CN111351420B - Magnetic position sensing device and method - Google Patents

Magnetic position sensing device and method Download PDF

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Publication number
CN111351420B
CN111351420B CN201811596977.9A CN201811596977A CN111351420B CN 111351420 B CN111351420 B CN 111351420B CN 201811596977 A CN201811596977 A CN 201811596977A CN 111351420 B CN111351420 B CN 111351420B
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voltage
pattern
induced voltage
induction
ruler
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CN111351420A (en
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王裕铭
杜陈忠
陈柏安
张祯元
胡竹生
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Industrial Technology Research Institute ITRI
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Industrial Technology Research Institute ITRI
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques

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  • General Physics & Mathematics (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
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Abstract

A magnetic position sensing device and method, which utilizes the relative position change of the pattern of an induction scale and an excitation element to generate induced voltage change, and further analyzes the position of the excitation element by the technical means of analyzing the position by a voltage value.

Description

Magnetic position sensing device and method
Technical Field
The present invention relates to position sensing technology, and more particularly, to a magnetic position sensing device and method.
Background
The high-precision position detecting device includes an optical ruler and a magnetic ruler, which are widely used in precision machinery industry (such as machine tools) and smart manufacturing industry (such as precision mechanical arms), wherein the magnetic ruler has better anti-pollution capability and simple structure than the optical ruler in response to the requirement of processing equipment to process products in a severe environment.
However, the conventional magnetic Scale suffers from the bottleneck of miniaturization of the magnetic pole width, and the problem of detection stability due to assembly control of the voltage phase difference analysis pattern position, so that the precision and stability of the general magnetic Scale are not high, and on the other hand, the problem of time consumption for magnetizing makes the high-order magnetic Scale more difficult to be scaled (Scale up).
Therefore, how to effectively improve the problems of time consumption of magnetization, difficulty in controlling the installation precision, limited production length, etc., is one of the issues to be solved in the industry at present.
BRIEF SUMMARY OF THE PRESENT DISCLOSURE
To overcome the disadvantages of the prior art, the present invention provides a magnetic position sensing device, comprising: an excitation element for generating an alternating magnetic field; an induction ruler, which is formed with a pattern, and the relative position change of the pattern and the excitation element generates induction voltage; and a position analyzing element for extracting the induced voltage to analyze the position of the exciting element on the induction scale according to the induced voltage.
The invention also provides a magnetic position sensing method, which comprises the following steps: forming a pattern on an induction ruler; making an excitation element generate an alternating magnetic field; generating induced voltage by using the relative position change of the pattern of the induction ruler and the excitation element; and extracting the induction voltage by using a position analysis element, and analyzing the position of the excitation element on the induction ruler according to the induction voltage.
It can be seen from the above that, the present invention utilizes the relative position change between the pattern of the induction Scale and the excitation element to generate the induced voltage, and further uses the technical means of analyzing the position by voltage value to improve the position detection precision and stability, and the advantages of easy scaling (Scale up) of the metal line pattern transfer process, so as to solve the problems of time consumption for magnetizing, difficult control of installation precision and limited production length encountered by magnetic pole pattern sensing and voltage phase difference analysis in the prior art.
Drawings
FIG. 1 is a schematic view of a first embodiment of a magnetic position sensing device of the present disclosure;
FIG. 2 is a schematic diagram of an excitation element of a first embodiment of a magnetic position sensing device of the present disclosure;
FIG. 3 is a schematic diagram of a position-resolving element of a first embodiment of a magnetic position-sensing device of the present disclosure;
FIG. 4 is a schematic diagram of an induced voltage signal processing unit of a first embodiment of the magnetic position sensing apparatus of the present disclosure;
FIG. 5A is a schematic view of a pattern of a sensing scale of a first embodiment of a magnetic position sensing apparatus of the present disclosure;
FIGS. 5B to 5C are schematic diagrams illustrating signal processing of induced voltages of the first embodiment of the magnetic position sensing apparatus according to the present disclosure;
FIG. 5D is a schematic diagram of a magnetic position sensing diagram of the first embodiment of the magnetic position sensing device of the present disclosure;
FIG. 5E is a schematic diagram of the relationship between the square wave pattern and the processing voltage of the first embodiment of the magnetic position sensing device of the present disclosure;
FIG. 5F is an enlarged view of the turning point of the processing voltage of the first embodiment of the magnetic position sensing device of the present disclosure;
FIG. 6A is a schematic view of a pattern of a sensing scale of a second embodiment of a magnetic position sensing apparatus of the present disclosure;
FIG. 6B is a schematic diagram of a magnetic position sensing diagram of a second embodiment of a magnetic position sensing apparatus of the present disclosure;
FIG. 6C is a schematic view of an analysis section of a second embodiment of a magnetic position sensing device of the present disclosure;
FIG. 7 is a schematic flow chart diagram illustrating a first embodiment of a magnetic position sensing method according to the present disclosure; and
fig. 8 is a flowchart illustrating step S74 of the first embodiment of the magnetic position sensing method according to the present disclosure.
