CN111152141B - Method for treating jet polishing waste liquid - Google Patents
Method for treating jet polishing waste liquid Download PDFInfo
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- CN111152141B CN111152141B CN202010118037.XA CN202010118037A CN111152141B CN 111152141 B CN111152141 B CN 111152141B CN 202010118037 A CN202010118037 A CN 202010118037A CN 111152141 B CN111152141 B CN 111152141B
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- liquid
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- turbidity
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C9/00—Appurtenances of abrasive blasting machines or devices, e.g. working chambers, arrangements for handling used abrasive material
- B24C9/006—Treatment of used abrasive material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C7/00—Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts
- B24C7/0007—Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts the abrasive material being fed in a liquid carrier
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C9/00—Appurtenances of abrasive blasting machines or devices, e.g. working chambers, arrangements for handling used abrasive material
Abstract
The invention discloses a method for treating jet polishing waste liquid, which comprises the following steps of conveying the waste liquid generated by each jet polishing station into a liquid inlet bin; the first liquid supply pump continuously pumps the water and the abrasive particles in the abrasive particle recovery bin into the first liquid outlet pipe; when the photoelectric water quality turbidity detection device detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe does not exceed the standard, the recovery valve is closed, and the liquid return valve and the second liquid supply pump are opened; when the photoelectric water quality turbidity detection device detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe exceeds the standard, the liquid return valve and the second liquid supply pump are closed, and the recovery valve is opened. The method for treating the jet polishing waste liquid can treat the waste liquid generated by jet polishing and recover abrasive particles in the waste liquid.
Description
Technical Field
The invention relates to the field of abrasive water jet polishing, in particular to a method for treating jet polishing waste liquid.
Background
The abrasive water jet polishing technology utilizes polishing liquid containing fine abrasive particles to impact and erode the surface of a workpiece under the action of high pressure to remove materials slightly, so as to achieve the purpose of polishing.
The waste liquid generated by jet polishing contains more abrasive particles, and if the abrasive particles are not recycled, waste is caused.
Disclosure of Invention
The invention aims to provide a method for treating jet polishing waste liquid, which can treat the waste liquid generated by jet polishing and recover abrasive particles in the waste liquid.
In order to achieve the purpose, the technical scheme of the invention is to design a method for treating jet polishing waste liquid, which adopts a jet polishing system to treat the waste liquid generated by jet polishing; the method is characterized in that:
the jet polishing system comprises a plurality of jet polishing stations, and each jet polishing station is provided with: the device comprises a liquid collecting tank, a clamp which is arranged at the upper part of an inner cavity of the liquid collecting tank and is used for clamping a workpiece, and a jet flow polishing nozzle which is arranged above the clamp and is used for carrying out jet flow polishing on the workpiece on the clamp; each jet polishing nozzle is externally connected with a polishing solution supply pipeline for supplying polishing solution to the jet polishing nozzle, and the polishing solution consists of water and abrasive particles; the bottom of the inner cavity of each liquid collecting tank is respectively provided with a liquid discharging pump, the output end of each liquid discharging pump is respectively externally connected with a liquid discharging branch pipe, and each liquid discharging branch pipe respectively extends out of the liquid collecting tank and is connected with a liquid discharging main pipe;
the liquid discharge main pipe is also connected with the liquid collecting tank; the liquid collecting pool is separated from left to right in sequence: the abrasive particle recovery bin, the liquid inlet bin and the liquid purification bin; the top of the liquid collecting pool is sealed by a cover plate, and a liquid discharging main pipe penetrates through the cover plate and extends into the liquid inlet bin; a first stirring device is arranged in the liquid inlet bin;
the abrasive particle recovery bin and the liquid inlet bin are separated by a first separation component, and the first separation component consists of a first vertical separation plate and a first inclined filter screen; the bottom end of the first partition plate is connected with the bottom wall of the liquid collecting tank, the top end of the first partition plate is connected with the bottom end of the first filter screen, the top end of the first filter screen inclines rightwards, and the top end of the first filter screen is connected with the cover plate; the first filter screen can allow particles with the particle size not larger than that of the abrasive particles to pass through; a second stirring device and a first liquid supply pump are arranged in the abrasive particle recovery bin; the output end of the first liquid supply pump is externally connected with a first liquid outlet pipe, the first liquid outlet pipe extends out of the left side wall of the abrasive particle recovery bin, and the outer end of the first liquid outlet pipe is also connected with a liquid return pipe and a polishing liquid recovery pipe through a three-way pipe; the liquid return pipe is communicated with the abrasive particle recovery bin, and a liquid return valve is arranged on the liquid return pipe; a polishing solution recovery tank is arranged on the left side of the liquid collecting tank, a polishing solution recovery pipe is communicated with the top of the polishing solution recovery tank, and a recovery valve is arranged on the polishing solution recovery pipe; a third stirring device is arranged in the polishing solution recovery tank;
the liquid purifying bin and the liquid inlet bin are separated by a second separating component, and the second separating component consists of a second vertical separating plate and a second inclined filter screen; the bottom end of the second partition plate is connected with the bottom wall of the liquid collecting tank, the top end of the second partition plate is connected with the bottom end of the second filter screen, the top end of the second filter screen inclines leftwards, and the top end of the second filter screen is connected with the cover plate; the second filter screen can intercept abrasive particles; a second liquid supply pump is arranged in the liquid purification bin; the output end of the second liquid supply pump is externally connected with a second liquid outlet pipe, the second liquid outlet pipe extends out of the right side wall of the liquid purifying bin, a purified liquid recovery pool is arranged on the right side of the liquid collecting pool, and the second liquid outlet pipe is communicated with the top of the purified liquid recovery pool;
the first liquid outlet pipe is provided with a photoelectric water quality turbidity detection device; the photoelectric water quality and turbidity detection device is used for detecting the water quality and turbidity of the liquid flowing through the first liquid outlet pipe, outputting a turbidity standard exceeding signal outwards when the water quality and turbidity is detected to exceed the standard, and outputting a turbidity standard not exceeding signal outwards when the water quality and turbidity is detected to not exceed the standard;
the liquid return valve and the recovery valve are electromagnetic valves, and the liquid return valve, the recovery valve and the second liquid supply pump are respectively connected with the photoelectric water quality turbidity detection device; the liquid return valve and the second liquid supply pump are triggered to be opened by a turbidity non-exceeding signal, and the liquid return valve and the second liquid supply pump are triggered to be closed by a turbidity exceeding signal; the recovery valve is triggered to be opened by a turbidity exceeding signal, and the recovery valve is triggered to be closed by a turbidity not exceeding signal;
the method for treating the waste liquid generated by jet polishing by adopting the jet polishing system comprises the following steps:
each jet polishing station adopts polishing solution consisting of water and abrasive particles, the jet polishing nozzles of each jet polishing station respectively adopt the polishing solution to carry out jet polishing on the workpiece on the clamp, and waste liquid generated by polishing falls into a liquid collecting tank; the waste liquid in each liquid collecting tank is pumped out by a liquid discharge pump and is sent into a liquid inlet bin of the liquid collecting tank by a liquid discharge branch pipe and a liquid discharge main pipe;
the first stirring device in the liquid inlet bin continuously stirs, water and abrasive particles in the liquid inlet bin enter the abrasive particle recovery bin through the first filter screen, and water in the liquid inlet bin also enters the clean liquid bin through the second filter screen; the second stirring device in the abrasive particle recovery bin continuously stirs the abrasive particles to ensure that the abrasive particles in the abrasive particle recovery bin are uniformly distributed;
