CN111580341B - Imprinting apparatus and imprinting method - Google Patents
Imprinting apparatus and imprinting method Download PDFInfo
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- CN111580341B CN111580341B CN202010503877.8A CN202010503877A CN111580341B CN 111580341 B CN111580341 B CN 111580341B CN 202010503877 A CN202010503877 A CN 202010503877A CN 111580341 B CN111580341 B CN 111580341B
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- wheel
- groove
- grooves
- side edge
- molding material
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
The invention provides an imprinting apparatus and an imprinting method. The embossing equipment comprises a carrier and an embossing roller, wherein the carrier is provided with a bearing surface and a side edge part connected with the bearing surface, the side edge part is provided with a drainage surface, and the drainage surface is inclined to the bearing surface. The embossing roller is configured to move in a direction parallel to the receiving surface and roll the layer of embossing material. The embossing roller above the side edge portion is adapted to move toward the hydrophobic surface and press the molding material layer to separate the molding material layer into a molding material portion and a remainder portion. The remainder is adapted to be spaced apart from the molding material portion along the hydrophobic surface, and the molding material portion forms an imprint mold.
Description
Technical Field
The present invention relates to imprinting technology, and more particularly, to an imprinting apparatus and an imprinting method.
Background
Currently, common Lithography technologies include electron beam Lithography (Electronic Beam Lithography), ion beam Lithography (Ion Beam Lithography), extreme ultraviolet Lithography (Extreme Ultraviolet Lithography) and nanoimprint Lithography (Nanoimprint Lithography), in which nanoimprint Lithography is not limited by an optical diffraction limit, and has the characteristics of high resolution, high speed and low cost, so that the application fields thereof are quite wide.
In detail, a known method of nanoimprint lithography may include: the method comprises the steps of manufacturing an imprinting mold, coating an adhesive layer on a carrier, transferring an imprinting pattern of the imprinting mold to a softened adhesive layer by using the imprinting mold, curing the patterned adhesive layer, removing the imprinting mold, and etching a specific material (such as metal) film layer by using the cured adhesive layer as a mask to form a required patterning structure. However, during the manufacturing process of the imprint mold (imprinting mold), excessive imprint material is easily accumulated in the surrounding area other than the master mold (master mold) by rolling of the imprint roller, so that the flatness of the imprint mold after curing is poor, and the overall yield of the subsequent nanoimprint process using the imprint mold is reduced.
Disclosure of Invention
The invention provides an imprinting device and an imprinting method, and an imprinting mold manufactured by the imprinting device has better imprinting quality.
The imprinting apparatus of the present invention is suitable for manufacturing imprinting molds and comprises a stage and an imprinting roller. The carrier has a receiving surface and a side edge portion connected to the receiving surface. The side edge part is provided with a drainage surface which is inclined to the bearing surface. The embossing roller is configured to move in a direction parallel to the receiving surface and roll the layer of embossing material. The embossing roller above the side edge portion is adapted to move toward the hydrophobic surface and press the molding material layer to separate the molding material layer into a molding material portion and a remainder portion. The remainder is adapted to be spaced apart from the molding material portion along the hydrophobic surface, and the molding material portion forms an imprint mold.
In an embodiment of the invention, the embossing apparatus further includes a guide vane disposed at a side edge of the stage. The guide vane is provided with a drainage surface, and the side edge of the guide vane away from the bearing surface protrudes from the side edge part.
In an embodiment of the invention, a hydrophobic surface of the deflector of the embossing device is provided with a plurality of diversion trenches.
In an embodiment of the present invention, the cross-sectional profile of the hydrophobic surface of the imprint apparatus described above includes a curve or a fold line.
In an embodiment of the invention, the embossing apparatus further includes a gumming wheel disposed at a side of the side edge facing away from the hydrophobic surface. The gumming wheel is provided with a rotating shaft and a wheel surface surrounding the rotating shaft. The side edge of the drainage surface far away from the bearing surface is overlapped with the wheel surface of the gumming wheel, and the wheel surface is suitable for rotating according to the rotating shaft to drive the residual material part to leave the drainage surface.
In an embodiment of the present invention, a portion of the de-gumming wheel of the embossing device overlapping the hydrophobic surface has a width in a direction, and a ratio of the width to a radius of a circle of the de-gumming wheel is greater than or equal to 0.5 and less than or equal to 1.5.
