CN111668137A - Pipeline pressure detection and adjustment device and method for high aspect ratio process - Google Patents
Pipeline pressure detection and adjustment device and method for high aspect ratio process Download PDFInfo
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- CN111668137A CN111668137A CN202010475563.1A CN202010475563A CN111668137A CN 111668137 A CN111668137 A CN 111668137A CN 202010475563 A CN202010475563 A CN 202010475563A CN 111668137 A CN111668137 A CN 111668137A
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- foreline
- pressure
- mass flow
- pipeline
- reaction chamber
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- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000001514 detection method Methods 0.000 title claims abstract description 18
- 230000008569 process Effects 0.000 title claims abstract description 18
- 230000001105 regulatory effect Effects 0.000 claims description 24
- 238000002955 isolation Methods 0.000 claims description 15
- 230000001276 controlling effect Effects 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract 1
- 239000000047 product Substances 0.000 description 5
- 230000007547 defect Effects 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
- G05D16/2026—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means
Abstract
The application relates to the technical field of semiconductor integrated circuits, in particular to a pipeline pressure detection and adjustment device and a detection and adjustment method for a high aspect ratio process. The detection and regulation device comprises a foreline, and a gas inlet is arranged on the foreline; the gas flow control device comprises a control pipeline, wherein the gas inlet end of the control pipeline is connected with a gas source, and the gas outlet end of the control pipeline is connected with a gas inlet; and the mass flow controller is arranged at the gas inlet end close to the control pipeline and is used for controlling the mass flow of the gas flowing through the mass flow controller according to the pressure difference between the foreline and the reaction chamber. The method comprises the following steps: acquiring pressure information of a foreline and a reaction cavity; determining a pressure differential between the foreline and the reaction chamber; controlling the mass flow of the gas flowing through the mass flow controller; the pressure of the foreline is adjusted to control the pressure differential between the foreline and the reaction chamber. This application can prevent to discharge to foreline's reaction accessory substance to flow backward to the reaction intracavity.
Description
Technical Field
The application relates to the technical field of semiconductor integrated circuits, in particular to a pipeline pressure detection and adjustment device and a detection and adjustment method for a shallow trench isolation structure high aspect ratio process.
Background
The Shallow Trench Isolation (STI) process forms a Shallow Trench by using a silicon nitride mask and sequentially performing deposition, patterning, and etching silicon, and forms a Shallow Trench Isolation structure by filling a deposited oxide in the Shallow Trench.
With the continuous reduction of the feature size of high-density integrated circuits, it is important to perform a uniform and void-free filling deposition process on shallow trenches with high aspect ratios formed by a shallow trench isolation process. Especially after entering 65 nm technology node, STI technology is more challenging due to the higher and higher requirements for shallow trench aspect ratio.
In the related art, a shallow trench with a High Aspect Ratio (HARP) is usually filled and deposited by a High Aspect Ratio Process (High Aspect Ratio Process) to form a uniform shallow trench isolation structure without a cavity, but after an oxide is deposited by the High Aspect Ratio Process, the pressure in the reaction chamber is rapidly increased under the action of a vacuum pump, while the pressure in the foreline remains unchanged, and when the pressure in the foreline is greater than the pressure in the reaction chamber, reaction byproducts and the like discharged into the foreline flow back into the reaction chamber, so that reactants discharged from the gas discharge line flow back into the reaction chamber, thereby causing defects on the surface of a product, affecting the yield of the product, and even causing the product to be scrapped.
Disclosure of Invention
The application provides a pipeline pressure detection and adjustment device and a detection and adjustment method for a shallow trench isolation structure high aspect ratio process, which can solve the problem that in the related art, reaction byproducts discharged to a foreline flow backwards into a reaction cavity to cause defects on the surface of a product.
On the one hand, this application is used for pipeline pressure of shallow trench isolation structure high aspect ratio technology to examine and transfer device, pipeline pressure examines and transfers the device and includes:
the foreline is provided with a pressure regulating gas inlet;
the gas flow control device comprises a control pipeline, the gas inlet end of the control pipeline is connected with a gas source, and the gas outlet end of the control pipeline is connected with the pressure regulating gas inlet;
and the mass flow controller is arranged at the position close to the gas inlet end of the control pipeline and used for controlling the mass flow of the pressure regulating gas flowing through the mass flow controller according to the pressure difference between the foreline and the reaction cavity.
