CN110760821A - Bidirectional tubular PECVD system and preparation process thereof - Google Patents

Bidirectional tubular PECVD system and preparation process thereof Download PDF

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Publication number
CN110760821A
CN110760821A CN201910948586.7A CN201910948586A CN110760821A CN 110760821 A CN110760821 A CN 110760821A CN 201910948586 A CN201910948586 A CN 201910948586A CN 110760821 A CN110760821 A CN 110760821A
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CN
China
Prior art keywords
boat
pecvd
graphite boat
graphite
equipment
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Pending
Application number
CN201910948586.7A
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Chinese (zh)
Inventor
朱旭东
史孟杰
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WUXI JIARUI PHOTOVOLTAIC CO Ltd
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WUXI JIARUI PHOTOVOLTAIC CO Ltd
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Priority to CN201910948586.7A priority Critical patent/CN110760821A/en
Publication of CN110760821A publication Critical patent/CN110760821A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets

Abstract

The invention discloses a bidirectional inlet and outlet tube type PECVD system, which comprises at least one equipment inlet and an equipment outlet, wherein a boat placing part, a preheating part, a PECVD process reaction furnace tube, a cooling part and a boat taking part are sequentially arranged from the equipment inlet to the equipment outlet, the boat placing part is used for grabbing and taking a graphite boat outside the graphite boat to the boat placing part, the graphite boat is placed to the preheating part by the boat placing part for preheating, the graphite boat is moved to the PECVD process reaction furnace tube for reaction after the preheating is finished, the cooling part is cooled after the preheating is finished, and the graphite boat is taken out of the equipment by the boat taking part after the cooling is finished. The invention also discloses a preparation process of the bidirectional in-out tubular PECVD system. By adopting the design of the invention, the PECVD reaction is carried out in a bidirectional inlet and outlet mode, and the preheating operation can be carried out while the PECVD reaction is carried out, thereby greatly accelerating the process of the production process.

Description

Bidirectional tubular PECVD system and preparation process thereof
Technical Field
The invention relates to a PECVD system, in particular to a bidirectional tubular PECVD system and a preparation process thereof.
Background
The PECVD technique is to generate glow discharge on a cathode (i.e., a tray on which a sample is placed) of a process chamber by using low-temperature plasma under low pressure, heat the sample to a predetermined temperature by using the glow discharge (or adding a heating element), then introduce a proper amount of process gases, and finally form a solid film on the surface of the sample through a series of chemical reactions and plasma reactions.
The existing PECVD equipment comprises a boat taking and placing system and a PECVD process reaction furnace tube, wherein the boat taking and placing system is positioned on the same side of the PECVD process reaction furnace tube, and an inlet and an outlet of a graphite boat are the same, but the method has the defects that at most two graphite boats can react in the equipment at the same time on a boat placing manipulator and a PECVD process reaction furnace tube, then the boat taking manipulator is taken out for continuous operation, three steps of preheating, reacting and cooling are required to be completed in the PECVD process reaction furnace tube, the flow time is about 35-45 minutes, wherein after the graphite boats enter the furnace tube, the temperature is firstly increased, the temperature inside the furnace tube and the graphite boats are heated to the temperature required by the process reaction, the approximate time of the step is about 10-15 minutes, and the time of the whole coating process is about 30 percent.
At present, for a tubular PECVD procedure of a solar cell production line, the tubular PECVD procedure mainly comprises the following steps: the boat page or leaf, graphite piece, pottery stick, carbon borer stick are made up, two electrode holes contact with electrode of PECVD apparatus each other, make the graphite flake in the graphite boat present the electric attribute of positive, negative alternation, namely connect with the radio frequency energy supply system alternately, in effect, every pair of graphite flakes is equivalent to the plasma generator of the miniature parallel plate. The solar silicon wafer is placed in the middle of the graphite sheet, deposition gas flows through the parallel plates, and local plasma completes the deposition effect.
Such a graphite boat design is not problematic for a single-sided entry system PECVD apparatus, but would not be suitable if a double-sided entry system were employed.
Disclosure of Invention
The purpose of the invention is as follows: the invention aims to solve the problems that the existing PECVD equipment taking and placing boat is arranged on the same side, preheating, reaction and cooling operations are required to be completed simultaneously in a reaction furnace tube in a PECVD process, the working hours are long, and the production efficiency is low, and the existing graphite boat cannot be suitable for a double-sided in-and-out system.
The technical scheme is as follows: the invention provides the following technical scheme:
a bidirectional tubular PECVD system comprises a PECVD device and a graphite boat matched with the PECVD device for PECVD, wherein the PECVD device comprises at least one device inlet and a device outlet, and a boat placing part, a preheating part, a PECVD process reaction furnace tube, a cooling part and a boat taking part are sequentially arranged from the device inlet to the device outlet.
Adopt two-way design, the equipment import sets up in putting the import of boat portion, and the equipment export sets up in getting the export of boat portion, and the graphite boat gets into from the equipment import, and the equipment export is taken out, in equipment, can hold at least one graphite boat simultaneously at every station, and whole equipment can hold 5 at least graphite boats simultaneously promptly, has long-standing progress for prior art.
The equipment with the structure can be suitable for all surface coating processes needing preheating, such as a surface aluminum oxide film coating process and the like.
Furthermore, the boat placing part and the boat taking part respectively comprise at least one manipulator capable of conveying the graphite boat.
The telescopic length of the manipulator at least ensures that the manipulator can extend to the PECVD process reaction furnace tube and enable the first electrode column and the second electrode column to form electric contact.
Further, heat insulation layers are arranged among the boat placing part, the preheating part, the PECVD process reaction furnace tube, the cooling part and the boat taking part.
The influence of mutual temperature difference is avoided.
Furthermore, the inner wall of each PECVD process reaction furnace tube is provided with a second electrode column capable of supplying power to the anode and the cathode of the graphite boat.
Correspondingly, the graphite boat that this equipment adopted also needs to make the improvement, pile up the graphite boat piece that sets up including the multilayer, has the space that is used for placing the silicon chip between adjacent graphite boat piece, has two first electrode posts that concatenate multi-disc graphite boat piece near the edge of graphite boat piece, and two adjacent graphite boat pieces are connected to two electrode posts respectively.
The first electrode column is matched with the second electrode column to supply power to the anode and the cathode.
Further, the second electrode column extends along the length direction of the PECVD process reaction furnace tube.
The existing technical means is that only the bottom of the PECVD process reaction furnace tube is correspondingly provided with an electrode for power supply, the whole PECVD process reaction furnace tube can be provided with power supply, the application range is enlarged, of course, the same position as the prior art is only needed to be adopted under the general condition, and then the corresponding second electrode column is arranged on the inner wall of the PECVD process reaction furnace tube, so that the cost can be saved, and only under the special condition, if the adopted graphite boat is vertical and is overlapped in an overlong way, the length of the second electrode column is required to be prolonged.
Furthermore, the graphite boat for PECVD comprises a plurality of graphite boat sheets stacked in a multi-layer mode, a gap for placing a silicon wafer is formed between every two adjacent graphite boat sheets, two electrode columns for connecting a plurality of graphite boat sheets in series are arranged at the edge, close to the graphite boat sheet, of each graphite boat sheet, and the two adjacent graphite boat sheets are connected to the two electrode columns respectively.
The positive and negative positions of the existing horizontal graphite boat are fixed, when the graphite boat enters and exits the furnace body from one way, only the positive and negative positions of the graphite boat facing the bottom of the furnace body need to be set, but the setting mode of the furnace body is time-consuming for production, and correspondingly, if the mode of two-way entering and exiting is adopted, the positions of the positive and negative electrodes of the graphite boat need to be adjusted definitely, and the design of the application is adopted, no matter the graphite boat is a horizontal graphite boat or a vertical graphite boat, as long as the positive and negative electrodes are arranged at the edge of a graphite boat sheet, the silicon sheet is not influenced to be placed, the positive and negative electrodes of the graphite boat can be powered through the power supply columns matched with the positive and negative.
Furthermore, each graphite boat sheet is only electrically connected with any electrode column, and one graphite boat sheet is connected with one electrode column, and the other graphite boat sheet is connected with the other electrode column.
Further, each graphite boat piece is electrically connected with the electrode column.
Furthermore, the position where the electrode column is intersected with the graphite boat piece but not connected is isolated by an insulating layer.
A preparation process of a bidirectional tubular PECVD system is characterized in that at least two graphite boats for PECVD are arranged in the bidirectional tubular PECVD system at the same time, and any two of boat placing operation, preheating operation, PECVD process reaction, cooling operation and boat taking operation are correspondingly carried out at any two stations in a boat placing part, a preheating part, a PECVD process reaction furnace tube, a cooling part and a boat taking part at the same time.
Has the advantages that: compared with the prior art, the invention has the advantages that:
by adopting the design of the invention, different stages of the PECVD process are independently finished in different areas in the equipment and can be simultaneously carried out under the control of the equipment control system, the capacity of single equipment is improved by about 30 percent, a small number of PE machines are used for matching the capacity requirements of the front and the back procedures, the investment cost of a production line is reduced, the energy consumption is reduced, and the production cost is reduced on the whole.
The graphite boat for PECVD is suitable for various PECVD tubular structures;
by adopting the design of the invention, the conductive structure is directly connected with the graphite flake instead of being connected through the graphite block, so that the conductive performance is better.
Drawings
FIG. 1 is a schematic structural diagram of a PECVD apparatus of the present invention;
FIG. 2 is a schematic diagram of a prior art PECVD apparatus;
FIG. 3 is a schematic view of a horizontal graphite boat in a PECVD process reaction furnace tube according to the prior art;
FIG. 4 is a schematic structural view of a graphite boat for PECVD in accordance with the present invention;
FIG. 5 is a schematic view of a graphite boat for PECVD in the prior art.
Detailed Description
The invention is further elucidated with reference to the drawings and the embodiments.
Examples
As shown in fig. 1, fig. 2 and fig. 4, a bidirectional tubular PECVD system comprises a PECVD apparatus and a graphite boat for PECVD cooperating therewith, wherein the PECVD apparatus comprises at least one apparatus inlet and an apparatus outlet, and a boat placing part 1, a preheating part 2, a PECVD process reaction furnace tube 3, a cooling part 4 and a boat taking part 5 are sequentially arranged from the apparatus inlet to the apparatus outlet.
By adopting a bidirectional design, the equipment inlet is arranged at the boat placing part inlet, the equipment outlet is arranged at the boat taking part outlet, the graphite boat 6 enters from the equipment inlet, the equipment outlet is taken out, and in the equipment, at least one graphite boat 6 can be simultaneously accommodated in each station, as shown in fig. 3, the graphite boat 6 needs to abut against the bottom of the PECVD process reaction furnace tube 3, namely, the whole equipment can simultaneously accommodate at least 5 graphite boats 6, and the method has great improvement compared with the prior art.
Each of the boat placing unit 1 and the boat taking unit 5 includes at least one robot (not shown) capable of transporting a graphite boat.
The telescopic length of the manipulator at least ensures that the manipulator can extend to the PECVD process reaction furnace tube and enable the first electrode column and the second electrode column to form electric contact.
Thermal insulation layers (not shown) are arranged among the boat placing part 1, the preheating part 2, the PECVD reaction furnace tube 3, the cooling part 4 and the boat taking part 5.
The influence of mutual temperature difference is avoided.
The inner wall of each PECVD process reaction furnace tube 3 is provided with a second electrode column (not shown) capable of supplying power to the anode and the cathode of the graphite boat.
Correspondingly, the graphite boat that this equipment adopted also makes the improvement, pile up the graphite boat piece that sets up including the multilayer, have the space that is used for placing the silicon chip between adjacent graphite boat piece, its characterized in that: two first electrode columns which connect a plurality of graphite boat pieces in series are arranged at the edge of the graphite boat piece, and two adjacent graphite boat pieces are respectively connected to the two electrode columns.
The first electrode column is matched with the second electrode column to supply power to the anode and the cathode.
The second electrode column extends along the length direction of the reaction furnace tube 3 in the PECVD process.
The existing technical means is that only the bottom of the PECVD process reaction furnace tube is correspondingly provided with an electrode for power supply, the whole PECVD process reaction furnace tube can be provided with power supply, the application range is enlarged, of course, the same position as the prior art is only needed to be adopted under the general condition, and then the corresponding second electrode column is arranged on the inner wall of the PECVD process reaction furnace tube, so that the cost can be saved, and only under the special condition, if the adopted graphite boat is vertical and is overlapped in an overlong way, the length of the second electrode column is required to be prolonged.
Further, the graphite boat for PECVD comprises a plurality of graphite boat sheets 7 stacked in a multilayer mode, a gap for placing a silicon wafer is formed between every two adjacent graphite boat sheets 7, two electrode columns 8 for connecting a plurality of graphite boat sheets in series are arranged at the edge, close to the graphite boat sheets, of each graphite boat sheet, and the two adjacent graphite boat sheets 7 are connected to the two electrode columns 8 respectively.
Each graphite boat piece 7 is only electrically connected with any electrode column 8, and one graphite boat piece 7 is connected with one electrode column 8, and the other graphite boat piece is connected with the other electrode column 8.
Each graphite boat piece 7 is electrically connected with an electrode column 8.
The position where the electrode column 8 is intersected with the graphite boat 7 but not connected is isolated by an insulating layer 9.
The positive and negative positions of the existing horizontal graphite boat are fixed, when the graphite boat enters and exits the furnace body from one way, only the positive and negative positions of the graphite boat facing the bottom of the furnace body need to be set, but the setting mode of the furnace body is time-consuming for production, and correspondingly, if the mode of two-way entering and exiting is adopted, the positions of the positive and negative electrodes of the graphite boat need to be adjusted definitely, and the design of the application is adopted, no matter the graphite boat is a horizontal graphite boat or a vertical graphite boat, as long as the positive and negative electrodes are arranged at the edge of a graphite boat sheet, the silicon sheet is not influenced to be placed, the positive and negative electrodes of the graphite boat can be powered through the power supply columns matched with the positive and negative.
Example 2
A preparation process of a bidirectional tubular PECVD system is characterized in that two graphite boats for PECVD are simultaneously arranged in the bidirectional tubular PECVD system and are respectively and correspondingly placed in two stations of a boat placing part and a preheating part at the same time.
By way of example only, the system simultaneously performs at least 5 PECVD graphite boats in the boat placing part, the preheating part, the PECVD process reaction furnace tube, the cooling part and the boat taking part simultaneously, and performs the boat placing operation, the preheating operation, the PECVD process reaction, the cooling operation and the boat taking operation respectively.
Comparative example
As shown in fig. 3 and fig. 5, the tubular PECVD process in the solar cell production line mainly comprises: the boat page, the graphite block, the ceramic rod and the carbon fiber rod are combined, fig. 2 is an end view of the most commonly used graphite boat at present, wherein the reference numerals 10 and 11 are two electrode holes of the graphite boat, and are contacted with electrodes of PECVD equipment, so that the graphite sheets in the graphite boat are in positive and negative alternative electrical properties, namely are alternately connected with a radio frequency energy supply system, and each pair of graphite sheets is equivalent to a micro parallel plate plasma generator in effect. The solar silicon wafer is placed in the middle of the graphite sheet, deposition gas flows through the parallel plates, and local plasma completes the deposition effect.

Claims (10)

1. A two-way business turn over tubular PECVD system which characterized in that: the device comprises PECVD equipment and a graphite boat matched with the PECVD equipment for PECVD, wherein the PECVD equipment comprises at least one equipment inlet and an equipment outlet, and a boat placing part, a preheating part, a PECVD process reaction furnace tube, a cooling part and a boat taking part are sequentially arranged from the equipment inlet to the equipment outlet.
2. The bi-directional ingress and egress tubular PECVD system of claim 1, wherein: the boat placing part and the boat taking part both comprise at least one manipulator capable of conveying the graphite boat.
3. The bi-directional ingress and egress tubular PECVD system of claim 1, wherein: the boat placing part, the preheating part, the PECVD process reaction furnace tube, the cooling part and the boat taking part are all provided with heat insulation layers.
4. The bi-directional ingress and egress tubular PECVD system of claim 1 or 3, wherein: the inner wall of each PECVD process reaction furnace tube is provided with a second electrode column capable of supplying power to the anode and the cathode of the graphite boat.
5. The bi-directional tube entry and exit PECVD system of claim 4, wherein: the second electrode column extends along the length direction of the PECVD process reaction furnace tube.
6. The bi-directional ingress and egress tubular PECVD system of claim 1, wherein: the graphite boat for PECVD comprises a plurality of graphite boat sheets stacked in a multilayer mode, a gap for placing a silicon wafer is formed between every two adjacent graphite boat sheets, two electrode columns for connecting a plurality of graphite boat sheets in series are arranged at the edge, close to the graphite boat sheets, of each graphite boat sheet, and the two adjacent graphite boat sheets are connected to the two electrode columns respectively.
7. The bi-directional tube entry and exit PECVD system of claim 6, wherein: each graphite boat sheet is only electrically connected with any electrode column, and one graphite boat sheet is connected with one electrode column, and the other graphite boat sheet is connected with the other electrode column.
8. The bi-directional tube entry and exit PECVD system of claim 6, wherein: each graphite boat piece is electrically connected with the electrode column.
9. The bi-directional tube entry and exit PECVD system of claim 6, wherein: the position where the electrode column is intersected with the graphite boat sheet but not connected is isolated by an insulating layer.
10. A process for preparing a bi-directional in-out tubular PECVD system of claim 1, wherein: at least two graphite boats for PECVD are arranged in the bidirectional in-and-out tube type PECVD system at the same time, and any two of boat placing operation, preheating operation, PECVD process reaction, cooling operation and boat taking operation are correspondingly carried out at any two stations in the boat placing part, the preheating part, the PECVD process reaction furnace tube, the cooling part and the boat taking part at the same time.
CN201910948586.7A 2019-10-08 2019-10-08 Bidirectional tubular PECVD system and preparation process thereof Pending CN110760821A (en)

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007537591A (en) * 2004-05-12 2007-12-20 ヴァイアトロン・テクノロジーズ・インコーポレーテッド Heat treatment system for semiconductor devices
CN101748392A (en) * 2008-12-17 2010-06-23 中国科学院沈阳科学仪器研制中心有限公司 Fully-automatic large-scale flat-plate type PECVD crystal silicon photovoltaic anti-reflection film preparation device
CN101851748A (en) * 2009-04-03 2010-10-06 中国科学院沈阳科学仪器研制中心有限公司 Full-automatic large panel PECVD silicon nitride tectorial membrane preparation system
CN105568257A (en) * 2016-03-03 2016-05-11 深圳市捷佳伟创新能源装备股份有限公司 Graphite boat with front and rear electrodes and chemical vapor deposition equipment
CN205347569U (en) * 2016-01-07 2016-06-29 深圳市捷佳伟创新能源装备股份有限公司 Plasma enhancement mode chemical vapor deposition equipment
CN107287579A (en) * 2017-06-07 2017-10-24 浙江爱旭太阳能科技有限公司 The filming equipment and film plating process of tubular type PERC solar cells
CN208965031U (en) * 2018-09-06 2019-06-11 深圳市捷佳伟创新能源装备股份有限公司 A kind of loading device of stable plated film
CN211170884U (en) * 2019-10-08 2020-08-04 无锡嘉瑞光伏有限公司 Two-way business turn over tubular PECVD equipment

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007537591A (en) * 2004-05-12 2007-12-20 ヴァイアトロン・テクノロジーズ・インコーポレーテッド Heat treatment system for semiconductor devices
CN101748392A (en) * 2008-12-17 2010-06-23 中国科学院沈阳科学仪器研制中心有限公司 Fully-automatic large-scale flat-plate type PECVD crystal silicon photovoltaic anti-reflection film preparation device
CN101851748A (en) * 2009-04-03 2010-10-06 中国科学院沈阳科学仪器研制中心有限公司 Full-automatic large panel PECVD silicon nitride tectorial membrane preparation system
CN205347569U (en) * 2016-01-07 2016-06-29 深圳市捷佳伟创新能源装备股份有限公司 Plasma enhancement mode chemical vapor deposition equipment
CN105568257A (en) * 2016-03-03 2016-05-11 深圳市捷佳伟创新能源装备股份有限公司 Graphite boat with front and rear electrodes and chemical vapor deposition equipment
CN107287579A (en) * 2017-06-07 2017-10-24 浙江爱旭太阳能科技有限公司 The filming equipment and film plating process of tubular type PERC solar cells
CN208965031U (en) * 2018-09-06 2019-06-11 深圳市捷佳伟创新能源装备股份有限公司 A kind of loading device of stable plated film
CN211170884U (en) * 2019-10-08 2020-08-04 无锡嘉瑞光伏有限公司 Two-way business turn over tubular PECVD equipment

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