In an embodiment of the invention, the de-gumming wheel of the embossing device further has a plurality of grooves disposed around the rotating shaft. Any two adjacent grooves are offset from each other in the rotation direction of the gumming wheel, and the remainder is suitable for flowing into the grooves.
In an embodiment of the present invention, the plurality of grooves of the imprint apparatus extend in a direction parallel to the rotation axis. The grooves include a first groove, a second groove and a third groove which are sequentially arranged in the rotation direction and are adjacent to each other. The first groove and the second groove have a first interval in the rotation direction, the second groove and the third groove have a second interval in the rotation direction, and the first interval is not equal to the second interval.
In an embodiment of the invention, the de-gumming wheel of the imprinting apparatus further has a plurality of through holes and through holes. The through holes are respectively communicated with the grooves, and the through holes are communicated with the through holes. The through hole extends in the axial direction of the rotating shaft, and the rotating shaft passes through the through hole. The through hole is connected to the suction pump. The suction pump is configured to generate a suction air flow, and the suction air flow is suitable for driving the residual material flowing into the grooves to be removed from the rubber removing wheel through the through holes and the through holes.
In an embodiment of the invention, the embossing apparatus further includes an actuator configured to drive the gumming wheel to rotate along the rotation axis.
In an embodiment of the invention, the embossing apparatus further includes a scraper disposed on a side of the de-gumming wheel away from the hydrophobic surface, and the scraper contacts a tread of the de-gumming wheel.
The embossing method is suitable for embossing equipment, and the embossing equipment comprises a carrier, a guide vane and an embossing roller. The carrier has a receiving surface and a side portion. The guide vane is arranged at the side edge part and provided with a drainage surface connected with the bearing surface. The embossing method includes coating the pressing mold material layer on the bearing surface of the carrier and covering the mother mold, moving the embossing roller towards the side edge in the direction parallel to the bearing surface and rolling the pressing mold material layer, and the embossing roller stays above the water draining surface after moving to the side edge, and moving the embossing roller towards the water draining surface and extruding the pressing mold material layer to separate the pressing mold material layer into pressing mold material part and residual material part. The remainder is adapted to be remote from the molding material portion along the hydrophobic surface.
In an embodiment of the invention, the embossing method further includes rotating the gumming wheel and driving the remainder to leave the hydrophobic surface. The glue removing wheel is overlapped on the side edge of the drainage surface far away from the bearing surface.
In an embodiment of the present invention, the imprinting method further includes moving the de-gumming wheel in a direction away from a side edge of the hydrophobic surface after the remainder leaves the de-gumming wheel, and storing the de-gumming wheel in the groove of the carrier.
In an embodiment of the present invention, the embossing method further includes moving the embossing roller away from the carrier after the remainder leaves the hydrophobic surface, so that an edge of the molding material portion near the guide vane is separated from the receiving surface of the carrier or the hydrophobic surface of the guide vane.
In an embodiment of the present invention, the de-gumming wheel of the stamping method rotates around a rotation axis, and has a plurality of grooves disposed around the rotation axis. Any two adjacent grooves are offset from each other in the rotation direction of the gumming wheel, and the remainder is suitable for flowing into the grooves.
In view of the foregoing, in the imprint apparatus and the imprint method according to an embodiment of the present invention, the side portion of the stage is provided with the hydrophobic surface, and the imprint roller is adapted to move toward the hydrophobic surface at the side portion and press the stamper material layer coated on the stage, so that the remainder portion is separated from the stamper material portion forming the imprint mold along the hydrophobic surface. Therefore, the flatness of the stamping die can be effectively improved, and the overall yield of the subsequent stamping process is improved.
Drawings
Fig. 1 is a schematic cross-sectional view of an imprint apparatus of a first embodiment of the present invention.
Fig. 2 is an enlarged schematic view of a partial region of the imprint apparatus of fig. 1.
Fig. 3A to 3G are schematic cross-sectional views of an operation flow of the imprint apparatus of fig. 1.
Fig. 4 is an enlarged schematic view of the stripper wheel of fig. 1.
Fig. 5 is a schematic cross-sectional view of the stripper wheel of fig. 1.
Fig. 6 is a schematic top view of the stripper wheel of fig. 1.
Fig. 7 is a schematic cross-sectional view of an imprint apparatus of a second embodiment of the present invention.
