CN111364968A - Resistivity logging instrument and resistivity measuring method - Google Patents
Resistivity logging instrument and resistivity measuring method Download PDFInfo
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- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
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Abstract
The embodiment of the invention discloses a resistivity logging instrument and a resistivity measuring method; the resistivity tool includes: the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes; the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode; wherein N is a positive integer greater than or equal to 3 and less than M, and M is a positive integer greater than 3. By the scheme of the invention, the resistivity logging instrument can be used for measuring a plurality of resistivity curves with different detection depths.
Description
Technical Field
The invention relates to the field of logging, in particular to a resistivity logging instrument and a resistivity measuring method.
Background
At present, compared with other resistivity logging instruments, the array lateral logging instrument widely used at home and abroad is not only suitable for a borehole with high formation-drilling fluid resistivity contrast, but also suitable for measuring environments such as complex well conditions, high longitudinal resolution, more radial resistivity information and the like, and is popularized in oil field logging in a large scale based on the advantages.
In practical application, however, the radial detection depth of the array laterolog instrument is shallow, and the detection depth of the array laterolog instrument can be 0.635 meter or 0.91 meter generally; the depth of the double lateral direction detection is deep and can reach 1.35 meters, but the double lateral direction logging instrument can only measure two resistivity curves and cannot clearly reflect the dip profile of a reservoir stratum. The array laterolog equipment has rich measurement curves, but the radial detection depth is shallow, and for the problem, the detection depth of the array laterolog equipment is generally increased by increasing the shielding return electrode or the length of the shielding return electrode in the prior art, but the increase of the radial detection depth of the array laterolog equipment by the method is limited, and the total length of the array laterolog equipment is increased by the method, so that the problems of inconvenient equipment transportation, field measurement and the like are caused. Accordingly, there is a need to provide a resistivity tool that solves the problems of the prior art.
Disclosure of Invention
In order to solve the technical problem, the invention provides a resistivity logging instrument which can measure a plurality of resistivity measurement curves with different detection depths by arranging a plurality of pairs of array monitoring measurement electrodes.
The invention provides a resistivity logging instrument, comprising:
the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes;
the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode; wherein the first pair of shield return electrodes is the pair of shield return electrodes closest to the main electrode;
the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes symmetrically to the main electrode, wherein the last pair of shielding return electrodes is a pair of shielding return electrodes farthest away from the main electrode; n is a positive integer greater than or equal to 3 and less than M, and M is a positive integer greater than 3.
In one exemplary embodiment, the plurality of pairs of shield return electrodes is five pairs of shield return electrodes; m is 9 and N is 4.
In an exemplary embodiment, the N pairs of array supervision measuring electrodes are arranged between the main electrode and the first pair of shielded return electrodes symmetrically to the main electrode, including: the first pair, the second pair, the third pair and the fourth pair of array supervision and measurement electrodes are symmetrical to the main electrode and are arranged between the main electrode and the first pair of shielding return electrodes from inside to outside;
the midpoints of the first pair of array monitoring measuring electrodes and the fourth pair of array monitoring measuring electrodes are the same as the midpoints of the second pair of array monitoring measuring electrodes and the third pair of array monitoring measuring electrodes.
In an exemplary embodiment, the plurality of remaining pairs of monitor electrodes are respectively distributed between the shield return electrodes except for the last pair of shield return electrodes symmetrically to the main electrode, and the method includes: the other monitoring electrodes are five pairs and are respectively arranged at one end of the first pair of shielding return electrodes, which is not close to the array monitoring measuring electrode, at two ends of the second pair of shielding return electrodes and at two ends of the third pair of shielding return electrodes.
In one exemplary embodiment, the five pairs of shield return electrodes comprise: the first pair, the second pair, the third pair, the fourth pair and the last pair of shielding return electrodes are arranged from inside to outside in sequence; the length of the first pair of shielding return electrodes is smaller than that of the second pair of shielding return electrodes, the length of the second pair of shielding return electrodes is smaller than that of the third pair of shielding return electrodes, and the length of the third pair of shielding return electrodes is smaller than that of the fourth pair of shielding return electrodes;
the last pair of shielding return electrodes are positioned at two ends of the electrode system structure, and the length of the shielding return electrodes is in an asymmetric structure.
In order to solve the above problems, the present invention further provides a resistivity logging method, which applies a resistivity logging instrument, comprising:
emitting a main current from the main electrode, emitting a shield current using a portion of the plurality of pairs of shield return electrodes, the remaining shield return electrodes receiving a return current;
measuring the potential of the corresponding array monitoring measuring electrode in the N pairs of array monitoring measuring electrodes according to different measuring modes;
from the measured potential and the main current, the apparent resistivity is calculated.
In one exemplary embodiment, the plurality of pairs of shield return electrodes is five pairs of shield return electrodes; m is 9, N is 4,
the transmitting a shielding current using a portion of the plurality of pairs of shielding return electrodes and the remaining plurality of pairs of shielding return electrodes receiving a return current includes:
in a first measurement mode, transmitting a shielding current using a first pair of shielding return electrodes, a second, third, fourth, and fifth pair of shielding return electrodes receiving a return current;
in a second measurement mode, transmitting a shielding current using the first pair and the second pair of shielding return electrodes, and receiving a return current using the third pair, the fourth pair, and the fifth pair of shielding return electrodes;
in a third measurement mode, transmitting a shielding current using the first, second, and third pairs of shielding return electrodes, the fourth and fifth pairs of shielding return electrodes receiving a return current; the first to fifth pairs of shielding return electrodes are arranged from inside to outside in sequence;
the measuring the electric potential of the corresponding array monitoring measuring electrode in the N pairs of array monitoring measuring electrodes according to different measuring modes comprises the following steps:
and under the first, second and third measurement modes, adopting a second pair and a third pair of array monitoring measurement electrodes to measure the electric potential of the electrodes, wherein the voltages of the second pair and the third pair of array monitoring measurement electrodes are equal, and measuring the electric potential of the second pair of array monitoring measurement electrodes.
