CN111139433A - Pot, preparation method thereof and cooking utensil - Google Patents
Pot, preparation method thereof and cooking utensil Download PDFInfo
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- CN111139433A CN111139433A CN201811299725.XA CN201811299725A CN111139433A CN 111139433 A CN111139433 A CN 111139433A CN 201811299725 A CN201811299725 A CN 201811299725A CN 111139433 A CN111139433 A CN 111139433A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
- A47J36/00—Parts, details or accessories of cooking-vessels
- A47J36/02—Selection of specific materials, e.g. heavy bottoms with copper inlay or with insulating inlay
- A47J36/025—Vessels with non-stick features, e.g. coatings
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
- C22C21/12—Alloys based on aluminium with copper as the next major constituent
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
- C22C30/02—Alloys containing less than 50% by weight of each constituent containing copper
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C2200/00—Crystalline structure
- C22C2200/06—Quasicrystalline
Abstract
The invention provides a pot, a preparation method thereof and a cooking utensil. The cookware includes: a pan body; the quasi-crystal coating is arranged on the inner surface of the pot body and is prepared through magnetron sputtering or multi-arc ion plating. Therefore, the quasicrystal coating has high density, meets the non-stick performance and has better heat conductivity; as the inner surface coating of the pan, the heat can be transferred to the opsonized object (food contacted with the pan), so that the pan has good non-adhesiveness, hardness and corrosion resistance, the surface of the quasicrystal coating is smooth, the non-adhesiveness of the pan can be further improved, the pan is convenient to clean, and in addition, the quasicrystal coating is compact and can be strongly attached to the surface of the pan.
Description
Technical Field
The invention relates to the technical field of quasi-crystal, in particular to a cooker, a preparation method thereof and a cooking utensil.
Background
The non-stick coating comprises Polytetrafluoroethylene (PTFE) coating, copolymer (PFA) coating of a small amount of perfluoropropyl perfluorovinyl ether and polytetrafluoroethylene, ceramic coating and other various non-stick coatings, organic coatings such as PTFE and PFA coating have excellent chemical thermal stability and self-lubricating (non-stick) performance, and are widely applied to the surfaces of inner containers of cookers and rice cookers, however, the organic coatings such as PTFE and PFA have the fatal defects of low hardness and low adhesive force, and are very easy to scratch by hard objects to cause coating scratch, so that aluminum base materials are exposed, and the body health of users is impaired. Ceramic coatings are susceptible to hydrolysis, resulting in non-tackiness that tends to decrease with increasing use times.
The quasicrystal material is a material with low surface energy, and also has the characteristics of high hardness, low friction coefficient, wear resistance, corrosion resistance and the like, so that the quasicrystal material can replace polytetrafluoroethylene to be used for manufacturing non-stick pans, particularly Al-Cu-Fe quasicrystal gold, the surface energy of the quasicrystal material is between that of stainless steel and that of polytetrafluoroethylene and is slightly larger than that of the polytetrafluoroethylene by about 25%, so that the quasicrystal material has good non-stick property, and the corrosion resistance is further improved after alloy elements such as Cr and/or Ti are added. However, the preparation process of the quasicrystal non-stick coating has many defects in preparation, which causes the problems of poor non-stick property, high cost and the like.
Therefore, research on the cookware is awaited.
Disclosure of Invention
The present invention is directed to solving, at least to some extent, one of the technical problems in the related art. Therefore, the invention aims to provide a cooker which has the advantages of low cost, good non-adhesion, excellent corrosion resistance, simple preparation process, high efficiency, strong market competitiveness and the like.
In one aspect of the invention, a cookware is provided. According to an embodiment of the present invention, the pot comprises: a pan body; the quasi-crystal coating is arranged on the inner surface of the pot body and is prepared through magnetron sputtering or multi-arc ion plating. Therefore, the quasicrystal coating has high density, meets the non-stick performance and has better heat conductivity; as an inner surface coating of the pot, the coating can transfer heat to a conditioning object (food contacted with the pot), so that the pot has good non-adhesiveness, hardness and corrosion resistance, and the surface of the quasicrystal coating is smooth, thereby further improving the non-adhesiveness of the pot and being convenient to clean; compared with other coating methods, such as evaporation coating, the quasi-crystal coating formed in the application is more compact and has stronger adhesive force.
