CN111642324A - Method for promoting growth of ganoderma lucidum by pulse discharge plasma - Google Patents

Method for promoting growth of ganoderma lucidum by pulse discharge plasma Download PDF

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CN111642324A
CN111642324A CN202010543385.1A CN202010543385A CN111642324A CN 111642324 A CN111642324 A CN 111642324A CN 202010543385 A CN202010543385 A CN 202010543385A CN 111642324 A CN111642324 A CN 111642324A
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ganoderma lucidum
plasma
growth
promoting
discharge
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熊紫兰
黄晓义
李孟琦
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Huazhong University of Science and Technology
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Huazhong University of Science and Technology
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    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01GHORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
    • A01G18/00Cultivation of mushrooms
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01GHORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
    • A01G18/00Cultivation of mushrooms
    • A01G18/60Cultivation rooms; Equipment therefor
    • A01G18/69Arrangements for managing the environment, e.g. sprinklers
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01GHORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
    • A01G7/00Botany in general
    • A01G7/04Electric or magnetic or acoustic treatment of plants for promoting growth
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2277/00Applications of particle accelerators

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  • Environmental Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Mycology (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Ecology (AREA)
  • Forests & Forestry (AREA)
  • Botany (AREA)
  • Biodiversity & Conservation Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Micro-Organisms Or Cultivation Processes Thereof (AREA)
  • Mushroom Cultivation (AREA)

Abstract

The invention belongs to the technical field of plasma generation and edible fungus growth, and discloses a method for promoting the growth of ganoderma lucidum by using pulse discharge plasma, which generates low-temperature plasma with certain parameters by discharging of a high-voltage pulse power supply; and treating the ganoderma lucidum culture medium and the thalli by using the plasma, and controlling the treatment time length and the treatment interval time. The plasma driving power supply is a high-voltage pulse power supply, the voltage amplitude, the pulse width and the frequency of the high-voltage pulse power supply can be selected according to the actual application effect, the plasma source is spark-like discharge, and the device can be in various forms such as needle plate discharge, needle point discharge, jet flow and the like. The invention relates to a method for promoting the growth of ganoderma lucidum by using plasma to shorten the growth period and improve the harvest quality. According to the method for promoting the growth of the ganoderma lucidum by the pulse discharge arc plasma, the plasma is generated by discharging of the high-voltage pulse power supply, the ganoderma lucidum culture medium and the thalli are treated, and the growth quality of the ganoderma lucidum is improved.

