable inclined seat; and the fifth adjusting bolt penetrates through the movable inclined seat and is in threaded connection with the reflector module.
Preferably, the UVLED light source module is disposed inside the exposure machine body and corresponds to the reflector module.
Preferably, the support plate frame be U type steel sheet, and be provided with the through-hole around inside, be convenient for cooperate the screw rod to alternate to it is fixed through fastening nut.
Preferably, the upper surface of the support plate is bolted with a UVLED light source module.
Preferably, the movable cross rod is matched with the first movable block and the second movable block.
Preferably, the lower sides of the inner parts of the first movable block and the second movable block are provided with grooves which are respectively connected with the screw rods.
Preferably, the second adjusting bolt and the third adjusting bolt are respectively connected with the screw rod and the movable cross rod.
Preferably, a fourth adjusting bolt is arranged at the joint of the sleeve pipe and the telescopic rod and is fixed through the fourth adjusting bolt.
Preferably, the movable inclined seat is U-shaped, and the reflector module in the movable inclined seat is fixed through a fifth adjusting bolt.
Compared with the prior art, the invention has the beneficial effects that:
1. in the invention, the UVLED light source module is arranged in the exposure machine body and corresponds to the reflector module, and in the exposure process, the UVLED light source module replaces the traditional mercury lamp light source, so that the power is greatly reduced, and the energy consumption is greatly saved; meanwhile, the UVLED light source module has longer service life and is more environment-friendly, and compared with the traditional mercury lamp light source, the UVLED light source module does not have infrared rays, so that the film expansion and shrinkage are avoided; compared with the traditional mercury lamp, the UVLED light source has no risk of explosion of the mercury lamp and is safer.
2. According to the invention, the support plate frame is a U-shaped steel plate, through holes are formed in the periphery of the support plate frame, the support plate frame can be conveniently inserted in a screw rod and fixed through the fastening nut, the support plate frame can be conveniently matched with the UVLED light source module to perform lifting and adjusting work, and meanwhile, the support plate frame is convenient to use.
3. In the invention, the UVLED light source module is installed on the upper surface of the supporting plate through the bolts, and compared with the traditional mercury lamp light source, the UVLED light source module is small in structure, simpler to install and debug, and can be better matched with the existing machine for transformation and use.
4. In the invention, the movable cross rod is matched with the first movable block and the second movable block, so that the movable cross rod is convenient to be matched with the supporting plate on the movable cross rod to move left and right and is adjusted and used along with the supporting plate, and the adjusting range and the adjusting effect are further increased.
5. In the invention, the lower sides of the inner parts of the first movable block and the second movable block are provided with grooves which are respectively connected with the screw rods, and when the screw rods at different positions are used for adjusting the height, the functions of adjusting the inclination angle can be realized by matching the first movable block and the second movable block.
6. In the invention, the second adjusting bolt and the third adjusting bolt are respectively connected with the screw rod and the movable cross rod, and after adjustment is completed, the second adjusting bolt and the third adjusting bolt are better fixed and used along with the screw rod and the movable cross rod.
7. In the invention, the joint of the sleeve pipe and the telescopic rod is provided with the fourth adjusting bolt which is fixed through the fourth adjusting bolt, so that the height and the rotating angle of the sleeve pipe can be conveniently adjusted, and the sleeve pipe and the telescopic rod are matched with the reflector module to be used at different positions.
8. In the invention, the movable inclined seat is U-shaped, and the reflector module in the movable inclined seat is fixed by a fifth adjusting bolt, so that the inclination angle of the reflector module can be adjusted for use.
Drawings
Fig. 1 is a schematic structural view of the present invention.
FIG. 2 is a schematic structural view of an adjustable illumination stand configuration of the present invention.
Fig. 3 is a schematic structural view of the movable ledge structure of the present invention.
FIG. 4 is a schematic structural view of an adjustable shelf structure of the present invention.
