CN110546599B

CN110546599B - Touch sensor substrate and method for manufacturing same, touch sensor member and method for manufacturing same, and display device

Info

Publication number: CN110546599B
Application number: CN201880026353.5A
Authority: CN
Inventors: 桥本弘昌
Original assignee: Zeon Corp
Current assignee: Zeon Corp
Priority date: 2017-05-31
Filing date: 2018-05-14
Publication date: 2023-05-09
Anticipated expiration: 2038-05-14
Also published as: JP7120225B2; KR102567855B1; KR20200015494A; TWI749230B; CN110546599A; JPWO2018221189A1; TW201902703A; WO2018221189A1

Abstract

A touch sensor substrate, which is a long touch sensor substrate; the touch sensor substrate includes, in order, a first skin layer formed of a thermoplastic resin S1, a core layer formed of a thermoplastic resin C, and a second skin layer formed of a thermoplastic resin S2; the glass transition temperature Tg (S1) of the thermoplastic resin S1 is 150 ℃ or higher; the glass transition temperature Tg (S2) of the thermoplastic resin S2 is 150 ℃ or higher; the glass transition temperature Tg (C) of the thermoplastic resin C satisfies the following formulas (1) and (2): tg (s 1) -Tg (c) > 15 ℃ (1), tg (s 2) -Tg (c) > 15 ℃ (2); the average transmittance in the width direction at a wavelength of 380nm is 0.1% or less.

Description

Touch sensor substrate and method for manufacturing same, touch sensor member and method for manufacturing same, and display device

Technical Field

The invention relates to a touch sensor substrate and a manufacturing method thereof, a touch sensor component and a manufacturing method thereof, and a display device.

Background

A display device having a touch panel as an input device is widely used in a mobile terminal such as a mobile phone, a tablet personal computer, and the like. Touch panels generally include a touch sensor member having a conductive layer that can function as an electrode or a wiring. As the touch sensor member, a touch sensor member including a touch sensor substrate and conductive layers formed on both surfaces of the touch sensor substrate is known (patent documents 1 to 3).

Further, a technique as disclosed in patent document 4 is known.

Prior art literature

Patent literature

Patent document 1: japanese patent application laid-open No. 2016-224735;

patent document 2: japanese patent application laid-open No. 2016-130922;

patent document 3: U.S. patent No. 8026903;

patent document 4: japanese patent application laid-open No. 2015-31753.

Disclosure of Invention

Problems to be solved by the invention

The conductive layer of the touch sensor assembly is sometimes formed by photolithography. In the case where the conductive layers are to be formed on both sides of the touch sensor substrate by photolithography, it is preferable to expose the resist layers on both sides of the touch sensor substrate simultaneously from the viewpoint of improving the manufacturing efficiency. However, when the resist layers on both sides of the touch sensor substrate are simultaneously exposed through the pattern mask, when the light used for exposure transmits the touch sensor substrate, it is difficult to obtain a resist pattern having a desired pattern shape due to the influence of the light transmitted through the touch sensor substrate. Therefore, in order to expose the resist layers on both sides of the touch sensor substrate at the same time, it is desirable to employ a touch sensor substrate having the ability to shield light used for exposure.

In photolithography, exposure is often performed using Ultraviolet (UV) light. Then, the present inventors studied to use a resin film having an ability to shield ultraviolet rays as described in patent document 4 as a touch sensor substrate.

The resin film having the ability to shield ultraviolet rays can be produced, for example, by: a resin is obtained by kneading a polymer and a UV-blocking agent such as an ultraviolet absorber in a high-temperature environment in which both the polymer and the UV-blocking agent can be melted, and the resin is molded into a film shape. However, fish eyes (fisheye) are easily generated in such a resin film due to shearing heat generated during kneading.

Here, the fish eyes refer to protrusions formed on the surface of the resin film due to foreign matter generated in the resin film. For example, the resin film may be agglomerated with an additive such as a UV inhibitor or a gelled resin to generate a foreign substance, and the foreign substance may push up the resin to form a protrusion or the like. Fish eyes typically produce scattering and refraction of light. Accordingly, the fish eye can be detected by projecting light from a light source device such as a fluorescent lamp, LED illumination, or laser light source to the resin film and using an inspection device for detecting the reflected light or transmitted light.

Fish eyes may be a cause of impairing the optical characteristics of a display device provided with a touch panel. Further, fish eyes may cause a decrease in the accuracy of patterning the conductive layer of the touch sensor substrate. Therefore, a touch sensor substrate formed as a resin film is required to be capable of suppressing formation of fish eyes.

The present invention has been made in view of the above-described problems, and an object thereof is to provide a touch sensor substrate having ultraviolet-shielding ability and suppressing formation of fish eyes, a method for manufacturing the touch sensor substrate, a touch sensor member including the touch sensor substrate, a method for manufacturing the touch sensor member, and a display device using the touch sensor member.

Solution for solving the problem

The present inventors have conducted intensive studies to solve the above problems, and as a result, have found that the above problems can be solved by adjusting the glass transition temperature of the resin contained in each layer in a thermoplastic resin film comprising a first skin layer, a core layer and a second skin layer in this order, and have completed the present invention.

Namely, the present invention includes the following.

[1] A touch sensor substrate is a long touch sensor substrate,

the touch sensor substrate comprises, in order, a first skin layer formed of a thermoplastic resin S1, a core layer formed of a thermoplastic resin C, and a second skin layer formed of a thermoplastic resin S2,

the glass transition temperature Tg (S1) of the thermoplastic resin S1 is 150 ℃ or higher,

the glass transition temperature Tg (S2) of the thermoplastic resin S2 is 150 ℃ or higher,

The glass transition temperature Tg (C) of the thermoplastic resin C satisfies the following formulas (1) and (2),

Tg(s1)-Tg(c)＞15℃ (1)

Tg(s2)-Tg(c)＞15℃ (2)

the average transmittance in the width direction at a wavelength of 380nm is 0.1% or less.

[2] The touch sensor substrate according to [1], wherein the standard deviation of transmittance of 380nm wavelength in the width direction of the touch sensor substrate is 0.02% or less.

[3] The touch sensor substrate according to [1] or [2], wherein the glass transition temperature Tg (C) of the thermoplastic resin C, the glass transition temperature Tg (S1) of the thermoplastic resin S1, and the glass transition temperature Tg (S2) of the thermoplastic resin S2 satisfy the following formulas (3) and (4),

Tg(s1)-Tg(c)＞30℃ (3)

Tg(s2)-Tg(c)＞30℃ (4)。

[4] the touch sensor substrate according to any one of [1] to [3],

the ultimate stress change rate of the touch sensor substrate based on the test under at least one of the following conditions (A) and (B) is 20% or less,

the heat shrinkage rate in the longitudinal direction and the heat shrinkage rate in the width direction of the touch sensor substrate after the test under the following condition (C) are both within ±0.1%.

(A) Conditions are as follows: the touch sensor substrate was immersed in a 10% strength aqueous hydrochloric acid solution at 25 ℃ ±2 ℃ for 1 hour.

(B) Conditions are as follows: the touch sensor substrate was immersed in a 5% strength aqueous sodium hydroxide solution at 25 ℃ ± 2 ℃ for 1 hour.

(C) Conditions are as follows: the touch sensor substrate was allowed to stand in an environment at 145 ℃ for 60 minutes.

[5] The touch sensor substrate according to any one of [1] to [4], wherein the thickness of the touch sensor substrate is 20 μm or more and 60 μm or less.

[6] The touch sensor substrate according to any one of [1] to [5], which has an in-plane retardation of 85nm or more and 150nm or less at a wavelength of 550 nm.

[7] The touch sensor substrate according to any one of [1] to [6], which is an obliquely stretched film.

[8] The touch sensor substrate according to any one of [1] to [5], wherein the touch sensor substrate has an in-plane retardation of 0nm or more and 10nm or less at a wavelength of 550 nm.

[9] The touch sensor substrate according to any one of [1] to [8], wherein a ratio of a thickness of the core layer to a total thickness of the first skin layer and the second skin layer is 1.0 or less.

[10] The touch sensor substrate according to any one of [1] to [9], wherein the thermoplastic resin S1 forming the first skin layer, the thermoplastic resin S2 forming the second skin layer, and the thermoplastic resin C forming the core layer contain norbornene-based polymers.

[11] The touch sensor substrate according to any one of [1] to [10], wherein the thermoplastic resin C contains a laser absorber.

[12] The touch sensor substrate according to [11], wherein the laser light absorber is a compound capable of absorbing laser light having a wavelength in the range of 9 μm to 11 μm.

[13] A method for manufacturing a touch sensor substrate according to any one of [1] to [12],

the method for producing the thermoplastic resin comprises a step of extruding the thermoplastic resin S1, the thermoplastic resin C and the thermoplastic resin S2 from a die,

the temperature of the mold is 150 ℃ or higher than the glass transition temperature Tg (C) of the thermoplastic resin C, 100 ℃ or higher than the glass transition temperature Tg (S1) of the thermoplastic resin S1 and 100 ℃ or higher than the glass transition temperature Tg (S2) of the thermoplastic resin S2.

[14] A touch sensor component comprising, in order: a first conductive layer; a substrate selected from the group consisting of the touch sensor substrate of any one of [1] to [12], and a substrate sheet cut out from the touch sensor substrate; and a second conductive layer.

[15] The touch sensor member according to [14], comprising a first photosensitive resin layer between the base material and the first conductive layer, and a second photosensitive resin layer between the base material and the second conductive layer.

[16] A method of manufacturing a touch sensor component, comprising:

a step of forming a first conductive layer on one surface of a substrate selected from the group consisting of the touch sensor substrate according to any one of [1] to [12], and a substrate sheet cut out from the touch sensor substrate;

forming a second conductive layer on the other surface of the base material;

forming a first resist layer covering the first conductive layer on the first conductive layer;

forming a second resist layer covering the second conductive layer on the second conductive layer;

exposing the first resist layer and the second resist layer simultaneously with ultraviolet rays through a mask pattern;

developing the exposed first resist layer to form a resist pattern for the first conductive layer;

developing the second resist layer after exposure to form a resist pattern for a second conductive layer;

etching a portion of the first conductive layer not covered with the first resist layer;

etching a portion of the second conductive layer not covered with the second resist layer;

a step of removing the first resist layer covering the first conductive layer;

And removing the second resist layer covering the second conductive layer.

[17] A display device comprising the touch sensor member of [14] or [15 ].

Effects of the invention

The present invention can provide a touch sensor substrate having an ability to shield ultraviolet light and suppress formation of fish eyes, a method for manufacturing the touch sensor substrate, a touch sensor member including the touch sensor substrate, a method for manufacturing the touch sensor member, and a display device obtained by using the touch sensor member.

Drawings

Fig. 1 is a cross-sectional view schematically showing a touch sensor substrate as a first embodiment of the present invention.

Fig. 2 is a cross-sectional view schematically showing a touch sensor member as a second embodiment of the present invention.

Fig. 3 is a cross-sectional view schematically showing a method of manufacturing a touch sensor member according to a second embodiment of the present invention.

Fig. 4 is a cross-sectional view schematically showing a method of manufacturing a touch sensor member according to a second embodiment of the present invention.

Fig. 5 is a cross-sectional view schematically showing a method of manufacturing a touch sensor member according to a second embodiment of the present invention.

Fig. 6 is a cross-sectional view schematically showing a method of manufacturing a touch sensor member according to a second embodiment of the present invention.

Fig. 7 is a cross-sectional view schematically showing a method of manufacturing a touch sensor member according to a second embodiment of the present invention.

Fig. 8 is a perspective view schematically showing jigs (Jig) used in the examples and comparative examples.

Detailed Description

The present invention will be described in detail below with reference to embodiments and examples. However, the present invention is not limited to the embodiments and examples described below, and can be arbitrarily modified and implemented within the scope of the claims and their equivalents.

In the following description, unless otherwise indicated, "ultraviolet rays" means light having a wavelength of 10nm to 400 nm.

In the following description, the "long shape" refers to a shape having a length of 5 times or more, preferably 10 times or more, with respect to the width, and specifically refers to a shape of a film having a length of a degree that can be stored or transported in a roll form. The upper limit of the length of the long strip is not particularly limited, and may be, for example, 10 ten thousand times or less the width.

The long film is generally parallel to the film transport direction on the production line, and the film width direction is generally perpendicular to the film transport direction.

In the following description, unless otherwise specified, the in-plane retardation Re of the film is a value represented by re= (nx-ny) ×d. Further, as long as not described otherwise, the retardation Rth in the thickness direction of the film is a value represented by rth= { (nx+ny)/2-nz } ×d. Here, nx represents a refractive index in a direction giving the maximum refractive index among directions (in-plane directions) perpendicular to the thickness direction of the film. ny represents a refractive index in a direction orthogonal to the nx direction among the in-plane directions of the film. nz represents the refractive index in the thickness direction of the film. d represents the thickness of the film. The measurement wavelength was 550nm unless otherwise specified.

