CN111123531A - Antireflection micro-nano structure array based on space shaping - Google Patents
Antireflection micro-nano structure array based on space shaping Download PDFInfo
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- CN111123531A CN111123531A CN201911386668.3A CN201911386668A CN111123531A CN 111123531 A CN111123531 A CN 111123531A CN 201911386668 A CN201911386668 A CN 201911386668A CN 111123531 A CN111123531 A CN 111123531A
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- 239000002086 nanomaterial Substances 0.000 title claims abstract description 48
- 238000007493 shaping process Methods 0.000 title claims abstract description 16
- 238000003491 array Methods 0.000 claims abstract description 4
- 230000003595 spectral effect Effects 0.000 abstract description 13
- 238000002834 transmittance Methods 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 210000001595 mastoid Anatomy 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
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Abstract
The invention relates to a space shaping-based anti-reflection micro-nano structure array, which comprises a plurality of anti-reflection micro-nano structures arranged in an array manner, wherein the surface shape of each anti-reflection micro-nano structure is an equilateral triangle or an isosceles trapezoid; the horizontal spacing and the vertical spacing of adjacent equilateral triangles in the array are both P; or the horizontal spacing and the vertical spacing of the adjacent isosceles trapezoids in the array are both P; p is determined specifically according to the wavelength of the antireflection. The invention solves the technical problem of low spectral bandwidth precision caused by the fact that the shadow parts of micro-group holes of the existing micro-nano structure array are not distributed according to the theoretical P value, and the two types of anti-reflection micro-nano structure arrays are distributed according to the theoretical P value from all directions, so that the selection precision of the spectral bandwidth is improved, and the requirements of the anti-reflection transmittance, the spectral bandwidth, the incidence angle and other characteristics can be better met.
Description
Technical Field
The invention relates to an antireflection micro-nano structure array, in particular to a high-precision spectral bandwidth antireflection micro-nano structure array.
Background
At present, the antireflection micro-nano structure is mainly formed by methods such as nano-imprinting, ion beam etching, laser-induced periodic structure, photolithography, chemical deposition, sol-gel method, laser direct writing and the like, and the shape of the antireflection micro-nano structure can be roughly divided into a nano-column, a micron-sized mastoid structure, a grating structure, a sub-wavelength periodic stripe, an array micro-group hole (with depth of micron order), an array rectangular hole (with depth of micron order) and the like, so that the antireflection characteristics (such as antireflection transmittance, spectral bandwidth and incident angle) are limited.
The antireflection micro-nano structure can be intuitively explained by an approximate equivalent medium theory, and because a part of surface substances are removed and filled with air after the micro-nano structure is processed on the surface, the equivalent refractive index of the surface of the micro-nano structure can be regarded as the average refractive index of air and a substrate material and is between the air and the substrate, and the microstructure serves as an intermediate layer to play an antireflection role.
As shown in fig. 1, the spacing between the micro-nano structures directly determines the spectral bandwidth of the spectral transmittance. However, the micro-group hole parts (i.e. the areas surrounded by three equilateral P's) of the conventional micro-nano structure array are not distributed according to the theoretical P value, i.e. the P value is obviously greater than the theoretical P value, which reduces the accuracy of selecting the spectral bandwidth.
Disclosure of Invention
The invention aims to solve the technical problem of low spectral bandwidth precision caused by the fact that shadow parts of micro-group holes of an existing micro-nano structure array are not distributed according to theoretical P values, and provides a space shaping-based antireflection micro-nano structure array with high-precision spectral bandwidth.
The technical solution of the invention is as follows:
the first antireflection micro-nano structure array based on spatial shaping comprises a plurality of antireflection micro-nano structures arranged in an array, and is characterized in that: the surface shape of the anti-reflection micro-nano structure is an equilateral triangle; the horizontal spacing and the vertical spacing of adjacent equilateral triangles in the array are both P, and the P is determined according to the wavelength of the antireflection.
The side length of the equilateral triangle is preferably < 10 um.
The depth-to-width ratio of the antireflection micro-nano structure is preferably more than or equal to 10: 1.
The second anti-reflection micro-nano structure array based on space shaping comprises a plurality of anti-reflection micro-nano structures arranged in an array, and is characterized in that: the surface shape of the antireflection micro-nano structure is an isosceles trapezoid; the horizontal spacing and the vertical spacing of adjacent isosceles trapezoids in the array are both P, and the P is specifically determined according to the wavelength of the antireflection.
The upper side length of the isosceles trapezoid is preferably less than 5um, and the lower side length is preferably less than 10 um.