[ description of main reference numerals in the drawings ] of the embodiments of the present disclosure
1 magnetic position sensing device
10 excitation element
20 induction ruler
21 front side
22 back side
30, 30' pattern
31 square wave pattern
31' first pattern
32 second graphic
40 position analyzing element
41 induced voltage signal processing unit
42 induced voltage resolution position cell
61 square wave region
62 negative square wave region
63 alternating magnetic field
101 magnetic conductive part
102 winding part
103 ac power supply unit
104 first magnetic pole part
105 second magnetic pole part
106 opening
311 treating voltage
311' first processing Voltage
313, 313' first peak-valley horizontal part
314, 314' first vertical part
315, 315' first peak top horizontal portion
321 second processing voltage
323 second peak-valley horizontal part
324 second vertical portion
325 second peak top horizontal part
411 filter
412 envelope detector
511 the first non-turning curve section
512 first turning curve section
513 first rising line segment
514 first descending line segment
515 first mountain area
516 first valley region
521 second non-turning curve section
522 second turning curve section
523 second rising line segment
524 second descending line segment
525 second peak area
526 second valley region
B wave crest turning region
Distance X
VS,VS1,VS2Induced voltage
VP,VP1,VP2Processing voltage
S71-S74, S81-S82.
Detailed Description
Other advantages and capabilities of the present disclosure will be readily apparent to those skilled in the art from the present disclosure, since the embodiments of the present disclosure are described below by specific embodiments.
It should be understood that the structures, proportions, and dimensions shown in the drawings and described herein are for illustrative purposes only and are not intended to limit the scope of the present disclosure, which is to be given the full breadth of the present disclosure, and thus, all such modifications, proportions, and variations are within the scope of the present disclosure without departing from the spirit and scope of the present disclosure. In addition, the terms "first" and "second" used in the present specification are for clarity of description only, and are not intended to limit the scope of the present disclosure, and changes or modifications in the relative relationship therebetween may be regarded as the scope of the present disclosure without substantial changes in the technical contents.
Fig. 1 is a schematic diagram of a first embodiment of a magnetic position sensing device 1 of the present disclosure. As shown in the figure, the magnetic position sensing apparatus 1 includes an excitation element 10 to which an alternating current power source is applied to generate an alternating magnetic field; an induction scale 20, in which a pattern 30 is formed, and induced voltage is generated by the relative position change of the pattern 30 and the excitation element 10; and a position analyzing element 40 connected to the sensing ruler 20 for reading the induced voltage generated by the sensing ruler 20 and analyzing the position of the exciting element 10 on the sensing ruler 20 according to the induced voltage.
In one embodiment, pattern 30 of induction ruler 20 is comprised of metal wires.
In one embodiment, the pattern 30 of the sensing ruler 20 is a periodic waveform pattern, and both ends of the periodic waveform pattern are connected to the position analyzing device 40, so that the position analyzing device 40 can read the induced voltage generated by the relative position change between the pattern 30 and the exciting device 10.
Fig. 2 is a side view of the excitation element 10 of this first embodiment of the present disclosure. As shown in the figure, the excitation element 10 includes a magnetic conductive portion 101, a winding portion 102, an ac power supply unit 103, a first magnetic pole portion 104, a second magnetic pole portion 105, and an opening 106.
The magnetic conductive part 101 is in a ring shape with an opening 106, the first magnetic pole part 104 and the second magnetic pole part 105 are located at two ends of the magnetic conductive part 101, the opening 106 is located between the first magnetic pole part 104 and the second magnetic pole part 105, and the winding part 102 is in a coil structure and is wound on the magnetic conductive part 101. At the same time, the excitation element 10 moves over the pattern 30 of the sensing ruler 20 through the opening 106, or the excitation element 10 is fixed to move the sensing ruler 20 in the opening 106.
The ac power supply unit 103 applies ac power to the winding portion 102 to generate the alternating magnetic field, so that the relative position between the pattern 30 of the induction ruler 20 and the exciting element 10 is changed to generate the induced voltage.