Fig. 8 is a schematic cross-sectional view of an imprint apparatus of a third embodiment of the present invention.
Fig. 9 is a schematic top view of a stripper wheel according to another embodiment of the present invention.
The reference numerals are as follows:
10. 11, 12 stamping device
100. 100A, 100B stage
100rs groove
100s bearing surface
101. 101A, 101B side edge portions
101s, 101s1, 120s hydrophobic surface
120 flow deflector
120g of flow guiding groove
130. 130A glue removing wheel
130b bottom surface
130c inclined plane
130r, 130r-1, 130r-2, 130r-3, 130r-A grooves
130s wheel surface
130s1 side edge
131. 131A through hole
132 through hole
140 actuation element
141 support arm
141p airflow pipeline
150 actuator
160 scraper blade
165 tray
200 embossing roller
300 imprinting material layer
300a imprint material portion
300ae edge
300b remainder
301 substrate
400 ultraviolet light source
D1, D2, D1', D2': direction
IM (instant Messaging) stamping die
Length L
MM: female die
PS concave-convex structure
Radius of circle R
RA rotating shaft
RD rotation direction
S1, S2, S3 spacing
W, W1 width W2W 3
Theta is the included angle
Detailed Description
As used herein, "about," "approximately," "essentially," or "substantially" includes both the recited values and average values within an acceptable deviation of the particular values determined by one of ordinary skill in the art, taking into account the particular number of measurements and errors associated with the measurements (i.e., limitations of the measurement system) in question. For example, "about" may mean within one or more standard deviations of the stated values, or within, for example, ±30%, ±20%, ±15%, ±10%, ±5%. Further, as used herein, "about," "approximately," "essentially," or "substantially" may be used to select a range of more acceptable deviations or standard deviations depending on the measured, cut, or other property, and not one standard deviation may be used for all properties.
In the drawings, the thickness of layers, films, panels, regions, etc. are exaggerated for clarity. It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to physical and/or electrical connection. Furthermore, "electrically connected" may be used in a manner that other elements are present between the two elements.
Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers will be used throughout the drawings and the description to refer to the same or like parts.
Fig. 1 is a schematic cross-sectional view of an imprint apparatus of a first embodiment of the present invention. Fig. 2 is an enlarged schematic view of a partial region of the imprint apparatus of fig. 1. Fig. 3A to 3G are schematic cross-sectional views of an operation flow of the imprint apparatus of fig. 1. Fig. 4 is an enlarged schematic view of the stripper wheel of fig. 1. Fig. 5 is a schematic cross-sectional view of the stripper wheel of fig. 1. Fig. 6 is a schematic top view of the stripper wheel of fig. 1. Specifically, for clarity of presentation, fig. 2 shows only the side edge 101 of the carrier 100 and the baffle 120 of fig. 1, fig. 1 omits the grooves 130r and the through holes 131 of fig. 5, and fig. 3A to 3G omit the air flow duct 141p of fig. 1.
Referring to fig. 1, the imprint apparatus 10 includes a stage 100 and an imprint roller 200. The carrier 100 has a receiving surface 100s and a side portion 101 connected to the receiving surface 100s. In the present embodiment, the embossing apparatus 10 may further optionally include a guide vane 120 disposed at the side portion 101 of the carrier 100, and a side edge of the guide vane 120 away from the receiving surface 100s protrudes from the side portion 101, but the invention is not limited thereto. Specifically, the guide vane 120 has a hydrophobic surface 120s, and the hydrophobic surface 120s is inclined with respect to the receiving surface 100s of the carrier 100. For example, the cross-sectional profile of the hydrophobic surface 120s may be a curve curved away from the receiving surface 100s, but the invention is not limited thereto.
In this embodiment, one end of the hydrophobic surface 120s may be selectively aligned with the receiving surface 100s of the carrier 100. However, the present invention is not limited thereto, and according to other embodiments, there may be a step between the drain surface 120s and the receiving surface 100s of the carrier 100, and the drain surface 120s is lower than the receiving surface 100s of the carrier 100. It should be noted that the platen roller 200 is adapted to move in a direction (e.g., direction D2) toward the hydrophobic surface 120s above the side portion 101 of the stage 100, in addition to moving in a direction (e.g., direction D1) parallel to the receiving surface 100s.