The depth-to-width ratio of the antireflection micro-nano structure is more than or equal to 10: 1.
The invention has the advantages that:
1. the invention improves the selection precision of the spectral bandwidth. The two types of anti-reflection micro-nano structure arrays provided by the invention are distributed according to theoretical P values from all directions, so that the selection precision of the spectral bandwidth is improved.
2. The invention provides an antireflection micro-nano structure array (triangle and trapezoid) based on two types of space shaping, enriches antireflection structures, can better meet the requirements of antireflection characteristics (such as antireflection transmittance, spectral bandwidth and incident angle), has higher selectivity of design optimization, and widens boundary conditions.
Drawings
FIG. 1 is a schematic diagram of a micro-cluster pore distribution of a conventional micro-nano structure array;
FIG. 2 is a schematic diagram of a micro-cluster pore distribution of a first antireflection micro-nano structure array according to the present invention;
FIG. 3 is a schematic diagram of the horizontal and vertical spacing of the micro-clusters of wells of FIG. 2;
FIG. 4 is a schematic diagram of a micro-cluster pore distribution of a second anti-reflection micro-nano structure array according to the present invention;
fig. 5 is a schematic diagram of the horizontal and vertical spacing of the micro-clusters of holes of fig. 4.
Detailed Description
The invention discloses a space shaping-based anti-reflection micro-nano structure, which aims at the problem of limited design simulation structure caused by limited actual processing capacity and realizes the design layout of two anti-reflection micro-nano structures based on a space shaping device (SLM) with an anti-laser damage threshold. The method comprises the following specific steps:
in the first anti-reflection micro-nano structure array, the surface of each unit is an equilateral triangle, the side length is less than 5um, the depth-to-width ratio is more than or equal to 10:1, and the period P is specifically determined according to the anti-reflection wavelength. As shown in particular in fig. 2 and 3.
In the second anti-reflection micro-nano structure array, the surface of each unit is an isosceles trapezoid, the upper side length is less than 4um, the lower side length is less than 8um, the depth-to-width ratio is more than or equal to 10:1, and the period P is specifically determined according to the wavelength of anti-reflection and anti-reflection. As shown in particular in fig. 4 and 5.
The principle of the invention is as follows:
with the increasing capability of the laser damage threshold resistance of various spatial shaping devices (high laser damage threshold SLM, DOE and the like), the application of the spatial shaping devices to ultrafast laser, especially femtosecond laser actual processing becomes possible, wherein the spatial light modulator has changeable and flexible spatial shaping capability based on diffraction, so that the laser processing capability is greatly enriched, for example, laser spots can be shaped into triangles, trapezoids, pentagons, even polygons and the like, which enable the design of novel anti-reflection micro-nano structures.
Claims (6)
1. The utility model provides a subtract anti-micro nano structure array based on space plastic, includes the subtract anti-micro nano structure that a plurality of arrays arranged, its characterized in that:
the surface shape of the anti-reflection micro-nano structure is an equilateral triangle;
the horizontal spacing and the vertical spacing of adjacent equilateral triangles in the array are both P, and the P is determined according to the wavelength of the antireflection.
2. The array of the antireflection micro-nano structure based on the spatial shaping of claim 1 is characterized in that:
the side length of the equilateral triangle is less than 10 um.
3. The array of the antireflection micro-nano structure based on the spatial shaping according to claim 1 or 2, wherein:
the depth-to-width ratio of the antireflection micro-nano structure is more than or equal to 10: 1.
4. The utility model provides a subtract anti-micro nano structure array based on space plastic, includes the subtract anti-micro nano structure that a plurality of arrays arranged, its characterized in that:
the surface shape of the antireflection micro-nano structure is an isosceles trapezoid;
the horizontal spacing and the vertical spacing of adjacent isosceles trapezoids in the array are both P, and the P is specifically determined according to the wavelength of the antireflection.
5. The array of the antireflection micro-nano structure based on the spatial shaping of claim 4 is characterized in that:
the length of the upper edge of the isosceles trapezoid is less than 5um, and the length of the lower edge of the isosceles trapezoid is less than 10 um.
6. The array of the antireflection micro-nano structure based on the spatial shaping according to claim 4 or 5, wherein:
the depth-to-width ratio of the antireflection micro-nano structure is more than or equal to 10: 1.
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| CN201911386668.3A CN111123531B (en) | 2019-12-29 | 2019-12-29 | Antireflection micro-nano structure array based on space shaping |
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| CN111123531B CN111123531B (en) | 2020-11-17 |
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