CN110989064A - Method for regulating and controlling bandwidth of narrow-band filtering film - Google Patents
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Abstract
The invention relates to a method for regulating and controlling the bandwidth of a narrow-band light filtering film, belonging to the technical field of optical films. The invention relates to a method for regulating and controlling the bandwidth of a narrow-band filtering film, which realizes the regulation and control of the bandwidth of the narrow-band filtering film by adopting a doped film with variable refractive index as a coupling layer of an ultra-narrow-band filtering film system structure and regulating the refractive index of the doped film. In the implementation process, a narrow-band filtering film is designed on a K9, fused silica or colored glass substrate, a low-refractive-index film material is doped in a high-refractive-index film, doped films with different refractive indexes can be obtained, and the doped films are used as coupling layers, so that narrow-band filtering films with different bandwidths can be designed.
Description
Technical Field
The invention belongs to the technical field of optical films, and particularly relates to a method for regulating and controlling the bandwidth of a narrow-band light filtering film.
Background
With the rapid development of optical systems, narrow-band filters have become an important research content in the field of optical thin films at present. The narrow-band filter is used as a device for filtering and selecting spectral lines, has wide application in laser technology, optical communication technology, high-resolution imaging, laser radar, satellite remote sensing detection and the like, and is especially important in a high-resolution imaging system. The research on narrow-band filters at home and abroad is highly focused, and the efforts of expanding cut-off wavelength, narrowing line width, reducing non-uniformity, and improving peak transmittance and reliability are continuously carried out, and become one of the most active subjects in the field of optical thin films.
In high-precision optical element applications, the methods currently used for depositing optical films can be broadly divided into: physical vapor deposition and chemical vapor deposition. The mainstream film forming method is still physical vapor deposition, which means that a film layer is prepared by a physical method, and the physical vapor deposition method mainly comprises electron beam evaporation, ion beam sputtering, ion beam assisted deposition, magnetron sputtering and the like. The filter film with the bandwidth less than 2nm can only be realized by ion beam sputtering deposition technology at present, but is limited by the reason of ion beam sputtering deposition target material, and the high-refractive-index film commonly used at present mainly comprises TiO2、Ta2O5、HfO2Etc. the low refractive index film material is mainly SiO2、Al2O3And the like. At present, the filter film with the bandwidth less than 2nm is mainly realized by adopting an all-dielectric two-cavity filter film structure or an all-dielectric two-cavity filter film structure, but the filter film structure is fixed, so that only a plurality of fixed bandwidths can be obtained, and the requirements of strong bandwidth requirements cannot be met. Therefore, a new method is needed to be found, which can realize the design and preparation of narrow-band filtering films with different bandwidths under the condition of narrow bandwidth.
In summary, no report is found on the current method for continuously adjusting the bandwidth of the narrow-band filtering film.
Disclosure of Invention
Technical problem to be solved
The technical problem to be solved by the invention is as follows: how to design a method capable of adjusting the bandwidth of the ultra-narrow band filtering film to realize the adjustment of the bandwidth of the ultra-narrow band filtering film.
(II) technical scheme
In order to solve the technical problem, the invention provides a method for regulating and controlling the bandwidth of a narrow-band light-filtering film, which comprises the following steps:
1) firstly, designing an ultra-narrow band light filtering film;
2) selecting a doped film as a coupling layer;
3) selecting coupling layers with different refractive indexes according to different bandwidth requirements;
4) obtaining a filtering film curve with different refractive indexes of the coupling layer through an ultra-narrow band filtering film system structure;
5) and the correlation between the bandwidth of the narrow-band filtering film and the refractive index of the coupling layer is obtained, and the design of the narrow-band filtering films with different bandwidths is realized.
Preferably, in step 1, the ultra-narrow band filtering film is designed as follows: center wavelength of λiThe film system structure is as follows: sub | L (HL) m kH (LH) m M (HL) m kH (LH) m LH | Air, wherein λiThe range is 200nm-5000nm, the range of m is 3-20, the range of k is 2-12 and is an even number, H is a high refractive index material, and the refractive index is nHL is a low refractive index material with a refractive index nLM is a coupling layer with a refractive index nM。
Preferably, in step 1, a 532nm narrow-band light filtering film is designed, and the structure of the film system is as follows: sub | L (HL) 52H (LH) 5M (HL) 52H (LH) 5L H | Air.
Preferably, in step 2, when the coupling layer is selected as the low refractive index thin film material SiO2When the optical filter is used, the bandwidth of the 532nm narrow-band filter film is 0.75 nm.
