CN111348652A - Chlorosilane high-boiling-point substance catalytic cracking reactor and polycrystalline silicon device - Google Patents
Chlorosilane high-boiling-point substance catalytic cracking reactor and polycrystalline silicon device Download PDFInfo
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- CN111348652A CN111348652A CN202010357993.3A CN202010357993A CN111348652A CN 111348652 A CN111348652 A CN 111348652A CN 202010357993 A CN202010357993 A CN 202010357993A CN 111348652 A CN111348652 A CN 111348652A
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- 239000005046 Chlorosilane Substances 0.000 title claims abstract description 41
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 238000004523 catalytic cracking Methods 0.000 title claims abstract description 37
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 17
- 239000000126 substance Substances 0.000 title claims description 16
- 238000009835 boiling Methods 0.000 claims abstract description 20
- 229920005591 polysilicon Polymers 0.000 claims abstract description 9
- 239000007921 spray Substances 0.000 claims description 8
- 230000008093 supporting effect Effects 0.000 claims description 8
- 239000000843 powder Substances 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 3
- 239000011148 porous material Substances 0.000 claims description 3
- 239000002699 waste material Substances 0.000 abstract description 6
- 238000003912 environmental pollution Methods 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 239000002994 raw material Substances 0.000 abstract description 4
- 239000000463 material Substances 0.000 description 15
- 238000007599 discharging Methods 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 239000003054 catalyst Substances 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 4
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000005049 silicon tetrachloride Substances 0.000 description 3
- 229910008045 Si-Si Inorganic materials 0.000 description 2
- 229910003910 SiCl4 Inorganic materials 0.000 description 2
- 229910003818 SiH2Cl2 Inorganic materials 0.000 description 2
- 229910002808 Si–O–Si Inorganic materials 0.000 description 2
- 229910006411 Si—Si Inorganic materials 0.000 description 2
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910007245 Si2Cl6 Inorganic materials 0.000 description 1
- 229910003822 SiHCl3 Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- LXEXBJXDGVGRAR-UHFFFAOYSA-N trichloro(trichlorosilyl)silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl LXEXBJXDGVGRAR-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
The invention provides a catalytic cracking reactor for chlorosilane high-boiling residues and a polysilicon device, wherein the catalytic cracking reactor for chlorosilane high-boiling residues comprises: the reactor comprises a reactor body, wherein the reactor body comprises a side wall, a top wall and a bottom wall, the side wall is surrounded by a cylindrical structure, the top wall is blocked at the upper end of the cylindrical structure, and the bottom wall is blocked at the lower end of the cylindrical structure; a first feed channel disposed on the bottom wall; the second feeding channel is arranged at the upper part of the cylindrical structure; and the discharge channel is arranged on the top wall. The technical scheme of the invention effectively solves the problems of raw material waste and environmental pollution caused in the production process of the polycrystalline silicon in the prior art.
Description
Technical Field
The invention relates to the technical field of polysilicon reaction vessels, in particular to a catalytic cracking reactor for chlorosilane high-boiling residues and a polysilicon device.
Background
In the process of producing polysilicon by the improved Siemens method, tail gas of a reduction system is except silicon and SiCl4、SiH2Cl2、H2And HCl, etc., and Si2Cl6、Si2HCl5、Si2H2Cl4、Cl6OSi2And Si3Cl8And the by-products of some series of compounds with double silicon atoms and multiple silicon atoms are generated, and the boiling points of the compounds with double silicon atoms and multiple silicon atoms are higher compared with trichlorosilane and silicon tetrachloride, namely the compounds with double silicon atoms and multiple silicon atoms are chlorosilane high-boiling residues. After the reduction tail gas is recovered by a dry method and rectified and purified, SiHCl3、SiCl4、SiH2Cl2、H2And HCl and other materials are returned to a system for recycling, after chlorosilane high-boiling residues and part of silicon tetrachloride are discharged from a rectifying tower kettle, most enterprises generally adopt a method of further concentrating the chlorosilane high-boiling residues to recover the silicon tetrachloride and then directly hydrolyzing, the treatment method not only causes the loss of a large amount of valuable elements such as silicon and chlorine, but also needs alkali liquor for neutralization, and a large amount of silicon-containing waste is generated after hydrolysis neutralization and needs deep burying treatment. In addition, acid mist is formed after the chlorosilane high-boiling residues are contacted with air or water, and the environment is polluted.
Disclosure of Invention
The invention mainly aims to provide a chlorosilane high-boiling-point substance catalytic cracking reactor and a polycrystalline silicon device, which are used for solving the problems of raw material waste and environmental pollution caused in the production process of polycrystalline silicon in the prior art.