In the following description, unless otherwise specified, the oblique direction of the long film means a direction which is neither parallel nor perpendicular to the width direction of the film among the in-plane directions of the film.

In the following description, unless otherwise specified, the front direction of a certain surface means the normal direction of the surface, specifically, the direction of the polar angle 0 ° and azimuth angle 0 ° of the surface.

In the following description, unless otherwise specified, the inclination direction of a certain surface means a direction which is neither parallel nor perpendicular to the surface, specifically, a direction in which the polar angle of the surface is in a range of more than 0 ° and less than 90 °.

In the following description, the slow axis of a film means the slow axis in the plane of the film unless otherwise specified.

In the following description, unless otherwise specified, the angle formed by the optical axis (absorption axis, transmission axis, slow axis, etc.) of each film in the member having a plurality of films means the angle when the films are viewed from the thickness direction.

In the following description, unless otherwise specified, the "polarizing plate" and the "wave plate" include not only rigid members but also members having flexibility such as a resin film.

[1. Outline of touch sensor substrate ]

Fig. 1 is a cross-sectional view schematically showing a touch sensor substrate 100 as a first embodiment of the present invention.

As shown in fig. 1, the touch sensor substrate 100 is an elongated member, and includes, in order in the thickness direction of the touch sensor substrate 100: a first skin layer 110, a core layer 120, and a second skin layer 130. Typically, the first skin layer 110 is in direct contact with the core layer 120 without other layers therebetween, and the core layer 120 is in direct contact with the second skin layer 130 without other layers therebetween.

The first skin layer 110 is formed of a thermoplastic resin S1. The core layer 120 is formed of a thermoplastic resin C. Further, the second skin layer 130 is formed of a thermoplastic resin S2. The glass transition temperatures Tg (S1), tg (C), and Tg (S2) of the thermoplastic resins S1, C, and S2 satisfy a predetermined relationship. Thereby, formation of fish eyes is suppressed in the touch sensor substrate 100.

Further, the average transmittance of the touch sensor substrate 100 in the width direction at the wavelength of 380nm is equal to or less than a predetermined value. The average transmittance of 380nm included in the ultraviolet ray region is low as described above, indicating that the touch sensor substrate 100 has the ability to shield ultraviolet rays.

Thus, by the touch sensor substrate 100, an excellent touch sensor substrate having the ability to shield ultraviolet rays and suppressing formation of fish eyes can be realized.

[2. Nuclear layer ]

The core layer is formed of thermoplastic resin C. The relationship between the glass transition temperature Tg (C) of the thermoplastic resin C and the glass transition temperature Tg (S1) of the thermoplastic resin S1 and the glass transition temperature Tg (S2) of the thermoplastic resin S2 is generally satisfied by the following formulas (1) and (2).

Tg(s1)-Tg(c)＞15℃ (1)

Tg(s2)-Tg(c)＞15℃ (2)

Preferably, the relationship between the glass transition temperature Tg (c) and the glass transition temperatures Tg (s 1) and Tg (s 2) satisfies the following formulas (3) and (4).

Tg(s1)-Tg(c)＞30℃ (3)

Tg(s2)-Tg(c)＞30℃ (4)

In more detail, the difference in glass transition temperatures, "Tg (s 1) -Tg (c)", is generally greater than 15 ℃, preferably greater than 30 ℃, more preferably greater than 35 ℃. Furthermore, the difference in glass transition temperatures, "Tg (s 2) -Tg (c)", is generally greater than 15 ℃, preferably greater than 30 ℃, more preferably greater than 35 ℃. The difference "Tg (s 1) -Tg (c)" and the difference "Tg (s 2) -Tg (c)" of the glass transition temperature are in the above ranges, whereby formation of fish eyes can be suppressed.

The upper limits of the difference "Tg (s 1) -Tg (c)" and the difference "Tg (s 2) -Tg (c)" of the glass transition temperatures are each preferably 70℃or less, more preferably 60℃or less, particularly preferably 50℃or less. By setting the upper limit as described above, variations in mechanical characteristics and optical characteristics in a high-temperature environment can be suppressed, and a touch sensor substrate excellent in heat resistance can be obtained.

The glass transition temperature Tg (C) of the thermoplastic resin C is preferably 100 ℃ or higher, more preferably 110 ℃ or higher, particularly preferably 120 ℃ or higher, preferably 190 ℃ or lower, more preferably 180 ℃ or lower, particularly preferably 170 ℃ or lower. When the glass transition temperature Tg (c) is equal to or higher than the lower limit of the above range, the heat resistance of the touch sensor substrate can be improved; when the glass transition temperature Tg (c) is equal to or lower than the upper limit of the above range, fish eyes can be effectively suppressed.

As the thermoplastic resin C forming the core layer, any resin can be used in a range having a glass transition temperature Tg (C) satisfying the above conditions. As the thermoplastic resin C, a resin containing a thermoplastic polymer is generally used.

The kind of the polymer is any kind. Among them, polymers containing alicyclic structures are preferable from the viewpoint of excellent mechanical properties, heat resistance, transparency, low hygroscopicity, dimensional stability and light weight. The polymer may be amorphous or crystalline. From the viewpoint of heat resistance, crystalline polymers are preferable. Examples of the alicyclic structure-containing polymer include: and (1) a norbornene polymer, (2) a monocyclic cyclic olefin polymer, (3) a cyclic conjugated diene polymer, and (4) a vinyl alicyclic hydrocarbon polymer. Among them, norbornene-based polymers are more preferable from the viewpoints of transparency and moldability.

Examples of the norbornene polymer include: ring-opened polymers of norbornene monomers, ring-opened copolymers of norbornene monomers with other monomers capable of ring-opening copolymerization, and hydrides thereof; addition polymers of norbornene monomers, addition copolymers of norbornene monomers and other monomers capable of copolymerization, and the like. Among them, ring-opening polymer hydrides of norbornene monomers are particularly preferable from the viewpoint of transparency.

The alicyclic structure-containing polymer may be selected from, for example, those disclosed in JP-A2002-321302.

As resins containing polymers having alicyclic structures, various commercial products are available, and resins having desired properties can be appropriately selected and used among these commercial products. Examples of such commercial products include the product groups of trade names "ZEONOR" (manufactured by japan rayleigh corporation), "ARTON" (manufactured by JSR corporation), "APEL" (manufactured by mitsunobu chemical corporation), "TOPAS" (manufactured by POLYPLASTICS corporation).

The polymer contained in the thermoplastic resin C may be used alone or in combination of two or more kinds in any ratio.

The weight average molecular weight (Mw) of the polymer is preferably 10000 or more, more preferably 15000 or more, particularly preferably 20000 or more, preferably 100000 or less, more preferably 80000 or less, particularly preferably 50000 or less. When the weight average molecular weight is in such a range, the mechanical strength and molding processability of the layer containing the polymer are highly balanced.

The molecular weight distribution (Mw/Mn) of the polymer is preferably 1.2 or more, more preferably 1.5 or more, particularly preferably 1.8 or more, preferably 3.5 or less, more preferably 3.0 or less, particularly preferably 2.7 or less. Here, mn represents a number average molecular weight. By setting the molecular weight distribution to the lower limit or more of the above range, the productivity of the polymer can be improved, and the production cost can be suppressed. In addition, by setting the molecular weight distribution to the upper limit or less, the amount of the low-molecular component becomes small, so that relaxation at the time of high-temperature exposure can be suppressed, and the stability of the layer containing the polymer can be improved.

The weight average molecular weight (Mw) and the number average molecular weight (Mn) can be measured as a weight average molecular weight in terms of polyisoprene or polystyrene by gel permeation chromatography using cyclohexane as a solvent. In the gel permeation chromatography, toluene may be used as a solvent in the case where the sample is not dissolved in cyclohexane.

The amount of the polymer in the thermoplastic resin C forming the core layer is preferably 80.0 wt% or more, more preferably 82.0 wt% or more, particularly preferably 84.0 wt% or more, preferably 97.0 wt% or less, more preferably 96.0 wt% or less, particularly preferably 95.0 wt% or less. By controlling the amount of the polymer within the above range, the advantages of the polymer can be effectively exhibited.

The thermoplastic resin C preferably contains a UV protection agent in combination with the polymer. By using the UV-blocking agent, the average transmittance of the touch sensor substrate in the width direction at a wavelength of 380nm can be reduced. Further, movement of the UV blocking agent contained in the core layer is blocked by the first skin layer and the second skin layer. Therefore, even if the thermoplastic resin C contains the UV-blocking agent, bleeding of the UV-blocking agent can be suppressed in the touch sensor substrate. Thus, the concentration of the UV inhibitor in the core layer can be increased, and the selection range of the kind of UV inhibitor can be widened, so that the ultraviolet light transmission inhibition ability can be improved even if the thickness of the touch sensor substrate is thin.

As the UV-blocking agent, an organic UV-blocking agent as an organic compound is preferably used. Thus, the light transmittance at the visible wavelength can be improved, and the haze can be reduced, so that the display performance of the display device including the touch sensor substrate can be improved.

Examples of the organic UV-blocking agent include organic UV-blocking agents such as triazine-based UV-blocking agents, benzophenone-based UV-blocking agents, benzotriazole-based UV-blocking agents, acrylonitrile-based UV-blocking agents, salicylate-based UV-blocking agents, cyanoacrylate-based UV-blocking agents, azomethine-based UV-blocking agents, indole-based UV-blocking agents, naphthalimide-based UV-blocking agents, and phthalocyanine-based UV-blocking agents. Among them, triazine-based ultraviolet absorbers are preferred as organic UV absorbers having a maximum ultraviolet absorption wavelength λmax of 300nm to 380nm, and having a small visible light absorption of 400nm to 400 nm. As the triazine ultraviolet light absorber, for example, a compound having a 1,3, 5-triazine ring is preferable. Specific examples of the triazine-based ultraviolet light absorber include: 2- (4, 6-diphenyl-1, 3, 5-triazin-2-yl) -5- [ (hexyl) oxy ] -phenol, 2, 4-bis (2-hydroxy-4-butoxyphenyl) -6- (2, 4-dibutoxyphenyl) -1,3, 5-triazine, and the like. Examples of commercial products of such triazine ultraviolet absorbers include "TINUVIN 1577" manufactured by Ciba Specialty Chemicals, and "LA-F70" and "LA-46" manufactured by ADEKA. The ultraviolet light can be efficiently absorbed by setting the maximum ultraviolet light absorption wavelength λmax to 300nm to 380 nm. Further, by setting the maximum ultraviolet absorption wavelength λmax to 380nm or less, the visible light transmittance of the touch sensor substrate can be improved. Further, as the UV-blocking agent, a molecular weight of 400 or more is preferable. Further, the UV blocking agent may be used alone, or two or more kinds may be used in combination at an arbitrary ratio. Examples of the UV-blocking agent such as an ultraviolet absorber include those described in japanese unexamined patent application publication No. 2017-68227.

The amount of the UV blocking agent in the thermoplastic resin C is preferably 3 wt% or more, more preferably 4 wt% or more, particularly preferably 5 wt% or more, preferably 20 wt% or less, more preferably 18 wt% or less, particularly preferably 16 wt% or less. When the amount of the UV blocking agent is not less than the lower limit value of the above range, the touch sensor substrate can have a high ultraviolet blocking capability. When the amount of the UV-blocking agent is equal to or less than the upper limit of the above range, the light transmittance of the touch sensor substrate at the visible wavelength is easily improved, and further, gelation of the resin due to the UV-blocking agent at the time of manufacturing the touch sensor substrate can be suppressed, and thus, occurrence of fish eyes can be effectively suppressed.

The thermoplastic resin C may also contain optional ingredients in combination with the polymer and UV protection agent. Examples of the optional component include: colorants such as pigments and dyes; a plasticizer; fluorescent whitening agents; a dispersing agent; a heat stabilizer; a light stabilizer; an antistatic agent; an antioxidant; a surfactant; laser absorbers, and the like.

As an optional component, a laser absorber is particularly preferable. When the laser absorber is contained, the touch sensor substrate can be freely cut and processed into a desired shape by laser light. Generally, as a method of cutting, a cutting method using a knife with a sharp edge, a punching method using a die, and other mechanical cutting methods are known. However, in such a mechanical cutting method, cracks may be generated during cutting due to flaws or residual stress that are not visible by the naked eye. In contrast, the laser processing method can process the touch sensor substrate while suppressing the aforementioned cracks.

