CN111106149B

CN111106149B - Display panel and preparation method thereof

Info

Publication number: CN111106149B
Application number: CN201911225552.1A
Authority: CN
Inventors: 杨薇薇
Original assignee: Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
Current assignee: Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
Priority date: 2019-12-04
Filing date: 2019-12-04
Publication date: 2022-07-12
Anticipated expiration: 2039-12-04
Also published as: CN111106149A

Abstract

The invention relates to a display panel and a preparation method thereof. According to the invention, the first groove penetrating from the surface, away from the substrate, of the interlayer insulating layer of the display area to the barrier layer and the first groove penetrating from the surface, away from the substrate, of the interlayer insulating layer of the bending area to the second groove in the active layer are formed in the display area through the first photomask simultaneously, so that the photomask cost is saved. On the other hand, the active layer of the bending area is reserved, so that the etching time of the first groove body is prolonged, and the first photomask can simultaneously meet the requirements of the depth of the first groove and the depth of the first groove body of the second groove.

Description

Display panel and preparation method thereof

Technical Field

The invention relates to the technical field of display, in particular to a display panel and a preparation method thereof.

Background

The display device can convert the data of the computer into various characters, numbers, symbols or visual images for display, and can input commands or data into the computer by using input tools such as a keyboard, and the display contents can be added, deleted and changed at any time by means of hardware and software of the system. Display devices are classified into plasma, liquid crystal, light emitting diode, cathode ray tube, and the like, according to the display device used.

Organic Light-Emitting display devices (also called Organic Light-Emitting diodes, abbreviated as OLEDs) are also called Organic electroluminescent display devices and Organic Light-Emitting semiconductors. The working principle of the OLED is as follows: when power is supplied to a proper voltage, positive holes and cathode charges are combined in the light-emitting layer and are recombined to form excitons (electron-hole pairs) in an excited state at a certain probability under the action of coulomb force, the excited state is unstable in a normal environment, the excitons in the excited state are recombined and transfer energy to the light-emitting material, so that the light-emitting material is transited from a ground state energy level to the excited state, the excited state energy generates photons through a radiation relaxation process, light energy is released, brightness is generated, and three primary colors of red, green and blue RGB are generated according to different formulas to form basic colors.

The OLED has the advantages of low voltage requirement, high power saving efficiency, fast response, light weight, thin thickness, simple structure, low cost, wide viewing angle, almost infinite contrast, low power consumption, extremely high response speed, and the like, and has become one of the most important display technologies today.

At present, a flexible display device is easy to break after being bent for multiple times, so that abnormal display is caused; in order to improve the bending property of the display panel, a fracture prevention design is added in the display area and the bending area; the inorganic layer is typically perforated and filled with organic material to form a foldable organic layer, but the additional anti-fracture design increases the cost of the mask, so a new display panel and a method for manufacturing the same are needed to solve the above problems.

Disclosure of Invention

An object of the present invention is to provide a display panel and a method for manufacturing the same, which can save a mask and reduce the cost of the mask.

In order to solve the above problem, an embodiment of the present invention provides a display panel defined with a display region and a non-display region, the non-display region having a bending region. Wherein the display panel includes: a substrate; a barrier layer disposed on the substrate; a buffer layer disposed on the barrier layer; an active layer disposed on the buffer layer of the display region and the bending region; an interlayer insulating layer disposed over the active layer; the first groove penetrates into the blocking layer from the surface, away from the substrate, of the interlayer insulating layer of the display area; the second groove is arranged in the bending area and comprises a first groove body and a second groove body; the first groove body penetrates into the active layer from the surface, far away from the substrate, of the interlayer insulating layer; the second groove body penetrates into the base plate from the surface, close to the base plate, of the first groove body.

Further, the display panel further comprises: a first gate insulating layer disposed on the active layer; a first gate layer disposed on the first gate insulating layer; a second gate insulating layer disposed on the first gate layer; a second gate layer interposed between the second gate insulating layer and the interlayer insulating layer.

Further, the display panel further comprises: the first organic layer is formed by filling an organic material in the first groove; and the second organic layer is formed by filling organic materials in the second groove.

Further, the display panel further comprises: a third groove and a fourth groove penetrating from the surface of the interlayer insulating layer of the display region, which is away from the substrate, to the surface of the active layer, which is away from the substrate; the source drain layer is arranged on the interlayer insulating layer; the source drain layer comprises a source electrode and a drain electrode, and the source electrode and the drain electrode are connected to the active layer through a third groove and a fourth groove respectively.

Further, the display panel further comprises: the flat layer is arranged on the source drain layer; the pixel definition layer is arranged on the flat layer and is provided with an opening; an anode disposed in the opening in the pixel defining layer and connected to the source drain layer; and the supporting column is arranged on the pixel definition layer.

Another embodiment of the present invention also provides a method for manufacturing a display panel according to the present invention, including the steps of: s1, providing a substrate, defining a display area and a non-display area on the display panel to be prepared, wherein the non-display area is provided with a bending area; s2, sequentially preparing a barrier layer, a buffer layer, an active layer and an interlayer insulating layer on the substrate, wherein the active layer is arranged on the buffer layer of the display area and the bending area; s3, providing a first photo-mask, and simultaneously forming a first trench in the display region from a surface of the interlayer insulating layer of the display region away from the substrate to the barrier layer and a first trench in the active layer from a surface of the interlayer insulating layer of the bending region away from the substrate to the second trench in the active layer; and S4, providing a second light shield, and forming a second groove body penetrating from the surface of the first groove body close to the substrate to a second groove in the substrate in the bending area through the second light shield.

Further, S2 further includes: preparing a first gate insulating layer on the active layer; preparing a first gate layer on the first gate insulating layer; preparing a second gate insulating layer on the first gate layer; preparing a second gate layer between the second gate insulating layer and the interlayer insulating layer.

Further, the preparation method of the display panel further comprises the following steps: s5, filling organic materials into the first and second grooves to form a first organic layer and a second organic layer, respectively.

Further, wherein in S4: and simultaneously forming a third groove and a fourth groove which penetrate from the surface of the interlayer insulating layer far away from the substrate to the surface of the active layer far away from the substrate in the display area through a second photomask.

Further, the preparation method of the display panel further comprises the following steps: and S6, preparing a source drain layer on the interlayer insulating layer, wherein the source drain layer comprises a source electrode and a drain electrode, and the source electrode and the drain electrode are respectively connected to the active layer through a third groove and a fourth groove.

The invention has the advantages that: the invention relates to a display panel and a preparation method thereof. According to the invention, the first groove which penetrates from the surface, far away from the substrate, of the interlayer insulating layer of the display area to the barrier layer and the first groove which penetrates from the surface, far away from the substrate, of the interlayer insulating layer of the bending area to the second groove in the active layer are formed in the display area through the first photomask, so that the photomask cost is saved. On the other hand, the active layer of the bending area is reserved, so that the etching time of the first groove body is prolonged, and the first photomask can meet the requirements of the depth of the first groove and the depth of the first groove body of the second groove at the same time.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.

FIG. 1 is a schematic structural diagram of a display panel according to the present invention.

FIG. 2 is a first schematic view of a display panel according to the present invention.

FIG. 3 is a second schematic view of the preparation of the display panel of the present invention.

FIG. 4 is a third schematic view of the preparation of the display panel of the present invention.

FIG. 5 is a fourth schematic view of the fabrication of a display panel according to the present invention.

The components in the figure are identified as follows:

100. display panel 101, display area

102. Non-display area

1. Substrate 2, barrier layer

3. Buffer layer 4, active layer

5. First gate insulating layer 6, first gate layer

7. Second gate insulating layer 8, second gate layer

9. Interlayer insulating layer 10, first groove

11. Second recess 12, first organic layer

13. Second organic layer 14, third recess

15. Fourth recess 16, source drain layer

17. Planarization layer 18, pixel definition layer

19. Anode 20, support column

111. First tank 112 and second tank

Detailed Description

The following detailed description of the preferred embodiments of the present invention is provided to enable those skilled in the art to make and use the present invention in a complete manner, and is provided for illustration of the technical disclosure of the present invention so that the technical disclosure of the present invention will be more clearly understood and appreciated by those skilled in the art how to implement the present invention. The present invention may, however, be embodied in many different forms of embodiment, and the scope of the present invention should not be construed as limited to the embodiment set forth herein, but rather construed as being limited only by the following description of the embodiment.

The directional terms used in the present invention, such as "up", "down", "front", "back", "left", "right", "inner", "outer", "side", etc., are only directions in the drawings, and are used for explaining and explaining the present invention, but not for limiting the scope of the present invention.