According to the embodiment of the invention, the quasicrystalline plating film is prepared by bias magnetron sputtering or bias multi-arc ion plating.
According to an embodiment of the invention, the material forming the pan body is selected from at least one of carbon steel, aluminum alloy, stainless steel, iron or ceramic.
According to the embodiment of the invention, the thickness of the quasicrystal coating film is 0.1-10 μm.
According to the embodiment of the invention, the quasicrystal content in the quasicrystal coating film is 60 wt% -90 wt%.
According to the embodiment of the invention, the porosity of the quasi-crystal coating film is less than or equal to 0.1%.
According to the embodiment of the invention, the surface roughness of the quasicrystalline plating film is less than or equal to 1.6 micrometers.
According to the embodiment of the invention, the raw materials for forming the quasi-crystal coating film comprise the following components in the atomic number ratio of (60-70): (15-25): (5-15): (5-15) aluminum, copper, iron, and an additional element, wherein the additional element comprises at least one of chromium and titanium.
In another aspect of the invention, the invention provides a method of making a cookware as hereinbefore described. According to an embodiment of the invention, the method comprises: providing a pot body; forming a quasi-crystal coating on the inner surface of the pot body through magnetron sputtering or multi-arc ion plating. Therefore, the preparation method is simple, low in cost, high in efficiency and easy for industrial production, the prepared pot has good non-adhesiveness, hardness and corrosion resistance, the surface of the quasicrystal coating film is smooth, the non-adhesiveness of the pot can be further improved, and the pot is convenient to clean; in addition, preferably, the quasi-crystal coating film is prepared by bias magnetron sputtering or bias multi-arc ion plating, and the bias is set in the process of preparing the quasi-crystal coating film by the magnetron sputtering or the multi-arc ion plating, so that the quasi-crystal coating film is compact and can be strongly attached to the surface of the pot body, namely the compactness and the adhesive force of the quasi-crystal coating film are further improved. Furthermore, the quasicrystal coating film has high density, meets the non-stick performance and has better heat conductivity; as the inner surface coating of the cookware, the heat can be transferred to the conditioning objects (food contacted with the cookware).
According to an embodiment of the invention, the magnetron sputtering or multi-arc ion plating is performed under at least one of the following conditions: vacuum degree of 1.0x10-2Pa～1.0x10-3Pa; the power is 6kW to 18 kW; the bias voltage is-100V to-300V; the deposition time is 60-180 minutes.
According to an embodiment of the present invention, the step of forming the quasicrystalline plating film includes: aluminum, copper, iron and additional elements are mixed according to the atomic number ratio (60-70): (15-25): (5-15): (5-15) mixing, and melting in a vacuum or a protective atmosphere to form an alloy ingot, wherein the additional element comprises at least one of chromium and titanium; processing the alloy ingot into a target material with a preset size; and forming a quasicrystal coating film on the pot body by using the target material.
According to the embodiment of the invention, before the forming of the quasicrystalline coating film on the pot body, the method further comprises the following steps: and annealing the target material.
According to an embodiment of the invention, the annealing treatment is performed under the following conditions: the temperature is 700-900 ℃, and the time is 6-12 h.
In yet another aspect of the present invention, the present invention provides a cooking appliance. According to an embodiment of the invention, the cooking appliance comprises the aforementioned pot. Therefore, the cooking utensil has good non-stick property, and when food is cooked, the food cannot stick to a pot, so that the taste and the appearance of the food are improved. Those skilled in the art will appreciate that the cooking appliance has all the features and advantages of the aforementioned cookware, and thus the description thereof is omitted.
Drawings
Fig. 1 is a schematic structural view of a pot in one embodiment of the present invention.
Fig. 2 is a schematic view of a partial structure of a pot in one embodiment of the present invention.
Fig. 3 is a flow chart of a method of making a cookware in another embodiment of the present invention.
Fig. 4 is a flow chart of a method of preparing a cookware in yet another embodiment of the present invention.
Detailed Description
The following describes embodiments of the present invention in detail. The following examples are illustrative only and are not to be construed as limiting the invention. The examples, where specific techniques or conditions are not indicated, are to be construed according to the techniques or conditions described in the literature in the art or according to the product specifications. The reagents or instruments used are not indicated by the manufacturer, and are all conventional products commercially available.
In one aspect of the invention, a cookware is provided. According to an embodiment of the present invention, referring to fig. 1 and 2, the pot includes: a pan body 10; the quasi-crystal coating film 20 is arranged on the inner surface of the pot body 10, wherein the quasi-crystal coating film is prepared by magnetron sputtering or multi-arc ion plating. Therefore, the quasicrystal coating has high density, meets the non-stick performance and simultaneously has better heat conductivity; the surface coating can transfer heat to a conditioning object (food contacted with the cookware) as an inner surface coating of the cookware, so that the cookware has good non-adhesiveness, hardness and corrosion resistance, the surface of the quasicrystal coating is smooth, the non-adhesiveness of the cookware can be further improved, the cookware is convenient to clean, and in terms of process, a post-treatment process of further polishing is not needed, so that the process flow is shortened, the production efficiency is improved, and the production cost is reduced; compared with other coating methods, such as evaporation coating, the quasi-crystal coating formed in the application is more compact and has stronger adhesive force.
According to the embodiment of the invention, the quasi-crystal coating is prepared by bias magnetron sputtering or bias multi-arc ion plating, namely bias is set in the process of preparing the quasi-crystal coating by magnetron sputtering or multi-arc ion plating. Therefore, the quasicrystal coating film can be more compact and can be strongly attached to the surface of the pot body, namely the compactness and the adhesive force of the quasicrystal coating film are further improved; furthermore, the density of the quasi-crystal coating is higher, so that the quasi-crystal coating has better heat conductivity while meeting the requirement of non-adhesion performance, and can transfer heat to a conditioner (food in contact with a cooker) as an inner surface coating of the cooker.
According to an embodiment of the invention, the material forming the pan body is selected from at least one of carbon steel, aluminum alloy, stainless steel, iron or ceramic. Therefore, the pot body has enough strength to form the quasicrystal coating film on the surface.
According to an embodiment of the present invention, in order to ensure good non-stick performance of the cookware, the thickness of the quasicrystalline plating film is 0.1 to 10 micrometers, such as 0.1, 0.3, 0.5, 1.0, 1.5, 2.0, 2.5, 3.0, 3.5, 4.0, 4.5, 5.0, 5.5, 6.0, 6.5, 7.0, 7.5, 8.0, 8.5, 9.0, 9.5 or 10 micrometers. The quasi-crystal coating has the characteristics of high hardness and high wear resistance, so that when an external appliance is used for cleaning for a long time, the quasi-crystal coating cannot be damaged and fall off, and the cookware can be endowed with lasting good non-adhesiveness, when the cookware is applied to cooking equipment, the thickness of the quasi-crystal coating has great influence on the heat conductivity of the surface of the cookware, the quasi-crystal coating cannot be uniformly heated relatively when being too thin, and the quasi-crystal coating is loose in relative structure and increased in pores when being too thick, so that the hardness, wear resistance and non-adhesiveness of the quasi-crystal coating are reduced, and the thickness of the quasi-crystal coating in the embodiment of the invention is 0.1-10 microns, so that the quasi-crystal coating can be ensured to play a good uniform heating role, and the problems of loose structure, increased pores and reduced hardness, wear resistance and non-adhesiveness of the coating can be avoided.
According to the embodiment of the present invention, in order to ensure and improve non-stick property of the pot, the quasicrystal content in the quasicrystal plating film is 60 wt% to 90 wt%, for example, 60 wt%, 65 wt%, 70 wt%, 75 wt%, 80 wt%, 85 wt%, or 90 wt%. From this, can guarantee that quasi-crystal coating film has the non-adhesion of preferred, and then improve the non-adhesion of pan, can also further improve the corrosion resistance and the wearability of pan, and then prolong the performance of pan.
According to the embodiment of the invention, the porosity of the quasicrystalline plating film is less than or equal to 0.1%. From this, the pan not only has good inadhesion nature, can also further improve the corrosion resistance and the wearability of pan, and then the performance of extension pan.
According to the embodiment of the invention, the surface roughness of the quasicrystalline plating film is 1.6 μm or less. Therefore, the quasi-crystal coating film directly prepared by magnetron sputtering or multi-arc ion plating has a smooth surface, the non-adhesiveness of the cookware can be further improved, and the post-treatment processes such as further polishing are not needed, so that the process flow is shortened, the production efficiency is improved, and the production cost is reduced.
According to an embodiment of the present invention, the material forming the quasicrystalline plating film includes at least two of aluminum, iron, copper, chromium, titanium, nickel, and zirconium. Thus, the quasicrystal content of the quasicrystal plating film can be obtained.
According to an embodiment of the present invention, a material forming the quasi-crystal plating film includes an Al-Cu-Fe alloy, an Al-Cu-Fe-Cr alloy, a Ti-Fe alloy, or a Ti-Ni-Zr alloy. Thus, the quasicrystal content of the quasicrystal plating film can be obtained.
According to the embodiment of the invention, in order to obtain the quasicrystal coating film with high quasicrystal content, the raw materials for forming the quasicrystal coating film comprise the following atomic number ratio of (60-70): (15-25): (5-15): (5-15) aluminum, copper, iron, and an additional element, wherein the additional element comprises at least one of chromium and titanium. Therefore, the quasicrystal content in the quasicrystal coating film can be higher and can reach 60 wt% -90 wt%, so that the quasicrystal coating film has better non-adhesiveness, wear resistance and corrosion resistance, and the service performance of the pot is further prolonged.
In another aspect of the invention, the invention provides a method of making a cookware as hereinbefore described. According to an embodiment of the present invention, referring to fig. 2, the method includes:
s100: providing a pan body.
According to an embodiment of the invention, the material forming the pan body is selected from at least one of carbon steel, aluminum alloy, stainless steel, iron or ceramic. Therefore, the pot body has enough strength so that the quasicrystal coating film can be formed on the surface of the pot body, and the service performance of the pot body is met.
According to the embodiment of the invention, in order to make the quasicrystal coating film stably attached to the pot body, the surface of the pot body can be cleaned in advance, and the specific cleaning method has no limitation requirement, as long as the stain, oil stain or rust on the surface of the pot body can be cleaned to meet the coating requirement. In the embodiment of the invention, the surface of the pot body can be cleaned and dried by adopting the modes of alcohol, trichloroethylene or pure water and ultrasonic waves and the like, and the surface of the pot body is required to have no rust and the like before spraying, so that the adhesion of the quasicrystal coating on the pot body can be greatly improved after the coating is cleaned.
S200: forming a quasi-crystal coating on the inner surface of the pot body by magnetron sputtering or multi-arc ion plating.
According to the embodiment of the invention, the quasi-crystal coating film prepared by magnetron sputtering or multi-arc ion plating is compact, has proper thickness and porosity, has good thermal conductivity while meeting the non-stick performance, has strong bonding force with the pot body, and has good adhesion on the pot body, so that the non-stick performance, the wear resistance and the corrosion resistance of the quasi-crystal coating film can be improved, and the service life of the pot can be prolonged. Compared with other coating methods, such as evaporation coating, the quasi-crystal coating formed in the method is better and more compact and has stronger adhesive force, and the evaporation coating is to evaporate the raw materials at one time, so that the adhesive force on the surface of the pot body is poor and the compactness is poor.
According to the embodiment of the invention, the quasi-crystal coating film can be further prepared by adopting bias magnetron sputtering or bias multi-arc ion plating, namely bias voltage is set in the magnetron sputtering or multi-arc ion plating process, the method for adopting bias magnetron sputtering or bias multi-arc ion plating is easier to operate and industrially produce cookware, the quasi-crystal coating film can be more compact, and can be strongly attached to the surface of the base body cookware body, and the compactness and the adhesive force of the quasi-crystal coating film are further improved.
According to the embodiment of the invention, in order to obtain the quasicrystal coating film with better non-stick property, the magnetron sputtering or the multi-arc ion plating is completed under the condition of at least one of the following conditions: vacuum degree of 1.0x10-2Pa～1.0x10-3Pa, e.g. 1.0x10-2Pa、0.7x10-2Pa、0.5x10-2Pa、0.2x10-2Pa or 1.0x10-3Pa; the power is 6kW to 18kW, such as 6kW, 8kW, 10kW, 12kW, 14kW, 16kW or 18 kW; the bias voltage is-100V to-300V, such as-100V, -150V, -200V, -250V or-300V; the deposition time is 60-180 minutes, such as 60 minutes, 80 minutes, 100 minutes, 140 minutes, 160 minutes, or 180 minutes. By adopting the bias process, the compactness of the quasicrystal coating film can be further improved, and the binding force between the quasicrystal coating film and the pot body is further improved. Therefore, the quasicrystal coating film with proper thickness and porosity can be obtained, and the non-adhesiveness, the wear resistance and the corrosion resistance of the quasicrystal coating film are further improved.
According to an embodiment of the present invention, referring to fig. 3, the step of forming the quasicrystalline plating film includes:
s210: aluminum, copper, iron and additional elements are mixed according to the atomic number ratio (60-70): (15-25): (5-15): (5-15) mixing, and smelting in a vacuum or protective atmosphere to form an alloy ingot, wherein the additional element comprises at least one of chromium and titanium. Therefore, the quasicrystal content in the quasicrystal coating film can be higher and can reach 60 wt% -90 wt%, so that the quasicrystal coating film has better non-adhesiveness, wear resistance and corrosion resistance, and the service performance of the pot is further prolonged.
The particular method of forming the alloy ingot according to embodiments of the present invention is not a limiting requirement and those skilled in the art may flexibly select the method according to actual needs. In the embodiment of the invention, the raw materials (Al, Cu, Fe, Cr and Ti) in the above proportion are weighed and put into a cleaned medium frequency induction furnace, wherein Fe and Cr are placed at the bottom position of the medium frequency induction furnace, the medium frequency induction furnace is heated and smelted, inert gas is introduced in the whole process as protective gas in the smelting process or vacuum pumping is carried out, and after the alloy is completely melted and slag is removed, an alloy ingot is obtained by casting, thus obtaining the quasicrystal material.
S220: and processing the alloy ingot into a target material with a preset size.
According to the embodiment of the invention, the method for processing the alloy ingot into the target is not limited, and the skilled person can flexibly select the method according to the actual requirement. In embodiments of the present invention, methods of processing an alloy ingot into a target include, but are not limited to, numerically controlled machine tool (CNC). Thus, the machining dimension is accurate.
According to the embodiment of the invention, the preset size is matched with the specific size of the cathode of the film plating machine in magnetron sputtering or multi-arc ion plating, namely the size of the target material is consistent with the size of the cathode of the film plating machine, and the skilled person can flexibly set the preset size according to the size of the cathode of the film plating machine.
According to the embodiment of the invention, in order to increase the quasicrystal content of the quasicrystal coating film, before the quasicrystal coating film is formed on the pot body, the method further comprises the following steps: and annealing the target material. In the annealing process, the quasicrystal crystal seeds in the target material can grow into quasicrystal crystal grains in the annealing process, so that the annealing treatment can greatly improve the quasicrystal content in the target material, further improve the quasicrystal content in the quasicrystal coating film, and further greatly improve the non-adhesiveness of the quasicrystal coating film.
According to the embodiment of the present invention, in order to grow the quasicrystalline seed crystal into a quasicrystalline grain in annealing, the annealing treatment is performed under the following conditions: the temperature is 700-900 deg.C, such as 700 deg.C, 720 deg.C, 740 deg.C, 760 deg.C, 780 deg.C, 800 deg.C, 850 deg.C, 880 deg.C or 900 deg.C, for 6-12 hours, such as 6 hours, 7 hours, 8 hours, 9 hours, 10 hours, 11 hours or 12 hours. The annealing temperature herein refers to a holding temperature during the annealing process. Therefore, the quasi-crystal seed in the target material can grow into the quasi-crystal grain by annealing in the temperature range, and the performance of the original quasi-crystal grain in the target material can not be influenced; if the temperature is lower than 700 ℃, a longer time is needed for the quasicrystal seed crystal to grow into the quasicrystal crystal grain, so the quasicrystal content in the target material is still improved compared with the target material before annealing treatment; if the temperature is higher than 900 ℃, although the content of the quasicrystal in the target material can be greatly improved, in the annealing process, the target material has overhigh thermal stress due to overhigh temperature, and the target material is cracked due to overhigh thermal stress, so that the thickness uniformity of the finally formed quasicrystal coating film is seriously influenced, and the non-sticking effect of the cookware is further influenced.