Optionally, a needle valve capable of adjusting the opening degree of the control pipeline is arranged at the position close to the air outlet end of the control pipeline.
Optionally, a pneumatic valve is provided on the control line.
Optionally, the gas flow control device is mounted on an outer wall of the foreline.
Optionally, the method further comprises:
a controller;
the reaction cavity pressure sensor is used for acquiring pressure information in the reaction cavity and outputting the pressure information in the reaction cavity to the controller;
a foreline pressure sensor for acquiring pressure information in a foreline and outputting the pressure information in the foreline to the controller;
the controller can judge the pressure difference between the foreline and the reaction chamber according to the pressure information in the reaction chamber and the pressure information in the foreline, and send a control signal to the mass flow controller according to the pressure difference.
Optionally, the mass flow controller can control the mass flow of the pressure-regulating gas flowing through the mass flow controller according to a control signal sent by the controller.
As a second aspect of the present application, there is provided a pipeline pressure detecting and adjusting method for a shallow trench isolation structure high aspect ratio process, where the pipeline pressure detecting and adjusting method employs the pipeline pressure detecting and adjusting device according to the first aspect of the present application, and the pipeline pressure detecting and adjusting method at least includes the following steps:
acquiring pressure information of a foreline and a reaction cavity in real time;
determining the pressure difference between the foreline and the reaction chamber according to the pressure information of the foreline and the reaction chamber;
controlling the mass flow of the pressure regulating gas flowing through the mass flow controller according to the pressure difference;
adjusting a foreline pressure until a pressure differential between the foreline and the reaction chamber reaches a predetermined threshold range.
Optionally, the predetermined threshold range is less than 0.
The technical scheme at least comprises the following advantages: the mass flow controller controls the mass flow of the pressure regulating gas according to the pressure difference between the foreline and the reaction chamber, so that the air pressure in the foreline is controlled, the pressure difference between the foreline and the reaction chamber is regulated in real time, the pressure difference between the foreline and the reaction chamber is kept in a safe range, and reaction products of the pressure regulating gas discharge pipeline are prevented from flowing backwards into the reaction chamber.
Drawings
In order to more clearly illustrate the detailed description of the present application or the technical solutions in the prior art, the drawings needed to be used in the detailed description of the present application or the prior art description will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a front view of a gas flow control device in a line pressure monitoring and conditioning apparatus for a shallow trench isolation high aspect ratio process as provided herein;
FIG. 2 is a left side view of FIG. 1;
fig. 3 is a control schematic diagram of a gas flow control device in a pipeline pressure detection and regulation device for a shallow trench isolation structure high aspect ratio process provided in the present application.
100. The foreline, 110, a regulated gas inlet, 200, a gas flow control device, 210, a control line, 220, a needle valve, 230, a pneumatic valve, 300, a mass flow controller, 410, a controller, 420, a reaction chamber pressure sensor, 430, a foreline pressure sensor.
Detailed Description
The technical solutions in the present application will be described clearly and completely with reference to the accompanying drawings, and it is obvious that the described embodiments are some, but not all embodiments of the present application. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present application. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; the connection can be mechanical connection or electrical connection; the two elements may be directly connected or indirectly connected through an intermediate medium, or may be communicated with each other inside the two elements, or may be wirelessly connected or wired connected. The specific meaning of the above terms in the present application can be understood in a specific case by those of ordinary skill in the art.
In addition, the technical features mentioned in the different embodiments of the present application described below may be combined with each other as long as they do not conflict with each other.
Referring to fig. 1 and 2, as an embodiment of the present application, there is provided a pipeline pressure detection and adjustment apparatus for a shallow trench isolation structure high aspect ratio process, including:
a foreline 100, the foreline 100 having a pressure regulating gas inlet 110.
Gas flow control device 200, gas flow control device 200 includes control circuit 210, the air supply is connected to the inlet end of control circuit 210, the end connection of giving vent to anger of control circuit 210 pressure regulating gas inlet 110 for through pressure regulating gas inlet 110 to let in the pressure regulating gas in foreline 100, the pressure regulating gas is used for adjusting atmospheric pressure in foreline 100.
