CN111649912A - Accelerated life test method for ion thruster - Google Patents
Accelerated life test method for ion thruster Download PDFInfo
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- CN111649912A CN111649912A CN202010491912.9A CN202010491912A CN111649912A CN 111649912 A CN111649912 A CN 111649912A CN 202010491912 A CN202010491912 A CN 202010491912A CN 111649912 A CN111649912 A CN 111649912A
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- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
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- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
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Abstract
The application discloses an accelerated life test method of an ion thruster, which comprises the following steps: an accelerator replacing area is arranged at the same position of each grid electrode, and grid electrode materials in the accelerator replacing area are removed to form an accelerating hole; an accelerating piece for shielding the accelerating holes is connected at each accelerating hole; punching is carried out on each accelerating element to form leading-out holes which correspond to the replacing areas of the original accelerating elements one by one; polishing and passivating the grid with the accelerator, and assembling the grid into an ion optical system with the accelerator; carrying out an accelerated life test on the ion optical system with the accelerating part, carrying out a life test on the original ion optical system without the accelerating part, and respectively obtaining corresponding sputter etching time-containing curves; determining an acceleration factor; and determining the service life of the ion optical system of the ion thruster to be tested according to the acceleration factor and the service life of the ion optical system with the acceleration piece, which is measured aiming at the ion thruster to be tested. The invention solves the problems of long duration and high cost of the whole-cycle examination of the ground service life of the ion thruster.
Description
Technical Field
The application relates to the field of aerospace electric propulsion, in particular to an acceleration life test method for an ion thruster.
Background
An ion thruster, also called an ion engine, is one of space electric propulsion technologies, and is characterized by small thrust and high specific impulse, and is widely applied to space propulsion, such as spacecraft attitude control, position maintenance, orbital maneuver, interplanetary flight and the like. The principle of the ion thruster is that gaseous working media are ionized, ions are accelerated to be sprayed out under the action of a strong electric field, and a satellite is pushed by a counterforce to perform attitude adjustment or orbit transfer tasks.
At present, ground service life tests are carried out in all countries to research the service life of the ion thruster. Except for the domestic LIPS-200 ion thrusters, the service life assessment time of the NEXT, NSTAR and XIPS series ion thrusters in the United states and the mu 10 microwave ion thrusters in Japan all reaches ten thousands of hours, and lasts for several years. With the development of deep space exploration tasks in various countries, the ion thruster can be subjected to longer ground service life assessment, and huge manpower, material resources and financial resources are consumed.
In order to solve the above problems, international preliminary research on an accelerated life test method is performed, for example, a voltage regulation method and a working medium utilization rate reduction method are used to accelerate structural failure of an ion thruster core assembly (ion optical system), however, the thickness and ion transparency of a grid sheath layer are seriously changed by changing the above working conditions, and effective acceleration of the ion optical system cannot be performed, so that a method for testing accelerated life of an ion thruster, which can effectively reduce ground life assessment time and reduce assessment cost, is urgently needed to be searched.
Disclosure of Invention
The main purpose of the present application is to provide a new method for testing the accelerated life of an ion thruster, so as to solve the problems of long examination time and high cost of the existing life test of the ion thruster.
In order to achieve the above object, the present application provides an accelerated lifetime testing method of an ion thruster, the ion thruster comprising an ion optical system, the ion optical system being composed of at least two grid electrodes, the grid electrodes having extraction holes thereon, the method comprising:
an accelerator replacing area is arranged at the same position of each grid electrode, a plurality of leading-out holes are formed in the accelerator replacing area, and grid electrode materials in the accelerator replacing area are removed to form acceleration holes;
connecting an accelerator covering the accelerating holes at each accelerating hole, wherein the sputtering yield of the accelerator material is higher than that of the grid material;
punching is carried out on each accelerating element to form leading-out holes corresponding to the replacing areas of the original accelerating elements one by one;
polishing and passivating the grid with the accelerator, and assembling the grid into an ion optical system with the accelerator;
carrying out an accelerated life test on the ion optical system with the accelerating part, carrying out a life test on the original ion optical system without the accelerating part, and respectively obtaining corresponding sputter etching time-containing curves;
determining an acceleration factor according to the sputtering etching time-containing curve;
and determining the service life of the ion optical system of the ion thruster to be tested according to the acceleration factor and the service life of the ion optical system with the acceleration piece, which is measured aiming at the ion thruster to be tested.
Further, the ion optical system is composed of an acceleration grid, a screen grid and a deceleration grid.
Further, the material of the accelerating part is oxygen-free copper or gold.
