CN111383892B - Grounding connection structure of gas spray header in plasma processing device - Google Patents
Grounding connection structure of gas spray header in plasma processing device Download PDFInfo
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- CN111383892B CN111383892B CN201811632020.5A CN201811632020A CN111383892B CN 111383892 B CN111383892 B CN 111383892B CN 201811632020 A CN201811632020 A CN 201811632020A CN 111383892 B CN111383892 B CN 111383892B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32908—Utilities
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Abstract
The invention relates to a grounding connection structure of a gas spray header in a plasma processing device, which leads the gas spray header, a mounting base and a base plate between the gas spray header and the mounting base to be tightly matched by connecting a fastener; the mounting hole of the mounting base is provided with a conductive part and an elastic element, the conductive part forms an inner space for accommodating the front end of the connecting fastener inserted into the mounting hole, the elastic force of the elastic element acts on the conductive part to enable the conductive part to be in close contact with the mounting base, and the conductive part is in close contact with the connecting fastener. The invention has a locking mechanism, can ensure the firm installation of the device, and corrects the offset generated near the connecting fastener in the using process. When the connecting fastener is used for conducting current, the close contact between the conductive part and the connecting fastener and between the conductive part and the mounting base can be effectively ensured, and the stability and reliability of a current transmission path are ensured.
Description
Technical Field
The invention relates to the field of plasma processing, in particular to a grounding connection structure of a gas spray header in a plasma processing device.
Background
The existing capacitive coupling plasma processing device comprises a reaction cavity capable of being vacuumized, a gas spray header for uniformly injecting reaction gas into the reaction cavity, and a mounting base which is usually used as an upper electrode and is grounded at the top of the reaction cavity; the substrate support, opposite the showerhead, is typically configured as a lower electrode and is connected to at least one rf power source to establish an electric field between the upper and lower electrodes to dissociate the reactant gases introduced into the chamber into a plasma. The radio frequency power is coupled to the gas shower head and then conducted to the mounting base to form a ground path for radio frequency current. Under the condition of high power process, larger radio frequency current can be generated.
The mounting base is for example made of aluminium and has good electrical and heat conducting capacity, and the temperature is regulated by a channel for flowing a heating medium. The lower surface of the gas spray header is exposed in the plasma, and can be sputtered by the plasma and generate heat; the showerhead is made of, for example, silicon carbide, and has a different coefficient of thermal expansion than the mounting base, possibly causing lateral stresses between the two.
Generally, a bolt is used as a connecting piece for assembly, so that the screw rod is screwed into a threaded hole formed in the mounting base, and the head of the bolt is inserted into a jack formed in a corresponding position of the gas spray header, so that the gas spray header is tightly matched with the mounting base. The screws are typically made of stainless steel material to meet strength requirements and to handle conditions such as high currents, temperature variations, lateral stresses, etc.
The bolt also passes radio frequency current coupled at the gas showerhead to the mounting base in a ground path. However, the bolt is prone to generate an arc at a position such as a thread, and oxides (such as iron oxide) are accumulated on the surface area, so that the resistance of the bolt is increased, the conductive effect of the bolt in a grounding path is unstable, and a radio frequency circuit has high impedance, so that a large amount of radio frequency energy is consumed, and the conduction efficiency is reduced.
The bolt also bears the heat from the mounting base and the gas spray header, and has different thermal expansion coefficients with the connected components, so that the bolt is easy to loosen or slide at the connection interface part of the bolt and the mounting base and the gas spray header, and the grounding path of the radio frequency loop is deviated. These all shorten the service life of the bolt, destroy the uniform distribution of the electric field in the reaction chamber, and cause the condition of radio frequency discharge to shift, resulting in the non-uniform distribution of plasma in the reaction chamber, thereby affecting the uniformity of substrate processing.
Disclosure of Invention
The invention provides a grounding connection structure of a gas spray header in a plasma processing device, which can realize looseness prevention on a bolt, ensure good contact of parts in a grounding path and enable a radio frequency loop to have low impedance at the bolt.
In order to achieve the above object, one technical solution of the present invention is to provide a grounding connection structure of a gas shower head in a plasma processing apparatus, wherein a grounded mounting base is arranged at the top of the plasma processing apparatus in a reaction chamber, and the gas shower head is arranged below the mounting base; the periphery of the mounting base is surrounded by the side part of a backing plate, and the bottom of the backing plate is provided with an extension section which is clamped between the mounting base and the edge of the gas spray header; the gas spray head, the extension section of the base plate and the mounting base are tightly matched through connecting fasteners;
the mounting base is provided with a mounting hole, a conductive part and an elastic element are arranged in the mounting hole, the conductive part forms an internal space and accommodates the front end of the connecting fastener inserted into the mounting hole, the elastic force of the elastic element acts on the conductive part to enable the outer side wall of the conductive part to be in close contact with the mounting base, and the inner side wall of the conductive part is in close contact with the connecting fastener; the connection fastener is in a conductive path, and current delivered to the connection fastener is transmitted to the mounting base via a conductive portion having a material resistivity lower than a material resistivity of the connection fastener.
Optionally, the conductive portion has a similar or the same coefficient of thermal expansion as the mounting base;
the mounting base is provided with a temperature regulating part and conducts heat through the base plate.
Optionally, the conductive part includes a conductive ring, and a groove is formed on a sidewall of the conductive ring to accommodate the elastic element; the space is formed by the inner surfaces of the side walls of the conductive rings, and the front end of the connecting fastener is inserted into the space; the inner surface of the side wall of the conductive ring is in close contact with the periphery of the front end of the connecting fastener through the elastic action of the elastic element, and the outer surface of the side wall of the conductive ring is in close contact with the inner wall of the mounting hole of the mounting base.
Optionally, a plurality of slidable conductive sheets are arranged around the opening in the front of the conductive part; the rear part of the conductive part is provided with a cavity for accommodating an elastic element, the elastic element is connected or contacted with the rear end of each conductive sheet, the front ends and the side sheets of the adjacent conductive sheets are mutually separated, and the front ends of the connecting fasteners are inserted into the openings of the conductive part; under the action of the elastic force of the elastic element, the front end of each conducting plate slides, so that the front end of each conducting plate and the inner surface of each side plate are in close contact with the periphery of the front end of the connecting fastener; the outer surface of the side piece of each conducting piece is in close contact with the inner wall of the mounting hole.
Optionally, the connecting fastener is a bolt; the front end of the screw of the bolt enters the mounting hole and is inserted into the inner space of the conductive part; and no external thread is arranged at the part of the front end of the screw rod, which is tightly contacted with the conductive part.
Optionally, the resilient element is a resilient sheet, or a spring.
Optionally, the backing plate is provided with a through counter bore, which includes a large-caliber front section and a small-caliber rear section, a screw of the bolt passes through the rear section, and the front section contains a part of the head of the bolt; the gas spray header is provided with a jack and is sleeved on the rest part of the head part of the bolt which is not accommodated by the front section;
a screw rod of the bolt penetrates through the base plate and then is screwed into the mounting hole of the mounting base; one end of the mounting hole is open, and the other end of the mounting hole is closed; the mounting hole comprises a first hole section and a second hole section which are continuous; the first hole section is a section extending inwards from the opening of the mounting hole and is provided with an internal thread meshed with the external thread on the screw rod; the front end of the screw is inserted into the second hole section and into the inner space of the conductive part.
Optionally, the bolt is stainless steel;
the mounting base, the backing plate and the conductive part are made of aluminum respectively;
the gas shower head is made of silicon carbide;
the outer ring of the gas spray head is provided with a grounding ring in a surrounding manner, the grounding ring is made of graphite, and the surface of the grounding ring is coated with a coating of silicon carbide.
