CN110931405B - Transmission member, transmission method, and cleaning device - Google Patents
Transmission member, transmission method, and cleaning device Download PDFInfo
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- CN110931405B CN110931405B CN201911128013.6A CN201911128013A CN110931405B CN 110931405 B CN110931405 B CN 110931405B CN 201911128013 A CN201911128013 A CN 201911128013A CN 110931405 B CN110931405 B CN 110931405B
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- 230000005540 biological transmission Effects 0.000 title claims abstract description 52
- 238000000034 method Methods 0.000 title claims abstract description 36
- 238000004140 cleaning Methods 0.000 title claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 163
- 238000012546 transfer Methods 0.000 claims description 11
- 230000005611 electricity Effects 0.000 abstract description 10
- 230000003068 static effect Effects 0.000 abstract description 10
- 238000010586 diagram Methods 0.000 description 4
- 230000009191 jumping Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000004891 communication Methods 0.000 description 1
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- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
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Abstract
The application provides a transmission component, a transmission method and a cleaning device. When the distance between the target substrate and the second roller group measured by the measuring unit is smaller than a first preset threshold value, the control unit increases the distance between the target substrate and the second roller group, so that the distance between the target substrate and the second roller group is larger than the first preset threshold value. According to the application, the control unit and the measuring unit are arranged in the transmission component, the distance between the target substrate and the second roller set is monitored in real time, the distance between the target substrate and the second roller set is located between the first preset threshold and the second preset threshold, the target substrate is guaranteed not to be in contact with the second roller set, static electricity is avoided, and the yield and the quality of products are improved.
Description
Technical Field
The present disclosure relates to semiconductor cleaning technologies, and particularly to a transmission member, a transmission method, and a cleaning apparatus.
Background
In the production process of the display panel, in order to improve the performance and yield of the product, the substrate is usually cleaned before the film forming process is performed on the substrate, and the water flow impacts the surface of the substrate to remove particles on the substrate, so as to achieve the purpose of cleaning the surface of the substrate. Finally, the substrate is transported by a roller in the cleaning device for the next process.
The cleaning apparatus for a substrate includes a cleaning section and a transfer section. In the prior art, in order to prevent the substrate from sliding or jumping, the transmission section is set to be double-roller transmission, and the substrate is positioned between the rollers. However, the roller directly contacts the substrate, which causes static electricity on the surface of the substrate, affects the subsequent process, and reduces the yield and quality of the product.
Therefore, a cleaning device is needed to solve the above problems.
Disclosure of Invention
The application provides a transmission component, a transmission method and a cleaning device, which are used for solving the technical problem that static electricity is generated in the transmission process of the existing substrate.
In order to solve the technical problem, the technical scheme provided by the application is as follows:
the present application provides a transmission member for transmitting a substrate, including:
a first roller set for supporting a target substrate;
the second roller group is positioned on the target substrate;
the measuring unit is used for measuring the distance between the target substrate and the second roller group;
the control unit is used for controlling the distance between the second roller group and the target;
when the distance between the target substrate and the second roller group measured by the measuring unit is smaller than a first preset threshold, the control unit increases the distance between the target substrate and the second roller group to enable the distance between the target substrate and the second roller group to be larger than the first preset threshold;
when the distance between the target substrate and the second roller set measured by the measuring unit is greater than a second preset threshold, the control unit decreases the distance between the target substrate and the second roller set to make the distance between the target substrate and the second roller set smaller than the second preset threshold.
In the transmission member of the present application, the first roller set and the second roller set include at least one roller, and the second roller set is disposed opposite to the first roller set.
In the transmission member of the present application, when the distance between the target substrate and the second roller set measured by the measurement unit is between the first preset threshold and the second preset threshold, a next photomask process is performed on the target substrate.
In the transmission means of the present application, said first preset threshold is smaller than said second preset threshold.
The present application also proposes a cleaning device, wherein the cleaning device comprises a cleaning member and a transfer member as described above.