For example, the imprint apparatus 10 of the present embodiment is suitable for producing an imprint mold (imprinting mold) used in a nanoimprint process, such as, but not limited to, a flexible imprint mold (flexible imprinting mold). That is, a master mold (master mold) for manufacturing an imprint mold may be placed on the stage 100 of the imprint apparatus 10, and the imprint roller 200 is adapted to roll against an imprint material coated on the master mold, so that an imprint pattern on the master mold is transferred onto a formed imprint material layer. It should be noted that, by the configuration relationship between the hydrophobic surface 120s (or the guide vane 120) and the carrier 100 and the actuation manner of the embossing roller 200, the embossing mold produced by the embossing apparatus 10 of the present embodiment has better flatness, so as to further improve the overall yield of the subsequent embossing process. The flow of manufacturing an imprint mold using the imprint apparatus 10 of the present embodiment will be exemplarily described below.
Referring to fig. 3A, first, a master mold MM is set on a receiving surface 100s of a stage 100 of the imprint apparatus 10. For example, a plurality of concave-convex structures PS may be disposed on a surface of the master mold MM facing away from the receiving surface 100s, and the concave-convex structures PS may be patterned structures with nanometer dimensions. In the present embodiment, the concave-convex structures PS are, for example, a plurality of convex structures arranged periodically and at equal intervals, but not limited thereto. For example, in the present embodiment, a side edge of the master MM may be aligned with an end surface of the guide 120 near the receiving surface 100s, but the invention is not limited thereto. In other embodiments, the master MM may also cover a portion of the hydrophobic surface 120s near the receiving surface 100s.
Next, a molding material layer 300 is coated on the receiving surface 100s of the carrier 100, and the molding material layer 300 directly covers the master MM and fills up the plurality of concave-convex structures PS. In this embodiment, the material of the master mold MM may include a metal material (e.g., nickel, iron, stainless steel, germanium, titanium, silicon), an inorganic material (e.g., glass, quartz, aluminum oxide), a resin material (e.g., polyimide, polyamide, polyester, polycarbonate, polyphenylene oxide, polyphenylene sulfide, polyacrylate, polymethacrylate, polyarylate, epoxy, silicone), or a carbon material (e.g., diamond, graphite).
Referring to fig. 3B, a substrate 301 is disposed between the platen roller 200 and the molding material layer 300. Next, the platen roller 200 is moved toward the side portion 101 of the stage 100 in a direction (e.g., direction D1) parallel to the receiving surface 100s of the stage 100, and rolls the molding material layer 300. Specifically, the platen roller 200 is moved above the side edge 101 of the stage 100, and then stays at a position overlapping the water-repellent surface 120 s. At this time, the portion of the molding material layer 300 located at the side portion 101 may have a thicker film thickness due to the pressing of the platen roller 200. That is, after the platen roller 200 rolls, more molding material is deposited on the side portion 101 (or the hydrophobic surface 120 s) of the stage 100.
In this embodiment, the substrate 301 is a flexible substrate, and the flexible substrate is made of polyethylene terephthalate (polyethylene terephthalate, PET), polyethylene isophthalate (polyethylene naphthalate, PEN), polyether sulfone (PES), polymethyl methacrylate (polymethyl methacrylate, PMMA), polycarbonate (PC) or Polyimide (PI).
Next, the embossing roller 200 is moved toward the hydrophobic surface 120s (e.g., the direction D2) and presses the molding material layer 300, so that the molding material layer 300 is separated into a molding material portion 300a and a remainder portion 300b, as shown in fig. 3C. At this time, the remainder 300b on the hydrophobic surface 120s flows along the hydrophobic surface 120s and away from the molding material 300a on the receiving surface 100s under the pressing of the platen roller 200. Specifically, since the hydrophobic surface 120s has hydrophobicity, the remainder 300b encounters less resistance during the flowing process, which facilitates removal of the remainder 300b from the side portion 101 of the stage 100. In this embodiment, the hydrophobic surface 120s of the deflector 120 may be further optionally provided with a plurality of deflector grooves 120g (as shown in fig. 2). The flow channel 120g can make the flow path of the remainder 300b more definite, which is helpful to increase the fluidity of the remainder 300b on the deflector 120.
