CN110716304A - High-resolution long-focal-depth nanometer optical needle generation system - Google Patents
High-resolution long-focal-depth nanometer optical needle generation system Download PDFInfo
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- CN110716304A CN110716304A CN201910992372.XA CN201910992372A CN110716304A CN 110716304 A CN110716304 A CN 110716304A CN 201910992372 A CN201910992372 A CN 201910992372A CN 110716304 A CN110716304 A CN 110716304A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0075—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. increasing, the depth of field or depth of focus
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
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- Optics & Photonics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
The invention discloses a system for generating a high-resolution long-focal-depth nano-optic needle, which comprises a beam expander, a polarizer, a radial polarization converter, a diffractive optical element, a phase plate and a high-numerical-aperture microobjective which are sequentially arranged along the optical axis direction of a laser. The polarizer adjusts the expanded light beams into horizontally polarized linear polarized light, and the linear polarized light generates radial polarized light after passing through the radial deflection converter through the arrangement of the liquid crystal units in the radial polarization converter controlled by the computer. The diffraction optical element regulates and controls the distribution of light intensity to increase the proportion of axial components in radial polarized light, so that the light field has a tight focusing characteristic. The specially designed phase plate is used for realizing phase control of an optical field, and finally, a microscope objective is used for focusing to generate the high-resolution long-focus-depth nanometer optical needle.
Description
Technical Field
The invention belongs to the field of micro-nano structure processing, and particularly relates to a high-resolution long-focal-depth nano optical needle generation system.
Background
With the development of advanced micro-nano processing technology, micro-nano structures have increasingly wide application in the aspects of optics, electronics, biochemistry and the like. However, the nano-device processing technology has been developed to have not only nano-scale processing resolution but also the capability of realizing ultra-limit processing from plane to curved surface, two-dimensional to three-dimensional, and nano-to micro-scale to macro-scale. Among the numerous methods, high aspect ratio complex structures with nanoscale features have been considered as one of the important means for increasing functional density of devices through spatial dimension expansion. The depth ratio enables the micro-nano structure to have a longer action distance, so that the control on photons can be better realized, the action time and the action distance between the photons and the structure are increased, the coupling action, cluster oscillation and local effect which are generated are stronger than that of a surface structure, a more excellent specific optical phenomenon is shown, and better effects can be generated in the aspects of optical waveguide and optical coupling. Therefore, the method has good application prospect in the aspect of constructing novel nanometer devices.
At present, the photoetching technology is the first choice for preparing the nano structure, and various photoetching technologies of different types have been formed through years of development, wherein the maskless laser direct writing technology becomes a very good choice in the field of laser processing due to the processing flexibility and the diversity of processable patterns. In this technique, however, the beam quality of the focused spot used for direct writing is directly related to the quality of the final processed pattern. Therefore, a nano optical needle with high resolution and long focal depth is needed to prepare the micro-nano structure with high depth-to-width ratio. However, there is currently no effective method for producing such high resolution elongated optical needle structures.
Based on the current situation, the invention provides a high-resolution long-focus deep nano optical needle generation system which is mainly used for carrying out phase regulation and control on a radial polarized optical field on the basis of a vector diffraction theory and forming a high-resolution long-focus deep focusing light spot which can be used for processing a high-depth-to-width ratio micro-nano structure through high numerical aperture focusing by utilizing the special electric field distribution characteristic of the system. The method is not limited by resolution and focal depth in the traditional focusing system, and can generate the required nano-optical needle only by properly regulating and controlling the phase of radial polarized light.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: the limitation that the resolution and the focal depth are mutually restricted in the traditional focusing system is overcome, and when the resolution exceeds the diffraction limit, the focal depth is difficult to reach 1 time of wavelength in the traditional focusing system. The nanometer optical needle produced by the invention has resolution ratio exceeding the diffraction limit, and the focal depth can reach more than 10 times of wavelength, so that the nanometer optical needle is applied to the field of micro-nano processing, and can better realize the preparation of a micro-nano structure with a high depth-to-width ratio.
The technical scheme adopted by the invention is as follows: a system for generating a high-resolution long-focal-depth nano optical needle comprises a beam expander, a polarizer, a radial polarization converter, a diffractive optical element, a phase plate and a high-numerical-aperture microobjective which are sequentially arranged along the optical axis direction of a laser, wherein the polarizer adjusts a beam expanded light beam into a horizontally polarized linear polarization light, and the linear polarization light passes through the radial deflection converter and then generates radial polarization light through the arrangement of liquid crystal units in the radial polarization converter controlled by a computer, the diffractive optical element regulates and controls the distribution of light intensity to increase the proportion of axial components in the radial polarization light, so that the optical field has a tight focusing characteristic, the specially designed phase plate is used for realizing the phase regulation and control of the optical field, and finally the microobjective is used for focusing to generate the high-resolution long-focal-depth nano optical needle.
Further, the laser needs to be modulated into parallel light.
Furthermore, the transmission axis of the polarizer needs to be the X axis to ensure that radial polarized light is formed after passing through the radial polarization converter.
Furthermore, the diffractive optical element is optimized by adopting a phase recovery algorithm, and the phase recovery algorithm can adopt a near-field diffraction formula or a far-field diffraction formula for calculation. And designing a single-wavelength diffraction element suitable for the selected wavelength by utilizing a GS algorithm according to the image corresponding to the actual wavelength.
Further, the phase of the adjacent structure of the phase plate is 0 and pi alternately distributed.
Furthermore, the numerical aperture of the microscope objective is more than 0.8, so that the focusing condition is tight focusing.
The invention has the advantages that:
(1) the method overcomes the limitation of mutual restriction of resolution and focal depth in the traditional focusing system, can enable the focusing light spot to have high resolution and long focal depth at the same time, can be used for processing a micro-nano structure with a high depth-to-width ratio, and solves the problem that the existing structure with the high depth-to-width ratio is difficult to prepare.
(2) The nano optical needle produced by the invention has higher resolution and depth-to-width ratio, and the focal depth can be changed by changing the structures of the phase plate and the diffraction element, so that the degree of freedom of regulation is obviously improved.
In conclusion, the method solves the problem that the resolution and the focal depth in a focusing system cannot be improved simultaneously, provides a new tool for processing the high-aspect-ratio micro-nano structure, and promotes the wide application of the high-aspect-ratio structure in the field of micro-nano processing.
Drawings
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be further described in detail with reference to the accompanying drawings, in which:
FIG. 1 is a flow chart of a system for generating a high resolution long focal depth nanooptical needle;
FIG. 2 is a target radially polarized annular light field image for a diffractive element design;
FIG. 3 is an image plane optical field distribution obtained by computer simulation of the phase distribution of the diffraction element designed according to the present invention;
FIG. 4 is a phase distribution of a diffraction element designed according to the present invention;
FIG. 5 is a structural distribution of a 0- π distributed phase plate for phase modulation designed according to the present invention;
FIG. 6 is a diagram illustrating the phase height distribution of a 0- π distributed phase plate for phase modulation according to the present invention;
FIG. 7 is a simulation result of the high resolution long focal depth nano-optic needle designed by the present invention.
Detailed Description
The invention is described in detail below with reference to the figures and the detailed description. The scope of the invention is intended to include the full extent of the claims. The claims of the present invention can be fully realized by those skilled in the art by the following examples.
FIG. 1 is a flow chart of a high resolution long focal depth nanooptical needle generation system, as shown in the figure, the generation of the high resolution long focal depth nanooptical needle of the present invention comprises the following steps:
step (1), firstly, laser emitted by a 532nm laser is collimated and expanded to form parallel light, so that light spots are not scattered within a range required by an experiment.
And (2) adopting a polarizer with the light transmission axis as the X axis to enable the light beam to become linearly polarized light vibrating horizontally.
And (3) enabling the linearly polarized light obtained in the step (2) to pass through a radial polarization converter to obtain radial polarized light, and checking whether the emergent light beam is the radial polarized light, wherein the specific steps are as follows: the light beam passes through the analyzer, and for radial polarized light, the extinction phenomenon always occurs along with the rotation of the analyzer and the direction vertical to the transmission axis of the analyzer.
And (4) preparing a diffractive optical element, wherein a target field is designed to be an annular light beam image shown in fig. 2, the outer diameter of the annular light beam is 6mm, the width of the annular band is 0.3mm, a single-wavelength diffractive element suitable for the selected wavelength is designed by utilizing a GS algorithm, the phase distribution of the obtained diffractive element is shown in fig. 4, the step number of the diffractive element is 2, the phases are 0 and pi, and the maximum depth is 577.4 nm.
And (5) placing the diffraction element obtained in the step (4) on the radial polarization converter in the step (3) and then performing corresponding light field regulation to form the required annular light beam.
Step (6), preparing a two-step annular phase plate with 0-pi phase distribution as shown in fig. 5 and placing the annular phase plate on the diffraction element in step (5), wherein the phase plate needs to perform phase control on the annular beam region generated in step (5) as shown in fig. 6.
And (7) focusing the light field formed in the step (6) by using a microscope objective with the numerical aperture of 0.85 to obtain the nano optical needle capable of being used for preparing the high-aspect-ratio micro-nano structure.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (6)
1. A generation system of a high-resolution long-focus-depth nanometer optical needle is characterized in that: the system comprises a beam expander, a polarizer, a radial polarization converter, a diffractive optical element, a phase plate and a high numerical aperture microobjective which are sequentially arranged along the optical axis direction of a laser, wherein the polarizer adjusts the beam expanded light beam into horizontally polarized linear polarization light, and the linear polarization light generates radial polarization light after passing through the radial deflection converter through the arrangement of liquid crystal units in the radial polarization converter controlled by a computer; the diffraction optical element regulates and controls the distribution of light intensity to increase the proportion of axial components in radial polarized light, so that the light field has a tight focusing characteristic; the specially designed phase plate is used for realizing phase control of an optical field, and finally, a microscope objective is used for focusing to generate the high-resolution long-focus-depth nanometer optical needle.
2. The system for generating a high resolution long focal depth nanooptical needle as claimed in claim 1, wherein: the laser needs to be modulated into parallel light.
3. The generation system of a high resolution long focal depth nano-optic needle according to claim 1, wherein: the transmission axis of the polarizer needs to be the X axis so as to ensure that radial polarized light is formed after passing through the radial polarization converter.
4. The generation system of a high resolution long focal depth nano-optic needle according to claim 1, wherein: the diffraction optical element is optimized by adopting a phase recovery algorithm, a near-field diffraction formula or a far-field diffraction formula can be adopted for calculation in the phase recovery algorithm, and a single-wavelength diffraction element suitable for the selected wavelength is designed by utilizing the phase recovery algorithm according to an image corresponding to the actual wavelength.
5. The generation system of a high resolution long focal depth nano-optic needle according to claim 1, wherein: the phases of the adjacent structures of the phase plate are alternately distributed as 0 and pi.
6. The generation system of a high resolution long focal depth nano-optic needle according to claim 1, wherein: the numerical aperture of the microscope objective is larger than 0.8, and the focusing condition is guaranteed to be tight focusing.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910992372.XA CN110716304A (en) | 2019-10-18 | 2019-10-18 | High-resolution long-focal-depth nanometer optical needle generation system |
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| CN201910992372.XA CN110716304A (en) | 2019-10-18 | 2019-10-18 | High-resolution long-focal-depth nanometer optical needle generation system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114406450A (en) * | 2022-01-25 | 2022-04-29 | 中国工程物理研究院激光聚变研究中心 | Regulating and controlling device and method for high-uniformity tight-focusing long-light needle in laser processing |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103336367A (en) * | 2013-06-07 | 2013-10-02 | 中国科学院上海光学精密机械研究所 | Three-dimensional optical field adjusting and controlling device |
| CN103777473A (en) * | 2014-01-23 | 2014-05-07 | 中国科学院上海光学精密机械研究所 | Laser direct writing exposure device based on stimulated light emission loss |
| CN105607267A (en) * | 2016-03-07 | 2016-05-25 | 东南大学 | Device for generating diffraction-free needle-shaped light field |
| CN109239915A (en) * | 2018-09-29 | 2019-01-18 | 南京理工大学 | A method of it generating hamburger pouch-type and focuses light field |
-
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- 2019-10-18 CN CN201910992372.XA patent/CN110716304A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103336367A (en) * | 2013-06-07 | 2013-10-02 | 中国科学院上海光学精密机械研究所 | Three-dimensional optical field adjusting and controlling device |
| CN103777473A (en) * | 2014-01-23 | 2014-05-07 | 中国科学院上海光学精密机械研究所 | Laser direct writing exposure device based on stimulated light emission loss |
| CN105607267A (en) * | 2016-03-07 | 2016-05-25 | 东南大学 | Device for generating diffraction-free needle-shaped light field |
| CN109239915A (en) * | 2018-09-29 | 2019-01-18 | 南京理工大学 | A method of it generating hamburger pouch-type and focuses light field |
Non-Patent Citations (1)
| Title |
|---|
| 赵弘扬: "基于矢量光束聚焦的超分辨滤波器设计研究", 《中国优秀硕士论文全文数据库 信息科技辑》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114406450A (en) * | 2022-01-25 | 2022-04-29 | 中国工程物理研究院激光聚变研究中心 | Regulating and controlling device and method for high-uniformity tight-focusing long-light needle in laser processing |
| CN114406450B (en) * | 2022-01-25 | 2023-11-07 | 中国工程物理研究院激光聚变研究中心 | Regulation and control device and method for high-uniformity tightly-focused long optical needle in laser processing |
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