In order to achieve the above object, according to one aspect of the present invention, there is provided a chlorosilane high boiler catalytic cracking reactor comprising: the reactor comprises a reactor body, wherein the reactor body comprises a side wall, a top wall and a bottom wall, the side wall is surrounded by a cylindrical structure, the top wall is blocked at the upper end of the cylindrical structure, and the bottom wall is blocked at the lower end of the cylindrical structure; a first feed channel disposed on the bottom wall; the second feeding channel is arranged at the upper part of the cylindrical structure; and the discharge channel is arranged on the top wall.
Further, the first feed channel includes a first feed tube passing through the bottom wall, a first end of the first feed tube being located within the reactor body, a second end of the first feed tube being located outside the reactor body, and a first filter cap disposed at the first end of the first feed tube.
Further, first filter cap includes first casing and the filter core of setting in first casing, has the via hole on the first casing, and first casing passes through threaded connection with first inlet pipe.
Further, the second feed channel includes a second feed pipe passing through the sidewall and a plurality of spiral spray heads mounted on a section of the second feed pipe located within the reactor body.
Further, discharge channel includes discharging pipe and second filter cap, and the first end of discharging pipe is located the reactor body, and the second end of discharging pipe is located the outside of reactor body, and the second filter cap sets up the first end at the discharging pipe.
Further, the second filter cap includes the second casing and sets up the filter core in the second casing, has the via hole on the second casing, and the second casing passes through threaded connection with the second inlet pipe.
Furthermore, the chlorosilane high-boiling residue catalytic cracking reactor also comprises a supporting structure which is arranged in the reactor body and is positioned on one side close to the bottom wall.
Further, the support structure includes a support provided on an inner wall of the reactor body and a support plate mounted on the support.
Further, the support plate is made of a metal powder porous material.
Furthermore, the chlorosilane high-boiling residue catalytic cracking reactor also comprises a discharging channel, wherein the discharging channel is positioned on the side wall of the reactor body, and the discharging channel is positioned on one side of the supporting structure, which is far away from the bottom wall.
Furthermore, the chlorosilane high-boiling residue catalytic cracking reactor also comprises a feeding channel, and the feeding channel is positioned on the side wall of the reactor body.
According to another aspect of the invention, a polysilicon plant is provided, the polysilicon plant comprises a chlorosilane high-boiling-point substance catalytic cracking reactor, and the chlorosilane high-boiling-point substance catalytic cracking reactor is the chlorosilane high-boiling-point substance catalytic cracking reactor.
By applying the technical scheme of the invention, HCl is introduced into the first feeding channel, a second material with chemical bonds of Si-Si, Si-O-Si, Si-C-Si, Si-Cl and the like is introduced into the second feeding channel, the material entering the first feeding channel reacts with the material entering the second feeding channel, and the generated material flows out of the discharging channel. The technical scheme of the invention effectively solves the problems of raw material waste and environmental pollution caused in the production process of the polycrystalline silicon in the prior art.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the invention and, together with the description, serve to explain the invention and not to limit the invention. In the drawings:
fig. 1 shows a schematic structural diagram of an embodiment of a chlorosilane high boiler catalytic cracking reactor according to the invention.
Wherein the figures include the following reference numerals:
10. a reactor body; 20. a first feed channel; 21. a first feed tube; 22. a first filter cap; 30. a second feed channel; 31. a second feed tube; 32. a spiral spray head; 40. a discharge channel; 41. a discharge pipe; 42. a second filter cap; 50. a support structure; 60. a discharge passage; 70. a feed channel.
Detailed Description
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present invention will be described in detail below with reference to the embodiments with reference to the attached drawings.
It should be noted that the following detailed description is exemplary and is intended to provide further explanation of the disclosure. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.
Spatially relative terms, such as "above … …," "above … …," "above … …," "above," and the like, may be used herein for ease of description to describe one device or feature's spatial relationship to another device or feature as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if a device in the figures is turned over, devices described as "above" or "on" other devices or configurations would then be oriented "below" or "under" the other devices or configurations. Thus, the exemplary term "above … …" can include both an orientation of "above … …" and "below … …". The device may be otherwise variously oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
Exemplary embodiments according to the present application will now be described in more detail with reference to the accompanying drawings. These exemplary embodiments may, however, be embodied in many different forms and should not be construed as limited to only the embodiments set forth herein. It is to be understood that these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of the exemplary embodiments to those skilled in the art, in the drawings, the thicknesses of layers and regions are exaggerated for clarity, and the same devices are denoted by the same reference numerals, and thus the description thereof will be omitted.
As shown in fig. 1, the catalytic cracking reactor for chlorosilane high boiling point compounds of this example comprises: a reactor body 10, a first feed channel 20, a second feed channel 30 and a discharge channel 40. The reactor body 10 comprises a side wall, a top wall and a bottom wall, wherein the side wall is enclosed to form a tubular structure, the top wall is plugged at the upper end of the tubular structure, and the bottom wall is plugged at the lower end of the tubular structure. The first feed channel 20 is provided in the bottom wall. The second feed channel 30 is arranged in the upper part of the cylindrical structure. The outlet channel 40 is provided in the top wall.
By applying the technical scheme of the embodiment, HCl (first material) is introduced into the first feeding channel 20, a second material having chemical bonds of Si-Si, Si-O-Si, Si-C-Si, Si-Cl and the like is introduced into the second feeding channel 30, the material entering from the first feeding channel 20 reacts with the material entering from the second feeding channel 30, and the generated material flows out from the discharging channel. The technical scheme of the embodiment effectively solves the problems of raw material waste and environmental pollution caused in the production process of the polycrystalline silicon in the prior art.
As shown in fig. 1, in the solution of the present embodiment, the first feed channel 20 includes a first feed pipe 21 and a first filter cap 22, the first feed pipe 21 penetrates through the bottom wall, a first end of the first feed pipe 21 is located inside the reactor body 10, a second end of the first feed pipe 21 is located outside the reactor body 10, and the first filter cap 22 is disposed at the first end of the first feed pipe 21. The first filter cap 22 is provided to prevent the powder of the catalyst from entering the first feed pipe 21. The first feeding channel 20 is arranged on the flange blind plate, namely the bottom wall is the flange blind plate, and the flange blind plate is detachably connected with the side wall through bolts. The bottom wall is provided with a through hole, and the first feeding pipe 21 penetrates through the through hole and is welded with the bottom wall. The above structure facilitates maintenance work such as replacement of the first filter cap 22. In the technical scheme of this embodiment, the top wall and the bottom wall are blind flanges, and when the top wall and the bottom wall of the reactor body 10 are also of a sealing head structure.
As shown in fig. 1, in the solution of the present embodiment, the first filter cap 22 includes a first housing and a filter element disposed in the first housing, the first housing has a through hole, and the first housing is connected to the first feed pipe 21 by a screw thread. The structure has lower processing cost and convenient operation.
As shown in fig. 1, in the present embodiment, the second feed passage 30 includes a second feed pipe 31 and a plurality of spiral spray heads 32, the second feed pipe 31 penetrates through the sidewall, and the plurality of spiral spray heads 32 are installed on a pipe section of the second feed pipe 31 located inside the reactor body 10. The plurality of spiral spray heads 32 are arranged such that the second material is distributed more uniformly as it enters the reactor body 10. The second feeding channel 30 is installed on a flange blind plate, and the flange blind plate is detachably connected with the side wall of the reactor body 10 through bolts, so that the maintenance work of the catalytic cracking reactor for chlorosilane high-boiling residues can be facilitated, such as the replacement of a spiral spray head 32 and the like.
As shown in fig. 1, in the solution of the present embodiment, the discharging channel 40 includes a discharging pipe 41 and a second filter cap 42, a first end of the discharging pipe 41 is located in the reactor body 10, a second end of the discharging pipe 41 is located outside the reactor body 10, and the second filter cap 42 is disposed at the first end of the discharging pipe 41. The second filter cap 42 can prevent the catalyst powder from overflowing from the discharge pipe 41, so that on one hand, the purer material discharged from the discharge pipe 41 is ensured, and on the other hand, the waste of the catalyst is avoided. The discharge pipe 41 is connected to the top wall in a manner similar to the connection of the bottom wall to the first feed pipe 21.
As shown in fig. 1, in the technical solution of this embodiment, the second filter cap includes a second housing and a filter element disposed in the second housing, the second housing has a through hole, and the second housing is connected to the second feed pipe 31 through a thread. The structure has lower processing cost and convenient arrangement.
As shown in fig. 1, in the technical solution of this embodiment, the chlorosilane high boiler catalytic cracking reactor further includes a supporting structure 50, and the supporting structure 50 is disposed in the reactor body 10 and located at a side close to the bottom wall. The provision of the support structure 50 ensures that the catalyst is well supported.
As shown in fig. 1, in the solution of the present embodiment, the support structure 50 includes a support frame provided on the inner wall of the reactor body 10 and a support plate mounted on the support frame. The supporting structure 50 is low in processing cost and convenient to install.
As shown in fig. 1, in the solution of the present embodiment, the supporting plate is made of a metal powder porous material. Above-mentioned structure makes first material trafficability characteristic better, and the firm better supporting effect of backup pad. Specifically, the catalyst is a resin, and the resin is disposed on the support plate.
As shown in fig. 1, in the technical solution of this embodiment, the chlorosilane high boiling point substance catalytic cracking reactor further includes a discharge channel 60, the discharge channel 60 is located on the side wall of the reactor body 10, and the discharge channel 60 is located on the side of the support structure 50 away from the bottom wall. The discharge passage 60 is provided so that the catalyst and the like can be easily removed from the reactor body 10. In particular, the discharge opening of the discharge channel 60 is flush with the upper surface of the support structure 50.