Description

Method for promoting growth of ganoderma lucidum by pulse discharge plasma
Technical Field
The invention belongs to the technical field of plasma generation and edible fungus growth, and particularly relates to a method for promoting growth of ganoderma lucidum by using pulse discharge plasma.
Background
At present, the chemical components of ganoderma lucidum are complex, and various components such as ganoderma lucidum polysaccharide, triterpenoids and the like are separated from the fungus of the genus. The components have wide immunoregulation activity, and can improve organism immunocompetence, improve collagen and liver cell tissue morphology, etc.
At present, the wild ganoderma lucidum is limited in resources, the quality of ganoderma lucidum products in the market is not uniform due to the difference of production areas, cultivation technologies, harvesting conditions and the like of artificially cultivated ganoderma lucidum, and a method for improving the quality of ganoderma lucidum needs to be researched urgently.
Ganoderma lucidum prefers to grow in a slightly acidic environment, and the pH range is required to be 3-7.5, and the pH range is most suitable to be 4-6.
The measurement indexes of the growth quality of the ganoderma lucidum are mainly the length of a stipe and the area of a pileus, wherein the longer the length of the stipe, the larger the area of the pileus represents the higher the quality of the ganoderma lucidum.
On the other hand, the gas discharge plasma has applications in many fields at present, such as material surface modification, sterilization, sewage treatment, air pollution treatment and the like, and has good application prospects in the fields of medical and agricultural applications.
The existing method for promoting the growth of the ganoderma lucidum mainly comprises methods of changing the raw material components of a culture medium or adding an active agent and the like, wherein the method for changing the raw material components of the culture medium is not in conflict with the method disclosed by the invention, and the method can realize synergistic effect and further improve the growth speed of the ganoderma lucidum; the traditional method for increasing the active agent mainly uses highly toxic chemical substances such as carbendazim, sulfur, formaldehyde and the like, has the defects of large quantity of residual toxic and harmful substances, and the defects of complex active agent components, required proportioning and troublesome operation, and can avoid the defects by promoting the growth of the ganoderma lucidum by the method provided by the invention.
Through the above analysis, the problems and defects of the prior art are as follows: (1) in the prior art, the growth period of the ganoderma lucidum culture is long, and the harvest quality is poor.
(2) In the prior art, the high-voltage pulse power supply does not discharge to generate plasma to treat the ganoderma lucidum culture medium and the thalli so as to improve the growth quality of the ganoderma lucidum.
Disclosure of Invention
Aiming at the problems in the prior art, the invention provides a method for promoting the growth of ganoderma lucidum by using pulse discharge plasma. In particular to a method for promoting the growth speed and growth quality of fungi by plasma.
The invention is realized in such a way that a method for promoting the growth of ganoderma lucidum by using pulse discharge plasma comprises the following steps:
generating low-temperature plasma with certain parameters by discharging of a high-voltage pulse power supply;
and step two, treating the ganoderma lucidum culture medium and the thalli by using the plasma, and controlling the treatment time length and the treatment interval time.
Further, in the first step, the parameter range of the input high-voltage pulse signal can select different frequencies, duty ratio amplitudes and the like according to the actual growth promoting effect. Further, in the first step, the plasma source is a spark-like discharge plasma source, and the plasma source may be in various forms such as needle plate discharge, needle point discharge, jet flow, and the like. The temperature range of the plasma is less than or equal to 250 ℃.
Further, the treatment process in the second step is that a plasma source is connected to a high-voltage pulse power supply to generate low-temperature plasma, and the plasma is acted on the ganoderma lucidum culture medium and the thalli.
Further, in the second step, the ganoderma lucidum culture medium is a solid culture medium.
Further, in the second step, the treatment duration and the treatment interval duration are adjusted according to the actual growth promoting effect.
Another object of the present invention is to provide a high voltage pulse discharge plasma apparatus for implementing the method for promoting the growth of Ganoderma lucidum by using the pulse discharge plasma.
The growth promotion principle is that pulse discharge destroys the cell wall of the ganoderma lucidum to enhance the water absorption capacity of the ganoderma lucidum and promote the growth of the ganoderma lucidum, and simultaneously, plasma generated by air discharge has the function of regulating the pH value of the growth environment of the ganoderma lucidum and can provide acidic growth conditions for the ganoderma lucidum.
By combining all the technical schemes, the invention has the advantages and positive effects that: the invention provides a method for promoting the growth of ganoderma lucidum by using plasma to shorten the growth period and improve the harvest quality aiming at the problems of long growth period and poor harvest quality of ganoderma lucidum culture at present.
According to the method for promoting the growth of the ganoderma lucidum by the pulse discharge arc plasma, the plasma is generated by discharging of the high-voltage pulse power supply, the ganoderma lucidum culture medium and the thalli are treated, and the growth quality of the ganoderma lucidum is improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed to be used in the embodiments of the present application will be briefly described below, and it is obvious that the drawings described below are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a flow chart of a method for promoting the growth of Ganoderma lucidum by using pulsed discharge plasma according to an embodiment of the present invention.