Another aspect of the present invention is to provide a plasma processing apparatus, wherein any one of the above-described ground connection structures of the gas shower head is used; the plasma processing device comprises a reaction cavity capable of being vacuumized, and reaction gas output by the gas supply device is uniformly conveyed into the reaction cavity through vent holes distributed on the gas spray header; a substrate supporting base is arranged below the reaction cavity, a substrate is fixed on the substrate supporting base through an electrostatic chuck, and at least one radio frequency power source is applied to the substrate supporting base as a lower electrode;
the gas spray header and the substrate supporting base are oppositely arranged and are used as an upper electrode for coupling radio frequency power signals; coupling radio frequency power into the reaction cavity, dissociating gas in the reaction cavity into plasma, and processing the substrate; the periphery of the gas spray header is provided with a grounding ring in a surrounding manner;
the periphery of the mounting base is surrounded by the side part of the backing plate, and the bottom of the backing plate is provided with an extension section which is clamped between the mounting base and the edge of the gas spray header; the gas spray head, the extension section of the backing plate and the mounting base are tightly matched through connecting fasteners;
the mounting base is provided with a mounting hole, a conductive part and an elastic element are arranged in the mounting hole, the conductive part forms an internal space and accommodates the front end of the connecting fastener inserted into the mounting hole, the elastic force of the elastic element acts on the conductive part to enable the conductive part to be in close contact with the mounting base, and the conductive part is in close contact with the connecting fastener; the connection fastener is in a grounding path of the radio frequency current loop, and radio frequency current coupled to the gas shower head is transmitted to the mounting base through the connection fastener and the conductive part.
Another technical solution of the present invention is to provide an electrically conductive connecting structure, wherein a connecting fastener is provided to fasten and connect a first member and a second member; the second component is provided with a concave hole, and a conductive part with an elastic element is arranged in the concave hole; when the front end of the connecting fastener enters the concave hole of the second part, the conductive part surrounds the connecting fastener, and the conductive part is tightly contacted with the connecting fastener through the elastic element; the connection fastener is in a conductive path, and current delivered to the connection fastener is transmitted to the second component through the conductive portion; the conductive portion has a similar or the same coefficient of thermal expansion as the second component.
The conductive part is arranged between the connecting fastener such as the bolt and the device connected with the connecting fastener, and the conductive part is matched with the elastic element to realize a locking mechanism, so that the looseness of the bolt possibly generated when the device is fastened can be effectively avoided, the firm installation of the device is ensured, and the deviation generated in the using process is corrected. When the bolt and the conductive part are used for conducting current, the bolt can be effectively ensured to be tightly contacted with the conductive part, and the stability and reliability of a current transmission path are ensured.
When the gas spray head is used as a grounding connection structure of the gas spray head in the plasma processing device, the gas spray head, the base plate and the mounting base are tightly matched through the bolts; the conductive part and the mounting base have similar or same thermal expansion coefficients, and the conductive part can be in close contact with the front end of the bolt by matching with the elastic element arranged on the conductive part, so that looseness is prevented, and offset is corrected, and good conductive heat transfer effect is ensured among the bolt, the conductive part and the mounting base.
Drawings
FIG. 1 is a schematic view of the overall structure of a plasma processing apparatus;
FIG. 2 is an enlarged view of the connection of the gas shower head at the corner position shown at X in FIG. 1;
FIG. 3 is a schematic view of the ground connection structure in one embodiment of the invention;
FIG. 4 is a schematic view of the ground connection structure in another embodiment of the present invention;
fig. 5 and 6 are sectional views in the direction ofbase:Sub>A-base:Sub>A of the ground connection structure of fig. 4 corresponding to the compression and restoration of the spring, respectively.
Detailed Description
Fig. 1 shows a capacitively coupled plasma processing apparatus, which includes a reaction chamber 10 capable of being evacuated, a substrate support pedestal 20 disposed below the reaction chamber 10, an electrostatic chuck 30 for fixing a substrate 40 on the substrate support pedestal 20, and at least one rf power source applied to the substrate support pedestal 20, which is generally used as a bottom electrode, for processing the substrate 40 by coupling rf power into the reaction chamber 10 and dissociating gas supplied from a gas supply 60 into the reaction chamber 10 into plasma.
