CN110596042A - Device and method for testing optical uniformity of biaxial crystal in main axis direction - Google Patents

Device and method for testing optical uniformity of biaxial crystal in main axis direction Download PDF

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Publication number
CN110596042A
CN110596042A CN201910987283.6A CN201910987283A CN110596042A CN 110596042 A CN110596042 A CN 110596042A CN 201910987283 A CN201910987283 A CN 201910987283A CN 110596042 A CN110596042 A CN 110596042A
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CN
China
Prior art keywords
crystal
optical
phase compensator
testing
light
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CN201910987283.6A
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Chinese (zh)
Inventor
吴文渊
何小玲
张昌龙
卢福华
王金亮
周海涛
李东平
覃世杰
左艳彬
宋旭东
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Guilin Bairay Photoelectric Technology Co Ltd
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Guilin Bairay Photoelectric Technology Co Ltd
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Priority to CN201910987283.6A priority Critical patent/CN110596042A/en
Publication of CN110596042A publication Critical patent/CN110596042A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/45Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods

Abstract

The invention discloses a device and a method for testing the optical uniformity of a biaxial crystal in the main axis direction. The testing device comprises a light source, a condensing lens, a collimating lens, a polarizer, a phase compensator, an analyzer, an imaging lens and a camera which are sequentially arranged along the direction of an optical axis, a crystal to be tested is arranged between the phase compensator and the analyzer, the phase compensator is composed of two optical wedges, the phase delay amount is adjusted by adjusting the relative positions of the two optical wedges, and the optical wedges are made of the same material as the crystal to be tested and have good optical uniformity. The device has the advantages of simple structure, low cost and convenient maintenance. Compared with the traditional test method, the method does not need to repeatedly test background interference and form an interference pattern by the laser in different polarization states through the crystal, is little influenced by the environment, has high test efficiency and is suitable for batch production detection; the method is simple to operate, has low processing requirement on the test crystal, and is easy to popularize and use.

Description

Device and method for testing optical uniformity of biaxial crystal in main axis direction
Technical Field
The invention relates to detection of optical uniformity of crystals, in particular to a device and a method for testing the optical uniformity of a biaxial crystal in a main shaft direction.
Background
The crystal material is widely used in modern laser systems for frequency conversion and phase modulation, and the quality of the crystal uniformity directly determines the performance of the laser system, so that the visible optical uniformity is an important index for evaluating the quality of the crystal. During the growth process of the crystal, the optical uniformity of the crystal with structural defects is reduced due to the inevitable influence of factors such as gravity, temperature, impurities and the like. Therefore, an essential step in the fabrication of optical devices using crystalline materials is to sort out regions of the optical uniformity of the test material that can be reasonably utilized for processing.
At present, the main method for testing the optical uniformity of the crystal is to obtain interference fringes of transmission crystal plane waves by using a large-scale laser interferometer, and calculate phases of different positions of the crystal by a wavefront reconstruction method so as to obtain the refractive index distribution (namely the optical uniformity) of the crystal. Although this method has high test accuracy, there are many inconveniences to adopt this test method in the production of crystal optical devices: firstly, the test method requires expensive equipment, which directly results in an increase in detection cost; secondly, extremely high requirements are provided for sample processing, environmental vibration and quality of operators, and detection conditions are harsh; moreover, the testing steps are complicated, and before the testing, the interference generated by the reflection of the front surface and the rear surface of the cavity and the crystal needs to be tested in sequence to eliminate background interference. In the actual production process, the testing efficiency and the accuracy are the same and important, and the optical uniformity of the crystal is often required to be rapidly and accurately judged and then follow-up procedures are arranged, so that a simple, convenient and practical device and method are required to improve the testing efficiency.
Disclosure of Invention
The invention aims to solve the technical problem of the prior art and provides a device and a method for testing the optical uniformity of a biaxial crystal in the main axis direction, which have the advantages of simple structure, low cost and easiness in operation.
In order to solve the technical problems, the invention adopts the following technical scheme:
the utility model provides a test device of biax crystal main shaft direction optical homogeneity, includes light source, collector lens, collimating lens, polarizer, phase compensator, analyzer, imaging lens and the camera that sets gradually along the optical axis direction, and the crystal that awaits measuring arranges in between phase compensator and the analyzer, phase compensator constitute by two light wedges, adjust the phase delay volume through the relative position who adjusts two light wedges, wherein the material of light wedge is the same and the good crystal of optical homogeneity of composition and crystal that awaits measuring.
In the above testing apparatus, the light source is a white point light source, preferably an LED lamp or an optical fiber halogen lamp, and more preferably an LED lamp or an optical fiber halogen lamp with a color temperature range of 3000-6000 k. The diameter of the light source is preferably controlled to be 5-10 mm.
In the testing device, the condensing lens and the collimating lens are used for expanding and collimating the point light source to form a uniform parallel light field as the detection light, and the condensing lens and the collimating lens are achromatic cemented lenses. The polarizer is used for converting incoherent probe light into linearly polarized light. The analyzer is used for enabling the two linearly polarized light beams passing through the crystal to be detected to generate interference in the polarization analyzing direction to form a color interference color. The imaging lens preferably adopts an object space telecentric lens, and has the advantages that only the principal ray parallel to the optical axis is received during imaging, so that the influence of stray light in other directions on interference is shielded, and simultaneously the object space telecentric lens can obtain the undistorted outline of the crystal to be detected, so that the optical uniformity of different areas of the crystal to be detected can be accurately judged. The camera is preferably a color CCD camera or a color CMOS camera and is used for receiving images formed by the imaging lens.
The crystal to be detected needs to be subjected to conventional detection polishing treatment, the light-passing surface parallelism of the crystal to be detected is generally required to be controlled to be more than or equal to 20 arcseconds, the flatness is more than or equal to lambda/4, and the length of the crystal to be detected is within the compensation range of the phase compensator.
In order to work in a wide spectral range, all optical components involved in the above-described apparatus are not coated.
The invention also provides a method for testing the optical uniformity of the crystal by adopting the testing device for the optical uniformity of the biaxial crystal in the main axis direction, which comprises the following steps:
a. focusing, expanding beam, collimating and polarizing the selected light source to obtain linearly polarized light emitted in parallel as detection light;
b. adjusting the angle of the crystal to be detected to enable the detection light to be normally incident to the light-transmitting surface of the crystal to be detected, and setting the included angle between the polarization direction of the detection light and the fast axis of the crystal to be detected and the included angle between the polarization direction of the detection light and the slow axis of the crystal to be detected to be 45 degrees;