Fig. 3 is a schematic diagram of the position analyzing element 40 of the magnetic position sensing device 1 of the present disclosure. As shown in the figure, the position analyzing device 40 includes an induced voltage signal processing unit 41, which is connected to the pattern 30 on the induction scale 20 to read the induced voltage V generated by the relative position change between the pattern 30 and the exciting device 10SAnd for the induced voltage VSPerforming signal processing of filtering and detecting to obtain processing voltage VP(ii) a And an induced voltage analyzing position unit 42 connected to the induced voltage signal processing unit 41 to receive the processing voltage VPAnd according to the processing voltage VPCorresponding to the relationship that the length of the pattern 30 on the sensing scale 20 is equal to the distance of the pattern 30 on the sensing scale 20 on the X coordinate, so as to resolve the position of the exciting element 10 on the sensing scale 20。
Fig. 4 is a schematic diagram of a first embodiment of the induced voltage signal processing unit 41 according to the present disclosure. As shown, the induced voltage signal processing unit 41 includes a filter 411 for the induced voltage VSFiltering to obtain the induced voltage VSFiltering out the carrier frequency of the alternating current power supply; and an envelope detector (envelope detector)412 connected to a filter (filter)411 to filter out the induced voltage V of the carrier frequencySDetecting to obtain the processing voltage VP
In the present embodiment, the filter 411 is a low-pass filter.
In this embodiment, the induced voltage signal processing unit 41 further includes: a first amplifier (not shown), an output end of which is connected to an input end of the filter 411, an input end of which is connected to the pattern 30 of the sensing scale 20, so as to obtain an induced voltage generated by a relative position change of the pattern 30 and the exciting element 10 from the sensing scale 20, amplify the induced voltage, and output the amplified induced voltage to the filter 411, but not limited thereto.
In this embodiment, the induced voltage signal processing unit 41 further includes: a level shifter (not shown) connected to the envelope detector 412 for processing the filtered and detected signal into a processed voltage VPPerforming level shift process to obtain the processing voltage VPThe level required for the subsequent operation (referred to herein as the voltage level); and a second amplifier (not shown) connected to the level shifter for shifting the processing voltage V to be level-shiftedPThe amplified output is sent to the induced voltage resolution location unit 42, but not limited thereto.
In this embodiment, the position analyzing element 40 further includes: an analog-to-digital converter (not shown) located between the induced voltage signal processing unit 41 and the induced voltage analyzing position unit 42 for converting the processing voltage V obtained by the induced voltage signal processing unit 41PProcessing voltage V converted into digital signalPAnd transmitted to the induced voltage resolution location unit 42, but not limited thereto.
Fig. 5A is a schematic diagram of a first embodiment of pattern 30 of induction scale 20 according to the present disclosure. As shown in the figure, the pattern 30 of the first embodiment is a square wave pattern 31 and is formed only on one of the front surface 21 and the back surface 22 of the induction ruler 20 shown in fig. 1, the square wave pattern 31 is composed of a plurality of first peak-valley horizontal portions 313, a plurality of first vertical portions 314 and a plurality of first peak-top horizontal portions 315, a line width of the square wave pattern 31 is 1mm, a line distance (a) between the first vertical portions 314 is 4mm, and a period (T) of the square wave pattern 31 is 4mmD) The distance corresponding to the X coordinate is 8mm, and the area of the square wave pattern 31 with the opening facing downward is a square wave area 61 and the area with the opening facing upward is a negative square wave area 62.
Fig. 5B is a waveform diagram of the induced voltage generated by the position analyzing element 40 according to the first embodiment analyzing the relative position change between the pattern 30 and the excitation element 10. As shown in the figure, when the exciting element 10 moves by a distance Δ X on the sensing scale 20, the relative position between the pattern 30 on the sensing scale 20 and the exciting element 10 changes, and a corresponding change in the induced voltage (change in the amplitude of the waveform) occurs. Therefore, the induced voltage VS1To the induced voltage VS2The relationship (c) is that the laser element 10 moves by a distance Δ X on the induction scale 20, and the induced voltage V includes the amplitude of the carrier frequency of the ac power supply 103, and therefore the induced voltage VS1Moving distance DeltaX to induced voltage VS2There will be a change in amplitude.
Fig. 5C is a schematic diagram of the processing voltage obtained after the induced voltage in fig. 5B is analyzed by the position analyzing element 40. As shown, the induced voltage V has a variation in amplitudeS1And VS2The signal processing unit 41 performs filtering and detection to obtain a processed voltage V without the carrier frequencyP1And VP2Since the processing voltage corresponds to the induced voltage, the processing voltage VP1To a treatment voltage VP2The relationship of (a) to (V) is also a change in the Δ X distance.
