CN110614863B - Method for realizing uniform pattern array of ink-jet printing - Google Patents

Method for realizing uniform pattern array of ink-jet printing Download PDF

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Publication number
CN110614863B
CN110614863B CN201910841335.9A CN201910841335A CN110614863B CN 110614863 B CN110614863 B CN 110614863B CN 201910841335 A CN201910841335 A CN 201910841335A CN 110614863 B CN110614863 B CN 110614863B
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ink
jet printing
polymer film
pattern array
uniform pattern
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CN110614863A (en
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宁洪龙
陈建秋
姚日晖
梁宏富
张观广
张旭
梁志豪
邱斌
黎群杰
彭俊彪
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South China University of Technology SCUT
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South China University of Technology SCUT
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0041Digital printing on surfaces other than ordinary paper
    • B41M5/0047Digital printing on surfaces other than ordinary paper by ink-jet printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0041Digital printing on surfaces other than ordinary paper
    • B41M5/0064Digital printing on surfaces other than ordinary paper on plastics, horn, rubber, or other organic polymers

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  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

The invention belongs to the technical field of ink-jet printing, and discloses a method for realizing uniform pattern array ink-jet printing. Pretreating a glass substrate, spin-coating a layer of polymer solution, and carrying out ultraviolet curing to obtain a polymer film; the polymer film is compatible with a solvent of subsequent ink-jet printing ink; and (3) carrying out ink-jet printing on the uniform ink drop array on the polymer film by using ink-jet printing ink, and naturally cooling after annealing treatment to obtain a uniform pattern array. According to the invention, a layer of polymer film is prepared in advance before ink-jet printing, and a high-precision uniform pattern array can be obtained by utilizing the coffee ring effect in the ink-jet printing process, so that the limit of the traditional preparation method is broken through, and the obtained pattern array has good repeatability and uniformity.

Description

Method for realizing uniform pattern array of ink-jet printing
Technical Field
The invention belongs to the technical field of ink-jet printing, and particularly relates to a method for realizing uniform pattern array ink-jet printing.
Background
Inkjet Printing (Inkjet Printing) is a bottom-up additive manufacturing patterning technology, and has the advantages of no need of vacuum, direct patterning, low temperature, low cost, environmental friendliness and the like. The method is widely applied to the preparation of thin film electronic devices such as capacitors, thin film transistors, organic light emitting diodes and organic solar cells.
In an inkjet printing process, the final topography of a droplet on a print substrate is a result of a combination of factors including evaporation of the droplet, surface tension of the droplet, surface energy of the substrate, and the like. The droplets are usually deposited spherically on the substrate surface, which, due to its special geometry, results in a higher solvent evaporation rate at the edge of the droplet than at the center of the droplet, thus creating a radial capillary flow from the center of the droplet to the edge of the droplet to compensate for the loss of solvent due to evaporation at the edge of the droplet. The radial capillary flow drives the solute in the liquid drop to move to the edge of the liquid drop, and finally an annular structure is formed, and the phenomenon is called a coffee ring effect. The coffee ring phenomenon may cause uneven deposition of droplets on the surface of the substrate, but some regular patterns may be formed under specific conditions to meet specific requirements by using the coffee ring phenomenon. Due to the limitation of instrument precision, the lowest line width which can be realized by the conventional piezoelectric ink-jet printing technology is about 20 μm, and the application of the conventional piezoelectric ink-jet printing technology in printing high-precision large-area uniform arrays is limited.
Disclosure of Invention
In view of the above disadvantages and shortcomings of the prior art, it is an object of the present invention to provide a method for achieving inkjet printing of a uniform pattern array.
The purpose of the invention is realized by the following technical scheme:
a method of achieving an inkjet printing uniform pattern array comprising the steps of:
(1) preparing a layer of polymer film on the pretreated glass substrate; the polymer film is compatible with a solvent of subsequent ink-jet printing ink;
(2) and (2) carrying out ink-jet printing on the uniform ink drop array on the polymer film obtained in the step (1) by using ink-jet printing ink, and naturally cooling after annealing treatment to obtain a uniform pattern array.
Preferably, the pretreatment in the step (1) is ultrasonic cleaning with tetrahydrofuran, isopropanol, a washing solution, deionized water and isopropanol in sequence, drying and then treating with oxygen plasma. To remove impurities on the surface of the glass substrate and to increase the surface energy of the substrate.
Preferably, the polymer film in step (1) refers to a polyvinylpyrrolidone (PVP) film; the ink-jet printing ink in the step (2) is silver nanoparticle ink taking triethylene glycol ethyl ether as a solvent.
Further, the polyvinylpyrrolidone film is prepared by the following method: and spin-coating a polymer solution containing polymer PVP, curing agent methylated poly (melamine-co-formaldehyde) and solvent ethylene glycol on the pretreated glass substrate, and carrying out ultraviolet curing to obtain the polyvinylpyrrolidone film.
Preferably, the temperature of the ink-jet printing in the step (2) is room temperature, and the ink drop distance is 150-250 μm.
Preferably, the temperature of the annealing treatment in the step (2) is 150-250 ℃ and the time is 10 min.
The principle of the invention is as follows: when the ink drops are deposited on the surface of the compound film, the solvent in the center of the liquid drops carries the solute to rapidly move to the edge of the liquid drops under the action of the strong coffee ring effect, and the solute is deposited at the edge. And the ink solvent dissolves the bottom polymer and further dissolves towards the edge, finally forming a ring of solute which is uniformly deposited on the edge of the ink drop. Without the polymer film, the ink droplets deposited on the glass substrate will form three-phase line pinning, the ink solute and the solvent are limited to be deposited within a certain range, the diameter of the finally formed single ink droplet is about 50 μm, the ink droplets will be deposited on the surface of the glass substrate to form a uniform dot matrix (as shown in fig. 5), and a ring structure with a uniform line width of less than 20 μm cannot be directly formed. Dissolution of the polymer film by the ink solvent will result in three-phase line slip, eventually promoting uniform deposition of solute at the ink drop edges. The schematic diagram is shown in fig. 1. The principle of the process of forming a uniform pattern array from a uniform array of ink drops is shown in fig. 2.
The preparation method of the invention has the following advantages and beneficial effects:
according to the invention, a layer of polymer film is prepared in advance before ink-jet printing, and a high-precision uniform pattern array can be obtained by utilizing the coffee ring effect in the ink-jet printing process, so that the limit of the traditional preparation method is broken through, and the obtained pattern array has good repeatability and uniformity.
Drawings
Fig. 1 and 2 are schematic diagrams of a process for patterning ink droplets and forming a uniform array of ink droplets into a uniform pattern array, respectively, in the method of the present invention. The numbering in the figures is as follows: 01-glass substrate, 02-polymer film, 03-solute of ink-jet printing ink, and 04-aqueous solvent of ink-jet printing ink.
FIG. 3 is a diagram illustrating a process of forming a uniform pattern array according to an embodiment of the present invention.
FIG. 4 is a diagram illustrating the effect of the uniform pattern array according to the embodiment of the present invention.
FIG. 5 is an array of patterns obtained by direct ink jet printing of a comparative polymer-free film.
Detailed Description
The present invention will be described in further detail with reference to examples and drawings, but the present invention is not limited thereto.
Examples
(1) Ultrasonically cleaning a glass substrate in tetrahydrofuran, isopropanol, washing liquor, deionized water (2 times) and isopropanol at room temperature for 10min, and then placing the cleaned glass substrate in a constant-temperature oven to dry at 75 ℃. The glass substrate was then treated with oxygen Plasma for 10min at room temperature to remove surface impurities and increase the substrate surface energy.
(2) Spin-coating a layer of PVP solution (500mg of PVP powder +0.1ml of methylated poly-melamine-co-formaldehyde in 5ml of ethylene glycol solution to obtain 100mg/ml of PVP solution) on the treated glass substrate by using a spin coater at room temperature, wherein the spin-coating conditions are as follows: the rotation speed is 3000 r/min, and the time is 30 s. And (3) after the spin coating is finished, curing the sample by using an ultraviolet curing machine for 3min to obtain the PVP polymer film.
(3) A Dimatix 2800 series piezoelectric ink-jet printer is adopted, silver nanoparticle ink is used as an ink-jet printing raw material to print a uniform ink drop array, and an ink solvent is triethylene glycol ethyl ether. The ink jet printing conditions were: the clip temperature was set to room temperature, the print substrate temperature was room temperature, and the ink droplet pitch was 150 μm.
(4) And placing the printed ink drop array on a hot table, annealing at 200 ℃ for 10min, and naturally cooling to obtain a uniform pattern array.
The process of forming the uniform pattern array in this embodiment is illustrated in fig. 3. The resulting uniform pattern array effect is shown in fig. 4. From the above results, it can be seen that it has a stable repetitive structure and good uniformity. The individual ring structures are about 150 μm by 150 μm in size, the width of the silver nanoparticle rings is about 17 μm, the spacing between the ring structures is about 2 μm, and no overlap is created between rings. By way of contrast, FIG. 5 is an array of patterns obtained by direct ink jet printing without a polymer film. It can be seen that the line width between the annular structures of the pattern array obtained by direct ink-jet printing of the polymer-free film is greater than 20 μm.
In conclusion, the invention prepares a layer of polymer film in advance, and the uniform pattern array realized by the ink-jet printing method has a stable repetitive structure and good uniformity, thus breaking through the limit of the traditional ink-jet printing method.
The above embodiments are preferred embodiments of the present invention, but the present invention is not limited to the above embodiments, and any other changes, modifications, substitutions, combinations, and simplifications which do not depart from the spirit and principle of the present invention should be construed as equivalents thereof, and all such changes, modifications, substitutions, combinations, and simplifications are intended to be included in the scope of the present invention.

Claims (4)

1. Use of a method for realizing an ink jet printed uniform pattern array for the preparation of uniform annular structures having a line width of less than 20 μm, characterized in that the method comprises the steps of:
(1) preparing a layer of polymer film on the pretreated glass substrate; the polymer film is compatible with a solvent of subsequent ink-jet printing ink;
(2) carrying out ink-jet printing on the uniform ink drop array on the polymer film obtained in the step (1) by using ink-jet printing ink, and naturally cooling after annealing treatment to obtain a uniform pattern array;
the polymer film in the step (1) is a polyvinylpyrrolidone film; the ink-jet printing ink in the step (2) is silver nanoparticle ink taking triethylene glycol ethyl ether as a solvent;
the temperature of the ink-jet printing in the step (2) is room temperature, and the ink drop distance is 150-250 mu m.
2. Use according to claim 1, characterized in that: the pretreatment in the step (1) is to sequentially use tetrahydrofuran, isopropanol, deionized water and isopropanol for ultrasonic cleaning, drying and then carrying out oxygen plasma treatment.
3. Use according to claim 1, characterized in that the polyvinylpyrrolidone film is prepared by the following process: spin-coating a polymer solution containing polymer PVP, curing agent methylated poly (melamine-co-formaldehyde) and solvent ethylene glycol on the pretreated glass substrate, and curing by ultraviolet light to obtain the polyvinylpyrrolidone film.
4. Use according to claim 1, characterized in that: the temperature of the annealing treatment in the step (2) is 150-250 ℃, and the time is 10 min.
CN201910841335.9A 2019-09-06 2019-09-06 Method for realizing uniform pattern array of ink-jet printing Active CN110614863B (en)

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CN111137013B (en) * 2020-01-09 2020-12-25 深圳市华星光电半导体显示技术有限公司 Inkjet printing method, inkjet printing apparatus, inkjet printing device, and computer-readable storage medium
CN111554812B (en) * 2020-05-14 2022-04-22 苏州大学 Preparation method of patterned organic crystal array and organic field effect transistor
CN111791623B (en) * 2020-07-21 2022-01-25 艾感科技(广东)有限公司 Method and device for preparing gas sensor array by ink-jet printing

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6162510A (en) * 1996-09-30 2000-12-19 Canon Kabushiki Kaisha Method of manufacturing a color filter
CN104253372A (en) * 2013-06-27 2014-12-31 中国科学院化学研究所 Whispering gallery mode photonic device and preparation method thereof
JP2016129220A (en) * 2014-11-27 2016-07-14 ユニバーシティ マラヤ Manufacturing method of nanowire
CN106299053A (en) * 2016-09-29 2017-01-04 Tcl集团股份有限公司 A kind of light emitting diode with quantum dots based on photon crystal structure and preparation method
CN106356466A (en) * 2016-10-27 2017-01-25 Tcl集团股份有限公司 White-light QLED (Quantum Dot Light Emitting Diode) device based on quantum dots with pre-set size and preparation method
CN107323118A (en) * 2017-07-06 2017-11-07 华南理工大学 A kind of preparation method of the silver-colored conductive film of UV solidifications pretreatment
CN108878664A (en) * 2017-05-11 2018-11-23 Tcl集团股份有限公司 Light emitting diode with quantum dots and the preparation method and application thereof
CN109461779A (en) * 2018-11-05 2019-03-12 吉林建筑大学 A kind of metal grid electrode preparation method based on inkjet printing technology
CN109768173A (en) * 2018-12-25 2019-05-17 武汉理工大学 A kind of full inkjet printing inverted structure light emitting diode with quantum dots preparation method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108022832A (en) * 2016-11-01 2018-05-11 京东方科技集团股份有限公司 The production method of electrode, thin film transistor (TFT) and preparation method thereof, related substrate
CN108659622B (en) * 2017-03-28 2021-05-04 京东方科技集团股份有限公司 Conductive ink, display substrate and manufacturing method thereof and display device
CN108215495B (en) * 2017-12-05 2019-06-18 华南理工大学 A kind of multistage splicing connecting different line width inkjet printing lines
CN108154968B (en) * 2017-12-28 2019-08-23 中建材蚌埠玻璃工业设计研究院有限公司 A kind of electronic information shows the preparation method with metal nano network flexible panel
CN109633950A (en) * 2019-02-20 2019-04-16 福州大学 A kind of liquid crystal lens and preparation method thereof for the changeable display of integration imaging 2D/3D

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6162510A (en) * 1996-09-30 2000-12-19 Canon Kabushiki Kaisha Method of manufacturing a color filter
CN104253372A (en) * 2013-06-27 2014-12-31 中国科学院化学研究所 Whispering gallery mode photonic device and preparation method thereof
JP2016129220A (en) * 2014-11-27 2016-07-14 ユニバーシティ マラヤ Manufacturing method of nanowire
CN106299053A (en) * 2016-09-29 2017-01-04 Tcl集团股份有限公司 A kind of light emitting diode with quantum dots based on photon crystal structure and preparation method
CN106356466A (en) * 2016-10-27 2017-01-25 Tcl集团股份有限公司 White-light QLED (Quantum Dot Light Emitting Diode) device based on quantum dots with pre-set size and preparation method
CN108878664A (en) * 2017-05-11 2018-11-23 Tcl集团股份有限公司 Light emitting diode with quantum dots and the preparation method and application thereof
CN107323118A (en) * 2017-07-06 2017-11-07 华南理工大学 A kind of preparation method of the silver-colored conductive film of UV solidifications pretreatment
CN109461779A (en) * 2018-11-05 2019-03-12 吉林建筑大学 A kind of metal grid electrode preparation method based on inkjet printing technology
CN109768173A (en) * 2018-12-25 2019-05-17 武汉理工大学 A kind of full inkjet printing inverted structure light emitting diode with quantum dots preparation method

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