CN211760842U - Jet polishing system - Google Patents
Jet polishing system Download PDFInfo
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- CN211760842U CN211760842U CN202020209117.1U CN202020209117U CN211760842U CN 211760842 U CN211760842 U CN 211760842U CN 202020209117 U CN202020209117 U CN 202020209117U CN 211760842 U CN211760842 U CN 211760842U
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Abstract
The utility model discloses a jet polishing system, which comprises a plurality of jet polishing stations, wherein each jet polishing station is provided with a liquid collecting tank, each liquid collecting tank is respectively provided with a liquid discharging pump, each liquid discharging pump is respectively externally connected with a liquid discharging branch pipe, each liquid discharging branch pipe is respectively connected with a liquid discharging main pipe, and the liquid discharging main pipe is also connected with a liquid collecting tank; the liquid collecting pool is separated from left to right in sequence: the abrasive particle recovery bin, the liquid inlet bin and the liquid purification bin; the liquid discharge main pipe extends into the liquid inlet bin. The utility model discloses jet polishing system, it can handle the waste liquid that the jet polishing produced, retrieves the abrasive material particle in the waste liquid.
Description
Technical Field
The utility model relates to an abrasive material water jet polishing field, concretely relates to jet polishing system.
Background
The abrasive water jet polishing technology utilizes polishing liquid containing fine abrasive particles to impact and erode the surface of a workpiece under the action of high pressure to remove materials slightly, so as to achieve the purpose of polishing.
The waste liquid generated by jet polishing contains more abrasive particles, and if the abrasive particles are not recycled, waste is caused.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a jet polishing system, its waste liquid that can produce the jet polishing is handled, retrieves the abrasive material particle in the waste liquid.
In order to achieve the above object, the technical scheme of the utility model is to design a jet polishing system, including a plurality of jet polishing stations, every jet polishing station all is equipped with: the device comprises a liquid collecting tank, a clamp which is arranged at the upper part of an inner cavity of the liquid collecting tank and is used for clamping a workpiece, and a jet flow polishing nozzle which is arranged above the clamp and is used for carrying out jet flow polishing on the workpiece on the clamp; each jet polishing nozzle is externally connected with a polishing solution supply pipeline for supplying polishing solution to the jet polishing nozzle, and the polishing solution consists of water and abrasive particles; the bottom of the inner cavity of each liquid collecting tank is respectively provided with a liquid discharging pump, the output end of each liquid discharging pump is respectively externally connected with a liquid discharging branch pipe, and each liquid discharging branch pipe respectively extends out of the liquid collecting tank and is connected with a liquid discharging main pipe;
the liquid discharge main pipe is also connected with the liquid collecting tank; the liquid collecting pool is separated from left to right in sequence: the abrasive particle recovery bin, the liquid inlet bin and the liquid purification bin; the top of the liquid collecting pool is sealed by a cover plate, and a liquid discharging main pipe penetrates through the cover plate and extends into the liquid inlet bin; a first stirring device is arranged in the liquid inlet bin;
the abrasive particle recovery bin and the liquid inlet bin are separated by a first separation component, and the first separation component consists of a first vertical separation plate and a first inclined filter screen; the bottom end of the first partition plate is connected with the bottom wall of the liquid collecting tank, the top end of the first partition plate is connected with the bottom end of the first filter screen, the top end of the first filter screen inclines rightwards, and the top end of the first filter screen is connected with the cover plate; the first filter screen can allow particles with the particle size not larger than that of the abrasive particles to pass through; a second stirring device and a first liquid supply pump are arranged in the abrasive particle recovery bin; the output end of the first liquid supply pump is externally connected with a first liquid outlet pipe, the first liquid outlet pipe extends out of the left side wall of the liquid inlet bin, and the outer end of the first liquid outlet pipe is also connected with a liquid return pipe and a polishing liquid recovery pipe through a three-way pipe; the liquid return pipe is communicated with the abrasive particle recovery bin, and a liquid return valve is arranged on the liquid return pipe; a polishing solution recovery tank is arranged on the left side of the liquid collecting tank, a polishing solution recovery pipe is communicated with the top of the polishing solution recovery tank, and a recovery valve is arranged on the polishing solution recovery pipe; a third stirring device is arranged in the polishing solution recovery tank;