The reaction gas output by the gas supply device 60 is uniformly delivered into the reaction chamber 10 through the vent holes distributed on the gas shower head 50; the gas showerhead 50 is disposed opposite the substrate support pedestal 20 and serves as an upper electrode for coupling of rf power signals. To form the rf current loop, the showerhead 50 is typically connected to a grounded mounting pedestal at the top of the chamber 10. The mounting base also realizes temperature control by means of, for example, providing a circulation line for a heating medium.
As further shown in fig. 2, a backing plate 72 is provided, with the sides of the backing plate 72 surrounding the periphery of the mounting base 71 and the bottom of the backing plate 72 extending below the edge of the mounting base 71. The side and bottom of the backing plate 72 are in close contact with the corresponding parts of the mounting base 71, and the backing plate has good electric conduction and heat transfer functions.
The gas spray header 50 is disc-shaped, most of the top of the gas spray header 50 is in close contact with the bottom of the mounting base 71, the edge of the top of the gas spray header 50 is located below the backing plate 72, the backing plate 72 is tightly connected with the mounting base 71 through the bolt 90, and the gas spray header 50 is tightly matched with the backing plate 72 and the mounting base 71. The periphery of the gas shower head 50 is further provided with a grounding ring 51 in a surrounding manner, and the grounding ring 51 is further in close contact with the backing plate 72 below the backing plate 72 to realize the functions of supporting and grounding.
Illustratively, the gas shower head 50 is made of silicon carbide, and the lower surface may be further provided with a plasma erosion resistant coating; the grounding ring 51 is made of graphite and coated with a silicon carbide coating; the mounting base 71 and the backing plate 72 are made of aluminum; the bolt 90 is stainless steel.
Referring to fig. 2 and 3, the gas shower head 50, the backing plate 72, and the mounting base 71 are closely fitted by bolts 90, typically at corresponding edge positions. Here, the backing plate 72 is provided with a through counter bore which includes a front section with a large caliber and a rear section with a small caliber, a screw of the bolt 90 passes through the rear section, the head of the bolt 90 is limited by the junction of the front section and the rear section to pass through, and a part of the head of the bolt 90 is accommodated through the front section; the rear section may have internal threads that engage external threads on the screw (or the rear section may be unthreaded). The gas shower head 50 is provided with a jack, which is sleeved on the part of the head of the bolt 90 which is not accommodated by the front section, namely, the rest part exposed out of the bottom surface of the backing plate 72. And after the screw of the bolt 90 passes through the backing plate 72, the screw is continuously screwed into the mounting hole formed in the mounting base 71.
One end of the mounting hole of the mounting base 71 is open, and the other end is closed; a first hole section is arranged at a distance from the mounting hole to extend inwards (upwards in the example) from the opening, and is provided with internal threads meshed with the external threads of the screwed-in screw rod; the first hole section continues to extend forward until the closed end of the mounting hole is a second hole section, and a conductive ring 81 is arranged in the first hole section in a surrounding manner, so that the front end of the screw rod is inserted into a space surrounded by the inner wall of the conductive ring 81. The first hole section and the second hole section are continuously disposed, and the aperture of the second hole section may be slightly larger to accommodate the conductive ring 81.
The conductive ring 81 includes a sidewall, a space defined by an inner surface of the sidewall may axially pass through, and both ends of the sidewall are opened, so that a front end surface of the screw finally abuts against a rear end surface (in this case, a top surface in the hole) of the mounting hole of the mounting base 71. Or the space is not axially through, one end of the space is open, the other end of the space is closed, and the front end surface of the screw abuts against the closed surface. The conductive ring 81 is made of a material having a similar or the same thermal expansion coefficient as the mounting base 71, such as an aluminum material. Preferably, the front end of the screw, i.e. the portion inserted into the conductive ring 81, has no thread, so that it is more closely attached to the conductive ring 81.
