CN105525918B - Dual lateral logging instrument, electrode system thereof and formation resistivity measuring method - Google Patents

Dual lateral logging instrument, electrode system thereof and formation resistivity measuring method Download PDF

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CN105525918B
CN105525918B CN201410572687.6A CN201410572687A CN105525918B CN 105525918 B CN105525918 B CN 105525918B CN 201410572687 A CN201410572687 A CN 201410572687A CN 105525918 B CN105525918 B CN 105525918B
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CN105525918A (en
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胡海涛
白庆杰
肖占山
张森峰
高秀晓
姚春明
朱瑞明
于振南
邵琨
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CNPC Great Wall Drilling Co
China National Logging Corp
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China National Logging Corp
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Abstract

The invention relates to a double-laterolog instrument and an electrode system thereof, a formation resistivity measuring method, wherein the electrode system comprises an electrode system and an insulating core rod, the electrode system is composed of a plurality of electrodes arranged on the insulating core rod and is connected with a measuring circuit through a lead, the plurality of electrodes are separated by adopting an insulating material, the center of the insulating core rod is a metal rod, the center of the metal rod is provided with a through hole, the metal rod is insulated from the electrode system, and the electrode system comprises: main electrodes a0, a 0' disposed in the middle of the electrode series; at least one pair of shield electrodes a2, a2 'and a1, a 1' emitting a shield current to focus the main current; a plurality of pairs of voltage measuring electrodes a1, a1 'and M0, M0' that measure the electrode voltage; and at least one pair of voltage monitoring electrodes M2, M2 'and M1, M1' for voltage monitoring, wherein shielding electrodes a2, a2 'are shorted, main electrodes a0, a 0' are shorted, and the other electrodes are not shorted. Thereby, higher measurement accuracy is achieved as compared with the hard focus system.

Description

Dual lateral logging instrument, electrode system thereof and formation resistivity measuring method
Technical Field
The invention relates to a logging device for petroleum exploration and development, in particular to a double-laterolog instrument and an electrode system and formation resistivity measuring method thereof.
Background
The dual laterolog instrument is a main instrument for measuring the formation resistivity in an open hole, researching the invasion change of the formation and estimating the oil saturation. The traditional double lateral logging instrument mainly comprises an electrode system, an electronic circuit and an insulating short section, the total length is about 7-10 meters, the deep lateral detection depth is about 1-1.5 meters, the shallow lateral detection depth is about 0.2-0.5 meters, and the longitudinal resolution is about 0.6 meter. When the traditional double-lateral logging instrument carries out deep lateral logging, the annular electrode emits current to enter a stratum, the columnar electrode emits shielding current to focus the main current, a feedback loop is needed in an electronic circuit to adjust the shielding current, and the monitoring electrode is controlled to be at the equipotential. For example, chinese patent CN1712995A discloses a strong-focusing dual-lateral logging tool, which mainly comprises an insulation short section, an electrode system and an electronic circuit part, wherein the electrode system comprises a main electrode and is centered on the main electrode, and a monitoring electrode, a shielding electrode, an auxiliary monitoring electrode and a loop electrode which are symmetrical to each other, the tool retains a standard mode of a conventional dual-lateral detection depth being the shallowest, and adds a deep-lateral strong-focusing mode of a shallow lateral with a double-layer shielding and a three-layer shielding. Theoretically, this focusing approach requires the amplifier to have infinite gain, but in practice, the monitor electrodes are not strictly equipotential and introduce errors in the measurement results, since the gain of the amplifier is limited. This error is small in conventional dual laterologs, but large in high resolution dual laterologs.
Along with the deepening of oil and gas exploration and development, reservoirs such as thin interbed layers and the like gradually become the key points of exploration, a logging instrument with high resolution is needed, the resolution of the traditional double-lateral logging instrument is generally 0.6m and cannot meet the exploration requirement, meanwhile, the length of a logging operation rat hole is short, the operation amount of complex well hole conditions such as a highly deviated well, a horizontal well and a fishbone branch well is increased year by year, the length of the traditional double-lateral logging instrument is about 7-10 m, well site construction operation and combined logging are not facilitated, and the probability of blocking is greatly increased under the complex well hole conditions such as the highly deviated well, the horizontal well and the fishbone branch well.
