CN111478168A - 一种发射波长228nm全固态激光装置 - Google Patents

一种发射波长228nm全固态激光装置 Download PDF

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CN111478168A
CN111478168A CN202010444819.2A CN202010444819A CN111478168A CN 111478168 A CN111478168 A CN 111478168A CN 202010444819 A CN202010444819 A CN 202010444819A CN 111478168 A CN111478168 A CN 111478168A
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laser
crystal
mirror
mgf
hfo
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李再金
曲轶
李林
乔忠良
赵志斌
曾丽娜
彭鸿雁
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Hainan Normal University
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/0915—Processes or apparatus for excitation, e.g. pumping using optical pumping by incoherent light
    • H01S3/0933—Processes or apparatus for excitation, e.g. pumping using optical pumping by incoherent light of a semiconductor, e.g. light emitting diode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
    • H01S3/109—Frequency multiplication, e.g. harmonic generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1611—Solid materials characterised by an active (lasing) ion rare earth neodymium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/163—Solid materials characterised by a crystal matrix
    • H01S3/1671—Solid materials characterised by a crystal matrix vanadate, niobate, tantalate
    • H01S3/1673—YVO4 [YVO]

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Abstract

本发明公开了一种发射波长228nm全固态激光装置，包括808nm半导体激光器；808nm聚焦镜；Nd:YVO4激光晶体；平面镜；LBO晶体；平凹镜A；BBO晶体；平凹镜B；228nm滤光片。808nm半导体激光器发射的808nm激光通过808nm聚焦镜将808nm激光聚焦到Nd:YVO4激光晶体中，Nd:YVO4激光晶体通过808nm激光泵浦发射914nm激光；914nm激光通过平面镜，再通过LBO倍频晶体倍频产生457nm激光；457nm激光通过平凹镜A反射，再通过BBO倍频晶体产生228nm激光；228nm激光通过平凹镜B反射，再依次通过BBO倍频晶体和平凹镜A，最后通过228nm滤光片发射228nm全固态激光。