The conductive ring 81 is further provided with a resilient element, for example a groove formed in the sidewall itself, for placing the resilient element (in this case, a resilient steel sheet 82 is used). The groove can be in the shape of a ring, or can be a plurality of mutually-separated arc sections or concave holes arranged along the ring, or can be in any other groove form capable of accommodating the elastic element. For example, when the front end of the screw is inserted, a pressure is applied to the elastic member through the sidewall of the conductive ring 81, and the elastic member always has a reverse resistance, so that the outer surface of the sidewall of the conductive ring 81 is in close contact with the inner wall of the second hole section of the mounting hole, and the inner surface of the sidewall of the conductive ring 81 is in close contact with the periphery of the front end of the screw. For example, when the temperature of the peripheral device is increased to a different degree to generate lateral stress, and the bolt 90 is slightly loosened or deflected, the elastic element is also deformed to provide resistance opposite to the deflection direction, so as to correct the deflection.
Referring to fig. 4, 5 and 6, another embodiment of the ground connection structure of the present invention comprises a conductive portion disposed in the second hole section of the mounting hole of the mounting base 71 and made of a material having a similar or same thermal expansion coefficient as that of the mounting base 71, such as an aluminum material; a plurality of slidable conducting strips 83 (four in this example) are arranged around the front opening of the conducting part, the rear part of the conducting part is provided with a cavity 85 and an elastic element (a spring 84 in this example) is arranged at the rear end of the conducting strip 83 to be connected or contacted with the rear end of the conducting strip 83, the adjacent conducting strips 83 are mutually separated at the front end and the side piece, and the front end of a bolt 90 can be inserted into the opening of the conducting part and is jointed with the front end of each conducting strip 83 and the inner surface of the side piece; when the front end of the bolt 90 is inserted, the elastic element is stressed and compressed to drive the conductive sheets 83 to slide, so that the front ends of the conductive sheets 83 approach each other, and the side sheets of the conductive sheets 83 are in close contact with the periphery of the front end of the bolt 90. The outer surface of the side piece of each conducting piece is in close contact with the inner wall of the mounting hole. For example, when the peripheral temperature changes to generate lateral stress, so that the bolt 90 is slightly loosened or deflected, the elastic element is also deformed to provide resistance force opposite to the deflection direction, so as to correct the deflection.
In summary, in the grounding connection structure of the gas shower head according to the present invention, the gas shower head 50, the pad plate 72 and the mounting base 71 are tightly engaged with each other by the bolt 90, and the mounting hole of the mounting base 71 is provided with a conductive portion (a conductive ring 81 or a slidable conductive plate 83), and the inner space thereof can accommodate the front end of the bolt 90 when the bolt 90 is inserted into the mounting hole; the conductive part and the mounting base 71 have similar or same thermal expansion coefficients, and the conductive part can be in close contact with the front end of the bolt 90 by matching with an elastic element arranged on the conductive part, so that looseness is prevented and offset correction is performed, and good conductive heat transfer effect among the bolt 90, the conductive part and the mounting base 71 is ensured.
While the present invention has been described in detail with reference to the preferred embodiments, it should be understood that the above description should not be taken as limiting the invention. Various modifications and alterations to this invention will become apparent to those skilled in the art upon reading the foregoing description. Accordingly, the scope of the invention should be determined from the following claims.
Claims (10)
1. A grounding connection structure of a gas spray header in a plasma processing device is characterized in that a grounding mounting base is arranged at the top of the plasma processing device in a reaction cavity, and the gas spray header is arranged below the mounting base; the periphery of the mounting base is surrounded by the side part of a backing plate, and the bottom of the backing plate is provided with an extension section which is clamped between the mounting base and the edge of the gas spray header; through connecting fastener, make closely cooperate its characterized in that between extension, the mounting base of gas shower head, backing plate:
the mounting base is provided with a mounting hole, a conductive part and an elastic element are arranged in the mounting hole, the conductive part forms an internal space and accommodates the front end of the connecting fastener inserted into the mounting hole, the elastic force of the elastic element acts on the conductive part to enable the outer side wall of the conductive part to be in close contact with the mounting base, and the inner side wall of the conductive part is in close contact with the connecting fastener; the connection fastener is in a conductive path, and current delivered to the connection fastener is transmitted to the mounting base through a conductive portion having a material resistivity lower than that of the connection fastener; the conductive portion has a similar or the same coefficient of thermal expansion as the mounting base.
2. The ground connection structure according to claim 1,
the mounting base is provided with a temperature regulating part and conducts heat through the base plate.
