CN111065941A - 制造衍射光栅的方法 - Google Patents

制造衍射光栅的方法 Download PDF

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Publication number
CN111065941A
CN111065941A CN201880038472.2A CN201880038472A CN111065941A CN 111065941 A CN111065941 A CN 111065941A CN 201880038472 A CN201880038472 A CN 201880038472A CN 111065941 A CN111065941 A CN 111065941A
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CN
China
Prior art keywords
substrate
grating
grating material
final
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201880038472.2A
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English (en)
Chinese (zh)
Inventor
J·奥尔科宁
I·瓦蒂亚宁
J·拉霍迈基
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dispelix Oy
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Dispelix Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dispelix Oy filed Critical Dispelix Oy
Priority to CN202510247189.2A priority Critical patent/CN119986883A/zh
Publication of CN111065941A publication Critical patent/CN111065941A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0005—Separation of the coating from the substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/017—Head mounted
    • G02B27/0172—Head mounted characterised by optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01—Head-up displays
    • G02B27/0101—Head-up displays characterised by optical features
    • G02B2027/0123—Head-up displays characterised by optical features comprising devices increasing the field of view
    • G02B2027/0125—Field-of-view increase by wavefront division
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/34—Optical coupling means utilising prism or grating

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
CN201880038472.2A 2017-06-02 2018-05-18 制造衍射光栅的方法 Pending CN111065941A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202510247189.2A CN119986883A (zh) 2017-06-02 2018-05-18 制造衍射光栅的方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20175507A FI127799B (en) 2017-06-02 2017-06-02 Process for producing a diffraction grating
FI20175507 2017-06-02
PCT/FI2018/050369 WO2018220264A1 (en) 2017-06-02 2018-05-18 Method of manufacturing a diffractive grating

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN202510247189.2A Division CN119986883A (zh) 2017-06-02 2018-05-18 制造衍射光栅的方法

Publications (1)

Publication Number Publication Date
CN111065941A true CN111065941A (zh) 2020-04-24

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
CN202510247189.2A Pending CN119986883A (zh) 2017-06-02 2018-05-18 制造衍射光栅的方法
CN201880038472.2A Pending CN111065941A (zh) 2017-06-02 2018-05-18 制造衍射光栅的方法

Family Applications Before (1)

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CN202510247189.2A Pending CN119986883A (zh) 2017-06-02 2018-05-18 制造衍射光栅的方法

Country Status (6)

Country Link
US (1) US11194081B2 (enExample)
EP (1) EP3631534B1 (enExample)
JP (1) JP2020522021A (enExample)
CN (2) CN119986883A (enExample)
FI (1) FI127799B (enExample)
WO (1) WO2018220264A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115421234A (zh) * 2022-11-04 2022-12-02 北京驭光科技发展有限公司 衍射光波导及其光栅结构以及显示设备

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EP3877454A4 (en) * 2018-11-09 2022-11-16 3M Innovative Properties Company NANOSTRUCTURED OPTICAL FILMS AND INTERMEDIATE PRODUCTS
WO2020229563A2 (en) * 2019-05-14 2020-11-19 Nil Technology Aps Seed structures for structured coatings for optical and other devices
FI131825B1 (en) * 2020-06-17 2025-12-18 Dispelix Oy Method for producing an optical element, an optical element, and apparatus for producing an optical element
EP4200657A1 (en) * 2020-09-08 2023-06-28 Sony Group Corporation Waveguide with diffraction grating, head mounted device comprising diffraction grating and template for imprinting optical gratings
US11867931B2 (en) 2020-09-23 2024-01-09 Applied Materials, Inc. Fabrication of diffractive optic element having a variable refractive index profile by inkjet printing deposition
EP4336229A1 (en) * 2022-08-03 2024-03-13 Himax Technologies Limited Optical element and method for manufacturing optical element
US11926113B2 (en) * 2022-08-03 2024-03-12 Himax Technologies Limited Optical element and method for manufacturing optical element
CN116609871B (zh) * 2023-07-19 2023-10-03 上海鲲游科技有限公司 一种不等高直齿光栅的制作方法

Citations (10)

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US4850681A (en) * 1986-04-07 1989-07-25 Canon Kabushiki Kaisha Optical modulation device
JPH0250109A (ja) * 1988-05-09 1990-02-20 Ricoh Co Ltd 入射カプラ付き光導波路装置
US5738825A (en) * 1993-07-20 1998-04-14 Balzers Aktiengesellschaft Optical biosensor matrix
US20050057789A1 (en) * 2003-09-17 2005-03-17 Hiroshi Funada Method for forming fine concavo-convex patterns, method for producing optical diffraction structure, and method for copying optical diffraction structure
US20060029889A1 (en) * 2004-08-06 2006-02-09 Wang Tak K Method to fabricate diffractive optics
JP2007328096A (ja) * 2006-06-07 2007-12-20 Ricoh Co Ltd 回折光学素子とその作製方法および光学モジュール
US20080219616A1 (en) * 2005-10-12 2008-09-11 Koninklijke Philips Electronics, N.V. All Polymer Optical Waveguide Sensor
US20100240840A1 (en) * 2006-06-14 2010-09-23 Mariko Toyama Resin Composition and multilayer optical member using the same
CN103328176A (zh) * 2011-01-14 2013-09-25 吉坤日矿日石能源株式会社 微细图案转印用模具的制造方法及使用该模具的衍射光栅的制造方法、以及具有该衍射光栅的有机el元件的制造方法
CN105209244A (zh) * 2013-05-17 2015-12-30 道康宁公司 制备制品的方法以及由该方法制备的制品

