CN111584589B

CN111584589B - Display substrate, display device and compensation method thereof

Info

Publication number: CN111584589B
Application number: CN202010432793.XA
Authority: CN
Inventors: 田宏伟; 牛亚男; 赵梦; 刘明; 刘政
Original assignee: BOE Technology Group Co Ltd
Current assignee: BOE Technology Group Co Ltd
Priority date: 2020-05-20
Filing date: 2020-05-20
Publication date: 2022-09-09
Anticipated expiration: 2040-05-20
Also published as: CN111584589A

Abstract

The embodiment of the disclosure discloses a display substrate, a display device and a compensation method thereof, relates to the technical field of display, and can determine the stretching amount of the display substrate according to the variation of the resistance value of a detection line and determine the compensation amount of display parameters of each area of the display substrate through a corresponding algorithm. The display substrate comprises a substrate, sub-pixels, an encapsulation layer and detection lines. The display substrate is provided with a plurality of island regions and bridge regions, and the bridge regions are connected between every two adjacent island regions. A plurality of sub-pixels are disposed on the substrate. The packaging layer is arranged on one side, away from the substrate, of the sub-pixels. The detection lines are arranged on one side, far away from the substrate, of the packaging layer, the length extension direction of the detection lines is parallel to the stretching direction of the display substrate or forms an acute angle with the stretching direction of the display substrate, and the detection lines can deform under the condition that the display substrate is stretched along the stretching direction to generate resistance value change. The display substrate is applied to a display device so that the display device displays a picture.

Description

Display substrate, display device and compensation method thereof

Technical Field

The present disclosure relates to the field of display technologies, and in particular, to a display substrate, a display device and a compensation method thereof.

Background

An Organic Light-Emitting Diode (OLED) display panel gradually becomes one of mainstream in the display field by virtue of its excellent properties of low power consumption, high color saturation, wide viewing angle, thin thickness, and being capable of realizing flexibility, and the OLED display panel can be widely applied to terminal products such as smart phones, tablet computers, televisions, and the like.

With the development of flexible display technology, OLED display panels gradually transition from bent (Bendable), bent (Foldable) to Stretchable (Stretchable). The flexible and stretchable OLED display panel gradually becomes a hot spot in the OLED display field because it can meet the requirements of various special structures.

In some flexible and stretchable OLED display panels, the stretching amount of different areas of the stretched display panel is different, which causes display problems such as color cast and uneven brightness of the display panel.

Disclosure of Invention

It is an object of some embodiments of the present disclosure to provide a display substrate, a display device and a compensation method thereof, which can determine a stretching amount of the display substrate according to a variation of a detection line resistance value, and determine a compensation amount of a display parameter of each region of the display substrate through a corresponding algorithm, so as to solve display problems such as color cast and non-uniformity of brightness after the display substrate is stretched.

In order to achieve the above purpose, some embodiments of the present disclosure provide the following technical solutions:

in a first aspect, a display substrate is provided, which includes a substrate, sub-pixels, an encapsulation layer, and a sensing line. The display substrate is provided with a plurality of island regions and bridge regions, and the bridge regions are connected between every two adjacent island regions. The plurality of sub-pixels are arranged on the substrate, at least one sub-pixel is arranged in one island region, at least one signal line is arranged in one bridge region, and one sub-pixel is coupled with at least one signal line. The packaging layer is arranged on one side, far away from the substrate, of the sub-pixels. The detection lines are arranged on one side, far away from the substrate, of the packaging layer, and can deform to generate resistance value change under the condition that the display substrate is stretched along the stretching direction.

According to the display substrate provided by the embodiment of the disclosure, by using the detection line, when the display substrate is stretched along the stretching direction, the detection line generates a resistance strain effect, that is, the detection line is mechanically deformed along with the deformation of the surface of the display substrate, so as to cause a change in the resistance value of the detection line, for example, the larger the deformation of the surface of the display substrate, the larger the change in the resistance value of the detection line. By utilizing the resistance strain effect of the metal, the stretching amount of the display substrate can be determined according to the detected resistance value variation of the detection line, and the compensation amount of the display parameters of each area of the display substrate is determined through a corresponding algorithm, so that the display problems of color cast, uneven brightness and the like after the display substrate is stretched are solved.

In some embodiments, the length extension direction of the inspection lines is parallel to or at an acute angle with respect to the stretchable direction of the display substrate.

In some embodiments, the plurality of islands are arranged in an array. The stretchable direction is parallel to the row direction in which the plurality of island regions are arranged, and one of the detection lines passes through a bridge region between the island regions in the same row. And/or, the stretchable direction is parallel to the column direction in which the plurality of island regions are arranged, and one of the sensing lines passes through a bridge region between the island regions in the same column.

In some embodiments, the length extension directions of any two of the detection lines are parallel to each other.

In some embodiments, the sensing wire includes a plurality of deformation portions located at the bridge region, and a plurality of connection portions located at the island region. The deformation parts and the connecting parts are alternately arranged and are sequentially connected in series.