3. The ground connection structure according to claim 1,
the conductive part comprises a conductive ring, and the side wall of the conductive ring is provided with a groove for accommodating the elastic element; the space is formed by the inner surfaces of the side walls of the conductive rings, and the front end of the connecting fastener is inserted into the space; the inner surface of the side wall of the conductive ring is in close contact with the periphery of the front end of the connecting fastener through the elastic action of the elastic element, and the outer surface of the side wall of the conductive ring is in close contact with the inner wall of the mounting hole of the mounting base.
4. The ground connection of claim 1,
a plurality of slidable conducting strips are arranged around the opening in the front part of the conducting part; the rear part of the conductive part is provided with a cavity for accommodating an elastic element, the elastic element is connected or contacted with the rear end of each conductive sheet, the front end and the side sheet of the adjacent conductive sheets are mutually separated, and the front end of the connecting fastener is inserted into the opening of the conductive part; under the action of the elastic force of the elastic element, the front end of each conducting plate slides, so that the front end of each conducting plate and the inner surface of each side plate are in close contact with the periphery of the front end of the connecting fastener; the outer surface of the side piece of each conducting piece is in close contact with the inner wall of the mounting hole.
5. The ground connection structure according to any one of claims 1 to 4,
the connecting fastener is a bolt; the front end of the screw of the bolt enters the mounting hole and is inserted into the inner space of the conductive part; and no external thread is arranged at the part of the front end of the screw rod, which is tightly contacted with the conductive part.
6. The ground connection structure according to claim 5,
the elastic element is an elastic sheet or a spring.
7. The ground connection structure of claim 5,
the backing plate is provided with a through counter bore which comprises a large-caliber front section and a small-caliber rear section, a screw of the bolt penetrates through the rear section, and the front section contains a part of the head of the bolt; the gas spray header is provided with a jack and is sleeved on the rest part of the head part of the bolt which is not accommodated by the front section;
a screw rod of the bolt penetrates through the base plate and then is screwed into the mounting hole of the mounting base; one end of the mounting hole is open, and the other end of the mounting hole is closed; the mounting hole comprises a first hole section and a second hole section which are continuous; the first hole section is a section extending inwards from the opening of the mounting hole and is provided with an internal thread meshed with the external thread on the screw rod; the front end of the screw is inserted into the second hole section and into the inner space of the conductive part.
8. The ground connection structure according to claim 5,
the bolt is stainless steel;
the mounting base, the backing plate and the conductive part are made of aluminum respectively;
the gas shower head is made of silicon carbide;
the outer ring of the gas spray head is provided with a grounding ring in a winding mode, the grounding ring is made of graphite, and the surface of the grounding ring is coated with a silicon carbide coating.
9. A plasma processing apparatus using the ground connection structure of the gas shower head in the plasma processing apparatus according to any one of claims 1 to 8,
the plasma processing device comprises a reaction cavity capable of being vacuumized, and reaction gas output by the gas supply device is uniformly conveyed into the reaction cavity through vent holes distributed on the gas spray header; a substrate supporting base is arranged below the reaction cavity, a substrate is fixed on the substrate supporting base through an electrostatic chuck, and at least one radio frequency power source is applied to the substrate supporting base as a lower electrode;
the gas spray header and the substrate supporting base are oppositely arranged and are used as an upper electrode for coupling radio frequency power signals; coupling radio frequency power into the reaction cavity, dissociating gas in the reaction cavity into plasma, and processing the substrate; the periphery of the gas spray header is provided with a grounding ring in a surrounding manner;
the periphery of the mounting base is surrounded by the side part of the backing plate, and the bottom of the backing plate is provided with an extension section which is clamped between the mounting base and the edge of the gas spray header; the gas spray head, the extension section of the backing plate and the mounting base are tightly matched through connecting fasteners;
the mounting base is provided with a mounting hole, a conductive part and an elastic element are arranged in the mounting hole, the conductive part forms an internal space and accommodates the front end of the connecting fastener inserted into the mounting hole, the elastic force of the elastic element acts on the conductive part to enable the conductive part to be in close contact with the mounting base, and the conductive part is in close contact with the connecting fastener; the connection fastener is in a grounding path of the radio frequency current loop, and radio frequency current coupled to the gas shower head is transmitted to the mounting base through the connection fastener and the conductive part.
