CN111270211A - Treatment method for prolonging service life of target material - Google Patents
Treatment method for prolonging service life of target material Download PDFInfo
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- CN111270211A CN111270211A CN202010259397.1A CN202010259397A CN111270211A CN 111270211 A CN111270211 A CN 111270211A CN 202010259397 A CN202010259397 A CN 202010259397A CN 111270211 A CN111270211 A CN 111270211A
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- pattern
- target
- treatment
- knurling
- sand blasting
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Abstract
The invention relates to a processing method for prolonging the service life of a target material, which comprises the following steps: and sequentially carrying out polishing treatment, knurling treatment and sand blasting treatment on the target material. According to the invention, through knurling, sand blasting and the like on the surface of the target, sputtering abnormalities (peeling, point discharge, pyramid peeling and the like) of the target in the coating process are solved, so that the service life of the target is prolonged.
Description
Technical Field
The invention relates to the field of targets, in particular to a treatment method for prolonging the service life of a target.
Background
The coating target is a sputtering source which forms various functional films on a substrate by sputtering through magnetron sputtering, multi-arc ion plating or other types of coating systems under proper process conditions. In short, the target material is a target material bombarded by high-speed charged energy particles, and when the target material is used in a high-energy laser weapon, lasers with different power densities, different output waveforms and different wavelengths interact with different target materials, different killing and damaging effects can be generated. For example: the evaporation magnetron sputtering coating is heating evaporation coating, aluminum film and the like. Different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets and the like) are replaced, and different film systems (such as superhard, wear-resistant and corrosion-resistant alloy films and the like) can be obtained.
An orthogonal magnetic field and an electric field are applied between a target pole (cathode) and an anode to be sputtered, required inert gas (usually Ar gas) is filled in a high-vacuum chamber, a permanent magnet forms a magnetic field of 250-350 gauss on the surface of a target material, and the orthogonal electromagnetic field is formed by the same high-voltage electric field. Under the action of electric field, Ar gas is ionized into positive ions and electrons, a certain negative high voltage is added on the target, the electrons emitted from the target electrode are subjected to the action of a magnetic field and the ionization probability of working gas is increased, high-density plasma is formed near the cathode, Ar ions accelerate to fly to the target surface under the action of Lorentz force, and bombard the target surface at a high speed, so that atoms sputtered from the target are separated from the target surface by high kinetic energy to fly to a substrate to deposit and form a film according to the momentum conversion principle. Magnetron sputtering is generally divided into two categories: direct current sputtering and radio frequency sputtering, wherein the direct current sputtering device has simple principle, and the speed is fast when metal is sputtered. The application range of the radio frequency sputtering is wider, and the radio frequency sputtering can be used for sputtering conductive materials, non-conductive materials and preparing compound materials such as oxides, nitrides, carbides and the like by reactive sputtering. When the frequency of the radio frequency is increased, microwave plasma sputtering is performed, and nowadays, Electron Cyclotron Resonance (ECR) type microwave plasma sputtering is generally used.
CN102011085A discloses a surface treatment method of a protection plate, which comprises the following steps: providing a protective plate with a smooth surface; patterning the anti-adhesion surface of the anti-adhesion plate to form an uneven anti-adhesion surface; carrying out sand blasting treatment on the anti-adhesion surface; and performing spray treatment on the anti-adhesion surface subjected to sand blasting treatment. After the surface of the smooth attachment prevention plate is subjected to patterning, sand blasting and meltallizing treatment, the surface of the attachment prevention plate achieves the purposes of corrosion prevention, rust prevention, wear resistance, lubrication, surface roughening, adsorption, insulation, heat insulation and the like. The uniform roughness of the anti-adhesion surface of the anti-adhesion plate can be achieved; the anti-adhesion plate can more easily adsorb target atoms or large-size particles and can not fall on the substrate, so that the precipitation capacity of the anti-adhesion plate is increased, and the cleanliness of the inner wall of the sputtering machine is improved; the film forming rate of sputtering is improved; the service life of the anti-sticking board is prolonged. However, the current sputtering target has the problems of abnormal sputtering process, short target life and the like due to unreasonable surface treatment.