In some embodiments, the connection portion is disposed along an edge of the island region.

In some embodiments, the display substrate further comprises a conductive layer, multiple conductive layers disposed on the substrate, the multiple conductive layers for forming at least a portion of the plurality of sub-pixels. At least one conductive layer comprises a detection electrode positioned in the bridge area, and the orthographic projection of the detection electrode on the substrate at least partially overlaps with the orthographic projection of the detection line on the substrate, so that the detection electrode and the detection line form capacitance.

In some embodiments, the display substrate further includes a first reference resistor, a second reference resistor, and a third reference resistor disposed on the substrate and located at an edge region of the display substrate. Wherein the first reference resistor and the second reference resistor are connected in series, and the third reference resistor and the sensing line are connected in series. The first and second reference resistances in series are in parallel with the third reference resistance and the sense line in series.

In some embodiments, the inspection line includes a laminated structure formed of a plurality of layers of metallic materials. Or the material of the detection line comprises a conductive composite material formed by carbon nanotubes and polydimethylsiloxane.

In a second aspect, there is provided a display device comprising a display substrate as described above in the first aspect.

The beneficial effects that can be achieved by the display device provided in the embodiments of the present disclosure are the same as those that can be achieved by the display substrate in the first aspect, and are not described herein again.

In a third aspect, a compensation method for a display device is provided, which includes the following steps:

detecting a resistance value variation amount of the detection line in a case where the display device is stretched;

determining the total stretching amount of the detection line according to the corresponding relation between the resistance value variation and the total stretching amount;

determining the stretching amount of each area of the detection line according to the corresponding relation between the total stretching amount of the detection line and the stretching amount of each area of the detection line;

and compensating the sub-pixels positioned in the corresponding island region in the display device according to the stretching amount of each region of the detection line.

The advantageous effects that can be achieved by the compensation method for the display device provided in the embodiment of the present disclosure are the same as the advantageous effects that can be achieved by the display substrate described in the first aspect, and are not described herein again.

Drawings

In order to more clearly illustrate the technical solutions in the present disclosure, the drawings needed to be used in some embodiments of the present disclosure will be briefly described below, and it is apparent that the drawings in the following description are only drawings of some embodiments of the present disclosure, and other drawings can be obtained by those skilled in the art according to the drawings. Furthermore, the drawings in the following description may be regarded as schematic diagrams, and do not limit the actual size of products, the actual flow of methods, the actual timing of signals, and the like, involved in the embodiments of the present disclosure.

In the drawings:

fig. 1 is a top view of a display substrate according to some embodiments of the present disclosure;

FIG. 2 is an enlarged view of a portion of FIG. 1 at M;

FIG. 3 is a partial cross-sectional view taken at O-O of FIG. 2;

FIG. 4 is a partial cross-sectional view of another display substrate provided in some embodiments of the present disclosure;

FIG. 5 is a top view of another display substrate provided by some embodiments of the present disclosure;

fig. 6 is an equivalent circuit diagram of a bridge circuit of a display device according to some embodiments of the present disclosure;

fig. 7 is a schematic structural diagram of a display device according to some embodiments of the present disclosure;

FIG. 8 is a flow chart of a compensation method provided by some embodiments of the present disclosure;

fig. 9 is a flow chart of a process for fabricating a display substrate according to some embodiments of the present disclosure;

FIG. 10 is a diagram illustrating a process for preparing a backing plate in a method according to some embodiments of the present disclosure;

FIG. 11 is a diagram illustrating a step of fabricating a pixel defining layer in a method according to some embodiments of the present disclosure;

FIG. 12 is a diagram of a step of fabricating a light emitting layer in a method according to some embodiments of the present disclosure;

fig. 13 is a diagram illustrating steps in a method of making a cathode according to some embodiments of the present disclosure;

fig. 14 is a diagram illustrating a step of fabricating an encapsulation layer in a method according to some embodiments of the present disclosure;

FIGS. 15-16 are diagrams of steps in a method for preparing a detection line according to some embodiments of the present disclosure;

fig. 17 is a diagram illustrating a step of fabricating a reference resistor in a method according to some embodiments of the present disclosure.

Detailed Description

For the convenience of understanding, the technical solutions provided by some embodiments of the present disclosure are described in detail below with reference to the accompanying drawings. It is obvious that the described embodiments are only some, not all embodiments of the proposed solution. All other embodiments that can be derived by one skilled in the art from some of the embodiments of the disclosure are intended to be within the scope of the disclosure.

In the following, the terms "first", "second" are used for descriptive purposes only and are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the embodiments of the present disclosure, "a plurality" means two or more unless otherwise specified.

In describing some embodiments, expressions of "coupled" and "connected," along with their derivatives, may be used. For example, the term "connected" may be used in describing some embodiments to indicate that two or more elements are in direct physical or electrical contact with each other. As another example, some embodiments may be described using the term "coupled" to indicate that two or more elements are in direct physical or electrical contact. However, the terms "coupled" or "communicatively coupled" may also mean that two or more elements are not in direct contact with each other, but yet still co-operate or interact with each other. The embodiments disclosed herein are not necessarily limited to the contents herein.