In one exemplary embodiment, the plurality of pairs of shield return electrodes is five pairs of shield return electrodes; m is 9 and N is 4.
The transmitting a shielding current using a portion of the plurality of pairs of shielding return electrodes and the remaining plurality of pairs of shielding return electrodes receiving a return current includes:
transmitting a shielding current using the first, second, third, and fourth pairs of shielding return electrodes, the fifth pair of shielding return electrodes receiving a return current; the first to fifth pairs of shielding return electrodes are arranged from inside to outside in sequence; the measuring the electric potential of the corresponding array monitoring measuring electrode according to different measuring modes comprises the following steps:
in a fourth measurement mode, adopting a second pair and a third pair of array monitoring measurement electrodes to measure the electric potential of the electrodes, wherein the voltages of the second pair and the third pair of array monitoring measurement electrodes are equal, and measuring the electric potential of the second pair of array monitoring measurement electrodes;
and in a fifth measurement mode, measuring the electric potential of the electrodes by adopting a first pair and a fourth pair of array monitoring measurement electrodes, wherein the voltages of the first pair and the fourth pair of array monitoring measurement electrodes are equal, and measuring the electric potential of the first pair of array monitoring measurement electrodes.
In an exemplary embodiment, the calculating apparent resistivity from the measured potential and the main current includes:
calculating to obtain apparent resistivity according to the measured potentials of the first pair or the second pair of array monitoring measuring electrodes and the main current by adopting a preset conversion formula;
the conversion formula comprises:
wherein Ra represents the apparent resistivity, UMThe potentials of the first pair or the second pair of array supervision measuring electrodes are represented, and K represents an instrument constant corresponding to the corresponding measuring mode.
A computer readable storage medium storing computer executable instructions which, when executed by a processor, perform the steps of the resistivity logging method of any of the above embodiments.
Compared with the prior art, the invention provides a resistivity logging instrument and a resistivity measuring method, wherein the resistivity logging instrument comprises: the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes; the N pairs of array monitoring measuring electrodes are arranged between the main electrode and the first pair of shielding return electrodes symmetrically to the main electrode; wherein the first pair of shield return electrodes is the pair of shield return electrodes closest to the main electrode; the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes in a symmetrical mode with the main electrodes, wherein the last pair of shielding return electrodes is the shielding return electrode pair farthest away from the main electrodes; n is a positive integer of 3 or more and less than M, and M is a positive integer of 3 or more. By the scheme of the invention, the problem that the existing resistivity logging instrument has few measurement curves or shallow radial detection depth is solved.
The invention also provides a resistivity measurement method, which applies a resistivity logging instrument and comprises the following steps: emitting a main current from the main electrode, emitting a shield current using a portion of the plurality of pairs of shield return electrodes, the remaining shield return electrodes receiving a return current; measuring the potential of the corresponding array monitoring measuring electrode in the N pairs of array monitoring measuring electrodes according to different measuring modes; from the measured potential and the main current, the apparent resistivity is calculated. By the scheme of the invention, a plurality of resistivity measurement curves with different detection depths can be measured by applying the resistivity logging instrument provided with a plurality of pairs of array monitoring measurement electrodes.
Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and claims hereof as well as the appended drawings.
Drawings
The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the example serve to explain the principles of the invention and not to limit the invention.
FIG. 1 is a schematic diagram of an electrode system of a resistivity tool according to an embodiment of the invention;
FIG. 2 is a flow chart of a resistivity logging method according to an embodiment of the invention;
FIG. 3 is a graph showing resistivity responses in different measurement modes according to a first embodiment of the present invention;
FIG. 4 is a schematic diagram of pseudo-geometric factors under different measurement modes according to a first embodiment of the present invention;
fig. 5 is a schematic diagram of longitudinal resolution in different measurement modes according to a first embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be noted that the embodiments and features of the embodiments in the present application may be arbitrarily combined with each other without conflict.
The steps illustrated in the flow charts of the figures may be performed in a computer system such as a set of computer-executable instructions. Also, while a logical order is shown in the flow diagrams, in some cases, the steps shown or described may be performed in an order different than here.
A resistivity tool of the present invention; the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes; the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode; wherein the first pair of shield return electrodes is the pair of shield return electrodes closest to the main electrode; the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes symmetrically to the main electrode, wherein the last pair of shielding return electrodes is a pair of shielding return electrodes farthest away from the main electrode; n is a positive integer greater than or equal to 3 and less than M, and M is a positive integer greater than 3. In this embodiment, N pairs of array supervisory measurement electrodes are provided between the main electrode and the first pair of shielded return electrodes, N being a positive integer of 3 or more and less than M, the plurality of pairs of array supervisory measurement electrodes being provided symmetrically to the main electrode.
In one exemplary embodiment the plurality of pairs of shield return electrodes is five pairs of shield return electrodes; m is 9 and N is 4. FIG. 1 shows a schematic diagram of an electrode system of a resistivity tool, wherein the main electrode is A0The five pairs of shielding reflux electrodes are as follows: a. the1And A1’、A2And A2’、A3And A3’、A4And A4’、A5And A5'. 9 pairs of monitoring electrodes, wherein the 9 pairs of monitoring electrodes comprise 4 pairs of array monitoring measurement electrodes and 5 pairs of remaining monitoring electrodes; the 4 pairs of array supervision and measurement electrodes are as follows: m1And M1’、M2And M2’、M3And M3’、M4And M4'; the 5 remaining pairs of monitor electrodes are: m5And M5’、M6And M6’、M7And M7’、M8And M8', M9And M9’。
In one exemplary embodiment, the five pairs of shield return electrodes comprise: the first pair, the second pair, the third pair, the fourth pair and the last pair of shielding return electrodes are arranged from inside to outside in sequence; the length of the first pair of shielding return electrodes is smaller than that of the second pair of shielding return electrodes, the length of the second pair of shielding return electrodes is smaller than that of the third pair of shielding return electrodes, and the length of the third pair of shielding return electrodes is smaller than that of the fourth pair of shielding return electrodes; the last pair of shielded return electrodes, i.e. A5And A5' located at both ends of the electrode system structure, A5And A5' Length is asymmetric Structure, A5Length of (A) is greater than that of (A)5' Length value is large.
In an exemplary embodiment, the N pairs of array supervision measuring electrodes are arranged between the main electrode and the first pair of shielded return electrodes symmetrically to the main electrode, including: the first pair, the second pair, the third pair and the fourth pair of array supervision and measurement electrodes are symmetrical to the main electrode and are arranged between the main electrode and the first pair of shielding return electrodes from inside to outside; the midpoints of the first pair of array monitoring measuring electrodes and the fourth pair of array monitoring measuring electrodes are the same as the midpoints of the second pair of array monitoring measuring electrodes and the third pair of array monitoring measuring electrodes. FIG. 1 shows a schematic diagram of an electrode system of a resistivity tool, wherein the main electrode is A04 pairs of array supervision measuring electrodes are symmetrical to the main electrode (A)0) Arranged from the inside outwards of the main electrode and of a first pair of shielded return electrodes (A)1And A1') between. Wherein, 4 pairs of array supervision measuring electrodes include: first pair (M)1And M1'), a second pair (M)2And M2'), a third pair (M)3And M3') and a fourth pair (M)4And M4') an array supervision measurement electrode; the inner in the inside-out direction is the direction close to the main electrode, the outer is the direction far away from the main electrode, and the specific positions are as follows: first pair (M)1And M1') array supervision measuring electrode near main electrode, located at main electrode (A)0) At both ends, inA second pair (M) is distributed at two ends of the pair in sequence2And M2') array supervision measuring electrodes, a third pair (M)3And M3') array supervision measuring electrode and fourth pair (M)4And M4') array of supervisory measurement electrodes, the fourth pair of array of supervisory measurement electrodes being spaced from the main electrode in comparison with the first pair (M)1And M1') array supervises the measuring electrode.
In an exemplary embodiment, the plurality of remaining pairs of monitor electrodes are respectively distributed between the shield return electrodes except for the last pair of shield return electrodes symmetrically to the main electrode, and the method includes: the other monitoring electrodes are five pairs and are respectively arranged at one end of the first pair of shielding return electrodes, which is not close to the array monitoring measuring electrode, at two ends of the second pair of shielding return electrodes and at two ends of the third pair of shielding return electrodes. The remaining monitoring electrodes were in five pairs including: fifth pair (M)5And M5') and a sixth pair (M)6And M6') and a seventh pair (M)7And M7') and an eighth pair (M)8And M8') and a ninth pair (M)9And M9') array supervision measurement electrodes. In this embodiment, M is used6、M7The position of the monitoring electrode, M, is explained as an example6Is arranged at A2Lower end of the shielded return electrode, M7Is arranged at A2The upper end of the return electrode is shielded.
The invention also provides a resistivity logging method, as shown in fig. 2, by applying the resistivity logging instrument in the above embodiment, the resistivity logging method may be implemented by the steps of: step 200-202:
step 200. emitting a main current from the main electrode, emitting a shield current using a portion of the plurality of pairs of shield return electrodes, the remaining shield return electrodes receiving a return current.
And step 201, measuring the electric potential of the corresponding array monitoring measuring electrode in the N pairs of array monitoring measuring electrodes according to different measuring modes.
And 202, calculating apparent resistivity according to the measured potential and the main current.
In this embodiment, a resistivity tool is applied, the resistivity tool comprising: the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes; the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode; wherein the first pair of shield return electrodes is the pair of shield return electrodes closest to the main electrode; the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes symmetrically to the main electrode, wherein the last pair of shielding return electrodes is a pair of shielding return electrodes farthest away from the main electrode; n is a positive integer greater than or equal to 3 and less than M, and M is a positive integer greater than 3.
The main current is emitted from the main electrode, the shielding current is emitted using a portion of the plurality of pairs of shielding return electrodes, and the remaining shielding return electrodes receive the return current.
In one exemplary embodiment, the plurality of pairs of shield return electrodes is five pairs of shield return electrodes; m is 9, N is 4;
the transmitting a shielding current using a portion of the plurality of pairs of shielding return electrodes and the remaining plurality of pairs of shielding return electrodes receiving a return current includes:
in a first measurement mode, transmitting a shielding current using a first pair of shielding return electrodes, a second, third, fourth, and fifth pair of shielding return electrodes receiving a return current;
in a second measurement mode, transmitting a shielding current using the first pair and the second pair of shielding return electrodes, and receiving a return current using the third pair, the fourth pair, and the fifth pair of shielding return electrodes;
in a third measurement mode, transmitting a shielding current using the first, second, and third pairs of shielding return electrodes, the fourth and fifth pairs of shielding return electrodes receiving a return current; the first to fifth pairs of shielding return electrodes are arranged from inside to outside in sequence;
the measuring the electric potential of the corresponding array monitoring measuring electrode in the N pairs of array monitoring measuring electrodes according to different measuring modes comprises the following steps:
and under the first, second and third measurement modes, adopting a second pair and a third pair of array monitoring measurement electrodes to measure the electric potential of the electrodes, wherein the voltages of the second pair and the third pair of array monitoring measurement electrodes are equal, and measuring the electric potential of the second pair of array monitoring measurement electrodes.