In general, the material of the molding material layer 300 may be a photosensitive resin material, and the viscosity of such a resin material is generally high. In order to further improve the efficiency of removing the remainder 300b of the molding material layer 300 from the side portion 101 of the carrier 100, the imprint apparatus 10 may further include a de-gumming wheel 130, an actuating element 140, and a supporting arm 141. The glue removal wheel 130 is arranged on the side of the side portion 101 facing away from the hydrophobic surface 120 s. In the present embodiment, the carrier 100 may further have a recess 100rs, and the actuating element 140 is disposed in the recess 100 rs. The supporting arm 141 is connected between the actuating element 140 and the removing wheel 130, and the supporting arm 141 is adapted to drive the removing wheel 130 to be received in the recess 100rs or extend from the recess 100rs under the driving of the actuating element 140. For example, the actuating element 140 may include a stepper motor, a servo motor, a linear motor, or other suitable drive motor.
Referring to fig. 3C and 3D, in detail, the de-glue wheel 130 has a rotation axis RA and a wheel surface 130s surrounding the rotation axis RA. A side edge of the drainage surface 120s remote from the receiving surface 100s overlaps the tread 130s of the stripper wheel 130 in the direction D2. In this embodiment, the stamping apparatus 10 may further include an actuator 150 disposed adjacent to one side of the de-gumming wheel 130. For example, the actuator 150 may be a drive wheel, and the drive wheel directly contacts the tread 130s of the stripper wheel 130. That is, the de-glue wheel 130 of the present embodiment cannot rotate by itself, and only needs to be driven by the driving wheel (i.e. the actuator 150) to rotate relative to the rotation shaft RA, but the invention is not limited thereto.
For example, in the present embodiment, the de-glue wheel 130 rotates along the counterclockwise direction (i.e. the direction RD) relative to the rotation axis RA. However, the present invention is not limited thereto, and the de-glue wheel 130 may also rotate in a clockwise direction according to other embodiments. It should be noted that, when a part of the remainder 300b flows from the hydrophobic surface 120s to the tread 130s of the stripping wheel 130, the tread 130s rotating relative to the rotation axis RA drives the part of the remainder 300b away from the deflector 120. In this way, in addition to avoiding the accumulation of molding material on one side edge of the guide vane 120 near the de-glue wheel 130, a part of the remainder 300b on the wheel face 130s can accelerate the flow of another part of the remainder 300b on the hydrophobic surface 120s through the self-adhesion, which is helpful for improving the removal efficiency of the molding material accumulated on the side edge 101.
In the present embodiment, the portion of the gumming roller 130 overlapping the hydrophobic surface 120s in the direction D2 has a width W in the direction D1. By the ratio of the width W to the radius R of the stripper rubber 130 being greater than or equal to 0.5 and less than or equal to 1.5, the stripper rubber 130 can be ensured to effectively drive the molding material (i.e. the remainder 300 b) deposited on the guide vane 120 to be removed from the side portion 101 of the carrier 100. In another aspect, the stamping apparatus 10 can further include a tray 165 and a doctor blade 160 disposed on the tray 165. The scraper 160 is disposed on a side of the de-gumming wheel 130 away from the hydrophobic surface 120s, and directly contacts the tread 130s of the de-gumming wheel 130. It should be noted that the imprint material (i.e., the remainder 300 b) attached to the tread 130s of the de-gumming wheel 130 can flow into the tray 165 via scraping by the scraper 160. Accordingly, it is possible to prevent excessive imprint material from adhering to the tread 130s of the desmear wheel 130 to reduce its adhesion to the imprint material.
Referring to fig. 4 to 6, in the embodiment, the glue removing wheel 130 further includes a through hole 132, a plurality of grooves 130r and a plurality of through holes 131 disposed around the rotation axis RA. The through hole 132 extends in the axial direction of the rotation shaft RA, and the rotation shaft RA passes through the through hole 132. The through holes 131 are connected between the grooves 130r and the through holes 132. The grooves 130r are, for example, groove structures recessed from the tread 130s, and the imprint material (i.e., the remainder 300 b) flowing onto the tread 130s is adapted to flow into the grooves 130 r. In the present embodiment, the through hole 132 may be connected to an external suction pump (not shown) through an air flow pipe 141p in the support arm 141. The pump is configured to generate an attractive air flow, and the attractive air flow is adapted to drive the imprint material flowing into the grooves 130r to be removed from the de-gumming wheel 130 through the through holes 131, the through holes 132 and the air flow channel 141p (shown in fig. 1) of the supporting arm 141 in sequence.