The present disclosure provides a display substrate 100, as shown in fig. 1 to 5, the display substrate 100 has a plurality of island regions a, bridge regions B and empty regions C, and the bridge regions B are connected between two adjacent island regions a. Fig. 3 illustrates a partial cross-sectional view at a-a of the display substrate 100. in some embodiments, the display substrate 100 includes a substrate 10 and a plurality of sub-pixels P disposed on a side of the substrate 10 away from the substrate 10, and at least one sub-pixel P is disposed in one island a.

In some embodiments, at least one signal line L is disposed in one bridge area B, and one sub-pixel P is coupled to the at least one signal line L. Here, "coupled" refers to an electrical connection.

Illustratively, the at least one signal line L includes a conductive line for transmitting various signals required for display to the sub-pixels P. For example, taking the display substrate 100 as an OLED type display substrate as an example, the at least one signal line L includes a gate line for transmitting a gate scanning signal, a data signal line for transmitting a data signal, an EM (emission, abbreviated as EM) signal line for transmitting a light emission control signal, a VDD line and a VSS line for transmitting a power voltage signal, and the like.

In some embodiments, as shown in fig. 3, the display substrate 100 further includes a buffer layer 11 disposed on one side of the substrate 10.

In some embodiments, each sub-pixel P includes a pixel driving circuit disposed at one side of the substrate 10, and one pixel driving circuit is disposed within one sub-pixel P. Each pixel driving circuit includes a plurality of thin film transistors 12. In some embodiments, each thin film transistor 12 includes a first gate electrode 121, a second gate electrode 122, an active layer 123, a source electrode 124, and a drain electrode 125. The first gate electrode 121 and the second gate electrode 122 are disposed at intervals along a thickness direction T of the display substrate 100; here, the thickness direction T of the display substrate 100 refers to a direction perpendicular to the main surface of the substrate 10. The figures of the embodiments of the present disclosure illustrate the thin film transistor 12 as including two gates, but in other embodiments, the thin film transistor 12 may include only one gate.

In some embodiments, as shown in fig. 3, the display substrate 100 further includes a planarization layer 16 covering a side of the plurality of pixel driving circuits away from the substrate 10, the planarization layer 16 having vias therein.

One light emitting device D is disposed in one sub-pixel P, and each light emitting device D includes an anode D1, a light emitting layer D2, and a cathode D3. The anode D1 of the light emitting device D is electrically connected to the source 124 or the drain 125 of the thin film transistor 12 as the driving transistor in the plurality of thin film transistors 12 included in the pixel driving circuit through the via hole in the planarization layer 16 (fig. 3 shows a case where the anode D1 is electrically connected to the source 124 of the thin film transistor 12), and the light emitting layer D2 and the cathode D3 are sequentially disposed on the side of the anode D1 away from the substrate 10.

In some embodiments, the light emitting device D includes one or more of an Electron Transport Layer (ETL), an Electron Injection Layer (EIL), a Hole Transport Layer (HTL), and a Hole Injection Layer (HIL) in addition to the light emitting layer D2.

The pixel driving circuit is used for applying voltage to the anode D1 of the light emitting device D and applying voltage to the cathode D3 of the light emitting device D, so that a voltage difference is formed between the anode D1 and the cathode D3, and the light emitting layer D2 in the light emitting device D can be driven to emit light, and the display device can display images.

In some embodiments, as shown in fig. 3, the display substrate 1 further includes a pixel defining layer 17 disposed on a side of the anode D1 away from the substrate 10, where the pixel defining layer 17 includes a plurality of opening regions, and one opening region corresponds to one sub-pixel P.

In some embodiments, as shown in fig. 3, the pixel defining layer 17 further includes a spacer layer 171 on a surface of a side thereof away from the substrate 10, and the spacer layer 171 includes a plurality of spacers, such as pillars, which protrude in a direction away from the substrate 10. When a high-precision Metal Mask (FMM for short) is used for evaporating the light-emitting layer D2, the spacer layer 171 can support and limit the high-precision Metal Mask, so that the high-precision Metal Mask can be prevented from contacting and scratching the evaporated light-emitting layer D2.

At least a part of the light emitting layer D2 of one light emitting device D is located in one opening region. Illustratively, a part or all of the luminescent layer D2 is located within one of the open areas. For example, the light emitting layer D2 covers the opening region, and the edge thereof overlaps the side of the pixel defining layer 17 away from the substrate 10.

In some embodiments, as shown in fig. 3, on the side of the buffer layer 11 away from the substrate 10, a first gate insulating layer 13 is disposed between the active layer 123 and the first gate electrode 121; a second gate insulating layer 14 is arranged on one side of the first gate insulating layer 13 away from the substrate 10, and between the first gate 121 and the second gate 122; an interlayer insulating layer 15 is disposed between the second gate electrode 122 and the source and drain

electrodes

124 and 125 on a side of the second gate insulating layer 14 away from the substrate 10.