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DE4211235C2 (de) * 1992-04-03 2003-04-17 Gao Ges Automation Org Verfahren und Vorrichtung zur Herstellung metallischer Flächenelemente auf Substraten und deren Verwendung
JP3996391B2 (ja) * 2001-12-28 2007-10-24 日置電機株式会社 微細周期構造体の製造方法
GB0213722D0 (en) * 2002-06-14 2002-07-24 Suisse Electronique Microtech Micro electrical mechanical systems
EP1942364A1 (en) * 2005-09-14 2008-07-09 Mirage Innovations Ltd. Diffractive optical relay and method for manufacturing the same
JP4999556B2 (ja) * 2007-05-31 2012-08-15 リコー光学株式会社 表面に微細凹凸形状をもつ光学素子の製造方法
JP4968234B2 (ja) * 2008-10-21 2012-07-04 セイコーエプソン株式会社 光学素子及び表示装置
JP5402317B2 (ja) 2009-06-29 2014-01-29 セイコーエプソン株式会社 偏光素子および偏光素子の製造方法、投写型表示装置、液晶装置、電子機器
CA2830078C (en) * 2011-03-28 2016-05-03 Jx Nippon Oil & Energy Corporation Method for manufacturing substrate having textured structure and method for manufacturing organic el elements using same
AU2015300184A1 (en) * 2014-08-04 2017-03-02 Jx Nippon Oil & Energy Corporation Method for manufacturing member having irregular pattern
US10007117B2 (en) * 2015-09-10 2018-06-26 Vuzix Corporation Imaging light guide with reflective turning array

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4850681A (en) * 1986-04-07 1989-07-25 Canon Kabushiki Kaisha Optical modulation device
JPH0250109A (ja) * 1988-05-09 1990-02-20 Ricoh Co Ltd 入射カプラ付き光導波路装置
US5738825A (en) * 1993-07-20 1998-04-14 Balzers Aktiengesellschaft Optical biosensor matrix
US20050057789A1 (en) * 2003-09-17 2005-03-17 Hiroshi Funada Method for forming fine concavo-convex patterns, method for producing optical diffraction structure, and method for copying optical diffraction structure
US20060029889A1 (en) * 2004-08-06 2006-02-09 Wang Tak K Method to fabricate diffractive optics
US20080219616A1 (en) * 2005-10-12 2008-09-11 Koninklijke Philips Electronics, N.V. All Polymer Optical Waveguide Sensor
JP2007328096A (ja) * 2006-06-07 2007-12-20 Ricoh Co Ltd 回折光学素子とその作製方法および光学モジュール
US20100240840A1 (en) * 2006-06-14 2010-09-23 Mariko Toyama Resin Composition and multilayer optical member using the same
CN103328176A (zh) * 2011-01-14 2013-09-25 吉坤日矿日石能源株式会社 微细图案转印用模具的制造方法及使用该模具的衍射光栅的制造方法、以及具有该衍射光栅的有机el元件的制造方法
US20160161647A1 (en) * 2011-01-14 2016-06-09 Jx Nippon Oil & Energy Corporation Method for producing mold for minute pattern transfer, method for producing diffraction grating using the same, and method for producing organic el element including the diffraction grating
CN105209244A (zh) * 2013-05-17 2015-12-30 道康宁公司 制备制品的方法以及由该方法制备的制品

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115421234A (zh) * 2022-11-04 2022-12-02 北京驭光科技发展有限公司 衍射光波导及其光栅结构以及显示设备
US11846785B1 (en) 2022-11-04 2023-12-19 Jiaxing Uphoton Optoelectronics Technology Co., Ltd. Diffraction optical waveguide and grating structure thereof, and display device

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Publication number Publication date
WO2018220264A1 (en) 2018-12-06
US11194081B2 (en) 2021-12-07
EP3631534A4 (en) 2021-03-10
EP3631534B1 (en) 2023-08-09
US20210157041A1 (en) 2021-05-27
EP3631534C0 (en) 2023-08-09
CN119986883A (zh) 2025-05-13
EP3631534A1 (en) 2020-04-08
JP2020522021A (ja) 2020-07-27
FI20175507A1 (en) 2018-12-03
FI127799B (en) 2019-02-28

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Application publication date: 20200424