S230: the target material is used for forming a quasicrystal coating film on the pot body.
According to the embodiment of the invention, the quasi-crystal coating film is formed by using a magnetron sputtering or multi-arc ion plating method, wherein, in order to obtain the quasi-crystal coating film with better non-stick property, the vacuum coating is completed under at least one of the following conditions: vacuum degree of 1.0x10-2Pa～1.0x10-3Pa, e.g. 1.0x10-2Pa、0.7x10-2Pa、0.5x10-2Pa、0.2x10-2Pa or 1.0x10- 3Pa; the power is 6kW to 18kW, such as 6kW, 8kW, 10kW, 12kW, 14kW, 16kW or 18 kW; the bias voltage is-100V to-300V, such as-100V, -150V, -200V, -250V or-300V; the deposition time is 60-180 minutes, such as 60 minutes, 80 minutes, 100 minutes, 140 minutes, 160 minutes, or 180 minutes. Therefore, the quasicrystal coating film with proper thickness and porosity can be obtained, and the non-adhesiveness, the wear resistance and the corrosion resistance of the quasicrystal coating film are further improved.
According to the embodiment of the invention, the method for preparing the pot is simple, low in cost, high in efficiency and easy for industrial production, the prepared pot has good non-adhesiveness, hardness and corrosion resistance, the surface of the quasicrystal coating film is smooth, the non-adhesiveness of the pot can be further improved, and the pot is convenient to clean; in addition, bias voltage is set in the process of preparing the quasi-crystal coating film by magnetron sputtering or multi-arc ion plating, so that the quasi-crystal coating film is more compact and can be strongly attached to the surface of the pot body, namely, the compactness and the adhesive force of the quasi-crystal coating film are further improved.
It should be noted that the term "non-stick" refers to the property of the pan when the pan is used in a cooking utensil, the quasicrystalline coating is placed in direct contact with food, and the food does not stick to the pan during cooking.
According to the embodiment of the invention, the type of the pot is not limited, and a person skilled in the art can flexibly select the pot according to actual conditions.
In yet another aspect of the present invention, the present invention provides a cooking appliance. According to an embodiment of the invention, the cooking appliance comprises the aforementioned pot. Therefore, the cooking utensil has good non-stick property, and when food is cooked, the food cannot stick to a pot, so that the taste and the appearance of the food are improved. Those skilled in the art will appreciate that the cooking appliance has all the features and advantages of the aforementioned cookware, and thus the description thereof is omitted.
Of course, it will be understood by those skilled in the art that the cooking appliance includes, in addition to the aforementioned quasicrystalline coating and body, the necessary structures or components of a conventional cooking appliance, such as a wok, and a handle, etc., in addition to the aforementioned pot; taking an electric cooker as an example, besides the cooker, the electric cooker further comprises a base, a steam valve, a cooker cover, an electric heating plate, an operation interface and other structures or components.
Examples
Example 1
The steps of preparing the pot include:
the method comprises the following steps: pure aluminum, pure copper, pure iron and pure chromium are used as raw materials, and according to the atomic percentages of Al, Cu, Fe and Cr + Ti, the raw materials are 60: 15: 15: 10, proportioning;
step two: putting weighed Al, Cu, Fe, (Cr + Ti) raw materials into a cleaned medium-frequency induction furnace, placing Fe and Cr at the bottom position of the medium-frequency induction furnace, heating and smelting, introducing inert gas in the whole process as protective gas in the smelting process or vacuumizing, and casting an alloy ingot after the alloy is completely melted and deslagging;
step three: machining the alloy ingot obtained in the step two into the size of the target material by adopting CNC machining;
step four: cleaning the pan body;
step five: performing film coating under the following conditions by adopting bias magnetron sputtering,
vacuum degree of 1.0x10-2Pa；
The power is 6 kW;
the bias voltage is-100V;
the deposition time was 60 minutes.