In fig. 1 to 4:
1. an exposure machine body; 2. connecting a steel rod; 3. an adjusting plate; 4. a first adjusting bolt; 5. a fly-eye lens; 6. an adjustable frame structure; 61. assembling a ring; 62. sleeving a pipe; 63. a telescopic rod; 64. a fourth adjusting bolt; 65. a movable inclined seat; 66. a fifth adjusting bolt; 7. a mirror module; 8. the structure of the irradiation frame can be adjusted; 81. a support plate frame; 82. fastening a nut; 83. a screw; 84. a movable plate frame structure; 841. a connecting plate; 842. a movable cross bar; 843. a first movable block; 844. a second movable block; 845. a second adjusting bolt; 846. a third adjusting bolt; 85. a support plate; 86. UVLED light source module.
Detailed Description
The invention is further described below with reference to the accompanying drawings:
as shown in fig. 1 and 2, the UVLED light source of the high-light-intensity parallel table-board exposure machine according to the present invention includes an exposure machine body 1, a connecting steel rod 2, an adjusting plate 3, a first adjusting bolt 4, a fly-eye lens 5, an adjustable frame structure 6, a reflector module 7 and an adjustable illumination frame structure 8, wherein the connecting steel rod 2 is respectively bolted around the outer side of the adjusting plate 3, and the bolts are mounted at the lower left portion of the inner wall of the exposure machine body 1; the first adjusting bolt 4 penetrates through the adjusting plate 3 and is in threaded connection with the fly-eye lens 5; the adjustable frame structure 6 is arranged at the right upper side in the exposure machine body 1, and the lower part of the adjustable frame structure is provided with a reflector module 7; the adjustable irradiation frame structure 8 is arranged at the right lower side inside the exposure machine body 1; the adjustable irradiation frame structure 8 comprises a supporting plate frame 81, a fastening nut 82, a screw 83, a movable plate frame structure 84, a supporting plate 85 and a UVLED light source module 86, wherein the supporting plate frame 81 is integrally arranged at the right lower side inside the exposure machine body 1; the fastening nut 82 is in threaded connection with the outer wall of the screw 83; the screw rods 83 are installed at the lower part of the movable plate frame structure 84 and are respectively inserted into the left side and the right side above the inside of the supporting plate frame 81; the support plate 85 is mounted on top of the movable ledge structure 84.
As shown in fig. 3, in the above embodiment, specifically, the movable plate frame structure 84 includes a connecting plate 841, a movable cross bar 842, a first movable block 843, a second movable block 844, a second adjusting bolt 845 and a third adjusting bolt 846, and the connecting plate 841 is integrally disposed at the left and right sides of the lower portion of the supporting plate 85; the movable cross bar 842 is respectively welded at the front part and the rear part between the connecting plate 841 and the connecting plate 841; the first moving block 843 and the second moving block 844 are respectively sleeved on the moving cross bar 842, and the screw 83 is inserted into the lower sides of the first moving block 843 and the second moving block 844; the second adjusting bolt 845 and the third adjusting bolt 846 are respectively in threaded connection with the upper side and the lower side of the inner parts of the first movable block 843 and the second movable block 844.
As shown in fig. 4, in the above embodiment, specifically, the adjustable frame structure 6 includes an assembly ring 61, a sleeve 62, an expansion link 63, a fourth adjusting bolt 64, a movable tilting seat 65 and a fifth adjusting bolt 66, the assembly ring 61 is welded on the upper portion of the outer wall of the sleeve 62, and is bolted on the upper right portion of the inner wall of the exposure machine body 1; one end of the telescopic rod 63 is welded with a movable inclined seat 65, and the other end of the telescopic rod is inserted in the sleeve pipe 62; the fourth adjusting bolt 64 is in threaded connection with the sleeve pipe 62; the reflector module 7 is inserted in the movable inclined seat 65; the fifth adjusting bolt 66 passes through the movable inclined seat 65 and is in threaded connection with the reflector module 7.
In the above embodiment, specifically, the UVLED light source module 86 is disposed inside the exposure machine body 1 and corresponds to the reflector module 7, and during the exposure process, the UVLED light source module 86 replaces a conventional mercury lamp light source, which is beneficial to greatly reducing power and saving energy consumption to a great extent; meanwhile, the lamp has longer service life and is more environment-friendly, and the UVLED light source module 86 has no infrared rays compared with the traditional mercury lamp light source, so that the film expansion and shrinkage are avoided; compared with the traditional mercury lamp, the UVLED light source has no risk of explosion of the mercury lamp and is safer.