Furthermore, the diameter of the leading-out hole is 1.25-1.9 mm, and the thickness of the grid electrode is 0.4-0.5 mm.
Further, the accelerator is riveted with the grid, and the accelerator is consistent with the arc of the grid at the corresponding position.
Further, the accelerating holes are sequentially arranged in the radial direction of the grid electrode.
Further, the coaxiality form and position error of the holes in the accelerating pieces at the same position of each grid electrode is 0.01 mm.
Further, carrying out an accelerated life test on the ion optical system with the accelerating part, carrying out a life test on the original ion optical system without the accelerating part, and respectively obtaining corresponding sputter etching time-containing curves, wherein the accelerated life test comprises the following steps:
carrying out an accelerated life test of an ion optical system with an accelerating part in a vacuum chamber, and measuring the sputter etching condition of the ion optical system every 50 hours to obtain a corresponding sputter etching time-containing curve; meanwhile, a life test of the original ion optical system without the accelerator is carried out, and the sputter etching condition is measured every 50 hours to obtain a corresponding sputter etching time curve.
Further, determining an acceleration factor according to the sputter etch time-containing curve comprises:
and obtaining the corresponding relation of two curve functions according to the time curve of the ion optical system sputter etching with the accelerating part and the time curve of the original ion optical system sputter etching without the accelerating part, and obtaining the accelerating factor.
The technical scheme of the invention has the following advantages:
the ion optical system is used as a core part assembly of the ion thruster, and the service life of the ion optical system directly determines the service life of the ion thruster, so that the structure failure of the ion optical system is accelerated by adopting an ion optical system in-situ material local replacement method, and an accelerated service life test is carried out. The invention provides an accelerated life test method of an ion thruster, which is characterized in that according to the sputtering characteristics of materials, local materials of an ion optical system are replaced by an accelerator with high sputtering yield materials in situ under the rated working condition without changing the thickness of a grid sheath layer and the focusing characteristics, the structural failure of the ion optical system is accelerated, and the accelerated life is achieved. By using the method, the problems of long duration and high cost of the whole-period examination of the ground service life of the ion thruster can be solved, and the method is suitable for ion optical systems with different beam extraction areas.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, serve to provide a further understanding of the application and to enable other features, objects, and advantages of the application to be more apparent. The drawings and their description illustrate the embodiments of the invention and do not limit it. In the drawings:
FIG. 1 is a schematic diagram of a primary ion optical system without an accelerator according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a location of an acceleration hole on a gate according to an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of an ion optical system with an accelerator at a displacement position on a grid according to an embodiment of the present invention;
fig. 4 is a schematic diagram of a location of an accelerator on a gate according to an embodiment of the invention.
Reference numerals:
1-an acceleration grid; 2-screen grating; 3-a deceleration grid; 4-accelerating grid leading-out hole; 5-screen grid leading-out hole; 6-a deceleration grid lead-out hole; 7-an acceleration aperture; 8-acceleration part.
Detailed Description
In order to make the technical solutions better understood by those skilled in the art, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only partial embodiments of the present application, but not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It should be noted that the terms "first," "second," and the like in the description and claims of this application and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It should be understood that the data so used may be interchanged under appropriate circumstances such that embodiments of the application described herein may be used. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
In this application, the terms "upper", "lower", "left", "right", "front", "rear", "top", "bottom", "inner", "outer", "middle", "vertical", "horizontal", "lateral", "longitudinal", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings. These terms are used primarily to better describe the present application and its embodiments, and are not used to limit the indicated devices, elements or components to a particular orientation or to be constructed and operated in a particular orientation.
Moreover, some of the above terms may be used to indicate other meanings besides the orientation or positional relationship, for example, the term "on" may also be used to indicate some kind of attachment or connection relationship in some cases. The specific meaning of these terms in this application will be understood by those of ordinary skill in the art as appropriate.
Furthermore, the terms "mounted," "disposed," "provided," "connected," and "sleeved" are to be construed broadly. For example, it may be a fixed connection, a removable connection, or a unitary construction; can be a mechanical connection, or an electrical connection; may be directly connected, or indirectly connected through intervening media, or may be in internal communication between two devices, elements or components. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present application will be described in detail below with reference to the embodiments with reference to the attached drawings.