In the drawings, structurally identical elements are represented by like reference numerals, and structurally or functionally similar elements are represented by like reference numerals throughout the several views. In addition, the size and thickness of each component shown in the drawings are arbitrarily illustrated for convenience of understanding and description, and the present invention is not limited to the size and thickness of each component.

When certain components are described as being "on" another component, the component can be directly on the other component; there may also be an intermediate component disposed on the intermediate component and the intermediate component disposed on another component. When an element is referred to as being "mounted to" or "connected to" another element, they are directly "mounted to" or "connected to" the other element or "mounted to" or "connected to" the other element through an intermediate element.

Example 1

As shown in fig. 1, a display panel 100 is defined with a display area 101 and a non-display area 102, wherein the non-display area 102 has a bending area. Wherein the display panel 100 includes: the semiconductor device comprises a substrate 1, a barrier layer 2, a buffer layer 3, an active layer 4, a first gate insulating layer 5, a first gate layer 6, a second gate insulating layer 7, a second gate layer 8 and an interlayer insulating layer 9.

As shown in fig. 1, the substrate 1 may include a first substrate, an intermediate layer, and a second substrate. The first substrate and the second substrate are made of polyimide, and therefore the first substrate and the second substrate are good in flexibility. The intermediate layer can be made of SiO2 or SiNx, or can be a laminated structure of SiO2 and SiNx, so that the prepared intermediate layer is good in water and oxygen resistance, and the tolerance between the first substrate and the second substrate can be improved.

As shown in fig. 1, the barrier layer 2 is disposed on the substrate 1 and mainly plays a role of blocking water and oxygen.

As shown in fig. 1, the buffer layer 3 is disposed on the barrier layer 2, and mainly serves as a buffer and a protection.

As shown in fig. 1, the active layer 4 is disposed on the display region 101 and the buffer layer 3 of the bending region. The active layer 4 includes a body portion 41 and two side portions 42. Specifically, in the embodiment, mainly, the poly-silicidation of the active layer 4 is implemented by using an excimer laser crystallization technology, then the active layer 4 is patterned through a PR mask to form the main body portion 41 and the two side portions 42, and finally the two side portions 42 of the active layer 4 are ion-doped through a PR mask to form the P-type semiconductor. Because the depth of the first groove 10 is greater than the thickness of the first groove body 111 of the second groove 11, and the etching rate of the active layer 4 is slower than that of the film layer arranged thereon, the active layer 4 is arranged on the buffer layer 3 of the bending region, so that the first photomask can meet the requirements of the depth of the first groove 10 and the depth of the first groove body 111 of the second groove 11 at the same time.

As shown in fig. 1, wherein the first gate insulating layer 5 is disposed on the active layer 4; the first gate layer 6 is disposed on the first gate insulating layer 5; the second gate insulating layer 7 is disposed on the first gate layer 6; the second gate layer 8 is disposed on the second gate insulating layer 7; wherein the interlayer insulating layer 9 is disposed on the second gate layer 8.

As shown in fig. 1, the display panel 100 further includes a first groove 10 penetrating into the barrier layer 2 from a surface of the interlayer insulating layer 9 of the display region 101 away from the substrate 1.

As shown in fig. 1, the display panel 100 further includes a second groove 11 disposed in the bending region, and the second groove 11 includes a first groove 111 and a second groove 112. Wherein the first groove 111 penetrates into the active layer 2 from the surface of the interlayer insulating layer 9 away from the substrate 1; the second slot 112 penetrates into the base plate 1 from the surface of the first slot 111 close to the base plate 1.

The first grooves 111 of the first groove 10 and the second groove 11 are formed at the same time by using a first photomask, so that one photomask can be saved, and the photomask cost can be saved.

As shown in fig. 1, the display panel 100 further includes a first organic layer 12 formed by filling an organic material in the first groove 10. The first organic layer 12 is arranged in the display area 101 and is mainly used for releasing an internal force generated when the display panel 100 is bent, so that the display panel 100 is prevented from being broken after being bent for multiple times, and abnormal display is avoided; the bending performance of the display panel 100 is improved.

As shown in fig. 1, the display panel 100 further includes a second organic layer 13 formed by filling an organic material in the second groove 11. The second organic layer 13 is arranged in the bending region and is mainly used for releasing an internal force generated when the display panel 100 is bent, so that the display panel 100 is prevented from being broken after being bent for multiple times, and abnormal display is avoided; the bending performance of the display panel 100 is improved.

As shown in fig. 1, the display panel 100 further includes a third groove 14 and a fourth groove 15, which penetrate from the surface of the interlayer insulating layer 9 of the display region 101 away from the substrate 1 to the surface of the active layer 2 away from the substrate 1.

As shown in fig. 1, the display panel 100 further includes a source/drain layer 16 disposed on the interlayer insulating layer 9. Which is also disposed on the first organic layer 12 and the second organic layer 13. Wherein the source drain layer 16 comprises a source electrode and a drain electrode, which are respectively connected to the active layer 4 through a third groove 14 and a fourth groove 15, in particular, to two side portions 42 of the active layer 4. Thereby, an electrical connection between the source drain layer 16 and the active layer 4 can be realized.

As shown in fig. 1, the display panel 100 further includes: a planarization layer 17, a pixel definition layer 18, an anode electrode 19, and support posts 20. Wherein the planarization layer 17 is disposed on the source drain layer 16; the pixel defining layer 18 is disposed on the flat layer 17, and the pixel defining layer 18 has an opening therein; the anode electrode 19 is disposed in the opening in the pixel defining layer 18 and connected to the source drain layer 16; the supporting posts 20 are disposed on the pixel defining layer 18.

Example 2

The present embodiment provides a manufacturing method of the display panel 100 according to the present invention.

As shown in fig. 2, S1, providing a substrate 1, defining a display area 101 and a non-display area 102 on a display panel 100 to be prepared, where the non-display area 102 has a bending area; and S2, sequentially preparing a barrier layer 2, a buffer layer 3, an active layer 4 and an interlayer insulating layer 9 on the substrate 1.

As shown in fig. 2, the active layer 4 is disposed on the display region 101 and the buffer layer 3 of the bending region. Because the depth of the first groove 10 is greater than the thickness of the first groove body 111 of the second groove 11, and the etching rate of the active layer 4 is slower than that of the film layer arranged on the active layer, the active layer 4 is arranged on the buffer layer 3 of the bending region, so that the first photomask can meet the requirements of the depth of the first groove 10 and the depth of the first groove body 111 of the second groove 11 at the same time.

As shown in fig. 2, S2 further includes: preparing a first gate insulating layer 5 on the active layer 4; preparing a first gate layer 6 on the first gate insulating layer 5; preparing a second gate insulating layer 7 on the first gate layer 6; a second gate electrode layer 8 is prepared between the second gate insulating layer 7 and the interlayer insulating layer 9.

As shown in fig. 3, S3, a first photo mask is provided, and a first groove 111 penetrating from the surface of the interlayer insulating layer 9 of the display region 101 away from the substrate 1 to the first groove 10 in the barrier layer 2 and penetrating from the surface of the interlayer insulating layer 9 of the bending region away from the substrate 1 to the second groove 11 in the active layer 2 are simultaneously formed in the display region 101. Therefore, one photomask is saved, and the effect of saving the photomask cost is achieved.

As shown in fig. 4, S4, a second light cover is provided, and a second groove 112 penetrating from the surface of the first groove 111 close to the substrate 1 to the second groove 11 in the substrate 1 is formed in the bending region 102 by the second light cover.

As shown in fig. 4, wherein in S4: a third groove 14 and a fourth groove 15 penetrating from the surface of the interlayer insulating layer 9 away from the substrate 1 to the surface of the active layer 2 away from the substrate 1 are simultaneously formed in the display region 101 by a second photo-mask. The third groove 14 and the fourth groove 15 and the second groove body 112 of the second groove 11 are formed simultaneously by the same second photomask, so that one photomask can be saved, and the photomask cost can be saved.

As shown in fig. 5, S5, organic materials are filled in the first groove 10 and the second groove 12 to form a first organic layer 12 and a second organic layer 13, respectively. Therefore, the internal force generated when the display panel 100 is bent can be released, and the display panel 100 is prevented from being broken after being bent for multiple times to cause abnormal display; the bending performance of the display panel 100 is improved.

As shown in fig. 1, S6, preparing a source drain layer 16 on the interlayer insulating layer 9, where the source drain layer 16 includes a source and a drain, and the source and the drain are connected to the active layer 4 through a third groove 14 and a fourth groove 15, respectively.

The display panel and the method for manufacturing the same provided by the present invention are described in detail above. It should be understood that the exemplary embodiments described herein should be considered merely illustrative for facilitating understanding of the method of the present invention and its core ideas, and not restrictive. Descriptions of features or aspects in each exemplary embodiment should generally be considered as applicable to similar features or aspects in other exemplary embodiments. While the present invention has been described with reference to exemplary embodiments, various changes and modifications may be suggested to one skilled in the art. It is intended that the present invention cover the modifications and variations of this invention provided they come within the spirit and scope of the appended claims and their equivalents and improvements made thereto.

Claims

1. A display panel defined with a display region and a non-display region, the non-display region having a bend region, comprising:

a substrate;

a barrier layer disposed on the substrate;

a buffer layer disposed on the barrier layer;

an active layer disposed on the buffer layer of the display region and the bending region;

an interlayer insulating layer disposed over the active layer;

the first groove penetrates into the blocking layer from the surface, away from the substrate, of the interlayer insulating layer of the display area;

the second groove is arranged in the bending area and comprises a first groove body and a second groove body;

the first groove body penetrates into the active layer from the surface, far away from the substrate, of the interlayer insulating layer;

the second groove body penetrates into the base plate from the surface, close to the base plate, of the first groove body;

the active layer located in the bending region is used for prolonging the etching time of the first groove body.

2. The display panel according to claim 1, further comprising:

a first gate insulating layer disposed on the active layer;

a first gate layer disposed on the first gate insulating layer;

a second gate insulating layer disposed on the first gate layer;

a second gate layer interposed between the second gate insulating layer and the interlayer insulating layer.

3. The display panel according to claim 1, further comprising:

the first organic layer is formed by filling an organic material in the first groove;

and the second organic layer is formed by filling an organic material in the second groove.

4. The display panel according to claim 1, further comprising:

a third groove and a fourth groove penetrating from the surface of the interlayer insulating layer of the display region, which is away from the substrate, to the surface of the active layer, which is away from the substrate;

the source drain layer is arranged on the interlayer insulating layer;

the source drain layer comprises a source electrode and a drain electrode which pass through a third groove and a second groove respectively

The fourth groove is connected to the active layer.

5. The display panel according to claim 4, further comprising:

the flat layer is arranged on the source drain layer;

the pixel definition layer is arranged on the flat layer and is provided with an opening;

an anode disposed in the opening in the pixel defining layer and connected to the source drain layer;

and the supporting column is arranged on the pixel definition layer.

6. A method for manufacturing the display panel according to claim 1, comprising the steps of:

s1, providing a substrate, defining a display area and a non-display area on the display panel to be prepared, wherein the non-display area is provided with a bending area;

s2, sequentially preparing a barrier layer, a buffer layer, an active layer and an interlayer insulating layer on the substrate, wherein the active layer is arranged on the buffer layer of the display area and the bending area, and the active layer positioned in the bending area is used for prolonging the etching time of the first groove body;

s3, providing a first photo-mask, and simultaneously forming a first trench in the display region from a surface of the interlayer insulating layer of the display region away from the substrate to the barrier layer and a first trench in the active layer from a surface of the interlayer insulating layer of the bending region away from the substrate to the second trench in the active layer;

and S4, providing a second light shield, and forming a second groove body penetrating from the surface of the first groove body close to the substrate to a second groove in the substrate in the bending area through the second light shield.

7. The method for manufacturing a display panel according to claim 6, wherein S2 further includes:

preparing a first gate insulating layer on the active layer;

preparing a first gate layer on the first gate insulating layer;

preparing a second gate insulating layer on the first gate layer;

preparing a second gate layer between the second gate insulating layer and the interlayer insulating layer.

8. The method for manufacturing a display panel according to claim 6, further comprising:

s5, filling organic materials into the first and second grooves to form a first organic layer and a second organic layer, respectively.

9. The method for manufacturing a display panel according to claim 6, wherein in S4: and simultaneously forming a third groove and a fourth groove which penetrate from the surface of the interlayer insulating layer far away from the substrate to the surface of the active layer far away from the substrate in the display area through a second photomask.

10. The method for manufacturing a display panel according to claim 9, further comprising:

and S6, preparing a source drain layer on the interlayer insulating layer, wherein the source drain layer comprises a source electrode and a drain electrode, and the source electrode and the drain electrode are respectively connected to the active layer through a third groove and a fourth groove.