It is noted that these grooves 130r extend in the axial direction of the rotation shaft RA, and that adjacent two grooves 130r are offset from each other in the direction perpendicular to the rotation shaft RA. For example, in the present embodiment, the plurality of grooves 130r includes a first groove 130r-1, a second groove 130r-2 and a third groove 130r-3 sequentially arranged in the rotation direction RD, the first groove 130r-1 and the second groove 130r-2 have a first spacing S1 in the rotation direction RD, the second groove 130r-2 and the third groove 130r-3 have a second spacing S2 in the rotation direction RD, and the first spacing S1 is not equal to the second spacing S2. Accordingly, it is ensured that the de-gumming roller 130 has sufficient roller surface 130s to be attached by the imprint material to be removed. In the present embodiment, the tread 130s of the de-glue wheel 130 may be made of metal (e.g. stainless steel, aluminum), chemical resistant plastic (e.g. polyimide), or other materials with good adhesion to resin materials, but not limited thereto.
On the other hand, the glue removing wheel 130 defines a bottom surface 130b of the groove 130r and the through hole 131 having a width W1 and a width W2, respectively, in a direction perpendicular to the rotation axis RA. The tread 130s defines a side 130s1 of the recess 130r having a width W3 in an axial direction perpendicular to the rotation axis RA. The groove 130r has a length L in the axial direction of the rotation shaft RA, and two adjacent through holes 131 communicating with the same groove 130r have a space S3 in the axial direction of the rotation shaft RA. The glue removing wheel 130 defines an inclined surface 130c and a bottom surface 130b of the groove 130r, which have an included angle θ. In a preferred embodiment, the width W1 of the bottom surface 130b is substantially equal to the width W2 of the through holes 131, the ratio of the space S3 between two adjacent through holes 131 to the length L of the groove 130r is 0.25, the ratio of the width W2 of the through holes 131 to the width W3 of the side edge 130S1 is 0.5, and the included angle θ between the inclined surface 130c and the bottom surface 130b is in the range of 30 degrees to 45 degrees, so that the de-gumming wheel 130 can generate enough suction force to suck the imprint material flowing to the wheel surface 130S into the groove 130r, but the invention is not limited thereto.
Referring to fig. 3E, after the remainder 300b is removed from the stripper wheel 130 by the above-mentioned two methods (i.e. the arrangement of the scraper 160 and the groove 130 r), the stripper wheel 130 is moved toward a direction away from the side edge of the hydrophobic surface 120s (e.g. the direction D1') and is accommodated in the groove 100rs of the carrier 100. Then, the platen roller 200 is moved in a direction away from the stage 100 (e.g., direction D2'). At this time, the molding material portion 300a is separated from the receiving surface 100s of the stage 100 (or the water repellent surface 120s of the baffle 120) near the edge 300ae of the baffle 120. Referring to fig. 3F, the molding material 300a is then cured. For example, in the present embodiment, the curing step of the molding material portion 300a may include sequentially irradiating different areas of the molding material portion 300a along the direction D1 by using an ultraviolet light source 400. Referring to fig. 3G, after the stamper material portion 300a is irradiated with ultraviolet light to form an imprint mold IM usable for an imprint process, a step of drawing the stamper is performed, for example: one end of the substrate 301 is moved along the direction D2' to sequentially separate different regions of the imprint mold IM from the master mold MM. In this case, the imprint mold IM is completed.
It should be noted that, by the cooperation between the embossing roller 200 and the hydrophobic surface 120s, the embossing roller 200 of the present embodiment does not need to limit the embossing pressure used in the process of rolling the molding material layer 300, which is helpful for increasing the process margin of the embossing mold IM. For example, in order to improve the embossing quality, the embossing roller 200 of the present embodiment may use an embossing pressure of 10MPa or more for rolling. Even if more molding material is pressed to the outside of the master MM (e.g., the region of the side portion 101 of the carrier 100), the molding material deposited on the side portion 101 can be removed from the carrier 100 through the hydrophobic surface 120s by the engagement of the platen roller 200 with the hydrophobic surface 120 s.
In the following, another embodiment will be listed to describe the present disclosure in detail, wherein like components will be denoted by like reference numerals, and descriptions of the same technical content will be omitted, and reference is made to the foregoing embodiment for parts, and the description thereof will not be repeated.
Fig. 7 is a schematic cross-sectional view of an imprint apparatus of a second embodiment of the present invention. Referring to fig. 7, the difference between the imprint apparatus 11 of the present embodiment and the imprint apparatus 10 of fig. 1 is that: the hydrophobic surfaces are arranged in different ways. In the present embodiment, the side edge portion 101A of the stage 100A of the imprint apparatus 11 may be directly provided with the water-repellent surface 101s. That is, the stamping apparatus 11 does not have the guide vane 120 of fig. 1. It should be appreciated that in an embodiment not shown, the hydrophobic surface 101s of the side portion 101A may also be provided with a flow guiding groove 120g as shown in fig. 2.
Fig. 8 is a schematic cross-sectional view of an imprint apparatus of a third embodiment of the present invention. Referring to fig. 8, the difference between the imprinting apparatus 12 of the present embodiment and the imprinting apparatus 10 of fig. 1 is that: the configuration of the hydrophobic surface varies. Specifically, the side portion 101B of the imprint apparatus 12 is provided with a hydrophobic surface 101s1 whose cross-sectional profile is in a folded-line shape. More specifically, the cross-sectional profile of the hydrophobic surface 101s1 of the present embodiment is a combination of two straight line segments. However, the invention is not limited thereto, and in other embodiments the cross-sectional profile of the hydrophobic surface may be a combination of straight and curved sections.
Fig. 9 is a schematic top view of a stripper wheel according to another embodiment of the present invention. Referring to fig. 9, the main differences between the de-glue wheel 130A of the present embodiment and the de-glue wheel 130 of fig. 6 are that: the configuration of the grooves of the gumming wheel is different. Specifically, the vertical projection profile of the groove 130r-a of the de-gumming wheel 130A on the wheel surface 130s may be circular, and the plurality of grooves 130r-a are arranged in an array manner on the wheel surface 130s. Since the configuration relationship between the groove 130r-a of the glue removing wheel 130A and other components (such as the through hole and the through hole) is similar to that of the previous embodiment, the detailed description will refer to the relevant paragraphs of the previous embodiment, and will not be repeated here.
In summary, in the imprinting apparatus and the imprinting method according to an embodiment of the invention, the side portion of the stage is provided with the hydrophobic surface, and the imprinting roller is adapted to move toward the hydrophobic surface at the side portion and press the molding material layer coated on the stage, so that the remainder is separated from the molding material portion forming the imprinting mold along the hydrophobic surface. Therefore, the flatness of the stamping die can be effectively improved, and the overall yield of the subsequent stamping process is improved.
Claims (12)
1. An imprint apparatus adapted to manufacture an imprint mold, the imprint apparatus comprising:
the carrier is provided with a bearing surface and a side edge part connected with the bearing surface, wherein the side edge part is provided with a hydrophobic surface, and the hydrophobic surface is inclined to the bearing surface; and
an embossing roller configured to move and roll a molding material layer in a direction parallel to the receiving surface, the embossing roller above the side portion being adapted to move toward the hydrophobic surface and press the molding material layer to separate the molding material layer into a molding material portion and a remainder portion, wherein the remainder portion is adapted to be away from the molding material portion along the hydrophobic surface, and the molding material portion forms the embossing mold;
the rubber removing wheel is arranged on one side of the side edge part, which is away from the water draining surface, and is provided with a rotating shaft and a wheel surface surrounding the rotating shaft, wherein one side edge of the water draining surface, which is away from the bearing surface, is overlapped with the wheel surface of the rubber removing wheel, and the wheel surface is suitable for driving the residual material part to leave the water draining surface by rotating according to the rotating shaft;
the rubber removing wheel is also provided with a plurality of grooves which are arranged around the rotating shaft, any two adjacent grooves are staggered with each other in a rotating direction of the rubber removing wheel, and the residual material part is suitable for flowing into the grooves;
the grooves extend in a direction parallel to the rotating shaft, the grooves comprise a first groove, a second groove and a third groove which are sequentially arranged in the rotating direction and are adjacent to each other, the first groove and the second groove have a first interval in the rotating direction, the second groove and the third groove have a second interval in the rotating direction, and the first interval is not equal to the second interval.
2. The imprinting apparatus of claim 1, further comprising a deflector disposed at the side portion of the stage, wherein the deflector has the hydrophobic surface, and a side edge of the deflector away from the receiving surface protrudes from the side portion.