In one exemplary embodiment, the plurality of pairs of shield return electrodes is five pairs of shield return electrodes; m is 9, N is 4;
the transmitting a shielding current using a portion of the plurality of pairs of shielding return electrodes and the remaining plurality of pairs of shielding return electrodes receiving a return current includes:
transmitting a shielding current using the first, second, third, and fourth pairs of shielding return electrodes, the fifth pair of shielding return electrodes receiving a return current; the first to fifth pairs of shielding return electrodes are arranged from inside to outside in sequence; the measuring the electric potential of the corresponding array monitoring measuring electrode according to different measuring modes comprises the following steps:
in a fourth measurement mode, adopting a second pair and a third pair of array monitoring measurement electrodes to measure the electric potential of the electrodes, wherein the voltages of the second pair and the third pair of array monitoring measurement electrodes are equal, and measuring the electric potential of the second pair of array monitoring measurement electrodes;
and in a fifth measurement mode, measuring the electric potential of the electrodes by adopting a first pair and a fourth pair of array monitoring measurement electrodes, wherein the voltages of the first pair and the fourth pair of array monitoring measurement electrodes are equal, and measuring the electric potential of the first pair of array monitoring measurement electrodes.
In an exemplary embodiment, the calculating apparent resistivity from the measured potential and the main current includes: calculating to obtain apparent resistivity according to the measured potentials of the first pair or the second pair of array monitoring measuring electrodes and the main current by adopting a preset conversion formula;
the conversion formula comprises:
wherein Ra represents the apparent resistivity, UMThe potentials of the first pair or the second pair of array supervision measuring electrodes are represented, and K represents an instrument constant corresponding to the corresponding measuring mode. In this embodiment, when measuring the potential of the second pair of array monitoring measurement electrodes, the conversion formula may be as follows:
wherein, RaiRepresenting apparent resistivity value, UM2Showing a second pair of supervised measurement electrodes M2K denotes the instrument constant, i 1,2,3,4 denotes four different measurement modes.
When the first pair of arrays to measure supervises the potential of the measure electrode, the conversion formula may be as follows:
wherein, RaiRepresenting apparent resistivity value, UM1Showing a first pair of supervised measurement electrodes M1K denotes an instrument constant, and i ═ 5 denotes a fifth measurement mode.
Exemplary embodiment two
Applying a resistivity tool, the resistivity tool comprising: the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes; the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode; wherein the first pair of shield return electrodes is the pair of shield return electrodes closest to the main electrode; the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes symmetrically to the main electrode, wherein the last pair of shielding return electrodes is a pair of shielding return electrodes farthest away from the main electrode; n is a positive integer greater than or equal to 3 and less than M, and M is a positive integer greater than 3. The multiple pairs of shielding reflux electrodes are five pairs of shielding reflux electrodes; m is 9 and N is 4. The five pairs of shield return electrodes include: the first pair, the second pair, the third pair, the fourth pair and the last pair of shielding return electrodes are arranged from inside to outside in sequence. The resistivity measurement method comprises the following implementation steps: step 300-;
step 300. in a first measurement mode, a main current is emitted from the main electrode, a shielding current is emitted using a first pair of shielded return electrodes, and a second, third, fourth and fifth pair of shielded return electrodes receive a return current. In this step, the main current I0From the main electrode A0Flowing out, the first pair of shielded return electrodes A1(A1') emission shield current I1The current returns to the electrode A2(A2’)、A3(A3’)、A4(A4’)、A5(A5'). Main electrode A0And a shielding return electrode A1(A1') are supplied with the same phase current, respectively.
And 301, in the first measurement mode, adopting a second pair and a third pair of array monitoring measurement electrodes to measure the electric potentials of the electrodes, wherein the voltages of the second pair and the third pair of array monitoring measurement electrodes are equal, and measuring the electric potentials of the second pair of array monitoring measurement electrodes. In this step, the second pair M is maintained during the measurement2(M2') and a third pair M3(M3') the array supervises the measurement electrode voltages being equal, i.e.
Measuring the second pair of supervised measuring electrodes M2(M2') potential.
Step 302, calculating apparent resistivity based on the measured potential and the main current.
In the step, calculating to obtain apparent resistivity according to the measured potential and main current of the second pair of array monitoring measuring electrodes by adopting a preset conversion formula;
the conversion formula may be as follows:
wherein, RaiRepresenting apparent resistivity value, UM2Showing a second pair of array-supervising measuring electrodes M2K denotes the instrument constant, i 1,2,3,4 denote four different measurement modes, i 1 in this step.
In a first measuring mode, the main current I0At the shielding current I1Enters the stratum in the direction vertical to the well wall under the action of the return electrode A2(A2’)、A3(A3’)、A4(A4’)、A5(A5') from the main electrode A0Very closely, the main current I0The probe is spread out shortly after entering the formation and the probe depth is shallower in this first measurement mode.
Exemplary embodiment two
Applying a resistivity tool, the resistivity tool comprising: the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes; the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode; wherein the first pair of shield return electrodes is the pair of shield return electrodes closest to the main electrode; the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes symmetrically to the main electrode, wherein the last pair of shielding return electrodes is a pair of shielding return electrodes farthest away from the main electrode; n is a positive integer greater than or equal to 3 and less than M, and M is a positive integer greater than 3. The multiple pairs of shielding reflux electrodes are five pairs of shielding reflux electrodes; m is 9 and N is 4. The five pairs of shield return electrodes include: the first pair, the second pair, the third pair, the fourth pair and the last pair of shielding return electrodes are arranged from inside to outside in sequence. The specific implementation steps of the resistivity logging method comprise: step 400-402:
step 400. in a second measurement mode, a main current is emitted from the main electrode, a shielding current is emitted using the first and second pairs of shielded return electrodes, and the third, fourth and fifth pairs of shielded return electrodes receive a return current. In this step, the main current I0From the main electrode A0Flowing out, the first and second pairs of shielding return electrodes shield the return electrode A1(A1’)、A2(A2') emission shield current I1And I2The current returns to the electrode A3(A3’)、A4(A4’)、A5(A5'). Main electrode A0And a shielding return electrode A1(A1’)、A2(A2') are supplied with the same phase current, respectively.