the first liquid supply pump continuously pumps the water and the abrasive particles in the abrasive particle recovery bin into the first liquid outlet pipe; the photoelectric water quality turbidity detection device is used for detecting the water quality turbidity of the liquid flowing through the first liquid outlet pipe, the turbidity of the liquid flowing through the first liquid outlet pipe is related to the concentration of the abrasive particles in the liquid, and the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is judged according to the turbidity;
when the photoelectric water quality turbidity detection device detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe is not over standard, the concentration of the abrasive particles in the liquid is not up to the recoverable degree, at the moment, the photoelectric water quality turbidity detection device outputs a turbidity non-over-standard signal outwards, the turbidity non-over-standard signal triggers the recovery valve to be closed and the liquid return valve to be opened, and the liquid containing the abrasive particles in the first liquid outlet pipe is returned to the abrasive particle recovery bin through the liquid return pipe; the turbidity signal does not exceed the standard also triggers a second liquid supply pump to be started, and water in the purified liquid bin is sent into a purified liquid recovery pool through a second liquid outlet pipe; along with the continuous feeding of the water in the clean liquid bin into the clean liquid recovery pool, the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is gradually increased until the concentration of the abrasive particles in the liquid reaches the recoverable degree;
when the photoelectric water quality turbidity detection device detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe exceeds the standard, the concentration of abrasive particles in the liquid reaches the recoverable degree, at the moment, the photoelectric water quality turbidity detection device outputs an excessive turbidity signal outwards, the excessive turbidity signal triggers the liquid return valve and the second liquid supply pump to be closed, the excessive turbidity signal triggers the recovery valve to be opened, and the liquid containing the abrasive particles in the first liquid outlet pipe is sent to the polishing liquid recovery pool through the polishing liquid recovery pipe; the abrasive particles in the abrasive particle recovery bin are continuously sent into the polishing solution recovery tank, and the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is gradually reduced until the concentration of the abrasive particles in the liquid does not reach the recoverable degree;
along with the intermittent rise and fall of the abrasive particle concentration in the liquid flowing through the first liquid outlet pipe, the recovery valve is opened and closed intermittently, so that the abrasive particles in the abrasive particle recovery bin are sent to the polishing liquid recovery tank intermittently in a manner that the abrasive particle concentration is not lower than the recoverable degree;
a third stirring device in the polishing solution recovery tank continuously stirs the slurry to ensure that the abrasive particles in the polishing solution recovery tank are uniformly distributed; the liquid in the polishing liquid recovery tank can be reused as the polishing liquid for jet polishing.
Preferably, the liquid collecting tank of each jet polishing station is provided with a fourth stirring device, and the fourth stirring devices continuously stir to avoid deposition of abrasive particles in the liquid collecting tank.
Preferably, a drain pipe is externally connected to the bottom of the liquid inlet bin, and a drain valve is arranged on the drain pipe; when the liquid inlet bin needs to be drained, the first liquid supply pump, the second liquid supply pump and each liquid discharge pump are closed, and the drain valve is opened.
The invention has the advantages and beneficial effects that: provides a method for treating jet polishing waste liquid, which can treat the waste liquid generated by jet polishing and recover abrasive particles in the waste liquid.
Detailed Description
The following further describes embodiments of the present invention with reference to examples. The following examples are only for illustrating the technical solutions of the present invention more clearly, and the protection scope of the present invention is not limited thereby.
The invention provides a method for treating jet polishing waste liquid, which adopts a jet polishing system to treat the waste liquid generated by jet polishing;
the jet polishing system comprises a plurality of jet polishing stations, and each jet polishing station is provided with: the device comprises a liquid collecting tank, a clamp which is arranged at the upper part of an inner cavity of the liquid collecting tank and is used for clamping a workpiece, and a jet flow polishing nozzle which is arranged above the clamp and is used for carrying out jet flow polishing on the workpiece on the clamp; each jet polishing nozzle is externally connected with a polishing solution supply pipeline for supplying polishing solution to the jet polishing nozzle, and the polishing solution consists of water and abrasive particles; the bottom of the inner cavity of each liquid collecting tank is respectively provided with a liquid discharging pump, the output end of each liquid discharging pump is respectively externally connected with a liquid discharging branch pipe, and each liquid discharging branch pipe respectively extends out of the liquid collecting tank and is connected with a liquid discharging main pipe;