In industry, an infrared laser is generally used as a laser. Here, the infrared laser refers to a laser having a wavelength in an infrared range of 760nm or more and less than 1 mm. Therefore, as the laser absorber, a compound capable of absorbing infrared laser light is preferably used. In particular, CO having a wavelength in the range of 9 μm to 11 μm is widely used because of less cracking and chipping of the cut surface and good handleability ₂ The laser light is an infrared laser light. Therefore, as the laser absorber, a compound capable of absorbing laser light having a wavelength in the range of 9 μm to 11 μm is preferably used.

In CO ₂ The laser beam includes a laser beam having a wavelength of 10.6 μm and a laser beam having a wavelength of 9.4 μm, and it is preferable to use a laser beam having a wavelength of 9.4 μm in the cutting process of the optical film. For example, in the case of cutting with a laser wavelength of 9.4 μm, the melt protrusion and melt deformation on the cut end face can be suppressed, and the cut end face becomes smooth, compared with the case of cutting with a laser wavelength of 10.6 μm. Therefore, as the laser absorber, a compound capable of absorbing laser light having a wavelength in the range of 9 μm to 11 μm is preferably used. It is particularly preferable to use a compound having a maximum absorption at 9.4 μm and 10.6 μm as the laser absorber. The compound used as such a laser absorber generally has no absorption in the ultraviolet wavelength region.

Preferable examples of the laser beam absorber include ester compounds. The ester compound is usually a polar compound and can efficiently absorb laser light having a wavelength in the range of 9 μm to 11 μm. Examples of the ester compound include a phosphate ester compound, a carboxylate ester compound, a phthalate ester compound, and an adipate ester compound. Wherein the CO can be absorbed particularly efficiently ₂ From the viewpoint of laser light, a carboxylic acid ester compound is preferable.

Among the above ester compounds, an ester compound having an aromatic ring in the molecule is preferable, and a compound having an ester bond bonded to the aromatic ring is particularly preferable. Such an ester compound can absorb laser light more efficiently. Therefore, among the above ester compounds, aromatic carboxylic acid esters are preferable, and among them, benzoic acid esters such as diethylene glycol dibenzoate and pentaerythritol tetrabenzoate are particularly preferable in view of excellent absorption efficiency of laser light.

Examples of such ester compounds include those described in International publication No. 2016/31776.

The molecular weight of the laser absorber is preferably 300 or more, more preferably 400 or more, particularly preferably 500 or more, preferably 2200 or less, more preferably 1800 or less, particularly preferably 1400 or less. By setting the molecular weight of the laser absorber to the lower limit value or more of the above range, exudation of the laser absorber can be suppressed. Further, by setting the molecular weight of the laser absorber to the upper limit value or less, the laser absorber can be easily caused to function as a plasticizer, and further, the laser absorber molecules after being heated can be quickly moved, so that the touch sensor substrate can be easily cut.

The melting point of the laser absorber is preferably 20 ℃ or higher, more preferably 60 ℃ or higher, particularly preferably 100 ℃ or higher, preferably 180 ℃ or lower, more preferably 150 ℃ or lower, particularly preferably 120 ℃ or lower. By setting the melting point of the laser absorber to the lower limit value or more of the above range, exudation of the laser absorber can be suppressed. Further, by setting the melting point of the laser absorber to the upper limit value or less, the laser absorber can be easily caused to function as a plasticizer, and further, the heated laser absorber molecules can be quickly moved, so that the touch sensor substrate can be easily cut. The cutting state of the touch sensor substrate can be evaluated by observing the cut surface with a visual or microscopic view.

Any one of the components may be used alone, or two or more of the components may be used in combination in any ratio.

The amount of any component other than the polymer and the UV blocking agent in the thermoplastic resin C is preferably 3% by weight or more, more preferably 4% by weight or more, particularly preferably 5% by weight or more, preferably 20% by weight or less, more preferably 18% by weight or less, particularly preferably 16% by weight or less. When the amount of any component is not less than the lower limit value and not more than the upper limit value of the above range, the glass transition temperature of the thermoplastic resin C can be controlled within a desired range, and occurrence of fish eyes can be effectively suppressed.

The UV protection agent and any components preferably function as plasticizers. By the UV-blocking agent and any component functioning as a plasticizer, the UV-blocking agent and any component can enter between polymer molecules in the thermoplastic resin C, lowering the glass transition temperature of the thermoplastic resin C. Therefore, the difference between the glass transition temperature of the thermoplastic resin C and the glass transition temperatures of the first skin layer and the second skin layer can be controlled to be within a desired range. Thus, the occurrence of fish eyes can be effectively suppressed.

Preferably, the thickness d of the core layer _c Set to the thickness d of the nuclear layer _c Relative to the combined thickness d of the first skin layer and the second skin layer _s1 +d _s2 Ratio d of (2) _c /(d _s1 +d _s2 ) Is within a prescribed range. Specifically, the thickness ratio d _c /(d _s1 +d _s2 ) Preferably 1.0 or less, more preferably 0.95 or less, particularly preferably 0.90 or less, preferably 0.30 or more, more preferably 0.35 or more, particularly preferably 0.40 or more. Through a thickness ratio d _c /(d _s1 +d _s2 ) The light transmittance of the touch sensor substrate at the visible wavelength can be improved by the upper limit value of the above range or less. Further, since the first skin layer and the second skin layer can be made thicker than the core layer, the occurrence of fish eyes can be effectively suppressed, and also the bleeding of the UV inhibitor can be effectively suppressed. In addition, by the thickness ratio d _c /(d _s1 +d _s2 ) The touch sensor substrate can have a high ultraviolet blocking capability at or above the lower limit of the above range.

The thickness ratio d _c /(d _s1 +d _s2 ) The transmittance can be calculated as described in examples described later. In addition, the thickness ratio d _c /(d _s1 +d _s2 ) The thickness of each layer included in the touch sensor substrate may be obtained by slicing the touch sensor substrate, observing a cross section of the slice with a microscope, and measuring the thickness of each layer.

[3 first skin layer ]

The first skin layer is formed of a thermoplastic resin S1. The glass transition temperature Tg (S1) of the thermoplastic resin S1 is usually 150℃or higher, preferably 155℃or higher, and more preferably 160 ℃. When the glass transition temperature Tg (S1) is equal to or higher than the lower limit, gelation of the thermoplastic resin S1 due to heat can be suppressed, and thus formation of fish eyes due to gelation of the resin can be suppressed. Further, since the heat resistance of the touch sensor substrate can be improved, the formation of the first conductive layer and the second conductive layer can be performed at a high temperature, and the first conductive layer and the second conductive layer with high crystallinity can be obtained, and therefore, the conductivity thereof can be improved. The upper limit of the glass transition temperature Tg (S1) of the thermoplastic resin S1 is preferably 200 ℃ or less, more preferably 190 ℃ or less, particularly preferably 180 ℃ or less, from the viewpoint of easy obtainment of the thermoplastic resin S1.

As the thermoplastic resin S1 forming the first skin layer, any resin can be used in a range having a glass transition temperature Tg (S1) satisfying the above conditions. As the thermoplastic resin S1, a resin containing a thermoplastic polymer is generally used.

The type of the polymer contained in the thermoplastic resin S1 is arbitrary. Among them, polymers containing alicyclic structures are preferable, and norbornene-based polymers are particularly preferable. This can provide the same advantages as those described in the description of the core layer. Further, by using both the thermoplastic resin C containing a norbornene-based polymer as the core layer and the thermoplastic resin S1 forming the first skin layer, the adhesive strength between the core layer and the first skin layer can be easily improved, and reflection at the interface between the core layer and the first skin layer can be easily suppressed. The polymer containing the thermoplastic resin S1 may be used alone or in combination of two or more kinds in any ratio.

The weight average molecular weight (Mw) and the molecular weight distribution (Mw/Mn) of the polymer contained in the thermoplastic resin S1 are preferably in the same ranges as those described for the weight average molecular weight (Mw) and the molecular weight distribution (Mw/Mn) of the polymer contained in the thermoplastic resin C as the nucleation layer. This can provide the same advantages as those described in the description of the core layer.

The amount of the polymer in the thermoplastic resin S1 forming the first skin layer is preferably 90.0 to 100% by weight, more preferably 95.0 to 100% by weight. By controlling the amount of the polymer within the above range, the advantages of the polymer can be effectively exhibited.

The thermoplastic resin S1 may further contain any component other than a polymer in combination with the polymer. As an optional component, the same component as the component that can be contained in the thermoplastic resin C forming the core layer can be mentioned. Further, any one of the components may be used alone, or two or more of the components may be used in combination in any ratio. However, from the viewpoint of effectively suppressing fish eyes and from the viewpoint of suppressing the exudation of the UV-blocking agent, the content of the UV-blocking agent in the thermoplastic resin S1 is preferably lower than that in the thermoplastic resin C, and particularly preferably no UV-blocking agent is contained.

Thickness d of first skin layer _s1 Preferably 0.1 μm or more, more preferably 1 μm or more, particularly preferably 10 μm or more, preferably 100 μm or less, more preferably 50 μm or less, particularly preferably 30 μm or less. Through the thickness d of the first skin layer _s1 The lower limit of the above range is more than the lower limit, and thus the occurrence of fish eyes can be effectively suppressed, and the bleeding of the UV inhibitor can be effectively suppressed. In addition, through the thickness d of the first skin layer _s1 The upper limit of the above range or less can make the touch sensor substrate thin.

[4. Second skin layer ]

The second skin layer is formed of a thermoplastic resin S2. The glass transition temperature Tg (S2) of the thermoplastic resin S2 is usually 150℃or higher. Among them, the glass transition temperature Tg (S2) of the thermoplastic resin S2 is preferably in the same range as that described as the range of the glass transition temperature Tg (S1) of the thermoplastic resin S1 forming the first skin layer. By having the glass transition temperature Tg (s 2) in the above range, the same advantages as those described in one item of the first skin layer can be obtained.

As the thermoplastic resin S2 forming the second skin layer, any resin can be used in a range having a glass transition temperature Tg (S2) satisfying the above conditions. As the thermoplastic resin S2, any thermoplastic resin selected from the range of thermoplastic resins described as the thermoplastic resin S1 forming the first skin layer can be used. Accordingly, the types and amounts of the components contained in the thermoplastic resin S2 can be selected and applied from the ranges described as the types and amounts of the components contained in the thermoplastic resin S1. This can provide the same advantages as those described in the first skin layer.

The thermoplastic resin S2 forming the second skin layer may be a different resin from the thermoplastic resin S1 forming the first skin layer, or may be the same resin. Among them, the same resin is preferably used as the thermoplastic resin S1 and the thermoplastic resin S2. By using the same resin as the thermoplastic resin S1 and the thermoplastic resin S2, the manufacturing cost of the touch sensor substrate can be suppressed, and curling of the touch sensor substrate can also be suppressed.

Thickness d of the second skin layer _s2 Can be from the thickness d as the first skin layer _s1 Any thickness selected from the ranges specified in the ranges of (a). This can provide the same advantages as those described in the first skin layer. Among them, in order to suppress curling of the touch sensor substrate, the thickness d of the second skin layer is preferably _s2 Thickness d with first skin layer _s1 The same applies.

[5. Optional layer ]

The touch sensor substrate may include any layer other than the core layer, the first skin layer, and the second skin layer, as required. Examples of the optional layer include an easy-to-adhere layer, an adhesive layer, a hard coat layer, an index matching layer, an antireflection layer, a masking layer, an optically anisotropic layer, and a protective layer. However, from the viewpoint of making the touch sensor substrate thin, the touch sensor substrate is preferably a layer having a three-layer structure without any layer.

[6. Characteristics and thickness of touch sensor substrate ]

(average transmittance at a wavelength of 380 nm)

The average transmittance of the touch sensor substrate in the width direction at a wavelength of 380nm is usually 0.100% or less, preferably 0.085% or less, more preferably 0.080% or less, and desirably 0%. The average transmittance at 380nm is low as described above, and indicates that the touch sensor substrate has excellent ability to block ultraviolet rays as a whole. Therefore, by using the touch sensor substrate, when manufacturing a touch sensor member by photolithography using ultraviolet rays, even if the resist layers on both sides of the touch sensor substrate are simultaneously exposed through the mask pattern, deterioration in the accuracy of the pattern shape due to the ultraviolet rays transmitted through the touch sensor substrate can be suppressed. Accordingly, a touch sensor member including the first conductive layer and the second conductive layer having a desired pattern shape can be manufactured with high manufacturing efficiency.

The average transmittance of the touch sensor substrate in the width direction at a wavelength of 380nm can be measured by the measurement method described in the examples described later.

The average transmittance of the touch sensor substrate in the width direction at the wavelength of 380nm can be reduced as described above, and can be achieved by using, for example, a resin containing a component such as a UV blocking agent having an ability to block ultraviolet rays as the thermoplastic resin C forming the core layer.

