CN110596987A - Display substrate and display device - Google Patents

Display substrate and display device Download PDF

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Publication number
CN110596987A
CN110596987A CN201910939975.3A CN201910939975A CN110596987A CN 110596987 A CN110596987 A CN 110596987A CN 201910939975 A CN201910939975 A CN 201910939975A CN 110596987 A CN110596987 A CN 110596987A
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CN
China
Prior art keywords
substrate
layer
electrode
reflective
orthographic projection
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Granted
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CN201910939975.3A
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Chinese (zh)
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CN110596987B (en
Inventor
李坤
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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Priority to CN201910939975.3A priority Critical patent/CN110596987B/en
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/1675Constructional details
    • G02F1/16755Substrates
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/1675Constructional details
    • G02F1/16756Insulating layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/1675Constructional details
    • G02F1/1676Electrodes
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/1675Constructional details
    • G02F1/1676Electrodes
    • G02F1/16766Electrodes for active matrices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits

Abstract

The invention discloses a display substrate and a display device, wherein the display substrate comprises: the substrate base plate, and be located the source drain layer on the substrate base plate in proper order, active layer and grid layer, the source drain layer includes many parallel interval distribution's data line, the grid layer includes many parallel interval distribution's grid line, many data line and many crossing a plurality of pixel regions that form array distribution of grid line, in every pixel region, the grid layer still includes the first reflection configuration with grid line insulation, the orthographic projection of first reflection configuration on the substrate base plate extends to in the orthographic projection of second data line on the substrate base plate from the orthographic projection of first data line on the substrate base plate, first data line and second data line are two data lines of pixel region both sides. The invention can increase the aperture opening ratio of the reflection area corresponding to the electronic ink layer and improve the display effect of the electronic paper.

Description

Display substrate and display device
Technical Field
The invention relates to the technical field of display, in particular to a display substrate and a display device.
Background
Electronic paper is a display device that realizes image display by reflecting external ambient light. In general, electronic paper includes two substrates and an electronic ink layer between the two substrates, the electronic ink layer including a transparent electrophoretic fluid and black charged particles dispersed in the transparent electrophoretic fluid. By controlling the voltage difference between the two substrates, the movement of the charged black particles can be controlled, so that the corresponding pixel region is controlled to be white or black.
In the related art, one of the two substrates includes a thin film transistor layer including a plurality of thin film transistors and a pixel electrode layer including a plurality of pixel electrodes. Each pixel region includes at least one thin film transistor and a pixel electrode. In each thin film transistor, an active layer is over a gate electrode, a source electrode and a drain electrode cover a partial region of the active layer, and a pixel electrode is connected to the drain electrode, so that a voltage on the corresponding pixel electrode can be controlled by the thin film transistor.
The metal layer is arranged below the pixel electrode, so that when external ambient light irradiates the pixel electrode of the substrate through the transparent electrophoretic liquid, the external ambient light is reflected by the metal layer below the pixel electrode, and the electronic paper presents a white picture.
In the related art, a reflective metal reflective layer is usually located in the middle of the corresponding pixel region and is disposed on the same layer as the source and drain electrodes, and the reflective metal layer may be connected to the drain electrode. Because the metal reflecting layer and the data line are arranged on the same layer, in order to avoid influencing the transmission performance of the data line, a gap area needs to be arranged between the metal reflecting layer and the data line, the gap area can not reflect light, the aperture opening ratio of a reflecting area corresponding to the electronic ink layer is reduced, and the display effect of the electronic paper is poor.
Disclosure of Invention
The embodiment of the invention provides a display substrate and a display device, which can increase the aperture opening ratio of a reflection area corresponding to an electronic ink layer and improve the display effect of electronic paper. The technical scheme is as follows:
in a first aspect, an embodiment of the present invention provides a display substrate, where the display substrate includes: the light source and drain structure comprises a substrate base plate, a source drain layer, an active layer and a grid layer, wherein the source drain layer, the active layer and the grid layer are sequentially arranged on the substrate base plate, the source drain layer comprises a plurality of data lines which are distributed in parallel at intervals, the grid layer comprises a plurality of grid lines which are distributed in parallel at intervals, the plurality of data lines and the plurality of grid lines are intersected to form a plurality of pixel areas which are distributed in an array mode, in each pixel area, the grid layer further comprises a first reflection structure which is insulated from the grid lines, the orthographic projection of the first reflection structure on the substrate base plate extends from the orthographic projection of the first data lines on the substrate base plate to the orthographic projection of second data lines on the substrate base plate, and the first data lines and the second data lines are two data lines on two sides of the pixel areas.
In an implementation manner of the embodiment of the present invention, the first reflection structure has two opposite first side edges and two second side edges connecting the two first side edges, in each pixel region, an orthogonal projection of the first side edge on the substrate is located in an orthogonal projection of the data line on the substrate, an orthogonal projection of the second side edge on the substrate and an orthogonal projection of the gate line on the substrate are distributed at intervals, the middle portion of the first reflection structure has a hollow, the source drain layer includes a reflection structure electrically connected to the drain electrode, and an orthogonal projection of the hollow on the substrate is located in an orthogonal projection of the reflection electrode on the substrate.
In another implementation manner of the embodiment of the present invention, an orthographic projection of the first reflective structure on the substrate overlaps with an orthographic projection of the reflective electrode on the substrate.
In another implementation manner of the embodiment of the present invention, the first reflective structures arranged along the extending direction of the gate line are connected to each other.
In another implementation manner of the embodiment of the present invention, in each pixel region, the source and drain layers further include a second reflective structure insulated from the source, the drain, and the data line, and an orthogonal projection of the second reflective structure on the substrate is at least partially located between an orthogonal projection of the gate line and the second side edge on the substrate.
In another implementation manner of the embodiment of the present invention, the second reflective structure is a frame structure having an opening, the frame structure surrounds the reflective electrode, and a partial region of the reflective electrode is connected to the drain electrode through the opening of the frame structure; or the second reflecting structure is a reflecting strip, the reflecting strip is arranged along the direction of the second side edge, and the orthographic projection of the reflecting strip on the substrate is at least partially positioned between the grid line and the orthographic projection of the second side edge on the substrate.
In another implementation manner of the embodiment of the present invention, the display substrate further includes a pixel electrode layer located on the gate layer, the pixel electrode layer includes pixel electrodes corresponding to the plurality of pixel regions one to one, in each of the pixel regions, the reflective electrode is connected to the pixel electrode through a via, and an orthogonal projection of the via on the substrate is located in an orthogonal projection of the hollow on the substrate.
In another implementation manner of the embodiment of the present invention, the pixel electrode covers the corresponding pixel region, and an orthogonal projection of the pixel electrode on the substrate overlaps with an orthogonal projection part of the data line and/or the gate line on two sides of the corresponding pixel region on the substrate.
In another implementation manner of the embodiment of the present invention, a partial region of the gate line is a gate electrode, and an orthogonal projection of the active layer on the substrate is located in an orthogonal projection of the gate line on the substrate.
In a second aspect, embodiments of the present invention provide a display device, which includes the display substrate as described above.
The technical scheme provided by the embodiment of the invention has the beneficial effects that at least:
in the embodiment of the invention, the source drain layer, the active layer and the gate layer of the display substrate are sequentially arranged on the substrate, namely the active layer is arranged below the gate layer, and the gate layer shields the active layer, so that the position of the active layer on the display substrate can reflect ambient light, and a pixel electrode can be arranged at the position. Meanwhile, in a pixel area formed by a plurality of data lines and a plurality of grid lines, the grid layer also comprises a first reflecting structure insulated from the grid lines, the orthographic projection of the first reflecting structure on the substrate extends from the orthographic projection of the first data line on the substrate to the orthographic projection of the second data line on the substrate, namely the first reflecting structure extends from the data line on one side to the data line on the other side in the pixel area, so that the first reflecting structure can shield a gap area between the data line and the metal reflecting layer, the gap area which cannot reflect light originally can reflect ambient light, the gap area can be provided with pixel electrodes, and each pixel area can form a metal reflecting layer with a larger area, therefore, each pixel area can be provided with the pixel electrode with a larger effective area, and the aperture ratio of the reflecting area corresponding to the electronic ink layer is increased, the display effect is improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a schematic partial structure diagram of a display substrate of an electronic paper provided in the related art;
FIG. 2 is a schematic view of a display substrate of FIG. 1;
fig. 3 is a schematic partial structure view of a display substrate of another electronic paper provided in the related art;
FIG. 4 is a schematic cross-sectional view taken along the line A-A of the display substrate shown in FIG. 3;
fig. 5 is a schematic partial structure diagram of a display substrate according to an embodiment of the present invention;
FIG. 6 is a schematic view of a display substrate according to an embodiment of the present invention;
fig. 7 is a schematic diagram of a partial enlarged structure of a display substrate according to an embodiment of the invention;
fig. 8 is a schematic partial structural diagram of a source drain layer of a display substrate according to an embodiment of the present invention;
fig. 9 is a schematic diagram of a partially enlarged structure of a source drain layer of a display substrate according to an embodiment of the present invention;
FIG. 10 is a schematic cross-sectional view taken along line B-B of the display substrate of FIG. 9;
fig. 11 is a schematic partial structure diagram of a source/drain layer according to an embodiment of the present invention;
fig. 12 is a schematic partial structure diagram of another source/drain layer according to an embodiment of the present invention;
FIG. 13 is a flow chart of a method for fabricating a display substrate according to an embodiment of the present invention;
FIG. 14 is a schematic diagram illustrating a first state of a display substrate according to an embodiment of the invention;
FIG. 15 is a schematic cross-sectional view taken along the direction C-C of a display substrate provided in FIG. 14;
FIG. 16 is a schematic diagram illustrating a second state of a display substrate according to an embodiment of the invention;
FIG. 17 is a schematic cross-sectional view taken along line D-D of the display substrate shown in FIG. 16;
FIG. 18 is a schematic diagram illustrating a third state of a display substrate according to an embodiment of the invention;
FIG. 19 is a schematic cross-sectional view taken along line E-E of the display substrate of FIG. 18;
FIG. 20 is a schematic diagram illustrating a fourth state of a display substrate according to an embodiment of the invention;
fig. 21 is a schematic cross-sectional view of the display substrate provided in fig. 20 in the direction F-F.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
Fig. 1 is a schematic view of a partial structure of a display substrate of an electronic paper provided in the related art. As shown in fig. 1, the display substrate includes a plurality of gate lines 41 and a plurality of data lines 23, the plurality of gate lines 41 and the plurality of data lines 23 intersect to define a plurality of pixel regions, and each pixel region is provided with a Thin-film transistor (TFT) circuit and a pixel electrode layer 6 connected to the TFT circuit. In the embodiment shown in fig. 1, the TFT circuit of each pixel region includes 2 TFTs, a first TFT a and a second TFT B, respectively. In each pixel region, the gate electrodes 40 of the first TFT a and the second TFT B are connected to the same gate line 41, the source electrode 21 of the first TFT a is connected to the data line 23, the drain electrode 22 of the first TFT a is connected to the source electrode 21 of the second TFT B, and the drain electrode 22 of the second TFT is connected to the pixel electrode layer 6.
Fig. 2 is a schematic view of a layer structure of the display substrate provided in fig. 1. As shown in fig. 2, the TFT layer includes: the pixel structure comprises a grid layer, an active layer 3 and a source drain layer which are sequentially stacked on a substrate base plate 1, wherein the grid layer comprises a grid 40 and a grid line 41, the source drain layer comprises a data line 23, a source 21 and a drain 22, a pixel electrode layer 6 is arranged in each pixel region, in order to ensure that external environment light is reflected by the drain 22 below the pixel electrode layer 6 after being irradiated to the pixel electrode layer 6, in each pixel region, the shape of the formed pixel electrode layer 6 is matched with that of the drain 22, the region where the active layer 3 is located and a gap region between the drain 22 and the data line 23 can be avoided, so that the area of a reflective metal layer below the pixel electrode layer is smaller, the aperture ratio of a reflective region corresponding to an electronic ink layer is reduced, the coverage area of the pixel electrode layer 6 in the pixel region is reduced, and the display effect of electronic paper is reduced.
In order to increase an effective opening area of a pixel electrode layer and improve an opening ratio of a reflection area corresponding to an electronic ink layer, the related art provides a display substrate. Fig. 3 is a partial structural view of a display substrate of another electronic paper provided in the related art, and fig. 4 is a sectional structural view of the display substrate provided in fig. 3 in the direction of a-a. As shown in fig. 3 and 4, the display substrate is provided with a metal layer 8 on the source drain layer 2 of the display substrate shown in fig. 1, the metal layer 8 is located in the pixel region and covers most of the pixel region, and blocks a switching portion (the active layer 3) of the TFT and a partial gap region between the drain and the data line, so that the pixel electrode layer 6 can be set to be a rectangle covering the pixel region, thereby increasing the area ratio of the pixel electrode layer 6, increasing the aperture ratio of the reflective region corresponding to the electronic ink layer, and improving the display effect of the electronic paper.
However, the above method additionally adds a related process for manufacturing the metal layer in the existing processing process, which is not favorable for reducing the production cost and the production period of the product.
Therefore, the gate layer is arranged above the active layer, and the reflecting structure which is spaced from the gate and the gate line is arranged in the gate layer, so that the active layer area can be covered by the gate layer, meanwhile, the gap area between the drain and the data line is filled by the reflecting structure, a metal layer does not need to be added, the production cost of a product is reduced, and the production efficiency is improved.
Fig. 5 is a schematic partial structure diagram of a display substrate according to an embodiment of the present invention. As shown in fig. 5, the display substrate includes a plurality of data lines 23 spaced apart in parallel and a plurality of gate lines 41 spaced apart in parallel, and the plurality of data lines 23 and the plurality of gate lines 41 intersect to form a plurality of pixel regions C distributed in an array.
Fig. 6 is a schematic view of a hierarchical structure of a display substrate according to an embodiment of the present invention. The hierarchical cross-section of the substrate shown in fig. 6 is a G-oriented cross-section as shown in fig. 7. As shown in fig. 6, the display substrate includes: the semiconductor device comprises a substrate base plate 1, and a source drain layer 2, an active layer 3 and a gate layer 4 which are sequentially arranged on the substrate base plate 1. The gate line 41 is located on the gate layer 4, and the data line 23 is located on the source drain layer 2. That is, the gate layer 4 includes the gate line 41, and the source-drain layer 2 includes the data line 23.
Fig. 7 is a schematic diagram of a partially enlarged structure of a display substrate according to an embodiment of the invention. Referring to fig. 6 and 7, in each pixel region, the gate layer 4 further includes a first reflective structure 42 insulated from the gate line 41, and an orthogonal projection of the first reflective structure 42 on the substrate base 1 extends from within an orthogonal projection of the first data line on the substrate base 1 to within an orthogonal projection of the second data line on the substrate base 1.