the liquid purifying bin and the liquid inlet bin are separated by a second separating component, and the second separating component consists of a second vertical separating plate and a second inclined filter screen; the bottom end of the second partition plate is connected with the bottom wall of the liquid collecting tank, the top end of the second partition plate is connected with the bottom end of the second filter screen, the top end of the second filter screen inclines leftwards, and the top end of the second filter screen is connected with the cover plate; the second filter screen can intercept abrasive particles; a second liquid supply pump is arranged in the liquid purification bin; the output end of the second liquid supply pump is externally connected with a second liquid outlet pipe, the second liquid outlet pipe extends out of the right side wall of the liquid purifying bin, a purified liquid recovery pool is arranged on the right side of the liquid collecting pool, and the second liquid outlet pipe is communicated with the top of the purified liquid recovery pool;
the first liquid outlet pipe is provided with a photoelectric water quality turbidity detection device; the photoelectric water quality and turbidity detection device is used for detecting the water quality and turbidity of the liquid flowing through the first liquid outlet pipe, outputting a turbidity standard exceeding signal outwards when the water quality and turbidity is detected to exceed the standard, and outputting a turbidity standard not exceeding signal outwards when the water quality and turbidity is detected to not exceed the standard;
the liquid return valve and the recovery valve are electromagnetic valves, and the liquid return valve, the recovery valve and the second liquid supply pump are respectively connected with the photoelectric water quality turbidity detection device; the liquid return valve and the second liquid supply pump are triggered to be opened by a turbidity non-exceeding signal, and the liquid return valve and the second liquid supply pump are triggered to be closed by a turbidity exceeding signal; the recovery valve is triggered to be opened by the turbidity exceeding signal, and the recovery valve is triggered to be closed by the turbidity not exceeding signal.
Preferably, each polishing liquid supply pipeline is provided with a polishing liquid supply valve.
Preferably, the liquid collecting tank of each jet polishing station is provided with a fourth stirring device.
The utility model has the advantages and the beneficial effects that: a jet polishing system is provided which is capable of treating a waste liquid produced by jet polishing and recovering abrasive particles from the waste liquid.
Each jet polishing station adopts polishing solution consisting of water and abrasive particles, the jet polishing nozzles of each jet polishing station respectively adopt the polishing solution to carry out jet polishing on the workpiece on the clamp, and waste liquid generated by polishing falls into a liquid collecting tank; the waste liquid in each liquid collecting tank is pumped out by a liquid discharge pump and is sent into a liquid inlet bin of the liquid collecting tank by a liquid discharge branch pipe and a liquid discharge main pipe;
the first stirring device in the liquid inlet bin continuously stirs, water and abrasive particles in the liquid inlet bin enter the abrasive particle recovery bin through the first filter screen, and water in the liquid inlet bin also enters the clean liquid bin through the second filter screen; the second stirring device in the abrasive particle recovery bin continuously stirs the abrasive particles to ensure that the abrasive particles in the abrasive particle recovery bin are uniformly distributed;
the first liquid supply pump continuously pumps the water and the abrasive particles in the abrasive particle recovery bin into the first liquid outlet pipe; the photoelectric water quality turbidity detection device is used for detecting the water quality turbidity of the liquid flowing through the first liquid outlet pipe, the turbidity of the liquid flowing through the first liquid outlet pipe is related to the concentration of the abrasive particles in the liquid, and the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is judged according to the turbidity;
when the photoelectric water quality turbidity detection device detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe is not over standard, the concentration of the abrasive particles in the liquid is not up to the recoverable degree, at the moment, the photoelectric water quality turbidity detection device outputs a turbidity non-over-standard signal outwards, the turbidity non-over-standard signal triggers the recovery valve to be closed and the liquid return valve to be opened, and the liquid containing the abrasive particles in the first liquid outlet pipe is returned to the abrasive particle recovery bin through the liquid return pipe; the turbidity signal does not exceed the standard also triggers a second liquid supply pump to be started, and water in the purified liquid bin is sent into a purified liquid recovery pool through a second liquid outlet pipe; along with the continuous feeding of the water in the clean liquid bin into the clean liquid recovery pool, the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is gradually increased until the concentration of the abrasive particles in the liquid reaches the recoverable degree;
when the photoelectric water quality turbidity detection device detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe exceeds the standard, the concentration of abrasive particles in the liquid reaches the recoverable degree, at the moment, the photoelectric water quality turbidity detection device outputs an excessive turbidity signal outwards, the excessive turbidity signal triggers the liquid return valve and the second liquid supply pump to be closed, the excessive turbidity signal triggers the recovery valve to be opened, and the liquid containing the abrasive particles in the first liquid outlet pipe is sent to the polishing liquid recovery pool through the polishing liquid recovery pipe; the abrasive particles in the abrasive particle recovery bin are continuously sent into the polishing solution recovery tank, and the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe is gradually reduced until the concentration of the abrasive particles in the liquid does not reach the recoverable degree;
along with the intermittent rise and fall of the abrasive particle concentration in the liquid flowing through the first liquid outlet pipe, the recovery valve is opened and closed intermittently, so that the abrasive particles in the abrasive particle recovery bin are sent to the polishing liquid recovery tank intermittently in a manner that the abrasive particle concentration is not lower than the recoverable degree;
a third stirring device in the polishing solution recovery tank continuously stirs the slurry to ensure that the abrasive particles in the polishing solution recovery tank are uniformly distributed; the liquid in the polishing liquid recovery tank can be reused as the polishing liquid for jet polishing.
The liquid collecting tank of each jet polishing station is provided with a fourth stirring device respectively, and the fourth stirring devices continuously stir, so that abrasive particles can be prevented from being deposited in the liquid collecting tank.
Drawings
Fig. 1 is a schematic diagram of the present invention.
Detailed Description
The following description will further describe embodiments of the present invention with reference to the accompanying drawings and examples. The following examples are only for illustrating the technical solutions of the present invention more clearly, and the protection scope of the present invention is not limited thereby.
The utility model discloses the technical scheme who specifically implements is:
as shown in fig. 1, a jet polishing system includes a plurality of jet polishing stations 1, each jet polishing station 1 being provided with: a liquid collecting tank 11, a clamp 12 arranged at the upper part of the inner cavity of the liquid collecting tank 11 and used for clamping a workpiece, and a jet polishing nozzle 13 arranged above the clamp 12 and used for carrying out jet polishing on the workpiece on the clamp 12; each jet polishing nozzle 13 is externally connected with a polishing solution supply pipeline 14 for supplying polishing solution to the jet polishing nozzle, and the polishing solution consists of water and abrasive particles; the bottom of the inner cavity of each liquid collecting groove 11 is respectively provided with a liquid discharge pump 15, the output end of each liquid discharge pump 15 is respectively connected with a liquid discharge branch pipe 21, and each liquid discharge branch pipe 21 respectively extends out of the liquid collecting groove 11 and is connected with a liquid discharge main pipe 22;