(inhibition of fish eye formation)

The touch sensor substrate can suppress formation of fish eyes. Therefore, the touch sensor substrate contains a small number of fish eyes. When the fish eyes are small, degradation in the accuracy of the pattern shape of the first conductive layer and the second conductive layer due to the fish eyes can be suppressed. Thus, by using the touch sensor substrate, a touch sensor member including the first conductive layer and the second conductive layer having a desired pattern shape can be obtained. Further, since the number of fish eyes is small, it is possible to suppress deterioration of optical characteristics of a display device including a touch sensor member manufactured using the touch sensor substrate due to the fish eyes.

It was confirmed that formation of fish eyes was suppressed by the number of fish eyes per unit area. The number of fish eyes can be measured by the method described in examples described below.

The present inventors speculate that the mechanism of suppressing the formation of fish eyes in the touch sensor substrate is as follows. However, the technical scope of the present invention is not limited by the mechanism described below.

In the case of producing a touch sensor substrate by melt extrusion using the thermoplastic resin C, the thermoplastic resin S1, and the thermoplastic resin S2, the thermoplastic resin C, the thermoplastic resin S1, and the thermoplastic resin S2 are extruded in a molten state, and then the extruded resins are cooled and solidified to obtain the touch sensor substrate. At this time, since the glass transition temperatures Tg (S1), tg (S2) of the thermoplastic resin S1 and the thermoplastic resin S2 are higher than the glass transition temperature Tg (C) of the thermoplastic resin C, the thermoplastic resin S1 and the thermoplastic resin S2 cure faster than the thermoplastic resin C. In this way, even if foreign matter is generated in the thermoplastic resin C in a molten state, the foreign matter is prevented from moving to the first skin layer and the second skin layer, and the first skin layer and the second skin layer are prevented from being squeezed out by the foreign matter. Therefore, the formation of fish eyes due to foreign matter generated in the thermoplastic resin C in a molten state can be suppressed, and thus the number of fish eyes can be reduced. Particularly, when the thermoplastic resin C contains a UV-blocking agent, since the UV-blocking agent tends to easily generate foreign matter due to gelation of the thermoplastic resin C, formation of fish eyes due to foreign matter generated in the thermoplastic resin C in a molten state can be suppressed, and thus the formation of fish eyes can be suppressed to a certain extent.

(Standard deviation sigma of transmittance at wavelength 380 nm)

The standard deviation σ of the transmittance of the touch sensor substrate at a wavelength of 380nm in the width direction is preferably 0.02% or less, more preferably 0.01% or less, particularly preferably 0.005% or less, and desirably 0%. The small standard deviation σ of the transmittance as described above indicates that the unevenness of the ultraviolet transmittance in the width direction of the touch sensor substrate is small. Since the unevenness of the ultraviolet transmittance is small, exposure can be performed at any position on the touch sensor substrate using the same exposure conditions, and thus the touch sensor substrate can be manufactured easily.

The standard deviation σ of the transmittance of the touch sensor substrate in the width direction at the wavelength of 380nm can be measured according to the measurement method described in the examples described later.

The standard deviation σ of the transmittance of the touch sensor substrate in the width direction at the wavelength 380nm can be reduced by, for example, reducing the thickness unevenness of the touch sensor substrate. The touch sensor substrate having small thickness unevenness can be produced by, for example, a melt extrusion method using a multi-manifold die.

(ultimate stress Change Rate based on immersion test)

When a touch sensor substrate is tested under at least one of the following conditions (a) and (B), it is preferable that the rate of change of the ultimate stress of the touch sensor substrate based on the test is small.

Specifically, the ultimate stress change rate of the touch sensor substrate based on the test under the condition (a) is preferably 20% or less, more preferably 15% or less, and particularly preferably 10% or less. The small rate of change in ultimate stress of the touch sensor substrate based on the test under the condition (a) indicates that the touch sensor substrate is excellent in resistance to acid. In photolithography, since the touch sensor substrate is sometimes brought into contact with an acidic solution, the touch sensor substrate is excellent in resistance to acid, and thus the accuracy of the pattern shapes of the first conductive layer and the second conductive layer can be improved. The lower limit of the limit stress change rate is arbitrary, and desirably 0%.

The ultimate stress change rate of the touch sensor substrate based on the test under the condition (B) is preferably 20% or less, more preferably 15% or less, and particularly preferably 10% or less. The small rate of change in ultimate stress of the touch sensor substrate based on the test under the condition (B) indicates that the touch sensor substrate is excellent in alkali resistance. In photolithography, since the touch sensor substrate is sometimes brought into contact with an alkaline solution, the touch sensor substrate is excellent in alkali resistance, and thus the accuracy of the pattern shapes of the first conductive layer and the second conductive layer can be improved. The lower limit of the limit stress change rate is arbitrary, and desirably 0%.

Further, in both cases where the test under the condition (a) and the test under the condition (B) are performed on the touch sensor substrate, it is preferable that the rate of change in the ultimate stress of the touch sensor substrate based on the test is small. Therefore, the touch sensor substrate preferably has a limit stress change rate of the touch sensor substrate based on the test under the condition (a) in the above range and a limit stress change rate of the touch sensor substrate based on the test under the condition (B) in the above range.

The ultimate stress change rate can be measured by the method described in examples described below.

The reduction of the ultimate stress change rate of the touch sensor substrate can be achieved by, for example, using a resin containing a polymer containing an alicyclic structure as the thermoplastic resin S1 forming the first skin layer and the thermoplastic resin S2 forming the second skin layer.

(Heat shrinkage)

The heat shrinkage in the longitudinal direction and the heat shrinkage in the width direction of the touch sensor substrate after the test under the following condition (C) are both preferably close to 0.

Specifically, the heat shrinkage in the longitudinal direction of the touch sensor substrate after the test under the condition (C) is preferably within ±0.10%, more preferably within ±0.095%, and particularly preferably within ±0.09%. The heat shrinkage of the touch sensor substrate after the test under the condition (C) is preferably within ±0.10%, more preferably within ±0.095%, and particularly preferably within ±0.09%. A heat shrinkage of approximately 0 in this way means that the dimensional change of the touch sensor substrate due to heat is small. Therefore, when manufacturing the touch sensor member, the change in pattern shape of the first conductive layer and the second conductive layer due to heat can be suppressed, and thus the accuracy of the pattern shape can be improved.

The heat shrinkage can be measured by the measurement method described in examples below.

The reduction of the heat shrinkage rate of the touch sensor substrate can be achieved by, for example, using a thermoplastic resin C containing a polymer containing an alicyclic structure as a core layer, a thermoplastic resin S1 forming a first skin layer, and a thermoplastic resin S2 forming a second skin layer.

(delay)

The touch sensor substrate may be an optically isotropic film. The in-plane retardation Re of the optically isotropic touch sensor substrate having a wavelength of 550nm is usually 0nm or more, preferably 10nm or less, preferably 5nm or less, more preferably 3nm or less. When the optically isotropic touch sensor substrate is provided in a display device, the touch sensor substrate can function as a protective film for a linear polarizer, and coloring of a display screen can be suppressed, thereby improving viewing angle characteristics. Furthermore, an optically isotropic touch sensor substrate can be combined with other optically anisotropic layers. The optically isotropic touch sensor substrate can be manufactured as an unstretched film to which a stretching treatment is not applied.

The touch sensor substrate may be an optically anisotropic film. The in-plane retardation Re of the optically anisotropic touch sensor substrate having a wavelength of 550nm is preferably 85nm or more, more preferably 90nm or more, particularly preferably 100nm or more, preferably 150nm or less, more preferably 145nm or less, particularly preferably 140nm or less. The optically anisotropic touch sensor substrate having the in-plane retardation Re in such a range can function as a 1/4 wave plate. Therefore, by combining the touch sensor substrate with the linear polarizer, the optical axes are adjusted to have a desired relationship, and a circularly polarizing plate can be obtained. In addition, optically anisotropic touch sensor substrates can be combined with other optically isotropic layers. The optically anisotropic touch sensor substrate can be manufactured as a stretched film to which a stretching treatment is applied.

Optically anisotropic touch sensor substrates typically have a slow axis in the in-plane direction. The direction of the slow axis is preferably in the oblique direction of the elongated touch sensor substrate. By bonding such a touch sensor substrate to a long linear polarizer having a polarized light transmission axis in the longitudinal direction or the width direction according to a roll-to-roll method, a circularly polarizing plate can be simply obtained. The bonding is performed in such a way that the slow axis of the touch sensor substrate and the transmission axis of the linear polarizer typically intersect at 45 °. In addition, as described above, the touch sensor substrate having the slow axis in the oblique direction can be manufactured as an oblique stretched film to which a stretching treatment in the oblique direction is applied. The stretching direction of the stretching treatment is preferably at an angle of 45 ° to the longitudinal direction or the width direction.

The retardation Rth in the thickness direction of the touch sensor substrate at a wavelength of 550nm is preferably-250 nm or more, more preferably-100 nm or more, particularly preferably 5nm or more, and usually +150nm or less. When the retardation Rth in the thickness direction of the touch sensor substrate is in the above range, coloring of the display screen can be suppressed and viewing angle characteristics can be improved in the case where the touch sensor substrate is provided in a display device. In particular, in a display device equipped with an external touch sensor, coloring of a panel when a display screen is viewed from an oblique direction can be suppressed, and darkening of the display screen can be suppressed when a wearer of polarized sunglasses views the display screen from a front direction. In particular, in a display device equipped with an In-Cell type or Mid-Cell type touch sensor, reflection of external light can be suppressed, and a high-contrast touch panel can be obtained.

The in-plane retardation Re and the retardation Rth in the thickness direction can be measured using, for example, an automatic birefringence meter (KOBRA-21 ADH manufactured by prince measuring machine corporation) and a retardation meter (optics corporation "Muller Matrix Polarimeter (axi Scan)").

(transparency)

From the viewpoint of stably functioning as an optical member, the touch sensor substrate preferably has high light transmittance at a visible wavelength. For example, the light transmittance of the touch sensor substrate in the wavelength range of 400nm to 700nm is preferably 85% to 100%, more preferably 87% to 100%, and particularly preferably 90% to 100%. The light transmittance of the touch sensor substrate can be measured using an ultraviolet-visible spectrophotometer.

From the viewpoint of improving the image clarity of the display device, it is preferable that the haze of the touch sensor substrate is small. The specific haze of the touch sensor substrate is preferably 1% or less, more preferably 0.8% or less, and particularly preferably 0.5% or less. Haze can be measured according to JIS K7361-1997 using a haze meter.

(thickness)

The thickness D of the touch sensor substrate is preferably 20 μm or more, more preferably 22 μm or more, particularly preferably 25 μm or more, preferably 60 μm or less, more preferably 58 μm or less, particularly preferably 56 μm or less. By setting the thickness D of the touch sensor substrate to the above lower limit value or more, high mechanical strength can be obtained, and the ultraviolet ray shielding capability of the touch sensor substrate can be improved. Further, by setting the thickness D of the touch sensor substrate to the above upper limit value or less, the touch sensor substrate can be made lightweight and space-saving, and the film can be wound in a long roll.

[7. Method for manufacturing touch sensor substrate ]

The touch sensor substrate can be produced by a melt extrusion method using a production apparatus described in japanese patent No. 3973755, 4581691, 6094282, 6094283, or the like. The manufacturing method using the melt extrusion method includes a step of extruding the thermoplastic resin S1, the thermoplastic resin C, and the thermoplastic resin S2 from a die, and in this case, the touch sensor substrate is obtained by extruding the thermoplastic resin into a film shape including a layer of the thermoplastic resin S1, a layer of the thermoplastic resin C, and a layer of the thermoplastic resin S2 in this order in the thickness direction.

The extrusion is performed in a state where the thermoplastic resin S1, the thermoplastic resin C, and the thermoplastic resin S2 are molten. Therefore, the temperature of the mold is generally set to a high temperature higher than the glass transition temperature Tg (C) of the thermoplastic resin C, the glass transition temperature Tg (S1) of the thermoplastic resin S1, and the glass transition temperature Tg (S2) of the thermoplastic resin S2. Then, after the thermoplastic resin in a molten state is extruded in this way, the thermoplastic resin is cooled and solidified, whereby a touch sensor substrate as a resin film can be obtained.

The temperature of the mold is preferably 150 ℃ or higher than the glass transition temperature Tg (c), 100 ℃ or higher than the glass transition temperature Tg (s 1), and 100 ℃ or higher than the glass transition temperature Tg (s 2). More specifically, the temperature of the mold is preferably Tg (c) +150 ℃ or higher, more preferably Tg (c) +155 ℃ or higher, and particularly preferably Tg (c) +158 ℃ or higher. The temperature of the mold is preferably Tg (s 1) +100 ℃ or higher, more preferably Tg (s 1) +105 ℃ or higher, and particularly preferably Tg (s 1) +110 ℃ or higher. The temperature of the mold is preferably Tg (s 2) +100 ℃ or higher, more preferably Tg (s 2) +105 ℃ or higher, and particularly preferably Tg (s 2) +110 ℃ or higher. The temperature of the mold is not less than the lower limit, so that the thermoplastic resin C, the thermoplastic resin S1, and the thermoplastic resin S2 can be sufficiently melted to improve the resin flowability, and thus the resin can be easily molded into a film shape, and the thickness unevenness can be reduced. Further, by sufficiently melting the resin in this way, the effect of suppressing formation of fish eyes by curing the thermoplastic resin S1 and the thermoplastic resin S2 faster than the thermoplastic resin C can be effectively exerted.

The upper limit of the temperature of the mold is not particularly limited, but is preferably Tg (c) +190 ℃ or lower, more preferably Tg (c) +185 ℃ or lower, and particularly preferably Tg (c) +180 ℃ or lower. The temperature of the mold is preferably Tg (s 1) +150deg.C or less, more preferably Tg (s 1) +145deg.C or less, and particularly preferably Tg (s 1) +140deg.C or less. The temperature of the mold is preferably Tg (s 2) +150deg.C or less, more preferably Tg (s 2) +145deg.C or less, and particularly preferably Tg (s 2) +140deg.C or less. The mold temperature is not higher than the upper limit, and gelation of the thermoplastic resin S1, the thermoplastic resin C, and the thermoplastic resin S2 can be suppressed, so that formation of fish eyes can be effectively suppressed. In addition, the upper limit of the temperature of the mold is usually 300 ℃ or less from the viewpoints of high temperature holding stability of the mold and safety of the equipment.

As the mold, any mold that can obtain a desired touch sensor substrate can be used, and for example, a mold described in japanese patent No. 6094282 or japanese patent No. 6094283 can be used. The material of the mold is not particularly limited, and may be a mold steel or stainless steel (SUS) which is generally used. As the mold steel, SKD-based hot work mold steel (thermal conductivity: about 30W/mdeg.C) or the like can be used, and as the stainless steel, SUS420J2 (thermal conductivity: about 25W/mdeg.C) or the like can be used.

In addition, in extruding the molten resin, in order not to mix the thermoplastic resin S1, the thermoplastic resin C, and the thermoplastic resin S2 together before extrusion from the die, each resin may be extruded by a separate pump.

The method for manufacturing a touch sensor substrate may further include a step of stretching the film obtained by the melt extrusion. The stretching treatment can exhibit a desired in-plane retardation.

The stretching treatment may be a uniaxial stretching treatment in which stretching is performed in only one direction, or a biaxial stretching treatment in which stretching is performed in two different directions. In the biaxial stretching treatment, simultaneous biaxial stretching treatment may be performed in which stretching is performed simultaneously in two directions, or sequential biaxial stretching treatment may be performed in which stretching is performed in one direction and then stretching is performed in the other direction. Further, the stretching may be performed by any one of a longitudinal stretching treatment in which the stretching is performed in the longitudinal direction of the film, a transverse stretching treatment in which the stretching is performed in the width direction of the film, and an oblique stretching treatment in which the stretching is performed in an oblique direction which is neither parallel nor perpendicular to the width direction of the film, or may be performed by a combination thereof. Examples of the stretching treatment include a roll type, a float (float) type, and a spoke-expanding type. Further, the stretching temperature and the stretching ratio can be arbitrarily set in a range where a touch sensor substrate having a desired retardation can be obtained.

The method for manufacturing a touch sensor substrate may further include any combination of the above steps. For example, the method for manufacturing a touch sensor substrate may include a step of performing trimming processing for cutting off both ends in the width direction.

[8 ] touch sensor Member ]

Fig. 2 is a cross-sectional view schematically showing a touch sensor member 200 as a second embodiment of the present invention.

As shown in fig. 2, the touch sensor member 200 sequentially includes, in a thickness direction of the touch sensor member 200: a first conductive layer 210, a substrate 220, and a second conductive layer 230. The substrate 220 is a member selected from a long touch sensor substrate including the first skin layer 110, the core layer 120, and the second skin layer 130 in this order, and a substrate sheet cut out from the touch sensor substrate. Here, the base sheet may be a long member or a non-long sheet-like member. Accordingly, touch sensor member 200 may be a long member or a sheet-like member. The touch sensor member 200 has the first conductive layer 210 and the second conductive layer 230 on the substrate 220 in which formation of fish eyes is suppressed, and thus can improve the accuracy of pattern shapes of the first conductive layer 210 and the second conductive layer 230. Further, the substrate 220 formed of a thermoplastic resin is generally less likely to crack than conventional glass substrates, and therefore the mechanical durability of the touch sensor member 200 is excellent. Further, since the base 220 formed of the thermoplastic resin is generally excellent in flexibility, a touch panel in which a finger is smoothly input can be realized by using the touch sensor member 200.

As shown in fig. 2, the first conductive layer 210 may be directly formed on one surface 220U of the substrate 220 without any layer therebetween with respect to the substrate 220. The first conductive layer 210 may be formed indirectly on the surface 220U of the substrate 220 with an optional layer (not shown) interposed therebetween.

As shown in fig. 2, the second conductive layer 230 may be directly formed on the other surface 220D of the substrate 220 without any layer interposed between the second conductive layer and the substrate 220. The second conductive layer 230 may be formed indirectly on the surface 220D of the substrate 220 with an optional layer (not shown) interposed therebetween.

(conductive layer)

The first conductive layer and the second conductive layer are layers that can function as electrodes and wirings, and are formed of a conductive material. As the conductive material, a material having high transmittance at a visible wavelength and conductivity is preferable. Examples of the conductive material include conductive metal oxides such as ITO (indium tin oxide), IZO (indium zinc oxide), znO (zinc oxide), IWO (indium tungsten oxide), ITiO (indium titanium oxide), AZO (aluminum zinc oxide), GZO (gallium zinc oxide), XZO (zinc-based special oxide), and IGZO (indium gallium zinc oxide); conductive nanowires such as carbon nanotubes and silver nanowires; metallic nanoink; a metal mesh; conductive polymers, and the like. These conductive materials may be used singly or in combination of two or more kinds in any ratio.

The first conductive layer and the second conductive layer are each typically patterned with a prescribed pattern shape. The pattern shapes of the first conductive layer and the second conductive layer are preferably patterns that can function well as a touch panel (for example, a capacitive touch panel), and examples thereof include patterns described in the specification of japanese patent application laid-open publication No. 2011-511357, japanese patent application laid-open publication No. 2010-164938, japanese patent application laid-open publication No. 2008-310550, japanese patent application laid-open publication No. 2003-511799, japanese patent application laid-open publication No. 2010-541109, and U.S. patent No. 8026903.

The surface resistance values of the first conductive layer and the second conductive layer are each preferably 2000 Ω/≡or less, more preferably 1500 Ω/≡or less, and particularly preferably 1000 Ω/≡or less. By making the surface resistance value low as described above, a touch sensor substrate can be used to realize a high-performance touch panel. The lower limit of the surface resistance value is not particularly limited, but is preferably 100deg.OMEGA/∈or more, more preferably 200Ω/∈ly or more, particularly preferably 300Ω/∈ly or more, from the viewpoint of ease of production.

The light transmittance of the first conductive layer and the second conductive layer in the wavelength range of 400nm to 700nm is preferably 85% or more, more preferably 90% or more, and still more preferably 95% or more.

The thickness of each of the first conductive layer and the second conductive layer is preferably 0.01 μm or more, preferably 10 μm or less, more preferably 3 μm or less, and particularly preferably 1 μm or less.

(optional layer)

The touch sensor assembly may also contain any combination of layers with the substrate, the first conductive layer, and the second conductive layer. Examples of the optional layer include a first photosensitive resin layer provided between the first conductive layer and the substrate, an index matching layer provided between the first conductive layer and the substrate, a second photosensitive resin layer provided between the second conductive layer and the substrate, and an index matching layer provided between the second conductive layer and the substrate.

The photosensitive resin layers such as the first photosensitive resin layer and the second photosensitive resin layer are layers made of photosensitive resins. These photosensitive resin layers can exhibit various functions according to the types of photosensitive resins.

For example, a hard coat layer can be obtained as a photosensitive resin layer by using a photosensitive resin having a hardness after curing of "HB" or more, which is measured in a pencil hardness test specified in JIS K5700. By using such a hard coat layer, the mechanical strength of the touch sensor member can be improved. Examples of the type of the photosensitive resin capable of forming such a hard coat layer include materials for a hard coat layer described in japanese unexamined patent publication No. 2013-226809.

The photosensitive resin may be used alone or in combination of two or more kinds thereof in any ratio.

The thickness of the photosensitive resin layer is preferably 0.5 μm or more, more preferably 2 μm or more, and preferably 30 μm or less, more preferably 15 μm or less.

The method for forming any layer is not particularly limited. For example, the photosensitive resin layers such as the first photosensitive resin layer and the second photosensitive resin layer can be formed by coating a photosensitive resin on a substrate, and curing the photosensitive resin by irradiation with light such as ultraviolet light. In addition, from the viewpoint of improving the adhesive strength between the photosensitive resin layer and the substrate, the surface of the substrate may be subjected to a surface treatment before the photosensitive resin is applied.

[9 ] method for manufacturing touch sensor Member ]

The touch sensor component can be manufactured by forming a first conductive layer and a second conductive layer on a substrate, for example, and patterning the first conductive layer and the second conductive layer by photolithography. Hereinafter, a method for manufacturing the touch sensor member of this example will be described with reference to the drawings. However, the method of manufacturing the touch sensor member is not limited to the following description.

Fig. 3 to 7 are cross-sectional views schematically showing a method of manufacturing a touch sensor member 200 according to a second embodiment of the present invention.

As shown in fig. 3, the method for manufacturing the touch sensor member 200 according to the second embodiment includes: a step of forming a first conductive layer 210 directly or via an optional layer (not shown) on one surface 220U of the substrate 220; and forming a second conductive layer 230 on the other surface 220D of the substrate 220 directly or via an optional layer (not shown). The step of forming the first conductive layer 210 and the step of forming the second conductive layer 230 may be performed simultaneously or may not be performed simultaneously.

The formation of the first conductive layer 210 and the second conductive layer 230 can be performed using an appropriate method corresponding to the materials of the first conductive layer 210 and the second conductive layer 230. Examples of the method for forming the first conductive layer 210 and the second conductive layer 230 include a vapor deposition method, a sputtering method, an ion plating method, an ion beam assisted deposition method, an arc discharge plasma deposition method, a thermal CVD method, a plasma CVD method, a plating method, a sol-gel method, a coating method, and combinations thereof. Among these methods, vapor deposition and sputtering are preferable, and sputtering is particularly preferable. In the sputtering method, a layer having a uniform thickness can be formed, and thus, local generation of thin portions in the first conductive layer 210 and the second conductive layer 230 can be suppressed.

In addition, in the above-described formation method of the first conductive layer 210 and the second conductive layer 230, the substrate 220 is sometimes exposed to a high-temperature environment. Therefore, as the base material 220, a base material having a heat shrinkage rate of approximately 0 after the test under the condition (C) is preferably used. This can suppress the change in pattern shape of the first conductive layer 210 and the second conductive layer 230 due to heat, and thus can improve the accuracy of the pattern shape.

As shown in fig. 4, the method of manufacturing the touch sensor member 200 further includes: a step of forming a first resist layer 310 covering the first conductive layer 210 on the first conductive layer 210; and forming a second resist layer 320 covering the second conductive layer 230 on the second conductive layer 230. The step of forming the first resist layer 310 and the step of forming the second resist layer 320 may be performed simultaneously or may not be performed simultaneously.

The first resist layer 310 and the second resist layer 320 are layers formed of a photosensitive resin as a photoresist that can be sensitized by ultraviolet rays. As the photoresist, either a positive type photoresist or a negative type photoresist may be used. The first resist layer 310 and the second resist layer 320 can be formed by, for example, coating photoresist. Examples of such a photoresist include a resist material described in japanese patent application laid-open No. 2004-34325.

As shown in fig. 5, the method of manufacturing the touch sensor member 200 further includes a step of simultaneously exposing the first resist layer 310 and the second resist layer 320 to ultraviolet light L1 and ultraviolet light L2. In this exposure, generally, irradiation of the first resist layer 310 with the ultraviolet light L1 through the pattern mask 330 and irradiation of the second resist layer 320 with the ultraviolet light L2 through the pattern mask 340 are performed simultaneously. By this exposure, the solubility of the exposed portions of the first resist layer 310 and the second resist layer 320 changes, forming a potential resist pattern. At this time, since the substrate 220 shields the ultraviolet rays L1, L2, the ultraviolet ray L1 does not affect the second resist layer 320 located on the opposite side with respect to the substrate 220, and the ultraviolet ray L2 does not affect the first resist layer 310 located on the opposite side with respect to the substrate 220. Accordingly, a potential resist pattern to which the shapes of the pattern masks 330, 340 are precisely transferred can be formed on the first resist layer 310 and the second resist layer 320.

The light sources of the ultraviolet rays L1, L2 are not particularly limited. Examples of the light source include a carbon arc lamp, a mercury vapor arc lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a xenon lamp, a metal halide lamp, an excimer lamp, and an LED. The cumulative light quantity of the ultraviolet rays L1, L2 is usually 100mJ/cm ² ～1000mJ/cm ² . Generally, the photoresist has absorption in the ultraviolet region, and thus the curing degree of the photoresist is affected by the ultraviolet shielding performance of the ultraviolet region of the substrate 220.

As shown in fig. 6, the method of manufacturing the touch sensor member 200 further includes: developing the exposed first resist layer 310 to form a resist pattern for the first conductive layer 210; and developing the exposed second resist layer 320 to form a resist pattern for the second conductive layer 230. The step of developing the first resist layer 310 and the step of developing the second resist layer 320 may be performed simultaneously or may not be performed simultaneously.

By developing, a portion of the first resist layer and a portion of the second resist layer are removed in correspondence with the latent resist pattern formed by exposure, and the resist pattern is developed. Thus, a first resist layer 310 having a resist pattern for the first conductive layer 210 and a second resist layer 320 having a resist pattern for the second conductive layer 230 are obtained.

The developing solution is usually brought into contact with the first resist layer 310 and the second resist layer 320 by a treatment such as dipping, spraying, or coating, and then is washed with a washing liquid as needed to develop the resist. The type of the developer is not particularly limited, and a developer that does not significantly damage the exposed portion is preferable. If the photoresist is negative, the developer is preferably one that can selectively remove the unexposed portions; if the photoresist is positive, the developer is preferably one that can selectively remove the exposed portion. In this case, an acidic solution or an alkaline solution may be used as the developing solution or the cleaning solution. Therefore, as the base material 220, a base material having a small rate of change in ultimate stress by a test under at least one of the conditions (a) and (B) is preferably used. Accordingly, deterioration of the base material 220 due to chemicals such as a developer and a cleaning liquid can be suppressed, and thus, accuracy of pattern shapes of the first conductive layer 210 and the second conductive layer 230 can be improved.

As shown in fig. 7, the method of manufacturing the touch sensor member 200 further includes: etching a portion of the first conductive layer 210 that is not covered with the developed first resist layer 310; and etching a portion of the second conductive layer 230 not covered with the developed second resist layer 320. The process of etching the first conductive layer 210 and the process of etching the second conductive layer 230 may be performed simultaneously or non-simultaneously.

By performing etching, a portion of the first conductive layer 210 not covered with the first resist layer 310 is removed, and a portion covered with the first resist layer 310 is not removed. By etching, a portion of the second conductive layer 230 not covered with the second resist layer 320 is removed, and a portion covered with the second resist layer 320 is not removed. Thereby, the first conductive layer 210 and the second conductive layer 230 can be formed into pattern shapes corresponding to the resist pattern of the first resist layer 310 and the resist pattern of the second resist layer 320.

The etching is generally performed by bringing an etching liquid into contact with the first conductive layer 210 and the second conductive layer 230, and then cleaning the layers with a cleaning liquid as necessary. In this case, an acidic solution or an alkaline solution may be used as the etching solution or the cleaning solution. Therefore, as the base material 220, a base material having a small rate of change in ultimate stress by a test under at least one of the conditions (a) and (B) is preferably used. Accordingly, deterioration of the substrate 220 due to chemicals such as an etching solution and a cleaning solution can be suppressed, and thus, the accuracy of pattern shapes of the first conductive layer 210 and the second conductive layer 230 can be improved.

The method of manufacturing the touch sensor assembly 200 further includes, after etching: a step of removing the first resist layer 310 covering the first conductive layer 210; and removing the second resist layer 320 covering the second conductive layer 230. The step of removing the first resist layer 310 and the step of removing the second resist layer 320 may be performed simultaneously or may not be performed simultaneously.

After etching, the remaining first resist layer 310 and second resist layer 320 are removed, whereby a touch sensor element 200 including the first conductive layer 210 and the second conductive layer 230 having a desired pattern shape can be obtained as shown in fig. 2. In the touch sensor member 200 thus obtained, the first conductive layer 210 and the second conductive layer 230 are formed on the base material 220 in which formation of fish eyes is suppressed, and thus the accuracy of the pattern shape of the first conductive layer 210 and the second conductive layer 230 can be improved.

The first resist layer 310 and the second resist layer 320 are generally removed by bringing a removal liquid into contact with the first resist layer 310 and the second resist layer 320, and then cleaning the same with a cleaning liquid as necessary. In this case, an acidic solution or an alkaline solution may be used as the removing liquid and the cleaning liquid. Therefore, as the base material 220, a base material having a small rate of change in ultimate stress by a test under at least one of the conditions (a) and (B) is preferably used. This can suppress degradation of the substrate 220 due to chemicals such as a removal liquid and a cleaning liquid, and thus can improve the accuracy of the pattern shapes of the first conductive layer 210 and the second conductive layer 230.

The method for manufacturing the touch sensor member 200 may include any process and any combination of the above processes as necessary. Examples of the optional step include a step of forming an optional layer such as a first photosensitive resin layer and a second photosensitive resin layer. The time for forming any layer is arbitrary, and for example, the first photosensitive resin layer can be formed before the first conductive layer 210 is formed on the surface 220U of the substrate 220, and the second photosensitive resin layer can be formed before the second conductive layer 230 is formed on the surface 220D of the substrate 220. Further, examples of the optional step include a heating step for curing the first resist layer 310 and the second resist layer 320, a drying step for removing a liquid, and the like.

In the above manufacturing method, the order of the steps is arbitrary as long as the desired touch sensor member 200 can be obtained.

[10. Display device ]

The touch sensor member can be incorporated into a display device. In a display device, a touch sensor member generally functions as a part of a touch panel. Here, the touch panel is an input device provided in a display device, and is provided so that a user can input information by touching a predetermined position as needed while referring to an image displayed on a display surface of the display device. Examples of the operation detection method of the touch panel include resistive film type, electromagnetic induction type, and capacitive type.

The display method of the display device including the touch panel is not particularly limited, and any display device such as a liquid crystal display device or an organic electroluminescence display device can be used. In the following description, the term "organic electroluminescence" is appropriately abbreviated as "organic EL".

For example, a liquid crystal display device generally includes: a liquid crystal cell including a pair of substrates and a liquid crystal compound enclosed between the pair of substrates; and a pair of polarizing plates provided on the front side and the back side of the liquid crystal cell. In general, one of the pair of polarizers is a visual-side polarizer, and the other is a light-source-side polarizer. The liquid crystal display device may include a protective film on one or both sides of each polarizing plate. Further, the liquid crystal display device may include an optical compensation layer between the polarizing plate on the visual side and the liquid crystal cell substrate, and may include an optical compensation layer between the polarizing plate on the light source side and the liquid crystal cell substrate. The organic EL display device further includes: a polarizing plate on the visual side; a phase difference film for antireflection (e.g., λ/4 plate, etc.); an organic EL element. In such a display device, the position where the touch sensor member is provided is not particularly limited. For example, in the liquid crystal display device, the touch sensor member may be provided at a position (external hanging type) of the liquid crystal display device outside (visual side) of the polarizing plate on the visual side.

In a specific example of the liquid crystal display device of the external type, when the touch sensor substrate is an optically isotropic film, the liquid crystal display device may include, in order: a liquid crystal cell, an optical compensation layer, an optional protective film, a visual-side polarizing plate, an optional protective film, a retardation layer, and a touch sensor member. In this liquid crystal display device, the combination of the polarizing plate on the visual side and the retardation layer can function as a circular polarizing plate.

In another specific example, when the touch sensor substrate is an optically anisotropic film, the liquid crystal display device may include, in order: a liquid crystal cell, an optical compensation layer, an optional protective film, a visual-side polarizing plate, an optional optically isotropic film (protective film), and a touch sensor member. In this liquid crystal display device, the combination of the visual-side polarizing plate and the touch sensor member can function as a circular polarizing plate.

For example, the touch sensor member may be provided at a position (Mid-Cell type or On-Cell type) between the polarizing plate On the visual side of the liquid crystal display device and the liquid crystal Cell, or may be provided at a position (In-Cell type) On the inner side (opposite side of the display surface) of the liquid crystal Cell.

In a specific example, when the touch sensor substrate is an optically isotropic film, the liquid crystal display device may include, in order: a liquid crystal cell, an optical compensation layer, a touch sensor member, an optional protective film, a visual-side polarizing plate, an optional protective film, and a retardation layer. In this liquid crystal display device, the combination of the polarizing plate on the visual side and the retardation layer can function as a circular polarizing plate.

In another specific example, when the touch sensor substrate is an optically anisotropic film, the liquid crystal display device may include, in order: a liquid crystal cell, an optical compensation layer, a touch sensor member, an arbitrary protective film, a polarizing plate on the visual side, an arbitrary protective film, and an arbitrary optically isotropic film. In this liquid crystal display device, the combination of the visual-side polarizing plate and the touch sensor member can function as a circular polarizing plate.

In the case of the liquid crystal display device described above, the retardation layer may have ultraviolet-proof properties, if necessary. The retardation layer is preferably a retardation layer capable of functioning as a 1/4 wave plate. Preferable examples of the retardation layer include a resin film; a cured film of a composition containing a liquid crystal compound such as an anti-wavelength dispersive liquid crystal compound, a positive wavelength dispersive liquid crystal compound, or a flat dispersive liquid crystal compound; broadband 1/4 wave plates including a 1/2 wave plate and a 1/4 wave plate are combined.

Further, in the example of the above-described liquid crystal display device, the optical compensation layer can be, for example, a multilayer film that combines a negative B film and a positive B film; a multilayer film comprising a combination of a positive C film and a cured film of a composition containing an inverse wavelength dispersive liquid crystal compound, and the like.

For example, in the organic EL display device, the touch sensor member may be provided at a position (external hanging) of the organic EL display device on the outer side (visual side) of the polarizing plate on the visual side, as in the liquid crystal display device.

In a specific example of the external-hanging type organic EL display device, when the touch sensor substrate is an optically isotropic film, the organic EL display device may include, in order: an organic EL element, an antireflection functional layer, an optional protective film, a visual-side polarizing plate, an optional protective film, a retardation layer, and a touch sensor member. In this organic EL display device, the combination of the antireflection functional layer and the polarizing plate on the visual side can function as a circular polarizing plate, and the combination of the polarizing plate on the visual side and the retardation layer can also function as a circular polarizing plate.

Further, as another specific example, in the case where the touch sensor substrate is an optically anisotropic film, the plug-in type organic EL display device may include an organic EL element, an antireflection functional layer, an arbitrary protective film, a polarizing plate on the visual side, an arbitrary optically isotropic film (protective film), and a touch sensor member in this order. In this organic EL display device, the combination of the antireflection functional layer and the visual-side polarizing plate may function as a circular polarizing plate, and the combination of the visual-side polarizing plate and the touch sensor member may also function as a circular polarizing plate.

For example, the touch sensor member may be provided at a position (In-Cell type or Mid-Cell type) between the polarizing plate on the visual side of the organic EL display device and the organic EL element.

In a specific example, when the touch sensor substrate is an optically isotropic film, the organic EL display device may include, in order: an organic EL element, an antireflection functional layer, a touch sensor member, an arbitrary protective film, a polarizing plate on the visual side, an arbitrary protective film, and a retardation layer. In this organic EL display device, the combination of the antireflection functional layer and the polarizing plate on the visual side can function as a circular polarizing plate, and the combination of the polarizing plate on the visual side and the retardation layer can also function as a circular polarizing plate.

Further, as another specific example, in the case where the touch sensor substrate is an optically anisotropic film, the organic EL display device may include, in order: an organic EL element, a touch sensor member, an optional protective film, a visual-side polarizing plate, an optional protective film, and a retardation layer. In this organic EL display device, the combination of the touch sensor member and the polarizing plate on the visual side may function as a circular polarizing plate, and the combination of the polarizing plate on the visual side and the retardation layer may also function as a circular polarizing plate.

In the above example of the organic EL display device, the retardation layer may have ultraviolet-proof performance, if necessary. The retardation layer is preferably a retardation layer capable of functioning as a 1/4 wave plate. A preferable example of the retardation layer is the same as that in a liquid crystal display device.