Preferably, in step 3, different doping ratios are selected to obtain doped films with different refractive indexes, and the refractive indexes of the different refractive index coupling layers are between 2.405 and 1.477.
Preferably, in step 4, doped films with different refractive indexes are selected as coupling layers, 532nm narrow-band filtering films with different bandwidths are designed, and 532nm narrow-band filtering film design curves under the conditions of different refractive index coupling layers are obtained.
Preferably, in step 5, the correlation between the bandwidth of the 532nm narrow-band filtering film and the refractive index of the coupling layer is obtained, and the bandwidth is continuously adjustable between 0.75nm and 1.15nm by changing the refractive index of the coupling layer, so as to realize the design of the narrow-band filtering films with different bandwidths.
Preferably, in step 1, a narrow-band filtering film is designed on a fused silica substrate.
Preferably, in step 1, a narrow-band filter film is designed on a K9 substrate.
Preferably, in step 1, a narrow-band filter film is designed on a colored glass substrate.
(III) advantageous effects
The invention designs a method for regulating and controlling the bandwidth of a narrow-band filtering film, which realizes the regulation and control of the bandwidth of the narrow-band filtering film by adopting a doped film with variable refractive index as a coupling layer of an ultra-narrow-band filtering film system structure and regulating the refractive index of the doped film. In the implementation process, a narrow-band filtering film is designed on a K9, fused silica or colored glass substrate, a low-refractive-index film material is doped in a high-refractive-index film, doped films with different refractive indexes can be obtained, and the doped films are used as coupling layers, so that narrow-band filtering films with different bandwidths can be designed. The result shows that the method can make up for the fixed bandwidth brought by the current narrow-band filtering film system structure, can realize the design of the narrow-band filtering film system structure with different bandwidths, and has important effects on the preparation and application of the narrow-band filtering film. The invention has universality for regulating and controlling the bandwidth of the ultra-narrow band filtering film with different working wavelengths.
Drawings
FIG. 1 is a schematic diagram of a 532nm narrow band filter structure;
FIG. 2 shows a high refractive index thin film material TiO2And low refractive index thin film material SiO2A refractive index profile of (a);
fig. 3 is a 532nm narrow-band filter film design curve (coupling layer M ═ low refractive index thin film material L);
FIG. 4 is a graph of the refractive index of different index coupling layers M;
FIG. 5 is a graph of a 532nm narrow band filter design under different refractive index coupling layer M conditions;
FIG. 6 is a graph of the dependence of the bandwidth of the 532nm narrow band filter film on the refractive index of the coupling layer.
Detailed Description
In order to make the objects, contents, and advantages of the present invention clearer, the following detailed description of the embodiments of the present invention will be made in conjunction with the accompanying drawings and examples.
The invention provides a method for regulating and controlling the bandwidth of a narrow-band light filtering film, which comprises the following steps:
1) firstly, designing an ultra-narrow band light filtering film with a central wavelength of lambdaiUnit is nm, and the structure of the film system is as follows: sub | L (HL) mkH (LH) m M (HL) mkH (LH) mLlH | Air, where Sub is the substrate, Air is Air, λiThe range of m is 3-20, the range of k is 2-12 and is even number, H is a high refractive index material, and the refractive index is nHL is a low refractive index material with a refractive index nLM is a coupling layer with a refractive index nM;
2) Selecting a doped film as a coupling layer with a refractive index nMRange of nH~nL;
3) Selecting M with different refractive indexes as a coupling layer according to different bandwidth requirements;
4) and obtaining a filtering film curve with different refractive indexes M of the coupling layer through the ultra-narrow band filtering film system structure.
5) And the correlation between the bandwidth of the narrow-band filtering film and the refractive index of the coupling layer is obtained, and the design of the narrow-band filtering films with different bandwidths is realized.
The following example experiments were performed with 532nm narrow band filter films, and the experimental procedure was as follows:
1) firstly, a 532nm narrow-band light filtering film is designed, the structural schematic diagram is shown in figure 1, and the structure of the film system is as follows: SubIL (HL) 52H (LH) 5M (HL) 52H (LH) 5L H L | Air, H is high refractive index TiO2Film material, L is low refractive index SiO2Film material, M is TiO2Doped SiO2Thin film material, in which the high refractive index thin film material TiO2And low refractive index thin film material SiO2The refractive index profile of (a) is shown in fig. 2.
2) When the coupling layer M is selected as a low-refractive-index thin-film material SiO2The design curve of the 532nm narrow-band filter film is shown in FIG. 3, the bandThe width is about 0.75 nm.