The patent application with the application number of 201210233337, which is proposed by the 22 nd research institute of the Chinese electronics science and technology group corporation, discloses a high-resolution azimuthal resistivity lateral logging instrument and a logging method, wherein the high-resolution azimuthal resistivity lateral logging instrument mainly comprises an azimuthal electrode system and a measuring electronic circuit, the electrode system comprises a plurality of lateral electrode rings with different widths and an azimuthal electrode ring M0 which are embedded on an insulating carrier, the center of the electrode system is M0, the 14 electrode rings with different widths use M0 as a symmetry axis and are arranged according to different intervals, the electrode rings with the same name are kept at equal potential by wire short circuit, and the electrode rings with the same name, the azimuthal electrode ring, a reference electrode N and a loop B are respectively connected with the measuring circuit through wires. Although the high-resolution azimuthal resistivity logging instrument and the logging method adopt the digital focusing mode and the hard focusing mode, compared with the original hard focusing circuit, the acquisition amount is increased, the measurement precision is greatly improved, and the measurement information is richer, the influence of the vertical potential gradient formed in the center of the instrument is still not solved due to the adoption of the mode that each electrode ring with the same name is short-circuited by a lead, so that the higher measurement precision is difficult to achieve.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: aiming at the defects in the prior art, the dual laterolog instrument electrode system and the resistivity measuring method with high resolution based on a software focusing mode are provided.
In order to solve the problems in the prior art, the invention provides an electrode system of a dual laterolog instrument, which comprises the electrode system and an insulating core rod, wherein the electrode system is composed of a plurality of electrodes arranged on one insulating core rod and is connected with a measuring circuit through a lead, and the electrode system is characterized in that
The plurality of electrodes are separated by adopting an insulating material, the center of the insulating core rod is a metal rod, the center of the metal rod is provided with a through hole, the metal rod is insulated from the electrode system, and the electrode system comprises:
main electrodes a0, a 0' disposed in the middle of the electrode train;
at least one pair of shield electrodes a2, a2 'and a1, a 1' emitting a shield current to focus the main current;
a plurality of pairs of voltage measuring electrodes a1, a1 'and M0, M0' that measure the electrode voltage; and
at least one pair of voltage monitoring electrodes M2, M2 'and M1, M1' for voltage monitoring,
wherein the shielding electrodes a2, a2 'are shorted, the main electrodes a0, a 0' are shorted, and the other electrodes are not shorted.
Preferably, in the dual laterolog tool electrode system, one of the electrodes M0, M0 'is located in the middle of the electrode system and is used for measuring the voltage of the main electrodes a0, a 0', respectively.
Preferably, in the dual laterolog instrument electrode system, the plurality of electrodes are sequentially arranged from one end to the other end of the electrode system as an electrode a2, an electrode a1, an electrode a1, an electrode M2, an electrode M1, an electrode a0, an electrode M0, an electrode M0 ', an electrode a0 ', an electrode M1 ', an electrode M2 ', an electrode a1 ', an electrode a1 ' and an electrode a2 '.
The invention also provides a dual laterolog instrument for measuring the formation resistivity, which is provided with the electrode system of the dual laterolog instrument.