In some embodiments, the display substrate 100 further includes an encapsulation layer 18 disposed on a side of the plurality of sub-pixels P away from the substrate 10 for encapsulating the display substrate 100. The encapsulation layer 18 may be an encapsulation film or an encapsulation substrate.

For example, as shown in fig. 3, in the case that the encapsulation layer 18 is an encapsulation film, the encapsulation layer 18 at least includes a first inorganic barrier layer 181, an organic barrier layer 182, and a second inorganic barrier layer 183, the first inorganic barrier layer 181 covers a surface of the light emitting device D on a side away from the substrate 10, the organic barrier layer 182 is formed on a side of the first inorganic barrier layer 181 away from the substrate 10, and the second inorganic barrier layer 183 is formed on a side of the organic barrier layer 182 away from the first inorganic barrier layer 181.

The encapsulation layer 18 covers at least the island region a, and the encapsulation layer 18 may or may not cover the bridge region B. Referring again to fig. 3, fig. 3 shows the situation where the encapsulation layer covers the bridge region B. In some embodiments, in the case that the encapsulation layer 18 covers the bridge region B, referring to fig. 4, the first inorganic barrier layer 181 and the second inorganic barrier layer 183 in the encapsulation layer 8 cover the bridge region B, and the organic barrier layer 182 in the encapsulation layer 8 does not cover the bridge region B.

The first inorganic barrier layer 181 and the second inorganic barrier layer 183 have the functions of blocking moisture and oxygen, and the organic barrier layer 182 has certain flexibility and the functions of absorbing moisture, so that the formed encapsulation layer 18 can make the display substrate 100 achieve a good encapsulation effect, and the phenomenon of encapsulation failure is not easy to occur.

In some embodiments, as shown in fig. 1 to 5, the display substrate 100 further includes a plurality of inspection lines 19 disposed on a side of the encapsulation layer 18 away from the substrate 10. Referring to fig. 1, 2 and 5, the length extending direction Q of each of the detecting lines 19 is parallel to or forms an acute angle with the stretchable direction of the display substrate 100.

In some embodiments, the inspection lines 19 are in contact with the surface of the display substrate 100, so that the inspection lines 19 are directly attached to the surface of the display substrate 100, which facilitates the deformation of the inspection lines 19 along with the deformation of the surface of the display substrate 100.

In the embodiment of the present disclosure, by using the above-described sensing lines 19, in the case where the display substrate 100 is stretched in the stretchable direction, the sensing lines 19 are mechanically deformed in accordance with the deformation of the surface of the display substrate 100, causing a change in the resistance value of the sensing lines 19, for example, the greater the deformation of the surface of the display substrate 100, the greater the change in the resistance value of the sensing lines 19. By using the resistance strain effect of the metal, the stretching amount of the display substrate 100 can be determined according to the detected resistance value variation of the detection line 19, and the compensation amount for the display parameters of each area of the display substrate 100 is determined through a corresponding algorithm, so that the display problems of color cast, uneven brightness and the like after the display substrate 100 is stretched are solved.

Here, the amount of change in the resistance value of the detection line 19 is a difference between the detected resistance value of the detection line 19 and the resistance value of the detection line 19 when no deformation or damage has occurred.

In some embodiments, the detection line 19 may also be used to detect a Crack (Crack) condition of the display substrate 100.

For example, in the case where the display substrate 100 is damaged, the bridge area B is the most easily broken area, and since the sensing line 19 passes through the bridge area B, it is possible to detect the breakage (Crack) of the display substrate 100 by detecting a change in the resistance value of the sensing line 19. For example, when it is detected that the variation of the resistance value of the detection line 19 exceeds a set threshold, it is determined that the bridge region B through which the detection line 19 passes has a fracture problem. In this case, the fracture degree of the bridge area B through which the detection line 19 passes may be further determined based on the difference between the resistance value variation of the detection line 19 and the set threshold, and the larger the difference is, the larger the fracture degree is; when the detecting line 19 is completely opened, the resistance value variation of the detecting line 19 reaches the maximum, and the difference between the resistance value variation and the set threshold value also reaches the maximum, at which the breakage degree of the detecting line 19 is the maximum.

Wherein the threshold value is a reference value set based on the difference between the resistance value when the detection line 19 is damaged or broken and the resistance value when the detection line 19 is not damaged or broken; the set threshold may be much larger than the amount of resistance change when the detection wire 19 is stretched to the maximum deformation.

The damage condition of the display substrate 100 is detected by using the detection lines 19, so that the detection efficiency of the display substrate 100 can be improved, the subsequent process of the damaged display substrate 100 is avoided, the process loss is reduced, and the productivity is saved.

For example, after the display substrate 100 is manufactured, the display substrate 100 is generally peeled off from the rigid substrate by using a Laser Lift Off (LLO) process. In the laser lift-off process and the subsequent cutting process, the bridge region B is fragile and easy to damage, and further, water vapor enters from the damaged part to cause the failure of the island region A. The fracture (Crack) condition of the display substrate 100 is detected by detecting the resistance value change of the corresponding detection line 19, so that the detection efficiency of the display substrate 100 is improved, the subsequent module process of the damaged display substrate 100 is avoided, the process loss is reduced, and the productivity is saved.

In some embodiments, the plurality of island regions a on the display substrate 100 may be arranged in an array, and other arrangements may also be designed. The stretching direction suitable for the display substrate 100 is determined according to the arrangement of the island regions a to ensure the stretching effect of the display substrate 100 in the stretching direction.

For example, as shown in fig. 1 and 2, a plurality of island regions a are arranged in an array, the stretchable direction of the display substrate 100 may be a row direction parallel to the plurality of island regions a, and each of the sensing lines 19 passes through each of the island regions a of the same row and the bridge region B between the island regions a; as shown in fig. 4, the stretchable direction of the display substrate 100 may also be a column direction in which a plurality of island regions a are arranged in parallel, each detection line 19 passing through each island region a of the same column and a bridge region B between the island regions a; further, the stretchable direction of the display substrate 100 may also be an oblique direction, and accordingly, the length extending direction Q of each sensing line 19 is arranged to be an oblique direction (not shown in the drawings).

Illustratively, as shown in fig. 1 and 2, the longitudinal extension directions Q of any two detection lines 19 are parallel to each other, so that the detection lines 19 are uniformly arranged on the display substrate 100, and further, along with the deformation of each area on the surface of the display substrate 100, each area of the detection lines 19 is deformed correspondingly.

In some embodiments, as shown in FIG. 2, the sensing wire 19 includes a plurality of deformations 191 located in the bridge region B and a plurality of connections 192 located in the island region A, the plurality of deformations and the plurality of connections being alternately arranged and sequentially connected in series.

The main deformation area of the stretched display substrate 100 is located in the bridge area B, and the deformation of the bridge area B causes the deformation of the deformation portion of the detection line 19. The structure of the island region a includes the above-mentioned film layers, and the rigidity of each film layer is greater than that of the bridge region, so that the deformation of each island region a after the display substrate 100 is stretched is negligible (i.e., the deformation of the connecting portion is negligible).

In some embodiments, as shown in fig. 2, a plurality of bridge regions B are connected between two adjacent island regions a, and accordingly, the deformation portion of the detection line 19 includes a plurality of deformation line segments 191A, and at least one deformation line segment 191A is disposed in one bridge region B, so that each bridge region B is deformed by the deformation line segment 191A therein.

For example, as shown in fig. 2, the connection portions 192 may be disposed along the edge of the island a, which may save the material usage of the sensing lines 19 compared to the case where the connection portions 192 cover the island a; the connecting portion 192 connects the adjacent two deformation portions 191, and plays a role of transmitting an electrical signal. For example, the connecting portion 192 is disposed around the island a in a circle, which can ensure good electrical signal transmission without using excessive material.

In some embodiments, the at least two deformation line segments 191A are respectively located on two sides of the central axis E of the detection line 19 along the length extension direction Q, and the deformation line segments 191A on two sides deform when the detection line 19 is stretched, so that the detection line 19 deforms uniformly, and the fracture failure caused by too large deformation of the local area of the detection line 19 is avoided.

Illustratively, as shown in fig. 2, two deformation line segments 191A are respectively located at two sides of the central axis E of the detection line 19 along the length extending direction Q thereof, and the two deformation line segments 191A are symmetrically arranged by taking the central axis E of the detection line 19 along the length extending direction Q thereof as a symmetry axis, so that the two deformation line segments 191A are uniformly deformed.

In some embodiments, as shown in fig. 1 and 5, the display substrate 100 further includes a plurality of sets of reference resistors disposed on the substrate 10 and located at an edge region of the display substrate 100, each set of reference resistors including a first reference resistor 21, a second reference resistor 22, and a third reference resistor 23.

The first reference resistor 21 and the second reference resistor 22 are connected in series, and the third reference resistor 23 and the detection line 19 are connected in series. The first reference resistor 21 and the second reference resistor 22 connected in series are connected in parallel with the third reference resistor 23 and one detection line 19 connected in series to form four arms in an equivalent circuit diagram of a bridge circuit shown in fig. 5.

In the embodiment of the present disclosure, a first reference resistor 21, a second reference resistor 22 and a third reference resistor 23 are connected to the detection line 19 to form a bridge circuit. According to the principle that a change in the resistance value of any one of the reference resistors in the bridge circuit causes a change in the output voltage value of the bridge circuit, the change in the resistance value of the detection wire 19 is determined by detecting the change in the output voltage value of the bridge circuit.

It should be noted that the bridge region B may be covered by the encapsulation layer 18, or may not be covered by the encapsulation layer 18.

In some embodiments, the display substrate 100 further includes a plurality of conductive layers disposed on the substrate 10, the plurality of conductive layers being used to form at least a portion of the plurality of sub-pixels P. The multi-layer conductive layer may include a gate conductive layer where the gate electrode is located, a source drain conductive layer where the source electrode 124 and the drain electrode 125 are located, and the like. As shown in fig. 4, the at least one conductive layer includes a sensing electrode 20 located at bridge region B, with the encapsulation layer 18 covering bridge region B. Illustratively, the detection electrode 20 is located on the source-drain conductive layer where the source electrode 124 and the drain electrode 125 are located, and the detection electrode 20 is disposed between the buffer layer 11 and the encapsulation layer 18.

The orthographic projection of the detection electrode 20 on the substrate 10 and the orthographic projection of the detection line 19 on the substrate 10 at least partially overlap, so that the detection electrode 20 and the detection line 19 form capacitance.

In the embodiment of the present disclosure, by using the capacitance formed by the detection electrode 20 and the detection line 19, the bridge region B is deformed when the display substrate 100 is stretched along the stretching direction, and each region of the detection line 19 is mechanically deformed corresponding to the deformation of the bridge region B, which results in a change of an orthographic projection area of the detection line 19 on the substrate 10, and further results in a change of an area of an overlapping portion of the detection line 19 and the detection electrode 20, and a capacitance value of the capacitance is changed. By using the principle, the stretching amount of the display substrate 100 can be determined according to the detected capacitance value variation of the capacitor, and the compensation amount of the display parameters of each area of the display substrate 100 can be determined through a corresponding algorithm, so that the display problems of color cast, uneven brightness and the like after the display substrate 100 is stretched are solved.

Illustratively, the inspection line 19 includes a laminated structure formed of a plurality of layers of metal materials, such as titanium, aluminum, and titanium sequentially deposited; the material of the inspection line 19 may also include a conductive composite material formed by carbon nanotubes and polydimethylsiloxane, and the inspection line 19 formed by using the conductive composite material has better tensile property and can protect the stretchable display substrate 100 to a certain extent, compared with a laminated structure formed by multiple layers of metal materials. Embodiments of the present disclosure are not limited thereto.

The present disclosure also provides a display device 200, where the display device 200 may be an electroluminescent display device, and the electroluminescent display device may be an Organic Light-Emitting display device (OLED) or a Quantum Dot electroluminescent display device (QLED).

In some embodiments, as shown in fig. 6 and 7, the electroluminescent display device includes a display substrate 100, a driving Circuit board 300, and a Flexible Printed Circuit (FPC) 400, and the display substrate 100 and the driving Circuit board 300 are connected through the FPC 400.

In the case where four bridge arms of a bridge circuit are provided in the display substrate 100, the driving circuit board 300 further includes a power supply U, a switch K, and a galvanometer G connected to the four bridge arms. In the four arms of the bridge circuit, a power supply U is connected between a common end a of a first reference resistor 21 and a third reference resistor 23 and a common end c of a second reference resistor 22 and a detection line 19; a galvanometer G is connected between a common terminal b of the first reference resistor 21 and the second reference resistor 22 and a common terminal d of the third reference resistor 23 and the sensing line 19 for detecting a voltage value change caused by a resistance value change of the sensing line 19.

The display substrate 100 herein can determine the stretching amount of the display substrate 100 according to the detected variation of the resistance value of the detection line 19, and determine the compensation amount of the display parameter of each area of the display substrate 100 through a corresponding algorithm, thereby solving the display problems of color cast, non-uniformity of brightness, etc. after the display substrate 100 is stretched.

In some embodiments, the display device 200 may be a top emission type display device, in which case the anode D1 near the substrate 10 is opaque and the cathode D3 far from the substrate 10 is transparent or translucent. Light is emitted from the light-emitting layer D2 and exits through the cathode D3 in a direction away from the substrate 10.

The display device 200 described above may be any device that displays images, whether in motion (e.g., video) or stationary (e.g., still images), and whether textual or textual. More particularly, it is contemplated that the embodiments may be implemented in or associated with a variety of electronic devices such as, but not limited to, mobile telephones, wireless devices, Personal Data Assistants (PDAs), hand-held or portable computers, GPS receivers/navigators, cameras, MP4 video players, camcorders, game consoles, wrist watches, clocks, calculators, television monitors, flat panel displays, computer monitors, auto displays (e.g., odometer display, etc.), navigators, cockpit controls and/or displays, displays of camera views (e.g., of a rear view camera in a vehicle), electronic photographs, electronic billboards or signs, projectors, architectural structures, packaging, and aesthetic structures (e.g., a display of images for a piece of jewelry), and so forth.

The embodiment of the present disclosure further provides a compensation method of a display device, as shown in fig. 8, the compensation method includes the following steps S1 to S4:

s1: the detection display device 200 detects the resistance value variation of the line 19 when it is pulled.

For example, when the display device 200 is stretched, the detection lines 19 are deformed by the deformation of the surface of the display substrate 100, and the resistance value changes. The change in the voltage value caused by the change in the resistance value of the detection wire 19 is detected by a galvanometer on the drive circuit board in the bridge circuit. The resistance value variation of the detection line 19 is obtained from the correspondence between the voltage value variation and the resistance value variation.

S2: the total amount of stretching of the detection wire 19 is determined based on the correspondence between the amount of change in the resistance value and the total amount of stretching.

Illustratively, the total stretching amount of the sensing wires 19, that is, the total stretching amount of the sensing wires 19 in the corresponding areas of the display substrate 100, is determined according to the corresponding relationship between the resistance value variation and the total stretching amount.

S3: the amount of stretching in each region of the detecting wire 19 is determined based on the correspondence between the total amount of stretching in the detecting wire 19 and the amount of stretching in each region of the detecting wire 19.

Wherein, ANSYS finite element analysis software is adopted to simulate the stretching amount of the display substrate 100, and the corresponding relation between the total stretching amount of the detection line 19 and the stretching amount of each area of the detection line 19 is obtained. The total amount of stretching passing through the inspection line 19 is compared with the simulation results, and the amount of stretching in each region of the inspection line 19 is determined.

S4: the subpixels P located in the corresponding island regions a in the display device 200 are compensated for by the amount of stretching of each region of the detection lines 19.

For example, as shown in fig. 1 and 2, the edge portion of the display substrate 100 does not have the empty region C, so the structural strength of the edge portion is higher than that of the middle portion, and the stretching amount of each portion of the display substrate 100 after stretching is different (i.e., the stretching amount of each region of the inspection line 19 is different). For example, the detection line 19 in the nth row has the largest variation in resistance value, and accordingly, the detection lines 19 in the previous row and the detection lines 19 in the subsequent row have smaller variation in resistance value than the detection lines 19 in the nth row. Correspondingly, the region of the display substrate 100 where the detection line 19 in the nth row is located is the region with the largest stretching amount, so that the sub-pixels P located in the corresponding island region a in the display substrate 100 are compensated for the corresponding brightness and chromaticity or any one of the two parameters according to the stretching amount of each region of the detection line 19 in the nth row.

For example, the change rate of the resistance value of the inspection line 19 (i.e., R (1+ Δ) after R change) may be determined as the compensation times of the luminance and/or the chromaticity. Corresponding compensation can also be performed according to the stretching amount of each area of the detection line 19.

The embodiment of the present disclosure further provides a method for manufacturing a display substrate, as shown in fig. 9, the method includes the following steps S1 to S3:

s1: a backplane is prepared and a plurality of subpixels P are formed on the backplane.

Illustratively, as shown in fig. 10, the preparation of the back sheet includes the following steps: providing a substrate 10, forming a buffer layer 11 on one side of the substrate 10, and dividing a plurality of setting areas of an island area A, a bridge area B and a vacant area C on the buffer layer 11; forming a plurality of sub-pixels P on a side of the buffer layer 11 away from the substrate 10, wherein at least one sub-pixel P is arranged in one island region a, at least one signal line L is arranged in one bridge region B, and one sub-pixel P is coupled with at least one signal line L; each of the sub-pixels P includes a pixel driving circuit disposed on a side of the buffer layer 11 away from the substrate 10, each of the pixel driving circuits includes a plurality of thin film transistors 12, and each of the thin film transistors 12 includes a first gate electrode 121, a second gate electrode 122, an active layer 123, a source electrode 124, and a drain electrode 125. A planarization layer 16 is then formed on the side of the plurality of pixel driving circuits remote from the substrate 10, the planarization layer 16 having vias formed therein.

For example, in the case that the bridge region B is provided with the detection electrode 20, as shown in fig. 10, the source electrode 124, the drain electrode 125, and the detection electrode 20 may be formed at the same time by a single patterning process, that is, the detection electrode 20 is located on the source-drain conductive layer where the source electrode 124 and the drain electrode 125 are located.

Illustratively, as shown in fig. 10, anodes D1 of a plurality of light-emitting devices D are formed on a side of the planarization layer 16 away from the substrate 10; an anode D1 is disposed in one sub-pixel P, and the anode D1 is electrically connected to the source 124 or the drain 125 of the thin film transistor 12, which is a driving transistor, among the plurality of thin film transistors 12 included in the pixel driving circuit through a via hole in the planarization layer 16.

Illustratively, as shown in fig. 11, a pixel defining layer 17 is formed on the side of the anode D1 away from the substrate 10 by a patterning process, wherein the pixel defining layer 17 includes a plurality of open regions, and one open region corresponds to one sub-pixel P. A spacer layer 171 is formed on the surface of the pixel defining layer 17 on the side away from the substrate 10, and the spacer layer 171 protrudes in a direction away from the substrate 10.

Illustratively, as shown in fig. 12, the light-emitting layer D2 is formed on the side of the pixel defining layer 17 away from the substrate 10 by an evaporation process. At least a part of the light emitting layer D2 is located within one opening region, that is, a part or all of the light emitting layer D2 is located within one opening region. For example, the light emitting layer D2 covers the opening region, and the edge thereof overlaps the side of the pixel defining layer 17 away from the substrate 10.

Illustratively, as shown in fig. 13, a cathode D3 is formed on a side of the light emitting layer D2 away from the substrate 10 by an evaporation process.

S2: an encapsulation layer 18 is formed on a side of the plurality of sub-pixels P remote from the substrate 10.

For example, as shown in fig. 14, an encapsulation layer 18 is formed on a side of the pixel defining layer 17 away from the substrate 10, the encapsulation layer 18 at least includes a first inorganic barrier layer 181, an organic barrier layer 182, and a second inorganic barrier layer 183, the first inorganic barrier layer 181 is in contact with a surface of the display substrate 100 to be formed, the organic barrier layer 182 is formed on a side of the first inorganic barrier layer 181 away from the substrate 10, and the second inorganic barrier layer 183 is formed on a side of the organic barrier layer 182 away from the first inorganic barrier layer 181.

S3: a plurality of inspection lines 19 are formed on the side of the encapsulation layer 18 remote from the substrate 10.

In some embodiments, as shown in fig. 15, a detection film 190 is formed on the side of the encapsulation layer 18 away from the substrate 10 by using a thin film deposition process, and the detection film 190 is attached to the surface of the encapsulation layer 18 away from the substrate 10. For example, the detection film 190 may be formed by sequentially depositing titanium, aluminum, and titanium metal materials in a low temperature environment.

In some embodiments, as shown in FIG. 16, the inspection film 190 is patterned to form inspection lines 19 using a patterning process.

In the case where the display substrate 100 further includes a reference resistor, the step S3 further includes forming a plurality of sets of reference resistors in the edge area of the display substrate 100. That is, the sensing lines 19 and the sets of reference resistors are formed simultaneously using a thin film deposition process.

Illustratively, as shown in fig. 17, a plurality of sets of reference resistors in a line shape are formed in the edge area of the display substrate 100 by depositing a metal material through the same thin film deposition process as the inspection line 19, and each set of reference resistors includes a first reference resistor 21, a second reference resistor 22, and a third reference resistor 23.

The above description is only for the specific embodiments of the present disclosure, but the scope of the present disclosure is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present disclosure, and all the changes or substitutions should be covered within the scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be subject to the protection scope of the claims.

Claims

1. A display substrate having a plurality of islands and a bridge region, the bridge region being connected between two adjacent islands, the display substrate comprising:

a substrate;

a plurality of sub-pixels disposed on the substrate, at least one sub-pixel disposed in an island region, at least one signal line disposed in a bridge region, and at least one sub-pixel coupled to the at least one signal line;

the packaging layer is arranged on one side, far away from the substrate, of the plurality of sub-pixels;

the detection lines are arranged on one side, away from the substrate, of the packaging layer, the length extension direction of the detection lines is parallel to or forms an acute angle with the stretching direction of the display substrate, and the detection lines are configured to deform to generate resistance value changes under the condition that the display substrate is stretched along the stretching direction;

wherein the plurality of island regions are arranged in an array; the stretchable direction is parallel to the row direction of the plurality of island regions, and one detection line passes through a bridge region between the island regions in the same row; and/or, the stretchable direction is parallel to the column direction of the plurality of island regions arranged, and one of the detection lines passes through the bridge region between the island regions in the same column;

the length extension directions of any two detection lines are parallel to each other.

2. The display substrate according to claim 1, wherein the detection lines comprise a plurality of deformation portions located at the bridge regions, and a plurality of connection portions located at the island regions;

the deformation parts and the connecting parts are alternately arranged and are sequentially connected in series.

3. The display substrate according to claim 2, wherein the deformation portion comprises a plurality of deformation line segments;

at least two deformation line segments are respectively positioned on two sides of a central axis of the detection line along the length extension direction of the detection line.

4. The display substrate according to claim 3, wherein the connection portion is provided along an edge of the island region.

5. The display substrate of any one of claims 1 to 4, further comprising a plurality of conductive layers disposed on the substrate, the plurality of conductive layers forming at least a portion of the plurality of sub-pixels;

at least one conductive layer comprises a detection electrode positioned in the bridge area, and the orthographic projection of the detection electrode on the substrate at least partially overlaps with the orthographic projection of the detection line on the substrate, so that the detection electrode and the detection line form capacitance.

6. The display substrate of claim 5, further comprising:

the first reference resistor, the second reference resistor and the third reference resistor are arranged on the substrate and located in the edge area of the display substrate;

the first reference resistor and the second reference resistor are connected in series; the third reference resistor is connected in series with the detection line; the first and second reference resistances in series are connected in parallel with the third reference resistance and the sensing line in series.

7. The display substrate according to claim 1, wherein the inspection lines comprise a stacked structure formed of a plurality of layers of metal materials; or the like, or, alternatively,

the material of the detection line comprises a conductive composite material formed by carbon nano tubes and polydimethylsiloxane.

8. A display device comprising the display substrate according to any one of claims 1 to 7.

9. A compensation method of a display device according to claim 8, wherein the compensation method comprises: