CN110614839B - Screen printing plate capable of adjusting screen cloth ink permeation quantity and manufacturing method thereof - Google Patents
Screen printing plate capable of adjusting screen cloth ink permeation quantity and manufacturing method thereof Download PDFInfo
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- CN110614839B CN110614839B CN201810636835.4A CN201810636835A CN110614839B CN 110614839 B CN110614839 B CN 110614839B CN 201810636835 A CN201810636835 A CN 201810636835A CN 110614839 B CN110614839 B CN 110614839B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/14—Forme preparation for stencil-printing or silk-screen printing
- B41C1/145—Forme preparation for stencil-printing or silk-screen printing by perforation using an energetic radiation beam, e.g. a laser
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F15/00—Screen printers
- B41F15/14—Details
- B41F15/34—Screens, Frames; Holders therefor
- B41F15/36—Screens, Frames; Holders therefor flat
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Abstract
A screen capable of adjusting the ink penetration amount of screen cloth comprises: a screen frame; the screen cloth is stretched by a preset tension and fixed on the screen frame and comprises a plurality of metal warps and a plurality of metal wefts which are arranged in a vertically staggered mode, and the plurality of metal warps and the plurality of metal wefts have a first wire diameter; the high polymer material layer is coated with the mesh cloth and comprises a multi-opening pattern, wherein the multi-opening pattern comprises a plurality of mesh cloth openings formed by a plurality of metal warps and a plurality of metal wefts, the plurality of metal warps and/or the plurality of metal wefts forming the plurality of mesh cloth openings have a second wire diameter, and the second wire diameter is smaller than the first wire diameter. Furthermore, the invention also provides a screen manufacturing method capable of adjusting the ink penetration amount of the screen cloth.
Description
Technical Field
The invention relates to a structure of a printing screen made of printing screen cloth and a manufacturing method thereof, in particular to a printing screen and a manufacturing method thereof, which control the ink penetration of an opening pattern by adjusting the diameter of a warp and a weft in the opening pattern on the printing screen cloth.
Background
With the progress of the technology, the circuit pattern on the circuit board and the specification of the printed circuit required by the circuit board, such as the loop circuit of the passive component, the Finger-type electrode (Finger Line) circuit on the solar cell, etc., become finer and more precise, so that the specification of the mesh that can be used for printing the fine circuit is also required for the screen printing plate of the circuit pattern.
In precision screen printing, a fine-line screen cloth is an important link influencing ink penetration, and the ink penetration rate of a screen plate is related to the opening rate of the screen cloth, and the opening rate of the screen cloth is related to the mesh number and the wire diameter of the screen cloth, and the following formula is shown: the mesh opening ratio (mesh area (a)/screen area (B)) is known to be larger as the wire diameter is smaller, and the ink permeability is better, but the cost difference is larger at the same time. For example, for 360 mesh (mesh) and 20um thread diameter, the thread diameter is 16um and 13um … 11um, and the price grows in multiples per meter, except for the price, the traditional drawing technology has higher threshold for finer thread, so how to reduce the cost and increase the ink penetration to achieve precise printing is a problem to be overcome.
In addition, although there is a printing screen structure in the prior art in which the screen is formed by electroforming or a steel plate is processed by laser to increase the opening ratio of the mesh cloth and increase the ink penetration, the electroforming or steel plate lacks the characteristic of mesh cloth with warp and weft threads, the strength of the fine-line screen formed by electroforming is insufficient, the elasticity of the steel plate forming screen is insufficient, and the required printing effect cannot be achieved in off-plate printing. Furthermore, in the screen structure formed by weaving the warps and the wefts, although the warps and the wefts can be woven with different wire diameters, the thickness of the warps and the wefts cannot be locally controlled, so that the effect of reducing the wire diameter of the warp and the weft structure in a plurality of opening patterns of one screen to increase ink penetration cannot be achieved. On the other hand, in the practical application of the screen printing plate, after printing, only partial poor ink penetration is often found, for example, the partial poor ink penetration is just at the turning or right angle of the opening pattern, or the opening pattern is just at the joint of the longitude and latitude lines, but the longitude and latitude line diameters of the positions cannot be locally adjusted to increase the ink penetration. In addition, in practice, more than two mesh wire diameters are needed for the circuits in the same graph to achieve different circuit ink requirements, for example, Finger Line and Bus Bar in a solar printing screen are designed in the same screen for two circuits with different function requirements.