A mass flow controller 300, said mass flow controller 300 being disposed proximate to the inlet end of said control line 210 for controlling the mass flow of the pressure regulating gas flowing through said mass flow controller 300 according to the pressure differential between foreline 100 and the reaction chamber.
It should be understood that the arrows in fig. 1 and 2 indicate gas flow, the arrows at the lower end of fig. 1 and 2 indicate gas flow from the gas source into the control line, and the arrows at the upper end of fig. 1 and 2 indicate gas flow from the foreline 100 into the reaction chamber.
It will be appreciated that the pressure in the foreline 100 is controlled by controlling the mass flow of the pressure regulating gas by the mass flow controller 300 in response to the pressure differential between the foreline 100 and the reaction chamber to regulate the pressure differential between the foreline 100 and the reaction chamber so that the pressure differential between the foreline 100 and the reaction chamber is maintained within safe limits.
Be close to control circuit 210 gas outlet end department is equipped with can adjust the needle valve 220 of control circuit 210 aperture, through thereby the needle valve 220 adjusts the mass flow that control circuit 210 aperture realized adjusting the pressure regulating gas and carries out further regulation to atmospheric pressure in can further control foreline 100 to adjust the pressure differential between foreline 100 and the reaction chamber, make the pressure differential between foreline 100 and the reaction chamber keep at safe scope.
A pneumatic valve 230 is provided on the control circuit 210, by means of which pneumatic valve 230 further regulation of the mass flow of the pressure regulating gas can be achieved, so that the gas pressure in the foreline 100 can be further controlled to regulate the pressure difference between the foreline 100 and the reaction chamber, so that the pressure difference between the foreline 100 and the reaction chamber is kept within a safe range.
The gas flow control apparatus 200 is mounted on an outer wall of the foreline 100.
Referring to fig. 3, the pipeline pressure detecting and adjusting apparatus for the shallow trench isolation structure high aspect ratio process further includes:
a controller 410;
the reaction chamber pressure sensor 420 is configured to obtain pressure information in the reaction chamber, and output the pressure information in the reaction chamber to the controller 410;
a foreline pressure sensor 430, the foreline pressure sensor 430 being configured to acquire pressure information in the foreline 100 and output the pressure information in the foreline 100 to the controller 410;
the controller 410, which is capable of determining a pressure difference between the foreline 100 and the reaction chamber based on the pressure information in the reaction chamber and the pressure information in the foreline 100, and transmitting a control signal to the mass flow controller 300 based on the pressure difference;
the mass flow controller 300 can control the mass flow of the pressure-regulating gas flowing through the mass flow controller 300 according to the control signal transmitted from the controller 410.
The pipeline pressure detection and adjustment method using the pipeline pressure detection and adjustment device for the shallow trench isolation structure high aspect ratio process in the embodiment at least comprises the following steps:
s1: acquiring pressure information of the foreline 100 and the reaction chamber in real time;
s2: determining the pressure difference between the foreline 100 and the reaction chamber according to the pressure information of the foreline 100 and the reaction chamber;
s3: controlling the mass flow of the pressure regulating gas flowing through the mass flow controller 300 according to the pressure difference;
s4: the foreline 100 pressure is adjusted until the pressure differential between the foreline 100 and the reaction chamber reaches a predetermined threshold range.
When the pressure difference between the foreline 100 and the reaction chamber reaches a predetermined threshold range, the pressure difference between the foreline 100 and the reaction chamber reaches a safe range, and reactants discharged from the gas discharge line cannot flow back into the reaction chamber in the safe range, so that the problem of product surface defects is avoided. In a preferred embodiment, the predetermined threshold range is less than 0, i.e., the pressure in the foreline 100 is less than the pressure in the reaction chamber, so that the exhausted reactants in the gas exhaust line do not flow back into the reaction chamber.
Embodiments of the present application control the mass flow of the pressure regulating gas via mass flow controller 300 based on the pressure differential between foreline 100 and the reaction chamber, thereby controlling the gas pressure in foreline 100 to regulate the pressure differential between foreline 100 and the reaction chamber so that the pressure differential between foreline 100 and the reaction chamber is maintained within a safe range.
