CN111041441A - Uniform coating method, coating equipment and computer-readable storage medium - Google Patents
Uniform coating method, coating equipment and computer-readable storage medium Download PDFInfo
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- CN111041441A CN111041441A CN201911383950.6A CN201911383950A CN111041441A CN 111041441 A CN111041441 A CN 111041441A CN 201911383950 A CN201911383950 A CN 201911383950A CN 111041441 A CN111041441 A CN 111041441A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
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Abstract
The invention discloses a uniform coating method, coating equipment and a computer readable storage medium, wherein the uniform coating method comprises the following steps: (1) determining a first deposition function distribution characteristic of a deposition source according to the surface shape of the optical element to be deposited; (2) determining the moving track of the deposition source according to the surface shape of the optical element to be deposited and the first deposition function distribution characteristic of the deposition source; (3) obtaining a second deposition function distribution characteristic of the deposition source; (4) solving the moving state of the deposition source in the moving process according to the second deposition function distribution characteristic of the deposition source; (5) performing virtual coating by adopting the solved moving state of the deposition source in the moving process to obtain a virtual coating result; and verifying the virtual film coating result and the actual deposition result of the deposition source. The deposition source can move, the moving track and the moving state of the deposition source can be adjusted, the efficiency is high, and the adaptability is good. The invention is applied to the technical field of optical element film preparation.
Description
Technical Field
The invention relates to the technical field of optical element film preparation, in particular to a uniform film coating method, film coating equipment and a computer readable storage medium.
Background
The uniformity of the deposition distribution of the optical thin film is one of the important indexes for preparing the thin film of the optical element with large aperture, and becomes an important problem to be faced by optical thin film workers in the process of increasing and increasing the manufacturing demand of the optical element with large aperture. The uneven distribution of the optical thin film deposition can cause the optical characteristics of the optical thin film system to be seriously affected and damaged, which can cause polarization aberration and wave surface distortion, and can cause the surface shape of the high-precision optical element to be affected, thereby affecting the performance of the whole optical system. Therefore, when manufacturing a high-performance large-aperture optical thin film device, it is important to strictly control the thickness distribution uniformity of the thin film deposited on the optical device. With the increasing size of optical elements and the appearance of complex optical elements such as free-form surfaces, off-axis aspheric surfaces, and common-body optical elements, the control of the deposition distribution uniformity becomes a significant challenge that large-aperture optical thin film workers have to face.
The development of optical coating technology has kept the exploration of the deposition method of high-uniformity optical film by optical film workers. The methods for controlling the uniformity of film deposition on an optical element can be mainly summarized as the following three methods: 1. the spatial distribution of the optical film deposition uniformity is closely related to the spatial relative position of the deposition source and the optical element to be deposited, so that the number and the position of the deposition sources in the coating equipment and the spatial relative position of the optical element to be deposited are optimally designed at the initial manufacturing stage of the coating equipment, so that the optimal deposition uniformity is realized, and even a plurality of large-caliber optical elements adopt a design method of special coating equipment; 2. integration of the optical element to be deposited on different deposition areas in space is realized in a mode of revolution, autorotation or combination of revolution and autorotation, and a common method for waiting for the rotation of the optical element to be deposited comprises plane rotation and planetary rotation; 3. the uniformity correction plates with different shapes are used for realizing the redistribution of the deposition uniformity distribution of the deposition source in the space, and the uniformity baffles with different shapes are designed for different optical elements to be deposited, so that the optimization of the deposition uniformity can be realized.
The conventional method for optimizing the deposition uniformity of the optical thin film has the problems of poor universality, long period and the like in the face of increasing aperture of optical elements and increasingly complex design of the optical elements. Therefore, for future larger-scale and more complex-and-diverse optical element designs, a more efficient and adaptive deposition uniformity adjustment method is needed to meet the challenges of more complex optical thin film deposition.
Disclosure of Invention
Technical problem to be solved
A deposition source is movable, the movement track and the movement state of the deposition source can be adjusted, an element to be deposited can rotate or be fixed, the efficiency is high, and the adaptability is good.