In the case of the organic EL display device, the antireflection layer may be the same as the optical compensation layer in the liquid crystal display device. The antireflection functional layer may be, for example, the same layer as the retardation layer, and among them, a layer capable of functioning as a 1/4 wave plate is preferable.

Examples

Hereinafter, the present invention will be specifically described with reference to examples. However, the present invention is not limited to the embodiments described below, and can be arbitrarily modified and implemented within the scope of the claims and their equivalents. In the following description, "%" and "parts" representing amounts are weight standards unless otherwise specified. The operation described below is performed in the atmosphere at normal temperature and normal pressure unless otherwise described.

[ evaluation method ]

[ method of measuring glass transition temperature ]

The sample heated to 300℃under a nitrogen atmosphere was rapidly cooled with liquid nitrogen, and the glass transition temperature of the sample was measured by heating at 10℃per minute using a Differential Scanning Calorimeter (DSC).

[ method for measuring transmittance of touch sensor substrate ]

A plurality of measurement points (14 points in the examples and comparative examples described later) arranged at 100mm intervals are set in the width direction of the touch sensor substrate. The touch sensor substrate was cut out in a square (1 side 50 mm) with each measurement point as the center, to obtain 14 sample pieces. Using these sample pieces, the transmittance of each measurement point at a measurement wavelength of 380mm was measured. The transmittance was measured using an ultraviolet-visible near-infrared spectrophotometer (Japanese Spectroscopy Co., ltd. "V-7200"). The measurement results at 14 were averaged to calculate an average transmittance. Furthermore, the standard deviation σ of the measurement result at 14 obtained is calculated.

[ method for measuring delay of touch sensor substrate ]

The in-plane retardation and the retardation in the thickness direction of each measurement point located at the center of the sample piece were measured using 14 sample pieces for measuring the transmittance. This measurement was performed using a phase difference measuring instrument (KOBRA-21 ADH, manufactured by prince measuring Co., ltd.) at a measurement wavelength of 550 nm. The measurement results at 14 were averaged, and an average value of in-plane delays and an average value of delays in the thickness direction of the touch sensor substrate were calculated.

[ method for measuring the overall thickness of a touch sensor substrate ]

The overall thickness D of the touch sensor substrate is measured using a contact thickness gauge.

[ method of measuring the thickness ratio of Nuclear layer ]

The ultraviolet absorbers used in production examples 1 to 4 were used to produce a known concentration C ₀ (%) and a known thickness d ₀ (μm) a monolayer film. Measuring the transmittance T of the single-layer film at the wavelength of 380nm ₁ (%) and the following. Based on the measured transmittance T ₁ Concentration C of ultraviolet absorber of monolayer film ₀ Thickness d ₀ The concentration absorbance coefficient ε of the ultraviolet absorber at 380nm was calculated by the following formula (A) of Lambert-beer's law.

The laser beam absorber used in production example 5 was not substantially absorbed in the ultraviolet region. Therefore, the concentration absorbance of the additive mixture system containing the ultraviolet absorber and the laser absorber used in production example 5 was also regarded as the same value as epsilon obtained previously.

[ 1]

A resin having the same composition as the resin for forming a core layer used in each of examples and comparative examples was prepared except that the resin did not contain an ultraviolet absorber or a laser absorber. The resin prepared in this way and containing no ultraviolet absorber or laser absorber was used to prepare a resin A single layer film of known thickness. Measuring the transmittance T of the single-layer film ₀ . In addition, the thickness of the single-layer film should in principle be consistent with the overall thickness D of the touch sensor substrate in each of the examples and comparative examples. However, the norbornene-based polymer used in each of the examples and comparative examples has a transmittance at 380nm to the same extent in the range of the entire thickness D (specifically, 25 μm to 55 μm) of the touch sensor substrate in each of the examples and comparative examples. Therefore, in the examples and comparative examples shown in the present specification, the transmittance of a single-layer film having the same thickness as the overall thickness D of the touch sensor substrate in each of the examples and comparative examples is approximately the transmittance T of a single-layer film having a known thickness ₀ 。

Further, the transmittance T of the touch sensor base material obtained in each example and comparative example was measured. Then, using the measured transmittance T, the thickness d of the core layer contained in the touch sensor substrate is calculated by the following formula (B) _c . In the formula (B), C represents the concentration (wt%) of the ultraviolet absorber in the resin for forming the core layer, T represents the transmittance (%) of the touch sensor substrate, epsilon represents the concentration absorbance coefficient, and d _c The thickness (μm) of the core layer of the touch sensor substrate is shown.

[ 2]

Using the overall thickness D of the touch sensor substrate and the thickness D of the core layer calculated by formula (B) _c Obtaining the thickness d of the nuclear layer _c Relative to the combined thickness of the first skin layer and the second skin layer (D-D _c ) Ratio d of (2) _c /(D-d _c )。

Here, the transmittance was measured at 380nm, and an ultraviolet-visible-near-infrared spectrophotometer (Japanese Specification Co., ltd. "V-7200") was used as a device for measuring the transmittance.

(evaluation method of fish eyes)

The number of fish eyes of the obtained film was measured by an optical surface inspection device (LSC-6000, MEC Co., ltd.)The amounts were counted. Counting the number of fish eyes within 4000m of the film length, calculating every 1m ² Is a number of (3). According to every 1m ² The number of fish eyes was evaluated.

[ method for evaluating laser processability of touch sensor substrate ]

The touch sensor substrates manufactured in examples or comparative examples were placed on a glass plate (thickness 1.5 mm) as evaluation samples. CO with a wavelength of 9.4 μm is irradiated to the touch sensor substrate ₂ And (5) laser. The output power of the laser was adjusted so that the portion of the evaluation sample other than the glass plate could be cut off. Specifically, the output power of the laser beam is initially set to be low, and the laser beam irradiation is stopped at a point at which the portion of the evaluation sample other than the glass plate can be cut or at a point at which the glass plate breaks. After the laser light was irradiated as described above, the evaluation sample was visually observed and evaluated according to the following criteria.

"A": the portion of the evaluation sample other than the glass plate can be cut without damaging the glass plate, and the cut surface is flat and in a good cut state.

"B": the evaluation sample cannot be cut off, or the glass plate breaks.

[ method of measuring ultimate stress Change Rate ]

(description of the jig)

Fig. 8 is a perspective view schematically showing a jig 400 used in the examples and comparative examples. Fig. 8 shows a state in which the jig 400 is cut by a plane perpendicular to the extending direction of the jig 400. As shown in fig. 8, the jig 400 is a columnar jig having a curved surface 410 as a side surface thereof. The curved surface 410 of the jig 400 has a shape in a cross section 420 cut using a plane perpendicular to the extending direction of the jig 400: by "(x/100) ² +(y/40) ² A part of an ellipse represented by =1″ (a part where 0 mm.ltoreq.x.ltoreq.100 mm, 0 mm.ltoreq.y.ltoreq.40 mm).

(description of method for measuring ultimate stress before test)

The touch sensor substrate was cut into a rectangular shape of 10mm×100mm to obtain test pieces. The test piece has a length of 10mm and a length of 100mm, and the test piece has a length of 10mm and a length of 100 mm.

The flexural modulus Eb (MPa) of the test piece was measured based on JIS K7171. The test piece is bent along the curved surface 410 with the end 430 of the curved surface 410 of the jig 400 having a small curvature as a starting point. That is, the test piece was brought into contact with the end 430 shown by an ellipse (x=0 mm, y=40 mm) indicating the shape of the curved surface 410, and bent for 5 hours so as to be rolled on the curved surface 410 while maintaining contact with the end 430.

In the bent test piece, the deformation continuously changes along the curvature of the ellipse, and therefore, it is possible to evaluate how much stress is generated by measuring the position where the crack is generated. Therefore, using the position at which the crack is generated, the distance L (cm) of the end 430 on the ellipse as the starting point, and the thickness D (cm) of the test piece, the strain E (-) is calculated according to the following formula (C).

E＝0.02×(1-0.0084×L ² ) ^-3/2 ×D (C)

Then, the obtained strain E was multiplied by the flexural modulus Eb of the test piece to obtain the ultimate stress (kPa) before the test. The higher the ultimate stress, the less prone to cracking. However, in both the examples and the comparative examples, no crack was generated in the test piece before the test. Therefore, in each of examples and comparative examples, deformation E before the test was determined assuming that l=10 cm.

((A) description of the method for measuring ultimate stress after test under the condition)

Before measuring the flexural modulus Eb and deformation E, the test piece was immersed in a 10% strength aqueous hydrochloric acid solution at 25.+ -. 2 ℃ for 1 hour (test under the condition of A). Except for this, the measurement of the limit stress after the test under the condition (a) was performed by the same operation as described above (description of the method of measuring the limit stress before the test).

The rate of change of the limiting stress based on the test under the condition (A) was calculated by dividing the difference between the limiting stress after the test under the condition (A) and the limiting stress before the test by the limiting stress before the test. In addition, in the case where no crack is generated, the rate of change is 0%.

((B) description of the method for measuring ultimate stress after test under the condition)

Before measuring the flexural modulus Eb and deformation E, the test piece was immersed in a 5% strength aqueous sodium hydroxide solution at 25.+ -. 2 ℃ for 1 hour (test under the condition of B). Except for this, the measurement of the limit stress after the test under the condition (B) was performed by the same operation as described above (description of the method of measuring the limit stress before the test).

The rate of change of the limiting stress based on the test under the condition (B) was calculated by dividing the difference between the limiting stress after the test under the condition (B) and the limiting stress before the test by the limiting stress before the test. In addition, in the case where no crack is generated, the rate of change is 0%.

[ method of measuring Heat shrinkage ]

The touch sensor substrate was cut into a square of 150mm×150mm at room temperature of 23 ℃ to obtain a sample film. Of the four sides of the sample film, both sides are parallel to the width direction of the touch sensor substrate, and both sides are parallel to the length direction of the touch sensor substrate. Thereafter, the sample film was allowed to stand in an environment at 145℃for 60 minutes ((C) test). After that, the sample film was cooled to 23 ℃ (room temperature). The lengths L1 (mm) and L2 (mm) of the four sides of the cooled sample film parallel to the direction in which the heat shrinkage S was to be measured were measured. Based on the measured lengths L1, L2, the heat shrinkage S in the measurement direction is calculated according to the following equation (D).

Heat shrinkage S (%) = [ (300-L1-L2)/300 ] ×100 (D)

Production example 1 production of thermoplastic resin (J1)

Pellets of a thermoplastic resin (J0) which is a non-crystalline norbornene-based polymer (manufactured by japan rayleigh corporation, glass transition temperature tg=126℃) were dried at 100 ℃ for 5 hours. 100 parts of the dried pellets and 10.0 parts of a benzotriazole-based ultraviolet absorber (LA-31, manufactured by ADEKA Co., ltd.) were mixed by a twin-screw extruder. The obtained mixture was charged into a hopper connected to a single-screw extruder, and melt-extruded from the single-screw extruder to obtain a thermoplastic resin (J1). The thermoplastic resin (J1) had a content of an ultraviolet absorber of 9.1% by weight and a glass transition temperature Tg of 117 ℃.

Production example 2 production of thermoplastic resin (J2)

The amount of the benzotriazole-based ultraviolet absorber (LA-31, manufactured by ADEKA Co., ltd.) was changed to 12.0 parts. The same operations as in production example 1 were performed except for the above, to obtain a thermoplastic resin (J2). The thermoplastic resin (J2) had a content of an ultraviolet absorber of 10.7% by weight and a glass transition temperature Tg of 114 ℃.

Production example 3 production of thermoplastic resin (J3)

The amount of the benzotriazole-based ultraviolet absorber (LA-31, manufactured by ADEKA Co., ltd.) was changed to 7.5 parts. The same operations as in production example 1 were performed except for the above, to obtain a thermoplastic resin (J3). The thermoplastic resin (J3) had a content of an ultraviolet absorber of 7.0% by weight and a glass transition temperature Tg of 119 ℃.

PREPARATION EXAMPLE 4 preparation of thermoplastic resin (J4)

The amount of the benzotriazole-based ultraviolet absorber (LA-31, manufactured by ADEKA Co., ltd.) was changed to 5.5 parts. The same operations as in production example 1 were performed except for the above, to obtain a thermoplastic resin (J4). The thermoplastic resin (J4) had a content of an ultraviolet absorber of 5.2% by weight and a glass transition temperature Tg of 121 ℃.

PREPARATION EXAMPLE 5 preparation of thermoplastic resin (J5)

The type of the particles of the amorphous norbornene-based polymer was changed to an amorphous norbornene-based polymer having a glass transition temperature Tg of 163 ℃.

The amount of the benzotriazole-based ultraviolet absorber (LA-31, manufactured by ADEKA Co., ltd.) was changed to 12.0 parts.