Disclosure of Invention
In view of the problems in the prior art, the present invention aims to provide a treatment method for prolonging the service life of a target, which solves the sputtering abnormality (peeling, point discharge, pyramid peeling, etc.) of the target during the coating process, thereby prolonging the service life of the target.
In order to achieve the purpose, the invention adopts the following technical scheme:
a method of extending the life of a target, the method comprising: and sequentially carrying out polishing treatment, knurling treatment and sand blasting treatment on the target material.
According to the invention, through knurling, sand blasting and the like on the surface of the target, sputtering abnormalities (peeling, point discharge, pyramid peeling and the like) of the target in the coating process are solved, so that the service life of the target is prolonged.
In a preferred embodiment of the present invention, the roughness Ra of the target surface after the polishing treatment is not more than 0.4. mu.m, and may be, for example, 0.4. mu.m, 0.3. mu.m, 0.2. mu.m, 0.1. mu.m, or 0.05. mu.m, but is not limited to the above-mentioned values, and other values not listed in the above range are also applicable.
In a preferred embodiment of the present invention, the knurling process is performed on a ring having a difference of 13mm between the outer diameter and the inner diameter of the edge of the sputtering surface and a position 3mm from the upper surface of the side surface of the sputtering target of the target material.
As a preferred technical scheme of the invention, the knurling patterns in the knurling treatment comprise 50TPI net patterns and/or 25TPI net patterns.
Preferably, the pattern is a 50TPI mesh pattern, and the knurling depth of the 50TPI mesh pattern is 110-180 μm, such as 110 μm, 120 μm, 130 μm, 140 μm, 150 μm, 160 μm, 170 μm or 180 μm, but not limited to the values listed, and other values not listed in this range are also applicable.
Preferably, the pattern is a 25TPI mesh, the 25TPI mesh having a rolling pattern depth of 160-230 μm, such as 160 μm, 165 μm, 170 μm, 175 μm, 180 μm, 185 μm, 190 μm, 195 μm, 200 μm, 205 μm, 210 μm, 215 μm, 220 μm, 225 μm or 230 μm, but not limited to the values listed, other values not listed in this range being equally applicable.
According to the invention, through the selection of the knurling patterns (net patterns) in the knurling and the pattern depth, sputtering abnormalities (peeling, point discharge, pyramid peeling and the like) of the target in the coating process are solved, so that the service life of the target is prolonged.
In a preferred embodiment of the present invention, the sandblasting is performed on the front surface of the target material at a distance of from 3mm from the upper surface to 182.5mm from the center point of the side surface of the sputtering target of the target material.
In a preferred embodiment of the present invention, the blasting time is 3 to 15min, and may be, for example, 3min, 4min, 5min, 6min, 7min, 8min, 9min, 10min, 11min, 12min, 13min, 14min, or 15min, but is not limited to the above-mentioned values, and other values not listed in the above range are also applicable.
In a preferred embodiment of the present invention, the distance between the head and the target surface in the blasting treatment is 10 to 15cm, and may be, for example, 10cm, 10.5cm, 11cm, 11.5cm, 12cm, 12.5cm, 13cm, 13.5cm, 14cm, 14.5cm or 15cm, but is not limited to the above-mentioned values, and other values not mentioned in the above-mentioned range are also applicable.
Preferably, the working pressure in the blasting treatment is 0.34 to 0.52MPa, and may be, for example, 0.34MPa, 0.35MPa, 0.36MPa, 0.37MPa, 0.38MPa, 0.39MPa, 0.4MPa, 0.41MPa, 0.42MPa, 0.43MPa, 0.44MPa, 0.45MPa, 0.46MPa, 0.47MPa, 0.48MPa, 0.49MPa, 0.5MPa, 0.51MPa or 0.52MPa, but not limited to the values listed, and other values not listed in this range are also applicable.
In a preferred embodiment of the present invention, the sand in the sand blasting is glass beads.
Preferably, the glass beads are No. 125 glass beads.
In a preferred embodiment of the present invention, the surface roughness Ra of the blast site after the blast treatment is 2 to 4 μm, and may be, for example, 2 μm, 2.1 μm, 2.2 μm, 2.3 μm, 2.4 μm, 2.5 μm, 2.6 μm, 2.7 μm, 2.8 μm, 2.9 μm, 3 μm, 3.1 μm, 3.2 μm, 3.3 μm, 3.4 μm, 3.5 μm, 3.6 μm, 3.7 μm, 3.8 μm, 3.9 μm or 4 μm, but is not limited to the above-mentioned values, and other values not specifically mentioned within the range are also applicable.