the liquid discharge main pipe is also connected with the liquid collecting tank; the liquid collecting pool is separated from left to right in sequence: the abrasive particle recovery bin, the liquid inlet bin and the liquid purification bin; the top of the liquid collecting pool is sealed by a cover plate, and a liquid discharging main pipe penetrates through the cover plate and extends into the liquid inlet bin; a first stirring device is arranged in the liquid inlet bin;
the abrasive particle recovery bin and the liquid inlet bin are separated by a first separation component, and the first separation component consists of a first vertical separation plate and a first inclined filter screen; the bottom end of the first partition plate is connected with the bottom wall of the liquid collecting tank, the top end of the first partition plate is connected with the bottom end of the first filter screen, the top end of the first filter screen inclines rightwards, and the top end of the first filter screen is connected with the cover plate; the first filter screen can allow particles with the particle size not larger than that of the abrasive particles to pass through; a second stirring device and a first liquid supply pump are arranged in the abrasive particle recovery bin; the output end of the first liquid supply pump is externally connected with a first liquid outlet pipe, the first liquid outlet pipe extends out of the left side wall of the abrasive particle recovery bin, and the outer end of the first liquid outlet pipe is also connected with a liquid return pipe and a polishing liquid recovery pipe through a three-way pipe; the liquid return pipe is communicated with the abrasive particle recovery bin, and a liquid return valve is arranged on the liquid return pipe; a polishing solution recovery tank is arranged on the left side of the liquid collecting tank, a polishing solution recovery pipe is communicated with the top of the polishing solution recovery tank, and a recovery valve is arranged on the polishing solution recovery pipe; a third stirring device is arranged in the polishing solution recovery tank;
the liquid purifying bin and the liquid inlet bin are separated by a second separating component, and the second separating component consists of a second vertical separating plate and a second inclined filter screen; the bottom end of the second partition plate is connected with the bottom wall of the liquid collecting tank, the top end of the second partition plate is connected with the bottom end of the second filter screen, the top end of the second filter screen inclines leftwards, and the top end of the second filter screen is connected with the cover plate; the second filter screen can intercept abrasive particles; a second liquid supply pump is arranged in the liquid purification bin; the output end of the second liquid supply pump is externally connected with a second liquid outlet pipe, the second liquid outlet pipe extends out of the right side wall of the liquid purifying bin, a purified liquid recovery pool is arranged on the right side of the liquid collecting pool, and the second liquid outlet pipe is communicated with the top of the purified liquid recovery pool;
the first liquid outlet pipe is provided with a photoelectric water quality turbidity detection device; the photoelectric water quality and turbidity detection device is used for detecting the water quality and turbidity of the liquid flowing through the first liquid outlet pipe, outputting a turbidity standard exceeding signal outwards when the water quality and turbidity is detected to exceed the standard, and outputting a turbidity standard not exceeding signal outwards when the water quality and turbidity is detected to not exceed the standard;
the liquid return valve and the recovery valve are electromagnetic valves, and the liquid return valve, the recovery valve and the second liquid supply pump are respectively connected with the photoelectric water quality turbidity detection device; the liquid return valve and the second liquid supply pump are triggered to be opened by a turbidity non-exceeding signal, and the liquid return valve and the second liquid supply pump are triggered to be closed by a turbidity exceeding signal; the recovery valve is triggered to be opened by a turbidity exceeding signal, and the recovery valve is triggered to be closed by a turbidity not exceeding signal;
the method for treating the waste liquid generated by jet polishing by adopting the jet polishing system comprises the following steps:
each jet polishing station adopts polishing solution consisting of water and abrasive particles, the jet polishing nozzles of each jet polishing station respectively adopt the polishing solution to carry out jet polishing on the workpiece on the clamp, and waste liquid generated by polishing falls into a liquid collecting tank; the waste liquid in each liquid collecting tank is pumped out by a liquid discharge pump and is sent into a liquid inlet bin of the liquid collecting tank by a liquid discharge branch pipe and a liquid discharge main pipe;
the first stirring device in the liquid inlet bin continuously stirs, water and abrasive particles in the liquid inlet bin enter the abrasive particle recovery bin through the first filter screen, and water in the liquid inlet bin also enters the clean liquid bin through the second filter screen; the second stirring device in the abrasive particle recovery bin continuously stirs the abrasive particles to ensure that the abrasive particles in the abrasive particle recovery bin are uniformly distributed;
the first liquid supply pump continuously pumps the water and the abrasive particles in the abrasive particle recovery bin into the first liquid outlet pipe; the photoelectric water quality turbidity detection device is used for detecting the water quality turbidity of the liquid flowing through the first liquid outlet pipe, the turbidity of the liquid flowing through the first liquid outlet pipe is related to the concentration of the abrasive particles in the liquid, and the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is judged according to the turbidity;
when the photoelectric water quality turbidity detection device detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe is not over standard, the concentration of the abrasive particles in the liquid is not up to the recoverable degree, at the moment, the photoelectric water quality turbidity detection device outputs a turbidity non-over-standard signal outwards, the turbidity non-over-standard signal triggers the recovery valve to be closed and the liquid return valve to be opened, and the liquid containing the abrasive particles in the first liquid outlet pipe is returned to the abrasive particle recovery bin through the liquid return pipe; the turbidity signal does not exceed the standard also triggers a second liquid supply pump to be started, and water in the purified liquid bin is sent into a purified liquid recovery pool through a second liquid outlet pipe; along with the continuous feeding of the water in the clean liquid bin into the clean liquid recovery pool, the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is gradually increased until the concentration of the abrasive particles in the liquid reaches the recoverable degree;
when the photoelectric water quality turbidity detection device detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe exceeds the standard, the concentration of abrasive particles in the liquid reaches the recoverable degree, at the moment, the photoelectric water quality turbidity detection device outputs an excessive turbidity signal outwards, the excessive turbidity signal triggers the liquid return valve and the second liquid supply pump to be closed, the excessive turbidity signal triggers the recovery valve to be opened, and the liquid containing the abrasive particles in the first liquid outlet pipe is sent to the polishing liquid recovery pool through the polishing liquid recovery pipe; the abrasive particles in the abrasive particle recovery bin are continuously sent into the polishing solution recovery tank, and the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is gradually reduced until the concentration of the abrasive particles in the liquid does not reach the recoverable degree;
along with the intermittent rise and fall of the abrasive particle concentration in the liquid flowing through the first liquid outlet pipe, the recovery valve is opened and closed intermittently, so that the abrasive particles in the abrasive particle recovery bin are sent to the polishing liquid recovery tank intermittently in a manner that the abrasive particle concentration is not lower than the recoverable degree;
a third stirring device in the polishing solution recovery tank continuously stirs the slurry to ensure that the abrasive particles in the polishing solution recovery tank are uniformly distributed; the liquid in the polishing liquid recovery tank can be reused as the polishing liquid for jet polishing.
Preferably, the liquid collecting tank of each jet polishing station is provided with a fourth stirring device, and the fourth stirring devices continuously stir to avoid deposition of abrasive particles in the liquid collecting tank.
Preferably, a drain pipe is externally connected to the bottom of the liquid inlet bin, and a drain valve is arranged on the drain pipe; when the liquid inlet bin needs to be drained, the first liquid supply pump, the second liquid supply pump and each liquid discharge pump are closed, and the drain valve is opened.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the technical principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.