The present application also provides a transmission method, which includes:
acquiring the distance between the target substrate and the second roller group;
when the distance between the target substrate and the second roller group is smaller than a first preset threshold value, increasing the distance between the target substrate and the second roller group to enable the distance between the target substrate and the second roller group to be larger than the first preset threshold value;
when the distance between the target substrate and the second roller group is larger than a second preset threshold value, reducing the distance between the target substrate and the second roller group to enable the distance between the target substrate and the second roller group to be smaller than the second preset threshold value.
In the transmission method of the present application,
the target substrate is positioned on the first roller group so as to support the target substrate;
the first roller group and the second roller group comprise at least one roller;
the second roller group is opposite to the first roller group.
In the transmission method of the application, the number of rollers in the first roller group is greater than the number of rollers in the second roller group;
the roller in the second roller group is opposite to the roller in the first roller group.
In the transmission method of the present application,
and when the distance between the target substrate and the second roller group is between the first preset threshold and the second preset threshold, carrying out the next photomask process on the target substrate.
In the transmission method of the present application,
the first preset threshold is smaller than the second preset threshold.
Has the advantages that: according to the application, the control unit and the measuring unit are arranged in the transmission component, the distance between the target substrate and the second roller set is monitored in real time, the distance between the target substrate and the second roller set is located between the first preset threshold and the second preset threshold, the target substrate is guaranteed not to be in contact with the second roller set, static electricity is avoided, and the yield and the quality of products are improved.
Drawings
The technical solution and other advantages of the present application will become apparent from the detailed description of the embodiments of the present application with reference to the accompanying drawings.
FIG. 1 is a schematic structural view of a transmission member according to the present application;
FIG. 2 is a schematic diagram of the operation of a transfer member of the present application;
fig. 3 is a flowchart illustrating a transmission method according to the present application.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. It is to be understood that the embodiments described are only a few embodiments of the present application and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
In the description of the present application, it is to be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the present application and for simplicity in description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed in a particular orientation, and be operated in a particular manner, and are not to be construed as limiting the present application. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", may explicitly or implicitly include one or more of the described features. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; may be mechanically connected, may be electrically connected or may be in communication with each other; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
In this application, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may comprise direct contact of the first and second features, or may comprise contact of the first and second features not directly but through another feature in between. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
The following disclosure provides many different embodiments or examples for implementing different features of the application. In order to simplify the disclosure of the present application, specific example components and arrangements are described below. Of course, they are merely examples and are not intended to limit the present application. Moreover, the present application may repeat reference numerals and/or letters in the various examples, such repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. In addition, examples of various specific processes and materials are provided herein, but one of ordinary skill in the art may recognize applications of other processes and/or use of other materials.
The present application provides a transfer member 100, and the transfer member 100 is mainly used for transferring a target substrate 30. The target substrate 30 is the target substrate 30 cleaned by the cleaning means.
Referring to fig. 1, fig. 1 is a schematic structural diagram of a transmission member 100 according to the present application.
The conveying member 100 includes a first roller set 10 and a second roller set 20. The second roller set 20 is disposed opposite to the first roller set 10.
In this embodiment, the first roller set 10 is used to support the target substrate 3030. The transfer member 100 transfers the target substrate 30 toward a target direction by a frictional force between the first roller set 10 and the target substrate 30.
The first roller group and the second roller group comprise at least one roller.
In this embodiment, the number of rollers in the first roller set is greater than the number of rollers in the second roller set.
In this embodiment, the roller of the second roller set is opposite to the roller of the first roller set.
Referring to fig. 1, the first roller set 10 includes at least two first rollers 101. The distance between two adjacent first rollers 101 is equal. The target substrate 30 is in contact with each of the first rollers 101. In this embodiment, the rotation direction of each of the first rollers 101 is clockwise, and the direction of the driving force (i.e., the friction force) applied by the first roller 101 on the target substrate 30 is the X direction in fig. 1, so as to drive the target substrate 30 to move in the X direction.
The second roller set 20 includes at least one second roller 201.