Based on the above reasons, it is an object of the present invention to provide a screen printing plate capable of adjusting the amount of ink penetration of a mesh and a method for manufacturing the same, so as to adjust the diameters of warps and wefts locally in the screen printing plate, thereby increasing the amount of ink penetration and reducing the cost.
Disclosure of Invention
To achieve the above object, the present invention provides a screen capable of adjusting the ink permeation amount of a screen cloth, comprising: a screen frame; a mesh cloth stretched and fixed on the mesh frame by a predetermined tension and including a plurality of metal warp threads and a plurality of metal weft threads arranged in a staggered manner up and down, the plurality of metal warp threads and the plurality of metal weft threads having a first thread diameter; the high polymer material layer is coated with the mesh cloth and comprises a plurality of opening patterns, wherein the opening patterns comprise a plurality of mesh cloth openings formed by a plurality of metal warps and a plurality of metal wefts, the metal warps and/or the metal wefts forming the mesh cloth openings have a second wire diameter, and the second wire diameter is smaller than the first wire diameter.
Preferably, the metal warp threads and/or the metal weft threads forming the mesh openings further have a third wire diameter, and the third wire diameter is smaller than the second wire diameter and the first wire diameter.
Preferably, the predetermined tension is 10-20 newtons.
Preferably, the material of the plurality of metal warp threads is one of stainless steel or tungsten, the material of the plurality of metal weft threads is one of stainless steel or tungsten, and the plurality of warp threads or the plurality of weft threads can be the same or different.
Furthermore, the invention also provides a screen printing plate manufacturing method capable of adjusting the ink penetration amount of the screen cloth, which comprises the following steps: weaving a plurality of metal warps and a plurality of metal wefts in an up-down staggered mode to form a mesh, wherein the plurality of metal warps and the plurality of metal wefts have a first wire diameter; stretching and fixing a plurality of metal warps and a plurality of metal wefts on a net frame by a preset tension; coating the mesh with a polymer material to form a polymer material layer on the mesh; etching the polymer material layer by a first etching way to form a plurality of first opening patterns, wherein the plurality of first opening patterns comprise a plurality of mesh openings formed by a plurality of metal warps and a plurality of metal wefts; etching the plurality of metal warps and/or the plurality of metal wefts forming the plurality of mesh openings by a second etching method to enable the plurality of metal warps and/or the plurality of metal wefts forming the plurality of mesh openings to have a second wire diameter, wherein the second wire diameter is smaller than the first wire diameter; and etching the polymer material layer by a first etching method to form a plurality of second opening patterns, wherein the plurality of first opening patterns and the plurality of second opening patterns form a plurality of third opening patterns.
Furthermore, in the step of etching the metal warps and/or the metal wefts forming the mesh openings by the second etching method, the metal warps and/or the metal wefts forming the mesh openings are further etched by the second etching method, so that the metal warps and/or the metal wefts forming the mesh openings have a third wire diameter, and the third wire diameter is smaller than the second wire diameter and the first wire diameter.
Furthermore, in the step of etching the plurality of metal warp threads and/or the plurality of metal weft threads forming the plurality of mesh openings by the second etching method, one of the plurality of metal warp threads and the plurality of metal weft threads forming the plurality of mesh openings is further etched by the second etching method to remove one of the plurality of metal warp threads and the plurality of metal weft threads forming the plurality of mesh openings by etching.
Preferably, the predetermined tension is 10-20 newtons.
Preferably, the material of the plurality of metal warp threads is one of stainless steel or tungsten, and the material of the plurality of metal weft threads is one of stainless steel or tungsten.
Preferably, the first etching method is laser etching, and the second etching method is chemical etching.