In the above embodiment, it is concrete, supporting plate frame 81 set up to U shaped steel board, and inside be provided with the through-hole all around, the cooperation screw rod 83 of being convenient for alternates to it is fixed through fastening nut 82, and then the cooperation UVLED light source module 86 of being convenient for goes up and down and the work of adjusting, also is convenient for use simultaneously.
In the above embodiment, specifically, the UVLED light source module 86 is installed on the support plate 85 through the bolts, and compared with a traditional mercury lamp light source, the light source is small and exquisite in structure, simpler to install and debug, and capable of being better matched with an existing machine to be modified and used.
In the above embodiment, specifically, the movable cross bar 842 is matched with the first movable block 843 and the second movable block 844, so that the movable cross bar 842 is matched with the supporting plate 85 on the movable cross bar 842 to move left and right and is adjusted accordingly for use, and the adjusting range and effect are further increased.
In the above embodiment, specifically, the joint of the sleeve 62 and the telescopic rod 63 is provided with the fourth adjusting bolt 64, and the joint is fixed by the fourth adjusting bolt 64, so that the height and the rotation angle of the joint can be conveniently adjusted, and the joint is used in different positions in cooperation with the reflector module 7.
In the above embodiment, specifically, the movable tilting base 65 is U-shaped, and the mirror module 7 inside the movable tilting base 65 is fixed by the fifth adjusting bolt 66, so that the tilting angle of the mirror module 7 can be adjusted for use.
Principle of operation
The working principle of the invention is as follows: when the device is used, the UVLED light source module 86 is driven to enable light to irradiate the reflector module 7, then the reflector module 7 reflects the light to the fly-eye lens 5, finally the fly-eye lens 5 irradiates the light to other optical systems in the exposure machine 1 for exposure, when the device is needed to be adjusted in the using process, the fly-eye lens 5 is inclined to reach a proper angle, then the first adjusting bolt 4 on the adjusting plate 3 is screwed to be fixed, then the movable telescopic rod 63 and the sleeve pipe 62 reach a proper length, the reflector module 7 is made to move up and down to a proper position and rotate to different angles, finally the fourth adjusting bolt 64 is screwed to be fixed, then the movable reflector module 7 reaches a proper angle, then the fifth adjusting bolt 66 is screwed to be fixed, finally the UVLED light source module 86 is moved, and the first movable block 843 and the second movable block 844 are made to move to a proper position on the movable cross rod 842, meanwhile, the screws 83 at different positions are lifted up and down along with the lifting and lowering of the UVLED light source module 86 to incline to a proper angle, and then the first movable block 843, the third adjusting bolt 846 and the fastening nut 82 are screwed down to be fixed, so that the adjustment and use of the fly-eye lens 5, the reflector module 7 and the UVLED light source module 86 can be completed.
The technical solutions of the present invention or similar technical solutions designed by those skilled in the art based on the teachings of the technical solutions of the present invention are all within the scope of the present invention.

Claims (10)

1. The UVLED light source is characterized by comprising an exposure machine body (1), connecting steel rods (2), an adjusting plate (3), first adjusting bolts (4), compound eye lenses (5), an adjustable frame structure (6), a reflector module (7) and an adjustable irradiation frame structure (8), wherein the connecting steel rods (2) are respectively installed on the periphery of the outer side of the adjusting plate (3) through bolts, and the bolts are installed on the lower left portion of the inner wall of the exposure machine body (1); the first adjusting bolt (4) penetrates through the adjusting plate (3) and is in threaded connection with the fly-eye lens (5); the adjustable frame structure (6) is arranged at the right upper side in the exposure machine body (1), and the lower part of the adjustable frame structure is provided with a reflector module (7); the adjustable irradiation frame structure (8) is arranged at the right lower side inside the exposure machine body (1); the adjustable irradiation frame structure (8) comprises a supporting plate frame (81), a fastening nut (82), a screw rod (83), a movable plate frame structure (84), a supporting plate (85) and a UVLED light source module (86), wherein the supporting plate frame (81) is integrally arranged at the right lower side inside the exposure machine body (1); the fastening nut (82) is in threaded connection with the outer wall of the screw rod (83); the screw rods (83) are arranged at the lower part of the movable plate frame structure (84) and are respectively inserted into the left side and the right side above the inner part of the supporting plate frame (81); the support plate (85) is arranged at the upper part of the movable plate frame structure (84).