As a preferred technical solution of the present invention, the method comprises: sequentially carrying out polishing treatment, knurling treatment and sand blasting treatment on the target material;
wherein the roughness Ra of the surface of the target after the polishing treatment is less than or equal to 0.4 mu m; the knurling processing refers to a circular ring with the difference value of 13mm between the position 3mm away from the upper surface of the side surface of the sputtering target of the target material and the outer diameter and the inner diameter of the edge of the sputtering surface; the knurling process comprises knurling the pattern of a 50TPI net pattern and/or a 25TPI net pattern; the pattern is a 50TPI reticular pattern, and the knurling pattern depth of the 50TPI reticular pattern is 110-180 mu m; the pattern is a 25TPI reticular pattern, and the rolling pattern depth of the 25TPI reticular pattern is 160-230 mu m; the sand blasting treatment refers to that sand blasting treatment is carried out on the front surface of the target material from the position 3mm away from the upper surface of the side surface of the sputtering target of the target material to 182.5mm away from the central point; the time of the sand blasting treatment is 3-15 min; the distance between the spray head and the surface of the target in the sand blasting treatment is 10-15 cm; the working pressure in the sand blasting treatment is 0.34-0.52 MPa; the sand particles in the sand blasting treatment are glass beads; the glass beads are No. 125 glass beads; the surface roughness Ra of the sand-blasting position after sand blasting treatment is 2-4 mu m.
Compared with the prior art, the invention has the following beneficial effects:
according to the invention, through knurling, sand blasting treatment and the like on the surface of the target material and selection of knurling patterns and pattern depths, sputtering abnormalities (peeling, point discharge, pyramid peeling and the like) of the target material in the coating process are solved, so that the service life of the target material is prolonged.
Drawings
FIG. 1 is a schematic view of the knurling and sandblasting positions of the present invention.
The present invention is described in further detail below. The following examples are merely illustrative of the present invention and do not represent or limit the scope of the claims, which are defined by the claims.
Detailed Description
To better illustrate the invention and to facilitate the understanding of the technical solutions thereof, typical but non-limiting examples of the invention are as follows:
example 1
The invention provides a processing method for prolonging the service life of a target material, which comprises the following steps: sequentially carrying out polishing treatment, knurling treatment and sand blasting treatment on the target material;
wherein the roughness Ra of the surface of the target after the polishing treatment is less than or equal to 0.4 mu m; the knurling processing refers to a circular ring with the difference value of 13mm between the position 3mm away from the upper surface of the side surface of the sputtering target of the target material and the outer diameter and the inner diameter of the edge of the sputtering surface; the knurling process comprises knurling patterns of 25TPI net patterns; the knurling depth of the 25TPI reticular pattern is 200 mu m; the sand blasting treatment refers to that sand blasting treatment is carried out on the front surface of the target material from the position 3mm away from the upper surface of the side surface of the sputtering target of the target material to 182.5mm away from the central point; the time of the sand blasting treatment is 5 min; the distance between the spray head and the surface of the target material in the sand blasting treatment is 10 cm; the operation pressure in the sand blasting treatment is 0.5 MPa; the sand particles in the sand blasting treatment are glass beads; the glass beads are No. 125 glass beads; the surface roughness Ra of the sand-blasted position after the sand blasting treatment is 2.5 mu m.
The sputtering of the target material in the film coating process is normal.
