CN110682185B - Processing method of high-precision exposure lens - Google Patents
Processing method of high-precision exposure lens Download PDFInfo
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- CN110682185B CN110682185B CN201910856844.9A CN201910856844A CN110682185B CN 110682185 B CN110682185 B CN 110682185B CN 201910856844 A CN201910856844 A CN 201910856844A CN 110682185 B CN110682185 B CN 110682185B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/0031—Machines having several working posts; Feeding and manipulating devices
- B24B13/0037—Machines having several working posts; Feeding and manipulating devices the lenses being worked by different tools, e.g. for rough-grinding, fine-grinding, polishing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/01—Specific tools, e.g. bowl-like; Production, dressing or fastening of these tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/01—Specific tools, e.g. bowl-like; Production, dressing or fastening of these tools
- B24B13/012—Specific tools, e.g. bowl-like; Production, dressing or fastening of these tools conformable in shape to the optical surface, e.g. by fluid pressure acting on an elastic membrane
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/02—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B51/00—Arrangements for automatic control of a series of individual steps in grinding a workpiece
Abstract
A high-precision exposure lens processing method for manufacturing a pulse compression grating comprises the steps of building a self-collimation interference detection device, milling and grinding, grinding and polishing, precision polishing and smoothing treatment of an aspheric surface of an exposure lens, and performing interferometer measurement on transmitted wavefront of the exposure lens to be processed by adopting the self-collimation interference detection device in the processes of grinding and polishing, precision polishing and smoothing treatment to ensure that each step meets respective requirements. The method avoids self errors and installation and adjustment errors introduced by the compensating mirror, adopts a high-efficiency high-precision numerical control machining process, solves the problem of full-band errors in numerical control machining of the exposure lens, finally improves the full-band wave surface quality under the exposure wavelength, and lays a foundation for manufacturing high-precision pulse compression gratings.
Description
Technical Field
The invention relates to the field of optical processing, in particular to a high-precision exposure lens processing method for manufacturing a pulse compression grating.
Background
High power lasers are ideal drivers for Inertial Confinement Fusion (ICF). In order to obtain ultra-strong and ultra-high energy laser, a Chirped Pulse Amplification (CPA) technique is used to generate ultra-strong and ultra-short laser pulses. The core element in the chirped pulse amplification technology is a pulse compression grating with large area, high diffraction efficiency and high damage threshold. At present, a static interference field exposure method is adopted internationally to manufacture a large-aperture grating, namely two beams of coherent light are expanded and then interfered to form an effective interference field larger than the area of a grating substrate, as shown in fig. 1. Two groups of large-aperture beam-expanding lenses are needed for manufacturing the large-scale holographic grating by adopting a static interference field exposure mode, so the processing precision of the exposure lens determines the precision of an interference field, and the transmitted wavefront precision of the exposure lens is guaranteed on the premise that the interference field exposure is used for manufacturing the high-precision large-aperture diffraction grating.
The exposure lens usually has an operating wavelength of ultraviolet band, while the interferometer has a detection wavelength of 632.8nm during processing, which causes a certain system error, mainly spherical aberration, due to the difference between the detection wavelength and the operating wavelength. The conventional machining inspection method adopts a compensation inspection method, that is, a corresponding compensation lens is designed according to an aspheric equation of an exposure lens to compensate for a systematic error caused by a wavelength change, as shown in fig. 2. In actual processing, the transmitted wavefront error of the exposure lens includes: 1. error of interferometer spherical standard lens; 2. compensating the machining error of the mirror; 3. exposing the surface shape error of the lens; 4. error of a planar standard mirror; 5. and detecting the installation and adjustment errors of the system. The errors of the spherical standard mirror and the plane reflector can be calibrated in advance. The processing of the compensation lens, especially the detection and calibration of the high-precision compensation lens group, has certain difficulty, and the error of the compensation lens and the adjustment error after the compensation lens is introduced can undoubtedly reduce the detection precision of the whole system, and finally influence the processing precision of the exposure lens. Meanwhile, the high-precision machining detection of the compensation lens not only increases the machining cost, but also reduces the machining efficiency of the exposure lens. For a traditional exposure lens processing method, a manual polishing method is extremely low in efficiency and very dependent on human experience, repeated iteration is needed in a convergence process, medium-high frequency errors are serious, if the medium-high frequency errors exist on the surface of an exposure lens, periodic ripples are introduced into an interference field, and finally the exposure lens is exposed on a grating surface to directly influence the grating quality, so that strict control is needed.
Disclosure of Invention
The invention aims to provide a high-precision exposure lens processing method for manufacturing a pulse compression grating, which avoids self errors and adjustment errors introduced by a compensating mirror by adopting a high-efficiency high-precision numerical control processing process, solves the problem of full-band errors in numerical control processing of an exposure lens, finally improves the full-band wave surface quality of the exposure lens under an exposure wavelength and lays a foundation for manufacturing a high-precision diffraction grating. Because a high-precision compensating mirror is not needed and a deterministic numerical control machining method is adopted, the method has the characteristics of low machining cost, high precision and high machining efficiency.
In order to achieve the technical purpose, the technical solution of the invention is as follows:
a high-precision exposure lens processing method for manufacturing a pulse compression grating is characterized by comprising the following steps:
1) building a self-collimation interference detection device: the device comprises a laser plane interferometer, a spherical standard lens and a standard plane reflector are sequentially arranged along the laser output direction of the laser plane interferometer, and the device is characterized in that a compensating mirror is not used, and an exposure lens to be detected is arranged between the spherical standard lens and the standard plane reflector during auto-collimation interference detection;
2) milling and grinding the aspheric surface of the exposure lens: calculating to obtain the radius of the closest spherical surface of the exposure lens according to an aspheric equation of the exposure lens, placing a blank of the lens at the center of a rotary table of a numerical control milling and grinding machine tool, driving the machine tool by adopting a spherical surface milling and grinding program code, and finishing rough grinding of the closest spherical surface by selecting a cup-shaped metal bonded grinding wheel according to a generated processing track; setting corresponding processing parameters and processing tracks according to the contour size and the aspheric equation parameters of the lens to generate processing codes, driving a machine tool to adopt a butterfly grinding wheel, and finely grinding the closest spherical surface according to the processing tracks to finish the milling and grinding processing of the aspheric surface of the exposure lens;
3) grinding and polishing: setting processing parameters and a processing track of a polishing machine tool according to aspheric equation parameters of an exposure lens to be processed, generating a corresponding processing code, driving the machine tool to perform shape-preserving polishing on the aspheric surface by using a flexible polishing disc according to the processing track, measuring the surface profile of the workpiece by using a high-precision three-coordinate measuring instrument, then calculating a theoretical surface shape by using matlab calculation programming software according to an aspheric theoretical formula, calculating the difference value between the surface profile of the workpiece and the theoretical surface shape, and performing data fitting to obtain error distribution data until the surface shape error converges to the range of an interferometer, wherein the general surface shape PV is less than 2 mu m;
4) and (3) measuring the transmitted wavefront of the exposure lens to be processed by using a wavefront interferometer: the Zernike polynomial coefficient of the system wavefront error of the exposure lens under the working wavelength is obtained through the simulation calculation of Zemax optical design software, and the system error of the exposure lens is constructed by utilizing the fitting of the Zernike polynomial;
placing the exposure lens in the auto-collimation interference detection device to measure the transmitted wavefront of the exposure lens to obtain the transmitted wavefront error of the exposure lens; subtracting the system error from the transmitted wavefront error of the exposure lens to obtain the transmitted wavefront of the exposure lens under the exposure wavelength;
5) precision polishing: placing an exposure lens to be processed in the center of a rotary table of a high-precision numerical control magneto-rheological machine tool, setting processing parameters and a processing track according to aspheric equation parameters and transmitted wavefront error distribution and combining a corresponding magneto-rheological removal function, generating a processing code, driving a magneto-rheological polishing wheel to precisely polish the exposure lens to be processed, timely placing the exposure lens in an auto-collimation interference detection device for detection and judgment, entering next processing when the transmitted wavefront error meets the requirement, and otherwise, taking the residual error of the exposure lens after superposition as a wavefront error, placing the wavefront error in the center of the rotary table of the high-precision numerical control magneto-rheological machine tool for continuous precise polishing;
6) smoothing treatment: adopting a numerical control small tool machine to carry out smooth processing technology processing on the exposure lens: according to the system error distribution of the exposure lens, a high-band distribution is formed at the position of 0.7 of the aperture of the lens, according to the theory of the polishing edge effect of a small tool, if a semi-rigid polishing disk with the aperture of an 1/6 workpiece is adopted, a polishing module adopts asphalt, a grating path without revolution and translation is adopted, an extra removal amount is formed at the position of 0.7 of the aperture of the lens, the system error remained in the previous process can be just compensated, the compensation and correction of the low-frequency surface shape are realized, in the smoothing process, the exposure lens is timely placed in the auto-collimation interference detection device for detection and judgment, whether the transmitted wavefront and the medium-high frequency error meet the processing requirement is judged, if the requirements do not meet the requirement, the step 3 is returned, and if the index requirement is met, the processing is ended.
The flexible grinding and polishing disc mainly comprises three parts: a) the grinding and polishing chassis is a stainless steel rigid back disk opposite to the maximum curvature radius of the aspheric surface workpiece; b) selecting foamed silica gel in the middle interlayer; c) in the grinding stage, the grinding pad adopts the American ring ball HL-7834, the semi-rigid grinding disc formed by the structure has high bonding degree with the aspheric surface, the surface shape change is small in the grinding process, and surface defects can not be generated while the milling and grinding knife lines are quickly removed; in the polishing stage, the polishing die is made of American ring ball LP-66 polyurethane, and the structure of the polishing disk can introduce less intermediate frequency error while ensuring that elements are polished quickly, and can effectively reduce the surface shape change in the rough polishing process.
The invention has the advantages that:
the method comprises the steps of building a self-collimation interference detection device, milling and grinding the aspheric surface of the exposure lens, grinding and polishing, precisely polishing and smoothing, and performing interferometer measurement on the transmitted wavefront of the exposure lens to be processed by adopting the self-collimation interference detection device in the processes of grinding and polishing, precisely polishing and smoothing, so that each step is ensured to meet respective requirements. The invention solves the problem of system error compensation detection caused by different detection wavelengths and exposure wavelengths in the exposure system processing process and improves the precision of the exposure lens numerical control processing full frequency band.
The invention avoids using the compensating mirror, eliminates self error and adjusting error caused by using the compensating mirror, simultaneously removes the cost caused by processing the high-precision compensating mirror, adopts high-efficiency high-precision numerical control polishing and smoothing treatment processes, solves the problem of full-band error of numerical control processing of the exposure lens, finally improves the quality of full-band wave surface under the exposure wavelength, and lays a foundation for manufacturing the high-precision diffraction grating.
Drawings
FIG. 1 is a schematic illustration of static interference field exposure.
Fig. 2 is a schematic view of a conventional exposure lens compensation detecting apparatus.
FIG. 3 is a flow chart of the present invention exposure lens processing.
Figure 4 is a schematic diagram of the construction of a flexible polishing pad.
Fig. 5 is a system error wavefront map (a) and a Zernike polynomial coefficient map (b) calculated by Zemax optical design software.
Fig. 6 is a wavefront error distribution diagram, where (a) is a systematic error obtained by Zernike polynomial fitting, (b) is a transmitted wavefront error obtained by interferometer measurement, and (c) is a transmitted wavefront error of an exposure lens at an exposure wavelength.
FIG. 7 is a mid-frequency collapse curve of an exposure lens, wherein (a) is a PSD1 (band 2.5 mm-33 mm) collapse curve, and (b) is a PSD2 (band 0.12 mm-2.5 mm) collapse curve.
Fig. 8 is a roughness measurement result of the exposure lens.
Detailed Description
The invention will be further illustrated with reference to the following examples, which should not be construed as limiting the scope of the invention.
The examples illustrate that:
phi 520 exposure lens key processing index
Referring to fig. 3, the method for processing a high-precision exposure lens based on wavefront error compensation of the present invention comprises the following steps:
1) building a self-collimation interference detection device: the device comprises a laser plane interferometer, a spherical standard lens and a standard plane reflector are sequentially arranged along the laser output direction of the laser plane interferometer, and the device is characterized in that a compensating mirror is not used, and an exposure lens to be detected is arranged between the spherical standard lens and the standard plane reflector during auto-collimation interference detection;
2) calculating to obtain the closest spherical radius according to the aspheric equation and parameters of the exposure lens, placing a blank of the lens at the center of a rotary table of a numerical control milling and grinding machine tool, driving the machine tool by adopting a spherical milling and grinding program code, and finishing rough grinding of the approximate spherical surface by selecting a cup-shaped metal bonded grinding wheel according to the generated processing track; setting corresponding processing parameters and processing tracks according to the contour size and the aspheric equation parameters of the lens to generate processing codes, driving a machine tool to accurately grind the closest spherical surface by adopting a butterfly-shaped grinding wheel according to the processing tracks, and finishing the milling and grinding of the aspheric surface of the exposure lens;
wherein, the expression of the aspheric equation of the exposure lens is as follows:
wherein s ═ x2+y2，c＝1/R0，R0Is the vertex radius of curvature, k is the conic constant, A4、A6For the high-order coefficient, the closest spherical radius of the exposure lens to be processed is determined using computer programming software (matlab).
3) Setting the processing parameters and processing tracks of a polishing machine tool, generating corresponding processing codes, driving the machine tool to adopt a flexible polishing disc, and as shown in figure 4, the structure is composed of a stainless steel back plate, the curvature radius of the stainless steel back plate is opposite to the maximum curvature radius of a workpiece, a middle interlayer is foamed silica gel, a grinding pad is an American ring ball HL-7834, and a polishing die is an American ring ball LP-66 polyurethane. And (2) performing shape-preserving grinding and polishing on the aspheric surface according to a processing track, measuring the surface profile of the workpiece by using a high-precision three-coordinate measuring instrument, calculating the theoretical surface profile by using matlab calculation programming software according to an aspheric surface theoretical formula, calculating the difference value of the theoretical surface profile and the surface profile, fitting the theoretical surface profile and the theoretical surface profile to obtain surface profile error distribution data until the surface profile error converges to the range of the interferometer, wherein the general surface profile PV is less than 2 mu m.
4) According to the optical characteristic parameters of the exposure lens, a commercial laser plane interferometer, a spherical standard lens and a standard plane reflector are utilized to build a self-collimation interference detection device, the exposure lens is placed in the self-collimation interference detection device to measure the transmitted wavefront of the exposure lens, as shown in the left part of fig. 3, a Zernike polynomial coefficient of the system wavefront error of the exposure lens under the working wavelength is obtained through simulation calculation of Zemax optical design software, as shown in fig. 5. Constructing a system error by using Zernike polynomial fitting (see figure 6(a)), and subtracting the system error (see figure 6(a)) from the transmitted wavefront error (see figure 6(b)) measured by the exposure lens compensation detection device interferometer to obtain the transmitted wavefront of the exposure lens at the exposure wavelength (see figure 6 (c)); in a polar coordinate system (p, a), the formula for fitting a wave surface using Zernike polynomials is as follows:
wherein: w (p, A) is a mathematical wave surface obtained by fitting, anIs Zernike polynomial coefficient, N is 1,2, …, N is polynomial term, Zn(p, A) is an orthogonal Zernike circular polynomial.
5) Placing an exposure lens at the center of a rotary table of a high-precision numerical control magneto-rheological machine tool, setting processing parameters and a processing track according to aspheric equation parameters and transmitted wavefront error distribution and combining a corresponding magneto-rheological removal function, generating a processing code, driving a magneto-rheological polishing wheel to perform precise polishing on a workpiece, judging whether the transmitted wavefront error meets the processing requirement of entering the next procedure, performing smooth processing if the transmitted wavefront error meets the requirement, and otherwise, continuing polishing;
6) and (3) performing smooth process processing on the workpiece by using a numerical control small tool machine, selecting a semi-rigid polishing disc with the workpiece aperture 1/6 according to the typical spherical aberration distribution characteristic of the system error distribution characteristic of the exposure lens, and performing smooth processing by using a translation grating path, as shown in the figure. In this example, the effective aperture of the lens is 480mm, so the diameter of the polishing disk is 80mm, a PSD detection interferometer is used to measure the exposure lens, and it is determined whether the transmitted wavefront and the medium-high frequency error meet the processing requirements, if so, the processing is ended, otherwise, the step 3 is returned until the index requirements are met.
Finally, the result of the exposure lens processing is: PV is 0.094 λ (λ 632.8nm), no distinct periodic structure is present, and roughness Rq is 0.57nm, all better than the index requirement, as shown in fig. 6(c), 7, and 8.
Experiments show that the invention solves the problem of compensation detection processing of system errors caused by different detection wavelengths and final working wavelengths in the exposure lens processing process;
the invention does not adopt a processing method of a compensating mirror, avoids introducing self errors and installation and adjustment errors of the compensating mirror, adopts high-precision numerical control polishing and smoothing processing technology, realizes the full-band processing of the surface shape of the exposure lens, reduces the processing cost and improves the processing efficiency because the high-precision compensating mirror does not need to be processed, finally improves the quality of the full-band wave surface under the exposure wavelength, and lays a foundation for the manufacturing of the high-precision diffraction grating.
Claims (2)
1. A high-precision exposure lens processing method for manufacturing a pulse compression grating is characterized by comprising the following steps:
1) building a self-collimation interference detection device: the device comprises a laser plane interferometer, a spherical standard lens and a standard plane reflector are sequentially arranged along the laser output direction of the laser plane interferometer, and the device is characterized in that a compensating mirror is not used, and an exposure lens to be detected is arranged between the spherical standard lens and the standard plane reflector during auto-collimation interference detection;
2) milling and grinding the aspheric surface of the exposure lens: calculating to obtain the radius of the closest spherical surface of the exposure lens according to an aspheric equation of the exposure lens, placing a blank of the lens at the center of a rotary table of a numerical control milling and grinding machine tool, driving the machine tool by adopting a spherical surface milling and grinding program code, and finishing rough grinding of the closest spherical surface by selecting a cup-shaped metal bonded grinding wheel according to a generated processing track; setting corresponding processing parameters and processing tracks according to the contour size and the aspheric equation parameters of the lens to generate processing codes, driving a machine tool to adopt a butterfly grinding wheel, and finely grinding the closest spherical surface according to the processing tracks to finish the milling and grinding processing of the aspheric surface of the exposure lens;
3) grinding and polishing: setting processing parameters and a processing track of a polishing machine tool according to aspheric equation parameters of an exposure lens to be processed, generating a corresponding processing code, driving the machine tool to perform shape-preserving polishing on the aspheric surface by using a flexible polishing disc according to the processing track, measuring a surface profile of a workpiece by using a high-precision three-coordinate measuring instrument, then calculating a theoretical surface profile by using matlab calculation programming software according to an aspheric surface theoretical formula, calculating a difference value between the surface profile of the workpiece and the theoretical surface profile, and performing data fitting to obtain error distribution data until the surface profile error converges to the range of an interferometer, wherein the general surface profile PV is less than 2 mu m;
4) and (3) measuring the transmitted wavefront of the exposure lens to be processed by using a wavefront interferometer: the Zernike polynomial coefficient of the system wavefront error of the exposure lens under the working wavelength is obtained through the simulation calculation of Zemax optical design software, and the system error of the exposure lens is constructed by utilizing the fitting of the Zernike polynomial;
placing the exposure lens in the auto-collimation interference detection device to measure the transmitted wavefront of the exposure lens to obtain the transmitted wavefront error of the exposure lens; subtracting the system error from the transmitted wavefront error of the exposure lens to obtain the transmitted wavefront of the exposure lens under the exposure wavelength;
5) precision polishing: placing an exposure lens to be processed in the center of a rotary table of a high-precision numerical control magneto-rheological machine tool, setting processing parameters and a processing track according to aspheric equation parameters and transmitted wavefront error distribution and combining a corresponding magneto-rheological removal function, generating a processing code, driving a magneto-rheological polishing wheel to precisely polish the exposure lens to be processed, timely placing the exposure lens in an auto-collimation interference detection device for detection and judgment, entering next processing when the transmitted wavefront error meets the requirement, and otherwise, taking the residual error of the exposure lens after superposition as a wavefront error, placing the wavefront error in the center of the rotary table of the high-precision numerical control magneto-rheological machine tool for continuous precise polishing;
6) smoothing treatment: adopting a numerical control small tool machine to carry out smooth processing technology processing on the exposure lens: according to the system error distribution of the exposure lens, a high-band distribution is formed at the position of 0.7 of the aperture of the lens, according to the theory of the polishing edge effect of a small tool, if a semi-rigid polishing disk with the aperture of an 1/6 workpiece is adopted, a polishing module adopts asphalt, a grating path without revolution and translation is adopted, an extra removal amount is formed at the position of 0.7 of the aperture of the lens, the system error remained in the previous process can be just compensated, the compensation and correction of the low-frequency surface shape are realized, in the smoothing process, the exposure lens is timely placed in the auto-collimation interference detection device for detection and judgment, whether the transmitted wavefront and the medium-high frequency error meet the processing requirement is judged, if the requirements do not meet the requirement, the step 3 is returned, and if the index requirement is met, the processing is ended.
2. The method for processing a high-precision exposure lens according to claim 1, wherein the flexible polishing disk is mainly composed of three parts: a) the grinding and polishing chassis is a stainless steel rigid back disk opposite to the maximum curvature radius of the aspheric surface workpiece; b) selecting foamed silica gel in the middle interlayer; c) in the grinding stage, the grinding pad adopts an American ring ball HL-7834, the joint degree of a flexible grinding and polishing disc formed by the three parts and the surface of an aspheric surface is high, the surface shape change is small in the grinding process, and surface defects can not be generated while the milling and grinding knife lines are quickly removed; in the polishing stage, a polishing die of the flexible polishing disc is made of American Ring-ball LP-66 polyurethane, so that the workpiece is rapidly polished, less intermediate frequency errors are introduced, and the surface shape change in the rough polishing process can be effectively reduced.
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