FIG. 2 is a diagram illustrating the effect of the plasma ganoderma lucidum processing process provided by the embodiment of the invention.
FIG. 3 is a top view of a treatment group (left) and a control group (right) on the same scale before and after 50 days of culture as provided in the examples of the present invention.
FIG. 4 is a side view of a treatment group (left) and a control group (right) on the same scale before and after 50 days of culture as provided by the example of the present invention.
FIG. 5 is a graph showing the average value of the total data obtained by counting the total pileus area of Ganoderma lucidum after 50 days of cultivation according to the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail with reference to the following embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
In the prior art, the growth period of the ganoderma lucidum culture is long, and the harvest quality is poor.
In the prior art, the high-voltage pulse power supply does not discharge to generate plasma to treat the ganoderma lucidum culture medium and the thalli so as to improve the growth quality of the ganoderma lucidum.
Aiming at the problems in the prior art, the invention provides a method for promoting the growth of ganoderma lucidum by using pulsed discharge plasma, and the invention is described in detail below with reference to the accompanying drawings.
As shown in figure 1, the method for promoting the growth of ganoderma lucidum by using the pulse discharge arc plasma provided by the invention generates the plasma by discharging the high-voltage pulse power supply, treats the ganoderma lucidum culture medium and thalli, and improves the growth quality of ganoderma lucidum.
The method specifically comprises the following steps:
and S101, discharging through a high-voltage pulse power supply to generate low-temperature plasma with certain parameters.
S102, treating the Ganoderma lucidum culture medium and the thallus by using the plasma, and controlling the treatment duration and the treatment interval time.
In the present invention, the parameter ranges of the high voltage pulse signal input in step S101 are: the frequency is less than or equal to 1kHz, the duty ratio is less than or equal to 1 percent, the pulse width is less than or equal to 10 microseconds, and the amplitude is less than or equal to 15 kV.
Needle plate discharge, needle point discharge, jet flow and other forms. The temperature range of the plasma is less than or equal to 250 ℃.
In the present invention, the processing procedure of step S102 is to connect the plasma source to the high-voltage pulse power source to generate low-temperature plasma, and apply the plasma to the Ganoderma lucidum culture medium and the thallus.
In the present invention, the Ganoderma lucidum culture medium of step S102 is a solid medium.
In the invention, the processing time of the step S102 is less than or equal to 1min, and the processing interval time is within the range of 5-10 days.
The present invention will be further described with reference to specific examples and experiments.
FIG. 2 shows a diagram of a plasma Ganoderma lucidum treatment process.
In order to facilitate the comparison treatment effect, the Ganoderma lucidum is divided into a treatment group and a comparison group, the culture is carried out under the same environmental conditions, the power supply used for the treatment of the comparison group is a pulse power supply with the frequency of 500Hz, the duty ratio of 0.04 percent and the amplitude of 13kV, the duration time of the treatment process is 40s, the treatment interval time is 1 week, and the growth condition of the Ganoderma lucidum is recorded every day.
FIG. 3 shows a top view of the treated group (left) and the control group (right) on the same scale before and after 55 days of culture, and FIG. 4 shows a side view of the treated group (left) and the control group (right) on the same scale before and after 55 days of culture. The comparison shows that the pileus differentiated from the erythroderma lucidum primordium of the treatment group is more completely formed, and the effect of shortening the growth cycle of the erythroderma lucidum by the plasma is reflected.
As shown in fig. 5, after 55 days of culture, the total pileus areas of the ganoderma lucidum are counted, and the area of each pileus is compared with the average value of the whole data, so that the experimental group is far larger than the control group, and a result that the pileus area of the treatment group is larger is reflected; the average value of the experimental group is 10.40cm when the total length of the stipes is counted, the average value of the control group is 7.32cm, the result that the length of the stipes of the treatment group is longer is reflected, and the data shows that the growth quality of the ganoderma lucidum after treatment is improved.
Table 1 shows the growth length of the stipe every 72 hours after the differentiation of the ganoderma lucidum from the primordium, and the record is 288 hours, the temperature of the ganoderma lucidum growth environment is 20 ℃ plus or minus 2 ℃, and the humidity is 80% plus or minus 5%, thus the growth speed of the stipe of the ganoderma lucidum treated by the method of the embodiment is accelerated.
TABLE 1 Ganoderma lucidum stalks growth Length per 72 hours
Figure BDA0002539822370000051
In the description of the present invention, "a plurality" means two or more unless otherwise specified; the terms "upper", "lower", "left", "right", "inner", "outer", "front", "rear", "head", "tail", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, are only for convenience in describing and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, should not be construed as limiting the invention. Furthermore, the terms "first," "second," "third," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
The above description is only for the purpose of illustrating the present invention and the appended claims are not to be construed as limiting the scope of the invention, which is intended to cover all modifications, equivalents and improvements that are within the spirit and scope of the invention as defined by the appended claims.