Test results of the pot inner surface (surface of the quasicrystal coating film):
surface roughness: ra0.2
Non-stick property: grade 1 (grade 1: light shaking or no shaking, all rice can fall out of the inner pot, grade 2: light shaking still rice is adhered on the coating, weight of rice is less than or equal to 50g, grade 3: light shaking still rice is adhered on the coating, weight of rice is less than or equal to 100 g).
And (3) neutral salt spray test: 96H does not rust
Example 2
The steps of preparing the pot include:
the method comprises the following steps: pure aluminum, pure copper, pure iron and pure chromium are used as raw materials, and Al, Cu, Fe and Cr + Ti are 70 atomic percent: 15: 5: 10, proportioning;
step two: putting weighed Al, Cu, Fe, (Cr + Ti) raw materials into a cleaned medium-frequency induction furnace, placing Fe and Cr at the bottom position of the medium-frequency induction furnace, heating and smelting, introducing inert gas in the whole process as protective gas in the smelting process or vacuumizing, and casting an alloy ingot after the alloy is completely melted and deslagging;
step three: machining the alloy ingot obtained in the step two into the size of the target material by adopting CNC machining;
step four: cleaning the pan body;
step five: adopts bias multi-arc ion plating to carry out film plating under the following conditions,
vacuum degree of 1.0x10-3Pa；
The power is 18 kW;
the bias voltage is-300V;
the deposition time was 180 minutes.
Test results of the pot inner surface (surface of the quasicrystal coating film):
surface roughness: ra0.3
Non-stick property: grade 1 (grade 1: light shaking or no shaking, all rice can fall off from the inner pot, grade 2: light shaking still rice is adhered on the coating, weight of rice is less than or equal to 50g, grade 3: light shaking still rice is adhered on the coating, weight of rice is less than or equal to 100g)
And (3) neutral salt spray test: 172H does not rust
Example 3
The steps of preparing the pot include:
the method comprises the following steps: pure aluminum, pure copper, pure iron and pure chromium are used as raw materials, and Al, Cu, Fe and Cr + Ti are 65 atomic percent: 15: 10: 10, proportioning;
step two: putting weighed Al, Cu, Fe, (Cr + Ti) raw materials into a cleaned medium-frequency induction furnace, placing Fe and Cr at the bottom position of the medium-frequency induction furnace, heating and smelting, introducing inert gas in the whole process as protective gas in the smelting process or vacuumizing, and casting an alloy ingot after the alloy is completely melted and deslagging;
step three: machining the alloy ingot obtained in the step two into the size of the target material by adopting CNC machining;
step four: cleaning the pan body;
step five: adopts bias multi-arc ion plating to carry out film plating under the following conditions,
vacuum degree of 5.0x10-2Pa；
The power is 12 kW;
the bias voltage is-150V;
the deposition time is 60-180 minutes.
Test results of the pot inner surface (surface of the quasicrystal coating film):
surface roughness: ra0.25
Non-stick property: grade 1 (grade 1: light shaking or no shaking, all rice can fall off from the inner pot, grade 2: light shaking still rice is adhered on the coating, weight of rice is less than or equal to 50g, grade 3: light shaking still rice is adhered on the coating, weight of rice is less than or equal to 100g)
And (3) neutral salt spray test: 144H does not rust
Example 4
The steps of preparing the pot include:
the method comprises the following steps: pure aluminum, pure copper, pure iron and pure chromium are adopted as raw materials, and Al, Cu, Fe and Cr + Ti are 55 atomic percent: 10: 20: 15, proportioning;
step two: putting weighed Al, Cu, Fe, (Cr + Ti) raw materials into a cleaned medium-frequency induction furnace, placing Fe and Cr at the bottom position of the medium-frequency induction furnace, heating and smelting, introducing inert gas in the whole process as protective gas in the smelting process or vacuumizing, and casting an alloy ingot after the alloy is completely melted and deslagging;
step three: machining the alloy ingot obtained in the step two into the size of the target material by adopting CNC machining;
step four: cleaning the pan body;
step five: the coating is carried out by adopting multi-arc ion plating or magnetron sputtering (without bias voltage) under the following conditions:
vacuum degree of 1.0x10-2Pa；
The power is 6 kW;
the deposition time was 60 minutes.
