CN110890434A - 一种铜氧基高温超导单光子探测器及其制备方法 - Google Patents
一种铜氧基高温超导单光子探测器及其制备方法 Download PDFInfo
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- CN110890434A CN110890434A CN201911056661.5A CN201911056661A CN110890434A CN 110890434 A CN110890434 A CN 110890434A CN 201911056661 A CN201911056661 A CN 201911056661A CN 110890434 A CN110890434 A CN 110890434A
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- oxygen
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- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 title claims abstract description 104
- 238000002360 preparation method Methods 0.000 title abstract description 14
- 239000002082 metal nanoparticle Substances 0.000 claims abstract description 30
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- 238000000034 method Methods 0.000 claims description 17
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- 238000001755 magnetron sputter deposition Methods 0.000 claims description 14
- 230000008569 process Effects 0.000 claims description 14
- 238000000137 annealing Methods 0.000 claims description 9
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 8
- 229910052681 coesite Inorganic materials 0.000 claims description 7
- 229910052906 cristobalite Inorganic materials 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052682 stishovite Inorganic materials 0.000 claims description 7
- 229910052905 tridymite Inorganic materials 0.000 claims description 7
- 239000002077 nanosphere Substances 0.000 claims description 6
- 229910021521 yttrium barium copper oxide Inorganic materials 0.000 claims description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 5
- 238000010894 electron beam technology Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 238000001020 plasma etching Methods 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000000233 ultraviolet lithography Methods 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims description 2
- 239000011148 porous material Substances 0.000 claims 1
- 238000001514 detection method Methods 0.000 abstract description 21
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 20
- 239000007788 liquid Substances 0.000 abstract description 15
- 230000010287 polarization Effects 0.000 abstract description 14
- 230000031700 light absorption Effects 0.000 abstract description 13
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 10
- 239000001307 helium Substances 0.000 abstract description 6
- 229910052734 helium Inorganic materials 0.000 abstract description 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 abstract description 6
- 238000003860 storage Methods 0.000 abstract description 4
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- 239000000463 material Substances 0.000 description 15
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- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
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- 238000009792 diffusion process Methods 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- -1 lanthanum aluminate Chemical class 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
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- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 2
- 239000002887 superconductor Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical group [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113138358A (zh) * | 2021-03-02 | 2021-07-20 | 华南师范大学 | 光磁场探针和探测系统、光磁响应材料的应用方法 |
CN113948603A (zh) * | 2021-09-29 | 2022-01-18 | 西安理工大学 | 一种纳米多孔氮化铌薄膜光电探测器红外光响应设计方法 |
CN113948602A (zh) * | 2021-09-29 | 2022-01-18 | 西安理工大学 | 一种纳米多孔氮化铌薄膜光电探测器 |
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US20090020701A1 (en) * | 2006-10-05 | 2009-01-22 | Commissariat A L'energie Atomique | High time-resolution ultrasensitive optical detector, using grating coupling |
CN102653392A (zh) * | 2012-05-17 | 2012-09-05 | 中国科学院物理研究所 | 一种负性电子束抗蚀剂曝光工艺制备超导纳米器件的方法 |
CN103367625A (zh) * | 2013-07-15 | 2013-10-23 | 河北大学 | 一种斜切砷化镓单晶光、热探测器 |
CN103496965A (zh) * | 2013-09-12 | 2014-01-08 | 中国科学院电工研究所 | 一种钇钡铜氧超导纳米线的制备方法 |
CN103872155A (zh) * | 2014-03-19 | 2014-06-18 | 南京大学 | 一种表面等离激元增强的超导单光子探测器及其制备方法 |
CN104091883A (zh) * | 2014-07-15 | 2014-10-08 | 中国科学院上海微系统与信息技术研究所 | 一种基于介质薄膜反射镜的超导纳米线单光子探测器 |
CN107579138A (zh) * | 2017-09-28 | 2018-01-12 | 武汉大学 | 一种全无机钙钛矿肖特基光电探测器及其制备方法 |
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2019
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US20090020701A1 (en) * | 2006-10-05 | 2009-01-22 | Commissariat A L'energie Atomique | High time-resolution ultrasensitive optical detector, using grating coupling |
CN102653392A (zh) * | 2012-05-17 | 2012-09-05 | 中国科学院物理研究所 | 一种负性电子束抗蚀剂曝光工艺制备超导纳米器件的方法 |
CN103367625A (zh) * | 2013-07-15 | 2013-10-23 | 河北大学 | 一种斜切砷化镓单晶光、热探测器 |
CN103496965A (zh) * | 2013-09-12 | 2014-01-08 | 中国科学院电工研究所 | 一种钇钡铜氧超导纳米线的制备方法 |
CN103872155A (zh) * | 2014-03-19 | 2014-06-18 | 南京大学 | 一种表面等离激元增强的超导单光子探测器及其制备方法 |
CN104091883A (zh) * | 2014-07-15 | 2014-10-08 | 中国科学院上海微系统与信息技术研究所 | 一种基于介质薄膜反射镜的超导纳米线单光子探测器 |
CN107579138A (zh) * | 2017-09-28 | 2018-01-12 | 武汉大学 | 一种全无机钙钛矿肖特基光电探测器及其制备方法 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113138358A (zh) * | 2021-03-02 | 2021-07-20 | 华南师范大学 | 光磁场探针和探测系统、光磁响应材料的应用方法 |
CN113948603A (zh) * | 2021-09-29 | 2022-01-18 | 西安理工大学 | 一种纳米多孔氮化铌薄膜光电探测器红外光响应设计方法 |
CN113948602A (zh) * | 2021-09-29 | 2022-01-18 | 西安理工大学 | 一种纳米多孔氮化铌薄膜光电探测器 |
CN113948603B (zh) * | 2021-09-29 | 2024-05-07 | 西安理工大学 | 一种纳米多孔氮化铌薄膜光电探测器红外光响应设计方法 |
CN113948602B (zh) * | 2021-09-29 | 2024-07-09 | 西安理工大学 | 一种纳米多孔氮化铌薄膜光电探测器 |
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