CN110780547A - Liquid container device - Google Patents
Liquid container device Download PDFInfo
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- CN110780547A CN110780547A CN201910615704.2A CN201910615704A CN110780547A CN 110780547 A CN110780547 A CN 110780547A CN 201910615704 A CN201910615704 A CN 201910615704A CN 110780547 A CN110780547 A CN 110780547A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
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Abstract
Provided is a liquid container device capable of uniformly maintaining the temperature of a liquid. The liquid container device includes: a storage pipe which includes an inlet through which the liquid collected from the working machine flows in, and an outlet through which the liquid flows out toward the working machine, and which can store the liquid by being connected to the outlet through the inlet; a liquid temperature regulator provided in the storage pipe and configured to regulate a temperature of the liquid in the storage pipe to a specific temperature; a pump provided at the outflow port for sending the liquid to the working device; a supply valve that adjusts a flow rate of the liquid supplied to the working device by opening and closing itself so as to supply at least a part of the liquid pumped out from the pump to the working device; and a return pipe that is connected to a portion on the inlet side of the storage pipe from between the pump and the supply valve, and that returns the liquid that has not been sent out from the supply valve to the storage pipe.
Description
Technical Field
The present invention relates to a liquid container apparatus for recovering and storing liquid used in a working device while the liquid used in the working device is supplied to the working device.
Background
Patent document 1 listed below describes a machining apparatus for performing metal machining such as cutting and polishing, and a coolant supply apparatus for supplying a coolant, which is a water-soluble solvent used for the purpose of lubrication and cooling, to the machining apparatus. Thus, the coolant is recovered and reused after the processing apparatus is used. In this way, the coolant supply device is provided with a heat sterilization device for sterilizing the coolant, and the heat sterilization device is provided with a heat treatment tank (which may be considered as a container for storing a liquid) and performs a sterilization process by a heat source (heater) provided in the heat treatment tank. In addition, the heat sterilization apparatus is configured such that a post-heat treatment flow path for sending out the heat-treated coolant from the heat treatment bath is provided in a spiral shape in a pre-treatment flow path for bringing the pre-heat-treated coolant into the heat treatment bath, and heat exchange is performed between these.
In addition to the coolant for the processing apparatus as described above, various reusable liquids exist in the manufacturing industry and the like. For example, a resist stripping solution used for photolithography in the production process of semiconductor devices, printed wiring boards, display panels, and the like. The resist stripping solution is supplied to an apparatus for stripping resist, and recovered and stored in a container, as in the above-described cooling solution. However, in order to sufficiently exert the function of stripping the resist with the stripping liquid for the resist, it is desirable to supply the stripping liquid at an appropriate temperature, and therefore, it is necessary to maintain the appropriate temperature in the container. Thus, it was found that the stripping solution was oxidized by use, and the stripping ability was lowered due to the increase of the oxide generated thereby.
Documents of the prior art
Patent document
Patent document 1: japanese patent application laid-open No. 2011-224191
Disclosure of Invention
Technical problem to be solved by the invention
In a configuration in which a heat source is simply provided in a treatment tank (storage tank) as in the apparatus described in patent document 1, a part of the liquid may be retained in the storage tank, and the liquid temperature may increase or decrease excessively in the part of the liquid. Further, for example, even if a stirring function is mounted in the storage tank, the storage tank may not be completely stirred. In particular, when the resist stripping solution is stored in a container apparatus having such a configuration, there is a problem that the solution temperature in a part of the solution rises excessively and is oxidized, and the oxide increases, thereby lowering the stripping ability.
The present invention has been made in view of such circumstances, and an object thereof is to provide a liquid container apparatus that uniformly maintains the temperature of a liquid.
Technical solution for solving technical problem
(1) In order to solve the above-described problems, a liquid container apparatus according to an embodiment of the present invention is a liquid container apparatus for supplying a liquid used in a working device to the working device and recovering and storing the liquid used in the working device, the liquid container apparatus including: a storage pipe which includes an inlet through which the liquid collected from the working machine flows in, and an outlet through which the liquid flows out toward the working machine, and which can store the liquid by being connected to the outlet through the inlet; a liquid temperature regulator provided in the storage pipe and configured to regulate a temperature of the liquid in the storage pipe to a specific temperature; a pump provided at the outflow port for sending the liquid to the working device; a supply valve that adjusts a flow rate of the liquid supplied to the working device by opening and closing itself so as to supply at least a part of the liquid pumped out from the pump to the working device; and a return pipe that is connected to a portion on the inlet side of the storage pipe from between the pump and the supply valve, and that returns the liquid that has not been sent out from the supply valve to the storage pipe.
(2) In one embodiment of the present invention, in addition to the configuration of (1), the storage pipe is formed in a spiral shape.
(3) In one embodiment of the present invention, in addition to the configuration of (2), the liquid container apparatus includes a plurality of liquid temperature regulators each serving as the liquid temperature regulator, and each of the plurality of liquid temperature regulators is arranged side by side at each of adjacent portions in the storage pipe formed in a spiral shape.
(4) In one embodiment of the present invention, in addition to any one of the configurations (1) to (3), the inlet is provided above the outlet, and the storage pipe extends downward from above.
(5) In one embodiment of the present invention, in addition to any one of the configurations (1) to (4), the liquid container apparatus includes a control device that manages its own control, and the control device is configured to continuously send out the liquid in the storage pipe so as to constantly operate the pump, and to control the opening and closing of the supply valve such that a supply flow rate, which is a flow rate of the liquid sent from the supply valve to the operating device, becomes a target supply flow rate, which is a target of the supply flow rate, with respect to a flow rate of the liquid sent from the pump.
(6) In one embodiment of the present invention, in addition to the configuration of (5), the liquid container device includes a liquid temperature sensor that detects a temperature of the liquid in the storage pipe, and the controller is configured to control a circulation flow rate profile, which is a flow rate of the liquid flowing into the return pipe, by controlling a pump flow rate, which is a flow rate of the liquid pumped out, based on a detection result of the liquid temperature sensor.
(7) In one embodiment of the present invention, in addition to the configuration of (5), the liquid container apparatus includes: a liquid temperature sensor for detecting a temperature of the liquid in the storage pipe; and a circulation flow rate adjustment valve provided in the return pipe and adjusting a circulation flow rate that is a flow rate of the liquid flowing into the return pipe, wherein the setting device sets the control mode corresponding to the user operation received by the operation receiving device to the control device, and the control device is configured to control the circulation flow rate adjustment valve based on a detection result of the liquid temperature sensor, thereby controlling the circulation flow rate shape.
(8) In one embodiment of the present invention, in addition to any one of the configurations (1) to (7), the liquid container device is configured to store a resist stripping liquid in a resist stripping device that is a device for stripping a resist as the work equipment.
Advantageous effects
According to the present invention, a liquid container device capable of uniformly maintaining the temperature of a liquid is provided.
Drawings
Fig. 1 is a diagram schematically showing a resist stripping system including a liquid container apparatus according to a first embodiment of the present invention.
Fig. 2 is a view schematically showing a liquid container apparatus according to a second embodiment of the present invention.
Fig. 3 is a flowchart showing a flow rate adjustment routine executed in the liquid container apparatus according to the second embodiment shown in fig. 2.
Fig. 4 is a view schematically showing a liquid container apparatus according to a third embodiment of the present invention.
Fig. 5 is a flowchart showing a flow rate adjustment routine executed in the liquid container apparatus according to the third embodiment shown in fig. 4.
Detailed Description
Hereinafter, several embodiments of the present invention will be described in detail as embodiments for carrying out the present invention with reference to the drawings. The present invention is not limited to the embodiments described below, and various modifications and improvements can be made in various ways based on the knowledge of those skilled in the art.
[ first embodiment ]
Fig. 1 is a diagram schematically showing a resist stripping system 12, and the resist stripping system 12 is configured to include a resist stripping liquid container apparatus 10 (hereinafter, may be simply referred to as "container apparatus 10") as a liquid container apparatus according to a first embodiment of the present invention. The resist stripping system 12 is a system for performing a photolithography process used in a manufacturing process of a semiconductor device, a printed circuit board, a display panel, or the like, and stripping and cleaning of a resist with respect to a workpiece. The resist stripping system 12 is configured to include: a stripping liquid container 14, a resist stripping device 16 as a working means for supplying a stripping liquid (amine solvent) to the stripping liquid container 14, and a control device 18 for controlling the stripping liquid container 14 and the resist stripping device 16. It is also conceivable that the resist stripping liquid container apparatus 10 of the present embodiment is configured to include the stripping liquid container 14 and the control device 18.
The configuration of the resist stripping apparatus 16 (hereinafter, may be simply referred to as "stripping apparatus 16") is shown in a block diagram in fig. 1. The main body of the peeling device 16 is configured as an application nozzle 20, and the application nozzle 20 applies the peeling liquid to the work in a shower shape. The peeling device 16 applies the peeling liquid to the work while controlling the flow rate of the peeling liquid discharged from the application nozzle 20 by the flow rate regulator 22. Therefore, the used stripping liquid is recovered by the stripping liquid recovery pipe 24. Incidentally, the used stripping liquid is a mixed solution of the photoresist to be stripped, but since it has a sufficient stripping ability up to a certain concentration, it is directly recovered and reused.
Next, the stripping solution container 14 (hereinafter, may be simply referred to as "container 14") will be described. The container 14 does not include a storage tank for storing the stripping liquid as in the conventional container, but includes a storage pipe 30 for storing the stripping liquid. The storage pipe 30 has a spiral portion 30a formed in a circular spiral shape, and the spiral portion 30a is disposed in a state of extending in the vertical direction. Thus, the storage pipe 30 has an inlet 30b at the upper end through which the stripping liquid collected by the stripping device 16 flows in, and an outlet 30c at the lower end through which the stripping liquid flows out toward the stripping device 16. Incidentally, the storage pipe 30 is configured to have a capacity not to be filled with the stripping liquid up to the inlet 30b. That is, in the container device 10 of the present embodiment, the storage pipe 30 is adapted to have the above-described shape extending from the upper side to the lower side.
The storage pipe 30 is provided with a plurality of heat exchangers 32 for heating the temperature of the stripping solution. Each of the plurality of heat exchangers 32 is provided in parallel at each of the vertically adjacent portions of the spiral portion 30a of the storage pipe 30. Although the detailed description is omitted, the plurality of heat exchangers 32 are all steam pipes disposed in the storage pipe 30 as a main body. In the present embodiment, the liquid temperature regulator is a heat exchanger for heating, but is not limited to this, and may be a heating device such as a heater. Further, a liquid temperature regulator for cooling the stripping liquid whose temperature has risen excessively is provided separately from the liquid temperature regulator for heating.
Further, the container 14 includes a pump 34. The pump 34 is provided at the outlet 30c of the storage pipe 30 and is configured to send out the stripping liquid in the storage pipe 30. Although the detailed description is omitted, the pump 34 is a rotary pump, and the pump flow rate Q, which is the flow rate of the stripping liquid to be sent, can be controlled by controlling the number of rotations thereof
P。
Further, the container 14 has a supply valve 36, and the supply valve 36 adjusts the flow rate of the peeling liquid sent from the pump 34 and supplies the peeling liquid to the peeling device 16. The supply valve 36 is a normally closed electromagnetic switch valve configured to be opened by receiving a supply of current, adjust the opening degree in accordance with the magnitude of the current, and control a supply flow rate Q, which is the flow rate of the stripping liquid supplied to the stripping device 16
S。
The tank 14 has a return pipe 40, and the return pipe 40 is branched from the delivery pipe 38 connecting the pump 34 to the supply valve 36, and the return pipe 40 is connected to a portion on the inlet side of the storage pipe 30, in other words, above the spiral portion 30a. The return pipe 40 is configured to return the stripping liquid that is not sent out from the supply valve 36 to the storage pipe 30.
The control device 18 controls the peeling device 16 and the container 14. Specifically, with respect to the vessel 14, the control device 18 controls the plurality of heat exchangers 32, the pump 34, and the supply valve 36. First, the controller 18 controls the liquid temperature of the stripping liquid in the storage pipe 30 by turning on/off each of the plurality of heat exchangers 32, and more specifically, the liquid temperature T of the stripping liquid in the outlet 30c of the storage pipe 30 becomes the set temperature T
0(specific temperature, 80 ℃ in the present embodiment). Further, the control device 18 operates the pump 34 to continuously deliver the fluid at a constant flow rate.
Further, receiving a request from the peeling device 16, the control device 18 opens the supply valve 36 to supply the peeling liquid to the peeling device 16. Specifically, the control device 18 controls the opening degree of the supply valve 36 so that the supply flow rate becomes the necessary flow rate Q which is the flow rate required by the peeling device 16
S(target supply amount). Therefore, in the container device 10, as shown in fig. 1, the slave pump flow rate Q
PMinus the supply flow Q
SFlow rate Q of
P-Q
S(circulation flow rate Q as the flow rate of the stripping liquid flowing into the return pipe 40
C. ) The stripping solution (2) is returned to the storage pipe 30 through the return pipe 40. That is, in the container device 10, the pump 34 is operated at all times, and the peeling liquid in the storage pipe 30 is circulated at all times even when the peeling liquid is not supplied to the peeling device 16.
In addition, in the conventional container device having the storage tank, the stripping liquid may be retained in the vicinity of the pipe due to the influence of the pipe of the heat exchanger disposed in the storage tank and the like. When the stripping liquid stays near the heat exchanger, the temperature of the retained stripping liquid rises, and oxidation rapidly proceeds. When the oxidized stripping solution is impure with respect to the stripping solution and the concentration thereof is increased, the stripping ability is rapidly decreased. That is, in the container device for storing the stripping liquid, it is desirable to suppress the liquid temperature rise and oxidation of only a part of the stripping liquid.
In the liquid container apparatus 10 configured as described above, since the stripping liquid in the storage pipe 30 can be circulated in the container 14 by the return pipe 40, the liquid temperature of the stripping liquid in the storage pipe 30 can be prevented from locally increasing, and the liquid temperature of the stripping liquid in the storage pipe 30 can be kept uniform. Accordingly, the temperature of the stripping liquid supplied to the stripping device 16 can be stabilized, and a stable stripping capability can be exhibited. Further, as described above, since the container device 10 operates the pump 34 all the time, the stripping liquid in the storage pipe 30 circulates all the time, and even if the supply to the stripping device 16 side is stopped, the temperature of the stripping liquid in the storage pipe 30 can be kept uniform. Further, in the present container device 10, since the storage pipe 30 is formed in a spiral shape, a flow without stagnation can be generated in the storage pipe 30, and the liquid temperature of the stripping liquid can be efficiently made uniform. In the present container device 10, since the storage pipe 30 formed in a spiral shape is used and the plurality of heat exchangers 32 are arranged at a constant interval, the temperature of the stripping liquid can be gradually increased, and the phenomenon that the stripping liquid is oxidized due to a too high increase in liquid temperature caused by a rapid increase in temperature can be avoided.
[ second embodiment ]
Fig. 2 shows a resist stripping solution container apparatus 60 as a liquid container apparatus according to a second embodiment. Since the container device 60 of the second embodiment has substantially the same configuration as the container device 10 of the first embodiment, the same components are given the same reference numerals, and description thereof is omitted. The container device 60 of the second embodiment is different from the container device 10 of the first embodiment in that a liquid temperature sensor 62 is provided, and the liquid temperature sensor 62 detects the temperature T of the stripping liquid at the outlet 30c of the storage pipe 30, in other words, the temperature T of the stripping liquid flowing into the pump 34. Thus, the tank device 60 of the present embodiment controls the circulation flow rate Q, which is the flow rate of the stripping liquid circulating through the return pipe 40, based on the detection result of the liquid temperature sensor 62
C。
Circulation flow rate Q
CThe control of (2) is executed by the control device 18 repeatedly executing the flow rate control routine of the flowchart shown in fig. 3 at short time intervals. The circulation flow rate Q will be described below with reference to the flowchart
CAnd (4) controlling. In the flow control program, first, in step 1 (hereinafter, S1 may be omitted, and the same applies to other steps), a necessary supply flow rate Q, which is a flow rate required by the peeling device 16, is acquired
SIn S2, the liquid temperature T at the outlet 30c of the storage pipe 30 detected by the liquid temperature sensor 62 is acquired.
Next, in S3, based on the detected liquid temperature T, the circulation flow rate Q is determined
C. In particular, the liquid temperature T is relative to the set temperature T
0The larger the difference is, the larger the circulation flow rate Q
CIs set to a large value. I.e. the liquid temperature T and the set temperature T
0The lower the ratio, the more the heat exchangers 32 are turned on to increase the circulation flow rate Q
CThe liquid temperature T is increased. On the other hand, the liquid temperature T and the set temperature T
0The higher the ratio, the more the heat exchangers 32 become disconnected to increase the circulation flow rate Q
CThus lowering the liquid temperature T. The liquid temperature T is a set temperature T
0In the case of (2), the circulation flow rateQ
CThe stripping liquid in the storage pipe 30 is circulated without being set to 0.
Next, in S4, the target pump flow rate Q is determined
PThe target pump flow rate Q
PIs the target of the flow rate of the stripping liquid sent by the pump 34. The target pump flow rate Q
PIs the necessary supply flow rate Q obtained in S1
SAnd the circulation flow rate Q determined in S3
CAre added together to determine. Thus, in the next step S5, the target pump flow rate Q is adjusted
PWhile the corresponding control target value (number of revolutions) is transmitted to the pump 34, in S6, the control target value (opening degree) is transmitted to the supply valve 36 so that the pump flow rate Q becomes equal to the target pump flow rate
PThe supply flow rate from the supply valve 36 becomes the necessary supply flow rate Q
S. The execution of the flow rate control program once is completed.
The container device 60 of the second embodiment can change the amount of the circulating stripping liquid based on the liquid temperature T in the storage pipe 30, and according to the container device 60 having this configuration, the liquid temperature T of the stripping liquid in the storage pipe 30 can be more effectively uniformized.
[ third embodiment ]
Fig. 3 shows a resist stripping liquid container apparatus 80 as a liquid container apparatus according to a third embodiment. Since the container device 80 of the third embodiment has substantially the same configuration as the container device 10 of the first embodiment and the container device 60 of the second embodiment, the same components are given the same reference numerals, and the description thereof is omitted. Thus, the tank device 80 of the third embodiment is provided with the liquid temperature sensor 62 for detecting the liquid temperature of the stripping liquid at the outlet 30c of the storage pipe 30, and controls the circulation flow rate Q, which is the flow rate of the stripping liquid circulating through the return pipe 40, based on the detection result of the liquid temperature sensor 62, similarly to the tank device 10 of the second embodiment
C. However, in the tank device 80 of the third embodiment, the pump flow rate Q of the pump 34 is not changed as in the tank device 60 of the second embodiment
PSimilarly to the container device 10 of the first embodiment, a constant flow rate is continuously fed.
The tank device 80 of the third embodiment is provided on the return pipe 40There is a circulation flow control valve 82, and the circulation flow control valve 82 is used for adjusting the flow rate through the return pipe, i.e., the circulation flow rate Q
CBased on the detection result of the liquid temperature sensor 62, the circulation flow rate control valve 82 is controlled, and therefore the circulation flow rate Q is controlled
C. However, since the flow rate of the stripping liquid fed from the pump 34 is constant, the container device 80 of the present embodiment is configured to circulate the stripping liquid fed from the pump 34 in its entirety when it is not necessary to transfer the stripping liquid to the stripping device 16. Further, the tank device 80 of the present embodiment is configured to distribute the stripping liquid sent from the pump 34 to each of the stripping device 16 side and the return pipe 40 side when it is necessary to transfer the stripping liquid to the stripping device 16 because the flow rate sent from the pump 34 is constant. That is, the flow rate transmitted to the peeling device 16 is configured so as to ensure the necessary supply flow rate Q required for the peeling device 16
SThe circulation flow rate is reduced by increasing the flow rate to be sent to the peeling device 16 in accordance with the liquid temperature T.
The control of the circulation flow rate is executed by the control device 18 repeatedly executing a flow rate control routine of the flowchart shown in fig. 5 at short time intervals. The control of the circulation flow rate will be described below with reference to this flowchart. In the flow rate control program, first, in step S11, a necessary supply flow rate Q, which is a flow rate required by the peeling device 16, is acquired
S. Next, in S12, it is determined that the acquired necessary supply flow rate Q is required
SWhether or not it is 0, that is, whether or not it is necessary to transfer the peeling liquid to the peeling means 16 is judged.
When it is necessary to transfer the peeling liquid to the peeling apparatus 16, in S13, the liquid temperature T of the outlet 30c of the storage pipe 30 detected by the liquid temperature sensor 62 is acquired. Next, in S14, the flow rate Q is supplied based on the need
SAnd a liquid temperature T, a ratio (r: 1-r) of the supply flow rate and the circulation flow rate is determined, and then, in S15, a target supply flow rate Q is determined according to the following formula
SSum of target circulation flow rate Q
C*。
Q
S*＝r·Q
P
Q
C*＝(1-r)·Q
P
On the other hand, there is no need to transfer the stripping liquid to the stripping meansAt position 16, in S16, the target supply flow rate Q
SSet to 0 and target circulation flow rate Q
CSet to 0.
When the target supply flow rate Q
SSum of target circulation flow rate Q
CWhen determined, in S17, the control target value (opening degree) is transmitted to supply valve 36 so that the pump flow rate Q is satisfied
PThe flow rate sent from supply valve 36 becomes target supply flow rate Q
SIn S18, the control target value (opening degree) is transmitted to the circulation flow rate adjustment valve 82 so as to correspond to the pump flow rate Q
PThe flow rate sent from the circulation flow rate adjustment valve 82 becomes the target circulation flow rate Q
C*. Incidentally, when it is necessary to transfer the peeling liquid to the peeling device 16, the supply valve 36 is turned to the closed state, and the circulation flow rate adjustment valve 82 is turned to the open state (opening degree 100%). The execution of the flow rate control program once is completed.
The container device 80 of the third embodiment can change the amount of the circulating stripping liquid based on the liquid temperature T in the storage pipe 30, and the container device 80 having this configuration can more effectively equalize the liquid temperature T of the stripping liquid in the storage pipe 30.
[ other embodiments ]
The container apparatuses according to the above three embodiments are configured to store a stripping liquid for a photoresist, but are not limited thereto, and may be used with various liquids. However, as in the case of the stripping liquid, it is preferable that the container devices according to the three embodiments store the liquid that undergoes chemical changes such as oxidation or changes in state by local heating or cooling. That is, in the container apparatuses according to the three embodiments described above, the liquid temperature regulator is a heat exchanger for heating, but depending on the liquid to be stored, a heat exchanger for cooling the liquid may be used.
In the container devices according to the three embodiments described above, the storage pipe 30 is formed in a circular spiral shape, but the shape is not limited to this, and may be a square spiral shape, a linear shape, a curved shape, or a combination thereof. However, if from the viewpoint of circulating the liquid, a shape capable of ensuring a flow without stagnation is desired.
Description of the reference numerals
Resist stripping liquid container means [ liquid container means (first embodiment) ]; a resist stripping system; a stripping solution container; a resist stripping apparatus [ working device ]; a control device; a storage pipe; a helical portion; an inflow port; a flow outlet; a heat exchanger (liquid temperature regulator); a pump; a supply valve; a return tube; resist stripping liquid container means [ liquid container means (second embodiment) ]; a liquid temperature sensor; 80.. a resist stripping liquid container device [ liquid container device (third embodiment) ]; 82.. circulating a flow adjustment valve.
Claims (8)
1. A liquid container apparatus for recovering and storing a liquid used in a working device while supplying the liquid used in the working device to the working device, characterized by comprising:
a storage pipe which includes an inlet through which the liquid collected from the working machine flows in, and an outlet through which the liquid flows out toward the working machine, and which can store the liquid by being connected to the outlet through the inlet;
a liquid temperature regulator provided in the storage pipe and configured to regulate a temperature of the liquid in the storage pipe to a specific temperature;
a pump provided at the outflow port for sending the liquid to the working device;
a supply valve that adjusts a flow rate of the liquid supplied to the working device by opening and closing itself so as to supply at least a part of the liquid pumped out from the pump to the working device;
and a return pipe that is connected to a portion on the inlet side of the storage pipe from between the pump and the supply valve, and that returns the liquid that has not been sent out from the supply valve to the storage pipe.
2. The liquid container device as claimed in claim 1, wherein the storage pipe is formed in a spiral shape.
3. The liquid container apparatus according to claim 2, comprising a plurality of liquid temperature regulators each serving as the liquid temperature regulator,
each of the plurality of liquid temperature regulators is disposed side by side at each of adjacent portions of the storage pipe formed in a spiral shape.
4. The liquid container apparatus according to any one of claims 1 to 3, wherein the inlet is provided above the outlet, and the storage pipe extends downward from above.
5. A liquid container apparatus according to any one of claims 1 to 3, comprising a control device which manages its own control,
the control device is configured to continuously send out the liquid in the storage pipe so as to operate the pump at all times, and to control the opening and closing of the supply valve such that a supply flow rate, which is a flow rate of the liquid sent from the supply valve to the working equipment, becomes a target supply flow rate, which is a target of the supply flow rate, with respect to a flow rate of the liquid sent from the pump.
6. The liquid container device according to claim 5, wherein the liquid container device includes a liquid temperature sensor that detects a temperature of the liquid in the storage pipe,
the controller is configured to control a circulation flow rate, which is a flow rate of the liquid flowing into the return pipe, by controlling a pump flow rate, which is a flow rate of the liquid pumped out, based on a detection result of the liquid temperature sensor.
7. The liquid container apparatus according to claim 5, characterized in that the liquid container apparatus comprises:
a liquid temperature sensor for detecting a temperature of the liquid in the storage pipe;
a circulation flow rate adjusting valve provided in the return pipe and adjusting a circulation flow rate which is a flow rate of the liquid flowing into the return pipe,
the controller is configured to control the circulation flow rate by controlling the circulation flow rate adjustment valve based on a detection result of the liquid temperature sensor.
8. The liquid container apparatus according to any one of claims 1 to 3 and 6 to 7, wherein the liquid container apparatus is configured to store a resist stripping liquid used in a resist stripping apparatus as an apparatus for stripping a resist in the work equipment.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862712065P | 2018-07-30 | 2018-07-30 | |
| US62/712065 | 2018-07-30 |
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| CN105573067A (en) * | 2016-01-28 | 2016-05-11 | 信利（惠州）智能显示有限公司 | Temperature control device for developing solution |
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