The application provides an accelerated life test method of an ion thruster, the ion thruster comprises an ion optical system, the ion optical system comprises at least two grids, a leading-out hole is formed in each grid, and the method comprises the following steps:
(1) an accelerator replacing area is arranged at the same position of each grid electrode, a plurality of leading-out holes are formed in the accelerator replacing area, and grid electrode materials in the accelerator replacing area are removed to form accelerating holes;
(2) connecting an accelerator covering the accelerating holes at each accelerating hole, wherein the sputtering yield of the accelerator material is higher than that of the grid material;
(3) punching is carried out on each accelerating element to form leading-out holes which correspond to the replacing areas of the original accelerating elements one by one;
(4) polishing and passivating the grid with the accelerator, and assembling the grid into an ion optical system with the accelerator;
(5) carrying out an accelerated life test on the ion optical system with the accelerating part, carrying out a life test on the original ion optical system without the accelerating part, and respectively obtaining corresponding sputter etching time-containing curves;
(6) determining an acceleration factor according to a sputtering etching time-containing curve;
(7) and determining the service life of the ion optical system of the ion thruster to be tested according to the acceleration factor and the service life of the ion optical system with the acceleration piece, which is measured aiming at the ion thruster to be tested.
The invention provides an accelerated life test method of an ion thruster, which is characterized in that according to the sputtering characteristics of materials, local materials of an ion optical system are replaced by an accelerator with high sputtering yield materials in situ under the rated working condition without changing the thickness of a grid sheath layer and the focusing characteristics, the structural failure of the ion optical system is accelerated, and the accelerated life is achieved. By using the method, the problems of long duration and high cost of the whole-period examination of the ground service life of the ion thruster can be solved, and the method is suitable for ion optical systems with different beam extraction areas.
The ion optical system according to the invention consists of at least two grids, for example an acceleration grid and a screen grid, or an acceleration grid 1, a screen grid 2 and a deceleration grid 3. The latter will be used as an example to describe the technical solution of the present invention in detail.
As shown in fig. 1, the accelerating grid 1 has an accelerating grid lead-out hole 4, the screen grid 2 has a screen grid lead-out hole 5, the decelerating grid 3 has a decelerating grid lead-out hole 6, the diameter of the lead-out hole is 1.25-1.9 mm, and the thickness of the grid is 0.4-0.5 mm.
And acceleration holes 7 are processed on the acceleration grid 1, the screen grid 2 and the deceleration grid 3. The selected position of the acceleration aperture is shown in fig. 2. Because the grid leading-out hole is in millimeter magnitude, the whole grid is replaced by oxygen-free copper or gold with high sputtering yield, thermal expansion deformation is large, partial position materials are replaced to ensure that the thermal expansion deformation of the accelerating part with large sputtering yield in a thermal vacuum environment does not influence the normal work of the ion optical system, and the accelerating hole position is preferably selected at different positions in the radial direction of the grid according to the distribution characteristic of large density in the middle area of beam and the distribution characteristic of the aperture area of the ion optical system.
The accelerator shown in fig. 3 is a component for locally replacing the gate material in situ, and the material thereof is oxygen-free copper or gold, which has a higher sputtering yield and can replace the gate material (such as molybdenum metal) with a lower sputtering yield, thereby accelerating the structural failure of the ion optical system. The accelerator is riveted with the grid, and the shape, the radian and the thickness of the accelerator are consistent with those of the in-situ grid material of the ion optical system without the accelerator. As shown in fig. 4, the accelerator 8 is circular, and holes are punched on the accelerator to form lead-out holes corresponding to the original accelerator replacement area one by one, wherein the number of the lead-out holes on the accelerator is 7, and the lead-out holes are not punched at the position of the lead-out hole in the gray filling area in the drawing in order to rivet the accelerator with the grid electrode because the lead-out hole pitch is small.
And (3) carrying out in-situ punching on the accelerating part by utilizing laser, wherein the coaxiality form and position error of the holes in the accelerating part at the same position of each grid is 0.01 mm.
Polishing and passivating the grid electrode, and assembling the grid electrode into an ion optical system with an accelerating part, wherein a screen grid with the accelerating part, an accelerating grid and a decelerating grid are sequentially arranged, and the intervals are consistent with the grid electrode intervals of the original ion optical system, and are respectively 0.9 +/-0.05 mm and 0.8 mm earth.
An accelerated life test of the ion optical system with the accelerating part is carried out in the vacuum chamber, and the test conditions are consistent with the test method and the conditions and the method of the ion thruster ground life verification test. In the test process, the sputter etching condition is measured every 50 hours to obtain a corresponding sputter etching time-containing curve; meanwhile, a life test of the original ion optical system without the accelerator is carried out, and the sputter etching condition is measured every 50 hours to obtain a corresponding sputter etching time curve.
And obtaining the corresponding relation of two curve functions according to the time curve of the sputter etching of the ion optical system with the accelerating part and the time curve of the sputter etching of the original ion optical system without the accelerating part, thereby obtaining the accelerating factor.