It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications therefrom are within the scope of the invention.
Claims (8)
1. A pipeline pressure detection and adjustment device for a shallow trench isolation structure high aspect ratio process is characterized by comprising:
the foreline is provided with a pressure regulating gas inlet;
the gas flow control device comprises a control pipeline, the gas inlet end of the control pipeline is connected with a gas source, and the gas outlet end of the control pipeline is connected with the pressure regulating gas inlet;
and the mass flow controller is arranged at the position close to the gas inlet end of the control pipeline and used for controlling the mass flow of the pressure regulating gas flowing through the mass flow controller according to the pressure difference between the foreline and the reaction cavity.
2. The apparatus according to claim 1, wherein a needle valve is disposed near the outlet of the control pipeline for adjusting the opening of the control pipeline.
3. The apparatus of claim 1 wherein a pneumatic valve is disposed on the control line.
4. The apparatus of claim 1, wherein the gas flow control device is mounted on an outer wall of the foreline.
5. The apparatus of claim 1, further comprising:
a controller;
the reaction cavity pressure sensor is used for acquiring pressure information in the reaction cavity and outputting the pressure information in the reaction cavity to the controller;
a foreline pressure sensor for acquiring pressure information in a foreline and outputting the pressure information in the foreline to the controller;
the controller can judge the pressure difference between the foreline and the reaction chamber according to the pressure information in the reaction chamber and the pressure information in the foreline, and send a control signal to the mass flow controller according to the pressure difference.
6. The apparatus of claim 5, wherein the mass flow controller is capable of controlling the mass flow of the pressure regulating gas flowing through the mass flow controller according to a control signal sent by the controller.
7. A pipeline pressure detection and adjustment method for a shallow trench isolation structure high aspect ratio process is characterized in that the pipeline pressure detection and adjustment method adopts the pipeline pressure detection and adjustment device according to any one of claims 1-6, and the pipeline pressure detection and adjustment method at least comprises the following steps:
acquiring pressure information of a foreline and a reaction cavity in real time;
determining the pressure difference between the foreline and the reaction chamber according to the pressure information of the foreline and the reaction chamber;
controlling the mass flow of the pressure regulating gas flowing through the mass flow controller according to the pressure difference;
adjusting a foreline pressure until a pressure differential between the foreline and the reaction chamber reaches a predetermined threshold range.
8. The method of claim 7, wherein the predetermined threshold range is less than 0.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010475563.1A CN111668137A (en) | 2020-05-29 | 2020-05-29 | Pipeline pressure detection and adjustment device and method for high aspect ratio process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010475563.1A CN111668137A (en) | 2020-05-29 | 2020-05-29 | Pipeline pressure detection and adjustment device and method for high aspect ratio process |
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| CN111668137A true CN111668137A (en) | 2020-09-15 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202010475563.1A Pending CN111668137A (en) | 2020-05-29 | 2020-05-29 | Pipeline pressure detection and adjustment device and method for high aspect ratio process |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11345806A (en) * | 1998-05-29 | 1999-12-14 | Nec Yamaguchi Ltd | Atmospheric pressure chemical vapor deposition device |
| CN1794421A (en) * | 2004-12-22 | 2006-06-28 | 东京毅力科创株式会社 | Semiconductor processing apparatus and method |
| CN1898411A (en) * | 2003-12-23 | 2007-01-17 | 约翰·C·舒马赫 | Exhaust conditioning system for semiconductor reactor |
-
2020
- 2020-05-29 CN CN202010475563.1A patent/CN111668137A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11345806A (en) * | 1998-05-29 | 1999-12-14 | Nec Yamaguchi Ltd | Atmospheric pressure chemical vapor deposition device |
| CN1898411A (en) * | 2003-12-23 | 2007-01-17 | 约翰·C·舒马赫 | Exhaust conditioning system for semiconductor reactor |
| CN1794421A (en) * | 2004-12-22 | 2006-06-28 | 东京毅力科创株式会社 | Semiconductor processing apparatus and method |
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Application publication date: 20200915 |
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| RJ01 | Rejection of invention patent application after publication |