(II) technical scheme
In order to solve the technical problem, the invention provides a uniform coating method, which comprises the following steps:
(1) determining a first deposition function distribution characteristic of a deposition source according to the surface shape of the optical element to be deposited;
(2) determining the moving track of the deposition source according to the surface shape of the optical element to be deposited and the first deposition function distribution characteristic of the deposition source;
(3) obtaining a second deposition function distribution characteristic of the deposition source according to the change of the relative position relation between the deposition source and the optical element to be deposited when the deposition source moves along the moving track;
(4) solving the moving state of the deposition source in the moving process according to the second deposition function distribution characteristic of the deposition source;
(5) performing virtual coating by adopting the solved moving state of the deposition source in the moving process to obtain a virtual coating result; after the deposition source is deposited, verifying the virtual film coating result and the actual deposition result of the deposition source;
and (4) if the virtual film coating result is not consistent with the actual deposition result, after the deposition source is adjusted, repeating the steps (1) to (4) until the virtual film coating result is consistent with the actual deposition result.
In a further improvement, in the step (5), the deposition source moves during deposition, and the moving track of the deposition source is a straight moving track or a reciprocating moving track or a track moving along a grating or a ross moving track.
In a further development, the trajectory of the movement of the deposition source during the deposition process intersects or covers a substantial area of the optical element to be deposited.
In a further improvement, the deposition source moves at a constant speed or at variable speeds along the moving track.
In a further improvement, in the step (5), before the deposition source deposits, the movement state and the movement track of the deposition source are adjusted by planning the movement state and the movement track of the deposition source.
And further improving, calculating according to the surface shapes of the different optical elements to be deposited and the deposition condition of the deposition source, and solving to obtain the movement mode of the deposition source so as to plan the movement state and the movement track of the deposition source.
The invention also discloses a coating device, which adopts the following technical scheme:
a plating apparatus comprising:
the first deposition function module is used for determining a first deposition function distribution characteristic of a deposition source according to the surface shape of the optical element to be deposited;
the moving track module is used for determining the moving track of the deposition source according to the surface shape of the optical element to be deposited and the first deposition function distribution characteristic of the deposition source;
the second deposition function module is used for obtaining a second deposition function distribution characteristic of the deposition source according to the change of the relative position relation between the deposition source and the optical element to be deposited when the deposition source moves along the moving track;
the moving state module is used for solving a moving state of the deposition source in the moving process according to the second deposition function distribution characteristic of the deposition source;
the verification module is used for performing virtual film coating by adopting the solved moving state of the deposition source in the moving process to obtain a virtual film coating result; after the deposition source is deposited, verifying the virtual film coating result and the actual deposition result of the deposition source;
if the virtual film coating result is not consistent with the actual deposition result, after the deposition source is adjusted, the processing from the first deposition function module to the verification module is repeated until the virtual film coating result is consistent with the actual deposition result.
In a further improvement, the deposition source is a magnetron sputtering system or an ion beam sputtering system.
In a further improvement, the surface of the optical element to be deposited is a central porous or central non-porous or off-axis aspheric or common optical element.
The invention also discloses a computer readable storage medium, which adopts the following technical scheme:
a computer-readable storage medium, which stores a computer program that, when executed by a processor, implements the steps of the above-described uniform plating method.
(III) advantageous effects
The invention provides a method capable of uniformly coating, which can effectively optimize the deposition uniformity of deposition optical elements with different complicated calibers and can effectively realize uniform film deposition for optical elements with holes in the center, no holes in the center, off-axis aspheric surfaces, common optical elements and the like.
The uniform film coating method provided by the invention is characterized in that the deposition residence time of the deposition source at different positions in the moving track of the deposition source is obtained by planning the moving track and the moving state of the deposition source relative to the optical element to be deposited in the optical film deposition process, namely calculating and optimizing the position relation change between the deposition source and the optical element to be deposited, so as to realize the adjustment of the deposition uniformity. The method provided by the invention has the following advantages: the deposition source can move, the moving track and the moving state of the deposition source can be adjusted, the element to be deposited can rotate or be fixed, the efficiency is high, and the adaptability is good.
The coating apparatus and the computer-readable storage medium proposed by the present invention also have the above-described advantages.
Drawings
FIG. 1 is a flow chart of the uniform coating method of the present invention;
FIG. 2 is a schematic view of a uniform coating method in example 1 of the present invention;
fig. 3 is a schematic view of a uniform plating method in example 2 of the present invention.
Detailed Description
The following detailed description of embodiments of the present invention is provided in connection with the accompanying drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
Example 1
A uniform coating method comprises the following steps:
(1) determining a first deposition function distribution characteristic of a deposition source according to the surface shape of the optical element to be deposited;
(2) determining the moving track of the deposition source according to the surface shape of the optical element to be deposited and the first deposition function distribution characteristic of the deposition source;
(3) obtaining a second deposition function distribution characteristic of the deposition source according to the change of the relative position relation between the deposition source and the optical element to be deposited when the deposition source moves along the moving track;
(4) solving the moving state of the deposition source in the moving process according to the second deposition function distribution characteristic of the deposition source;
(5) performing virtual coating by adopting the solved moving state of the deposition source in the moving process to obtain a virtual coating result; after the deposition source is deposited, verifying the virtual film coating result and the actual deposition result of the deposition source;
and (4) if the virtual film coating result is not consistent with the actual deposition result, after the deposition source is adjusted, repeating the steps (1) to (4) until the virtual film coating result is consistent with the actual deposition result. Preferably, the deposition source moves in the deposition process, and the movement track of the deposition source is a linear movement track or a reciprocating movement track or a track moving along a grating or a ross movement track; further preferably, the movement track of the deposition source penetrates or covers most of the area of the optical element to be deposited during the deposition process; further preferably, the deposition source moves at a constant speed or at a variable speed along the movement track. Further preferably, before the deposition of the deposition source, the movement state and the movement track of the deposition source are adjusted by planning the movement state and the movement track of the deposition source; specifically, the calculation is performed according to the surface shapes of the different optical elements to be deposited and the deposition conditions of the deposition sources, and the movement mode of the deposition sources is obtained through solving so as to plan the movement state and the movement track of the deposition sources.
The embodiment also discloses a coating device, which adopts the following technical scheme:
a plating apparatus comprising:
the first deposition function module is used for determining a first deposition function distribution characteristic of a deposition source according to the surface shape of the optical element to be deposited; the deposition source is a magnetron sputtering system or an ion beam sputtering system.
The moving track module is used for determining the moving track of the deposition source according to the surface shape of the optical element to be deposited and the first deposition function distribution characteristic of the deposition source; the surface of the optical element to be deposited is an optical element with a hole at the center, or without a hole at the center, or an off-axis aspheric surface or a common body.
The second deposition function module is used for obtaining a second deposition function distribution characteristic of the deposition source according to the change of the relative position relation between the deposition source and the optical element to be deposited when the deposition source moves along the moving track;
the moving state module is used for solving a moving state of the deposition source in the moving process according to the second deposition function distribution characteristic of the deposition source;
the verification module is used for performing virtual film coating by adopting the solved moving state of the deposition source in the moving process to obtain a virtual film coating result; after the deposition source is deposited, verifying the virtual film coating result and the actual deposition result of the deposition source;
if the virtual film coating result is not consistent with the actual deposition result, after the deposition source is adjusted, the processing from the first deposition function module to the verification module is repeated until the virtual film coating result is consistent with the actual deposition result.
The embodiment also discloses a computer readable storage medium, which adopts the following technical scheme:
a computer-readable storage medium, which stores a computer program that, when executed by a processor, implements the steps of the above-described uniform plating method.