After the excitation element 10 generates the alternating magnetic field, the induced voltage signal processing unit 41 processes the patterns 30 and the excitation element 10The induced voltage V generated by the relative position changeSAfter performing signal processing of filtering and detection to obtain the processing voltage 311 having a triangular-like shape as shown in fig. 5D, the induced voltage analyzing position unit 42 extracts all sections of the processing voltage 311 having a triangular-like shape as shown in fig. 5D as an analysis section, and sets the period (T) of the processing voltage of the analysis sectionL) Corresponding to the length on the X coordinate, with the period (T) of square wave pattern 31D) The change of the processing voltage of the analysis section along with the distance unit is the moving distance of the exciting element 10 on the induction scale 20, and the position of the exciting element 10 on the induction scale 20 is analyzed from the analysis section.
It will be appreciated that the voltage V is processedP1Corresponding induced voltage VS1And induce a voltage VS1With respect to the distance over which the excitation element 10 moves over the pattern 30, and thus the period of the processing voltage (T) shown in fig. 5DL) Corresponding to the length on the X coordinate by the period (T) of the pattern 30D) Corresponding to the unit representation of distance on the X coordinate, X ═ S × TL+X0=S×TL+(Vt-V0) Where X is the position of the excitation element 10 on the sensing scale 20, S is the number of cycles (0, 0.5, 1, 1.5,..) of the evaluation segment, TLFor analysing the distance of the period of the segments, X0Processing the distance, V, from the voltage to X for the S-th cycletTo process the voltage value, V0Is the linear starting voltage value of the S period, m is (X, V)t) The slope value of (a).
Fig. 5E is a schematic diagram illustrating a relationship between the square wave pattern 31 and the processing voltage 311 on the induction ruler 20 according to the first embodiment of the disclosure. As shown in the figure, the relative position change between the square wave pattern 31 and the excitation element 10 generates a processing voltage 311 corresponding to a triangle-like waveform, and fig. 5F shows that the processing voltage 311 of the triangle-like waveform appears like an arc in the turning region between the peak and the trough (as shown in the peak turning region B in fig. 5E).
Fig. 6A is a schematic diagram of a pattern 30' of a second embodiment of the magnetic position sensing device 1 of the present disclosure. As shown in the figure, the difference between the present embodiment and the first embodimentThe difference is the pattern 30', so the differences will be described below and the description of the same will be omitted. The pattern 30 ' of the present embodiment includes a first pattern 31 ' and a second pattern 32, the first pattern 31 ' is formed on the front surface 21 of the sensing ruler 20 shown in fig. 1, and the second pattern 32 is formed on the back surface 22 of the sensing ruler 20 shown in fig. 1, wherein the first pattern 31 ' and the second pattern 32 are located on the same horizontal line, and the first pattern 31 ' and the second pattern 32 are the same and differ from each other by 1/2 line distance (a) or 1/4 period (T) of t.sub.32 (t.sub.d)D) The first pattern 31 'is a square wave pattern composed of a plurality of first peak-valley horizontal portions 313', a plurality of first vertical portions 314 'and a plurality of first peak-top horizontal portions 315', and the second pattern 32 is a square wave pattern composed of a plurality of second peak-valley horizontal portions 323, a plurality of second vertical portions 324 and a plurality of second peak-top horizontal portions 325.
After the relative position change between the first pattern 31' and the excitation element 10 generates the first induced voltage and the relative position change between the second pattern 32 and the excitation element 10 generates the second induced voltage, the induced voltages are processed by the induced voltage signal processing unit 41 to obtain two processing voltages in the form of triangle-like waves which are located on the same horizontal line and have a difference of 1/4 cycles as shown in fig. 6B, the first processing voltage 311 'corresponds to the first graph 31' and the second processing voltage 321 corresponds to the second graph 32, the first processing voltage 311 'and the second processing voltage 321 both have the waveform of triangle-like waves, as shown in fig. 6A, the first graph 31' and the second graph 32 have a difference of 1/2 line spacing (a) or 1/4 cycles (TD), therefore, the first processing voltage 311' and the second processing voltage 321 also differ from each other by 1/4 cycles (T).D)。
The waveforms of the first non-inflected curve segment 511 of the first processing voltage 311 'and the second non-inflected curve segment 521 of the second processing voltage 321 are non-inverted portions, and thus the slope approaches a constant value, and the waveforms of the first inflected curve segment 512 of the first processing voltage 311' and the second inflected curve segment 522 of the second processing voltage 321 are inverted portions, and thus the slope cannot approach the constant value due to the exchange of positive and negative slopes. The first non-turning curve section 511 includes a first rising line section 513 and a first falling line section 514, the second non-turning curve section 521 includes a second rising line section 523 and a second falling line section 524, the first turning curve section 512 includes a first peak region 515 and a first valley region 516, and the second turning curve section 522 includes a second peak region 525 and a second valley region 526.