And 401, in a second measurement mode, measuring the electric potentials of the electrodes by adopting a second pair and a third pair of array monitoring measurement electrodes, wherein the voltages of the second pair and the third pair of array monitoring measurement electrodes are equal, and measuring the electric potentials of the second pair of array monitoring measurement electrodes. In this step, the second pair of supervised measurement signals M is maintained during the measurement2(M2'), a third pair of supervised measuring electrodes M3(M3'), a fifth pair of supervised measuring electrodes M5(M5') and a sixth pair of supervised measuring electrodes M6(M6') voltage equality, i.e.
Measuring the second pair of supervised measuring electrodes M2(M2') potential.
Step 402, calculating apparent resistivity based on the measured potential and the main current.
In the step, calculating to obtain apparent resistivity according to the measured potential and main current of the second pair of array monitoring measuring electrodes by adopting a preset conversion formula;
the conversion formula may be as follows:
wherein, RaiRepresenting apparent resistivity value, UM2Showing a second pair of supervised measurement electrodes M2K denotes the instrument constant, i-1, 2,3,4 denotes four different measurement modes, i-2 in this step. In a second measuring mode, the main current I0At the shielding current I1And I2Under the action of the shielding return electrode A, the shielding return electrode A enters the stratum along the direction vertical to the well wall3(A3’)、A4(A4’)、A5(A5') from the main electrode A0Still very recently, the detection depth is shallower in this mode.
Exemplary embodiment three
Applying a resistivity tool, the resistivity tool comprising: the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes; the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode; wherein the first pair of shield return electrodes is the pair of shield return electrodes closest to the main electrode; the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes symmetrically to the main electrode, wherein the last pair of shielding return electrodes is a pair of shielding return electrodes farthest away from the main electrode; n is a positive integer greater than or equal to 3 and less than M, and M is a positive integer greater than 3. The multiple pairs of shielding reflux electrodes are five pairs of shielding reflux electrodes; m is 9 and N is 4. The five pairs of shield return electrodes include: the first pair, the second pair, the third pair, the fourth pair and the last pair of shielding return electrodes are arranged from inside to outside in sequence. The specific implementation steps of the resistivity logging method comprise: step 500-502:
step 500. in a third measurement mode, a main current is emitted from the main electrode, using the first, second and third pairs of shielded return electrodesEmitting a shield current, the fourth and fifth pairs of shield return electrodes receiving a return current; wherein, the first to the fifth pairs of shielding return electrodes are arranged from inside to outside in sequence. In this step, the main current I0From the main electrode A0Flowing out, the first, second and third pairs of shielded return electrodes A1(A1’)、A2(A2') and A3(A3') emission shield current I1、I2And I3The current returns to the fourth and fifth pairs of shielded return electrodes A4(A4’)、A5(A5'). Main electrode A0And a first, a second and a third pair of shielded return electrodes A1(A1’)、A2(A2') and A3(A3') are supplied with the same phase current, respectively.
And 501, in a third measurement mode, measuring the electric potentials of the electrodes by adopting a second pair and a third pair of array monitoring measurement electrodes, wherein the voltages of the second pair and the third pair of array monitoring measurement electrodes are equal, and measuring the electric potentials of the second pair of array monitoring measurement electrodes. In this step, the holding supervision measuring electrode M is kept during measurement2(M2’)、M3(M3’)、M5(M5’)、M6(M6’)、M7(M7') and M8(M8') voltage equality, i.e.
Measuring the second pair of supervised measuring electrodes M2The potential of (2).
Step 502. calculate apparent resistivity from the measured potential and the main current.
In the step, calculating to obtain apparent resistivity according to the measured potential and main current of the second pair of array monitoring measuring electrodes by adopting a preset conversion formula;
the conversion formula may be as follows:
wherein, RaiRepresenting apparent resistivity value, UM2Showing a second pair of supervised measurement electrodes M2K denotes the instrument constant, i-1, 2,3,4 denotes four different measurement modes, i-3 in this step. In the third measuring mode, the emitted current of the shielding return electrode is increased, and the main current returns to the receiving electrode after flowing into the stratum deeper, so the detection depth is deeper.
Exemplary embodiment four
Applying a resistivity tool, the resistivity tool comprising: the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes; the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode; wherein the first pair of shield return electrodes is the pair of shield return electrodes closest to the main electrode; the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes symmetrically to the main electrode, wherein the last pair of shielding return electrodes is a pair of shielding return electrodes farthest away from the main electrode; n is a positive integer greater than or equal to 3 and less than M, and M is a positive integer greater than 3. The multiple pairs of shielding reflux electrodes are five pairs of shielding reflux electrodes; m is 9 and N is 4. The five pairs of shield return electrodes include: the first pair, the second pair, the third pair, the fourth pair and the last pair of shielding return electrodes are arranged from inside to outside in sequence. The specific implementation steps of the resistivity logging method comprise: step 600-;
step 600. in a fourth measurement mode, emitting a main current from the main electrode, emitting a shielding current using the first, second, third and fourth pairs of shielded return electrodes, the fifth pair of shielded return electrodes receiving a return current; wherein, the first to the fifth pairs of shielding return electrodes are arranged from inside to outside in sequence. In this step, the main current I0From the main electrode A0Flow out, shieldReturn electrode A1(A1’)、A2(A2’)、A3(A3') and A4(A4') emission shield current I1、I2、I3And I4The current returns to the fifth pair of shielded return electrodes A5(A5'). Holding main electrode A0And a shielding return electrode A1(A1’)、A2(A2’)、A3(A3') and A4(A4') are supplied with the same phase current, respectively.