Test results of the pot inner surface (surface of the quasicrystal coating film):
surface roughness: ra0.25
Non-stick property: stage 2
And (3) neutral salt spray test: 48 rusts and 96H rusts
Comparative example 1
The steps of preparing the pot include:
the method comprises the following steps: pure aluminum, pure copper, pure iron and pure chromium are used as raw materials, and according to the atomic percentages of Al, Cu, Fe and Cr + Ti, the raw materials are 60: 15: 15: 10, proportioning;
step two: putting weighed Al, Cu, Fe, (Cr + Ti) raw materials into a cleaned medium-frequency induction furnace, placing Fe and Cr at the bottom position of the medium-frequency induction furnace, heating and smelting, introducing inert gas in the whole process as protective gas in the smelting process or vacuumizing, and casting an alloy ingot after the alloy is completely melted and deslagging;
step three: atomizing the alloy ingot obtained in the step two to prepare powder;
step four: cleaning the pan body;
step five: and preparing the quasicrystal coating by adopting plasma spraying.
Test results of the pot inner surface (surface of the quasicrystal coating film):
surface roughness: ra8.0
Non-stick property: stage 2
And (3) neutral salt spray test: 144H does not rust
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made to the above embodiments by those of ordinary skill in the art within the scope of the present invention.
Claims (14)
1. A cookware, comprising:
a pan body;
a quasi-crystal coating film arranged on the inner surface of the pot body,
wherein the quasi-crystal coating is prepared by magnetron sputtering or multi-arc ion plating.
2. The cookware according to claim 1, wherein said quasicrystalline coating is prepared by bias magnetron sputtering or bias multi-arc ion plating.
3. The cookware according to claim 1 or 2, wherein the material forming the pot is selected from at least one of carbon steel, aluminum alloy, stainless steel, iron or ceramic.
4. The cookware according to claim 1 or 2, wherein the thickness of the quasicrystalline coating is 0.1-10 microns.
5. The cookware according to claim 1 or 2, wherein the quasicrystal content in the quasicrystal coating is 60 wt% to 90 wt%.
6. The cookware according to claim 1 or 2, wherein the porosity of the quasicrystalline coating is less than or equal to 0.1%.
7. The cookware according to claim 1 or 2, wherein the surface roughness of the quasicrystalline coating is less than or equal to 1.6 microns.
8. The cookware according to claim 1 or 2, wherein the raw material for forming the quasicrystalline coating comprises an atomic number ratio of (60-70): (15-25): (5-15): (5-15) aluminum, copper, iron, and an additional element, wherein the additional element comprises at least one of chromium and titanium.
9. A method of making the cookware of any of claims 1-8, comprising:
providing a pot body;
forming a quasi-crystal coating on the inner surface of the pot body through magnetron sputtering or multi-arc ion plating.
10. The method of claim 9, wherein the magnetron sputtering or multi-arc ion plating is performed under at least one of the following conditions:
vacuum degree of 1.0x10-2Pa～1.0x10-3Pa；
The power is 6kW to 18 kW;
the bias voltage is-100V to-300V;
the deposition time is 60-180 minutes.
11. The method of claim 9, wherein the step of forming the quasicrystalline coating film comprises:
aluminum, copper, iron and additional elements are mixed according to the atomic number ratio (60-70): (15-25): (5-15): (5-15) mixing, and melting in a vacuum or a protective atmosphere to form an alloy ingot, wherein the additional element comprises at least one of chromium and titanium;
processing the alloy ingot into a target material with a preset size;
and forming the quasicrystal coating film on the pot body by using the target material.
12. The method of claim 11, wherein before forming the quasicrystalline coating on the pot body, further comprising:
and annealing the target material.
13. The method of claim 12, wherein the annealing is performed under the following conditions:
the temperature is 700-900 ℃ and the time is 6-12 hours.
14. A cooking appliance comprising the pot according to any one of claims 1 to 8.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115165717A (en) * | 2022-06-29 | 2022-10-11 | 九阳股份有限公司 | Cooking container coating testing method and cooker |
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