Example 2
The invention provides a processing method for prolonging the service life of a target material, which comprises the following steps: sequentially carrying out polishing treatment, knurling treatment and sand blasting treatment on the target material;
wherein the roughness Ra of the surface of the target after the polishing treatment is less than or equal to 0.4 mu m; the knurling processing refers to a circular ring with the difference value of 13mm between the position 3mm away from the upper surface of the side surface of the sputtering target of the target material and the outer diameter and the inner diameter of the edge of the sputtering surface; the knurling process comprises knurling a knurling pattern in a 50TPI net pattern; the knurling depth of the 50TPI reticular pattern is 150 mu m; the sand blasting treatment refers to that sand blasting treatment is carried out on the front surface of the target material from the position 3mm away from the upper surface of the side surface of the sputtering target of the target material to 182.5mm away from the central point; the time of the sand blasting treatment is 8 min; the distance between the spray head and the surface of the target material in the sand blasting treatment is 13 cm; the operation pressure in the sand blasting treatment is 0.4 MPa; the sand particles in the sand blasting treatment are glass beads; the glass beads are No. 125 glass beads; the surface roughness Ra of the sand-blasted position after the sand blasting treatment is 4 mu m.
The sputtering of the obtained target material is normal in the coating process.
Example 3
The invention provides a processing method for prolonging the service life of a target material, which comprises the following steps: sequentially carrying out polishing treatment, knurling treatment and sand blasting treatment on the target material;
wherein the roughness Ra of the surface of the target after the polishing treatment is less than or equal to 0.4 mu m; the knurling processing refers to a circular ring with the difference value of 13mm between the position 3mm away from the upper surface of the side surface of the sputtering target of the target material and the outer diameter and the inner diameter of the edge of the sputtering surface; the knurling process comprises knurling a knurling pattern in a 50TPI net pattern; the knurling depth of the 50TPI reticular pattern is 180 mu m; the sand blasting treatment refers to that sand blasting treatment is carried out on the front surface of the target material from the position 3mm away from the upper surface of the side surface of the sputtering target of the target material to 182.5mm away from the central point; the time of the sand blasting treatment is 3-15 min; the distance between the spray head and the surface of the target in the sand blasting treatment is 10-15 cm; the working pressure in the sand blasting treatment is 0.34-0.52 MPa; the sand particles in the sand blasting treatment are glass beads; the glass beads are No. 125 glass beads; the surface roughness Ra of the sand-blasted position after the sand-blasting treatment is 3 mu m.
The sputtering of the obtained target material is normal in the coating process.
Comparative example 1
The only difference from example 1 is that knurling treatment will not be performed. The sputtering of the obtained target material is abnormal in the film coating process (peeling off and point discharge).
Comparative example 2
The only difference from example 1 is that no blasting treatment was performed, and the surface roughness Ra of the target after the blasting treatment was 0.4 μm or less. The sputtering of the obtained target material in the film coating process is abnormal (pyramid falling off and the like).
Comparative example 3
The only difference from example 1 is that the depth of the knurl pattern is 50 μm, and the sputtering of the obtained target material is abnormal (exfoliation, point discharge, pyramid exfoliation, etc.).
Comparative example 4
The only difference from example 1 is that the depth of the knurl pattern is 300 μm, and the sputtering of the obtained target material is abnormal (peeling, point discharge, pyramid peeling, etc.).
Comparative example 5
The only difference from example 1 is that the knurling pattern was 35TPI, and the sputtering of the resulting target material was abnormal (exfoliation, point discharge).
The roughness was measured by a roughness instrument in the examples of the present invention and the comparative examples.
From the results of the above examples and comparative examples, it can be seen that in the present invention, sputtering abnormalities (peeling, point discharge, pyramid peeling, etc.) of the target during the coating process are solved by knurling the surface of the target, sand blasting, etc., thereby prolonging the service life of the target.
The applicant declares that the present invention illustrates the detailed structural features of the present invention through the above embodiments, but the present invention is not limited to the above detailed structural features, that is, it does not mean that the present invention must be implemented depending on the above detailed structural features. It should be understood by those skilled in the art that any modifications of the present invention, equivalent substitutions of selected components of the present invention, additions of auxiliary components, selection of specific modes, etc., are within the scope and disclosure of the present invention.
The preferred embodiments of the present invention have been described in detail, however, the present invention is not limited to the specific details of the above embodiments, and various simple modifications may be made to the technical solution of the present invention within the technical idea of the present invention, and these simple modifications are within the protective scope of the present invention.
It should be noted that the various technical features described in the above embodiments can be combined in any suitable manner without contradiction, and the invention is not described in any way for the possible combinations in order to avoid unnecessary repetition.
In addition, any combination of the various embodiments of the present invention is also possible, and the same should be considered as the disclosure of the present invention as long as it does not depart from the spirit of the present invention.