The specific implementation manner of this embodiment is as follows:
referring to fig. 1 to 2, a surface of the optical element a to be deposited is a large-caliber spherical surface with no hole at the center, and the specific steps are as follows:
(1) determining to use a rectangular magnetron sputtering system B as a deposition source according to the surface shape characteristic-center imperforate large-caliber spherical surface of the optical element to be deposited, and analyzing the distribution characteristic of a first deposition function of the deposition source of the rectangular magnetron sputtering system B through experiments and calculation;
(2) because the optical element to be deposited is rotationally symmetrical, the optical element to be deposited performs autorotation C in the deposition process in the deposition method, the deposition source can make linear movement D along the central direction passing through the optical element to be deposited, and the whole movement track penetrates through the optical element to be deposited;
(3) obtaining a second deposition function distribution characteristic of the deposition source of the rectangular magnetron sputtering system B on the optical element A to be deposited when the deposition source is at different positions of the moving track D;
(4) according to the second deposition function distribution characteristic of the deposition source of the rectangular magnetron sputtering system B, the moving state of the deposition process of the deposition source B is solved by combining the moving track D of the deposition source and the autorotation condition C of the optical element to be deposited;
(5) performing virtual film coating by adopting the solved moving state of the deposition source to obtain a virtual film coating result, depositing the deposition source, and verifying the virtual film coating result and the actual deposition result of the deposition source;
the embodiment further comprises the following steps:
if the virtual film coating result is not matched with the actual deposition result, adjusting the deposition source, and then repeating the steps (1) to (4) until the virtual film coating result is matched with the actual deposition result;
(6) and depositing the sample A to be deposited, and finally obtaining a uniform thin film on the surface of the deposition optical element.
Example 2
Please refer to fig. 1 and fig. 3.
The schematic diagram of the deposition method is shown in fig. 3, the surface of the optical element to be deposited is a large-caliber large-off-axis aspheric surface with no hole at the center, and the specific steps are as follows:
(1) determining an ion beam sputtering system E adopting a circular sputtering ion source to be used as a deposition source according to the surface shape characteristics of the optical element to be deposited, namely a large-caliber large-off-axis-quantity aspheric surface F without a hole at the center, and analyzing the first deposition function distribution characteristic of the ion beam sputtering deposition source E through experiments and calculation;
(2) because the optical element to be deposited is non-rotationally symmetrical and has a large off-axis amount, the optical element to be deposited cannot rotate in the deposition process in the deposition method, and the deposition source can perform grating movement G along the surface of the optical element to be deposited and cover the whole surface of the optical element to be deposited;
(3) obtaining a second deposition function distribution characteristic of the ion beam sputtering system E on the optical element F to be deposited when the deposition source is at different positions of the moving track G;
(4) according to the second deposition function distribution characteristic of the deposition source of the ion beam sputtering system E, the moving state of the deposition process of the deposition source E is solved by combining the moving track G of the deposition source;
(5) performing virtual film coating by adopting the solved moving state of the deposition source to obtain a virtual film coating result, depositing the deposition source, and verifying the virtual film coating result and the actual deposition result of the deposition source;
the embodiment further comprises the following steps:
if the virtual film coating result is not matched with the actual deposition result, adjusting the deposition source, and then repeating the steps (1) to (4) until the virtual film coating result is matched with the actual deposition result;
(6) and depositing the sample F to be deposited to finally obtain a uniform thin film on the surface of the deposition optical element.
The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, several modifications and variations can be made without departing from the technical principle of the present invention, and these modifications and variations should also be regarded as the protection scope of the present invention.
Claims (10)
1. The uniform coating method is characterized by comprising the following steps:
(1) determining a first deposition function distribution characteristic of a deposition source according to the surface shape of the optical element to be deposited;
(2) determining the moving track of the deposition source according to the surface shape of the optical element to be deposited and the first deposition function distribution characteristic of the deposition source;
(3) obtaining a second deposition function distribution characteristic of the deposition source according to the change of the relative position relation between the deposition source and the optical element to be deposited when the deposition source moves along the moving track;
(4) solving the moving state of the deposition source in the moving process according to the second deposition function distribution characteristic of the deposition source;
(5) performing virtual coating by adopting the solved moving state of the deposition source in the moving process to obtain a virtual coating result; after the deposition source is deposited, verifying the virtual film coating result and the actual deposition result of the deposition source;
and (4) if the virtual film coating result is not consistent with the actual deposition result, after the deposition source is adjusted, repeating the steps (1) to (4) until the virtual film coating result is consistent with the actual deposition result.
2. The uniform coating method according to claim 1, wherein in the step (5), the deposition source moves during the deposition process, and the moving track of the deposition source is a linear moving track or a reciprocating moving track or a track moving along a grating or a Ross moving track.
3. The method according to claim 1, wherein the movement track of the deposition source penetrates or covers most of the area of the optical element to be deposited during the deposition process.
4. The method for uniformly coating according to claim 1, wherein the deposition source moves at a constant speed or at a variable speed along the movement track.
