CN107329275B - Method and system for generating high-quality quasi-Bessel array beam - Google Patents
Method and system for generating high-quality quasi-Bessel array beam Download PDFInfo
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- CN107329275B CN107329275B CN201710765842.XA CN201710765842A CN107329275B CN 107329275 B CN107329275 B CN 107329275B CN 201710765842 A CN201710765842 A CN 201710765842A CN 107329275 B CN107329275 B CN 107329275B
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
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Abstract
The invention discloses a method and a system for generating high-quality quasi-Bessel array beams, wherein the method comprises the following steps: generating a Gaussian beam; expanding the Gaussian beam; modulating the expanded Gaussian beam to generate an array point beam; scattering the array point light beam to generate a completely incoherent light beam; collimating the completely incoherent light beam to generate a partially coherent light beam; modulating the partial coherent light beam, and generating a circular vortex light beam at a focus; the circular vortex light beams are focused, and quasi Bessel array light beams are generated at a focal point. According to the method and the system for generating the high-quality quasi-Bessel array beam, the high-quality quasi-Bessel array beam can be generated by using common optical equipment, the array mode, the number of arrays and the Bessel order of the quasi-Bessel array beam can be regulated and controlled as required, the high-power quasi-Bessel array beam can be generated, and the method and the system have important effects on industry and national defense and have wide application prospects.
Description
Technical Field
The invention relates to the technical field of Bessel beam generation, in particular to a method and a system for generating high-quality quasi-Bessel array beams.
Background
Diffraction is known to be an extremely important feature of the beam itself, however, in 1987, bernin first proposed a bessel beam, which was found to be immune to diffraction. However, the bessel beam is a central main spot and has an infinite number of concentric rings beside it, and the energy of each ring is the same, so the energy of the bessel beam is infinite, and obviously in reality, the beam cannot exist. In experiments we can only generate a finite ring of bessel beams, called quasi-bessel beams. In the same year, Durnin experimentally generates a quasi-bessel beam by using a very narrow ring, research results of the quasi-bessel beam are published in Physical Review Letters in the journal of Physical apex, and then a large number of researchers begin to research the characteristics of the bessel beam, and the research results show that the quasi-bessel beam has a strong self-repairing function and has an irreplaceable effect in a plurality of fields such as particle capture, atomic waveguide, optical detection, micromanipulation, technology and cell imaging. In addition, the bessel beam can be used as a traction beam because the bessel beam generates a backward scattering force after encountering the particles, and the force can promote the particles to move to the light source. On the other hand, the array light beam with the light intensity distribution of the periodic structure has important functions in the aspects of cold atom capture, grating generation, microfluidic sequencing, photonic crystal engineering, optical communication and the like. Therefore, how to generate quasi-bessel array beams is an important issue for many researchers to study.
Currently, there are several methods for generating quasi-bessel beam arrays: (1) an N wave interference method, (2) a holography method, (3) a Dammann grating method, and (4) a microstructure method. However, these methods generally have the following problems: the quality of the generated quasi-Bessel light beam is low, and the increasing requirements of the quasi-Bessel light beam in the fields of scientific research and application cannot be met.
Disclosure of Invention
In view of the deficiencies of the prior art, it is an object of the present invention to provide a method for producing a high quality quasi-bessel array beam, the method comprising the steps of:
generating a Gaussian beam;
expanding the Gaussian beam;
modulating the expanded Gaussian beam to generate an array point beam;
scattering the array point light beam to generate a completely incoherent light beam;
collimating the fully incoherent light beam to generate a partially coherent light beam;
modulating the partially coherent light beam to generate a circular vortex light beam;
and focusing the circular vortex light beams to generate quasi Bessel array light beams at a focus.
As a further improvement of the present invention, modulating the partially coherent light beam to generate an annular vortex light beam specifically includes: and respectively carrying out phase modulation and light intensity modulation on the partially coherent light beam by using a vortex phase plate and a circular ring amplitude attenuation sheet, wherein the topological charge number of the circular ring vortex light beam is the same as that of the vortex phase plate.
As a further improvement of the present invention, the performing phase modulation and light intensity modulation on the partially coherent light beam by using the vortex phase plate and the circular amplitude attenuation plate respectively specifically includes: firstly, the vortex phase plate is used for carrying out phase modulation on the partially coherent light beam, and then the annular amplitude attenuation piece is used for carrying out light intensity modulation on the partially coherent light beam after the phase modulation, or the annular amplitude attenuation piece is used for carrying out light intensity modulation on the partially coherent light beam, and then the vortex phase plate is used for carrying out phase modulation on the partially coherent light beam after the light intensity modulation.
As a further improvement of the present invention, the modulating the expanded gaussian beam specifically includes: and (3) modulating the light intensity distribution of the expanded Gaussian beam by using a pinhole plate or a micro-lens array.
As a further improvement of the present invention, the scattering of the array spot beam specifically includes: the array spot beam is broken up using rotating ground glass.
It is a further object of the present invention to provide a system for producing high quality quasi-bessel array beams, said system comprising:
a laser for generating a gaussian beam;
the beam expander is used for expanding the Gaussian beam;
the first light modulator is used for modulating the expanded Gaussian beam to generate an array point beam;
the light beam scattering device is used for scattering the array point light beam to generate a completely incoherent light beam;
a collimating lens for collimating the fully incoherent light beam to generate a partially coherent light beam;
the second optical modulator group is used for modulating the partially coherent light beam to generate an annular vortex light beam;
and the focusing lens is used for focusing the circular vortex light beams and generating quasi Bessel array light beams at a focal point.
As a further improvement of the invention, the second optical modulator group comprises a vortex phase plate and a circular ring amplitude attenuation sheet; the modulating the partially coherent light beam to generate an annular vortex light beam specifically includes: and respectively carrying out phase modulation and light intensity modulation on the partially coherent light beam by using a vortex phase plate and a circular ring amplitude attenuation sheet, wherein the topological charge number of the circular ring vortex light beam is the same as that of the vortex phase plate.
As a further improvement of the present invention, the performing phase modulation and light intensity modulation on the partially coherent light beam by using the vortex phase plate and the circular amplitude attenuation plate respectively specifically includes: firstly, the vortex phase plate is used for carrying out phase modulation on the partially coherent light beam, and then the annular amplitude attenuation piece is used for carrying out light intensity modulation on the partially coherent light beam after the phase modulation, or the annular amplitude attenuation piece is used for carrying out light intensity modulation on the partially coherent light beam, and then the vortex phase plate is used for carrying out phase modulation on the partially coherent light beam after the light intensity modulation.
As a further improvement of the present invention, the first light modulator is a pinhole plate or a microlens array.
As a further improvement of the invention, the light beam scattering device is a rotating ground glass.
Compared with the prior art, the invention has the beneficial effects that: the method and the system for generating the high-quality quasi-Bessel array beam can generate the high-quality quasi-Bessel array beam by using common optical equipment, can regulate and control the array mode, the array number and the Bessel order of the quasi-Bessel array beam according to the requirement, have low price, can generate the high-power quasi-Bessel array beam, have important effect on industry and national defense, and have wide market prospect and application prospect.
The foregoing description is only an overview of the technical solutions of the present invention, and in order to make the technical means of the present invention more clearly understood, the present invention may be implemented in accordance with the content of the description, and in order to make the above and other objects, features, and advantages of the present invention more clearly understood, the following preferred embodiments are described in detail with reference to the accompanying drawings.
Drawings
FIG. 1 is a schematic diagram of a method of producing a high quality quasi-Bessel array beam in an embodiment of the invention;
FIG. 2 is a schematic diagram of a system for producing a high quality quasi-Bessel array beam in an embodiment of the present invention;
FIG. 3 is a light intensity distribution diagram of quasi-Bessel array light beams at receiving surfaces corresponding to ring amplitude attenuation sheets with different inner and outer ring radius parameters under software simulation;
FIG. 4 is a diagram of the light intensity distribution of quasi-Bessel array light beams at the receiving surface corresponding to the pinhole plates in different array forms under software simulation;
FIG. 5 is a light intensity distribution diagram of quasi-Bessel array light beams at receiving surfaces corresponding to pinhole plates with different circular hole pitches under software simulation;
FIG. 6 is a light intensity distribution diagram of quasi-Bessel array light beams at receiving surfaces corresponding to vortex phase plates with different topological charge numbers under software simulation.
FIG. 7 is a diagram of the light intensity distribution of quasi-Bessel array light beams at the receiving surfaces corresponding to vortex phase plates with different topological charge numbers in an experiment.
In the figure: 210. a laser; 220. a beam expander; 230. a pinhole plate; 240. rotating the ground glass; 250. a collimating lens; 260. swirling the phase plate; 270. a circular ring amplitude attenuation sheet; 280. a focusing lens; 290. a receiving surface.
Detailed Description
The invention will be further described with reference to the accompanying drawings and the detailed description below:
as shown in fig. 1, a method for generating a high quality quasi-bessel array beam according to the present invention comprises the steps of:
step S110, generating a Gaussian beam;
specifically, a laser is used to generate a gaussian beam.
Step S120, expanding the Gaussian beam;
specifically, the gaussian beam is expanded by a beam expander.
Step S130, modulating the expanded Gaussian beam to generate an array point beam;
preferably, the expanded gaussian beam is modulated by a pinhole plate array, and the expanded gaussian beam passes through the pinhole plate to generate an array point beam.
Preferably, each point of the light beam has a very small size, on the order of 10-100 microns, and the quasi-bessel array can be set according to requirements through the pinhole plate, because the array distribution form of the quasi-bessel array light beam is consistent with the distribution form of the pinhole array on the pinhole plate. The pinhole array on the pinhole plate meets the condition that light in the region where the pinholes are located can be completely transmitted, and other regions are completely blocked.
Preferably, in other embodiments of the present invention, the pinhole plate may be replaced with a microlens array or other device as long as the array spot beam can be generated.
Step S140, scattering the array point light beam to generate a completely incoherent light beam;
preferably, the array spot beam is broken up using a rotating ground glass.
Preferably, in other embodiments of the present invention, the rotating ground glass may be replaced by other devices as long as they function to break up the array spot beam to generate a completely incoherent beam.
Preferably, the rotating ground glass is tightly attached to the pinhole plate.
Step S150, collimating the completely incoherent light beam to generate a partially coherent light beam;
preferably, the substantially incoherent light beam is collimated by a collimating lens.
Step S160, modulating the partially coherent light beam to generate an annular vortex light beam;
specifically, the vortex phase plate and the circular ring amplitude attenuation sheet are used for respectively carrying out phase modulation and light intensity modulation on the partially coherent light beam, and the topological charge number of the circular ring-shaped vortex light beam is the same as that of the vortex phase plate.
Specifically, the performing phase modulation and light intensity modulation on the partially coherent light beam by using the vortex phase plate and the circular ring amplitude attenuation sheet respectively specifically includes: firstly, the vortex phase plate is used for carrying out phase modulation on the partially coherent light beam, and then the annular amplitude attenuation piece is used for carrying out light intensity modulation on the partially coherent light beam after the phase modulation, or the annular amplitude attenuation piece is used for carrying out light intensity modulation on the partially coherent light beam, and then the vortex phase plate is used for carrying out phase modulation on the partially coherent light beam after the light intensity modulation.
Preferably, the collimating lens, the vortex phase plate and the circular ring amplitude attenuation sheet are closely attached.
And S170, focusing the circular vortex light beams and generating quasi Bessel array light beams at a focus.
Specifically, the annular vortex light beams are focused by a focusing lens, a quasi-Bezier array light beam receiving surface is arranged at a focal point, and the quasi-Bezier array light beam receiving surface receives the quasi-Bezier array light beams.
As shown in fig. 2, a system for generating high quality quasi-bessel array beams for the present invention comprises: the device comprises a laser 210, a beam expander 220, a pinhole plate 230, rotating ground glass 240, a collimating lens 250, a vortex phase plate 260, a circular ring amplitude attenuation sheet 270, a focusing lens 280 and a receiving surface 290.
The laser 210 is used for generating a Gaussian beam;
the beam expander 220 is configured to expand the gaussian beam;
the pinhole plate 230 is used for modulating the expanded Gaussian beam to generate an array point beam;
preferably, each point of the light beam has a very small size, on the order of 10-100 microns, and the quasi-bessel array can be set according to requirements through the pinhole plate, because the array distribution form of the quasi-bessel array light beam is consistent with the distribution form of the pinhole array on the pinhole plate. The pinhole array on the pinhole plate meets the condition that light in the region where the pinholes are located can be completely transmitted, and other regions are completely blocked.
Preferably, in other embodiments of the present invention, the pinhole plate may be replaced with a microlens array or other device as long as the array spot beam can be generated.
The rotating ground glass 240 is used for scattering the array point light beam to generate a completely incoherent light beam;
preferably, in other embodiments of the present invention, the rotating ground glass 240 may be replaced by other devices as long as they function to break up the array spot beam to generate a completely incoherent beam.
Preferably, the rotating ground glass 240 is closely attached to the pinhole plate 230.
The collimating lens 250 is configured to collimate the completely incoherent light beam to generate a partially coherent light beam;
the vortex phase plate 260 and the annular amplitude attenuation sheet 270 are used for modulating the partially coherent light beam to generate an annular vortex light beam;
specifically, the vortex phase plate 260 and the circular amplitude attenuation plate 270 are used to perform phase modulation and light intensity modulation on the partially coherent light beam, and the topological charge number of the circular vortex light beam is the same as that of the vortex phase plate 260.
Preferably, the positions of the vortex phase plate 260 and the circular ring amplitude attenuation plate 270 are adjustable. Specifically, the partially coherent light beam may be phase-modulated by the vortex phase plate 260 having a topological charge number and then the light intensity of the phase-modulated partially coherent light beam is modulated by the circular amplitude attenuation plate 270, or the partially coherent light beam may be intensity-modulated by the circular amplitude attenuation plate 270 and then the phase-modulated partially coherent light beam is phase-modulated by the vortex phase plate 260.
Preferably, the collimating lens 250, the vortex phase plate 260 and the circular amplitude attenuation sheet 270 are closely attached.
The focusing lens 280 is used for focusing the circular vortex light beams and generating quasi-Bessel array light beams at a focal point;
preferably, when the partially coherent light beam passes through the vortex phase plate 260 and then passes through the circular amplitude attenuation plate 270, the distance from the incident surface of the focusing lens 280 to the exit surface of the circular amplitude attenuation plate 270 is the focal length of the focusing lens 280; when the partially coherent light beam passes through the annular amplitude attenuation plate 270 and then passes through the vortex phase plate 260, the distance from the incident surface of the focusing lens 280 to the exit surface of the vortex phase plate 260 is the focal length of the focusing lens 280.
The receiving surface 290 is configured to receive the quasi-bessel array beam.
Specifically, the distance from the receiving surface 290 to the exit surface of the focusing lens 280 is the focusing of the focusing lens 280.
In the calculation derivation, the pinhole plate 230 is set to be tightly attached to the rotating ground glass 240, the collimating lens 250, the vortex phase plate 260 and the circular amplitude attenuation sheet 270 are sequentially tightly attached to each other, the distance from the exit surface of the circular amplitude attenuation sheet 270 to the entrance surface of the focusing lens 280 is the focal length of the focusing lens 280, the distance from the focusing lens 280 to the receiving surface 290 is the focal length of the focusing lens 280, the pinhole plate 230 is composed of M circular hole arrays, and the transmittance function of the pinhole plate to light intensity is as follows:
wherein sigma0Expressed as the radius of the circular hole; v represents a vector coordinate; v. of0mIndicating the location of the center of each circular hole. Since the pinhole plate 230 is tightly attached to the rotating ground glass 240, the light intensity distribution on the surface of the rotating ground glass 240 is:
at the exit face of the annular amplitude attenuation sheet 270, the cross-normal density function of the light beam thereof can be obtained according to the generalized Collins integral expression:
where denotes the complex conjugate, -denotes the fourier variation, τ (r) is the electric field distribution at the light source, where:
wherein r and
as a coordinate of a cylindrical coordinate system, T1Is a transmittance function of the annular amplitude attenuation sheet 270, which is specifically expressed as:
where a denotes the outer radius of the ring and b denotes the inner radius of the ring. Furthermore, T1The function can be described as the subtraction of two circular domain functions, where the circular domain function is defined as:
r ≡ (x, y) denotes the vector coordinates, r ≡ x0Representing the radius of the circular field.
The transmission from the exit surface of the annular amplitude attenuation plate 270 to the receiving surface 290 can be expressed by means of a generalized Collins integral expression, and the intensity of light at the receiving surface 290 can be determined from the formula S (ρ) ═ W (ρ, ρ, z):
where ρ denotes the vector coordinates at the receiving surface, k 2 π/λ, λ being the wavelength of the Gaussian beam. After a simple calculation, the intensity of the light at the receiving surface 290 can be expressed as:
wherein
Representing a convolution. It can be found by the above formula: the intensity of the light at the receiving surface 290 is a convolution of the fourier change of the beam at the source laser 210 with the P-function at the face of the rotating frosted glass 240.
Here, each beamlet size in the light intensity array on the face of the rotating frosted glass 240 is extremely small, i.e., σ0Is very small. And satisfy
The corresponding distribution is much larger than
Based on the convolution property, the above equation can be reduced to:
where ρ is0mThe coordinates representing the amount of deflection at the receiving surface, so from the above equation, in combination with the nature of the P function, one can know: by adjusting the light intensity distribution and the number on the frosted glass surface, the array mode and the number of the quasi-Bessel light beams can be accurately regulated and controlled.
Fourier transform of τ (r) yields:
wherein the content of the first and second substances,
when b approaches a indefinitely (i.e., the circle is a delta circle), the above equation can be reduced:
the ideal Bessel array beam can be obtained, but a delta ring does not exist in reality, and the circular ring has a certain width, so the light beam is called a quasi-Bessel array beam. The narrower the ring width (i.e., the closer b is to a), the closer the quasi-bessel array beam is produced to the ideal bessel array beam.
In the software simulation, a gaussian beam with λ being 532nm is adopted, the pinhole plate 230 is tightly attached to the rotating ground glass 240, the collimating lens 250, the vortex phase plate 260 and the circular amplitude attenuation plate 270 are sequentially tightly attached, the distance from the emergent surface of the circular amplitude attenuation plate 270 to the incident surface of the focusing lens 280 is the focal length of the focusing lens 280, and the distance from the focusing lens 280 to the receiving surface 290 is the focal length of the focusing lens 280.
Fig. 3 is a diagram showing a light intensity distribution of quasi-bessel array light beams at receiving surfaces corresponding to ring amplitude attenuation sheets with different inner and outer ring radius parameters under software simulation. Wherein the fixed parameters are: the size of each sub-light spot hitting on the rotating ground glass 240 is 23um, the distance between adjacent sub-light spots is d equal to 1mm, and the topological charge number of the vortex phase plate is l equal to 2. The parameters of the ring amplitude attenuation sheet 270 in each figure are (a) a ═ 1.856mm, b ═ 1.398mm, (b) a ═ 1.856mm, b ═ 1.6mm, (c) a ═ 1.856mm, and b ═ 1.7mm, respectively.
The following conclusions can be drawn by numerical comparison: the smaller the difference between the outer ring radius a and the inner ring radius b, i.e., the narrower the ring of the annular amplitude attenuation sheet 270, the greater the number of quasi-bessel rings generated, and the closer to the ideal bessel beam.
As shown in fig. 4, it is a distribution diagram of the light intensity of quasi-bessel array light beams at the receiving surface 290 corresponding to the pinhole plates 230 in different array forms under the software simulation of the present invention. The size of each sub-spot on the rotating ground glass 240 is 23um, the distance between adjacent sub-spots is 1mm, the topological load number of the vortex phase plate is 2, and the parameters a and b of the ring amplitude attenuation plate are 1.856mm and 1.398 mm.
We have found that the distribution of the quasi-bessel array beam at the array spot beam distribution receiving surface 290 from the pinhole plate 230 is uniform, and therefore the array spot beam distribution pattern from the pinhole plate 230 is omitted here. The following conclusions can be drawn: the specific array distribution form of the quasi-bessel array beam can be regulated by the circular hole distribution of the pinhole plate 230.
As shown in fig. 5, it is a light intensity distribution diagram of quasi-bessel array light beams at the receiving surface 290 corresponding to the pinhole plate 230 with different circular hole pitches d under the software simulation of the present invention. Wherein the fixed parameters are: the size of each sub-light spot on the rotating ground glass 240 is 23um, the topological charge number of the vortex phase plate is 2, and the parameters a and b of the circular ring amplitude attenuation sheet are 1.856mm and 1.398 mm. The parameters of the pinhole plate 230 in each figure are (a) d is 0.6mm, (b) d is 1mm, and (b) d is 1.4 mm.
The following conclusions can be drawn by numerical comparison: the distance between the sub-beams of the quasi-bessel array beam can be adjusted by adjusting the pitch of the circular holes of the pinhole plate 230.
As shown in FIG. 6, it is a diagram of the light intensity distribution of quasi-Bessel array light beams at the receiving surface 290 corresponding to the vortex phase plate 260 with different topological charge numbers l in the software simulation according to the present invention. Wherein the fixed parameters are: the size of each sub-light spot on the rotating ground glass 240 is 23um, the distance between adjacent sub-light spots is 1mm, and the parameters a and b of the annular amplitude attenuation sheet are 1.856mm and 1.398mm respectively. The parameters of the vortex phase plate 260 in each figure are: (a) l is 0, (b) l is 1, and (b) l is 2.
The following conclusions can be drawn by numerical comparison: by replacing vortex phase plates 260 with different topological charge numbers, quasi-bessel array beams with different bessel orders corresponding to the topological charge numbers of the vortex phase plates 260 can be generated.
FIG. 7 is a graph showing the intensity distribution of quasi-Bessel array beams at receiving surfaces corresponding to vortex phase plates with different topological charge numbers in an experiment according to the present invention.
In an experiment, a Gaussian beam with the lambda of 532nm is adopted, the pinhole plate 230 is tightly attached to the rotating ground glass 240, the collimating lens 250, the vortex phase plate 260 and the circular amplitude attenuation sheet 270 are sequentially tightly attached, and the circular amplitude attenuation sheetThe distance from the exit surface of the reduction plate 270 to the entrance surface of the focusing lens 280 is the focal length of the focusing lens 280, the distance from the focusing lens 280 to the receiving surface 290 is the focal length of the focusing lens 280, the pinhole plate 230 is composed of a 4 × 4 pinhole array, wherein the distance between two circular holes connected in the horizontal or vertical direction is d equal to 1mm, and the radius sigma of each circular hole is 1mm040 μm, so that the size of each sub-spot impinging on the rotating ground glass 240 is 40um, and the focal length f of the collimating lens 2501400mm, focal length f of the focusing lens 2802The radius parameter a of the outer ring and the radius parameter b of the ring amplitude attenuation plate 270 are 1.856mm and 1.398mm, respectively, 150mm, and the vortex phase plate 260 with different topological charge numbers l is used. The parameters of the vortex phase plate 260 in each figure are: (a) l is 0, (b) l is 1, and (b) l is 2. As can be seen from the figure: according to the experimental parameters, high-quality quasi-Bessel array beams with different orders can be obtained.
Compared with the prior art, the invention has the beneficial effects that: according to the method and the system for generating the high-quality quasi-Bessel array beam, the high-quality quasi-Bessel array beam can be generated by using common optical equipment, the array mode, the number of the arrays and the Bessel order of the quasi-Bessel array beam can be regulated and controlled according to needs, the adopted equipment is simple and low in price, the high-power quasi-Bessel array beam can be generated, the method and the system have an important effect on industry and national defense, and have wide market prospect and application prospect.
The above embodiments are only preferred embodiments of the present invention, and the protection scope of the present invention is not limited thereby, and any insubstantial changes and substitutions made by those skilled in the art based on the present invention are within the protection scope of the present invention.
Claims (8)
1. A method of producing a high quality quasi-bessel array beam, comprising:
generating a Gaussian beam;
expanding the Gaussian beam;
modulating the expanded Gaussian beam to generate an array point beam; the method specifically comprises the following steps: carrying out light intensity distribution modulation on the expanded Gaussian beam by using a pinhole plate;
scattering the array point light beam to generate a completely incoherent light beam;
collimating the fully incoherent light beam to generate a partially coherent light beam;
modulating the partially coherent light beam to generate a circular vortex light beam;
and focusing the circular vortex light beams to generate quasi Bessel array light beams at a focus.
2. The method of producing a high quality quasi-bessel array beam of claim 1 in which modulating the partially coherent beam produces a circular vortex beam, comprising: and respectively carrying out phase modulation and light intensity modulation on the partially coherent light beam by using a vortex phase plate and a circular ring amplitude attenuation sheet, wherein the topological charge number of the circular ring vortex light beam is the same as that of the vortex phase plate.
3. The method of generating high quality quasi-bessel array beams as claimed in claim 2, wherein said phase modulating and intensity modulating said partially coherent beam with a vortex phase plate and a circular amplitude attenuator, respectively, comprises: firstly, the vortex phase plate is used for carrying out phase modulation on the partially coherent light beam, and then the annular amplitude attenuation piece is used for carrying out light intensity modulation on the partially coherent light beam after the phase modulation, or the annular amplitude attenuation piece is used for carrying out light intensity modulation on the partially coherent light beam, and then the vortex phase plate is used for carrying out phase modulation on the partially coherent light beam after the light intensity modulation.
4. The method of generating a high quality quasi-bessel array beam of claim 1 in which breaking up the array spot beam includes: the array spot beam is broken up using rotating ground glass.
5. A system for producing a high quality quasi-bessel array beam, comprising:
a laser for generating a gaussian beam;
the beam expander is used for expanding the Gaussian beam;
the first light modulator is used for modulating the expanded Gaussian beam to generate an array point beam; the first light modulator is a pinhole plate;
the light beam scattering device is used for scattering the array point light beam to generate a completely incoherent light beam;
a collimating lens for collimating the fully incoherent light beam to generate a partially coherent light beam;
the second optical modulator group is used for modulating the partially coherent light beam to generate an annular vortex light beam;
and the focusing lens is used for focusing the circular vortex light beams and generating quasi Bessel array light beams at a focal point.
6. The system for generating a high quality quasi-bessel array beam of claim 5, wherein the second optical modulator bank includes a vortex phase plate and a circular amplitude attenuator plate; the modulating the partially coherent light beam to generate an annular vortex light beam specifically includes: and respectively carrying out phase modulation and light intensity modulation on the partially coherent light beam by using a vortex phase plate and a circular ring amplitude attenuation sheet, wherein the topological charge number of the circular ring vortex light beam is the same as that of the vortex phase plate.
7. The system for generating high quality quasi-bessel array beams as claimed in claim 6, wherein said phase modulating and intensity modulating said partially coherent beam with a vortex phase plate and a circular amplitude attenuator, respectively, comprises: firstly, the vortex phase plate is used for carrying out phase modulation on the partially coherent light beam, and then the annular amplitude attenuation piece is used for carrying out light intensity modulation on the partially coherent light beam after the phase modulation, or the annular amplitude attenuation piece is used for carrying out light intensity modulation on the partially coherent light beam, and then the vortex phase plate is used for carrying out phase modulation on the partially coherent light beam after the light intensity modulation.
8. The system for generating a high quality quasi-bessel array beam of claim 5 in which the beam breaking means is rotating ground glass.
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| CN107953028B (en) * | 2017-12-28 | 2019-11-26 | 东莞市盛雄激光先进装备股份有限公司 | A kind of monitoring device of bessel beam |
| CN109273864B (en) * | 2018-09-06 | 2020-12-11 | 中国科学院国家空间科学中心 | Device for generating millimeter wave Bessel wave beam by using double-fed source |
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| CN105807432A (en) * | 2016-05-06 | 2016-07-27 | 华侨大学 | Optical system for generating hollow beam by focusing Bessel-Shell model light field through axicons |
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