The acceleration factor is known, and the acceleration service life of the ion optical system with the acceleration piece is obtained by testing the ion thruster to be measured, namely the service life of the ion optical system of the ion thruster to be measured can be calculated through the corresponding relation.
The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (9)
1. An accelerated life test method of an ion thruster, wherein the ion thruster comprises an ion optical system, the ion optical system is composed of at least two grid electrodes, and the grid electrodes are provided with extraction holes, and the method comprises the following steps:
an accelerator replacing area is arranged at the same position of each grid electrode, a plurality of leading-out holes are formed in the accelerator replacing area, and grid electrode materials in the accelerator replacing area are removed to form acceleration holes;
connecting an accelerator covering the accelerating holes at each accelerating hole, wherein the sputtering yield of the accelerator material is higher than that of the grid material;
punching is carried out on each accelerating element to form leading-out holes corresponding to the replacing areas of the original accelerating elements one by one;
polishing and passivating the grid with the accelerator, and assembling the grid into an ion optical system with the accelerator;
carrying out an accelerated life test on the ion optical system with the accelerating part, carrying out a life test on the original ion optical system without the accelerating part, and respectively obtaining corresponding sputter etching time-containing curves;
determining an acceleration factor according to the sputtering etching time-containing curve;
and determining the service life of the ion optical system of the ion thruster to be tested according to the acceleration factor and the service life of the ion optical system with the acceleration piece, which is measured aiming at the ion thruster to be tested.
2. The accelerated lifetime test method of an ion thruster according to claim 1, wherein the ion optical system is composed of an acceleration grid, a screen grid and a deceleration grid.
3. The accelerated lifetime test method of an ion thruster according to claim 1 or 2, wherein the material of the accelerating member is oxygen-free copper or gold.
4. The accelerated lifetime test method of an ion thruster according to any one of claims 1 to 3, wherein the diameter of the extraction hole is 1.25 to 1.9mm, and the thickness of the grid electrode is 0.4 to 0.5 mm.
5. The accelerated life test method of an ion thruster according to any one of claims 1 to 4, wherein the accelerator member is riveted to the grid, and the accelerator member is aligned with the arc of the grid at a corresponding position.
6. The accelerated lifetime test method of an ion thruster according to any one of claims 1 to 5, wherein the acceleration holes are arranged in sequence in a radial direction of the grid electrode.
7. The accelerated life test method of an ion thruster of any one of claims 1 to 6, wherein the coaxiality form and position error of the holes on the accelerating member at the same position of each grid is 0.01 mm.
8. The accelerated life test method of the ion thruster of any one of claims 1 to 7, wherein the accelerated life test is performed on an ion optical system with an accelerating member, and the life test is performed on an original ion optical system without the accelerating member, so as to respectively obtain corresponding sputter etching time-containing curves, and the method comprises the following steps:
carrying out an accelerated life test of an ion optical system with an accelerating part in a vacuum chamber, and measuring the sputter etching condition of the ion optical system every 50 hours to obtain a corresponding sputter etching time-containing curve; meanwhile, a life test of the original ion optical system without the accelerator is carried out, and the sputter etching condition is measured every 50 hours to obtain a corresponding sputter etching time curve.
9. The accelerated life test method of an ion thruster according to any one of claims 1 to 8, wherein determining an acceleration factor according to the time-containing curve of sputter etching comprises:
and obtaining the corresponding relation of two curve functions according to the time curve of the ion optical system sputter etching with the accelerating part and the time curve of the original ion optical system sputter etching without the accelerating part, and obtaining the accelerating factor.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112525088A (en) * | 2020-11-09 | 2021-03-19 | 兰州空间技术物理研究所 | Method for mounting grid insulation guide pin of ion thruster |