And 601, in a fourth measurement mode, adopting a second pair and a third pair of array monitoring measurement electrodes to measure the electric potentials of the electrodes, wherein the voltages of the second pair and the third pair of array monitoring measurement electrodes are equal, and measuring the electric potentials of the second pair of array monitoring measurement electrodes. In this step, the supervision measuring electrode M is kept during measurement2(M2’)、M3(M3’)、M5(M5’)、M6(M6’)、M7(M7’)、M8(M8’)、M9(M9') and A4(A4') voltage equality, i.e.
Measuring the second pair of supervised measuring electrodes M2The potential of (2).
And step 602, calculating apparent resistivity according to the measured potential and the main current.
In the step, calculating to obtain apparent resistivity according to the measured potential and main current of the second pair of array monitoring measuring electrodes by adopting a preset conversion formula;
the conversion formula may be as follows:
wherein, RaiRepresenting apparent resistivity value, UM2Showing a second pair of supervised measurement electrodes M2K denotes the instrument constant, i-1, 2,3,4 denotes four different measurement modes, i-4 in this step. In the fourth measurement mode, the electrode for shielding the emission current of the return electrode is continuously increased, and the main current flows into the stratum deeper and then returns to the receiving electrode, so the detection depth is deeper.
Exemplary embodiment five
Applying a resistivity tool, the resistivity tool comprising: the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes; the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode; wherein the first pair of shield return electrodes is the pair of shield return electrodes closest to the main electrode; the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes symmetrically to the main electrode, wherein the last pair of shielding return electrodes is a pair of shielding return electrodes farthest away from the main electrode; n is a positive integer greater than or equal to 3 and less than M, and M is a positive integer greater than 3. The multiple pairs of shielding reflux electrodes are five pairs of shielding reflux electrodes; m is 9 and N is 4. The five pairs of shield return electrodes include: the first pair, the second pair, the third pair, the fourth pair and the last pair of shielding return electrodes are arranged from inside to outside in sequence. The specific implementation steps of the resistivity logging method comprise: step 700-702:
step 700. in a fifth measurement mode, emitting a main current from the main electrode, emitting a shielding current using the first, second, third and fourth pairs of shielded return electrodes, the fifth pair of shielded return electrodes receiving a return current; wherein, the first to the fifth pairs of shielding return electrodes are arranged from inside to outside in sequence. In this step, the main current I0From the main electrode A0Flowing out and shielding the return electrode A1(A1’)、A2(A2’)、A3(A3') and A4(A4') emission shield current I1、I2、I3And I4The current returns to the fifth pair of shielded return electrodes A5(A5'). Holding main electrode A0And a shielding return electrode A1(A1’)、A2(A2’)、A3(A3') and A4(A4') are supplied with the same phase current, respectively.
And 701, in a fifth measurement mode, measuring the electric potentials of the electrodes by adopting a first pair and a fourth pair of array monitoring measurement electrodes, wherein the voltages of the first pair and the fourth pair of array monitoring measurement electrodes are equal, and measuring the electric potentials of the first pair of array monitoring measurement electrodes. In the step, the potentials of the electrodes are measured by adopting a first pair and a fourth pair of array monitoring measuring electrodes, wherein the voltages of the first pair and the fourth pair of array monitoring measuring electrodes are equal, and the potentials of the first pair of array monitoring measuring electrodes are measured. In this step, the supervision measuring electrode M is kept during measurement1(M1’)、M4(M4’)、M5(M5’)、M6(M6’)、M7(M7’)、M8(M8’)、M9(M9') and A4(A4') equal voltage, measuring a first pair of supervised measurement electrodes M1The potential of (2).
Step 702, calculating apparent resistivity based on the measured potential and the main current.
In the step, calculating to obtain apparent resistivity according to the measured potential and main current of the second pair of array monitoring measuring electrodes by adopting a preset conversion formula;
the conversion formula may be as follows:
when the first pair of arrays to measure supervises the potential of the measure electrode, the conversion formula may be as follows:
wherein, RaiRepresenting apparent resistivity value, UM1Showing a first pair of supervised measurement electrodes M1K denotes an instrument constant, and i ═ 5 denotes a fifth measurement mode.
From the basic principle of electromagnetic fields, it is known that the closer a supervising electrode is to a supervised electrode, the more representative it is of the potential across it, especially where the electromagnetic field varies strongly. For example, in the fifth measurement mode, the monitoring measurement electrode is closer to the main electrode and the shielding return electrode, so that the potential difference between the shielding return electrode and the main electrode is smaller, the current of the shielding return electrode has a stronger current shielding effect on the main electrode, and the main current returns to the receiving electrode after flowing deeper into the formation, so that the detection depth is deeper in the fifth measurement mode.
FIG. 3 is a graph of the resistivity response curves calculated by finite element simulation with the resistivity tool of the present application in five measurement modes as a function of invasion radius. Wherein, this resistivity logging instrument includes: the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes; the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode; wherein the first pair of shield return electrodes is the pair of shield return electrodes closest to the main electrode; the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes symmetrically to the main electrode, wherein the last pair of shielding return electrodes is a pair of shielding return electrodes farthest away from the main electrode; n is a positive integer greater than or equal to 3 and less than M, and M is a positive integer greater than 3. In this embodiment, N pairs of array supervisory measurement electrodes are provided between the main electrode and the first pair of shielded return electrodes, N being a positive integer of 3 or more and less than M, the plurality of pairs of array supervisory measurement electrodes being provided symmetrically to the main electrode.