Claims (7)

1. A method for promoting the growth of Ganoderma lucidum by using pulse discharge plasma is characterized by comprising the following steps:
generating low-temperature plasma with certain parameters by discharging of a high-voltage pulse power supply;
and step two, treating the ganoderma lucidum culture medium and the thalli by using the plasma, and controlling the treatment time length and the treatment interval time.
2. The method for promoting the growth of ganoderma lucidum by using the pulse discharge plasma as claimed in claim 1, wherein in the step one, the parameters of the input high-voltage pulse signal are different in frequency and duty ratio amplitude according to actual effects.
3. The method for promoting the growth of ganoderma lucidum by using the pulse discharge plasma as claimed in claim 1, wherein in the first step, the plasma source is a spark-like discharge plasma source, the device is in various forms of needle plate discharge, needle point discharge and jet flow, and the temperature range of the plasma is less than or equal to 250 ℃.
4. The method for promoting the growth of Ganoderma lucidum by using the pulsed discharge plasma as claimed in claim 1, wherein the treatment process in the second step is that the plasma source is connected to a high-voltage pulsed power supply to generate low-temperature plasma, and the plasma is applied to the Ganoderma lucidum culture medium and the thallus.
5. The method for promoting the growth of Ganoderma lucidum by using pulsed discharge plasma as claimed in claim 1, wherein in the second step, the Ganoderma lucidum culture medium is a solid culture medium.
6. The method for promoting the growth of Ganoderma lucidum by using pulsed discharge plasma as claimed in claim 1, wherein in the second step, the treatment duration and the treatment interval duration are selected according to the actual growth promoting effect.
7. A high voltage pulse discharge plasma equipment for implementing the method for promoting the growth of Ganoderma lucidum by using the pulse discharge plasma as claimed in any one of claims 1 to 6.
CN202010543385.1A 2020-06-15 2020-06-15 Method for promoting growth of ganoderma lucidum by pulse discharge plasma Pending CN111642324A (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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CN108243662A (en) * 2017-01-11 2018-07-06 深圳中科拓达农业科技有限公司 A kind of plasma preparation promoted applied to corn yield and preparation method thereof and application method
CN109463062A (en) * 2017-09-07 2019-03-15 洛阳华清天木生物科技有限公司 A method of utilizing atmospheric pressure at room corona treatment crop seeds
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CN104255230A (en) * 2014-09-04 2015-01-07 李永青 Corn seed plasma treatment method and matched cultivation method
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CN107058283A (en) * 2017-06-06 2017-08-18 中国科学院合肥物质科学研究院 Method using plasma mutagenesis ganoderma lucidum protoplast to build mutant strain
CN107242542A (en) * 2017-06-06 2017-10-13 中国科学院合肥物质科学研究院 Method of the corona treatment Reishi sporule to improve triterpene and polysaccharide burst size
CN109463062A (en) * 2017-09-07 2019-03-15 洛阳华清天木生物科技有限公司 A method of utilizing atmospheric pressure at room corona treatment crop seeds
CN110800490A (en) * 2019-12-12 2020-02-18 山东农业大学 Application of cold plasma treatment in promoting survival and growth of grafted tomatoes

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Application publication date: 20200911