2. The UVLED light source of high light intensity table side exposure machine as claimed in claim 1, wherein said movable grillage structure (84) comprises a connecting plate (841), a movable cross bar (842), a first movable block (843), a second movable block (844), a second adjusting bolt (845) and a third adjusting bolt (846), said connecting plate (841) is integrally installed at the left and right sides of the lower part of the supporting plate (85) respectively; the movable cross rod (842) is respectively welded at the front part and the rear part between the connecting plate (841) and the connecting plate (841); the first movable block (843) and the second movable block (844) are respectively sleeved on the movable cross rod (842), and the lower sides of the interiors of the first movable block (843) and the second movable block (844) are inserted with screw rods (83); and the second adjusting bolt (845) and the third adjusting bolt (846) are respectively in threaded connection with the upper side and the lower side of the inner parts of the first movable block (843) and the second movable block (844).
3. The UVLED light source of high light intensity table side exposure machine as claimed in claim 1, wherein said adjustable frame structure (6) comprises an assembling ring (61), a sleeve (62), a telescopic rod (63), a fourth adjusting bolt (64), a movable tilting seat (65) and a fifth adjusting bolt (66), said assembling ring (61) is welded on the upper part of the outer wall of the sleeve (62) and is bolted on the upper right part of the inner wall of the exposure machine body (1); one end of the telescopic rod (63) is welded with a movable inclined seat (65), and the other end of the telescopic rod is inserted into the sleeve pipe (62); the fourth adjusting bolt (64) is in threaded connection with the sleeve pipe (62); a reflector module (7) is inserted in the movable inclined seat (65); and the fifth adjusting bolt (66) penetrates through the movable inclined seat (65) and is in threaded connection with the reflector module (7).
4. The UVLED light source of high light intensity table side exposure machine of claim 1, wherein said UVLED light source module (86) is installed inside the exposure machine body (1) and corresponding to the reflector module (7).
5. The UVLED light source of the high light intensity table-board parallel exposure machine as claimed in claim 1, wherein said supporting plate frame (81) is made of U-shaped steel plate and has through holes on its inner periphery for the insertion of the matching screw (83) and the fixation by the fastening nut (82).
6. The high optical power table side parallelizer UVLED light source of claim 1, wherein the UVLED light source module (86) is surface bolted to the support plate (85).
7. The UVLED light source of high light intensity table side exposure machine as recited in claim 1, characterized in that said movable cross bar (842) is adapted to the first movable block (843) and the second movable block (844).
8. The UVLED light source of the high light intensity table side parallel exposure machine as claimed in claim 2, wherein the lower side of the inside of the first movable block (843) and the second movable block (844) is provided with a groove and is respectively connected with a screw rod (83).
9. The UVLED light source of high light intensity table side exposure machine as claimed in claim 3, wherein the joint of said socket tube (62) and telescopic rod (63) is equipped with a fourth adjusting bolt (64) and fixed by the fourth adjusting bolt (64).
10. A UVLED light source for a high light intensity table side exposure machine according to claim 3 characterized in that said movable tilting mount (65) is arranged in a U shape, the mirror module (7) inside said movable tilting mount (65) is fixed by a fifth adjusting bolt (66).
CN202010588918.8A 2020-06-24 2020-06-24 UVLED light source of high-light-intensity table-board parallel exposure machine Pending CN111679559A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117666298A (en) * 2024-02-01 2024-03-08 河南百合特种光学研究院有限公司 Exposure machine light source with multiple LED spherical surface spliced

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117666298A (en) * 2024-02-01 2024-03-08 河南百合特种光学研究院有限公司 Exposure machine light source with multiple LED spherical surface spliced
CN117666298B (en) * 2024-02-01 2024-05-17 河南百合特种光学研究院有限公司 Exposure machine light source with multiple LED spherical surface spliced

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