The five response curves shown in fig. 3 correspond to the first measurement mode MLR1 resistivity response curve, the second measurement mode MLR2 resistivity response curve, the third measurement mode MLR3 resistivity response curve, the fourth measurement mode MLR4 resistivity response curve, and the fifth measurement mode MLR5 resistivity response curve from bottom to top in sequence, and it can be known from the five response curves in fig. 3 that: the resistivity response curves at different depths of investigation gradually deviate from the true formation value as the invasion radius gradually increases, and the resistivity response in the MLR5 resistivity response curve of the fifth measurement mode is expected to reach 50% of the true value of the target layer when the invasion depth reaches 63 inches (1.6 meters). As can be seen from the schematic diagram of FIG. 3, the resistivity tool can obtain a more realistic formation response value while ensuring an increase in the depth of investigation.
The resistivity logging instrument of the invention is arranged on a main electrode A0And a first pair of shielding electrodes A1And 4 pairs of array monitoring measuring electrodes are arranged between the electrodes (A1'), five different measuring models can be realized through different focusing modes, and five resistivity curves with different detection depths can be obtained in the corresponding measuring modes. According to the definition of the detection depth of the instrument, that is, when the pseudo-geometric factor is equal to 0.5, the corresponding intrusion depth is the radial detection depth of the instrument, fig. 4 is a schematic diagram of the pseudo-geometric factor in different measurement modes, which sequentially includes a first measurement mode MLR1 pseudo-geometric factor response curve, a second measurement mode MLR2 pseudo-geometric factor response curve, a third measurement mode MLR3 pseudo-geometric factor response curve, a fourth measurement mode MLR4 pseudo-geometric factor response curve and a fifth measurement mode MLR5 pseudo-geometric factor response curve from left to right, the pseudo-geometric factor response curve in different measurement modes shown in fig. 4 can reflect the detection depth of the instrument in corresponding modes, and it can be known that when the pseudo-geometric factor is equal to 0.5, the radial detection depth of the instrument can reach 1.4 meters at the maximum. As can be seen from the schematic of FIG. 4, the resistivity tool may obtain shallow to deep resistivity response curves using different measurement modes.
The resistivity logging instrument of the invention requires a first pair of monitoring electrodes M without changing the dimensional parameters of the overall structure of the electrode system of the instrument1(M1') and a fourth pair of supervision electrodes M4(M4') midpoint with a second pair of monitor electrodes M2(M2') and a third pair of supervision electrodes M3(M3') the mid-points are identical, i.e. the electrode distances of the different measurement modes are equal. As shown in the longitudinal resolution diagram of FIG. 5 for different measurement modes, the measurement response of the resistivity tool at 1ft thickness shows that when the measurement response of the resistivity tool is close to half of the true value of the formation, i.e., 5 ohm-meters, it indicates that the resistivity tool can distinguish a thin layer with a thickness of 1 ft. For formations with a contrast of 1:10 for the surrounding rock and the formation of interest, it can be seen from FIG. 5 that the resistivity tool has a longitudinal resolution of 1 ft. Therefore, the resistivity logging instrument can increase the detection depth of the instrument and maintain the high-resolution characteristic of the logging instrument.
By the resistivity logging instrument and the resistivity logging method, a plurality of resistivity curves with different detection depths can be obtained without changing the size parameters of the whole structure of the electrode system of the instrument. Based on a first pair of supervision electrodes M1(M1') and a fourth pair of supervision electrodes M4(M4') midpoint with a second pair of monitor electrodes M2(M2') and a third pair of supervision electrodes M3(M3') the electrode distances in different measurement modes are equal, so that the detection depth of the logging instrument is increased, and the high-resolution characteristic of the logging instrument is still maintained. The resistivity logging instrument solves the problems of few measurement curves and shallow detection depth in the prior art.
It will be understood by those of ordinary skill in the art that all or some of the steps of the methods, systems, functional modules/units in the devices disclosed above may be implemented as software, firmware, hardware, and suitable combinations thereof. In a hardware implementation, the division between functional modules/units mentioned in the above description does not necessarily correspond to the division of physical components; for example, one physical component may have multiple functions, or one function or step may be performed by several physical components in cooperation. Some or all of the components may be implemented as software executed by a processor, such as a digital signal processor or microprocessor, or as hardware, or as an integrated circuit, such as an application specific integrated circuit. Such software may be distributed on computer readable media, which may include computer storage media (or non-transitory media) and communication media (or transitory media). The term computer storage media includes volatile and nonvolatile, removable and non-removable media implemented in any method or technology for storage of information such as computer readable instructions, data structures, program modules or other data, as is well known to those of ordinary skill in the art. Computer storage media includes, but is not limited to, RAM, ROM, EEPROM, flash memory or other memory technology, CD-ROM, Digital Versatile Disks (DVD) or other optical disk storage, magnetic cassettes, magnetic tape, magnetic disk storage or other magnetic storage devices, or any other medium which can be used to store the desired information and which can accessed by a computer. In addition, communication media typically embodies computer readable instructions, data structures, program modules or other data in a modulated data signal such as a carrier wave or other transport mechanism and includes any information delivery media as known to those skilled in the art.
Claims (10)
1. A resistivity tool, comprising:
the device comprises a main electrode, a plurality of pairs of shielding return electrodes and M pairs of monitoring electrodes, wherein the shielding return electrodes are symmetrical to the main electrode and arranged from inside to outside; the monitoring electrodes comprise N pairs of array monitoring measuring electrodes and a plurality of pairs of other monitoring electrodes;
the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode; wherein the first pair of shield return electrodes is the pair of shield return electrodes closest to the main electrode;
the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes symmetrically to the main electrode, wherein the last pair of shielding return electrodes is a pair of shielding return electrodes farthest away from the main electrode; n is a positive integer greater than or equal to 3 and less than M, and M is a positive integer greater than 3.
2. The resistivity tool of claim 1, wherein the plurality of pairs of shield return electrodes are five pairs of shield return electrodes; m is 9 and N is 4.
3. The resistivity tool of claim 2,
the N pairs of array supervision and measurement electrodes are arranged between the main electrode and the first pair of shielding return electrodes in a symmetrical mode to the main electrode, and the N pairs of array supervision and measurement electrodes comprise: the first pair, the second pair, the third pair and the fourth pair of array supervision and measurement electrodes are symmetrical to the main electrode and are arranged between the main electrode and the first pair of shielding return electrodes from inside to outside;
the midpoints of the first pair of array monitoring measuring electrodes and the fourth pair of array monitoring measuring electrodes are the same as the midpoints of the second pair of array monitoring measuring electrodes and the third pair of array monitoring measuring electrodes.
4. The resistivity tool of claim 2,
the other pairs of monitoring electrodes are respectively distributed between the shielding return electrodes except the last pair of shielding return electrodes in a manner of being symmetrical to the main electrodes, and the method comprises the following steps: the other monitoring electrodes are five pairs and are respectively arranged at one end of the first pair of shielding return electrodes, which is not close to the array monitoring measuring electrode, at two ends of the second pair of shielding return electrodes and at two ends of the third pair of shielding return electrodes.
5. The resistivity tool of claim 2, wherein the five pairs of shield return electrodes comprise: the first pair, the second pair, the third pair, the fourth pair and the last pair of shielding return electrodes are arranged from inside to outside in sequence; the length of the first pair of shielding return electrodes is smaller than that of the second pair of shielding return electrodes, the length of the second pair of shielding return electrodes is smaller than that of the third pair of shielding return electrodes, and the length of the third pair of shielding return electrodes is smaller than that of the fourth pair of shielding return electrodes;
the last pair of shielding return electrodes are positioned at two ends of the electrode system structure, and the length of the shielding return electrodes is in an asymmetric structure.
6. A resistivity measurement method, wherein the resistivity logging tool of claim 1 is applied, comprising:
emitting a main current from the main electrode, emitting a shield current using a portion of the plurality of pairs of shield return electrodes, the remaining shield return electrodes receiving a return current;
measuring the potential of a corresponding array monitoring measuring electrode in the N pairs of array monitoring measuring electrodes according to different measuring modes;
from the measured potential and the main current, the apparent resistivity is calculated.
7. The resistivity measurement method of claim 6, wherein the plurality of pairs of shield return electrodes are five pairs of shield return electrodes; m is 9, N is 4;
the transmitting a shielding current using a portion of the plurality of pairs of shielding return electrodes, the remaining shielding return electrodes receiving a return current, comprising:
in a first measurement mode, transmitting a shielding current using a first pair of shielding return electrodes, a second, third, fourth, and fifth pair of shielding return electrodes receiving a return current;
in a second measurement mode, transmitting a shielding current using the first pair and the second pair of shielding return electrodes, and receiving a return current using the third pair, the fourth pair, and the fifth pair of shielding return electrodes;
in a third measurement mode, transmitting a shielding current using the first, second, and third pairs of shielding return electrodes, the fourth and fifth pairs of shielding return electrodes receiving a return current; the first to fifth pairs of shielding return electrodes are arranged from inside to outside in sequence;
the measuring the electric potential of the corresponding array monitoring measuring electrode in the N pairs of array monitoring measuring electrodes according to different measuring modes comprises the following steps:
measuring the potential of the electrodes by using a second pair and a third pair of array monitoring measuring electrodes in a first measuring mode, a second measuring mode and a third measuring mode; and the voltages of the second pair of array supervision measuring electrodes and the third pair of array supervision measuring electrodes are equal, and the potential of the second pair of array supervision measuring electrodes is measured.
8. The resistivity measurement method of claim 6, wherein the plurality of pairs of shield return electrodes are five pairs of shield return electrodes; m is 9, N is 4,
the transmitting a shielding current using a portion of the plurality of pairs of shielding return electrodes, the remaining shielding return electrodes receiving a return current, comprising:
transmitting a shielding current using the first, second, third, and fourth pairs of shielding return electrodes, the fifth pair of shielding return electrodes receiving a return current; the first to fifth pairs of shielding return electrodes are arranged from inside to outside in sequence; the measuring the electric potential of the corresponding array monitoring measuring electrode according to different measuring modes comprises the following steps:
in a fourth measurement mode, adopting a second pair and a third pair of array monitoring measurement electrodes to measure the electric potential of the electrodes, wherein the voltages of the second pair and the third pair of array monitoring measurement electrodes are equal, and measuring the electric potential of the second pair of array monitoring measurement electrodes;
and in a fifth measurement mode, measuring the electric potential of the electrodes by adopting a first pair and a fourth pair of array monitoring measurement electrodes, wherein the voltages of the first pair and the fourth pair of array monitoring measurement electrodes are equal, and measuring the electric potential of the first pair of array monitoring measurement electrodes.
9. The resistivity measurement method of claim 6, wherein the calculating an apparent resistivity from the measured potential and the main current comprises:
calculating to obtain apparent resistivity according to the measured potentials of the first pair or the second pair of array monitoring measuring electrodes and the main current by adopting a preset conversion formula;
the conversion formula comprises:
wherein Ra represents the apparent resistivity, UMRepresenting first or second pairs of arraysAnd (4) monitoring the potential of the measuring electrode, wherein K represents an instrument constant corresponding to the corresponding measuring mode.
10. A computer-readable storage medium storing computer-executable instructions which, when executed by a processor, implement the steps of the resistivity measurement method of any one of claims 6-9.
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