the drainage main pipe 22 is also connected with the liquid collecting tank 3; the liquid collecting tank 3 is sequentially separated from left to right: an abrasive particle recovery bin 31, a liquid inlet bin 32 and a liquid purifying bin 33; the top of the liquid collecting pool 3 is sealed by a cover plate 34, and the liquid discharging main pipe 22 penetrates through the cover plate 34 and extends into the liquid bin 32; a first stirring device 41 is arranged in the liquid inlet bin 32;
the abrasive particle recovery bin 31 and the liquid inlet bin 32 are separated by a first separation assembly, and the first separation assembly consists of a first vertical separation plate 51 and a first inclined filter screen 52; the bottom end of the first partition plate 51 is connected with the bottom wall of the liquid collecting tank 3, the top end of the first partition plate 51 is connected with the bottom end of the first filter screen 52, the top end of the first filter screen 52 inclines rightwards, and the top end of the first filter screen 52 is connected with the cover plate 34; the first screen 52 allows particles not larger than the abrasive particle size to pass through; the abrasive particle recovery bin 31 is provided with a second stirring device 42 and a first liquid supply pump 61; the output end of the first liquid supply pump 61 is externally connected with a first liquid outlet pipe 71, the first liquid outlet pipe 71 extends out from the left side wall of the liquid inlet bin 32, and the outer end of the first liquid outlet pipe 71 is further connected with a liquid return pipe 72 and a polishing liquid recovery pipe 73 through a three-way pipe; the liquid return pipe 72 is communicated with the abrasive particle recovery bin 31, and a liquid return valve 74 is arranged on the liquid return pipe 72; a polishing solution recovery tank 75 is arranged on the left side of the liquid collecting tank 3, a polishing solution recovery pipe 73 is communicated with the top of the polishing solution recovery tank 75, and a recovery valve 76 is arranged on the polishing solution recovery pipe 73; a third stirring device 43 is arranged in the polishing solution recovery tank 75;
the liquid purifying bin 33 and the liquid inlet bin 32 are separated by a second separating component, and the second separating component consists of a second vertical separating plate 53 and a second inclined filter screen 54; the bottom end of the second partition plate 53 is connected with the bottom wall of the liquid collecting tank 3, the top end of the second partition plate 53 is connected with the bottom end of the second filter screen 54, the top end of the second filter screen 54 inclines leftwards, and the top end of the second filter screen 54 is connected with the cover plate 34; the second screen 54 may intercept abrasive particles; a second liquid supply pump 62 is arranged in the liquid purification bin 33; the output end of the second liquid supply pump 62 is externally connected with a second liquid outlet pipe 81, the second liquid outlet pipe 81 extends out from the right side wall of the liquid purifying bin 33, a purified liquid recovery pool 82 is arranged on the right side of the liquid collecting pool 3, and the second liquid outlet pipe 81 is communicated with the top of the purified liquid recovery pool 82;
a photoelectric water quality turbidity detection device 77 is arranged on the first liquid outlet pipe 71; the photoelectric water quality and turbidity detection device 77 is used for detecting the water quality and turbidity of the liquid flowing through the first liquid outlet pipe 71, outputting a turbidity exceeding signal outwards when the water quality and turbidity is detected to exceed the standard, and outputting a turbidity not exceeding signal outwards when the water quality and turbidity is detected to not exceed the standard;
the liquid return valve 74 and the recovery valve 76 are electromagnetic valves, and the liquid return valve 74, the recovery valve 76 and the second liquid supply pump 62 are respectively connected with a photoelectric water quality turbidity detection device 77; the liquid return valve 74 and the second liquid supply pump 62 are triggered to be opened by the turbidity non-exceeding signal, and the liquid return valve 74 and the second liquid supply pump 62 are triggered to be closed by the turbidity exceeding signal; the recovery valve 76 is triggered to open by a turbidity overproof signal and the recovery valve 76 is triggered to close by a turbidity not overproof signal.
Preferably, a polishing liquid supply valve 16 is provided on each polishing liquid supply line 14.
Preferably, the liquid collecting tank 11 of each jet polishing station 1 is provided with a fourth stirring device 44.
The utility model discloses jet polishing system, it can handle the waste liquid that the jet polishing produced, retrieves the abrasive material particle in the waste liquid.