In addition, the invention also provides a formation resistivity measuring method, which adopts the double lateral logging instrument to measure the formation resistivity and is characterized in that the bidirectional logging instrument works in the following three modes:
in mode 1, the current output by the output module is applied to electrodes A1, A1 'and electrodes A2, A2', and the auxiliary supervisory circuit module maintainsThe electrode a1 is equipotential to the electrode a2, and the data acquisition module records the potentials of the electrodes M2 and M2 'and the potentials of the electrodes M1 and M1' in the mode, and records the potentials as
Figure 375684DEST_PATH_IMAGE001
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Figure 391144DEST_PATH_IMAGE003
Figure 957255DEST_PATH_IMAGE004
While recording the potential of electrode N, is recorded
Figure 196606DEST_PATH_IMAGE005
In mode 2, the current output by the output module is applied to the electrodes A1 and A1 'and returned to the electrodes A2 and A2', and the data acquisition module records the potentials of the electrodes M2 and M2 'and the electrodes M1 and M1' in the mode and records the potentials as
Figure 822760DEST_PATH_IMAGE006
Figure 881983DEST_PATH_IMAGE007
Figure 251784DEST_PATH_IMAGE008
Figure 283325DEST_PATH_IMAGE009
While recording the potential of electrode N, is recorded
Figure 80380DEST_PATH_IMAGE010
In mode 3, the current output by the output module is applied to electrodes a0, a0 ' and returned to electrodes a1, a1 ' and electrodes a2, a2 ', the supervisory circuit module maintains electrode a1 at the same potential as electrode a2, and electrode a1 at the same potential as electrode a2The data acquisition module records the potentials of the electrodes M2 and M2 ', the electrodes M1 and M1 ', and the electrodes M0 and M0 ' in the mode, and records the potentials as
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Figure 545493DEST_PATH_IMAGE013
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Figure 422631DEST_PATH_IMAGE015
Figure 134235DEST_PATH_IMAGE016
While recording the potential of electrode N, is recorded
Figure 937106DEST_PATH_IMAGE017
(ii) a The current on the recording electrodes A0, A0', is recorded as
Figure 13646DEST_PATH_IMAGE018
Figure 597074DEST_PATH_IMAGE019
Preferably, in the formation resistivity measurement method, the deep lateral apparent resistivity can be obtained by combining the mode 1 with the mode 3:
Figure 112369DEST_PATH_IMAGE020
wherein,
Figure 769746DEST_PATH_IMAGE021
in order to be a deep lateral instrumental factor,
Figure 79505DEST_PATH_IMAGE022
Figure 87912DEST_PATH_IMAGE023
Figure 141319DEST_PATH_IMAGE024
Figure 918782DEST_PATH_IMAGE025
Figure 399442DEST_PATH_IMAGE026
preferably, in the formation resistivity measurement method, the mode 2 and the mode 3 are combined to obtain shallow lateral apparent resistivity:
Figure 957462DEST_PATH_IMAGE027
wherein,
Figure 486664DEST_PATH_IMAGE028
is the coefficient of the shallow lateral instrument,
Figure 180950DEST_PATH_IMAGE029
Figure 35774DEST_PATH_IMAGE030
preferably, in the formation resistivity measurement method, the following high-resolution deep and shallow lateral apparent resistivity curves can be calculated by using the data acquired in the 3 working modes:
Figure 815511DEST_PATH_IMAGE031
Figure 148403DEST_PATH_IMAGE032
wherein,
Figure 962776DEST_PATH_IMAGE033
Figure 722921DEST_PATH_IMAGE034
high resolution deep and shallow lateral instrument coefficients respectively,
Figure 927638DEST_PATH_IMAGE035
Figure 126538DEST_PATH_IMAGE036
Figure 733100DEST_PATH_IMAGE037
Figure 726463DEST_PATH_IMAGE038
Figure 418476DEST_PATH_IMAGE039
Figure 155488DEST_PATH_IMAGE040
Figure 616556DEST_PATH_IMAGE026
compared with the prior art, the invention has the following advantages:
the invention solves the problems that the traditional dual-side adopts a hardware focusing mode, the circuit realizes main monitoring control through closed loop, the influence of peripheral environment is large, the focusing effect is deviated and the like, avoids the influence of residual potential between monitoring electrodes in hard focusing and greatly improves the longitudinal resolution. Meanwhile, the vertical gradient formed in the center of the instrument is solved, the focusing capacity of the instrument is further enhanced, and the measurement precision of the instrument is improved.
In addition, the invention can obtain 2 standard deep and shallow resistivity curves and 2 high-resolution deep and shallow resistivity curves at the same time; high resolution logs can identify 0.1m lamellae and can measure the true resistivity of 0.4m lamellae.
Moreover, the design scheme of the high-resolution dual laterolog instrument electrode system can effectively shorten the length of the instrument and improve the applicability of the instrument in a complex borehole environment.
Drawings
FIG. 1 is a schematic diagram of the high resolution dual laterolog tool electrode system of the present invention.
FIGS. 2A and 2B illustrate mode 1 and mode 3, respectively, of the high resolution dual laterolog tool of the present invention; FIG. 2C is a deep lateral log pattern synthesized using the high resolution dual laterolog tool of the present invention.
FIGS. 3A and 3B illustrate mode 2 and mode 3, respectively, of the high resolution dual laterolog tool of the present invention; FIG. 3C is a shallow laterolog pattern synthesized using the high resolution dual laterolog tool of the present invention.
Detailed Description
The traditional dual laterolog instrument adopts a hardware focusing mode, a circuit realizes main monitoring control through a closed loop, the influence of peripheral environment is large (temperature change, power supply fluctuation and the like), residual voltage cannot be eliminated, and focusing effect deviation (logic dual laterolog main monitoring amplification factor reaches 25000 times and approaches the limit of circuit design). The invention adopts a software focusing mode. The software focusing is a novel focusing mode, the principle of electric field superposition is utilized, two currents in a non-focusing state are synthesized into focusing current, the focusing condition is satisfied unconditionally, and therefore the influence of residual current between monitoring electrodes in the hardware focusing process can be prevented, and the method becomes an effective method for improving the longitudinal resolution.
The structure of the high resolution double laterolog instrument electrode system of the invention is shown in figure 1, which is mainly composed of an electrode system and an insulating core rod, wherein the electrode system is connected with a measuring circuit through a lead, and the whole system also comprises a reference electrode N (not shown) and a loop electrode B. The electrode system is composed of 14 electrodes arranged on an insulating mandrel, the electrode names from one end to the other end of the electrode system are A2, A1, A1, M2, M1, A0, M0, M0 ', A0', M1 ', M2', A1 ', A1 and A2' in sequence, the electrodes are separated by adopting an insulating material, the center of the insulating mandrel is a metal rod, the center of the metal rod is provided with a through hole, and the metal rod and the electrode system are insulated. The electrodes A2 and A2 ' and the electrodes A1 and A1 ' are shielding electrodes and are positioned at two ends of an electrode system, and the shielding electrodes A2 and A2 ' are connected through leads and are used for emitting shielding current to focus main current. The electrodes a0, a0 ' are main electrodes, are located in the middle of the electrode system, are divided into two parts by the electrodes M0, M0 ', and are connected through a lead between the electrodes a0, a0 ' for emitting main current. The electrode system further includes ring electrodes such as electrodes a1, a1 ', electrodes M2, M2', electrodes M1, M1 ', and electrodes M0, M0', and the ring electrodes a1 and a1 'are used to measure the voltages of the shielding electrodes a1 and a 1', respectively. In addition, two pairs of ring electrodes M2, M2 'and M1, M1' are used for voltage monitoring, while ring electrodes M0, M0 'are located in the middle of the electrode series and are used to measure the voltage at electrodes a0, a 0', respectively.
That is, in the present invention, the electrodes a2, a 2' are directly connected together by a wire and then connected to a circuit; the electrodes A0 and A0' are directly connected together by a lead wire and then connected with a circuit, and the other electrodes are directly connected with the circuit.
The embodiment discloses a logging method adopting the high-resolution dual laterolog instrument. According to the electric field superposition principle in software focusing, the logging method can be decomposed into three independent modes with different frequencies, namely a mode 1, a mode 2 and a mode 3, and the deep and shallow lateral focusing modes can be realized by combining the three modes in pairs.
Fig. 2A and 2B show mode 1 and mode 3, respectively, of the high resolution dual laterolog tool of the present invention. FIGS. 3A and 3B show mode 2 and mode 3, respectively, of the high resolution dual laterolog tool of the present invention.
As shown in fig. 2A, in mode 1, the current output by the output module is applied to electrodes a1, a1 ' and electrodes a2, a2 ', the auxiliary monitoring circuit module keeps electrode a1 equipotential to electrode a2, and electrode a1 equipotential to electrode a2 ', and the data acquisition module records the potentials of electrodes M2, M2 ' and electrodes M1, M1 ' in this mode, and records the potentials as
Figure 46400DEST_PATH_IMAGE001
Figure 225709DEST_PATH_IMAGE002
Figure 438516DEST_PATH_IMAGE003
Figure 81987DEST_PATH_IMAGE004
While recording the potential of electrode N, is recorded
Figure 354836DEST_PATH_IMAGE005
As shown in FIG. 3A, in mode 2, the current output by the output module is applied to electrodes A1, A1 'and back to electrodes A2, A2'. The data acquisition module records the potentials of the electrodes M2 and M2 'and the potentials of the electrodes M1 and M1' in the mode and records the potentials as
Figure 83758DEST_PATH_IMAGE006
Figure 100255DEST_PATH_IMAGE007
Figure 598233DEST_PATH_IMAGE008
Figure 369880DEST_PATH_IMAGE009
While recording the potential of electrode N, is recorded
Figure 258201DEST_PATH_IMAGE010
As shown in fig. 2B and fig. 3B, in mode 3, the current output by the output module is applied to electrodes a0, a0 ', and returned to electrodes a1, a 1' and electrodes a2, a2 ', and the supervisory loop module maintains electrode a1 at the same potential as electrode a2 and electrode a1 at the same potential as electrode a 2'. The data acquisition module records the potentials of the electrodes M2 and M2 ', the electrodes M1 and M1 ', and the electrodes M0 and M0 ' in the mode, and records the potentials as
Figure 140707DEST_PATH_IMAGE011
Figure 430874DEST_PATH_IMAGE012
Figure 373422DEST_PATH_IMAGE013
Figure 686723DEST_PATH_IMAGE014
Figure 107340DEST_PATH_IMAGE015
Figure 517592DEST_PATH_IMAGE016
While recording the potential of electrode N, is recorded
Figure 631042DEST_PATH_IMAGE017
(ii) a While recording the current on electrodes A0, A0', noted as
Figure 493956DEST_PATH_IMAGE018
Figure 718264DEST_PATH_IMAGE019
Example 1
FIG. 2C is a deep lateral log pattern synthesized using the high resolution dual laterolog tool of the present invention. The apparent resistivity of the stratum can be calculated by using the data acquired under the 3 working modes. As shown in fig. 2C, deep lateral apparent resistivity can be obtained using mode 1 in combination with mode 3:
Figure 729162DEST_PATH_IMAGE020
wherein,
Figure 13513DEST_PATH_IMAGE021
in order to be a deep lateral instrumental factor,
Figure 426040DEST_PATH_IMAGE022
Figure 391722DEST_PATH_IMAGE023
Figure 573305DEST_PATH_IMAGE024
Figure 700661DEST_PATH_IMAGE025
Figure 600483DEST_PATH_IMAGE026
example 2
FIG. 3C is a shallow laterolog pattern synthesized using the high resolution dual laterolog tool of the present invention. The apparent resistivity of the stratum can be calculated by using the data acquired under the 3 working modes. As shown in fig. 3C, with mode 2 combined with mode 3, shallow side-view resistivity can be obtained:
Figure 104277DEST_PATH_IMAGE027
wherein,
Figure 405945DEST_PATH_IMAGE028
is the coefficient of the shallow lateral instrument,
Figure 766520DEST_PATH_IMAGE029
Figure 91322DEST_PATH_IMAGE030
the following high-resolution deep and shallow lateral apparent resistivity curves can be calculated by using the data acquired under the 3 working modes:
Figure 461123DEST_PATH_IMAGE031
Figure 289402DEST_PATH_IMAGE032
wherein,
Figure 24140DEST_PATH_IMAGE033
Figure 632976DEST_PATH_IMAGE034
high resolution deep and shallow lateral instrument coefficients respectively,
Figure 806468DEST_PATH_IMAGE035
Figure 754832DEST_PATH_IMAGE036
Figure 660472DEST_PATH_IMAGE037
Figure 694287DEST_PATH_IMAGE038
Figure 405891DEST_PATH_IMAGE039
Figure 208762DEST_PATH_IMAGE040
Figure 347619DEST_PATH_IMAGE026
in the invention, the electrodes A2 and A2 'are short-circuited, the electrodes A0 and A0' are short-circuited, and other electrodes are not short-circuited. The potential difference between the control electrodes A1 and A1' of the driving loop is adopted to eliminate the vertical gradient formed in the center of the instrument, namely the vertical gradient is realized
Figure 868730DEST_PATH_IMAGE041
Providing more accurate focusing conditions.
The invention adopts a soft focusing mode, adopts an open-loop mode for a circuit, is less influenced by the peripheral environment, improves the measurement precision during formation resistivity measurement, can effectively shorten the length of the dual-laterolog instrument, and improves the applicability of the instrument in a complex borehole environment. Meanwhile, the logging instrument and the logging method can identify and detect a thin layer and a thin interbed of 0.1m, and provide an effective logging curve for thin layer logging.
The above embodiments are only for illustrating but not limiting the technical solutions of the present invention, and although the present invention is described in detail with reference to the above embodiments, those of ordinary skill in the art should understand that: modifications and equivalents may be made thereto without departing from the spirit and scope of the invention and it is intended to cover in the claims the invention as defined in the appended claims.

Claims (8)

1. The electrode system of the double lateral logging instrument comprises an electrode system and an insulating core rod, wherein the electrode system is composed of a plurality of electrodes arranged on the insulating core rod and is connected with a measuring circuit through a lead, and the electrode system is characterized in that
The plurality of electrodes are separated by adopting an insulating material, the center of the insulating core rod is a metal rod, the center of the metal rod is provided with a through hole, the metal rod is insulated from the electrode system, and the electrode system comprises:
main electrodes a0, a 0' disposed in the middle of the electrode train;
at least one pair of shield electrodes a2, a2 'and a1, a 1' emitting a shield current to focus the main current;
a plurality of pairs of voltage measuring electrodes a1, a1 'and M0, M0' that measure the electrode voltage; and
at least one pair of voltage monitoring electrodes M2, M2 'and M1, M1' for voltage monitoring,
wherein the shielding electrodes a2, a2 'are shorted, the main electrodes a0, a 0' are shorted, and the other electrodes are not shorted.
2. The dual laterolog tool electrode train of claim 1, wherein one of the pairs of voltage measurement electrodes M0, M0 'is located in the middle of the electrode train for measuring the voltage of the main electrodes a0, a 0', respectively.
3. The dual laterolog tool electrode train of claim 1, wherein the plurality of electrodes are arranged in series from one end of the electrode train to the other as a shield electrode a2, a voltage measurement electrode a1, a shield electrode a1, a voltage monitor electrode M2, a voltage monitor electrode M1, a main electrode a0, a voltage measurement electrode M0, a voltage measurement electrode M0 ', a main electrode a0 ', a voltage monitor electrode M1 ', a voltage monitor electrode M2 ', a shield electrode a1 ', a voltage measurement electrode a1 ', a shield electrode a2 '.
4. A dual laterolog tool for formation resistivity measurement, comprising the dual laterolog tool electrode system of any one of claims 1 to 3.