c. adjusting a phase compensator to offset the phase difference generated by the two linearly polarized light beams passing through the crystal to be measured;
d. setting a polarization analyzer to be vertical to the polarization state of the polarizer, and forming polarization interference by two beams of linearly polarized light along the direction of the polarization analyzer;
e. and shooting a polarization interference image through an imaging lens and a camera, and judging the optical uniformity of the crystal to be detected in the main shaft direction according to the interference color.
The selection and function of the light source, imaging lens, camera, etc. involved in the above method are the same as those described above.
In the above method, a precise micrometer is usually used to adjust the relative position of two optical wedges constituting the phase compensator to adjust the phase retardation.
Compared with the prior art, the invention is characterized in that:
1. the device has the advantages of simple structure, low cost and convenient maintenance.
2. Compared with the traditional test method, the method provided by the invention has the advantages that the repeated test of background interference and the formation of an interference pattern by the laser in different polarization states through the crystal are not needed, the influence of the environment is small, the test efficiency is high, and the method is suitable for batch production detection.
3. The method disclosed by the invention is simple to operate, has low processing requirement on the test crystal, is easy to train operators, and is suitable for popularization and application.
Drawings
FIG. 1 is a schematic structural diagram of an embodiment of a device for testing optical uniformity of a biaxial crystal in a major axis direction according to the present invention.
The reference numbers in the figures are:
1. the device comprises a light source, 2, a condenser lens, 3, a collimating lens, 4, a polarizer, 5, a phase compensator, 6, a crystal to be detected, 7, an analyzer, 8, an imaging lens, 9 and a camera.
Detailed Description
The test device for the optical uniformity of the biaxial crystal in the main shaft direction is used for testing based on the following principle:
parallel light emitted by the white point light source after being focused and collimated is changed into linearly polarized light through the polarizer. When the included angle between the polarization direction of the incident light and the fast axis of the crystal to be measured and the included angle between the polarization direction of the incident light and the slow axis of the crystal to be measured are both 45 degrees, the incident light is decomposed into two linearly polarized lights with the same intensity and different vertical propagation speeds in the same vibration direction in the crystal due to the double refraction effect, and the two linearly polarized lights generate a certain phase difference delta after passing through the crystal to be measured1. The phase compensator acts to produce an inverse phase difference delta2=-δ1The total phase difference (delta-delta) generated by two polarized lights passing through the phase compensator and the crystal to be measured12) Is zero. The polarization direction of the analyzer is perpendicular to the polarizer and is determined by the formula of polarization interferenceWhen the optical path difference generated by the two beams of monochromatic polarized light is half wavelength, the light intensity of emergent light which is even-numbered times is zero. The white light consists of seven kinds of monochromatic light with different wavelengths, and except that the optical path difference is zero, any one optical path difference cannot be equal to even times of half wavelength of each monochromatic light simultaneously, and the seven kinds of monochromatic light cannot be counteracted simultaneously to extinction. When the refractive index of the crystal to be tested is not uniform, the optical path difference generated in each area has slight deviation and is reflected that different colors appear in the transmitted light, the interference colors of the light gradually change from black to gray black along with the gradual increase of the optical path difference from zero, and the change sequence of the various interference colors sequentially appears, so that the optical uniformity of different areas of the crystal to be tested can be represented according to the color difference, and the method for testing the optical uniformity of the crystal provided by the invention is formed.
The invention is described in further detail below with reference to the figures and specific embodiments.
Example 1: the invention relates to a device for testing the optical uniformity of a biaxial crystal in the main axis direction
As shown in figure 1, the device for testing the optical uniformity of the biaxial crystal in the main axis direction comprises a light source 1, a condenser lens 2, a collimating lens 3, a polarizer 4, a phase compensator 5, an analyzer 7, an imaging lens 8 and a camera 9 which are sequentially arranged along the optical axis direction, wherein a crystal 6 to be tested is arranged between the phase compensator 5 and the analyzer 7, the phase compensator 5 is composed of two optical wedges, the phase delay amount is adjusted by adjusting the relative positions of the two optical wedges, and the optical wedges are made of crystals with the same components as the crystal to be tested and good optical uniformity.
In the present embodiment, the light source 1 is a white point light source, more specifically, a color temperature 3000k-6000k LED lamp or a fiber halogen lamp, and the diameter of the light source is controlled within the range of 5-10mm to improve the parallelism of the probe light.
The condensing lens 2 and the collimating lens 3 are mainly used for expanding and collimating light emitted by the light source 1 to obtain homogenized parallel light beams, so that the detection capability of the crystals to be detected with different apertures to be detected is enhanced, and the detection light interference imaging contrast is improved.
The polarizer 4 converts the parallel light emitted from the collimator lens 3 into completely linearly polarized light so as to satisfy the condition of polarization interference.
The phase compensator 5 is composed of two crystal optical wedges with the same components as the crystal 6 to be measured and good optical uniformity, three main shafts of the two optical wedges are completely overlapped structurally, and a precise micrometer is adopted to push the relative positions of the two optical wedges forming the phase compensator 5 so as to adjust the phase delay. The phase compensator 5 is used for generating a reverse phase difference to offset the phase difference generated by the crystal to be measured due to birefringence.
The light passing direction of the crystal 6 to be detected is parallel to the detection light, the included angle between the polarization direction of the polarizer 4 and the fast axis of the crystal 6 to be detected is 45 degrees, and the included angle between the polarization direction of the polarizer 4 and the slow axis of the crystal 6 to be detected is 45 degrees. In this embodiment, the light passing direction of the crystal 6 to be measured is the x-axis direction of the crystal, the fast axis is the y-axis of the crystal, and the slow axis is the z-axis of the crystal.
It should be noted that the light passing directions of the crystal 6 to be measured and the phase compensator 5 are along the same main axis direction, and it should be ensured that the fast axis of the crystal 6 to be measured coincides with the slow axis of the phase compensator 5, and the slow axis of the crystal 6 to be measured coincides with the fast axis of the phase compensator 5. In this embodiment, the directions of the main light transmission axes of the crystal 6 to be measured and the phase compensator 5 are both x-axes, the slow axis z-axis of the crystal 6 to be measured coincides with the fast axis y-axis of the phase compensator 5, and the fast axis y-axis of the crystal 6 to be measured coincides with the slow axis z-axis of the phase compensator 5.
The analyzer 7 is used for enabling the two linearly polarized light beams passing through the crystal 6 to be measured to generate interference in the analyzing direction to form a color interference color. It should be noted here that the polarizer 4 and the analyzer 7 should be in the extinction position, i.e. the polarization states of the two are perpendicular to each other.
The imaging lens 8 is used for imaging the parallel light passing through the crystal to be measured and filtering stray light in other directions. The imaging lens 8 adopts an object space telecentric lens, which has the advantages that only the chief ray parallel to the optical axis is received during imaging, the influence of stray light in other directions on interference is shielded, and simultaneously the object space telecentric lens can obtain the undistorted outline of the crystal 6 to be detected, so that the optical uniformity of different areas of the crystal 6 to be detected can be accurately judged.
The camera 9 is a color CMOS camera or a color CCD camera, and is used to capture an image formed by the imaging lens 8.
Example 2: method for testing optical uniformity of crystal by using embodiment shown in figure 1
1) Adjusting the relative positions of the light source 1, the condensing lens 2 and the collimating lens 3 to enable the expanded detection light to be emitted in parallel along the horizontal direction;
2) adjusting the positions and angles of the polarizer 4, the analyzer 7, the imaging lens 8 and the camera 9 to enable the incident parallel light to be normally incident to the center of the optical element; setting the reference polarization direction of the polarizer 4 to be a horizontal direction or a vertical direction, wherein the polarization directions of the analyzer 4 and the polarizer 7 are mutually vertical, and the picture shot by the camera 9 is a uniform black background;
3) inserting a crystal 6 to be tested, ensuring that the detection light can completely cover the light transmission aperture of the crystal, wherein the light transmission direction is the main axis direction of the crystal to be tested, adjusting the polarization state of the polarizer 4 to ensure that the included angle between the polarization direction of the detection light and the fast axis of the crystal 6 to be tested is 45 degrees, and simultaneously, the included angle between the polarization direction of the polarizer 4 and the slow axis of the crystal 6 to be tested is also 45 degrees;
4) inserting a phase compensator 5, and rotating the phase compensator 5 along an optical axis by an angle to enable a fast axis of the phase compensator 5 to coincide with a slow axis of the crystal 6 to be detected and a slow axis of the phase compensator 5 to coincide with the fast axis of the crystal 6 to be detected;
5) and (3) pushing the relative positions of two optical wedges forming the phase compensator 5 by using a precise micrometer until the color in the crystal outline in the picture obtained by the crystal 6 to be measured and shot by the camera 9 is a gray black area from full white, and judging the optical uniformity of the crystal in the main shaft direction according to the comparison of the color of the picture of the crystal 6 to be measured and shot by the camera 9 and an interference color sequence table.
The above-mentioned embodiments are only specific examples for further explaining the objects, technical solutions and advantageous effects of the present invention in detail, and the present invention is not limited thereto. Any modification, equivalent replacement, improvement and the like made within the scope of the disclosure of the present invention are included in the protection scope of the present invention.

Claims (10)

1. The utility model provides a test device of biax crystal main axis direction optical homogeneity which characterized in that: including light source (1), condensing lens (2), collimating lens (3), polarizer (4), phase compensator (5), analyzer (7), imaging lens (8) and camera (9) that set gradually along the optical axis direction, phase compensator (5) and analyzer (7) are arranged in to the crystal (6) that awaits measuring between phase compensator (5) and analyzer (7), phase compensator (5) constitute by two optical wedges, adjust the phase delay volume through the relative position who adjusts two optical wedges, wherein the material of optical wedge is the composition and awaits measuring the crystal that crystal (6) are the same and optical homogeneity is good crystal.
2. The apparatus for testing the optical uniformity in the principal axis direction of a biaxial crystal as set forth in claim 1, wherein: the light source (1) is a white point light source.
3. The apparatus for testing the optical uniformity in the principal axis direction of a biaxial crystal as defined in claim 2, wherein: the light source (1) is an LED lamp or an optical fiber halogen lamp.
4. The apparatus for testing the optical uniformity in the principal axis direction of a biaxial crystal as set forth in claim 1, wherein: the imaging lens (8) adopts an object space telecentric lens.
5. The apparatus for testing the optical uniformity in the principal axis direction of a biaxial crystal as set forth in claim 1, wherein: the camera (9) is a color CCD camera or a color CMOS camera.
6. The method for testing the optical uniformity of the crystal by using the test device for the optical uniformity of the main axis directions of the biaxial crystal, which is disclosed by claim 1, comprises the following steps:
a. focusing, expanding, collimating and polarizing the selected light source (1) to obtain linearly polarized light emitted in parallel as detection light;
b. adjusting the angle of the crystal (6) to be detected to enable the detection light to be normally incident to the light passing surface of the crystal (6) to be detected, and setting the included angle between the polarization direction of the detection light and the fast axis of the crystal (6) to be detected and the included angle between the polarization direction of the detection light and the slow axis of the crystal (6) to be detected to be 45 degrees;
c. the phase compensator (5) is adjusted to counteract the phase difference generated by the two linearly polarized light beams passing through the crystal (6) to be measured;
d. arranging an analyzer (7) to be vertical to the polarization state of the polarizer (4), and forming polarization interference by two beams of linearly polarized light along the direction of the analyzer (7);
e. the polarization interference image is shot through an imaging lens (8) and a camera (9), and the optical uniformity of the main shaft direction of the crystal 6 to be detected is judged according to the interference color.
7. The method of claim 6, wherein: the light source (1) is a white point light source.
8. The method of claim 6, wherein: the phase delay is adjusted by adjusting the relative position of two optical wedges forming the phase compensator (5) by a precise micrometer.
9. The method of claim 6, wherein: the imaging lens (8) adopts an object space telecentric lens.
10. The method of claim 6, wherein: the camera (9) is a color CCD camera or a color CMOS camera.
CN201910987283.6A 2019-10-17 2019-10-17 Device and method for testing optical uniformity of biaxial crystal in main axis direction Pending CN110596042A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115561884A (en) * 2022-10-28 2023-01-03 中国科学院长春光学精密机械与物理研究所 Stray light eliminating coaxial illumination telecentric optical imaging system

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101183043A (en) * 2007-12-07 2008-05-21 大恒新纪元科技股份有限公司北京光电技术研究所 Optical phase put-off precision measurement method and system thereof
CN102096187A (en) * 2010-12-23 2011-06-15 福建福晶科技股份有限公司 Broadband achromatic Solier-Babinet compensator
CN103543129A (en) * 2013-09-23 2014-01-29 中国建筑材料科学研究总院 Device and method for measuring optical uniformity of optical glass
CN107228828A (en) * 2017-07-14 2017-10-03 济南快谱光电技术有限公司 The method of testing and its detection means of crystal optics uniformity
CN211086081U (en) * 2019-10-17 2020-07-24 桂林百锐光电技术有限公司 Testing arrangement of biax crystal main axis direction optical homogeneity

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101183043A (en) * 2007-12-07 2008-05-21 大恒新纪元科技股份有限公司北京光电技术研究所 Optical phase put-off precision measurement method and system thereof
CN102096187A (en) * 2010-12-23 2011-06-15 福建福晶科技股份有限公司 Broadband achromatic Solier-Babinet compensator
CN103543129A (en) * 2013-09-23 2014-01-29 中国建筑材料科学研究总院 Device and method for measuring optical uniformity of optical glass
CN107228828A (en) * 2017-07-14 2017-10-03 济南快谱光电技术有限公司 The method of testing and its detection means of crystal optics uniformity
CN211086081U (en) * 2019-10-17 2020-07-24 桂林百锐光电技术有限公司 Testing arrangement of biax crystal main axis direction optical homogeneity

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
邓林涓: "白光干涉术的测量系统与处理算法的研究", 中国优秀硕士学位论文全文数据库 工程科技II辑, 15 June 2016 (2016-06-15), pages 1 - 59 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115561884A (en) * 2022-10-28 2023-01-03 中国科学院长春光学精密机械与物理研究所 Stray light eliminating coaxial illumination telecentric optical imaging system
CN115561884B (en) * 2022-10-28 2024-01-26 中国科学院长春光学精密机械与物理研究所 Stray light eliminating coaxial illumination telecentric optical imaging system

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