Each jet polishing station 1 adopts polishing solution consisting of water and abrasive particles, the jet polishing nozzles 13 of each jet polishing station 1 respectively adopt the polishing solution to carry out jet polishing on the workpiece on the clamp 12, and waste liquid generated by polishing falls into the liquid collecting tank 11; the waste liquid in each liquid collecting groove 11 is pumped out by a liquid discharge pump 15 and is sent into a liquid inlet bin 32 of the liquid collecting tank 3 by a liquid discharge branch pipe 21 and a liquid discharge main pipe 22;
the first stirring device 41 in the liquid inlet bin 32 continues stirring, water and abrasive particles in the liquid inlet bin 32 enter the abrasive particle recovery bin 31 through the first filter screen 52, and water in the liquid inlet bin 32 also enters the clean liquid bin 33 through the second filter screen 54; the second stirring device 42 in the abrasive particle recovery bin 31 continuously stirs, so that the abrasive particles in the abrasive particle recovery bin 31 are uniformly distributed;
the first liquid supply pump 61 continuously pumps the water and the abrasive particles in the abrasive particle recovery bin 31 into the first liquid outlet pipe 71; the photoelectric water quality turbidity detection device 77 performs water quality turbidity detection on the liquid flowing through the first liquid outlet pipe 71, the turbidity of the liquid flowing through the first liquid outlet pipe 71 is related to the concentration of the abrasive particles in the liquid, and the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe 71 is judged according to the turbidity;
when the photoelectric water quality turbidity detection device 77 detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe 71 does not exceed the standard, the concentration of the abrasive particles in the liquid does not reach the recoverable degree, at the moment, the photoelectric water quality turbidity detection device 77 outputs a turbidity non-exceeding signal outwards, the turbidity non-exceeding signal triggers the recovery valve 76 to be closed and the liquid return valve 74 to be opened, and the liquid containing the abrasive particles in the first liquid outlet pipe 71 is returned into the abrasive particle recovery bin 31 through the liquid return pipe 72; the turbidity signal does not exceed the standard, the second liquid supply pump 62 is also triggered to be started, and water in the purified liquid bin 33 is sent into the purified liquid recovery pool 82 through a second liquid outlet pipe 81; as the water in the clean liquid bin 33 is continuously fed into the clean liquid recovery tank 82, the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe 71 gradually increases until the concentration of the abrasive particles in the liquid reaches a level at which the abrasive particles can be recovered;
when the photoelectric water quality turbidity detection device 77 detects that the water quality turbidity of the liquid flowing through the first liquid outlet pipe 71 exceeds the standard, the concentration of abrasive particles in the liquid reaches the recoverable degree, at the moment, the photoelectric water quality turbidity detection device 77 outputs an excessive turbidity signal outwards, the excessive turbidity signal triggers the liquid return valve 74 and the second liquid supply pump 62 to be closed, the excessive turbidity signal triggers the recovery valve 76 to be opened, and the liquid containing the abrasive particles in the first liquid outlet pipe 71 is sent to the polishing liquid recovery tank 75 through the polishing liquid recovery pipe 73; as the abrasive particles in the abrasive particle recovery bin 31 are continuously sent to the polishing solution recovery tank 75, the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe 71 is gradually reduced until the concentration of the abrasive particles in the liquid does not reach the recoverable degree;
with the intermittent increase and decrease of the concentration of the abrasive particles in the liquid flowing through the first liquid outlet pipe 71, the recovery valve 76 is intermittently opened and closed, so that the abrasive particles in the abrasive particle recovery bin 31 are intermittently fed into the polishing liquid recovery tank 75 at a concentration not lower than a recoverable degree;
the third stirring device 43 in the polishing solution recovery tank 75 continuously stirs the slurry to make the abrasive particles in the polishing solution recovery tank 75 uniformly distributed; the liquid in the polishing liquid recovery tank 75 can be reused as the polishing liquid for jet polishing.
The liquid collecting tank 11 of each jet polishing station 1 is provided with a fourth stirring device 44, and the fourth stirring devices 44 continuously stir to avoid abrasive particles from depositing in the liquid collecting tank 11.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of improvements and decorations can be made without departing from the technical principle of the present invention, and these improvements and decorations should also be regarded as the protection scope of the present invention.