Drawings
The various aspects of the present invention and the particular features and advantages thereof will become more readily apparent to those having ordinary skill in the art upon reading the following detailed description and upon viewing the accompanying drawings in which:
fig. 1 is a schematic view illustrating a structure of a screen capable of adjusting an ink permeation amount of a mesh according to an embodiment of the present invention;
FIG. 2 is a schematic view illustrating an enlarged structure of a region A in FIG. 1;
FIG. 3 is a flow chart illustrating a method for fabricating a screen capable of adjusting the ink permeability of the web according to an embodiment of the present invention;
FIG. 4 is a schematic diagram illustrating a screen structure of an embodiment of the present invention that does not include an opening pattern and that can adjust the ink permeability of the mesh;
FIG. 5 is a schematic diagram illustrating a screen structure with adjustable ink penetration of a mesh cloth including a first opening pattern according to an embodiment of the present invention;
FIG. 6a is a schematic diagram illustrating a screen structure with adjustable ink penetration of a mesh cloth including a first opening pattern and a second opening pattern according to an embodiment of the present invention;
FIG. 6B is an enlarged view illustrating the region B in FIG. 6 a;
FIG. 7a is a schematic diagram illustrating a screen structure of a screen with adjustable ink penetration of a mesh cloth according to another embodiment of the present invention, which includes a first opening pattern and a second opening pattern; and
fig. 7b is an enlarged view illustrating a structure of a region C in fig. 7 a.
Detailed Description
The following embodiments of the present invention will be described in more detail with reference to the drawings and the accompanying drawings, so that those skilled in the art can implement the invention after studying the specification.
Fig. 1 is a schematic view illustrating a structure of a composite material web according to an embodiment of the present invention. Referring to fig. 1, in an embodiment of the present invention, a screen 1 capable of adjusting the ink permeability of a mesh includes a frame 10, a mesh 12, and a polymer material layer 14. The mesh cloth 12 is stretched and fixed on the net frame 10 by a predetermined tension, and the mesh cloth 12 includes a plurality of metal warp threads 121 and a plurality of metal weft threads 123 arranged in a staggered manner, and the metal warp threads 121 and the metal weft threads 123 have a first wire diameter. The polymeric material layer 14 covers the mesh fabric 12, and the polymeric material layer 14 includes an opening pattern 16 and an opening pattern 18. The metal warp 121 and/or the metal weft 123 in the opening patterns 16 and 18 have a second diameter smaller than the first diameter, so as to achieve the technical effect of increasing the ink penetration of the mesh cloth 12.
Fig. 2 is a schematic view illustrating an enlarged structure of the region a in fig. 1. Referring to fig. 1 and 2, as can be seen from fig. 2, the opening pattern 16 includes a plurality of mesh openings 141 formed by a plurality of metal warp 1211 and a plurality of metal weft 1231, the metal warp 1211 and the metal weft 1231 have the second diameter, and the second diameter is smaller than the first diameter. For example, the second wire diameter is 60% -90% of the first wire diameter. In particular, in order to achieve the technical effects of increasing the ink permeability of the mesh cloth 12 and reducing the cost, the mesh cloth 12 may be woven by using the metal warps 121 and the metal wefts 123 with relatively low price and large diameter, and then, the metal warps 121 and/or the metal wefts 123 in the opening patterns 16 and/or the opening patterns 18 may be etched by using a chemical solvent such as an acid solution or an alkali solution to reduce the diameter of the metal warps 121 and/or the metal wefts 123. For example, the diameter of the metal warp 121 and/or the metal weft 123 can be reduced by 60% -90%, so as to achieve the effect of locally controlling the thickness of the diameter and increase the ink penetration amount.
It should be understood that the number of the metal warps 121 and the metal wefts 123 in fig. 1 is only a schematic nature, and a larger number of the metal warps 121 and the metal wefts 123 are shown in the enlarged schematic view of fig. 2 to more clearly show the features of the present invention.
