CN110869536A - 一种抛光剂、不锈钢件及其抛光处理方法 - Google Patents

一种抛光剂、不锈钢件及其抛光处理方法 Download PDF

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Publication number
CN110869536A
CN110869536A CN201780092839.4A CN201780092839A CN110869536A CN 110869536 A CN110869536 A CN 110869536A CN 201780092839 A CN201780092839 A CN 201780092839A CN 110869536 A CN110869536 A CN 110869536A
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CN
China
Prior art keywords
parts
stainless steel
polishing
polishing agent
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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CN201780092839.4A
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English (en)
Inventor
刘国平
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Shenzhen Hongchangfa Technology Co Ltd
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Shenzhen Hongchangfa Technology Co Ltd
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Application filed by Shenzhen Hongchangfa Technology Co Ltd filed Critical Shenzhen Hongchangfa Technology Co Ltd
Publication of CN110869536A publication Critical patent/CN110869536A/zh
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00—Brightening metals by chemical means
    • C23F3/04—Heavy metals
    • C23F3/06—Heavy metals with acidic solutions

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

一种抛光剂、不锈钢件及其抛光处理方法。抛光剂用于不锈钢件表面预处理，以200重量份计，包括如下重量份数的成分：10‑50份双氧水，2‑10份尿素，3‑8份硼砂，6‑20份冰醋酸，0.5‑5份金刚石微粉，0.5‑2份十二烷基苯磺酸钠和余量水。经过上述抛光剂处理后，不锈钢件表面清洁光亮，而且整个抛光处理方法工艺简单、环保，无气味无NO 2逸出，操作方便，使用成本低。

Description

PCT国内申请，说明书已公开。

Claims (1)

  1. PCT国内申请，权利要求书已公开。
CN201780092839.4A 2017-07-03 2017-07-03 一种抛光剂、不锈钢件及其抛光处理方法 Withdrawn CN110869536A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2017/091539 WO2019006605A1 (zh) 2017-07-03 2017-07-03 一种抛光剂、不锈钢件及其抛光处理方法

Publications (1)

Publication Number Publication Date
CN110869536A true CN110869536A (zh) 2020-03-06

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CN201780092839.4A Withdrawn CN110869536A (zh) 2017-07-03 2017-07-03 一种抛光剂、不锈钢件及其抛光处理方法

Country Status (2)

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CN (1) CN110869536A (zh)
WO (1) WO2019006605A1 (zh)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030022502A1 (en) * 2001-07-30 2003-01-30 Kabushiki Kaisha Toshiba Chemical mechanical polishing slurry containing abrasive particles exhibiting photocatalytic function
CN101851470A (zh) * 2009-04-03 2010-10-06 比亚迪股份有限公司 一种化学抛光液及抛光方法
CN102311706A (zh) * 2010-06-30 2012-01-11 中国科学院微电子研究所 一种纳米级抛光液及其调配方法
CN105624683A (zh) * 2016-03-28 2016-06-01 苏州市晶协高新电子材料有限公司 一种抛光剂及其制备方法
CN106811751A (zh) * 2017-02-16 2017-06-09 河南科技学院 一种304不锈钢化学机械抛光用抛光剂和抛光液及其制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2902954B2 (ja) * 1994-09-20 1999-06-07 鐘紡株式会社 金コロイド溶液の製造方法および金コロイド溶液
EP3127984A4 (en) * 2014-04-04 2017-10-04 Fujimi Incorporated Polishing composition for hard materials
CN105623524A (zh) * 2016-01-28 2016-06-01 繁昌县陈氏金属制品有限公司 一种用于不锈钢表面抛光的多磨料表面处理剂

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030022502A1 (en) * 2001-07-30 2003-01-30 Kabushiki Kaisha Toshiba Chemical mechanical polishing slurry containing abrasive particles exhibiting photocatalytic function
CN101851470A (zh) * 2009-04-03 2010-10-06 比亚迪股份有限公司 一种化学抛光液及抛光方法
CN102311706A (zh) * 2010-06-30 2012-01-11 中国科学院微电子研究所 一种纳米级抛光液及其调配方法
CN105624683A (zh) * 2016-03-28 2016-06-01 苏州市晶协高新电子材料有限公司 一种抛光剂及其制备方法
CN106811751A (zh) * 2017-02-16 2017-06-09 河南科技学院 一种304不锈钢化学机械抛光用抛光剂和抛光液及其制备方法

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WO2019006605A1 (zh) 2019-01-10

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