Claims (10)
1. A method of extending the life of a target, the method comprising: and sequentially carrying out polishing treatment, knurling treatment and sand blasting treatment on the target material.
2. The method of claim 1, wherein the roughness Ra of the target surface after the polishing process is less than or equal to 0.4 μm.
3. The method of claim 1 or 2, wherein the knurling process refers to a circular ring in which the difference between the outer diameter and the inner diameter of the edge of the sputtering surface is 13mm at a position 3mm from the upper surface of the side surface of the sputtering target to the target material.
4. The method of any of claims 1-3, wherein the knurl in the knurl processing comprises a 50TPI mesh pattern and/or a 25TPI mesh pattern;
preferably, the pattern is a 50TPI mesh pattern, and the knurling pattern depth of the 50TPI mesh pattern is 110-180 μm;
preferably, the pattern is a 25TPI mesh pattern, and the rolling pattern depth of the 25TPI mesh pattern is 160-230 μm.
5. The method according to any of claims 1 to 4, wherein the blasting is performed on the front surface of the target material at a distance of from 3mm from the upper surface to 182.5mm from the center point of the side surface of the sputtering target of the target material.
6. The method of any one of claims 1 to 6, wherein the grit blasting is carried out for a period of time of from 3 to 15 minutes.
7. The method according to any of claims 1 to 7, wherein the distance between the nozzle and the target surface in the grit blasting is 10 to 15 cm;
preferably, the working pressure in the sand blasting is 0.34-0.52 MPa.
8. The method according to any one of claims 1 to 8, wherein the grit in the grit blasting is glass beads;
preferably, the glass beads are No. 125 glass beads.
9. The method according to any one of claims 1 to 9, wherein the surface roughness Ra of the blast site after the blast treatment is 2 to 4 μm.
10. The method of any one of claims 1-10, wherein the method comprises: sequentially carrying out polishing treatment, knurling treatment and sand blasting treatment on the target material;
wherein the roughness Ra of the surface of the target after the polishing treatment is less than or equal to 0.4 mu m; the knurling processing refers to a circular ring with the difference value of 13mm between the position 3mm away from the upper surface of the side surface of the sputtering target of the target material and the outer diameter and the inner diameter of the edge of the sputtering surface; the knurling process comprises knurling the pattern of a 50TPI net pattern and/or a 25TPI net pattern; the pattern is a 50TPI reticular pattern, and the knurling pattern depth of the 50TPI reticular pattern is 110-180 mu m; the pattern is a 25TPI reticular pattern, and the rolling pattern depth of the 25TPI reticular pattern is 160-230 mu m; the sand blasting treatment refers to that sand blasting treatment is carried out on the front surface of the target material from the position 3mm away from the upper surface of the side surface of the sputtering target of the target material to 182.5mm away from the central point; the time of the sand blasting treatment is 3-15 min; the distance between the spray head and the surface of the target in the sand blasting treatment is 10-15 cm; the working pressure in the sand blasting treatment is 0.34-0.52 MPa; the sand particles in the sand blasting treatment are glass beads; the glass beads are No. 125 glass beads; the surface roughness Ra of the sand-blasting position after sand blasting treatment is 2-4 mu m.
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| CN112077408A (en) * | 2020-09-08 | 2020-12-15 | 宁波江丰电子材料股份有限公司 | Brazing method of chromium-silicon target and copper back plate |
| CN112359334A (en) * | 2020-10-21 | 2021-02-12 | 宁波江丰电子材料股份有限公司 | Target material assembly and machining method thereof |
| CN113084236A (en) * | 2021-04-26 | 2021-07-09 | 宁波江丰电子材料股份有限公司 | Machining method for sputtering target material inclined plane patterns |
| CN113151798A (en) * | 2021-04-29 | 2021-07-23 | 宁波江丰电子材料股份有限公司 | Target material assembly and machining method thereof |
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| CN113151798A (en) * | 2021-04-29 | 2021-07-23 | 宁波江丰电子材料股份有限公司 | Target material assembly and machining method thereof |
| CN113290351A (en) * | 2021-05-25 | 2021-08-24 | 宁波江丰电子材料股份有限公司 | Method for prolonging service life of tungsten-titanium target material |
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