As shown in fig. 1, in the technical solution of this embodiment, the chlorosilane high boiling point substance catalytic cracking reactor further includes a feeding channel 70, and the feeding channel 70 is located on the side wall of the reactor body 10. The structure makes the addition of materials such as catalysts and the like easier, and the structure greatly saves manpower and material resources.
It should be noted that the catalytic cracking reactor for chlorosilane high boiling point compounds of the present embodiment further includes a pressure measuring structure, a temperature measuring structure, a liquid outlet channel, a safety valve, and other structures.
The present application further provides a polysilicon device. The polycrystalline silicon device comprises a chlorosilane high-boiling-point substance catalytic cracking reactor, and the chlorosilane high-boiling-point substance catalytic cracking reactor is the chlorosilane high-boiling-point substance catalytic cracking reactor.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.
It should be noted that the terms "first," "second," and the like in the description and claims of this application and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the application described herein are, for example, capable of operation in sequences other than those illustrated or otherwise described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (12)
1. A catalytic cracking reactor for chlorosilane high-boiling residues is characterized by comprising:
the reactor body (10) comprises side walls, a top wall and a bottom wall, wherein the side walls are enclosed to form a cylindrical structure, the top wall is blocked at the upper end of the cylindrical structure, and the bottom wall is blocked at the lower end of the cylindrical structure;
a first feed channel (20), said first feed channel (20) being provided on said bottom wall;
a second feed channel (30), the second feed channel (30) being disposed at an upper portion of the cylindrical structure;
a discharge channel (40), the discharge channel (40) being disposed on the top wall.
2. A chlorosilane high boiler catalytic cracking reactor according to claim 1, characterized in that the first feed channel (20) comprises a first feed pipe (21) and a first filter cap (22), the first feed pipe (21) passes through the bottom wall, a first end of the first feed pipe (21) is located inside the reactor body (10), a second end of the first feed pipe (21) is located outside the reactor body (10), and the first filter cap (22) is arranged at the first end of the first feed pipe (21).
3. The chlorosilane high boiler catalytic cracking reactor according to claim 2, characterized in that the first filter cap (22) comprises a first housing and a filter element arranged in the first housing, the first housing is provided with a through hole, and the first housing is connected with the first feed pipe (21) through a thread.
4. A chlorosilane high boiler catalytic cracking reactor according to claim 1, characterized in that the second feed channel (30) comprises a second feed pipe (31) and a plurality of spiral spray heads (32), the second feed pipe (31) passes through the side wall, and the plurality of spiral spray heads (32) are installed on a pipe section of the second feed pipe (31) located inside the reactor body (10).
5. The chlorosilane high boiler catalytic cracking reactor according to claim 4, characterized in that the discharge channel (40) comprises a discharge pipe (41) and a second filter cap (42), a first end of the discharge pipe (41) is located in the reactor body (10), a second end of the discharge pipe (41) is located outside the reactor body (10), and the second filter cap (42) is arranged at the first end of the discharge pipe (41).
6. The chlorosilane high boiler catalytic cracking reactor according to claim 5, characterized in that the second filter cap comprises a second shell and a filter element arranged in the second shell, the second shell is provided with through holes, and the second shell is connected with the second feed pipe (31) through threads.
7. The chlorosilane high boiler catalytic cracking reactor according to one of claims 1 to 6, characterized by further comprising a support structure (50), the support structure (50) being arranged in the reactor body (10) on one side close to the bottom wall.
8. A chlorosilane high boiler catalytic cracking reactor according to claim 7, characterized in that the support structure (50) comprises brackets and support plates arranged on the inner wall of the reactor body (10), the support plates being mounted on the brackets.
9. The chlorosilane high boiler catalytic cracking reactor of claim 8, wherein the supporting plate is made of a metal powder porous material.
10. The reactor for catalytic cracking of chlorosilane high boilers as claimed in claim 7, characterized in that it further comprises a discharge channel (60), the discharge channel (60) being located on the side wall of the reactor body (10), the discharge channel (60) being located on the side of the support structure (50) remote from the bottom wall.
11. The reactor for catalytic cracking of chlorosilane high boilers as claimed in claim 1, characterized in that it further comprises a feed channel (70), the feed channel (70) being located on the side wall of the reactor body (10).
12. A polysilicon plant, characterized in that the polysilicon plant comprises a chlorosilane high boiling point substance catalytic cracking reactor, and the chlorosilane high boiling point substance catalytic cracking reactor is the chlorosilane high boiling point substance catalytic cracking reactor as claimed in any one of claims 1 to 11.
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| CN212315553U (en) * | 2020-04-29 | 2021-01-08 | 中国恩菲工程技术有限公司 | Chlorosilane high-boiling-point substance catalytic cracking reactor and polycrystalline silicon device |
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