The first data line and the second data line are two data lines on two sides of the pixel region. Referring to fig. 5, the first data line may be the data line S1 in the pixel region C, and the second data line may be the data line S2 in the pixel region C.
In the embodiment of the invention, the source drain layer, the active layer and the gate layer of the display substrate are sequentially arranged on the substrate, namely the active layer is arranged below the gate layer, and the gate layer shields the active layer, so that the position of the active layer on the display substrate can reflect ambient light, and a pixel electrode can be arranged at the position. Meanwhile, in a pixel area formed by a plurality of data lines and a plurality of grid lines, the grid layer also comprises a first reflecting structure insulated from the grid lines, the orthographic projection of the first reflecting structure on the substrate extends from the orthographic projection of the first data line on the substrate to the orthographic projection of the second data line on the substrate, namely the first reflecting structure extends from the data line on one side to the data line on the other side in the pixel area, so that the first reflecting structure can shield a gap area between the data line and the metal reflecting layer, the gap area which cannot reflect light originally can reflect ambient light, the gap area can be provided with pixel electrodes, and each pixel area can form a metal reflecting layer with a larger area, therefore, each pixel area can be provided with the pixel electrode with a larger effective area, and the aperture ratio of the reflecting area corresponding to the electronic ink layer is increased, the display effect is improved.
Wherein, insulating means that the two are not contacted with each other and arranged at intervals. The gate line 41 is insulated from the first reflective structure 42 such that the first reflective structure 42 is spaced apart from the gate line 41.
Optionally, as shown in fig. 5, the first reflective structure 42 has two opposite first sides 421, and two second sides 422 connecting the two first sides 421, in each pixel region, an orthogonal projection of the first side 421 on the substrate 1 is located in an orthogonal projection of the data line 23 on the substrate 1, an orthogonal projection of the second side 422 on the substrate 1 is spaced from an orthogonal projection of the gate line 41 on the substrate 1, and a hollow 43 is disposed in a middle portion of the first reflective structure 42.
Fig. 8 is a schematic partial structural diagram of a source/drain layer of a display substrate according to an embodiment of the present invention. As shown in fig. 8, the source/drain layer 2 of the display substrate includes a plurality of data lines 23 arranged in parallel at intervals, and a source electrode 21, a drain electrode 22, and a reflective electrode 20 electrically connected to the drain electrode 22 are provided between two adjacent data lines 23. With reference to fig. 5 and 7, the orthographic projection of the hollow 43 on the substrate 1 is located in the orthographic projection of the reflective electrode 20 on the substrate 1.
In this embodiment, as shown in fig. 5 and 7, the first reflective structure 42 includes four side edges, wherein two first side edges 421 are disposed opposite to each other, and two second side edges 422 are used to connect the two first side edges 421, so that the first reflective structure 42 forms a closed structure. Because the orthographic projection of the first side 421 on the substrate base plate 1 is located in the orthographic projection of the data line 23 on the substrate base plate 1, at least part of the first reflection structure 42 covers between the data line 23 and the reflection electrode 20, and therefore, the first reflection structure 42, the source electrode 21, the drain electrode 22 and the reflection electrode 20 can jointly form a metal reflection layer with a larger area, so that the position on the display base plate, which cannot be reflected originally, can reflect ambient light, so that a pixel electrode with a larger area can be arranged, the aperture ratio is increased, and the display effect is improved. The orthographic projection of the second side edge 422 on the substrate 1 and the orthographic projection of the gate line 41 on the substrate 1 are distributed at intervals, so that the second side edge 422 is insulated from the gate line 41, and the phenomenon that the two adjacent gate lines 41 form a passage to influence the normal operation of the gate layer 4 due to the connection of the first reflection structure 42 and the gate line 41 in the use process of the TFT is avoided.
The first reflective structure 42 has a hollow 43 in the middle. And the orthographic projection of the hollow 43 on the substrate base plate 1 is located in the orthographic projection of the reflective electrode 20 on the substrate base plate 1, that is, the first reflective structure 42 covers the gap area between the reflective electrode 20 and the data line 23, and meanwhile, the reflective electrode 20 can also achieve the purpose of light reflection through the hollow design.
Exemplarily, as shown in fig. 5 and 7, the first reflective structure 42 is a rectangular frame-shaped structure, the rectangular frame-shaped structure is a frame body whose outer contour of the cross section and inner contour of the cross section are both rectangular, the middle portion of the first reflective structure 42 has a hollow 43, and the hollow is rectangular, the first reflective structure 42 covers the reflective electrode 20, and the reflective electrode 20 is a rectangular structure, the area of the hollow 43 is not greater than the area of the reflective electrode 20 to ensure that after the first reflective structure 42 covers the reflective electrode 20, there is no gap between the first reflective structure 42 and the orthographic projection of the reflective electrode 20 on the substrate 1. Meanwhile, the first reflection structure 42 is in a rectangular frame shape, so that the first reflection structure 42, the source electrode 21, the drain electrode 22 and the reflection electrode 20 can form a rectangular metal reflection layer, and thus, a whole rectangular pixel electrode can be conveniently formed on the gate layer 4, a pixel electrode layer can be conveniently and rapidly processed and manufactured on the gate layer 4, the effective area for setting the pixel electrode can be larger, and the aperture opening ratio is increased to improve the display effect.
As shown in fig. 5, 6 and 7, the display substrate further includes a pixel electrode layer 6 on the gate layer 4, and the pixel electrode layer 6 includes pixel electrodes corresponding to the plurality of pixel regions one to one. In each pixel region, the reflective electrode 20 is connected with the pixel electrode through a via hole 5, and the orthographic projection of the via hole 5 on the substrate base plate 1 is positioned in the orthographic projection of the hollow part 43 on the substrate base plate 1. Since signal transmission is required between the pixel electrode provided on the gate layer 4 and the drain electrode 22, the purpose of controlling the pixel electrode by the TFT is achieved. And a first reflective structure 42 is disposed between the source drain layer 2 and the pixel electrode. Therefore, in order to facilitate the electrical connection between the pixel electrode and the drain electrode 22 for signal transmission, a hollow 43 may be disposed on the first reflective structure 42, and the pixel electrode and the reflective electrode 20 are electrically connected through the via 5 in the hollow 43, and since the reflective electrode 20 is electrically connected to the drain electrode 22, the reflective electrode 20 and the pixel electrode are connected through the via 5, so that the drain electrode 22 can be electrically connected to the pixel electrode and transmit signals.
Since the orthographic projection of the first reflective structure 42 on the substrate 1 extends from the data line on one side of the pixel region to the data line on the other side of the pixel region, and the gate electrode 4 is usually disposed therein and connected to the active layer 2, the gate electrode is connected to the gate line 41, and since the first reflective structure 42 is insulated from the gate line 41. Therefore, the first reflective structure 42 does not completely cover the active layer 2. Therefore, the uncovered portion of the active layer 2 cannot reflect external ambient light, and the pixel electrode cannot be disposed in the uncovered region of the active layer 2, that is, the effective area of the pixel electrode is reduced, and the aperture ratio is reduced.
The aperture ratio is improved to increase the effective area of the pixel electrode. In the embodiment of the present invention, a partial region of the gate line 41 is a gate, and an orthogonal projection of the active layer 3 on the substrate 1 is located in an orthogonal projection of the corresponding gate line 41 on the substrate 1. By using a part of the area of the gate line 41 as a gate electrode and covering the active layer 3 on the area of the gate line 41 where the gate electrode is located, the active layer 2 is shielded by the gate line 41, so that a pixel electrode can be disposed at the position where the active layer 2 is disposed, the effective area of the pixel electrode is increased, and the aperture opening ratio is improved.
In the embodiment of the present invention, the orthographic projection of the first reflective structure 42 on the substrate 1 partially overlaps the orthographic projection of the reflective electrode 20 on the substrate 1. That is, a partial region of the first reflective structure 42 is opposite to the reflective electrode 20, and since the insulating layer is disposed between the first reflective structure 42 and the reflective electrode 20, when the first reflective structure 42 and the reflective electrode 20 are powered on, the first reflective structure 42 and the reflective electrode 20 may form a storage capacitor. The storage capacitor can weaken the voltage drop generated by drain leakage when the TFT works, so that the voltage applied to the pixel electrode can be kept at the required working voltage, and the working voltage of the TFT is stabilized.
Alternatively, as shown in fig. 5 and 7, a plurality of first reflective structures 42 arranged along the extending direction of the gate line 41 are connected to each other. In the embodiment of the present invention, the first reflective structures 42 in each pixel region in the extending direction of the gate line 41 may be sequentially connected through the connection portion 44, so that the first reflective structures 42 in the extending direction of the gate line 41 are electrically connected. That is, the first reflective structures 42 are connected to form a whole, so that the capacity of the storage capacitor formed by the first reflective structure 42 and the reflective electrode 20 is larger, and the voltage drop caused by drain leakage during the operation of the TFT can be weakened to a greater extent, so that the voltage applied to the pixel electrode can be more stably maintained at the required operating voltage, and the operating voltage of the TFT can be stabilized.
Fig. 8 is a schematic partial structure diagram of a source/drain layer of a display substrate according to an embodiment of the present invention, fig. 9 is a schematic partial enlarged structure diagram of the source/drain layer of the display substrate according to an embodiment of the present invention, and fig. 10 is a schematic cross-sectional structure diagram in the direction B-B of the display substrate according to fig. 9. As shown in fig. 8, 9 and 10, in each pixel region, the source drain layer 2 further includes a second reflective structure 24 insulated from the source electrode 21, the drain electrode 22 and the data line 23.
Referring to fig. 7, an orthogonal projection of the second reflective structure 24 on the substrate base plate 1 is at least partially located between the gate line 41 and an orthogonal projection of the second side 422 on the substrate base plate 1. In this embodiment, since the first reflective structure 42 and the gate line 41 are arranged at an insulating interval, the first reflective structure 42 cannot completely cover all regions between the source electrode 21 and the drain electrode 22 and between the gate line 41 and the data line 23, and in order to further increase the effective area on the display substrate where the pixel electrode can be disposed, by disposing the second reflective structure 24, the orthographic projection of the second reflective structure 24 on the substrate 1 is at least partially located between the orthographic projections of the gate line 41 and the second side 422 on the substrate 1, and the second reflective structure 24 is used to cover the gap between the gate line 41 and the second side 422. Namely, a metal reflective layer with a larger area can be further formed through the first reflective structure 42, the second reflective structure 24, the source electrode 21 and the drain electrode 22, so that ambient light can be reflected by a larger area position on the display substrate, the effective area for setting the pixel electrode is larger, the aperture opening ratio is increased, and the display effect is improved.
In one possible implementation manner, as shown in fig. 8 and 9, the second reflective structure 24 is a frame structure having an opening D, the frame structure surrounds the reflective electrode 20, and a partial region of the reflective electrode 20 is connected to the drain 22 through the opening D of the frame structure. The frame structure may be a circular frame, a square frame, or other frame with various shapes, the frame structure is arranged around the reflective electrode 20 and insulates the frame structure from the reflective electrode 20, and the side of the frame structure has an opening D, so that a partial region of the reflective electrode 20 passes through the frame structure through the opening D and is connected to the drain electrode 22, and the drain electrode 22 is electrically connected to the source electrode 21 through the active layer 3. A larger-area metal reflective layer is formed by the first reflective structure 42, the second reflective structure 24, the source electrode 21, the drain electrode 22 and the reflective electrode 20, so that ambient light can be reflected by a larger area on the display substrate, the effective area for setting the pixel electrode is larger, the aperture opening ratio is increased, and the display effect is improved.
Exemplarily, as shown in fig. 8 and 9, the second reflective structure 24 is a frame structure in a square frame shape, the frame structure is framed on the reflective electrode 20, and each side of the frame structure is parallel to and spaced apart from a side of the rectangular reflective electrode 20, in conjunction with fig. 8 and 9, the drain electrode 22 is connected to the reflective electrode 20 through a strip structure, the strip structure is located in the opening of the frame structure, and the drain electrode 22 is located outside the frame structure so as to be connected to the active layer 3. One part of the frame structure is located between the gate line 41 and the reflective electrode 20, and the other part of the frame structure is located between the data line 23 and the reflective electrode 20, so that a metal reflective layer with a larger area is formed by the first reflective structure 42, the second reflective structure 24, the source electrode 21, the drain electrode 22 and the reflective electrode 20, and the aperture ratio is increased.
In another possible implementation manner, the second reflective structure 24 is a reflective strip 25, the reflective strip 25 is disposed along the second side 422, and an orthogonal projection of the reflective strip 25 on the substrate base 1 is at least partially located between the gate line 41 and an orthogonal projection of the second side 422 on the substrate base 1. The reflective stripe 25 may have a stripe structure, which is disposed along the second side 422, and the reflective stripe 25 is located between the gate line 41 and the second side 422. Therefore, a metal reflective layer with a larger area can be formed through the first reflective structure 42, the reflective strip 25, the source electrode 21 and the drain electrode 22, so that ambient light can be reflected by a larger area on the display substrate, the effective area for setting the pixel electrode is larger, the aperture opening ratio is increased, and the display effect is improved.
Alternatively, the second reflective structure 24 may comprise at least two reflective strips 25, the reflective strips 25 being arranged along the same second side edge 422.
Illustratively, as shown in fig. 11, the second reflective structure 24 includes two reflective stripes 25, each of the two reflective stripes 25 extends along the extending direction of the gate line 41, i.e., along the first side 422, and a gap is formed between the two reflective stripes 25 so that the stripe structure connecting the drain electrode 22 and the reflective electrode 20 passes through the gap, so that the reflective electrode 20 and the drain electrode 22 are electrically connected. A larger-area metal reflective layer is formed by the first reflective structure 42, the two reflective strips 25, the source electrode 21, the drain electrode 22 and the reflective electrode 20, so that the larger area position on the display substrate can reflect ambient light, the effective area for setting the pixel electrode is larger, the aperture opening ratio is increased, and the display effect is improved.
Alternatively, the second reflective structure 24 may comprise at least three reflective strips 25, the reflective strips 25 being arranged along different two second side edges 422.
Illustratively, as shown in fig. 12, the second reflective structure 24 includes three reflective strips 25, each of the three reflective strips 25 extends along the extending direction of the gate line 41, one of the reflective strips 25 is disposed along one of the second side edges 422 of the first reflective structure 42, the other two reflective strips 25 are disposed along the other one of the second side edges 422 of the first reflective structure 42, and a gap is formed between the two reflective strips 25 so that the strip structure connecting the drain electrode 22 and the reflective electrode 20 passes through the gap, so that the reflective electrode 20 and the drain electrode 22 are electrically connected. A larger-area metal reflective layer is formed by the first reflective structure 42, the three reflective strips 25, the source electrode 21, the drain electrode 22 and the reflective electrode 20, so that ambient light can be reflected by a larger area on the display substrate, the effective area for setting the pixel electrode is larger, the aperture opening ratio is increased, and the display effect is improved.
Alternatively, as shown in fig. 5 and 7, the pixel electrode covers the corresponding pixel region, and the orthographic projection of the pixel electrode on the substrate 1 overlaps with the orthographic projection of the data line 23 and/or the gate line 41 on both sides of the corresponding pixel region on the substrate 1. Since the first reflective structure 42, the source electrode 21, the drain electrode 22, the reflective electrode 20, and the second reflective structure 24 in each pixel region can cover most of the pixel region, the pixel electrode provided corresponding to each pixel region can cover the entire pixel region. Meanwhile, in order to further increase the effective area of the pixel electrode and increase the aperture ratio to improve the display effect, the pixel electrode may also be covered on a partial region of the data line 23 and/or the gate line 41, that is, the orthographic projection of the pixel electrode on the substrate 1 may overlap the orthographic projection of the data line 23 on the substrate 1, or the orthographic projection of the pixel electrode on the substrate 1 may overlap the orthographic projection of the gate line 41 on the substrate 1, or the orthographic projection of the pixel electrode on the substrate 1 may overlap the orthographic projection of the data line 23 and the gate line 41 on the substrate 1, so as to achieve the purpose of increasing the effective area of the pixel electrode.
The embodiment provides a method for manufacturing a display substrate, which includes: the substrate, and be located the source drain layer on the substrate in proper order, active layer and grid layer, the source drain layer includes many parallel interval distribution's data line, the grid layer includes many parallel interval distribution's grid line, many data line and many crossing a plurality of pixel regions that form array distribution of grid line, in every pixel region, the grid layer still includes the first reflection configuration with grid line insulation, the orthographic projection of first reflection configuration on the substrate extends to in the orthographic projection of second data line on the substrate from the orthographic projection of first data line on the substrate.
Fig. 13 is a flowchart of a method for manufacturing a display substrate according to an embodiment of the invention. As shown in fig. 13, the method for manufacturing the display substrate includes:
step 101: and forming a source drain layer on the substrate.
As shown in fig. 9 and 10, step 101 may include preparing a source/drain layer on the substrate 1, and forming a pattern layer of the reflective electrode 20, the source 21, the drain 22, the gate line 23, and the second reflective structure 24.
The preparation of the source and drain electrode layer can form a metal layer on the substrate, and then the metal layer is subjected to patterning treatment, so that the metal layer forms patterns of a source electrode, a drain electrode and a second reflection structure. The patterning process generally includes the steps of film formation, exposure, development, etching, and the like.
The steps of forming a patterned film, exposing, developing, etching, and forming a film will be described by taking the formation of the source/drain layer as an example. When the film is formed, a layer of photoresist is coated on the metal layer of the substrate, after the photoresist is coated, the surface of the substrate is covered with mask plates, different mask plates correspond to different patterns, and the source drain electrode layer is formed in the embodiment, namely the selected mask plates are the patterns of the reflecting electrode, the source electrode, the drain electrode, the grid line and the second reflecting structure. After the mask is covered, selective irradiation is carried out through ultraviolet light, so that the photoresist of the illumination part is subjected to chemical reaction, and the solubility of the photoresist film in the developing solution is changed. After development, the photoresist film will display the pattern corresponding to the mask. The developing process is a process of dissolving and removing the irradiated portion of the photoresist film in a developing solution. Etching is to etch off the metal layer which is not protected by the photoresist by using a certain proportion of acid liquor, and to reserve the metal layer which is protected by the photoresist, finally forming patterns of the source electrode, the drain electrode and the second reflection structure, and forming a source drain electrode layer.
In the following steps, the process of preparing the active layer, the insulating layer and the gate layer is the same as the forming method of preparing the source drain layer, and is not described in detail.
Step 102: and forming an active layer on the source drain layer.
As shown in fig. 14 and 15, an active layer 3 is formed on the source/drain layer 2, and the active layer 3 connects the source electrode 21 and the drain electrode 22.
Step 103: and forming an insulating layer on the source drain layer and the active layer.
As shown in fig. 16 and 17, an insulating layer 7 is formed on the source drain layer 2 and the active layer 3, and the insulating layer 7 covers the source drain layer 2 and the active layer 3.
Step 104: a gate layer is formed on the insulating layer.
As shown in fig. 18 and 19, step 104 may include preparing the gate layer 4 on the insulating layer 7, and forming a layer of the gate line 41, the gate electrode and the first reflective structure 42 in the gate layer 4.
Wherein, first reflection configuration and second reflection configuration, source electrode, drain electrode and reflection electrode overlap each other, have increased the metal reflection stratum, make on the display substrate bigger area position can reflect ambient light to set up the bigger pixel electrode layer of effective area, thereby increase the aperture opening ratio, improve display effect.
Step 105: an insulating layer is formed on the gate layer, and a via is formed on the insulating layer.
As shown in fig. 20 and 21, an insulating layer 7 and a via 5 on the insulating layer 7 are formed on the gate layer 4.
Step 106: a pixel electrode layer is formed on the insulating layer.
As shown in fig. 6 and 7, a pixel electrode layer 6 is formed on the insulating layer 7. In this embodiment, make the pixel electrode layer that forms correspond in the pixel region shape for the rectangle through setting up first reflection configuration and second reflection configuration, form the monoblock pixel electrode that is the rectangle form, the processing preparation of the pixel electrode layer of being convenient for, and enable to set up the effective area of pixel electrode bigger, the increase aperture ratio is in order to improve display effect.
An embodiment of the invention provides a display device, which includes the display substrate as described above. The display device may be a product or a component having a reflective display function, such as electronic paper.
The present invention is not limited to the above preferred embodiments, and any modifications, equivalent replacements, improvements, etc. within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (10)

1. A display substrate, comprising: the liquid crystal display panel comprises a substrate (1), and a source drain layer (2), an active layer (3) and a grid layer (4) which are sequentially arranged on the substrate (1), wherein the source drain layer (2) comprises a plurality of data lines (23) which are distributed in parallel at intervals, the grid layer (4) comprises a plurality of grid lines (41) which are distributed in parallel at intervals, the plurality of data lines (23) and the plurality of grid lines (41) are intersected to form a plurality of pixel areas which are distributed in an array manner,
in each pixel region, the gate layer (4) further comprises a first reflection structure (42) insulated from the gate line (41), an orthographic projection of the first reflection structure (42) on the substrate base plate (1) extends from an orthographic projection of a first data line on the substrate base plate (1) to an orthographic projection of a second data line on the substrate base plate (1), and the first data line and the second data line are two data lines (23) on two sides of the pixel region.
2. The display substrate according to claim 1, wherein the first reflective structure (42) has two opposite first sides (421) and two second sides (422) connecting the two first sides (421), in each pixel region, an orthographic projection of the first sides (421) on the substrate (1) is located in an orthographic projection of the data lines (23) on the substrate (1), an orthographic projection of the second sides (422) on the substrate (1) and an orthographic projection of the gate lines (41) on the substrate (1) are distributed at intervals, a hollow (43) is arranged in a middle of the first reflective structure (42), the source and drain layers (2) include reflective electrodes (20) electrically connected with the drain electrodes (22), and an orthographic projection of the hollow (43) on the substrate (1) is located in an orthographic projection of the reflective electrodes (20) on the substrate (1) .
3. The display substrate according to claim 2, wherein an orthographic projection of the first reflective structure (42) on the substrate (1) partially overlaps with an orthographic projection of the reflective electrode (20) on the substrate (1).
4. A display substrate according to claim 3, wherein a plurality of the first reflective structures (42) arranged along the extending direction of the gate line (41) are connected to each other.
5. The display substrate according to claim 2, wherein in each pixel region, the source drain layer (2) further comprises a second reflective structure (24) insulated from the source electrode (21), the drain electrode (22) and the data line (23), and an orthographic projection of the second reflective structure (24) on the substrate (1) is at least partially located between the orthographic projections of the gate line (41) and the second side edge (422) on the substrate (1).
6. The display substrate according to claim 5, wherein the second reflective structure (24) is a frame structure having an opening, the frame structure surrounds the reflective electrode (20), and a partial region of the reflective electrode (20) is connected to the drain electrode (22) through the opening of the frame structure; alternatively, the first and second electrodes may be,
the second reflecting structure (24) is a reflecting strip (25), the reflecting strip (25) is arranged along the direction of the second side edge (422), and the orthographic projection of the reflecting strip (25) on the substrate base plate (1) is at least partially positioned between the grid line (41) and the orthographic projection of the second side edge (422) on the substrate base plate (1).
7. The display substrate according to claim 2, further comprising a pixel electrode layer (6) on the gate layer (4), wherein the pixel electrode layer (6) comprises pixel electrodes corresponding to a plurality of the pixel regions,
in each pixel region, the reflecting electrode (20) is connected with the pixel electrode through a through hole (5), and the orthographic projection of the through hole (5) on the substrate base plate (1) is positioned in the orthographic projection of the hollow part (43) on the substrate base plate (1).
8. The display substrate according to claim 7, wherein the pixel electrode covers the corresponding pixel region, and an orthographic projection of the pixel electrode on the substrate (1) overlaps with orthographic projections of the data line (23) and/or the gate line (41) on the substrate (1) on two sides of the corresponding pixel region.
9. The display substrate according to any one of claims 1 to 8, wherein the partial region of the gate line (41) is a gate electrode, and an orthogonal projection of the active layer (3) on the substrate (1) is located within an orthogonal projection of the corresponding gate line (41) on the substrate (1).
10. A display device comprising the display substrate according to any one of claims 1 to 9.
CN201910939975.3A 2019-09-30 2019-09-30 Display substrate and display device Active CN110596987B (en)

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