5. The uniform coating method according to claim 1, wherein in the step (5), before the deposition of the deposition source, the movement state and the movement track of the deposition source are adjusted by planning the movement state and the movement track of the deposition source.
6. The uniform coating method according to claim 5, wherein the movement mode of the deposition source is calculated and solved according to the surface shapes of the optical elements to be deposited and the deposition condition of the deposition source so as to plan the movement state and the movement track of the deposition source.
7. A plating apparatus, characterized by comprising:
the first deposition function module is used for determining a first deposition function distribution characteristic of a deposition source according to the surface shape of the optical element to be deposited;
the moving track module is used for determining the moving track of the deposition source according to the surface shape of the optical element to be deposited and the first deposition function distribution characteristic of the deposition source;
the second deposition function module is used for obtaining a second deposition function distribution characteristic of the deposition source according to the change of the relative position relation between the deposition source and the optical element to be deposited when the deposition source moves along the moving track;
the moving state module is used for solving a moving state of the deposition source in the moving process according to the second deposition function distribution characteristic of the deposition source;
the verification module is used for performing virtual film coating by adopting the solved moving state of the deposition source in the moving process to obtain a virtual film coating result; after the deposition source is deposited, verifying the virtual film coating result and the actual deposition result of the deposition source;
if the virtual film coating result is not consistent with the actual deposition result, after the deposition source is adjusted, the processing from the first deposition function module to the verification module is repeated until the virtual film coating result is consistent with the actual deposition result.
8. The plating apparatus according to claim 7, wherein the deposition source is a magnetron sputtering system or an ion beam sputtering system.
9. The plating apparatus according to claim 7, wherein the surface of the optical element to be deposited is a central holed or central holeless or off-axis aspherical or co-body optical element.
10. A computer-readable storage medium, in which a computer program is stored, which, when being executed by a processor, carries out the steps of the uniform coating method according to any one of claims 1 to 6.
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| CN201911383950.6A CN111041441B (en) | 2019-12-28 | 2019-12-28 | Uniform coating method, coating equipment and computer-readable storage medium |
| PCT/CN2020/136428 WO2021129457A1 (en) | 2019-12-28 | 2020-12-15 | Uniform coating method, coating device, and computer readable storage medium |
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| CN201911383950.6A CN111041441B (en) | 2019-12-28 | 2019-12-28 | Uniform coating method, coating equipment and computer-readable storage medium |
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| WO2021129457A1 (en) * | 2019-12-28 | 2021-07-01 | 中国科学院长春光学精密机械与物理研究所 | Uniform coating method, coating device, and computer readable storage medium |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1718844A (en) * | 2005-07-12 | 2006-01-11 | 中国科学院上海光学精密机械研究所 | The modification method of evenness of film thickness of electron beam evaporation film coating |
| US20070281075A1 (en) * | 2006-05-31 | 2007-12-06 | Cheng-Chia Huang | Optical method to monitor nano thin-film surface structure and thickness thereof |
| US20120021083A1 (en) * | 2010-07-22 | 2012-01-26 | Chung Yuan Christian University | Non-planar large-scale film extending apparatus |
| CN103726019A (en) * | 2013-12-13 | 2014-04-16 | 中国科学院上海光学精密机械研究所 | Design method for baffle capable of improving coating film uniformity of spherical optical element |
| JP2015147953A (en) * | 2014-02-04 | 2015-08-20 | 株式会社アルバック | Film deposition method |
| CN108315702A (en) * | 2018-02-05 | 2018-07-24 | 中国科学院长春光学精密机械与物理研究所 | A kind of planar rectangular magnetic control sputtering cathode plating film uniformity adjusting apparatus and method |
| CN108546897A (en) * | 2018-05-11 | 2018-09-18 | 鞍钢股份有限公司 | A kind of cold rolling hot dip galvanizing steel plate transverse direction coating uniformity control method |
| CN109332033A (en) * | 2018-11-13 | 2019-02-15 | 江苏大学 | A kind of electrostatic coating machine people is directed to the optimization method of non-regulation planar polygon layer thickness uniformity |
| CN109576667A (en) * | 2018-12-18 | 2019-04-05 | 中国科学院力学研究所 | A method of improving large mold PVD membrane uniformity |
| CN110344017A (en) * | 2018-04-03 | 2019-10-18 | 程实平 | With the method for optics thickness monitor system administration coating uniformity |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7211461B2 (en) * | 2003-02-14 | 2007-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing apparatus |
| KR100977971B1 (en) * | 2007-06-27 | 2010-08-24 | 두산메카텍 주식회사 | Evaporation equipment |
| CN102776484B (en) * | 2012-06-27 | 2014-03-26 | 中国科学院光电技术研究所 | Design method of baffle for controlling distribution of film thickness of planar optical element in film coating planetary system |
| CN103938161A (en) * | 2014-04-29 | 2014-07-23 | 京东方科技集团股份有限公司 | Evaporating device and evaporating method of substrate |
| JP6619934B2 (en) * | 2015-01-07 | 2019-12-11 | 日東電工株式会社 | Multilayer optical film thickness control method, multilayer optical film manufacturing method, and multilayer optical film sputtering apparatus |
| CN107557750A (en) * | 2017-08-22 | 2018-01-09 | 中国科学院长春光学精密机械与物理研究所 | Plated film real-time closed-loop control system and its control method |
| CN108441838B (en) * | 2018-03-21 | 2020-04-17 | 中国兵器科学研究院宁波分院 | Method for ion beam sputtering deposition of film on surface of medium-large diameter optical element |
| CN111041441B (en) * | 2019-12-28 | 2021-04-13 | 中国科学院长春光学精密机械与物理研究所 | Uniform coating method, coating equipment and computer-readable storage medium |
-
2019
- 2019-12-28 CN CN201911383950.6A patent/CN111041441B/en active Active
-
2020
- 2020-12-15 WO PCT/CN2020/136428 patent/WO2021129457A1/en active Application Filing
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1718844A (en) * | 2005-07-12 | 2006-01-11 | 中国科学院上海光学精密机械研究所 | The modification method of evenness of film thickness of electron beam evaporation film coating |
| US20070281075A1 (en) * | 2006-05-31 | 2007-12-06 | Cheng-Chia Huang | Optical method to monitor nano thin-film surface structure and thickness thereof |
| US20120021083A1 (en) * | 2010-07-22 | 2012-01-26 | Chung Yuan Christian University | Non-planar large-scale film extending apparatus |
| CN103726019A (en) * | 2013-12-13 | 2014-04-16 | 中国科学院上海光学精密机械研究所 | Design method for baffle capable of improving coating film uniformity of spherical optical element |
| JP2015147953A (en) * | 2014-02-04 | 2015-08-20 | 株式会社アルバック | Film deposition method |
| CN108315702A (en) * | 2018-02-05 | 2018-07-24 | 中国科学院长春光学精密机械与物理研究所 | A kind of planar rectangular magnetic control sputtering cathode plating film uniformity adjusting apparatus and method |
| CN110344017A (en) * | 2018-04-03 | 2019-10-18 | 程实平 | With the method for optics thickness monitor system administration coating uniformity |
| CN108546897A (en) * | 2018-05-11 | 2018-09-18 | 鞍钢股份有限公司 | A kind of cold rolling hot dip galvanizing steel plate transverse direction coating uniformity control method |
| CN109332033A (en) * | 2018-11-13 | 2019-02-15 | 江苏大学 | A kind of electrostatic coating machine people is directed to the optimization method of non-regulation planar polygon layer thickness uniformity |
| CN109576667A (en) * | 2018-12-18 | 2019-04-05 | 中国科学院力学研究所 | A method of improving large mold PVD membrane uniformity |
Non-Patent Citations (2)
| Title |
|---|
| YUANYI ZHANG ET AL: "rapid and selective deposition of patterned thin films on heterogeneous substrates via spin coating", 《APPLIED MATERIALS & INTERFACES》 * |
| 李资政等: "具有大面积均匀性、高质量的大尺寸中阶梯光栅铝膜的研究", 《物理学报》 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021129457A1 (en) * | 2019-12-28 | 2021-07-01 | 中国科学院长春光学精密机械与物理研究所 | Uniform coating method, coating device, and computer readable storage medium |
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| CN111041441B (en) | 2021-04-13 |
| WO2021129457A1 (en) | 2021-07-01 |
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