| CN113357111A (en) * | 2021-07-01 | 2021-09-07 | 兰州空间技术物理研究所 | Installation method of probe of ion thruster |
| CN113466119A (en) * | 2021-07-02 | 2021-10-01 | 兰州空间技术物理研究所 | Method for measuring and evaluating ion sputtering corrosion resistance of material |
| CN115659642A (en) * | 2022-10-26 | 2023-01-31 | 兰州空间技术物理研究所 | Method for determining acceleration factor of ionic electric propulsion life test |
| CN115828589A (en) * | 2022-11-30 | 2023-03-21 | 兰州空间技术物理研究所 | Thruster ion optical system structure strengthening method |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101567313A (en) * | 2009-06-04 | 2009-10-28 | 上海宏力半导体制造有限公司 | Grid manufacturing method |
| CN102194650A (en) * | 2010-03-03 | 2011-09-21 | 中芯国际集成电路制造(上海)有限公司 | Method for evaluating efficiency of processes for improving negative bias temperature instability effect |
| CN104232849A (en) * | 2014-09-04 | 2014-12-24 | 兰州空间技术物理研究所 | Stabilizing treatment method for magnetic steel of ion thruster |
| CN107860330A (en) * | 2017-09-21 | 2018-03-30 | 苏州轩明视测控科技有限公司 | A kind of ion thruster grid corrosion measurement system based on focusing distance measuring method |
| CN108280253A (en) * | 2017-12-20 | 2018-07-13 | 中国空间技术研究院 | The ion thruster lifetime estimation method to be backflowed based on grid erosion profile and electronics |
| CN108535607A (en) * | 2017-12-22 | 2018-09-14 | 兰州空间技术物理研究所 | The performance test of ion thruster hollow cathode and life assessment test device and method |
| CN109751977A (en) * | 2018-12-06 | 2019-05-14 | 兰州空间技术物理研究所 | A kind of measurement method of ion thruster arc chamber inside deposition sputtering |
| US20200102100A1 (en) * | 2018-10-01 | 2020-04-02 | Massachusetts Institute Of Technology | Staging of ion propulsion thrusters |
| CN111199099A (en) * | 2019-12-26 | 2020-05-26 | 兰州空间技术物理研究所 | Method for evaluating operation life of ion thruster based on grid corrosion |
-
2020
- 2020-06-02 CN CN202010491912.9A patent/CN111649912B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101567313A (en) * | 2009-06-04 | 2009-10-28 | 上海宏力半导体制造有限公司 | Grid manufacturing method |
| CN102194650A (en) * | 2010-03-03 | 2011-09-21 | 中芯国际集成电路制造(上海)有限公司 | Method for evaluating efficiency of processes for improving negative bias temperature instability effect |
| CN104232849A (en) * | 2014-09-04 | 2014-12-24 | 兰州空间技术物理研究所 | Stabilizing treatment method for magnetic steel of ion thruster |
| CN107860330A (en) * | 2017-09-21 | 2018-03-30 | 苏州轩明视测控科技有限公司 | A kind of ion thruster grid corrosion measurement system based on focusing distance measuring method |
| CN108280253A (en) * | 2017-12-20 | 2018-07-13 | 中国空间技术研究院 | The ion thruster lifetime estimation method to be backflowed based on grid erosion profile and electronics |
| CN108535607A (en) * | 2017-12-22 | 2018-09-14 | 兰州空间技术物理研究所 | The performance test of ion thruster hollow cathode and life assessment test device and method |
| US20200102100A1 (en) * | 2018-10-01 | 2020-04-02 | Massachusetts Institute Of Technology | Staging of ion propulsion thrusters |
| CN109751977A (en) * | 2018-12-06 | 2019-05-14 | 兰州空间技术物理研究所 | A kind of measurement method of ion thruster arc chamber inside deposition sputtering |
| CN111199099A (en) * | 2019-12-26 | 2020-05-26 | 兰州空间技术物理研究所 | Method for evaluating operation life of ion thruster based on grid corrosion |
Non-Patent Citations (1)
| Title |
|---|
| 林逢春: ""氙离子推力器寿命试验与可靠性评估方法"", 《质量与可靠性》 * |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112525088A (en) * | 2020-11-09 | 2021-03-19 | 兰州空间技术物理研究所 | Method for mounting grid insulation guide pin of ion thruster |
| CN113357111A (en) * | 2021-07-01 | 2021-09-07 | 兰州空间技术物理研究所 | Installation method of probe of ion thruster |
| CN113357111B (en) * | 2021-07-01 | 2022-03-18 | 兰州空间技术物理研究所 | Installation method of probe of ion thruster |
| CN113466119A (en) * | 2021-07-02 | 2021-10-01 | 兰州空间技术物理研究所 | Method for measuring and evaluating ion sputtering corrosion resistance of material |
| CN115659642A (en) * | 2022-10-26 | 2023-01-31 | 兰州空间技术物理研究所 | Method for determining acceleration factor of ionic electric propulsion life test |
| CN115659642B (en) * | 2022-10-26 | 2023-07-18 | 兰州空间技术物理研究所 | Method for determining acceleration factor of ion electric propulsion life test |
| CN115828589A (en) * | 2022-11-30 | 2023-03-21 | 兰州空间技术物理研究所 | Thruster ion optical system structure strengthening method |
| CN115828589B (en) * | 2022-11-30 | 2024-05-07 | 兰州空间技术物理研究所 | Structure strengthening method for ion optical system of thruster |
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