CN110791738A - Vacuum magnetron sputtering ion coating process for hub - Google Patents
Vacuum magnetron sputtering ion coating process for hub Download PDFInfo
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- CN110791738A CN110791738A CN201910957051.6A CN201910957051A CN110791738A CN 110791738 A CN110791738 A CN 110791738A CN 201910957051 A CN201910957051 A CN 201910957051A CN 110791738 A CN110791738 A CN 110791738A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/028—Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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Abstract
The invention discloses a vacuum magnetron sputtering ion coating process for a hub, which has the technical scheme key points that: the method specifically comprises the following steps: s1, preparing a silicon dioxide target material: selecting silicon dioxide powder and an adhesive accounting for 0.02-0.1% of the mass ratio of the silicon dioxide powder to initially prepare a silicon dioxide target rod; s2, refining the silicon dioxide target material; s3, polishing the hub: placing the aluminum alloy wheel hub in a vibration grinder filled with grinding materials, wherein the grinding materials adopt 80-100 mesh carborundum and 70-90 mesh brown corundum grinding stones; s4, pre-vacuum magnetron sputtering coating: placing the polished aluminum alloy hub in the step S3 in the middle of a coating chamber in a vacuum magnetron sputtering coating machine; s5, vacuum magnetron sputtering coating; according to the process, silicon dioxide adopted when the surface of the hub is plated with silicon is used as a target source, and the cost of the silicon dioxide is lower than that of a silicon simple substance, so that the cost can be greatly reduced; and the silicon die plated on the surface of the hub has good adhesiveness and is not easy to fall off.
Description
Technical Field
The invention relates to the field of hub coating, in particular to a vacuum magnetron sputtering ion coating process for a hub.
Background
Common automobile hubs include steel hubs and aluminum alloy hubs. The steel hub has high strength and is commonly used for large trucks; however, the steel hub has heavy mass and single appearance, is not in line with the current low-carbon and fashionable concepts, and is gradually replaced by the aluminum alloy hub.
The hub is coated with a film, which is an effective means for prolonging the service life of the hub, for example, a silicon coating film, namely a silicon glass coating film, is used for comprehensively providing efficient protection for the hub, increasing the hardness and smoothness of the surface of the hub, improving the antifouling performance and isolating the corrosion of pollutants such as external acid rain. And the effects of color brightening and brightening can be achieved. The utilization is wide.
The prior Chinese patent with publication number CN110105815A discloses a film coating agent for an automobile aluminum alloy hub and a film coating process, and the specific process flow is as follows: processing; performing finish machining to remove black skin, bruise and aluminum-bonded parts on the surface of the hub, and grinding the uneven parts by using sand paper to flatten the surface; cleaning: firstly, cleaning, removing impurities and oil in hot water, and finally cleaning with pure water; and (3) drying: after being cleaned by clear water, the water marks left on the surface of the wheel are dried, and then the surface impurities are removed by high-temperature baking; pretreatment: adopting an alkaline chromate method to carry out conversion film treatment; spraying base powder: spraying epoxy polyester powder coating by adopting an electrostatic spraying method, then curing the coating through a baking channel, and curing for 15 minutes at the temperature of 160 ℃; grinding: grinding the surface of the hub sprayed with the base powder by using No. 400 sand paper; and (6) coating.
The coating agent and the coating process for the automobile aluminum alloy wheel hub solve the problem of low mechanical strength of the coating on the surface of the wheel hub. However, the coating agent and the coating process for the automobile aluminum alloy wheel hub still have some disadvantages, such as: firstly, although the coating agent is prepared, a silicon coating method is not provided; the second and common silicon plating process adopts simple substance silicon, which is high in price and high in cost; thirdly, in most silicon plating processes, the surface of the hub is not polished, and occasionally, skin spots are generated on the surface of the hub; fourth, the existing silicon plating process mostly adopts evaporation plating, and the adopted evaporation plating has more consumables and greater pollution.
Disclosure of Invention
In view of the problems mentioned in the background art, the present invention is directed to a vacuum magnetron sputtering ion plating process for a hub, so as to solve the problems mentioned in the background art.
The technical purpose of the invention is realized by the following technical scheme:
a vacuum magnetron sputtering ion coating process for a hub specifically comprises the following steps:
s1, preparing a silicon dioxide target material: selecting silicon dioxide powder with purity of over 99.9 percent and granularity of 0.8-1.2um, selecting adhesive accounting for 0.02-0.1 percent of the mass ratio of the silicon dioxide powder, uniformly mixing the silicon dioxide powder and the adhesive, and molding in a press mold under the pressure of 90-100MPA and the temperature of 25-35 ℃ to obtain a primary silicon dioxide target rod;
s2, refining the silicon dioxide target material: placing the primary silicon dioxide target rod in the S1 into an oven with the temperature of 620-680 ℃, and preserving the heat for 5-6h to remove the adhesive in the primary silicon dioxide target rod;
s3, polishing the hub: placing the aluminum alloy wheel hub in a vibration grinding machine filled with grinding materials, wherein the grinding materials adopt 80-100-mesh carborundum and 70-90-mesh brown corundum grinding stones, and the mass ratio of the carborundum to the brown corundum grinding stones is 3: 1, adopting 40-50Hz frequency to carry out vibration grinding for 5-10min until the roughness of the aluminum alloy surface reaches Ra1.6;
s4, pre-vacuum magnetron sputtering coating: placing the polished aluminum alloy wheel hub in the S3 in the middle of a coating chamber in a vacuum magnetron sputtering coating machine, selecting 4-8 refined silicon dioxide target materials in the S2, and uniformly distributing the refined silicon dioxide target materials around the wheel hub in a circumferential array by using a clamp;
s5, vacuum magnetron sputtering coating: controlling the temperature of the refined silicon dioxide target material to be 1100-1300 ℃; controlling the working gas to be argon, the reaction gas to be oxygen, and controlling the flow ratio of the argon to the oxygen to be 15: 20; controlling the vacuum degree in the vacuum magnetron sputtering coating machine to be 0.0005Pa and the working air pressure to be 1.0 Pa; the sputtering power is controlled to be 5KW, and the sputtering time is controlled to be 60 min.
Preferably, when the silicon dioxide target material is primarily manufactured by S1, silicon dioxide powder with purity of over 99.9% and granularity of 0.9-1.1um is selected, a bonding agent accounting for 0.06-0.1% of the mass ratio of the silicon dioxide powder is selected, the silicon dioxide powder and the bonding agent are uniformly mixed, and then the mixture is molded in a compression mold under the pressure of 92-98MPA and the temperature of 27-32 ℃ to obtain the primarily manufactured silicon dioxide target material rod.
Preferably, in the S2 refined silicon dioxide target, the primary silicon dioxide target rod in the S1 is placed in an oven with the temperature of 640-660 ℃, and the temperature is kept for 5-6h to remove the adhesive therein.
Preferably, in the step S3, in the step of polishing the hub, the aluminum alloy hub is placed in a vibration grinder filled with grinding materials, wherein the grinding materials adopt carborundum with the granularity of 85-95 meshes and brown corundum grinding stones with the meshes of 75-85 meshes, and the mass ratio of the carborundum to the brown corundum grinding stones is 3: 1, adopting 40-50Hz frequency to carry out vibration grinding for 5-10min until the roughness of the aluminum alloy surface reaches Ra1.6.
Preferably, in the S4 pre-vacuum magnetron sputtering coating, the aluminum alloy hub polished in S3 is placed in the center of a coating chamber in a vacuum magnetron sputtering coating machine, 4 to 6 refined silicon dioxide target materials in S2 are selected, and the refined silicon dioxide target materials are arranged in a circumferential array and uniformly distributed around the hub by using a fixture.
Preferably, in the S5 vacuum magnetron sputtering coating, the temperature of the refined silicon dioxide target material is controlled to 1150-1220 ℃; controlling the working gas to be argon, the reaction gas to be oxygen, and controlling the flow ratio of the argon to the oxygen to be 15: 20; controlling the vacuum degree in the vacuum magnetron sputtering coating machine to be 0.0005Pa and the working air pressure to be 1.0 Pa; the sputtering power is controlled to be 5KW, and the sputtering time is controlled to be 60 min.
Preferably, the adhesive used in the S2 refined silica target material is one or more of epoxy resin, polyvinyl alcohol and carboxymethyl cellulose.
Preferably, the closest distance between the refined silicon dioxide target and the hub in the S4 pre-vacuum magnetron sputtering coating is 30-40 cm.
Preferably, the step S3 is performed by performing high-pressure water descaling on the hub before polishing the hub.
In summary, the invention mainly has the following beneficial effects:
firstly, silicon dioxide adopted when the surface of the hub is plated with silicon is taken as a target source, and the cost of the silicon dioxide is lower than that of a silicon simple substance, so that the cost can be greatly reduced;
secondly, the process adopts a vacuum magnetron sputtering ion plating mode to carry out film plating, and a silicon die plated on the surface of the hub has good adhesion and is not easy to fall off;
thirdly, the hub is polished before the hub is coated, so that the phenomenon of coating skin spots caused by the fact that the surface of the hub is not smooth enough can be effectively avoided, and the integrity of coating can be improved;
fourthly, the process designs a process to produce the silicon dioxide target material by self, has the advantage of simple preparation method, and overcomes the defect that no silicon dioxide target material is sold in the prior art.
Drawings
FIG. 1 is a schematic view showing the positional relationship between the hub and the silicon dioxide target rods in the process of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
Referring to fig. 1, a vacuum magnetron sputtering ion plating process for a hub specifically includes the following steps:
s1, preparing a silicon dioxide target material: selecting silicon dioxide powder with the purity of 99.95% and the granularity of 0.8um, selecting an adhesive accounting for 0.02% of the mass ratio of the silicon dioxide powder, uniformly mixing the silicon dioxide powder and the adhesive, and molding in a compression mold under the pressure of 90MPA and the temperature of 25 ℃ to obtain a primary silicon dioxide target rod;
s2, refining the silicon dioxide target material: placing the primary silicon dioxide target material rod in S1 into an oven with the temperature of 620 ℃, and preserving heat for 5 hours to remove the adhesive in the primary silicon dioxide target material rod;
s3, polishing the hub: placing the aluminum alloy wheel hub in a vibration grinding machine filled with grinding materials, wherein the grinding materials adopt 80-mesh carborundum and 70-mesh brown corundum grinding stones, and the mass ratio of the carborundum to the brown corundum grinding stones is 3: 1, adopting 40Hz frequency to carry out vibration grinding for 5min until the roughness of the surface of the aluminum alloy reaches Ra1.6;
s4, pre-vacuum magnetron sputtering coating: placing the polished aluminum alloy wheel hub in the step S3 in the middle of a coating chamber in a vacuum magnetron sputtering coating machine, selecting 4 refined silicon dioxide target materials in the step S2, and uniformly distributing the refined silicon dioxide target materials around the wheel hub in a circumferential array by using a clamp;
s5, vacuum magnetron sputtering coating: controlling the temperature of the refined silicon dioxide target material to be 1100 ℃; controlling the working gas to be argon, the reaction gas to be oxygen, and controlling the flow ratio of the argon to the oxygen to be 15: 20; controlling the vacuum degree in the vacuum magnetron sputtering coating machine to be 0.0005Pa and the working air pressure to be 1.0 Pa; the sputtering power is controlled to be 5KW, and the sputtering time is controlled to be 60 min.
The adhesive adopted in the S2 refined silicon dioxide target material is epoxy resin and polyvinyl alcohol, and the mass ratio of the epoxy resin to the polyvinyl alcohol is 1: 1.
wherein the closest distance between the refined silicon dioxide target material and the hub in the S4 pre-vacuum magnetron sputtering coating is 30 cm.
Wherein, the hub is subjected to high-pressure water descaling to remove scale on the surface of the hub before polishing the hub at S3.
According to the process, silicon dioxide adopted when the surface of the hub is plated with silicon is used as a target source, and the cost of the silicon dioxide is lower than that of a silicon simple substance, so that the cost can be greatly reduced; the process adopts a vacuum magnetron sputtering ion coating mode for coating, and the silicon die coated on the surface of the hub has good adhesion and is not easy to fall off; the hub is polished before the hub is coated, so that the phenomenon of coating film skin spots caused by the fact that the surface of the hub is not smooth enough can be effectively avoided, and the integrity of the coated film can be improved; the process designs a process for automatically producing the silicon dioxide target material, has the advantage of simple preparation method, and overcomes the defect that no silicon dioxide target material is sold in the prior art.
Example 2
Referring to fig. 1, a vacuum magnetron sputtering ion plating process for a hub specifically includes the following steps:
s1, preparing a silicon dioxide target material: selecting silicon dioxide powder with the purity of 99.99 percent and the granularity of 0.9um, selecting an adhesive accounting for 0.05 percent of the mass ratio of the silicon dioxide powder, uniformly mixing the silicon dioxide powder and the adhesive, and molding in a compression mold under the pressure of 95MPA and the temperature of 28 ℃ to obtain a primary silicon dioxide target rod;
s2, refining the silicon dioxide target material: placing the primary silicon dioxide target material rod in S1 into an oven with the temperature of 630 ℃, and preserving heat for 5.4 hours to remove the adhesive in the primary silicon dioxide target material rod;
s3, polishing the hub: placing the aluminum alloy wheel hub in a vibration grinding machine filled with grinding materials, wherein the grinding materials adopt carborundum with the granularity of 84 meshes and brown corundum grinding stones with the meshes of 74 meshes, and the mass ratio of the carborundum to the brown corundum grinding stones is 3: 1, adopting 40Hz frequency to carry out vibration grinding for 5min until the roughness of the surface of the aluminum alloy reaches Ra1.6;
s4, pre-vacuum magnetron sputtering coating: placing the polished aluminum alloy wheel hub in the step S3 in the middle of a coating chamber in a vacuum magnetron sputtering coating machine, selecting 5 refined silicon dioxide target materials in the step S2, and uniformly distributing the refined silicon dioxide target materials around the wheel hub in a circumferential array by using a clamp;
s5, vacuum magnetron sputtering coating: controlling the temperature of the refined silicon dioxide target material to be 1180 ℃; controlling the working gas to be argon, the reaction gas to be oxygen, and controlling the flow ratio of the argon to the oxygen to be 15: 20; controlling the vacuum degree in the vacuum magnetron sputtering coating machine to be 0.0005Pa and the working air pressure to be 1.0 Pa; the sputtering power is controlled to be 5KW, and the sputtering time is controlled to be 60 min.
The adhesive adopted in the S2 refined silicon dioxide target material is epoxy resin, polyvinyl alcohol and carboxymethyl cellulose, and the mass ratio of the epoxy resin to the polyvinyl alcohol to the carboxymethyl cellulose is 1: 1: 1.
wherein the closest distance between the refined silicon dioxide target material and the hub in the S4 pre-vacuum magnetron sputtering coating is 35 cm.
Wherein, the hub is subjected to high-pressure water descaling to remove scale on the surface of the hub before polishing the hub at S3.
Example 3
Referring to fig. 1, a vacuum magnetron sputtering ion plating process for a hub specifically includes the following steps:
s1, preparing a silicon dioxide target material: selecting silicon dioxide powder with the purity of 99.99 percent and the granularity of 1um, selecting an adhesive accounting for 0.08 percent of the mass ratio of the silicon dioxide powder, uniformly mixing the silicon dioxide powder and the adhesive, and molding in a compression mold under the pressure of 95MPA and the temperature of 28 ℃ to obtain a primary silicon dioxide target rod;
s2, refining the silicon dioxide target material: placing the primary silicon dioxide target material rod in S1 into an oven with the temperature of 640 ℃, and preserving heat for 5.6 hours to remove the adhesive in the primary silicon dioxide target material rod;
s3, polishing the hub: placing the aluminum alloy wheel hub in a vibration grinding machine filled with grinding materials, wherein the grinding materials adopt carborundum with the granularity of 90 meshes and brown corundum grinding stones with the meshes of 80 meshes, and the mass ratio of the carborundum to the brown corundum grinding stones is 3: 1, adopting 40Hz frequency to carry out vibration grinding for 5min until the roughness of the surface of the aluminum alloy reaches Ra1.6;
s4, pre-vacuum magnetron sputtering coating: placing the polished aluminum alloy wheel hub in the step S3 in the middle of a coating chamber in a vacuum magnetron sputtering coating machine, selecting 6 refined silicon dioxide target materials in the step S2, and uniformly distributing the refined silicon dioxide target materials around the wheel hub in a circumferential array by using a clamp;
s5, vacuum magnetron sputtering coating: controlling the temperature of the refined silicon dioxide target material to be 1200 ℃; controlling the working gas to be argon, the reaction gas to be oxygen, and controlling the flow ratio of the argon to the oxygen to be 15: 20; controlling the vacuum degree in the vacuum magnetron sputtering coating machine to be 0.0005Pa and the working air pressure to be 1.0 Pa; the sputtering power is controlled to be 5KW, and the sputtering time is controlled to be 60 min.
Example 4
Referring to fig. 1, a vacuum magnetron sputtering ion plating process for a hub specifically includes the following steps:
s1, preparing a silicon dioxide target material: selecting silicon dioxide powder with the purity of 99.99 percent and the granularity of 1.2um, selecting an adhesive accounting for 0.1 percent of the mass ratio of the silicon dioxide powder, uniformly mixing the silicon dioxide powder and the adhesive, and molding in a compression mold under the pressure of 100MPA and the temperature of 35 ℃ to obtain a primary silicon dioxide target rod;
s2, refining the silicon dioxide target material: placing the primary silicon dioxide target material rod in S1 into an oven with the temperature of 680 ℃, and preserving heat for 6 hours to remove the adhesive in the primary silicon dioxide target material rod;
s3, polishing the hub: placing the aluminum alloy wheel hub in a vibration grinding machine filled with grinding materials, wherein the grinding materials adopt carborundum with the granularity of 100 meshes and brown corundum grinding stones with the meshes of 90 meshes, and the mass ratio of the carborundum to the brown corundum grinding stones is 3: 1, adopting 40Hz frequency to carry out vibration grinding for 5min until the roughness of the surface of the aluminum alloy reaches Ra1.6;
s4, pre-vacuum magnetron sputtering coating: placing the polished aluminum alloy wheel hub in the step S3 in the middle of a coating chamber in a vacuum magnetron sputtering coating machine, selecting 8 refined silicon dioxide target materials in the step S2, and uniformly distributing the refined silicon dioxide target materials around the wheel hub in a circumferential array by using a clamp;
s5, vacuum magnetron sputtering coating: controlling the temperature of the refined silicon dioxide target material to be 1300 ℃; controlling the working gas to be argon, the reaction gas to be oxygen, and controlling the flow ratio of the argon to the oxygen to be 15: 20; controlling the vacuum degree in the vacuum magnetron sputtering coating machine to be 0.0005Pa and the working air pressure to be 1.0 Pa; the sputtering power is controlled to be 5KW, and the sputtering time is controlled to be 60 min.
The surface hardness and peel strength of the hubs obtained in examples 1 to 4 were measured, and an experiment was performed using a general hub obtained by vapor deposition as a control. The results of the experiments are given in the following table (control as reference):
TABLE 1
| Surface hardness | Peel strength | Cost of | Contaminant barrier ability | |
| Control group | 100％ | 100％ | 100％ | 100％ |
| Example 1 | 118％ | 118％ | 46％ | 130％ |
| Example 2 | 110％ | 104％ | 46％ | 124％ |
| Example 3 | 135％ | 137％ | 45％ | 135％ |
| Example 4 | 113％ | 108％ | 46％ | 130％ |
Because the surface hardness and the peeling strength of the hub are improved when the process of the embodiment of the invention is adopted for polishing, the process of the embodiment of the invention can improve the mechanical performance of silicon plating on the surface of the traditional hub to a certain extent. In addition, the embodiment of the invention has great improvement on cost control compared with the existing price through experimental accounting. Further, the contamination-barrier ability of the hub surface silicon film in example 3 was also greatly increased. And example 3 of the four examples of the present invention is a more excellent example.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (9)
1. A vacuum magnetron sputtering ion coating process for a hub is characterized by comprising the following steps: the method specifically comprises the following steps:
s1, preparing a silicon dioxide target material: selecting silicon dioxide powder with purity of over 99.9 percent and granularity of 0.8-1.2um, selecting adhesive accounting for 0.02-0.1 percent of the mass ratio of the silicon dioxide powder, uniformly mixing the silicon dioxide powder and the adhesive, and molding in a press mold under the pressure of 90-100MPA and the temperature of 25-35 ℃ to obtain a primary silicon dioxide target rod;
s2, refining the silicon dioxide target material: placing the primary silicon dioxide target rod in the S1 into an oven with the temperature of 620-680 ℃, and preserving the heat for 5-6h to remove the adhesive in the primary silicon dioxide target rod;
s3, polishing the hub: placing the aluminum alloy wheel hub in a vibration grinding machine filled with grinding materials, wherein the grinding materials adopt 80-100-mesh carborundum and 70-90-mesh brown corundum grinding stones, and the mass ratio of the carborundum to the brown corundum grinding stones is 3: 1, adopting 40-50Hz frequency to carry out vibration grinding for 5-10min until the roughness of the aluminum alloy surface reaches Ra1.6;
s4, pre-vacuum magnetron sputtering coating: placing the polished aluminum alloy wheel hub in the S3 in the middle of a coating chamber in a vacuum magnetron sputtering coating machine, selecting 4-8 refined silicon dioxide target materials in the S2, and uniformly distributing the refined silicon dioxide target materials around the wheel hub in a circumferential array by using a clamp;
s5, vacuum magnetron sputtering coating: controlling the temperature of the refined silicon dioxide target material to be 1100-1300 ℃; controlling the working gas to be argon, the reaction gas to be oxygen, and controlling the flow ratio of the argon to the oxygen to be 15: 20; controlling the vacuum degree in the vacuum magnetron sputtering coating machine to be 0.0005Pa and the working air pressure to be 1.0 Pa; the sputtering power is controlled to be 5KW, and the sputtering time is controlled to be 60 min.
2. The vacuum magnetron sputtering ion plating process for the wheel hub as claimed in claim 1, wherein: when the S1 primary silicon dioxide target material is manufactured, silicon dioxide powder with the purity of over 99.9 percent and the granularity of 0.9-1.1um is selected, adhesive accounting for 0.06-0.1 percent of the mass ratio of the silicon dioxide powder is selected, the silicon dioxide powder and the adhesive are uniformly mixed, and the mixture is molded in a pressing die under the pressure of 92-98MPA and the temperature of 27-32 ℃ to obtain the primary silicon dioxide target material rod.
3. The vacuum magnetron sputtering ion plating process for the wheel hub as claimed in claim 1, wherein: in the S2 refined silicon dioxide target material, the primary silicon dioxide target material rod in the S1 is placed in an oven with the temperature of 640-660 ℃, and the temperature is kept for 5-6h to remove the adhesive in the primary silicon dioxide target material rod.
4. The vacuum magnetron sputtering ion plating process for the wheel hub as claimed in claim 1, wherein: in the S3 polishing wheel hub, the aluminum alloy wheel hub is placed in a vibration grinder with abrasive materials, wherein the abrasive materials adopt carborundum with the granularity of 85-95 meshes and brown corundum abrasive stones with the meshes of 75-85 meshes, and the mass ratio of the carborundum to the brown corundum abrasive stones is 3: 1, adopting 40-50Hz frequency to carry out vibration grinding for 5-10min until the roughness of the aluminum alloy surface reaches Ra1.6.
5. The vacuum magnetron sputtering ion plating process for the wheel hub as claimed in claim 1, wherein: in the S4 pre-vacuum magnetron sputtering coating, the aluminum alloy hub polished in the S3 is placed in the center of a coating chamber in a vacuum magnetron sputtering coating machine, 4-6 refined silicon dioxide target materials in the S2 are selected, and the refined silicon dioxide target materials are uniformly distributed around the hub in a circumferential array by using a clamp.
6. The vacuum magnetron sputtering ion plating process for the wheel hub as claimed in claim 1, wherein: in the S5 vacuum magnetron sputtering coating, the temperature of the refined silicon dioxide target material is controlled to 1150-1220 ℃; controlling the working gas to be argon, the reaction gas to be oxygen, and controlling the flow ratio of the argon to the oxygen to be 15: 20; controlling the vacuum degree in the vacuum magnetron sputtering coating machine to be 0.0005Pa and the working air pressure to be 1.0 Pa; the sputtering power is controlled to be 5KW, and the sputtering time is controlled to be 60 min.
7. The vacuum magnetron sputtering ion plating process for the wheel hub as claimed in claim 1, wherein: the adhesive adopted in the S2 refined silicon dioxide target material is one or more of epoxy resin, polyvinyl alcohol and carboxymethyl cellulose.
8. The vacuum magnetron sputtering ion plating process for the wheel hub as claimed in claim 1, wherein: the closest distance between the refined silicon dioxide target in the S4 pre-vacuum magnetron sputtering coating and the hub is 30-40 cm.
9. The vacuum magnetron sputtering ion plating process for the wheel hub as claimed in claim 1, wherein: the S3 descaling the hub with high pressure water before polishing the hub.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910957051.6A CN110791738A (en) | 2019-10-10 | 2019-10-10 | Vacuum magnetron sputtering ion coating process for hub |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910957051.6A CN110791738A (en) | 2019-10-10 | 2019-10-10 | Vacuum magnetron sputtering ion coating process for hub |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112456989A (en) * | 2020-12-22 | 2021-03-09 | 宁波江丰电子材料股份有限公司 | Preparation method of silicon dioxide target blank |
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| WO2014112661A1 (en) * | 2013-01-16 | 2014-07-24 | 광주과학기술원 | Pure granular mesoporous silica, and method for producing same using organic bonding agent |
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