3) Different doping proportions are selected to obtain doped films with different refractive indexes, and the refractive index curves of the different refractive index coupling layers M are shown in FIG. 4, and the refractive indexes are between 2.405 and 1.477.
4) The doped thin films with different refractive indexes are selected as the coupling layer, 532nm narrow-band filtering thin films with different bandwidths are designed, and the design curve of the 532nm narrow-band filtering thin films under the condition of different refractive index coupling layers M is shown in FIG. 5.
5) The correlation between the bandwidth of the 532nm narrow-band filtering film and the refractive index of the coupling layer is obtained, and as a result, as shown in fig. 6, by changing the refractive index of the coupling layer, the bandwidth can be continuously adjusted between 0.75nm and 1.15nm, and the design of the narrow-band filtering film with different bandwidths can be realized.
The above description is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, several modifications and variations can be made without departing from the technical principle of the present invention, and these modifications and variations should also be regarded as the protection scope of the present invention.
Claims (10)
1. A method for regulating and controlling the bandwidth of a narrow-band light filtering film is characterized by comprising the following steps:
1) firstly, designing an ultra-narrow band light filtering film;
2) selecting a doped film as a coupling layer;
3) selecting coupling layers with different refractive indexes according to different bandwidth requirements;
4) obtaining a filtering film curve with different refractive indexes of the coupling layer through an ultra-narrow band filtering film system structure;
5) and the correlation between the bandwidth of the narrow-band filtering film and the refractive index of the coupling layer is obtained, and the design of the narrow-band filtering films with different bandwidths is realized.
2. The method of claim 1, wherein in step 1, the ultra-narrow band filter film is designed as follows: center wavelength of λiThe film system structure is as follows: sub | L (HL) m kH (LH) m M (HL) m kH (LH) m LH | Air, wherein λiIn the range of 200nm-5000nm, m is 3-20, k is 2-12 and even number, H is high refractive index material, and refractive index is nHL is a low refractive index material with a refractive index nLM is a coupling layer with a refractive index nM。
3. The method of claim 2, wherein in step 1, a 532nm narrow-band filter film is designed, and the structure of the film system is as follows: sub | L (HL) 52H (LH) 5M (HL) 52H (LH) 5L H | Air.
4. The method of claim 3, wherein in step 2, when the coupling layer is selected as a low refractive index thin film material SiO2When the optical filter is used, the bandwidth of the 532nm narrow-band filter film is 0.75 nm.
5. The method of claim 4, wherein in step 3, different doping ratios are selected to obtain doped films with different refractive indices, and the refractive indices of the different index coupling layers are between 2.405 and 1.477.
6. The method of claim 5, wherein in step 4, doped films with different refractive indexes are selected as coupling layers, 532nm narrow-band filtering films with different bandwidths are designed, and 532nm narrow-band filtering film design curves under the conditions of different refractive index coupling layers are obtained.
7. The method of claim 6, wherein in step 5, the correlation between the bandwidth of the 532nm narrow-band filtering film and the refractive index of the coupling layer is obtained, and the bandwidth is continuously adjustable between 0.75nm and 1.15nm by changing the refractive index of the coupling layer, so as to realize the design of narrow-band filtering films with different bandwidths.
8. The method of claim 7, wherein in step 1, a narrow-band filter film is designed on a fused silica substrate.
9. The method of claim 7 wherein in step 1, a narrow band filter film is designed on a K9 substrate.
10. The method of claim 7, wherein in step 1, a narrow-band filter film is designed on a colored glass substrate.
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN203606528U (en) * | 2013-11-25 | 2014-05-21 | 杭州科汀光学技术有限公司 | Cubic prism bandpass filter without polarization |
CN106405709A (en) * | 2016-11-16 | 2017-02-15 | 天津津航技术物理研究所 | Wide band cut-off ultra-narrow-band filter |
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Publication number | Priority date | Publication date | Assignee | Title |
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CN203606528U (en) * | 2013-11-25 | 2014-05-21 | 杭州科汀光学技术有限公司 | Cubic prism bandpass filter without polarization |
CN106405709A (en) * | 2016-11-16 | 2017-02-15 | 天津津航技术物理研究所 | Wide band cut-off ultra-narrow-band filter |
Non-Patent Citations (2)
Title |
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王多书等: "空间光学薄膜技术", 《真空科学与技术学报》 * |
王治乐: "《薄膜光学与真空镀膜技术》", 30 June 2013 * |
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