It should be noted that the polymer material layer 14 has acid and alkali resistance and high tensile strength, and can protect the areas other than the opening patterns 16 and 18 in the screen 1 when the chemical solvent is used to etch the metal warp 121 and/or the metal weft 123 in the opening patterns 16 and/or 18. Furthermore, in order to prevent the supporting force of the entire mesh cloth 12 from being weakened when the diameters of the metal warp 1211 and the metal weft 1231 are reduced, the mesh cloth 12 is stretched and fixed on the frame 10 with a predetermined tension of, for example, 10-20 newtons, and the tension with a specific value can make the metal warp 1211 and the metal weft 1231 have a certain supporting force after the diameters are reduced.
On the other hand, the metal warp threads 121 may be made of one of stainless steel and tungsten, and the metal weft threads 123 may be made of one of stainless steel and tungsten. When the metal warp threads 121 and the metal weft threads 123 are made of the same material, the metal warp threads 121 and the metal weft threads 123 may be etched simultaneously by using a chemical solvent to reduce the diameters of the metal warp threads 121 and the metal weft threads 123 simultaneously. If the metal warp 121 and the metal weft 123 are different in material, for example, the metal warp 121 is made of stainless steel, and the metal weft 123 is made of tungsten, only the metal warp 121 can be etched by using an acid solution, and only the metal weft 123 can be etched by using an alkali solution, so as to locally reduce the diameter of the specific material. Furthermore, the metal warp 1211 or the metal weft 1231 may be further etched and removed by an acid solution or an alkali solution, so that the opening pattern 16 or the opening pattern 18 only includes the metal warp 1211 or only includes the metal weft 1231.
In addition, in other embodiments of the present invention, the opening pattern 18 may include a plurality of metal warps and/or wefts (not shown) having a third diameter, and the third diameter is smaller than the first diameter and the second diameter. Specifically, the third wire diameter smaller than the first wire diameter and the second wire diameter can be formed by etching the metal warp 121 and/or the metal weft 123 in the opening pattern 18 with a chemical solvent such as an acid solution or an alkali solution for a longer time than the metal warp 121 and/or the metal weft 123 in the opening pattern 16, for example, the metal warp 121 and/or the metal weft 123 in the opening pattern 16 is etched for 5 minutes, and the metal warp 121 and/or the metal weft 123 in the opening pattern 18 is etched for 10 minutes. In other words, in the screen structure of the present invention, the opening pattern has metal warp threads and metal weft threads with various diameters, so that the mesh opening ink permeability with various values can be obtained. Furthermore, in other embodiments of the present invention, the single opening pattern structure of the opening pattern 16 may include metal warp threads and metal weft threads with various thread diameters, for example, the metal warp threads and the metal weft threads of the first portion of the opening pattern 16 may be configured to have a second thread diameter, and the metal warp threads and the metal weft threads of the second portion of the opening pattern 16 may be configured to have a third thread diameter.
Fig. 3 is a flowchart for describing a screen printing method for adjusting the ink penetration of the mesh according to an embodiment of the invention. Referring to fig. 3, the screen printing plate manufacturing method capable of adjusting the ink permeation amount of the screen cloth of the present invention includes steps S10-S60, and step S10 is: weaving a plurality of metal warps and a plurality of metal wefts in an up-down staggered mode to form a mesh, wherein the metal warps and the metal wefts have a first wire diameter; step S20 is: stretching and fixing the metal warp and the metal weft on a net frame by a preset tension; step S30 is: coating the mesh with a polymer material to form a polymer material layer on the mesh; step S40 is: etching the polymer material layer by a first etching way to form a plurality of first opening patterns, wherein the first opening patterns comprise a plurality of mesh openings formed by the metal warp threads and the metal weft threads; step S50 is: etching the metal warp threads and/or the metal weft threads forming the mesh fabric opening by a second etching mode to enable the metal warp threads and/or the metal weft threads forming the mesh fabric opening to have a second thread diameter, wherein the second thread diameter is smaller than the first thread diameter; and step S60 is: and etching the polymer material layer by the first etching way to form a plurality of second opening patterns, wherein the first opening patterns and the second opening patterns form a plurality of third opening patterns.
Each step will now be described in detail with reference to the schematic diagram of the halftone screen. Fig. 4 is a schematic view illustrating a screen structure for adjusting the ink permeability of a mesh without an opening pattern according to an embodiment of the invention. Referring to fig. 3 and 4, after the steps S10-S30 are completed, the structure of the screen 2 shown in fig. 4 can be obtained, in which the screen 2 includes a mesh 22 formed by weaving a plurality of metal warp yarns 221 and a plurality of metal weft yarns 223 in an up-and-down staggered manner, the metal warp yarns 221 and the metal weft yarns 223 of the mesh 22 are stretched and fixed on a frame 20 with a predetermined tension, and at the same time, the mesh 22 can be covered by a polymer material to form a polymer material layer 24 on the mesh 22.
On the other hand, in step S30, the polymer material used in the polymer material layer 24 is one of PET, PE, PI, PU, PVC, PP, PTFE, PMMA, PS or other polymer synthetic materials with acid-base resistance and high tensile force resistance. In addition, in an embodiment of the present invention, the polymer material in the form of a film can be combined with the mesh fabric 22 in a hot pressing manner, so that the polymer material covers the mesh fabric 22 and forms the polymer material layer 24; alternatively, the polymer material may be used as a thin film, and then a layer of glue is coated on the polymer material or on the mesh fabric 22, and then the mesh fabric 22 and the polymer material are bonded together through the glue, so that the polymer material covers the mesh fabric 22 to form the polymer material layer 24. In other embodiments of the present invention, the polymer material in liquid form and the mesh fabric 22 may be combined by one of wet coating, slot coating, dip coating, rotary coating, spray coating or slit coating, so that the polymer material covers the mesh fabric 22 and forms the polymer material layer 24.
Fig. 5 is a schematic view illustrating a screen structure including a first opening pattern for adjusting the ink permeability of the mesh according to an embodiment of the invention. Referring to fig. 3 and 5, in step S40, the polymer material layer 24 may be etched by a first etching method to form a plurality of first opening patterns 26, wherein the first opening patterns 26 include a plurality of mesh openings 241 formed by metal warp threads 221 and metal weft threads 223. Next, in step S50, the metal warp threads 221 and/or the metal weft threads 223 forming the mesh openings 241 may be etched by a second etching method, so that the metal warp threads 221 and/or the metal weft threads 223 forming the mesh openings 241 have a second thread diameter, wherein the second thread diameter is smaller than the first thread diameter. In addition, since the description of etching the metal warp 221 and the metal weft 223 is already described above, the description thereof is omitted.
Fig. 6a is a schematic view illustrating a screen structure including a first opening pattern and a second opening pattern capable of adjusting the ink permeation amount of the mesh according to an embodiment of the present invention. Referring to fig. 3 and 6a, in step S60, the polymer material layer 24 may be etched by the first etching method to form a plurality of second opening patterns 28, wherein the first opening patterns 26 and the second opening patterns 28 may further form a third opening pattern, that is, the third opening pattern representing the entire opening pattern includes the first opening patterns 26 etched to have a finer pitch and weft diameter and the second opening patterns 28 not etched to have a common pitch and weft diameter.
Fig. 6B is a schematic diagram illustrating an enlarged structure of the region B in fig. 6 a. Referring to fig. 6b, as can be clearly seen from fig. 6b, in the first opening pattern 26, the metal warp 2211 and/or the metal weft 2231 forming the mesh opening 241 have a second diameter, and in the second opening pattern 28, the metal warp 221 and/or the metal weft 223 forming the mesh opening 241 have a first diameter, and the second diameter is smaller than the first diameter. In this way, the first opening pattern 26 has a larger ink penetration amount than the second opening pattern 28, so as to achieve the purpose of locally controlling the ink penetration amount. The user can adjust the thickness of the line diameter in the first opening pattern 26 and the second opening pattern 28 according to the requirement, that is, the line diameter in the second opening pattern 28 can be thinner.
It should be understood that the number of the metal warp threads 221 and the metal weft threads 223 in fig. 6a is only a schematic nature, and a larger number of the metal warp threads 221 and the metal weft threads 223 are shown in the enlarged schematic view of fig. 6b to more clearly show the features of the present invention.
On the other hand, in the manufacturing method of the present invention, the first etching method is an etching method that only etches the polymer material layer 24, such as laser etching or other etching methods with the same effect, so as to cut out the patterns with different wire diameters by laser or other etching methods, and cut out the patterns of another part of the whole pattern in the subsequent steps. The second etching method is an etching method for etching only the metal warp 221 and/or the metal weft 223, such as chemical etching or other etching methods with the same effect, so as to etch the metal warp and/or the metal weft by using a chemical solvent, such as an acid solution or an alkali solution, to reduce the diameter of the metal warp and/or the metal weft.
In addition, in another embodiment of the present invention, in step S50, the method may further include the following steps: and etching the metal warp and/or the metal weft forming the mesh opening by the second etching way to enable the metal warp and/or the metal weft forming the mesh opening to have a third wire diameter, wherein the third wire diameter is smaller than the second wire diameter and the first wire diameter. For example, in step S50, the metal warp threads 221 and/or the metal weft threads 223 in a plurality of the first opening patterns 26 may be etched for, for example, 5 minutes to form the metal warp threads 2211 and/or the metal weft threads 2231 with the second thread diameter. Then, the metal warp 221 and/or the metal weft 223 in another plurality of the first opening patterns 26 are etched for, for example, 10 minutes to form metal warp and/or metal weft (not shown in the figure) with a third diameter. And so on, as long as the etching time is prolonged, the metal warp and/or the metal weft with other wire diameters smaller than the first wire diameter, the second wire diameter and the third wire diameter can be formed.
One method of etching the plurality of first opening patterns 26 to form the third line diameter is as follows: the first set of first opening patterns 26 are etched by a first etching method, such as laser etching, and then the metal warp lines 221 and/or the metal weft lines 223 in the first set of first opening patterns 26 are etched by a second etching method, such as chemical etching, for example, the etching time is 5 minutes. Then, the second group of first opening patterns 26 are etched by the first etching method, and the metal warp lines 221 and/or the metal weft lines 223 in the first group of first opening patterns 26 and the second group of first opening patterns 26 are simultaneously etched by the second etching method, wherein the etching time is 5 minutes, for example. In this way, the etching time of the metal warp lines 221 and/or the metal weft lines 223 in the first set of first opening patterns 26 is 10 minutes in total, and the metal warp lines and/or the metal weft lines with the third diameter can be obtained, while the etching time of the metal warp lines 221 and/or the metal weft lines 223 in the second set of first opening patterns 26 is 5 minutes in total, and the metal warp lines 2211 and/or the metal weft lines 2231 with the second diameter can be obtained, and the third diameter is smaller than the second diameter.
Another method of etching the plurality of opening patterns 26 to form the third line diameter is: the first group of first opening patterns 26 are etched by a first etching method, such as laser etching, and then the metal warp lines 221 and/or the metal weft lines 223 in the first group of first opening patterns 26 are etched by a second etching method, such as chemical etching, for example, for 5 minutes, so as to form the metal warp lines 2211 and/or the metal weft lines 2231 with the second line diameter, and then the first group of first opening patterns 26 may be filled with an acid-base resistant emulsion. Thereafter, the first etching method may be used to etch the second group of first opening patterns 26, and then the second etching method may be used to etch the metal warp 221 and/or the metal weft 223 in the second group of first opening patterns 26 for, for example, 10 minutes, so as to form the metal warp and/or the metal weft with a third wire diameter, where the third wire diameter is smaller than the second wire diameter. At this time, since the first group of first opening patterns 26 are filled with the acid-base resistant emulsion, the metal warp 2211 and/or the metal weft 2231 in the first group of first opening patterns 26 are not etched when the second group of first opening patterns 26 are etched.
As can be seen from the above method, the invention can form metal warp and metal weft with various wire diameters in the opening pattern of the screen by a special manufacturing method, so as to obtain mesh fabric opening ink permeability with various values,
in addition, in another embodiment of the present invention, in step S50, the method may further include the following steps: etching one of the metal warp threads and the metal weft threads forming the mesh fabric opening by the second etching mode so as to remove one of the metal warp threads and the metal weft threads forming the mesh fabric opening by etching. For example, the metal warp 221 may be made of one of stainless steel and tungsten, and the metal weft 223 may be made of one of stainless steel and tungsten. If the metal warp 221 and the metal weft 223 are different in material, for example, the metal warp 221 is made of stainless steel, and the metal weft 223 is made of tungsten, the metal warp 221 can be etched and reduced only by using an acid solution, or the metal warp 221 can be further removed, and the metal weft 223 can be etched and reduced only by using an alkali solution, or the metal weft 223 can be further removed, so as to reduce or remove the diameter of a specific material locally, and improve the ink penetration amount.
Fig. 7a is a schematic view illustrating a screen structure capable of adjusting the ink penetration of a mesh cloth according to another embodiment of the present invention, which includes a first opening pattern and a second opening pattern; FIG. 7b is a schematic diagram illustrating an enlarged structure of a region C in FIG. 7 a. Referring to fig. 7a and 7b, in another embodiment of the present invention, a screen 3 capable of adjusting the ink permeation amount of a mesh includes a frame 30, a mesh 32, and a polymer material layer 34. The mesh 32 is stretched and fixed on the frame 30 by a predetermined tension, and the mesh 32 includes a plurality of metal warp 321 and a plurality of metal weft 323 arranged in a staggered manner and perpendicular to each other, and the metal warp 321 and the metal weft 323 have a first wire diameter. The polymer material layer 34 covers the mesh 32, and the polymer material layer 34 includes a plurality of first opening patterns 36 and a plurality of second opening patterns 38. It should be noted that, in this embodiment, the metal warp 321 in the first opening pattern 36 is removed by etching with a chemical solvent such as an acid solution or an alkali solution, and the diameter of the metal weft 323 is reduced by etching to form the metal weft 3231 with a second diameter smaller than the first diameter, so as to increase the ink penetration of the mesh 32.
As is apparent from the enlarged structure of fig. 7b, the diameter of the metal weft 3231 in the first opening pattern 36 is significantly thinner than that of the metal weft 323, and the metal warp 321 is not included in the first opening pattern 36, so that the ink penetration amount of the first opening pattern 36 can be controlled to be maximized.
It should be understood that the number of the metal warp threads 321 and the metal weft threads 323 in fig. 7a is only schematic, and a larger number of the metal warp threads 321 and the metal weft threads 323 are shown in the enlarged schematic view of fig. 7b to more clearly show the features of the present invention.
In summary, the present invention successfully provides a screen capable of adjusting the ink permeation amount of a mesh and a method for manufacturing the same, in the screen structure of the present invention, the line diameter of the metal warp and weft in the opening pattern on the screen can be locally controlled, so that the metal warp and weft in the opening pattern has a thinner line diameter, so as to further increase the ink permeation amount in the opening pattern.
The foregoing is illustrative of the preferred embodiment of the present invention and is not to be construed as limiting thereof, since any modification or variation thereof within the spirit of the invention is intended to be covered thereby.
Wherein the reference numerals are as follows:
1. 2, 3 half tone screen
10. 20, 30 net frame
12. 22, 32 mesh cloth
14. 24, 34 high polymer material layer
16. 18 opening pattern
26. 36 first opening pattern
28. 38 second opening pattern
121. 1211, 221, 2211, 321 and 3211 metal warp
123. 1231, 223, 2231, 323, 3231 metallic weft
141. 241 mesh opening
S10-S60 steps
A. B, C area
Claims (7)
1. The utility model provides a half tone of adjustable screen cloth ink transmission volume which characterized in that includes:
a screen frame;
the screen cloth is stretched by a preset tension and fixed on the screen frame and comprises a plurality of metal warps and a plurality of metal wefts which are vertically staggered, and the metal warps and the metal wefts have a first wire diameter;
the polymer material layer is used for coating the mesh cloth and comprises a plurality of first opening patterns and a plurality of second opening patterns which are formed by etching the polymer material layer by a first etching mode, wherein the first opening patterns and the second opening patterns form a plurality of third opening patterns;
the metal warp threads and/or the metal weft threads forming the mesh openings are etched in a second etching mode to enable the metal warp threads and/or the metal weft threads forming the mesh openings to have a second wire diameter smaller than the first wire diameter, the metal warp threads and/or the metal weft threads forming the mesh openings are etched in the second etching mode to further have a third wire diameter smaller than the second wire diameter and the first wire diameter.
2. The screen of claim 1, wherein the predetermined tension is 10-20 newtons.
3. The screen according to claim 1, wherein the metal warp is made of one of stainless steel and tungsten, and the metal weft is made of one of stainless steel and tungsten.
4. A screen manufacturing method capable of adjusting the ink penetration amount of screen cloth is characterized by comprising the following steps:
weaving a plurality of metal warps and a plurality of metal wefts in an up-down staggered mode to form a mesh, wherein the metal warps and the metal wefts have a first wire diameter;
stretching and fixing the metal warp and the metal weft on a net frame by a preset tension;
coating the mesh with a polymer material to form a polymer material layer on the mesh;
etching the polymer material layer by a first etching way to form a plurality of first opening patterns, wherein the first opening patterns comprise a plurality of mesh openings formed by the metal warp threads and the metal weft threads;
etching the metal warp threads and/or the metal weft threads forming the mesh fabric opening by a second etching mode to enable the metal warp threads and/or the metal weft threads forming the mesh fabric opening to have a second thread diameter, wherein the second thread diameter is smaller than the first thread diameter; and
etching the polymer material layer by the first etching method to form a plurality of second opening patterns, wherein the first opening patterns and the second opening patterns form a plurality of third opening patterns;
in the step of etching the metal warp threads and/or the metal weft threads forming the mesh openings by the second etching method, the metal warp threads and/or the metal weft threads forming the mesh openings are further etched by the second etching method, so that the metal warp threads and/or the metal weft threads forming the mesh openings have a third wire diameter, and the third wire diameter is smaller than the second wire diameter and the first wire diameter.
5. The method of claim 4, wherein the predetermined tension is 10-20 newtons.
6. The screen printing plate manufacturing method according to claim 4, wherein the metal warp is made of one of stainless steel and tungsten, and the metal weft is made of one of stainless steel and tungsten.
7. The method of claim 4, wherein the first etching process is laser etching and the second etching process is chemical etching.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810636835.4A CN110614839B (en) | 2018-06-20 | 2018-06-20 | Screen printing plate capable of adjusting screen cloth ink permeation quantity and manufacturing method thereof |
| TW107134762A TWI670181B (en) | 2018-06-20 | 2018-10-02 | Screen plate capable of locally controlling yarn thickness and manufacturing method thereof |
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| CN201810636835.4A CN110614839B (en) | 2018-06-20 | 2018-06-20 | Screen printing plate capable of adjusting screen cloth ink permeation quantity and manufacturing method thereof |
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| CN110614839B true CN110614839B (en) | 2021-06-01 |
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| CN111469531B (en) * | 2020-03-11 | 2022-09-09 | 昆山恒盛电子有限公司 | SE screen printing plate manufacturing process without net knots |
| TWI742889B (en) * | 2020-10-22 | 2021-10-11 | 倉和股份有限公司 | Printing screen capable of guiding ink and increasing ink permeability and manufacturing method thereof |
| CN114474960B (en) * | 2020-10-26 | 2023-05-09 | 仓和精密制造(苏州)有限公司 | Printing screen plate capable of guiding ink and increasing ink penetration and manufacturing method thereof |
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| TW202000479A (en) | 2020-01-01 |
| CN110614839A (en) | 2019-12-27 |
| TWI670181B (en) | 2019-09-01 |
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