Then, the induced voltage analyzing position unit 42 is used to subtract the first peak area 515 and the first valley area 516 of the first processing voltage 311', extract only the first rising line 513 and the first falling line 514, similarly, the induced voltage analyzing position unit 42 subtracts the second peak area 525 and the second valley area 526 of the second processing voltage 321, extract only the second rising line 523 and the second falling line 524 (as shown by the thick line in fig. 6B), so that all the rising lines and the falling lines of the first processing voltage 311 and the second processing voltage 321 form the analysis section of the forward and backward staggered triangular wave shown in fig. 6C, and the period of the processing voltage (T) of the analysis section is the period of the processing voltage (T) of the analysis sectionL) Corresponding to the length on the X coordinate, with a period (T) of the first pattern 31' or the second pattern 32D) The change of the processing voltage of the analysis section along with the distance unit is the moving distance of the exciting element 10 on the sensing scale 20, so as to complete the position sensing waveform diagram shown in fig. 6C, and further analyze the position of the exciting element 10 on the sensing scale 20 from the analysis section.
It is to be understood that, since the first graph 31 'corresponds to the first processing voltage 311' and the second graph 32 corresponds to the second processing voltage 321, the period (T) of the processing voltage shown in FIG. 6CL) A period (T) of the first pattern 31' or the second pattern 32 corresponding to the length of the X coordinateD) Corresponding to the distance unit representation on the X coordinate.
Since the induced voltage analyzing unit 42 only extracts the non-inflected curve segments 511 and 521 with the slope approaching the constant value, the pattern 30 'of the second embodiment can effectively improve the accuracy of the position sensing of the exciting element 10 compared to the pattern 30 of the first embodiment, wherein in the second embodiment, referring back to fig. 6A, when the periods (T) of the first pattern 31' and the second pattern 32 are (T)D) Corresponding to a distance of 8mm on the X coordinate, a line pitch (A) of 4mm and a line width of 1mm, and a first graphThe shape 31' and the second pattern 32 are offset
Figure GDA0003053550310000091
During the process, from the analysis section of the non-turning curve section of the first processing voltage 311' and the second processing voltage 321, the optimal forward precision error range and the optimal positioning precision of the position sensing of the exciting element 10 can be obtained, wherein the optimal forward precision error range is ± 0.003mm and the optimal positioning precision is 0.01 mm.
In the second embodiment, as shown in fig. 6C, the induced voltage analyzing position unit 42 further provides a position conversion algorithm to directly convert the position (X) of the exciting element 10 on the induction scale 20, wherein X is S × 1/2 (T)L)+X0=S×1/2(TL)+(Vt-V0) Where X is the position of the excitation element 10 on the sensor scale 20, S is the number of cycles (0, 0.5, 1, 1.5.) of the evaluation segment, TLFor analysing the distance of the period of the segments, X0Processing the distance, V, from the voltage to X for the S-th cycletTo process the voltage value, V0Is the linear starting voltage value of the S period, m is (X, V)t) The slope value of (2) has many position conversion algorithms, and is not limited to the above. The calculation is over several periods TLS X1/2 (T) is obtainedL) The linear starting voltage value V of the S-th period is obtained from the known slope value m of the rising section and the falling section of the triangular wave0Measuring a process voltage value V to be knowntThen, the distance X from the S-th period induction voltage to X can be calculated0Thereby, the position X of the exciting element 10 on the induction scale 20 can be obtained.
Fig. 7 is a schematic flowchart of a first embodiment (i.e., the single-sided pattern ruler of fig. 5A) of the magnetic position sensing method of the present disclosure. As shown, the method comprises the following steps: in step S71, forming a pattern 30 on a sensing ruler 20; in step S72, an excitation element 10 generates an alternating magnetic field; in step S73, an induced voltage is generated by using the relative position change of the pattern 30 of the induction scale 20 and the excitation element 10; and in step S74, a position analyzing element 40 is used to extract the induced voltage, and the position of the exciting element 10 on the sensing scale 20 is analyzed according to the induced voltage.
The step S72 is to make an ac power supply unit 103 apply ac power to the exciting element 10 to generate the alternating magnetic field.
Fig. 8 is a flowchart of the step S74. As shown, the method comprises the following steps: in step S81, an induced voltage signal processing unit 41 reads the induced voltage V generated by the relative position change between the pattern 30 and the excitation element 10 from the induction ruler 20SAnd for the induced voltage VSPerforming signal processing of filtering and detecting to obtain processing voltage VP(ii) a And in step S82, let an induced voltage resolution location unit 42 read the processing voltage VPAccording to the relationship that the period of the processing voltage corresponds to the length of the pattern 30 on the sensing scale 20 on the X coordinate and corresponds to the distance on the X coordinate, the position of the exciting element 10 on the sensing scale 20 can be analyzed from the processing voltage.
In the present embodiment, the step S81 includes: the induced voltage is filtered by a low pass filter (i.e. filter 411 of fig. 4) to filter the induced voltage VSThe carrier frequency of the ac power supply is filtered out; the induced voltage V at the carrier frequency is filtered out by an envelope detector (i.e., envelope detector 412 of FIG. 4)SDetecting to obtain the processing voltage VP
In the first embodiment, the step S71 forms the pattern 30 of the square wave pattern 31 on one of the front surface 21 or the back surface 22 of the induction ruler 20 opposite to the front surface 21; the induced voltage signal processing unit 41 in step S81 reads the induced voltage generated by the relative position change between the square wave pattern 31 and the excitation element 10 from the induction ruler 20, and applies the induced voltage VSPerforming signal processing of filtering and detection to obtain the processed voltage 311 in the form of a triangle-like wave; and making the induced voltage analyzing position unit 42 in the step S82 read the triangular-like processing voltage 311, and making all the segments of the triangular-like processing voltage 311 be analysis segments, and according to the length of the period of the processing voltage corresponding to the X coordinate being equal to the distance of the period of the square wave pattern 31 on the induction rule 20 corresponding to the X coordinateThe relationship (f) of the period (T) of the processing voltage of the analysis sectionL) Corresponding to the period (T) of the square-wave pattern 31 in length on the X coordinateD) The distance unit on the X coordinate represents to complete the position sensing waveform shown in fig. 5D, and the change of the processing voltage of the analysis section along with the distance unit is the moving distance of the excitation element 10 on the sensing scale 20, so as to analyze the position of the excitation element 10 on the sensing scale 20 from the analysis section.
The present disclosure further provides a second embodiment of a magnetic position sensing method (i.e., a double-sided pattern ruler in fig. 6A), which is different from the first embodiment in the pattern 30', and therefore, different points will be described below, and the description thereof is omitted. The step S71 is to form patterns on the front surface 21 and the back surface 22 of the induction ruler 20, each of which is a first pattern 31' and a second pattern 32 of a square wave pattern and has a difference of 1/2 line spacing or 1/4 cycles (as shown in fig. 6A), respectively, and have the same horizontal line; the induced voltage signal processing unit 41 in step S81 performs the signal processing on the induced voltage generated by the relative position change between each pattern and the excitation element 10 to obtain two processing voltages (i.e. the first processing voltage 311' and the second processing voltage 321) with similar triangular waves which are located on the same horizontal line and have a difference of 1/4 cycles; and enabling the induced voltage analyzing position unit 42 in the step S82 to read the two triangular-wave-like processing voltages (i.e. the first processing voltage 311 ' and the second processing voltage 321), extract the non-inflected curve segments (i.e. the first non-inflected curve segment 511 and the second non-inflected curve segment) of the two triangular-wave-like processing voltages (i.e. the first processing voltage 311 ' and the second processing voltage 321) to obtain the analysis segment of the forward and reverse interleaved triangular waves (as shown in fig. 6C), and apply the period (T) of the processing voltage of the analysis segment according to the relationship that the period of the processing voltage corresponds to the distance on the X coordinate between the period of the first graph 31 ' or the period of the second graph 32 on the induction ruler 20 and the X coordinateL) Corresponding to the period (T) of the first pattern 31' or the second pattern 32 in length on the X coordinateD) Corresponding to the distance unit representation on the X coordinate to complete the location sensing waveform diagram as shown in FIG. 6C, and let the analysis regionThe change of the processing voltage of the segment along with the distance unit is the moving distance of the excitation element 10 on the induction scale 20, and then the position of the excitation element 10 on the induction scale 20 is analyzed from the analysis section.
In the first embodiment of the method (i.e. the single-sided pattern ruler in fig. 5A), the step S82 further includes providing a bit permutation algorithm to directly swap the position (X) of the exciting element 10 on the sensing ruler 20 from the position sensing waveform chart, wherein X is sxtL+X0=S×TL+(Vt-V0) Where X is the position of the excitation element 10 on the sensing scale 20, S is the number of cycles (0, 0.5, 1, 1.5,..) of the evaluation segment, TLFor analysing the distance of the period of the segments, X0Processing the distance, V, from the voltage to X for the S-th cycletTo process the voltage value, V0Is the linear starting voltage value of the S period, m is (X, V)t) The slope value of (2) has many position conversion algorithms, and is not limited to the above.
In the second embodiment of the method (i.e. fig. 6A dual-sided pattern ruler), the step S82 further includes providing a bit permutation algorithm to directly swap the position (X) of the exciting element 10 on the sensing ruler 20 from the position sensing waveform diagram, wherein X is S × 1/2(T ═ S ═ X1/2)L)+X0=S×1/2(TL)+(Vt-V0) Where X is the position of the excitation element 10 on the sensing scale 20, S is the number of cycles (0, 0.5, 1, 1.5,..) of the evaluation segment, TLFor analysing the distance of the period of the segments, X0Is S × 1/2 (T)L) Distance to point X, VtTo process the voltage value, V0Is the linear starting voltage value of the S period, m is (X, V)t) The slope value of (2) has many position conversion algorithms, and is not limited to the above.
As can be seen from the above, the present disclosure utilizes the relative position change between the pattern of the induction Scale and the excitation element 10 to generate the induced voltage, and further uses the technical means of analyzing the position by voltage value to improve the position detection precision and stability, and the advantages of the metal line pattern transfer process such as easy scaling (Scale up) are achieved, so as to solve the problems of time consumption for magnetizing, difficulty in controlling the installation precision, and limited production length encountered by the magnetic pole pattern sensing and voltage phase difference analysis in the prior art.

Claims (13)

1. A magnetic position sensing device, comprising:
an excitation element for generating an alternating magnetic field;
an induction ruler, which is formed with a pattern, and the relative position change of the pattern and the excitation element generates induction voltage; and
a position analyzing element for extracting the induced voltage to analyze the position of the exciting element on the induction scale according to the induced voltage;
the exciting element also comprises a first magnetic pole part, a second magnetic pole part and an opening positioned between the first magnetic pole part and the second magnetic pole part, so that the exciting element can move the pattern on the induction ruler in the opening through the first magnetic pole part and the second magnetic pole part;
wherein, the position of the exciting element on the induction ruler is obtained by one of the following algorithms: in the case that the pattern on the induction ruler is a square wave pattern and is located on the front or back side of the induction ruler, the algorithm (1) X = sxtL+X0= S×TL+(Vt-V0) Obtaining the product of the reaction; or when the front and back surfaces of the induction ruler are respectively provided with patterns on the same horizontal line, the patterns are square wave patterns and have 1/2 line spacing or 1/4 periods, the method (2) X = S X1/2 (T)L)+X0= S×1/2(TL)+(Vt-V0) Obtaining the product of the reaction;
wherein X is the position of the exciting element on the induction ruler, S is the period number of the analysis section, TLFor analysing the distance of the period of the segments, X0Processing the distance, V, from the voltage to X for the S-th cycletTo process the voltage value, V0Is the linear starting voltage value of the S period, m is (X, V)t) The slope value of (a).
2. A magnetic position sensing device according to claim 1, wherein the pattern of the sensing ruler is formed of metal wires.
3. The magnetic position sensing device of claim 1, further comprising:
an AC power supply unit for applying AC power to the exciting element to generate the alternating magnetic field.
4. A magnetic position sensing device according to claim 3, wherein the position resolving element further comprises:
an induced voltage signal processing unit which reads the induced voltage and sequentially performs signal processing of filtering and detecting on the induced voltage to obtain a processed voltage, wherein the carrier frequency of the alternating current power supply contained in the induced voltage is filtered by the filtering; and
the induced voltage analyzing position unit analyzes the position of the exciting element on the induction scale according to the relation that the distance between the period of the processing voltage and the X coordinate is equal to the distance between the period of the pattern on the induction scale and the X coordinate.
5. The magnetic position sensing device of claim 4, wherein for the algorithm (1), the pattern on the sensing scale is a square wave pattern and is located on the front or back of the sensing scale, so that the induced voltage signal processing unit processes the induced voltage generated by the relative position change between the pattern and the exciting element to obtain the processing voltage in the form of a triangle wave, and the induced voltage analyzing location unit extracts all sections of the processing voltage in the form of a triangle wave to obtain an analyzing section, and analyzes the position of the exciting element on the sensing scale from the analyzing section according to the relationship that the distance between the period of the processing voltage and the X coordinate is equal to the distance between the period of the pattern on the sensing scale and the X coordinate.
6. The magnetic position sensor according to claim 4, wherein for the algorithm (2), the front and back surfaces of the sensing ruler each have a pattern on the same horizontal line, each of the patterns is a square wave pattern and differs from each other by 1/2 line distance or 1/4 cycles, so that the induced voltage signal processing unit performs signal processing on the induced voltage generated by the relative position change of each pattern and the excitation element, so as to obtain the processing voltages of two triangular-like waves on the same horizontal line and differing from each other by 1/4 cycles, and the induced voltage analyzing position unit extracts the non-turning curve segments of the two triangular-like processing voltages to obtain the analysis segments of the front and back staggered triangular waves, and according to the relationship that the distance of the processing voltage on the X coordinate is equal to the distance of the pattern on the sensing ruler on the X coordinate, and analyzing the position of the excitation element on the induction scale from the analysis section.
7. The magnetic position sensing device according to claim 4, wherein the induced voltage signal processing unit obtains the processed voltage without the carrier frequency after performing signal processing of filtering and detecting the induced voltage with amplitude variation, and the voltage variation of the processed voltage corresponds to the variation of the moving distance of the laser element on the sensing scale.
8. A method of magnetic position sensing, comprising:
forming a pattern on an induction ruler;
making an excitation element generate an alternating magnetic field;
generating induced voltage by using the relative position change of the pattern of the induction ruler and the excitation element; and
extracting the induced voltage by using a position analysis element, and analyzing the position of the excitation element on the induction ruler according to the induced voltage;
the exciting element also comprises a first magnetic pole part, a second magnetic pole part and an opening positioned between the first magnetic pole part and the second magnetic pole part, so that the exciting element can move the pattern on the induction ruler in the opening through the first magnetic pole part and the second magnetic pole part;
wherein, the position of the exciting element on the induction ruler is obtained by one of the following algorithms: in the case that the pattern on the induction ruler is a square wave pattern and is located on the front or back side of the induction ruler, the algorithm (1) X = sxtL+X0= S×TL+(Vt-V0) Obtaining the product of the reaction; or when the front and back surfaces of the induction ruler are respectively provided with patterns on the same horizontal line, the patterns are square wave patterns and have 1/2 line spacing or 1/4 periods, the method (2) X = S X1/2 (T)L)+X0= S×1/2(TL)+(Vt-V0) Obtaining the product of the reaction;
wherein X is the position of the exciting element on the induction ruler, S is the period number of the analysis section, TLFor analysing the distance of the period of the segments, X0Processing the distance, V, from the voltage to X for the S-th cycletTo process the voltage value, V0Is the linear starting voltage value of the S period, m is (X, V)t) The slope value of (a).
9. The method of claim 8, wherein the alternating magnetic field is generated by an ac power supply unit applying ac power to the excitation element.
10. The method of claim 9, wherein the step of the position analyzing element analyzing the position of the exciting element on the sensing scale comprises:
an induced voltage signal processing unit reads the induced voltage generated by the relative position change of the pattern and the excitation element from the induction ruler, and then sequentially performs signal processing of filtering and detecting on the induced voltage to obtain a processed voltage, wherein the carrier frequency of the alternating current power supply contained in the induced voltage is filtered by the filtering; and
and analyzing the position of the exciting element on the induction scale from the processing voltage by an induction voltage analyzing position unit according to the relation that the distance between the period of the processing voltage and the X coordinate is equal to the distance between the period of the pattern on the induction scale and the X coordinate.
11. The magnetic position sensing method of claim 10, wherein for the algorithm (1), a square-wave pattern is formed on the front or back of the sensing ruler, the induced voltage signal processing unit performs signal processing on the induced voltage generated by the relative position change between the pattern and the exciting element to obtain the processing voltage in a triangle-like wave, the induced voltage analyzing position unit extracts all sections of the processing voltage in a triangle-like wave to obtain an analyzing section, and the position of the exciting element on the sensing ruler is analyzed from the analyzing section according to the relationship that the distance between the period of the processing voltage and the X coordinate is equal to the distance between the period of the pattern on the sensing ruler and the X coordinate.
12. The magnetic position sensing method of claim 10, wherein for the algorithm (2), the front and the back of the sensing ruler are formed with patterns on the same horizontal line, each of the patterns is a square wave pattern and has a difference of 1/2 line distance or 1/4 cycles, so that the induced voltage signal processing unit processes the induced voltage generated by the relative position change between each of the patterns and the exciting element to obtain two triangular-like processing voltages on the same horizontal line and having a difference of 1/4 cycles, and the induced voltage analyzing position unit extracts the non-turning curve segments of the two triangular-like processing voltages to obtain the forward and backward staggered triangular analysis segments, and according to the relationship that the distance of the processing voltage on the X coordinate is equal to the distance of the pattern on the sensing ruler on the X coordinate, and analyzing the position of the excitation element on the induction scale from the analysis section.
13. The magnetic position sensing method of claim 10, wherein the induced voltage signal processing unit performs signal processing of filtering and detecting the induced voltage having a variation in amplitude to obtain the processed voltage without the carrier frequency, and a variation in voltage of the processed voltage corresponds to a variation in a moving distance of the laser element on the induction scale.
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