10. An electrically conductive connection structure, characterized in that,
the first component is tightly connected with the second component by arranging a connecting fastener; the second component is provided with a concave hole, and a conductive part with an elastic element is arranged in the concave hole; when the front end of the connecting fastener enters the concave hole of the second component, the conductive part surrounds the connecting fastener, and the conductive part is tightly contacted with the connecting fastener through the elastic element; the connection fastener being in an electrically conductive path, current delivered to the connection fastener passing through the electrically conductive portion to the second component; the conductive portion has a similar or the same coefficient of thermal expansion as the second component.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811632020.5A CN111383892B (en) | 2018-12-29 | 2018-12-29 | Grounding connection structure of gas spray header in plasma processing device |
| TW108146203A TWI709361B (en) | 2018-12-29 | 2019-12-17 | Ground connection structure of gas shower head in plasma processing device, plasma processing device and conductive connection structure |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201811632020.5A CN111383892B (en) | 2018-12-29 | 2018-12-29 | Grounding connection structure of gas spray header in plasma processing device |
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| CN111383892B true CN111383892B (en) | 2023-03-07 |
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| JP3290036B2 (en) * | 1994-10-18 | 2002-06-10 | 菱電セミコンダクタシステムエンジニアリング株式会社 | Dry etching apparatus and dry etching method |
| JPH08311654A (en) * | 1995-05-10 | 1996-11-26 | Ulvac Japan Ltd | Plasma cvd apparatus and thin film forming process by plasma cvd |
| JP4387008B2 (en) * | 1999-11-08 | 2009-12-16 | キヤノンアネルバ株式会社 | High frequency electrode device for substrate processing equipment |
| US7645341B2 (en) * | 2003-12-23 | 2010-01-12 | Lam Research Corporation | Showerhead electrode assembly for plasma processing apparatuses |
| US7862682B2 (en) * | 2007-06-13 | 2011-01-04 | Lam Research Corporation | Showerhead electrode assemblies for plasma processing apparatuses |
| JP5008478B2 (en) * | 2007-06-27 | 2012-08-22 | 東京エレクトロン株式会社 | Substrate processing apparatus and shower head |
| US8679288B2 (en) * | 2008-06-09 | 2014-03-25 | Lam Research Corporation | Showerhead electrode assemblies for plasma processing apparatuses |
| WO2012122054A2 (en) * | 2011-03-04 | 2012-09-13 | Novellus Systems, Inc. | Hybrid ceramic showerhead |
| JP5848140B2 (en) * | 2012-01-20 | 2016-01-27 | 東京エレクトロン株式会社 | Plasma processing equipment |
| CN102543641B (en) * | 2012-01-20 | 2015-07-08 | 中微半导体设备(上海)有限公司 | Connector capable of realizing elastic contact of plasma etching cavity |
| US9018022B2 (en) * | 2012-09-24 | 2015-04-28 | Lam Research Corporation | Showerhead electrode assembly in a capacitively coupled plasma processing apparatus |
| US9449795B2 (en) * | 2013-02-28 | 2016-09-20 | Novellus Systems, Inc. | Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactor |
| US9290843B2 (en) * | 2014-02-11 | 2016-03-22 | Lam Research Corporation | Ball screw showerhead module adjuster assembly for showerhead module of semiconductor substrate processing apparatus |
| CN108266447B (en) * | 2016-12-30 | 2020-06-09 | 中微半导体设备(上海)股份有限公司 | Screw assembly and radio frequency processing device applied by same |
-
2018
- 2018-12-29 CN CN201811632020.5A patent/CN111383892B/en active Active
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2019
- 2019-12-17 TW TW108146203A patent/TWI709361B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| CN111383892A (en) | 2020-07-07 |
| TW202029843A (en) | 2020-08-01 |
| TWI709361B (en) | 2020-11-01 |
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