In this embodiment, the number of the first rollers 101 is greater than the number of the second rollers 201. When the second roller set 20 includes two or more second rollers 201, at least one first roller 101 is disposed between two adjacent second rollers 201.
The second roller 201 is not in contact with the target substrate 30, and the second roller 201 is spaced from the target substrate 30. So as to prevent the target substrate 30 from having too large jumping performance during the transmission process, and ensure the stability of the target substrate 30 during the transmission process.
Referring to fig. 2, fig. 2 is a schematic diagram illustrating an operation of a transmission member 100 according to the present invention.
The transmission member 100 further comprises a measurement unit 40.
The measuring unit 40 may be located inside the second roller 201 or outside the second roller 201. The measuring unit 40 is used to measure the distance between the target substrate 30 and the second roller set 20.
When the measuring unit 40 is located in the second roller 201, the measuring unit 40 emits measuring light from the second roller 201, reaches the target substrate 30, reflects the measuring light to the measuring unit 40, and is received by the measuring unit 40. The distance between the target substrate 30 and the second roller set 20 is calculated according to the time difference between the emission and the reception of the measuring light.
In this embodiment, when the target substrate 30 has an excessive bump during the transportation process, it will contact the second roller 201, forcing the second roller 201 to rotate. Therefore, the measuring unit 40 and the second roller 201 rotate non-coaxially. When the second roller 201 rotates, the measuring unit 40 is in a stationary state, and the measuring light emitted by the measuring unit 40 is perpendicular to the target substrate 30.
The transmission member 100 further comprises a control unit 50.
In this embodiment, the control unit 50 is used for controlling the distance between the second roller set 20 and the target. The control unit 50 controls the second roller set 20 to ascend and descend by calling a control lever so as to control the distance between the second roller set 20 and the target, thereby satisfying the requirements of the conveying member 100.
When the distance between the target substrate 30 and the second roller set 20 measured by the measuring unit 40 is smaller than a first preset threshold, the control unit 50 pulls up the second roller set 20 through the control rod to increase the distance between the target substrate 30 and the second roller set 20, so that the distance between the target substrate 30 and the second roller set 20 is larger than the first preset threshold, thereby ensuring that the target substrate 30 is not in contact with the second roller set 20 and avoiding generation of static electricity.
In this embodiment, even though there is a certain distance between the target substrate 30 and the second roller set 20, since the target substrate 30 may shake up and down during the transportation process, when the distance is too small, static electricity may be generated, which may affect the quality of the target substrate 30.
In this embodiment, the distance between the target substrate 30 and the second roller set 20 may be 5 mm.
When the distance between the target substrate 30 and the second roller set 20 measured by the measuring unit 40 is greater than a second preset threshold, the control unit 50 lowers the second roller set 20 through the control rod to reduce the distance between the target substrate 30 and the second roller set 20, so that the distance between the target substrate 30 and the second roller set 20 is smaller than the second preset threshold, and the target substrate 30 is prevented from having an excessive bump and affecting the quality of the target substrate 30.
In this embodiment, the first preset threshold is smaller than the second preset threshold. The specific numerical values of the first preset threshold and the second preset threshold may be obtained by numerical simulation calculation.
When the distance between the target substrate 30 and the second roller set 20 measured by the measuring unit 40 is between the first preset threshold and the second preset threshold, the second roller set 20 does not need to be adjusted, and the next photomask process is performed on the target substrate 30.
In this embodiment, when the distance between the target substrate 30 and the second roller set 20 measured by the measuring unit 40 is smaller than a first preset threshold, the distance between the target substrate 30 and the second roller set 20 may be increased by adding other heightening devices such as spacers under the second roller set 20, so that the distance between the target substrate 30 and the second roller set 20 is larger than the first preset threshold.
In this embodiment, when the distance between the target substrate 30 and the second roller set 20 measured by the measuring unit 40 is greater than a second preset threshold, the distance between the target substrate 30 and the second roller set 20 may be reduced by reducing other heightening devices such as pads under the second roller set 20, so as to make the distance between the target substrate 30 and the second roller set 20 smaller than the second preset threshold.