5. A method of formation resistivity measurements using the dual laterolog apparatus of claim 4, wherein said dual laterolog apparatus is operated in three modes:
in mode 1, the current output by the output module is loaded on the shielding electrodes A1 and A1 'and the shielding electrodes A2 and A2', the auxiliary monitoring circuit module keeps the voltage measuring electrode A1 and the shielding electrode A2 at the same potential, and the data acquisition module records the potentials of the voltage monitoring electrodes M2 and M2 'and the voltage monitoring electrodes M1 and M1' in the mode and records the potentials as
Figure 711636DEST_PATH_IMAGE001
Figure 628776DEST_PATH_IMAGE002
Figure 470830DEST_PATH_IMAGE003
Figure 866040DEST_PATH_IMAGE004
While recording the potential of electrode N, is recorded
Figure 493461DEST_PATH_IMAGE005
In mode 2, the current output by the output module is loaded on the shielding electrodes A1 and A1 'and returns to the shielding electrodes A2 and A2', and the data acquisition module records the potentials of the voltage monitoring electrodes M2 and M2 'and the voltage monitoring electrodes M1 and M1' in the mode and records the potentials as
Figure 315924DEST_PATH_IMAGE006
Figure 962718DEST_PATH_IMAGE007
Figure 161618DEST_PATH_IMAGE008
Figure 830496DEST_PATH_IMAGE009
While recording the potential of electrode N, is recorded
Figure 823860DEST_PATH_IMAGE010
In mode 3, the current output by the output module is applied to the main electrodes a0 and a0 ' and returned to the shielding electrodes a1 and a1 ' and the shielding electrodes a2 and a2 ', the monitoring circuit module keeps the voltage measuring electrode a1 equipotential with the shielding electrode a2, the voltage measuring electrode a1 equipotential with the shielding electrode a2 ', and the data acquisition module records the potentials of the voltage monitoring electrodes M2 and M2 ', the voltage monitoring electrodes M1 and M1 ', and the voltage measuring electrodes M0 and M0 ' in the mode and records the potentials as
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Figure 900904DEST_PATH_IMAGE013
Figure 143797DEST_PATH_IMAGE014
Figure 385423DEST_PATH_IMAGE015
Figure 660546DEST_PATH_IMAGE016
While recording the potential of electrode N, is recorded
Figure 304017DEST_PATH_IMAGE017
Recording the current on the main electrodes A0, A0', noted as
Figure 701501DEST_PATH_IMAGE018
Figure 430422DEST_PATH_IMAGE019
6. The formation resistivity measurement method of claim 5, using the mode 1 in combination with the mode 3, a deep lateral apparent resistivity can be obtained:
Figure 509237DEST_PATH_IMAGE020
wherein,
Figure 318798DEST_PATH_IMAGE021
in order to be a deep lateral instrumental factor,
Figure 90445DEST_PATH_IMAGE022
Figure 41084DEST_PATH_IMAGE023
Figure 923589DEST_PATH_IMAGE024
Figure 151439DEST_PATH_IMAGE025
Figure 156304DEST_PATH_IMAGE026
7. the formation resistivity measurement method of claim 5, with the mode 2 combined with the mode 3, a shallow sideview resistivity can be obtained:
Figure 594239DEST_PATH_IMAGE027
wherein,
Figure 326441DEST_PATH_IMAGE028
is the coefficient of the shallow lateral instrument,
Figure 799010DEST_PATH_IMAGE029
Figure 974777DEST_PATH_IMAGE030
8. the method for measuring the formation resistivity according to any one of the claims 5 to 7, wherein the following high-resolution deep and shallow lateral resistivity curves can be calculated by using the data acquired in the three operation modes of the mode 1, the mode 2 and the mode 3:
Figure 900007DEST_PATH_IMAGE031
Figure 373583DEST_PATH_IMAGE032
wherein,
Figure 248129DEST_PATH_IMAGE033
Figure 594797DEST_PATH_IMAGE034
high resolution deep and shallow lateral instrument coefficients respectively,
Figure 313049DEST_PATH_IMAGE035
Figure 341048DEST_PATH_IMAGE036
Figure 584947DEST_PATH_IMAGE037
Figure 774620DEST_PATH_IMAGE038
Figure 674443DEST_PATH_IMAGE039
Figure 53603DEST_PATH_IMAGE040
Figure 355271DEST_PATH_IMAGE026
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