Claims (3)
1. A processing method of jet polishing waste liquid adopts a jet polishing system to process the waste liquid generated by jet polishing; the method is characterized in that:
the jet polishing system comprises a plurality of jet polishing stations, and each jet polishing station is provided with: the device comprises a liquid collecting tank, a clamp which is arranged at the upper part of an inner cavity of the liquid collecting tank and is used for clamping a workpiece, and a jet flow polishing nozzle which is arranged above the clamp and is used for carrying out jet flow polishing on the workpiece on the clamp; each jet polishing nozzle is externally connected with a polishing solution supply pipeline for supplying polishing solution to the jet polishing nozzle, and the polishing solution consists of water and abrasive particles; the bottom of the inner cavity of each liquid collecting tank is respectively provided with a liquid discharging pump, the output end of each liquid discharging pump is respectively externally connected with a liquid discharging branch pipe, and each liquid discharging branch pipe respectively extends out of the liquid collecting tank and is connected with a liquid discharging main pipe;
the liquid discharge main pipe is also connected with the liquid collecting tank; the liquid collecting pool is separated from left to right in sequence: the abrasive particle recovery bin, the liquid inlet bin and the liquid purification bin; the top of the liquid collecting pool is sealed by a cover plate, and a liquid discharging main pipe penetrates through the cover plate and extends into the liquid inlet bin; a first stirring device is arranged in the liquid inlet bin;
the abrasive particle recovery bin and the liquid inlet bin are separated by a first separation component, and the first separation component consists of a first vertical separation plate and a first inclined filter screen; the bottom end of the first partition plate is connected with the bottom wall of the liquid collecting tank, the top end of the first partition plate is connected with the bottom end of the first filter screen, the top end of the first filter screen inclines rightwards, and the top end of the first filter screen is connected with the cover plate; the first filter screen can allow particles with the particle size not larger than that of the abrasive particles to pass through; a second stirring device and a first liquid supply pump are arranged in the abrasive particle recovery bin; the output end of the first liquid supply pump is externally connected with a first liquid outlet pipe, the first liquid outlet pipe extends out of the left side wall of the abrasive particle recovery bin, and the outer end of the first liquid outlet pipe is also connected with a liquid return pipe and a polishing liquid recovery pipe through a three-way pipe; the liquid return pipe is communicated with the abrasive particle recovery bin, and a liquid return valve is arranged on the liquid return pipe; a polishing solution recovery tank is arranged on the left side of the liquid collecting tank, a polishing solution recovery pipe is communicated with the top of the polishing solution recovery tank, and a recovery valve is arranged on the polishing solution recovery pipe; a third stirring device is arranged in the polishing solution recovery tank;
the liquid purifying bin and the liquid inlet bin are separated by a second separating component, and the second separating component consists of a second vertical separating plate and a second inclined filter screen; the bottom end of the second partition plate is connected with the bottom wall of the liquid collecting tank, the top end of the second partition plate is connected with the bottom end of the second filter screen, the top end of the second filter screen inclines leftwards, and the top end of the second filter screen is connected with the cover plate; the second filter screen can intercept abrasive particles; a second liquid supply pump is arranged in the liquid purification bin; the output end of the second liquid supply pump is externally connected with a second liquid outlet pipe, the second liquid outlet pipe extends out of the right side wall of the liquid purifying bin, a purified liquid recovery pool is arranged on the right side of the liquid collecting pool, and the second liquid outlet pipe is communicated with the top of the purified liquid recovery pool;
the first liquid outlet pipe is provided with a photoelectric water quality turbidity detection device; the photoelectric water quality and turbidity detection device is used for detecting the water quality and turbidity of the liquid flowing through the first liquid outlet pipe, outputting a turbidity standard exceeding signal outwards when the water quality and turbidity is detected to exceed the standard, and outputting a turbidity standard not exceeding signal outwards when the water quality and turbidity is detected to not exceed the standard;
the liquid return valve and the recovery valve are electromagnetic valves, and the liquid return valve, the recovery valve and the second liquid supply pump are respectively connected with the photoelectric water quality turbidity detection device; the liquid return valve and the second liquid supply pump are triggered to be opened by a turbidity non-exceeding signal, and the liquid return valve and the second liquid supply pump are triggered to be closed by a turbidity exceeding signal; the recovery valve is triggered to be opened by a turbidity exceeding signal, and the recovery valve is triggered to be closed by a turbidity not exceeding signal;
the method for treating the waste liquid generated by jet polishing by adopting the jet polishing system comprises the following steps:
each jet polishing station adopts polishing solution consisting of water and abrasive particles, the jet polishing nozzles of each jet polishing station respectively adopt the polishing solution to carry out jet polishing on the workpiece on the clamp, and waste liquid generated by polishing falls into a liquid collecting tank; the waste liquid in each liquid collecting tank is pumped out by a liquid discharge pump and is sent into a liquid inlet bin of the liquid collecting tank by a liquid discharge branch pipe and a liquid discharge main pipe;
the first stirring device in the liquid inlet bin continuously stirs, water and abrasive particles in the liquid inlet bin enter the abrasive particle recovery bin through the first filter screen, and water in the liquid inlet bin also enters the clean liquid bin through the second filter screen; the second stirring device in the abrasive particle recovery bin continuously stirs the abrasive particles to ensure that the abrasive particles in the abrasive particle recovery bin are uniformly distributed;
the first liquid supply pump continuously pumps the water and the abrasive particles in the abrasive particle recovery bin into the first liquid outlet pipe; the photoelectric water quality turbidity detection device is used for detecting the water quality turbidity of the liquid flowing through the first liquid outlet pipe, the turbidity of the liquid flowing through the first liquid outlet pipe is related to the concentration of the abrasive particles in the liquid, and the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is judged according to the turbidity;
when the photoelectric water quality turbidity detection device detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe is not over standard, the concentration of the abrasive particles in the liquid is not up to the recoverable degree, at the moment, the photoelectric water quality turbidity detection device outputs a turbidity non-over-standard signal outwards, the turbidity non-over-standard signal triggers the recovery valve to be closed and the liquid return valve to be opened, and the liquid containing the abrasive particles in the first liquid outlet pipe is returned to the abrasive particle recovery bin through the liquid return pipe; the turbidity signal does not exceed the standard also triggers a second liquid supply pump to be started, and water in the purified liquid bin is sent into a purified liquid recovery pool through a second liquid outlet pipe; along with the continuous feeding of the water in the clean liquid bin into the clean liquid recovery pool, the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is gradually increased until the concentration of the abrasive particles in the liquid reaches the recoverable degree;
when the photoelectric water quality turbidity detection device detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe exceeds the standard, the concentration of abrasive particles in the liquid reaches the recoverable degree, at the moment, the photoelectric water quality turbidity detection device outputs an excessive turbidity signal outwards, the excessive turbidity signal triggers the liquid return valve and the second liquid supply pump to be closed, the excessive turbidity signal triggers the recovery valve to be opened, and the liquid containing the abrasive particles in the first liquid outlet pipe is sent to the polishing liquid recovery pool through the polishing liquid recovery pipe; the abrasive particles in the abrasive particle recovery bin are continuously sent into the polishing solution recovery tank, and the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is gradually reduced until the concentration of the abrasive particles in the liquid does not reach the recoverable degree;
along with the intermittent rise and fall of the abrasive particle concentration in the liquid flowing through the first liquid outlet pipe, the recovery valve is opened and closed intermittently, so that the abrasive particles in the abrasive particle recovery bin are sent to the polishing liquid recovery tank intermittently in a manner that the abrasive particle concentration is not lower than the recoverable degree;
a third stirring device in the polishing solution recovery tank continuously stirs the slurry to ensure that the abrasive particles in the polishing solution recovery tank are uniformly distributed; the liquid in the polishing liquid recovery tank can be reused as the polishing liquid for jet polishing.
2. The method for treating waste jet polishing liquid according to claim 1, wherein the liquid collecting tank of each jet polishing station is provided with a fourth stirring device, and the fourth stirring devices continuously stir to avoid abrasive particles from depositing in the liquid collecting tank.
3. The method for treating waste fluid of jet polishing as claimed in claim 1, wherein a drain pipe is externally connected to the bottom of the fluid inlet chamber, and a drain valve is arranged on the drain pipe; when the liquid inlet bin needs to be drained, the first liquid supply pump, the second liquid supply pump and each liquid discharge pump are closed, and the drain valve is opened.
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| JP2000071172A (en) * | 1998-08-28 | 2000-03-07 | Nec Corp | Regenerative unit for and regenerative method of slurry for mechanochemical polishing |
| CN105479258B (en) * | 2016-01-31 | 2018-04-06 | 苏州帝瀚环保科技股份有限公司 | Lathe cutting fluid reclaiming system |
| CN106670976A (en) * | 2016-12-09 | 2017-05-17 | 昆山纳诺新材料科技有限公司 | Method of high-pressure abrasive water flow-jetting workpiece polishing |
| CN108889025A (en) * | 2018-07-03 | 2018-11-27 | 太仓市思卡拓机械科技有限公司 | A kind of sewage cycling treatment device and its working method of intelligent automatic circulating filtration |
| CN208866875U (en) * | 2018-09-29 | 2019-05-17 | 黄鹄（苏州）机床有限公司 | Liquid supply unit is cut in the reuse of lathe liquid case |
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