3. The embossing apparatus of claim 2, wherein the hydrophobic surface of the deflector is provided with a plurality of deflector grooves.
4. The imprint apparatus of claim 1, wherein the cross-sectional profile of the hydrophobic surface comprises a curve or a fold line.
5. The imprint apparatus of claim 1, wherein a portion of the desmear wheel overlapping the hydrophobic surface in a direction of the hydrophobic surface above the side edge portion of the stage has a width in the direction, and a ratio of the width to a radius of a circle of the desmear wheel is equal to or greater than 0.5 and equal to or less than 1.5.
6. The embossing apparatus of claim 1, wherein the de-gumming wheel further has:
a plurality of through holes respectively communicated with the plurality of grooves; and
the through hole is communicated with the through holes, extends in the axial direction of the rotating shaft and passes through the through hole, wherein the through hole is connected to an air pump, the air pump is configured to generate an attractive air flow, and the attractive air flow is suitable for driving the residual material flowing into the grooves to be removed from the rubber removing wheel through the through holes and the through holes.
7. The apparatus of claim 1, further comprising an actuator configured to rotate the de-gumming wheel about the axis of rotation.
8. The imprinting apparatus of claim 1, further comprising a scraper disposed on a side of the de-gumming wheel away from the hydrophobic surface, the scraper contacting the tread of the de-gumming wheel.
9. An imprinting method comprising
Providing a stamping device, wherein the stamping device comprises a carrier, a guide vane and a stamping roller, the carrier is provided with a bearing surface and a side edge part, and the guide vane is arranged on the side edge part and is provided with a hydrophobic surface connected with the bearing surface:
coating a pressing mold material layer on the bearing surface of the carrier and covering a master mold;
moving the embossing roller towards the side edge part in a direction parallel to the bearing surface and rolling the pressing die material layer, wherein the embossing roller stays above the water repellent surface after moving to the side edge part; and
moving the embossing roller towards the hydrophobic surface and extruding the molding material layer to separate the molding material layer into a molding material portion and a remainder portion, wherein the remainder portion is adapted to be separated from the molding material portion along the hydrophobic surface;
rotating a rubber removing wheel and driving the residual material part to leave the drainage surface, wherein the rubber removing wheel is overlapped on one side edge of the drainage surface, which is far away from the bearing surface;
the glue removing wheel rotates according to a rotating shaft, the glue removing wheel is also provided with a plurality of grooves which are arranged around the rotating shaft, any two adjacent grooves are staggered with each other in a rotating direction of the glue removing wheel, and the residual material part is suitable for flowing into the grooves;
the grooves extend in a direction parallel to the rotating shaft, the grooves comprise a first groove, a second groove and a third groove which are sequentially arranged in the rotating direction and are adjacent to each other, the first groove and the second groove have a first interval in the rotating direction, the second groove and the third groove have a second interval in the rotating direction, and the first interval is not equal to the second interval.
10. The embossing method of claim 9, further comprising:
after the remainder leaves the glue removing wheel, the glue removing wheel moves towards the direction away from the side edge of the hydrophobic surface and is accommodated in a groove of the carrier.
11. The embossing method of claim 9, further comprising:
after the remainder leaves the drainage surface, the embossing roller is moved in a direction away from the carrier, so that one edge of the moulding material part, which is close to the guide vane, is separated from the receiving surface of the carrier or the drainage surface of the guide vane.
12. The embossing method of claim 9, wherein any two adjacent ones of the plurality of grooves are offset from each other in a direction of rotation of the stripper wheel, and the remainder is adapted to flow into the plurality of grooves.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW109102731A TWI718856B (en) | 2020-01-30 | 2020-01-30 | Imprinting apparatus and imprinting method |
| TW109102731 | 2020-01-30 |
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| Publication Number | Publication Date |
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| CN111580341A CN111580341A (en) | 2020-08-25 |
| CN111580341B true CN111580341B (en) | 2023-10-13 |
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| CN202010503877.8A Active CN111580341B (en) | 2020-01-30 | 2020-06-05 | Imprinting apparatus and imprinting method |
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| CN (1) | CN111580341B (en) |
| TW (1) | TWI718856B (en) |
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Also Published As
| Publication number | Publication date |
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| TWI718856B (en) | 2021-02-11 |
| TW202128402A (en) | 2021-08-01 |
| CN111580341A (en) | 2020-08-25 |
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