Claims (3)
1. Efflux polishing system, its characterized in that, including a plurality of efflux polishing stations, every efflux polishing station all is equipped with: the device comprises a liquid collecting tank, a clamp which is arranged at the upper part of an inner cavity of the liquid collecting tank and is used for clamping a workpiece, and a jet flow polishing nozzle which is arranged above the clamp and is used for carrying out jet flow polishing on the workpiece on the clamp; each jet polishing nozzle is externally connected with a polishing solution supply pipeline for supplying polishing solution to the jet polishing nozzle, and the polishing solution consists of water and abrasive particles; the bottom of the inner cavity of each liquid collecting tank is respectively provided with a liquid discharging pump, the output end of each liquid discharging pump is respectively externally connected with a liquid discharging branch pipe, and each liquid discharging branch pipe respectively extends out of the liquid collecting tank and is connected with a liquid discharging main pipe;
the liquid discharge main pipe is also connected with the liquid collecting tank; the liquid collecting pool is separated from left to right in sequence: the abrasive particle recovery bin, the liquid inlet bin and the liquid purification bin; the top of the liquid collecting pool is sealed by a cover plate, and a liquid discharging main pipe penetrates through the cover plate and extends into the liquid inlet bin; a first stirring device is arranged in the liquid inlet bin;
the abrasive particle recovery bin and the liquid inlet bin are separated by a first separation component, and the first separation component consists of a first vertical separation plate and a first inclined filter screen; the bottom end of the first partition plate is connected with the bottom wall of the liquid collecting tank, the top end of the first partition plate is connected with the bottom end of the first filter screen, the top end of the first filter screen inclines rightwards, and the top end of the first filter screen is connected with the cover plate; the first filter screen can allow particles with the particle size not larger than that of the abrasive particles to pass through; a second stirring device and a first liquid supply pump are arranged in the abrasive particle recovery bin; the output end of the first liquid supply pump is externally connected with a first liquid outlet pipe, the first liquid outlet pipe extends out of the left side wall of the liquid inlet bin, and the outer end of the first liquid outlet pipe is also connected with a liquid return pipe and a polishing liquid recovery pipe through a three-way pipe; the liquid return pipe is communicated with the abrasive particle recovery bin, and a liquid return valve is arranged on the liquid return pipe; a polishing solution recovery tank is arranged on the left side of the liquid collecting tank, a polishing solution recovery pipe is communicated with the top of the polishing solution recovery tank, and a recovery valve is arranged on the polishing solution recovery pipe; a third stirring device is arranged in the polishing solution recovery tank;
the liquid purifying bin and the liquid inlet bin are separated by a second separating component, and the second separating component consists of a second vertical separating plate and a second inclined filter screen; the bottom end of the second partition plate is connected with the bottom wall of the liquid collecting tank, the top end of the second partition plate is connected with the bottom end of the second filter screen, the top end of the second filter screen inclines leftwards, and the top end of the second filter screen is connected with the cover plate; the second filter screen can intercept abrasive particles; a second liquid supply pump is arranged in the liquid purification bin; the output end of the second liquid supply pump is externally connected with a second liquid outlet pipe, the second liquid outlet pipe extends out of the right side wall of the liquid purifying bin, a purified liquid recovery pool is arranged on the right side of the liquid collecting pool, and the second liquid outlet pipe is communicated with the top of the purified liquid recovery pool;
the first liquid outlet pipe is provided with a photoelectric water quality turbidity detection device; the photoelectric water quality and turbidity detection device is used for detecting the water quality and turbidity of the liquid flowing through the first liquid outlet pipe, outputting a turbidity standard exceeding signal outwards when the water quality and turbidity is detected to exceed the standard, and outputting a turbidity standard not exceeding signal outwards when the water quality and turbidity is detected to not exceed the standard;
the liquid return valve and the recovery valve are electromagnetic valves, and the liquid return valve, the recovery valve and the second liquid supply pump are respectively connected with the photoelectric water quality turbidity detection device; the liquid return valve and the second liquid supply pump are triggered to be opened by a turbidity non-exceeding signal, and the liquid return valve and the second liquid supply pump are triggered to be closed by a turbidity exceeding signal; the recovery valve is triggered to be opened by the turbidity exceeding signal, and the recovery valve is triggered to be closed by the turbidity not exceeding signal.
2. The jet polishing system as claimed in claim 1, wherein each of the slurry supply lines has a slurry supply valve.
3. The jet polishing system of claim 2, wherein the sump of each jet polishing station is provided with a fourth agitating device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020209117.1U CN211760842U (en) | 2020-02-26 | 2020-02-26 | Jet polishing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020209117.1U CN211760842U (en) | 2020-02-26 | 2020-02-26 | Jet polishing system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211760842U true CN211760842U (en) | 2020-10-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020209117.1U Active CN211760842U (en) | 2020-02-26 | 2020-02-26 | Jet polishing system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211760842U (en) |
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2020
- 2020-02-26 CN CN202020209117.1U patent/CN211760842U/en active Active
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