CN110797472B - Display substrate, display device and manufacturing method of display substrate - Google Patents

Display substrate, display device and manufacturing method of display substrate Download PDF

Info

Publication number
CN110797472B
CN110797472B CN201911039956.1A CN201911039956A CN110797472B CN 110797472 B CN110797472 B CN 110797472B CN 201911039956 A CN201911039956 A CN 201911039956A CN 110797472 B CN110797472 B CN 110797472B
Authority
CN
China
Prior art keywords
layer
substrate
light
area
display substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201911039956.1A
Other languages
Chinese (zh)
Other versions
CN110797472A (en
Inventor
熊建清
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vivo Mobile Communication Co Ltd
Original Assignee
Vivo Mobile Communication Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vivo Mobile Communication Co Ltd filed Critical Vivo Mobile Communication Co Ltd
Priority to CN201911039956.1A priority Critical patent/CN110797472B/en
Publication of CN110797472A publication Critical patent/CN110797472A/en
Application granted granted Critical
Publication of CN110797472B publication Critical patent/CN110797472B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
    • H10K59/65—OLEDs integrated with inorganic image sensors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

The invention provides a display substrate, a display device and a manufacturing method of the display substrate; the display substrate comprises a substrate base plate, a flat layer and an electrode layer, the flat layer is located between the substrate base plate and the electrode layer, the flat layer comprises a light-transmitting area, the orthographic projection of the electrode layer in the light-transmitting area is located in a flat layer graph, and an area, except the flat layer graph, of the light-transmitting area is a first hollow area. The technical scheme provided by the invention solves the problem of low light transmittance of the conventional display substrate.

Description

Display substrate, display device and manufacturing method of display substrate
Technical Field
The invention relates to the technical field of communication, in particular to a display substrate, a display device and a manufacturing method of the display substrate.
Background
With the rapid development of technology, the under-screen photosensitive module has become one of the main development trends of the current terminal devices. To ensure the light sensing effect of the light sensing module, the light sensing module under the screen needs the light sensing sensor to receive enough light flux within a limited time. However, the conventional design of the display substrate has a problem of low light transmittance.
Disclosure of Invention
The embodiment of the invention provides a display substrate, a display device and a manufacturing method of the display substrate, and aims to solve the problem that the light transmittance of the existing display substrate is low.
In order to solve the problems, the invention is realized as follows:
in a first aspect, an embodiment of the present invention provides a display substrate, including a substrate, a flat layer, and an electrode layer, where the flat layer is located between the substrate and the electrode layer, the flat layer includes a light-transmitting area, an orthographic projection of an electrode of the electrode layer in the light-transmitting area is located in a flat layer pattern, and an area of the light-transmitting area, excluding the flat layer pattern, is a first hollow-out area.
In a second aspect, embodiments of the present invention further provide a display device, where the display device includes the display substrate as described in the first aspect.
In a third aspect, an embodiment of the present invention further provides a method for manufacturing a display substrate, where the method is applied to the display substrate in the first aspect, and the method includes the following steps:
providing a substrate base plate;
forming a flat layer on the substrate, and processing the flat layer to form a light-transmitting area;
forming an electrode layer on one side of the flat layer, which is opposite to the substrate base plate;
the orthographic projection of the electrode layer in the light transmission area is located in the flat layer pattern of the light transmission area, and the area of the light transmission area except the flat layer pattern is a first hollow area.
According to the display substrate provided by the embodiment of the invention, the flat layer comprises the light-transmitting area, the area except the flat layer pattern in the light-transmitting area is the first hollow-out area, the first hollow-out area cannot cause any influence on the light passing, the light can almost pass through the first hollow-out area without attenuation, the light flux attenuation cannot be caused, the light transmittance of the light-transmitting area is further increased, and the light transmittance of the display substrate is further increased.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required to be used in the description of the embodiments of the present invention will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.
Fig. 1 is a structural diagram of a display substrate according to an embodiment of the present invention;
FIG. 2 is a block diagram of a light emitting structure in the display substrate provided in FIG. 1;
FIG. 3 is a block diagram of a planarization layer in the display substrate provided in FIG. 1;
FIG. 4 is a diagram of another display substrate according to an embodiment of the present invention;
FIG. 5 is a block diagram of a planarization layer in the display substrate provided in FIG. 4;
fig. 6 is a flowchart of a method for manufacturing a display substrate according to an embodiment of the invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
An embodiment of the present invention provides a display substrate, referring to fig. 1 to 5, the display substrate includes a substrate 101, a flat layer 113 and an electrode layer 114, the flat layer 113 is located between the substrate 101 and the electrode layer 114, the flat layer 113 includes a light-transmitting region, an orthogonal projection of an electrode of the electrode layer 114 in the light-transmitting region is located in a flat layer pattern 1131, and a region of the light-transmitting region excluding the flat layer pattern 1131 is a first hollow region 1130.
The light-transmitting region may be a partial region of the planarization layer 113, or the entire planarization layer 113 may be the light-transmitting region. The transparent region includes a first hollow region 1130, and the first hollow region 1130 may be designed by etching a portion of the transparent region except for the planarization layer 1131 to remove the portion, so that the transparent region includes only the planarization layer 1131.
Optionally, the display substrate provided in the embodiment of the present invention may be an AMOLED (Active-Matrix organic Light Emitting Diode) display substrate, a PMOLE (Passive Matrix OLED), or a QLED (Quantum Dot Emitting Diode). The display substrate mainly comprises a substrate, a thin film transistor and a light-emitting structure; the thin film transistor mainly includes a gate electrode layer (GE), a source/drain electrode metal layer (SD), and the like.
Referring to fig. 1, the electrode layer 114 is disposed on a side of the planarization layer 113 opposite to the substrate 101, and an orthogonal projection of the electrode layer 114 in the light-transmitting area of the planarization layer 113 is disposed in the planarization layer pattern 1131, that is, the planarization layer pattern 1131 in the light-transmitting area covers under the electrode of the electrode layer 114, so as to ensure uniformity of the surface of the light-emitting position of the display substrate during evaporation. The area of the transparent area except for the flat layer pattern 1131 is the first hollow-out area 1130, the first hollow-out area 1130 does not affect the light passing therethrough, the light can pass through the first hollow-out area 1130 almost without attenuation, the light flux attenuation is not caused, the light transmittance of the transparent area is increased, and the light transmittance of the display substrate is increased.
Such design more is favorable to the display substrates to be applied to and installs in the display device of sensitization module under the screen, and sensitization module can be just setting up the light-permeable zone to display substrates under the screen, and the orthographic projection that also is the sensitization module for display substrates is located the light-permeable zone. The design of the first hollow area 1130 in the light-transmitting area enables the light-transmitting area to have good light transmittance, so that the light flux requirement of the photosensitive module is met, and the photosensitive function of the photosensitive module is ensured. For example, the photosensitive module can be fingerprint identification module under the screen or the camera module under the screen, and the design of first hollow area 1130 also more is favorable to the unblock of optics fingerprint or the formation of image of camera under the screen.
Referring to fig. 1 and 4, the display substrate further includes a supporting pillar 116, the supporting pillar 116 is located on a side of the electrode layer 114 opposite to the substrate 101, and an orthogonal projection of the supporting pillar 116 in the light-transmitting region is located in the flat layer pattern 1131. The electrode layer 114 is located on a side of the flat layer 113 opposite to the substrate base 101, the supporting pillar 116 is located on a side of the electrode layer 114 opposite to the flat layer 113, and an orthogonal projection of the electrode layer 114 in the light-transmitting region and an orthogonal projection of the supporting pillar 116 in the light-transmitting region are both located in the flat layer pattern 1131, for example, an orthogonal projection of the electrode layer 114 in the light-transmitting region may overlap with an orthogonal projection of the supporting pillar 116 in the light-transmitting region, or may be adjacent to both of the orthogonal projections. That is, the flat layer patterns 1131 of the transparent region are located within the coverage of the supporting pillars 116 to ensure the Panel step.
Optionally, referring to fig. 1 and fig. 2, the display substrate further includes a source/drain metal layer 112 located between the substrate 101 and the planarization layer 113, and the planarization layer pattern 1131 covers the pattern of the source/drain metal layer 112 in the orthogonal projection of the source/drain metal layer 112. The transparent region of the planarization layer 1131 (shown as the three vertical frame shadows in fig. 2) covers the pattern of the source/drain metal layer 112, so as to ensure that the pattern of the source/drain metal layer 112 is not exposed, and prevent the electrode layer 114 from damaging the pattern of the source/drain metal layer 112 by acid solution during etching.
Alternatively, referring to fig. 4, in some embodiments, the display substrate may include a source/drain metal layer 112 and an inorganic protection layer 119, the source/drain metal layer 112 is located on a side of the substrate 101 facing the planarization layer 113, the inorganic protection layer 119 is located between the source/drain metal layer 112 and the planarization layer 113, and the first hollow region 1130 covers a pattern of the source/drain metal layer 112. It can be understood that the inorganic protection layer 119 can protect the source/drain metal layer 112, so as to prevent the pattern of the source/drain metal layer 112 from being exposed, and further prevent the electrode layer 114 from damaging the pattern of the source/drain metal layer 112 by acid solution during etching. In this embodiment, due to the arrangement of the inorganic protection layer 119, the planarization layer pattern 1131 does not need to cover the pattern of the source/drain metal layer 112, and further the first hollow-out region 1130 covers the pattern of the source/drain metal layer 112, so that the range of the first hollow-out region 1130 in the light-transmitting region is further increased (as shown in fig. 5), and the light transmittance of the light-transmitting region is also increased.
In the embodiment of the present invention, the display substrate further includes a pixel defining layer 115 located on a side of the flat layer 113 opposite to the substrate 101, where the pixel defining layer 115 includes a second hollow area, and the second hollow area is opposite to the first hollow area 1130. That is, the pixel defining layer 115 also includes a design of a hollow area, and an area of the pixel defining layer 115 except for the pixel defining layer pattern is a second hollow area. The second hollow area is opposite to the first hollow area 1130, for example, the second hollow area covers the first hollow area 1130. Due to the design, light rays cannot be attenuated when passing through the second hollow-out area of the pixel defining layer 115 and the first hollow-out area 1130 of the flat layer 113, and light transmittance of the display substrate is further increased.
In a preferred embodiment, the electrode layer 114 is an anode layer. The display substrate may include a substrate 101, a source-drain metal layer 112(SD), an inorganic protective layer 119(PV), a planarization layer 113(PLN), an Anode layer (Anode), a pixel defining layer 115(PDL), and a support pillar 116(PS) which are sequentially disposed. The planarization layer 113 includes a transparent region, and the transparent region includes a first hollow region 1130, and the first hollow region 1130 covers the pattern of the source/drain metal layer 112; the pixel defining layer 115 includes a second hollow area, and the second hollow area is disposed opposite to the first hollow area 1130; the orthographic projection of the support posts 116 in the light-transmitting region is located within the planar layer pattern 1131. Like this for display substrate has great luminousness, more is favorable to display substrate to be applied to and installs in the display device of sensitization module under the screen.
In an embodiment of the invention, referring to fig. 1 specifically, the substrate 101 may refer to a first substrate, and the display substrate may further include a first buffer layer (PB1)102, a second substrate (PI2)103, a second buffer layer (PB2)104, a protection layer 105, a first gate insulating layer (GI1)106, an active layer (Poly)107, a first gate layer (GE1)109, a second gate insulating layer (GI2)108, a second gate layer (GE2)111, an intermediate Insulating Layer (ILD)110, a source/drain metal layer (SD)112, an organic Planarization Layer (PLN)113, an Anode layer (Anode), a Pixel Definition Layer (PDL)115, a support layer (PS)116, a Cathode layer (Cathode)117, and a package layer 118, which are sequentially disposed. In the above embodiment, the electrode layer 114 is an anode layer.
It can be understood that the light emitting structure mainly includes a first electrode layer, a second electrode layer, and a light emitting unit between the first electrode layer and the second electrode layer. As shown in fig. 2, when the display substrate is an AMOLED, a Hole Injection Layer (HIL)121, a Hole Transport Layer (HTL)122, an emission layer (EML)123, an Electron Transport Layer (ETL)124, and an Electron Injection Layer (EIL)125 may be sequentially disposed between the Anode layer (Anode) and the Cathode layer (Cathode) 117. It should be noted that, the specific positional relationship of the above structural layers in the display substrate may refer to the prior art, and is not described herein again.
An embodiment of the present invention further provides a display device, including the display substrate described in the above embodiment. The display device comprises all technical characteristics of the display substrate, can achieve the same technical effect, and is not repeated herein for avoiding repetition.
The display device may be a cell phone, a tablet computer, an e-book reader, an MP3 player, an MP4 player, a digital camera, a laptop portable computer, a car computer, a desktop computer, a smart tv, a wearable device, etc.
In the embodiment of the invention, the display device further comprises a photosensitive module, the photosensitive module is positioned on one side of the substrate in the display substrate, which is back to the flat layer, and the orthographic projection of the photosensitive module relative to the display substrate is positioned in the light-transmitting area. That is to say, the sensitization module is sensitization module under the screen, and light need pass display substrate and just can be received by sensitization module. As described above, the light-transmitting area includes the design of the first hollow area, so that the light transmittance of the light-transmitting area is higher, and the photosensitive module is arranged just opposite to the light-transmitting area of the flat layer, thereby ensuring that the photosensitive module can receive a larger luminous flux and ensuring the photosensitive function of the photosensitive module.
Optionally, the sensitization module can be fingerprint identification module or camera module, and the design in the first fretwork district just also more is favorable to the unblock of optics fingerprint or the formation of image of camera under the screen in the printing opacity district to promote the smooth and easy nature that sensitization module function realized.
The embodiment of the invention also provides a manufacturing method of the display substrate, which is applied to the display substrate. Referring to fig. 6, the method for manufacturing the display substrate includes the following steps:
step 601, providing a substrate.
Alternatively, the substrate may be a flexible substrate, a transparent substrate, or the like.
In the embodiment of the present invention, the buffer layer may include a first substrate board (PI1) and a second substrate board (PI2), a first buffer layer (PB1) may be further formed between the first substrate board and the second substrate board, and a second buffer layer (PB2) may be formed on a side of the second substrate board facing away from the first buffer layer. The substrate and the buffer layer used in the present embodiment may refer to related technologies, and are not limited herein.
Step 602, forming a flat layer on the substrate, and forming a light-transmitting area on the flat layer, where an area of the light-transmitting area except for a flat layer pattern is a first hollow-out area.
The transparent region may be a partial region of the flat layer, or the entire flat layer may be the transparent region. The light-transmitting area comprises a first hollowed-out area, the first hollowed-out area can be formed by etching areas except for flat layer patterns in the light-transmitting area to remove the flat layer patterns, the light-transmitting area only comprises the flat layer patterns, the first hollowed-out area cannot attenuate the luminous flux of light passing through, the light transmittance of the light-transmitting area is increased, and the light transmittance of the display substrate is also increased.
Optionally, the method may further include: forming a pixel limiting layer on one side of the flat layer, which is opposite to the substrate base plate, and forming a second hollow-out area on the pixel limiting layer, wherein the second hollow-out area is opposite to the first hollow-out area. For example, the area of the pixel defining layer except for the pixel defining layer pattern may be etched to be removed, so as to form the second hollow area.
The second hollow area is opposite to the first hollow area, for example, the second hollow area covers the first hollow area. By adopting the design, the light transmittance of the display substrate is further increased.
Step 603, forming an electrode layer on one side of the flat layer, which is opposite to the substrate, wherein the orthographic projection of the electrode layer in the light-transmitting area is positioned in the flat layer pattern.
In this embodiment, the electrode layer is an anode layer. That is, the electrode pattern of the anode layer covers the flat layer pattern of the light-transmitting region to ensure the uniformity of the surface of the light-emitting position of the display substrate during evaporation.
Further, the method may further include: and forming a supporting column on one side of the pixel defining layer, which is opposite to the flat layer, wherein the orthographic projection of the supporting column relative to the light transmission area in the flat layer is positioned in the flat layer pattern so as to ensure the Panel section difference.
Optionally, before the step 602, the method may further include: forming a source drain metal layer on the substrate, and forming an inorganic protective layer on one side of the source drain metal layer, which is opposite to the substrate, wherein the inorganic protective layer is positioned between the flat layer and the source drain metal layer; and the first hollow-out area of the flat layer covers the pattern of the source electrode and drain electrode metal layer.
The inorganic protective layer can protect the source electrode and drain electrode metal layer, so that the pattern of the source electrode and drain electrode metal layer is prevented from being exposed, and the pattern of the source electrode and drain electrode metal layer can be prevented from being damaged by acid liquor during etching of the electrode layer. In this embodiment, due to the arrangement of the inorganic protective layer, the pattern of the flat layer does not need to cover the pattern of the source/drain metal layer, and further the first hollow-out region covers the pattern of the source/drain metal layer, so that the range of the first hollow-out region in the light-transmitting region is further increased, and the light transmittance of the light-transmitting region is also increased.
In this embodiment, a protection layer, a first gate insulating layer (GI1), a first gate layer (GE1), a second gate insulating layer (GI2), a second gate layer (GE2), an intermediate Insulating Layer (ILD), and the like may be further formed between the substrate and the source/drain metal layer; the electrode layer is an anode layer, and a cathode layer can be formed on one side of the pixel limiting layer, which is back to the substrate; a Hole Injection Layer (HIL), a Hole Transport Layer (HTL), an emission layer (EML), an Electron Transport Layer (ETL), an Electron Injection Layer (EIL), etc. sequentially formed between the anode layer and the cathode layer, and a specific preparation method may refer to the related art and is not further limited herein.
The specific structure of the display substrate prepared in this embodiment may refer to the description in the foregoing display substrate embodiment, and is not repeated herein.
The display substrate of this embodiment preparation, through the printing opacity district that includes first fretwork district in the flat layer formation for first fretwork district can not cause the hindrance to light, just can not cause the decay to luminous flux yet, and then has increased display substrate's luminousness, more helps display substrate to use in the display device who is provided with sensitization module under the screen, in order to satisfy the demand that sensitization module was to luminous flux under the screen.
The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily think of the changes or substitutions within the technical scope of the present invention, and shall cover the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.

Claims (8)

1. A display substrate is characterized by comprising a substrate base plate, a flat layer and an electrode layer, wherein the flat layer is positioned between the substrate base plate and the electrode layer and comprises a light-transmitting area, the orthographic projection of the electrode layer in the light-transmitting area is positioned in a flat layer pattern, and the area of the light-transmitting area except the flat layer pattern is a first hollow area;
the display substrate further comprises a pixel limiting layer positioned on one side of the flat layer, which faces away from the substrate, and the pixel limiting layer covers the first hollow-out area;
the display substrate further comprises a source drain metal layer and an inorganic protective layer, the source drain metal layer is located on one side, facing the flat layer, of the substrate, the inorganic protective layer is located between the source drain metal layer and the flat layer, and the first hollow-out area covers the graph of the source drain metal layer; and thinning the pixel limiting layer corresponding to the pattern of the source electrode and drain electrode metal layer.
2. The display substrate of claim 1, further comprising a support pillar on a side of the electrode layer facing away from the substrate, wherein an orthographic projection of the support pillar in the light transmissive region is within the flat layer pattern.
3. The display substrate of claim 1, further comprising a source drain metal layer between the substrate and the planarization layer, wherein the planarization layer pattern covers the pattern of the source drain metal layer in an orthographic projection of the source drain metal layer.
4. The display substrate of claim 1, wherein the electrode layer is an anode layer.
5. A display device comprising the display substrate according to any one of claims 1 to 4.
6. The display device according to claim 5, further comprising a photosensitive module located on a side of the substrate base plate facing away from the flat layer, wherein an orthographic projection of the photosensitive module on the display base plate is located in the light-transmitting region.
7. The display device according to claim 6, wherein the photosensitive module is a camera module or a fingerprint recognition module.
8. A method for manufacturing a display substrate, applied to the display substrate according to any one of claims 1 to 4, the method comprising the steps of:
providing a substrate base plate;
forming a flat layer on the substrate, and forming a light-transmitting area on the flat layer, wherein the area of the light-transmitting area except for the flat layer pattern is a first hollow-out area;
forming an electrode layer on one side of the flat layer, which is opposite to the substrate base plate;
and the orthographic projection of the electrode layer in the light transmission area is positioned in the flat layer pattern of the light transmission area.
CN201911039956.1A 2019-10-29 2019-10-29 Display substrate, display device and manufacturing method of display substrate Active CN110797472B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201911039956.1A CN110797472B (en) 2019-10-29 2019-10-29 Display substrate, display device and manufacturing method of display substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201911039956.1A CN110797472B (en) 2019-10-29 2019-10-29 Display substrate, display device and manufacturing method of display substrate

Publications (2)

Publication Number Publication Date
CN110797472A CN110797472A (en) 2020-02-14
CN110797472B true CN110797472B (en) 2022-09-02

Family

ID=69442047

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201911039956.1A Active CN110797472B (en) 2019-10-29 2019-10-29 Display substrate, display device and manufacturing method of display substrate

Country Status (1)

Country Link
CN (1) CN110797472B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113421891A (en) * 2021-07-15 2021-09-21 合肥维信诺科技有限公司 Array substrate and OLED display panel
CN114093277A (en) * 2021-12-09 2022-02-25 武汉华星光电半导体显示技术有限公司 Splicing screen

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5303818B2 (en) * 2001-09-18 2013-10-02 パナソニック株式会社 Organic electroluminescent display panel and manufacturing method thereof
CN103985717A (en) * 2014-05-13 2014-08-13 京东方科技集团股份有限公司 Array substrate, manufacturing method of array substrate, and display device
CN104201292B (en) * 2014-08-27 2019-02-12 京东方科技集团股份有限公司 A kind of organic electroluminescence device and preparation method thereof
CN109065587A (en) * 2018-08-07 2018-12-21 京东方科技集团股份有限公司 Display base plate and its manufacturing method, display device

Also Published As

Publication number Publication date
CN110797472A (en) 2020-02-14

Similar Documents

Publication Publication Date Title
US11812640B2 (en) Display substrate having a projection of the display layer located within a projection of a light shielding layer, display device and transparent display including the same
CN109103231B (en) Display substrate, manufacturing method thereof and display device
US20210132726A1 (en) Flexible display apparatus
US10665644B2 (en) Organic light emitting display panel and fabricating method thereof, display device
CN110797379B (en) Display substrate, display device and manufacturing method of display substrate
US11967620B2 (en) Thin film transistor, method of manufacturing the same and display device
US9825112B2 (en) Array substrate, display panel and display device
US9853237B2 (en) Curved display apparatus
US20220310721A1 (en) Display panel, manufacturing method thereof and display device
US6780688B2 (en) AMEL display panel and method for fabricating the same
US20200176720A1 (en) Display panel and method of manufacturing the same
US11289685B2 (en) Display panel with patterned light absorbing layer, and manufacturing method thereof
US10651244B2 (en) Touch display panel, method for fabricating the same, and display device
US9583646B2 (en) Bottom-emitting substrate, display device and manufacturing method of substrate
US11796913B2 (en) Organic light-emitting display device and manufacturing method thereof
CN110797472B (en) Display substrate, display device and manufacturing method of display substrate
CN110783387A (en) Display substrate, display device and manufacturing method of display substrate
US11521936B2 (en) Display substrate and method of manufacturing the same, and display panel
CN110767725B (en) Display substrate, display device and manufacturing method of display substrate
KR101660914B1 (en) Flexible Display Device
US11963431B2 (en) Mask, flexible display panel and manufacturing method thereof
CN111863909A (en) Display substrate, manufacturing method thereof and display device
KR20210054650A (en) Display apparatus and method of manufacturing the same
CN111223886A (en) Display screen and electronic equipment
KR102430817B1 (en) display device

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant