CN110632768A - Parallel Gaussian beam double telecentric system and alignment method - Google Patents

Parallel Gaussian beam double telecentric system and alignment method Download PDF

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Publication number
CN110632768A
CN110632768A CN201910810908.1A CN201910810908A CN110632768A CN 110632768 A CN110632768 A CN 110632768A CN 201910810908 A CN201910810908 A CN 201910810908A CN 110632768 A CN110632768 A CN 110632768A
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lens
diaphragm
laser
light
quality analyzer
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CN110632768B (en
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黄丽芳
王灵光
赖宣润
赵盼娟
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Intelligent Automation Equipment Zhuhai Co Ltd
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Zhuhai Damien Technology Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30Collimators
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect

Abstract

The invention aims to provide a parallel Gaussian beam double telecentric system and an alignment method which are simple to operate, wide in application range and high in precision. The parallel Gaussian beam double-telecentric system comprises a laser emission component, a first diaphragm, a first lens, a second diaphragm, a second lens and a beam quality analyzer which are sequentially arranged along the same axis, wherein the focal lengths of the first lens and the second lens are the same, the first diaphragm is positioned on the front focal point of the first lens, the second diaphragm is positioned on the rear focal point of the first lens, the rear focal point of the first lens and the front focal point of the second lens are superposed, and the photosensitive surface of the beam quality analyzer is positioned on the rear focal point of the second diaphragm; the alignment method is used for aligning and coinciding the light source beams and the optical axes of the parallel Gaussian beam double telecentric system. The invention is applied to the technical field of laser shaping.

Description

Parallel Gaussian beam double telecentric system and alignment method
Technical Field
The invention is applied to the technical field of laser shaping, and particularly relates to a parallel Gaussian beam double telecentric system and an alignment method.
Background
The double telecentric optical path system can physically realize the spectral analysis and the processing of the optical information in the frequency domain. The double telecentric optical path system is also called an optical computer and is widely used in optical information processing such as spatial filtering, feature recognition and the like.
With the development of industry, lasers are more and more used in industrial production, the double telecentric system can shape and filter the passing lasers, and the alignment of the lasers and the double telecentric optical path directly influences the shaping and filtering effects of the double telecentric system on the optical path. At present, one of the most common methods for aligning the gaussian parallel light beam with the double telecentric system is to adjust step by step, receive the light spot by using a receiving screen, observe the shape of the light spot and compare the shape with the shape of the source light spot, thereby judging whether the gaussian parallel light beam is aligned with the double telecentric light path system. The method has poor universality, when the size of a light spot of a light source is small, the judgment error of human eyes is large, in addition, the method is not suitable for invisible light, and too many steps are changed in the adjusting process. Another common method is to integrate the whole optical path system into a whole by mechanical positioning, but this method cannot ensure the high coincidence between the center of the light source and the fitting optical axis of the mechanical structure, so the accuracy of this method is low.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a parallel Gaussian beam double telecentric system and an alignment method which are simple to operate, wide in application range and high in precision.
The technical scheme adopted by the invention is as follows: the two telecentric systems of parallel gaussian beam include along laser emission subassembly, first diaphragm, first lens, second diaphragm, second lens and the light beam quality analysis appearance that same axis set gradually, first lens with the focus of second lens is the same, first diaphragm is located on the preceding focus of first lens, the second diaphragm is located on the back focus of first lens, the back focus of first lens with the coincidence of the preceding focus of second lens, the photosensitive surface of light beam quality analysis appearance is located on the back focus of second diaphragm, the second diaphragm is adjustable aperture diaphragm.
According to the scheme, the laser output by the laser emitting assembly is intercepted through the first diaphragm, the laser after passing through the first diaphragm has stronger Fraunhofer diffraction, the Fraunhofer diffraction generated at the first diaphragm is intercepted by arranging the second diaphragm at the coincidence position of the back focus of the first lens and the front focus of the second lens, normal light passes through the pinhole of the second diaphragm, and the plane where the pinhole is located and perpendicular to the optical axis is called as a frequency spectrum plane. The light rays pass through the back focus of the second lens, which is also called as a final image surface, and the image of the first diaphragm is formed at the position, so that an ideal light spot which is uniformly collimated is obtained. The invention has compact and stable structure, easy debugging of the adjustable part, no influence on the imaging quality of the optical system and high reliability. Meanwhile, the distance between the optical elements is reasonable, the integral optical system can be split into modules, and the transportation, the installation and the use are convenient. Meanwhile, the light beam quality analyzer is used for imaging, visible light and invisible light can be captured to realize shaping suitable for various lasers, and in addition, the identification effect can be improved according to accurate judgment of the shape of the light spot under the condition that the diameter of the light spot is small, so that adjustment is facilitated.
One preferred scheme is, laser emission subassembly includes laser emitter, collimater, beam expanding lens and four-axis displacement device, laser emitter the collimater and the beam expanding lens connects gradually fixedly, laser emitter the collimater and the beam expanding lens is all fixed on four-axis displacement device's activity is served.
According to the scheme, the laser emitted from the laser emitter has a large divergence angle, and the laser is collimated by the collimator, wherein the collimator can be a transmission type or a reflection type. The energy of the collimated light spots is too concentrated, the energy of the centers of the collimated light spots is smoothed by arranging the beam expander, the energy peak value of the centers of the light spots passing through the beam expander is reduced, the aperture of the light spots is enlarged, and the energy decrease from the centers of the light beams to the edges is gentler. Simultaneously through setting up four-axis displacement device realizes mechanized adjustment, four-axis displacement device is for can making rectilinear movement and can follow the adjustment mechanism of X axle and Z rotation of axes along X axle and Z axle, the X axle perpendicular to the optical axis of the two telecentric systems of parallel gaussian beam and the level line that is on a parallel with, the Z axle perpendicular to the optical axis of the two telecentric systems of parallel gaussian beam and the plumb line that is on a parallel with.
Further preferably, the amplification ratio of the beam expander is two to ten times.
Preferably, the second diaphragm is a shifting rod type diaphragm or a gear type diaphragm.
According to the scheme, the shifting rod type diaphragm or the gear type diaphragm is adopted as the second diaphragm, so that the adjustment of the pinhole is more convenient.
The alignment method comprises the following steps:
A. firstly, turning on the laser transmitter and setting power, aligning a photosensitive surface of the beam quality analyzer with an output end of the beam expanding lens, enabling laser emitted by the laser transmitter to pass through the collimator and the beam expanding lens and then to be projected on the photosensitive surface of the beam quality analyzer, and adjusting the amplification factor of the beam expanding lens to enable the beam energy output by the laser emitting assembly to reach a uniform state;
B. after the light beam is adjusted, the laser emitter, the collimator and the beam expander are installed on a movable end of the four-axis displacement device, the beam quality analyzer is assembled at a back focus of the second lens, at the moment, the light beam output by the laser emitting assembly deviates slightly relative to optical axes of the first lens and the second lens, the aperture of the second diaphragm is adjusted to enable the deviated light beam to be projected on the beam quality analyzer, and adjustment information required by the laser emitting assembly is obtained according to the deviation direction of the light beam;
C. then, the aperture of the second diaphragm is adjusted to be small, and the position and the deflection angle of laser emission are adjusted through the four-axis displacement device, so that the brightness of a light spot projected on the light beam quality analyzer is brightest, and the energy distribution of the light spot is uniform;
D. and repeating the step B and the step C until the light spots which are uniformly distributed and symmetrical are obtained on the light beam quality analyzer.
According to the scheme, the aperture of the second diaphragm is enlarged to enable the deviated light beam to pass through the pinhole, so that the deviation information of the light beam is further acquired, the angle and the position of the light source are adjusted according to the deviation information, and the light source is overlapped with the optical axis of the system through gradual adjustment.
Drawings
FIG. 1 is a schematic structural diagram of the parallel Gaussian beam double telecentric system;
fig. 2 is a flow chart of the alignment method.
Detailed Description
As shown in fig. 1, in this embodiment, the parallel gaussian beam double telecentric system includes a laser emitting assembly 1, a first diaphragm 2, a first lens 3, a second diaphragm 4, a second lens 5, and a beam quality analyzer 6, which are sequentially disposed along a same axis, the focal lengths of the first lens 3 and the second lens 5 are the same, the first diaphragm 2 is located at a front focal point of the first lens 3, the second diaphragm 4 is located at a rear focal point of the first lens 3, the rear focal point of the first lens 3 coincides with the front focal point of the second lens 5, a photosensitive surface of the beam quality analyzer 6 is located at a rear focal point of the second diaphragm 4, and the second diaphragm 4 is an adjustable aperture diaphragm.
In this embodiment, laser emission subassembly 1 includes laser emitter 11, collimator 12, beam expanding lens 13 and four-axis displacement device, laser emitter 11 collimator 12 and beam expanding lens 13 connects gradually fixedly, laser emitter 11 collimator 12 and beam expanding lens 13 all fixes on four-axis displacement device's the activity is held.
In this embodiment, four-axis displacement device includes first straight line slip table, second straight line slip table, first rotary motor, second rotary motor and installation piece, first straight line slip table perpendicular to the optical axis setting of the two telecentric systems of parallel gaussian beam, second straight line slip table is fixed the expansion end of first straight line slip table, second straight line slip table sets up along vertical direction, first rotary motor fixes on the expansion end of second straight line slip table, first rotary motor's output shaft is on a parallel with the length direction of first straight line slip table, second rotary motor fixes on first rotary motor's output shaft, second rotary motor's output shaft perpendicular with first rotary motor's output shaft, the installation piece is fixed on second rotary motor's output shaft, laser emitter 11, The collimator 12 and the beam expander 13 are fixed on the mounting block.
In the present embodiment, the expansion ratio of the beam expander 13 is two to ten times.
In this embodiment, the second diaphragm 4 is a lever diaphragm or a gear diaphragm, and the aperture adjustment range of the second diaphragm 4 is 0.7 mm to 5.0 mm.
As shown in fig. 2, the alignment method includes the steps of:
A. firstly, turning on the laser transmitter 11 and setting power, aligning a photosensitive surface of the beam quality analyzer 6 with an output end of the beam expander 13, so that laser emitted by the laser transmitter 11 passes through the collimator 12 and the beam expander 13 and then is projected on the photosensitive surface of the beam quality analyzer 6, and adjusting the amplification factor of the beam expander 13 to enable the beam energy output by the laser emitting assembly 1 to reach a uniform state;
B. after the light beam is adjusted, the laser emitter 11, the collimator 12 and the beam expander 13 are installed at the movable end of the four-axis displacement device, and the beam quality analyzer 6 is assembled at the back focus of the second lens 5, at this time, the light beam output by the laser emitting assembly 1 deviates slightly from the optical axes of the first lens 3 and the second lens 5, the aperture of the second diaphragm 4 is adjusted to enable the deviated light beam to be projected on the beam quality analyzer 6, and the adjustment information required by the laser emitting assembly 1 is obtained according to the direction of the deviation of the light beam;
C. at this time, the aperture of the second diaphragm 4 is adjusted to be small, and the position and the deflection angle of the laser emission assembly 1 are adjusted through the four-axis displacement device, so that the brightness of a light spot projected on the light beam quality analyzer 6 is brightest, and the energy distribution of the light spot is uniform;
D. and repeating the step B and the step C until the light spots which are uniformly distributed and symmetrical are obtained on the light beam quality analyzer 6.

Claims (5)

1. The utility model provides a two telecentric systems of parallel gaussian beam which characterized in that: it includes along laser emission subassembly (1), first diaphragm (2), first lens (3), second diaphragm (4), second lens (5) and light beam quality analysis appearance (6) that same axis set gradually, first lens (3) with the focus of second lens (5) is the same, first diaphragm (2) are located on the front focus of first lens (3), second diaphragm (4) are located on the back focus of first lens (3), the back focus of first lens (3) with the coincidence of the front focus of second lens (5), the photosurface of light beam quality analysis appearance (6) is located on the back focus of second diaphragm (4), second diaphragm (4) are adjustable aperture diaphragm.
2. A parallel gaussian beam double telecentric system according to claim 1 wherein: laser emission subassembly (1) includes laser emitter (11), collimator (12), beam expander lens (13) and four-axis displacement device, laser emitter (11) collimator (12) and beam expander lens (13) connect gradually fixedly, laser emitter (11) collimator (12) and beam expander lens (13) all fix on four-axis displacement device's the activity is served.
3. A parallel gaussian beam double telecentric system according to claim 2 wherein: the amplification ratio of the beam expander (13) is two times to ten times.
4. A parallel gaussian beam double telecentric system according to claim 1 wherein: the second diaphragm (4) is a shifting rod type diaphragm or a gear type diaphragm.
5. A method of aligning a parallel gaussian beam double telecentric system according to claim 2 comprising the steps of:
A. firstly, turning on the laser transmitter (11) and setting power, aligning a photosensitive surface of the beam quality analyzer (6) with an output end of the beam expanding lens (13), enabling laser emitted by the laser transmitter (11) to pass through the collimator (12) and the beam expanding lens (13) and then to be projected on the photosensitive surface of the beam quality analyzer (6), and adjusting the amplification factor of the beam expanding lens (13) to enable the beam energy output by the laser transmitting assembly (1) to reach a uniform state;
B. after the light beam is adjusted, the laser emitter (11), the collimator (12) and the beam expander (13) are installed on the movable end of the four-axis displacement device, the beam quality analyzer (6) is assembled at the back focus of the second lens (5), at the moment, the light beam output by the laser emitting assembly (1) deviates in a small range relative to the optical axes of the first lens (3) and the second lens (5), the aperture of the second diaphragm (4) is adjusted to enable the deviated light beam to be projected on the beam quality analyzer (6), and adjustment information required by the laser emitting assembly (1) is obtained according to the deviation direction of the light beam;
C. at the moment, the aperture of the second diaphragm (4) is adjusted to be small, the position and the deflection angle of the laser emission assembly (1) are adjusted through the four-axis displacement device, and therefore the brightness of a light spot projected on the light beam quality analyzer (6) is brightest, and the energy distribution of the light spot is uniform;
D. and repeating the step B and the step C until the light spots which are uniformly distributed and symmetrical are obtained on the light beam quality analyzer (6).
CN201910810908.1A 2019-08-30 2019-08-30 Parallel Gaussian beam double telecentric system and alignment method Active CN110632768B (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112596253A (en) * 2020-12-30 2021-04-02 合肥中科领谱科技有限公司 Light beam superposition adjusting device and method
CN114253003A (en) * 2021-12-06 2022-03-29 北京遥测技术研究所 Tube shell laser alignment debugging device and method

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JP2013125213A (en) * 2011-12-15 2013-06-24 Olympus Imaging Corp Inner focus lens system and imaging apparatus with the same
CN103776559A (en) * 2014-01-13 2014-05-07 南京航空航天大学 Tomography laser shearing interference three-dimensional temperature measurement device and temperature measurement method
CN103969832A (en) * 2014-05-27 2014-08-06 哈尔滨工业大学 Laser beam-expanding dodging device based on microlens array
CN104991423A (en) * 2013-09-16 2015-10-21 中国科学院上海光学精密机械研究所 Lithography method of LDI lithography equipment in printed circuit board (PCB) lithography field
CN110146991A (en) * 2019-04-18 2019-08-20 珠海达明科技有限公司 A kind of laser facula shaping optical system

Patent Citations (5)

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Publication number Priority date Publication date Assignee Title
JP2013125213A (en) * 2011-12-15 2013-06-24 Olympus Imaging Corp Inner focus lens system and imaging apparatus with the same
CN104991423A (en) * 2013-09-16 2015-10-21 中国科学院上海光学精密机械研究所 Lithography method of LDI lithography equipment in printed circuit board (PCB) lithography field
CN103776559A (en) * 2014-01-13 2014-05-07 南京航空航天大学 Tomography laser shearing interference three-dimensional temperature measurement device and temperature measurement method
CN103969832A (en) * 2014-05-27 2014-08-06 哈尔滨工业大学 Laser beam-expanding dodging device based on microlens array
CN110146991A (en) * 2019-04-18 2019-08-20 珠海达明科技有限公司 A kind of laser facula shaping optical system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112596253A (en) * 2020-12-30 2021-04-02 合肥中科领谱科技有限公司 Light beam superposition adjusting device and method
CN112596253B (en) * 2020-12-30 2023-10-31 合肥中科领谱科技有限公司 Light beam superposition adjusting device and adjusting method
CN114253003A (en) * 2021-12-06 2022-03-29 北京遥测技术研究所 Tube shell laser alignment debugging device and method
CN114253003B (en) * 2021-12-06 2023-09-29 北京遥测技术研究所 Tube shell laser collimation debugging device and method

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