According to the application, the control unit and the measuring unit are arranged in the transmission component, the distance between the target substrate and the second roller set is monitored in real time, the distance between the target substrate and the second roller set is located between the first preset threshold and the second preset threshold, the target substrate is guaranteed not to be in contact with the second roller set, static electricity is avoided, and the yield and the quality of products are improved.
The application also provides a cleaning device.
In this embodiment, the cleaning device includes a cleaning member and a transfer member.
The cleaning component is used for cleaning a target substrate subjected to a photomask process or an etching process so as to remove particles or other impurities on the substrate.
The working principle of the transmission component in the cleaning device is the same as or similar to that of the transmission component, and detailed description is omitted.
Referring to fig. 3, fig. 3 is a flowchart illustrating a transmission method according to the present application.
The transmission method comprises the following steps:
s10, acquiring the distance a between the target substrate 30 and the second roller group 20;
the transmission method of the present application is performed in a transmission member 100 as in fig. 1.
The conveying member 100 includes a first roller set 10 and a second roller set 20. The second roller set 20 is disposed opposite to the first roller set 10.
In this embodiment, the first roller set 10 is used to support the target substrate 30. The transfer member 100 transfers the target substrate 30 toward a target direction by a frictional force between the first roller set 10 and the target substrate 30.
The first roller group and the second roller group comprise at least one roller.
In this embodiment, the number of rollers in the first roller set is greater than the number of rollers in the second roller set.
In this embodiment, the roller of the second roller set is opposite to the roller of the first roller set.
Referring to fig. 1, the first roller set 10 includes at least two first rollers 101. The distance between two adjacent first rollers 101 is equal. The target substrate 30 is in contact with each of the first rollers 101. In this embodiment, the rotation direction of each of the first rollers 101 is clockwise, and the direction of the driving force (i.e., the friction force) applied by the first roller 101 on the target substrate 30 is the X direction in fig. 1, so as to drive the target substrate 30 to move in the X direction.
The second roller set 20 includes at least one second roller 201.
In this embodiment, the number of the first rollers 101 is greater than the number of the second rollers 201. When the second roller set 20 includes two or more second rollers 201, at least one first roller 101 is disposed between two adjacent second rollers 201.
The second roller 201 is not in contact with the target substrate 30, and the second roller 201 is spaced from the target substrate 30. So as to prevent the target substrate 30 from having too large jumping performance during the transmission process, and ensure the stability of the target substrate 30 during the transmission process.
Referring to fig. 2, fig. 2 is a schematic diagram illustrating an operation of a transmission member 100 according to the present invention.
The transmission member 100 further comprises a measurement unit 40.
The measuring unit 40 may be located inside the second roller 201 or outside the second roller 201. The measuring unit 40 is used to measure the distance between the target substrate 30 and the second roller set 20.
When the measuring unit 40 is located in the second roller 201, the measuring unit 40 emits measuring light from the second roller 201, reaches the target substrate 30, reflects the measuring light to the measuring unit 40, and is received by the measuring unit 40. The distance between the target substrate 30 and the second roller set 20 is calculated according to the time difference between the emission and the reception of the measuring light.
In this embodiment, when the target substrate 30 has an excessive bump during the transportation process, it will contact the second roller 201, forcing the second roller 201 to rotate. Therefore, the measuring unit 40 and the second roller 201 rotate non-coaxially. When the second roller 201 rotates, the measuring unit 40 is in a stationary state, and the measuring light emitted by the measuring unit 40 is perpendicular to the target substrate 30.
The transmission member 100 further comprises a control unit 50.
In this embodiment, the control unit 50 is used for controlling the distance between the second roller set 20 and the target. The control unit 50 controls the second roller set 20 to ascend and descend by calling a control lever so as to control the distance between the second roller set 20 and the target, thereby satisfying the requirements of the conveying member 100.
In this step, the distance between the target substrate 30 and the second roller set 20 is mainly obtained by the measuring unit 40.
S20, when the distance between the target substrate 30 and the second roller set 20 is smaller than a first preset threshold, increasing the distance between the target substrate 30 and the second roller set 20 to make the distance between the target substrate 30 and the second roller set 20 larger than the first preset threshold;
in this step, when the distance between the target substrate 30 and the second roller set 20 measured by the measuring unit 40 is smaller than a first preset threshold, the control unit 50 pulls up the second roller set 20 through the control rod to increase the distance between the target substrate 30 and the second roller set 20, so that the distance between the target substrate 30 and the second roller set 20 is larger than the first preset threshold, thereby ensuring that the target substrate 30 and the second roller set 20 are not in contact with each other and avoiding generation of static electricity.
In this embodiment, even though there is a certain distance between the target substrate 30 and the second roller set 20, since the target substrate 30 may shake up and down during the transportation process, when the distance is too small, static electricity may be generated, which may affect the quality of the target substrate 30.
In this embodiment, the distance between the target substrate 30 and the second roller set 20 may be 5 mm.
S30, when the distance between the target substrate 30 and the second roller set 20 is greater than a second preset threshold, decreasing the distance between the target substrate 30 and the second roller set 20 to make the distance between the target substrate 30 and the second roller set 20 smaller than the second preset threshold;
in this step, when the distance between the target substrate 30 and the second roller set 20 measured by the measuring unit 40 is greater than a second preset threshold, the control unit 50 lowers the second roller set 20 through the control rod to reduce the distance between the target substrate 30 and the second roller set 20, so that the distance between the target substrate 30 and the second roller set 20 is smaller than the second preset threshold, and the target substrate 30 is prevented from having too large bump and affecting the quality of the target substrate 30.
S40, when the distance between the target substrate 30 and the second roller set 20 measured by the measuring unit 40 is between the first preset threshold and the second preset threshold, the second roller set 20 does not need to be adjusted, and the next mask process is performed on the target substrate 30.
In steps S20 and S30, the first preset threshold is smaller than the second preset threshold. The specific numerical values of the first preset threshold and the second preset threshold may be obtained by numerical simulation calculation.
In this embodiment, when the distance between the target substrate 30 and the second roller set 20 measured by the measuring unit 40 is smaller than a first preset threshold, the distance between the target substrate 30 and the second roller set 20 may be increased by adding other heightening devices such as spacers under the second roller set 20, so that the distance between the target substrate 30 and the second roller set 20 is larger than the first preset threshold.
In this embodiment, when the distance between the target substrate 30 and the second roller set 20 measured by the measuring unit 40 is greater than a second preset threshold, the distance between the target substrate 30 and the second roller set 20 may be reduced by reducing other heightening devices such as pads under the second roller set 20, so as to make the distance between the target substrate 30 and the second roller set 20 smaller than the second preset threshold.
The application provides a transmission component, a transmission method and a cleaning device. When the distance between the target substrate and the second roller group measured by the measuring unit is smaller than a first preset threshold value, the control unit increases the distance between the target substrate and the second roller group, so that the distance between the target substrate and the second roller group is larger than the first preset threshold value. According to the application, the control unit and the measuring unit are arranged in the transmission component, the distance between the target substrate and the second roller set is monitored in real time, the distance between the target substrate and the second roller set is located between the first preset threshold and the second preset threshold, the target substrate is guaranteed not to be in contact with the second roller set, static electricity is avoided, and the yield and the quality of products are improved.
In the foregoing embodiments, the descriptions of the respective embodiments have respective emphasis, and for parts that are not described in detail in a certain embodiment, reference may be made to related descriptions of other embodiments.
The foregoing describes in detail an electronic device provided in an embodiment of the present application, and a specific example is applied to illustrate the principle and the implementation of the present application, and the description of the foregoing embodiment is only used to help understanding the technical solution and the core idea of the present application; those of ordinary skill in the art will understand that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; such modifications or substitutions do not depart from the spirit and scope of the present disclosure as defined by the appended claims.
Claims (8)
1. A transfer member for transferring a substrate, comprising:
a first roller set for supporting a target substrate;
the second roller group is positioned on the target substrate, and the target substrate is not in contact with the second roller group;
the measuring unit is used for measuring the distance between the target substrate and the second roller group;
the control unit is used for controlling the distance between the second roller group and the target substrate;
when the distance between the target substrate and the second roller group measured by the measuring unit is smaller than a first preset threshold, the control unit increases the distance between the target substrate and the second roller group to enable the distance between the target substrate and the second roller group to be larger than the first preset threshold;
when the distance between the target substrate and the second roller group measured by the measuring unit is greater than a second preset threshold, the control unit reduces the distance between the target substrate and the second roller group to make the distance between the target substrate and the second roller group smaller than the second preset threshold;
the first preset threshold is smaller than the second preset threshold.
2. Transmission member according to claim 1,
the first roller group and the second roller group comprise at least one roller, and the second roller group is opposite to the first roller group.
3. Transmission member according to claim 1,
and when the distance between the target substrate and the second roller group measured by the measuring unit is between the first preset threshold and the second preset threshold, performing the next photomask process on the target substrate.
4. A cleaning device comprising a cleaning member and a transport member as claimed in any one of claims 1 to 3.
5. A method of transmission, comprising:
acquiring the distance between the target substrate and the second roller group;
when the distance between the target substrate and the second roller group is smaller than a first preset threshold value, increasing the distance between the target substrate and the second roller group to enable the distance between the target substrate and the second roller group to be larger than the first preset threshold value;
when the distance between the target substrate and the second roller group is larger than a second preset threshold value, reducing the distance between the target substrate and the second roller group to enable the distance between the target substrate and the second roller group to be smaller than the second preset threshold value;
the first preset threshold is smaller than the second preset threshold.
6. The transmission method according to claim 5,
the target substrate is positioned on the first roller group so as to support the target substrate;
the first roller group and the second roller group comprise at least one roller;
the second roller group is opposite to the first roller group.
7. The conveying method according to claim 6, wherein the number of rollers in the first roller group is greater than the number of rollers in the second roller group;
the roller in the second roller group is opposite to the roller in the first roller group.
8. The transmission method according to claim 5,
and when the distance between the target substrate and the second roller group is between the first preset threshold and the second preset threshold, carrying out the next photomask process on the target substrate.
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| CN201911128013.6A CN110931405B (en) | 2019-11-18 | 2019-11-18 | Transmission member, transmission method, and cleaning device |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101254859A (en) * | 2007-11-30 | 2008-09-03 | 无锡尚德太阳能电力有限公司 | Roller train for conveying thin sheet panel and method for chemical treatment thereby |
| CN105197536A (en) * | 2015-10-23 | 2015-12-30 | 京东方科技集团股份有限公司 | Control device, transportation equipment and control method |
| CN110095890A (en) * | 2019-05-05 | 2019-08-06 | 深圳市华星光电半导体显示技术有限公司 | Cleaning device and cleaning method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20070117287A (en) * | 2006-06-08 | 2007-12-12 | 삼성전자주식회사 | Inspection unit for substrate, inspection apparatus for substrate and method of substrate inspection using the same |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101254859A (en) * | 2007-11-30 | 2008-09-03 | 无锡尚德太阳能电力有限公司 | Roller train for conveying thin sheet panel and method for chemical treatment thereby |
| CN105197536A (en) * | 2015-10-23 | 2015-12-30 | 京东方科技集团股份有限公司 | Control device, transportation equipment and control method |
| CN110095890A (en) * | 2019-05-05 | 2019-08-06 | 深圳市华星光电半导体显示技术有限公司 | Cleaning device and cleaning method |
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Denomination of invention: Transmission components, transmission methods, and cleaning devices Effective date of registration: 20231113 Granted publication date: 20220426 Pledgee: Industrial and Commercial Bank of China Limited Shenzhen Guangming Sub branch Pledgor: TCL China Star Optoelectronics Technology Co.,Ltd. Registration number: Y2023980065368 |