CN110846154A - Plate-attachment-preventing cleaning agent for OLED organic evaporation equipment and application - Google Patents
Plate-attachment-preventing cleaning agent for OLED organic evaporation equipment and application Download PDFInfo
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- CN110846154A CN110846154A CN201910814344.9A CN201910814344A CN110846154A CN 110846154 A CN110846154 A CN 110846154A CN 201910814344 A CN201910814344 A CN 201910814344A CN 110846154 A CN110846154 A CN 110846154A
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- cleaning agent
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- 239000012459 cleaning agent Substances 0.000 title claims abstract description 33
- 238000001704 evaporation Methods 0.000 title claims abstract description 18
- 230000008020 evaporation Effects 0.000 title claims abstract description 18
- 239000002904 solvent Substances 0.000 claims description 20
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 18
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 18
- 238000003756 stirring Methods 0.000 claims description 18
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 claims description 12
- 238000002791 soaking Methods 0.000 claims description 9
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 claims description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 6
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000002957 persistent organic pollutant Substances 0.000 claims description 6
- 150000001412 amines Chemical class 0.000 claims description 5
- 150000002576 ketones Chemical class 0.000 claims description 5
- 150000002895 organic esters Chemical class 0.000 claims description 5
- 150000003457 sulfones Chemical class 0.000 claims description 5
- 150000003462 sulfoxides Chemical class 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 4
- 239000000498 cooling water Substances 0.000 claims description 4
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 claims description 3
- MBDUIEKYVPVZJH-UHFFFAOYSA-N 1-ethylsulfonylethane Chemical compound CCS(=O)(=O)CC MBDUIEKYVPVZJH-UHFFFAOYSA-N 0.000 claims description 3
- DKUITGQKEJLOBE-UHFFFAOYSA-N 2-(2-phenylethylsulfonyl)ethylbenzene Chemical compound C=1C=CC=CC=1CCS(=O)(=O)CCC1=CC=CC=C1 DKUITGQKEJLOBE-UHFFFAOYSA-N 0.000 claims description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 3
- RBNJVRRKUAPBKK-UHFFFAOYSA-N C(C)(O)O.C(C(=O)O)(=O)O Chemical compound C(C)(O)O.C(C(=O)O)(=O)O RBNJVRRKUAPBKK-UHFFFAOYSA-N 0.000 claims description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 3
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 3
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims 1
- 238000005516 engineering process Methods 0.000 abstract description 8
- 238000004140 cleaning Methods 0.000 abstract description 3
- 239000002245 particle Substances 0.000 abstract description 3
- 230000007547 defect Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000003344 environmental pollutant Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/266—Esters or carbonates
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3218—Alkanolamines or alkanolimines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3263—Amides or imides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/34—Organic compounds containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- General Chemical & Material Sciences (AREA)
- Detergent Compositions (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The invention provides an OLED organic evaporation equipment anti-sticking plate cleaning agent and application, introduces proportion, manufacture and application, and aims to overcome the defects of the prior cleaning technology, namely the problem that a plurality of residual organic matters invisible to naked eyes (visible through a microscope ultraviolet lamp) exist in a cleaned anti-sticking plate to form a particle source.
Description
Technical Field
The invention relates to a plate-attachment-preventing cleaning agent for OLED organic evaporation equipment and application thereof.
Background
With the continuous development and change of panel display technologies, the conventional electronic tube and liquid crystal transistor display technologies are gradually mature, and based on Organic Light Emitting Diodes (OLEDs) as a novel pure solid display technology, the OLED display technology has the previous technical advantages, and has the advantages of unique self-luminescence, ultra-Light and thinness, fast response, wide viewing angle and the like, and is widely concerned, so that the OLED display technology has been widely researched and produced.
The organic light emitting layer in the OLED display is usually prepared by vacuum evaporation technology, i.e. in a vacuum chamber, the evaporation material in a crucible is heated to evaporate and deposit on the target substrate. In the organic vapor deposition process, organic matters adsorbed on the surface are gradually accumulated to form particles after the anti-sticking plate is used for a period of time, so that the anti-sticking plate needs to be disassembled and cleaned regularly. As shown in fig. 1, the existing cleaning method is mainly to remove the residual organic matters (visible through a microscope ultraviolet lamp) invisible to naked eyes in the cleaned anti-sticking plate by soaking in organic solvents such as pure pyrrolidone, and the glass substrate is scrapped after the anti-sticking plate is installed in equipment to form particles. Therefore, it is important to develop a cleaning agent for completely removing the organic film. So far, no relevant documents about the cleaning agent are reported.
Disclosure of Invention
The invention aims to provide a plate-attachment-preventing cleaning agent for OLED organic evaporation equipment and application thereof, so as to solve the problems in the background technology.
In order to achieve the purpose, the invention provides the following technical scheme: the cleaning agent comprises the following components in parts by weight:
40-60 parts of organic ketone solvent
15-20 parts of organic amine solvent
10-15 parts of organic ester solvent
10-15 parts of organic sulfone and sulfoxide solvents;
wherein the organic ketone solvent is one or the combination of more than two of acetone, phenyl methyl ketone, N-methyl pyrrolidone and N-ethyl pyrrolidone.
Wherein the organic amine solvent is one or the combination of more than two of monoethanolamine, diethanolamine, triethanolamine and N, N-dimethylformamide;
wherein the organic ester solvent is one or the combination of more than two of ethyl acetate, butyl acetate and ethanedioic acid ethanediol;
wherein the organic sulfone and sulfoxide solvent is one or more of dimethyl sulfone, phenethyl sulfone, diethyl sulfone, diphenyl sulfone and sulfolane.
Preferably, the cleaning agent comprises the following components in percentage by weight:
55 parts of N-methylpyrrolidone
15 parts of N, N-dimethylformamide
5 parts of monoethanolamine
Ethyl acetate 15 parts
10 parts of dimethyl sulfone.
Preferably, the preparation method of the cleaning agent for the anti-adhesion plate of the OLED organic evaporation equipment comprises the following steps:
and (2) adding the components in parts by weight into a stirring kettle in sequence, wherein the stirring speed is controlled to be 30-50 revolutions per minute, cooling the stirring kettle in a jacket by using cooling water, the temperature is controlled to be below 40 ℃, and slowly stirring the components at normal temperature for 30 minutes to obtain the cleaning agent.
Preferably, the organic vapor deposition equipment anti-adhesion plate is soaked in the cleaning agent for 30-60 min at the temperature of 40-60 ℃, so that organic pollutants on the surface of the anti-adhesion plate are removed; the temperature is 50 ℃; the soaking time is 60 min.
Compared with the prior art, the invention has the beneficial effects that: the cleaning agent is a neutral organic solvent formula, and organic pollutants attached to the anti-sticking plate of the evaporation equipment are quickly dissolved by using the organic solvent, so that the pollutants are separated from the surface of the anti-sticking plate, as shown in figure 2, the organic pollutants are thoroughly removed through the observation of a microscopic ultraviolet lamp, meanwhile, the corrosion of the anti-sticking plate is small, and the method has the advantages of low use cost and thorough cleaning effect.
Drawings
FIG. 1 shows that pure pyrrolidone is used for soaking and removing a membrane in the traditional method.
FIG. 2 shows the membrane removal by soaking the repellent plate according to the example.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The invention provides a technical scheme that: the cleaning agent comprises the following components in parts by weight:
40-60 parts of organic ketone solvent
15-20 parts of organic amine solvent
10-15 parts of organic ester solvent
10-15 parts of organic sulfone and sulfoxide solvents;
wherein the organic ketone solvent is one or the combination of more than two of acetone, phenyl methyl ketone, N-methyl pyrrolidone and N-ethyl pyrrolidone.
Wherein the organic amine solvent is one or the combination of more than two of monoethanolamine, diethanolamine, triethanolamine and N, N-dimethylformamide;
wherein, the organic ester solvent is one or the combination of more than two of ethyl acetate, butyl acetate and ethanedioic acid ethanediol.
Wherein the organic sulfone and sulfoxide solvent is one or more of dimethyl sulfone, phenethyl sulfone, diethyl sulfone, diphenyl sulfone and sulfolane.
The cleaning agent comprises the following components in percentage by weight:
55 parts of N-methylpyrrolidone
15 parts of N, N-dimethylformamide
5 parts of monoethanolamine
Ethyl acetate 15 parts
10 parts of dimethyl sulfone.
A preparation method of a cleaning agent for an OLED organic evaporation equipment anti-sticking plate comprises the following steps:
the cleaning agent is prepared by the following steps of sequentially adding the components into a stirring kettle according to the parts by weight in the claim 2, wherein the stirring speed is controlled to be 30-50 revolutions per minute, cooling the stirring kettle by using cooling water in a jacket of the stirring kettle, controlling the temperature to be below 40 ℃, and slowly stirring for 30 minutes at normal temperature.
The application of the cleaning agent for the anti-sticking plate of the OLED organic evaporation equipment comprises the steps of soaking the anti-sticking plate of the OLED organic evaporation equipment in the cleaning agent for 30-60 min at the temperature of 40-60 ℃ to remove organic pollutants on the surface of the anti-sticking plate; the temperature is 50 ℃; the soaking time is 60 min.
Example (b):
adding 55kg of N-methyl pyrrolidone, 15kg of N, N-dimethylformamide, 5kg of monoethanolamine, 15kg of ethyl acetate and 10kg of dimethyl sulfone into a stirring kettle in sequence, wherein the stirring speed is controlled at 30 revolutions per minute, cooling by using cooling water in a jacket of the stirring kettle at the temperature below 40 ℃, and slowly stirring at normal temperature for 30 minutes to obtain the cleaning agent.
Soaking the vapor deposition equipment anti-sticking plate for 60min by using the cleaning agent with the components at the temperature of 60 ℃ so as to thoroughly remove organic pollutants, and observing by a microscopic ultraviolet lamp to ensure that no visible pollutant remains on the surface.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (4)
1. An OLED organic evaporation equipment anti-sticking plate cleaning agent and application are characterized in that: the cleaning agent comprises the following components in parts by weight:
wherein the organic ketone solvent is one or the combination of more than two of acetone, phenyl methyl ketone, N-methyl pyrrolidone and N-ethyl pyrrolidone.
Wherein the organic amine solvent is one or the combination of more than two of monoethanolamine, diethanolamine, triethanolamine and N, N-dimethylformamide;
wherein the organic ester solvent is one or the combination of more than two of ethyl acetate, butyl acetate and ethanedioic acid ethanediol;
wherein the organic sulfone and sulfoxide solvent is one or more of dimethyl sulfone, phenethyl sulfone, diethyl sulfone, diphenyl sulfone and sulfolane.
2. The OLED organic evaporation equipment anti-adhesion plate cleaning agent and the application thereof according to claim 1, wherein the OLED organic evaporation equipment anti-adhesion plate cleaning agent comprises the following components in parts by weight: the cleaning agent comprises the following components in percentage by weight:
3. the OLED organic evaporation equipment anti-adhesion plate cleaning agent and the application thereof according to claim 1, wherein the OLED organic evaporation equipment anti-adhesion plate cleaning agent comprises the following components in parts by weight: a preparation method of a cleaning agent for an OLED organic evaporation equipment anti-sticking plate comprises the following steps:
the cleaning agent is prepared by the following steps of sequentially adding the components into a stirring kettle according to the parts by weight in the claim 2, wherein the stirring speed is controlled to be 30-50 revolutions per minute, cooling the stirring kettle by using cooling water in a jacket of the stirring kettle, controlling the temperature to be below 40 ℃, and slowly stirring for 30 minutes at normal temperature.
4. The use of the cleaning agent for the protective plate of the OLED organic evaporation equipment as claimed in claim 1, wherein the cleaning agent comprises: soaking the organic vapor deposition equipment anti-sticking plate in the cleaning agent for 30-60 min at the temperature of 40-60 ℃ to remove organic pollutants on the surface of the anti-sticking plate; the temperature is 50 ℃; the soaking time is 60 min.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201910814344.9A CN110846154A (en) | 2019-08-30 | 2019-08-30 | Plate-attachment-preventing cleaning agent for OLED organic evaporation equipment and application |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201910814344.9A CN110846154A (en) | 2019-08-30 | 2019-08-30 | Plate-attachment-preventing cleaning agent for OLED organic evaporation equipment and application |
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CN110846154A true CN110846154A (en) | 2020-02-28 |
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CN201910814344.9A Pending CN110846154A (en) | 2019-08-30 | 2019-08-30 | Plate-attachment-preventing cleaning agent for OLED organic evaporation equipment and application |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112474656A (en) * | 2020-12-10 | 2021-03-12 | 四川富乐德科技发展有限公司 | Cleaning and regenerating method for organic evaporation source ceramic crucible |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020119901A1 (en) * | 1995-01-20 | 2002-08-29 | 3M Innovative Properties Company | Coating compositions |
CN104781732A (en) * | 2012-11-20 | 2015-07-15 | 东进世美肯株式会社 | Photoresist stripping fluid composition and method of stripping photoresist |
CN108424818A (en) * | 2017-02-14 | 2018-08-21 | 东友精细化工有限公司 | Cleaning masks liquid composition |
CN109415798A (en) * | 2017-06-26 | 2019-03-01 | Agc株式会社 | The cleaning method and flushing composition of the mask of vacuum evaporation |
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2019
- 2019-08-30 CN CN201910814344.9A patent/CN110846154A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020119901A1 (en) * | 1995-01-20 | 2002-08-29 | 3M Innovative Properties Company | Coating compositions |
CN104781732A (en) * | 2012-11-20 | 2015-07-15 | 东进世美肯株式会社 | Photoresist stripping fluid composition and method of stripping photoresist |
CN108424818A (en) * | 2017-02-14 | 2018-08-21 | 东友精细化工有限公司 | Cleaning masks liquid composition |
CN109415798A (en) * | 2017-06-26 | 2019-03-01 | Agc株式会社 | The cleaning method and flushing composition of the mask of vacuum evaporation |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112474656A (en) * | 2020-12-10 | 2021-03-12 | 四川富乐德科技发展有限公司 | Cleaning and regenerating method for organic evaporation source ceramic crucible |
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