Description

一种发射波长228nm全固态激光装置
技术领域
本发明涉及全固态激光技术领域，特别涉及一种发射波长228nm全固态激光装置。
背景技术
原子荧光光谱法是以原子在辐射能激发下发射的荧光强度进行定量分析的发射光谱分析法，因为其谱线简单、检出限低、重复性高、线性范围宽等优点受到广大研究者的青睐并获得广泛使用。原子荧光光谱法采用的光源通常为空心阴极灯或氙弧灯，其存在很多缺点，寿命短、不稳定，同时存在荧光猝灭效应和散射光的干扰等，光源的缺点导致检测精度偏高。原子的荧光强度在一定条件下和原子荧光激发光源的强度成正比，通过提高激发光源强度则可进一步提高仪器的检出限，提高检测的稳定性。用激光替代传统激发光源，能提高原子光谱检测精度。针对环境重金属污染，228nm全固态激光是一种高强度光源，可作为原子荧光光谱检测的激发光源的替代光源，从而提高原子荧光光谱仪器的检出限和检测的稳定性。
发明内容
本发明的目的在于提出一种发射波长228nm全固态激光装置。
一种发射波长228nm全固态激光装置，包括1-808nm半导体激光器、2-808nm聚焦镜、3-Nd:YVO4激光晶体、4-平面镜、5-LBO晶体、6-平凹镜A、7-BBO晶体、8-平凹镜B和9-228nm滤光片。
其特征在于：
1-808nm半导体激光器输出波长范围为808±3nm，连续输出最小功率为4W。
2-808nm聚焦镜前后表面镀有181.7nm TiO2/96.7nm SiO2/156.9 nm TiO2/94.1nmSiO2的光学膜。
3-Nd:YVO4激光晶体前表面镀有108.1nm TiO2/144.9nm SiO2/29.8nm TiO2/280.7nm SiO2/260.8nm TiO2/232.1nm SiO2/62.1nm TiO2/157.2nm SiO2/101.5nm TiO2/156.2nm SiO2/97.7nm TiO2/477.3nm SiO2/105.7nm TiO2/165.3nm SiO2/90.8nm TiO2/96.8nm SiO2/92.8nm TiO2/267.2nm SiO2/256.4nm TiO2/的光学膜，后表面镀有31.4nmSiO2/51.9nm TiO2/206.8nm SiO2的光学膜。
4-平面镜前表面镀有46.8nm TiO2/76.7nm SiO2/76.9nm TiO2/214.1nm SiO2的光学膜，后表面镀有44.3nm TiO2/67.8nm SiO2/52.9nm TiO2/75.5nm SiO2/39.8nm TiO2/87.4nm SiO2/44.6nm TiO2/66.6nm SiO2/53.9nm TiO2/73.6nm SiO2/39.9nm TiO2/87.7nmSiO2/41.9nm TiO2/76.7nm SiO2/58.5nm TiO2/38.2nm SiO2/51.4nm TiO2/126.8nm SiO2/17.3nm TiO2的光学膜。
5-LBO倍频晶体前后表面镀有149.1nm SiO2/112.7nm TiO2/16.1nm SiO2/47.8nmTiO2/75.3nm SiO2的光学膜。
6-平凹镜A凹面镀有180.8nm HfO2/64.5nm MgF2/180.7nm HfO2/78.2nm MgF2/182.1nm HfO2/36.2nm MgF2/202.2nm HfO2/101.1nm MgF2/431.3nm HfO2/57.5nm MgF2/177.7nm HfO2/82.9nm MgF2/179.4nm HfO2/80.6nm MgF2/180.1nm HfO2/79.1nm MgF2/180.7nm HfO2/78.4nm MgF2/180.7nm HfO2/78.2nm MgF2/180.6nm HfO2/78.4nm MgF2/180.5nm HfO2/181.2nm MgF2/104.8nm HfO2/189.3nm MgF2/124.1nm HfO2的光学膜，平面镀有47.6nm HfO2/31.7nm MgF2的光学膜。
7-BBO倍频晶体前后表面镀有104.2nm HfO2/72.38nm MgF2/12.6nm HfO2/120.5nmMgF2的光学膜。
8-平凹镜B凹面镀有155.2nm HfO2/115.4nm MgF2/156.9nm HfO2/113.7nm MgF2/157.8nm HfO2/112.9nm MgF2/158.3nm HfO2/112.9nm MgF2/48.1nm HfO2/33.2nm MgF2/84.4nm HfO2/113.1nm MgF2/45.6nm HfO2/37.8nm MgF2/83.2nm HfO2/113.2nm MgF2/43.2nm HfO2/41.9nm MgF2/82.5nm HfO2/112.9nm MgF2/41.2nm HfO2/46.4nm MgF2/81.5nmHfO2/112.1nm MgF2/159.1nm HfO2/219.0nm MgF2/81.0nm HfO2/218.3nm MgF2/81.1nmHfO2/112.3nm MgF2/158.6nm HfO2/217.8nm MgF2/82.0nm HfO2/216.2nm MgF2/83.1nmHfO2/213.9nm MgF2/84.8nm HfO2的光学膜，平面镀不镀光学膜。
9-228nm滤光片中心波长为228nm±5nm、半高全宽为35nm±10nm、峰值透过率大于30%、截止带为350nm到1150nm。
附图说明
图1是本发明具体实施方式的装置图。
具体实施方式
下面结合图1对本发明进一步详细说明。
本发明公开了一种发射波长228nm全固态激光装置，包括1-808nm半导体激光器；2-808nm聚焦镜；3-Nd:YVO4激光晶体；4-平面镜；5-LBO晶体；6-平凹镜A；7-BBO晶体；8-平凹镜B；9-228nm滤光片。
将1-808nm半导体激光器输出的808nm的激光通过2-808nm聚焦镜会聚到3-Nd:YVO4激光晶体中，3-Nd:YVO4激光晶体产生波长为914nm的激光。
从3-Nd:YVO4激光晶体发射的914nm激光通过4-平面镜，再通过5-LBO倍频晶体，进行倍频，产生波长为457nm的激光。
457nm激光通过6-平凹镜A反射，457nm激光再通过7-BBO倍频晶体，进行倍频，产生波长为228nm的激光。
228nm激光通过8-平凹镜B反射，依次通过7-BBO倍频晶体和6-平凹镜A，最后通过9-228nm滤光片发射228nm全固态激光。

Claims (1)

1.一种发射波长228nm全固态激光装置，其特征在于，包括：808nm半导体激光器；808nm聚焦镜；Nd:YVO4激光晶体；平面镜；LBO晶体；平凹镜A；BBO晶体；平凹镜B；228nm滤光片，808nm半导体激光器发射的808nm激光通过808nm聚焦镜将808nm激光聚焦到Nd:YVO4激光晶体中，Nd:YVO4激光晶体通过808nm激光泵浦发射914nm激光；914nm激光通过平面镜，再通过LBO倍频晶体产生457nm激光；457nm激光通过平凹镜A反射，再通过BBO倍频晶体倍频产生228nm激光；228nm激光通过平凹镜B反射，再依次通过BBO倍频晶体和平凹镜A，最后通过228nm滤光片发射228nm全固态激光。
CN202010444819.2A 2020-05-23 2020-05-23 一种发射波长228nm全固态激光装置 Pending CN111478168A (zh)

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