Further, the norbornene polymer and the benzotriazole ultraviolet absorber were combined, and 5.0 parts of a laser absorber (pentaerythritol tetrabenzoate having a molecular weight of 552, a melting point of 102.0 to 106.0 ℃ C., a compound capable of absorbing laser light having a wavelength in the range of 9 μm to 11 μm) was further mixed to obtain a mixture.

The same operations as in production example 1 were performed except for the above, to obtain a thermoplastic resin (J5). The thermoplastic resin (J5) had a content of an ultraviolet absorber of 10.3% by weight and a glass transition temperature Tg of 126 ℃.

Production example 6 production of hard coating agent for Forming photosensitive resin layer

To 100 parts by weight of an antimony pentoxide methyl isobutyl ketone sol (solid content: 40% of catalyst formation industry Co., ltd.), 10 parts by weight of UV-curable urethane acrylate (Japanese synthetic chemical industry Co., ltd. "Violet UV 7640B"), 0.4 parts by weight of a photopolymerization initiator (Ciba-Geigy Co., ltd. "Irgacure-184") and 0.2 parts by weight of a fluorinated alkyl oligomer (Japanese ink chemical industry Co., ltd. "MEGAFAC F470") were mixed to obtain a UV-curable hard coating agent.

Example 1

A twin-screw type uniaxial extruder (diameter d=50 mm of screw, ratio L/d=32 of effective length L of screw to diameter D of screw) equipped with a polymer filter having a leaf disk shape with a mesh of 3 μm was prepared. The thermoplastic resin (J1) obtained in production example 1 was introduced into the single-screw extruder as a resin for forming a core layer, and melted. Then, the molten thermoplastic resin (J1) was fed to the multi-manifold die under conditions of an extruder outlet temperature of 265℃and a rotational speed of 10rpm of a gear pump of the extruder. The die lip of the multi-manifold die had a surface roughness Ra of 0.1 μm.

On the other hand, a uniaxial extruder having a polymer filter in the shape of a leaf disk with a mesh of 3 μm was prepared (diameter d=50 mm of screw, ratio L/d=32 of effective length L of screw to diameter D of screw). Particles of a non-crystalline norbornene polymer (glass transition temperature tg=163℃ manufactured by japan rayleigh) dried at 100 ℃ for 5 hours were introduced into the single-screw extruder as a thermoplastic resin (J6) for forming the first skin layer and the second skin layer, and melted. Then, the molten thermoplastic resin (J6) was fed to the multi-manifold die at an extruder outlet temperature of 290℃and a rotational speed of 4rpm of a gear pump of the extruder.

Next, the thermoplastic resin (J1) and the thermoplastic resin (J6) in the molten state were co-extruded from a multi-manifold die at a die temperature of 277 ℃ so as to be discharged into a film shape of three layers including a layer of the first skin layer forming resin, a layer of the core layer forming resin, and a layer of the second skin layer forming resin. Then, the extruded thermoplastic resin (J1) and thermoplastic resin (J6) were cast on a cooling roll having a temperature adjusted to 150 ℃ to obtain a multilayer film composed of two three layers of "a first skin layer formed of thermoplastic resin (J6)/" a core layer formed of thermoplastic resin (J1)/"a second skin layer formed of thermoplastic resin (J6)". The multilayer film composed of two three layers means a film having a three-layer structure composed of two resins. The resulting multilayer film had a width of 1450mm and a thickness of 55. Mu.m. In the coextrusion, the air gap amount is set to 50mm, and as a method of casting the film-like resin in a molten state onto the cooling roll, edge-fixing (backing-up) is used. The thus obtained multilayer film was trimmed at both ends in the width direction by 50mm to obtain a long touch sensor substrate having a width of 1350mm and a length of 4000 m.

The obtained touch sensor substrate was evaluated in the manner described above.

Example 2

The thermoplastic resin (J2) obtained in production example 2 was used as the resin for forming a core layer instead of the thermoplastic resin (J1) obtained in production example 1. In addition, the conditions during coextrusion are adjusted to change the thickness of each layer included in the touch sensor substrate.

Except for the above, the touch sensor substrate was manufactured and evaluated in the same manner as in example 1.

Example 3

The thermoplastic resin (J5) obtained in production example 5 was used as the resin for forming a core layer instead of the thermoplastic resin (J1) obtained in production example 1. In addition, the conditions during coextrusion are adjusted to change the thickness of each layer included in the touch sensor substrate.

Example 4

The conditions during coextrusion were adjusted to change the thickness of each layer contained in the touch sensor substrate.

Example 5

Example 6

The touch sensor substrate obtained in example 1 was stretched in an oblique direction at an angle of 45 ° to the longitudinal direction of the touch sensor substrate. The stretching was performed under conditions of a stretching temperature of 180℃and a stretching ratio of 2.0 times. The stretched touch sensor substrate was evaluated in the manner described above.

Comparative example 1

The thermoplastic resin (J3) obtained in production example 3 was used as the resin for forming a core layer instead of the thermoplastic resin (J1) obtained in production example 1. In addition, as the resin for forming the first skin layer and the resin for forming the second skin layer, a thermoplastic resin (J0) is used instead of the thermoplastic resin (J6). Except for the above, the touch sensor substrate was manufactured and evaluated in the same manner as in example 1.

Comparative example 2

The thermoplastic resin (J3) obtained in production example 3 was used as the resin for forming a core layer instead of the thermoplastic resin (J1) obtained in production example 1.

Comparative example 3

The thermoplastic resin (J4) obtained in production example 4 was used as the resin for forming a core layer instead of the thermoplastic resin (J1) obtained in production example 1. In addition, the conditions during coextrusion are adjusted to change the thickness of each layer included in the touch sensor substrate.

[ results of examples 1 to 6 and comparative examples 1 to 3]

The results of examples 1 to 6 and comparative examples 1 to 3 are shown in the following table. In the following table, the abbreviations have the following meanings.

UVA amount: concentration of uv absorber in the resin.

UV transmittance: the average transmittance of the touch sensor substrate in the width direction at a wavelength of 380 nm.

Standard deviation of transmittance: standard deviation of transmittance of 380nm wavelength in the width direction of the touch sensor substrate.

Average Re: an average of in-plane delays of the touch sensor substrate.

Average Rth: and (3) averaging the delays in the thickness direction of the touch sensor substrate.

TABLE 1

TABLE 1 results for examples 1-6

TABLE 2

Table 2 results of comparative examples 1 to 3

Example 7

The long touch sensor substrate manufactured in example 1 was cut into a square with 50mm four sides, to obtain a substrate sheet. The UV curable hard coat agent obtained in production example 6 was applied as a photosensitive resin to both sides of the substrate sheet thus obtained. Thereafter, ultraviolet rays are irradiated to cure the photosensitive resin, thereby forming a hard coat layer as the first photosensitive resin layer and the second photosensitive resin layer. The thickness of the hard coat layers formed was 3 μm each.

Indium tin oxide layers (ITO layers) as a first conductive layer and a second conductive layer are formed on the surfaces of the two hard coat layers by a sputtering method. An ITO layer with an optical film thickness of 40nm was formed on the entire surface of the hard coat layer.

Next, a negative photosensitive resin (APR-K11, manufactured by asahi chemical industry) as a photoresist was coated on the two ITO layers, and negative photosensitive resin layers as a first resist layer and a second resist layer were formed. Thus, a multilayered intermediate including a negative photosensitive resin layer, an ITO layer, a hard coat layer, a base sheet, a hard coat layer, an ITO layer, and a negative photosensitive resin layer in this order in the thickness direction was obtained.

Next, two negative photosensitive resin layers of the multilayer intermediate were each subjected to a cumulative light amount of 400mJ/cm with a photomask having a different pattern shape interposed therebetween ² Is exposed simultaneously with the ultraviolet rays of (a).

Next, the two negative photosensitive resin layers are developed to remove the negative photosensitive resin except the exposed portion, and a resist pattern is formed on the negative photosensitive resin layer.

Next, the portions of the ITO layer not covered by the negative photosensitive resin layer are etched by performing etching treatment on both sides of the multilayer intermediate.

Then, the negative photosensitive resin remaining on the surface of the ITO layer is removed. Thus, a touch sensor member including a patterned ITO layer, a hard coat layer, a base material sheet, a hard coat layer, and a patterned ITO layer in this order in the thickness direction was obtained.

The pattern shapes formed on both sides of the obtained touch sensor member were observed with a microscope. When the observation result is that the pattern accuracy is maintained completely, the pattern accuracy is judged to be "o", when the pattern accuracy is partially broken, the pattern accuracy is judged to be "Δ", and when the pattern accuracy is completely broken, the pattern accuracy is judged to be "x".

Example 8

The same operations as in example 7 were performed except that the touch sensor substrate manufactured in example 2 was used instead of the touch sensor substrate manufactured in example 1, and the manufacturing and evaluation of the touch sensor member were performed.

Example 9

The same operations as in example 7 were performed except that the touch sensor substrate manufactured in example 3 was used instead of the touch sensor substrate manufactured in example 1, and the manufacturing and evaluation of the touch sensor member were performed.

Comparative example 4

The same operations as in example 7 were performed except that the touch sensor substrate manufactured in comparative example 1 was used instead of the touch sensor substrate manufactured in example 1, and the manufacturing and evaluation of the touch sensor member were performed.

Comparative example 5

The same operations as in example 7 were performed except that the touch sensor substrate manufactured in comparative example 3 was used instead of the touch sensor substrate manufactured in example 1, and the manufacturing and evaluation of the touch sensor member were performed.

[ results of examples 7 to 9 and comparative examples 4 to 5]

The results of examples 7 to 9 and comparative examples 4 to 5 are shown in the following table.

TABLE 3

TABLE 3 results for examples 7-9 and comparative examples 4-5

From this result, it is known that: the smaller the average transmittance of the touch sensor substrate, the less the effect on the pattern accuracy on the opposite side due to the two-sided exposure; the larger the average transmittance, the greater the effect on the pattern accuracy on the opposite side due to the double-sided exposure. In addition, in the touch sensor substrate with many fish eyes, it is not preferable from the viewpoint of foreign matter.

Description of the reference numerals

100: a touch sensor substrate; 110: a first skin layer; 120: a core layer; 130: a second skin layer; 200: a touch sensor component; 210: a first conductive layer; 220: a substrate; 220D, 220U: a surface of the substrate; 230: a second conductive layer; 310: a first resist layer; 320: a second resist layer; 330: a pattern mask; 340: a pattern mask; 400: a clamp; 410: a curved surface; 420: a section plane; 430: the end of the curved surface.

Claims

1. A touch sensor substrate is an elongated touch sensor substrate, wherein,

the ratio of the thickness of the core layer to the total thickness of the first skin layer and the second skin layer is 1.0 or less,

Tg(s1)-Tg(c)＞15℃ (1)

Tg(s2)-Tg(c)＞15℃ (2)

2. The touch sensor substrate of claim 1, wherein,

the standard deviation of the transmittance of the touch sensor substrate in the width direction at a wavelength of 380nm is 0.02% or less.

3. The touch sensor substrate according to claim 1 or 2, wherein,

the glass transition temperature Tg (C) of the thermoplastic resin C, the glass transition temperature Tg (S1) of the thermoplastic resin S1, and the glass transition temperature Tg (S2) of the thermoplastic resin S2 satisfy the following formulas (3) and (4),

Tg(s1)-Tg(c)＞30℃ (3)

Tg(s2)-Tg(c)＞30℃ (4)。

4. The touch sensor substrate according to claim 1 or 2, wherein,

the heat shrinkage rate in the longitudinal direction and the heat shrinkage rate in the width direction of the touch sensor substrate after the test under the following condition (C) are both within + -0.1%,

(A) Conditions are as follows: the touch sensor substrate was immersed in a 10% strength aqueous hydrochloric acid solution at 25 ℃ ± 2 ℃ for 1 hour,

(B) Conditions are as follows: the touch sensor substrate was immersed in a 5% strength aqueous sodium hydroxide solution at 25 c + 2 c for 1 hour,

5. The touch sensor substrate according to claim 1 or 2, wherein,

the thickness of the touch sensor substrate is 20 [ mu ] m or more and 60 [ mu ] m or less.

6. The touch sensor substrate according to claim 1 or 2, wherein,

the touch sensor substrate has an in-plane retardation of 85nm to 150nm in a wavelength of 550 nm.

7. The touch sensor substrate according to claim 1 or 2, wherein,

the touch sensor substrate is a tilt stretched film.

8. The touch sensor substrate according to claim 1 or 2, wherein,

the touch sensor substrate has an in-plane retardation of 0nm to 10nm in a wavelength of 550 nm.

9. The touch sensor substrate according to claim 1 or 2, wherein,

the thermoplastic resin S1 forming the first skin layer, the thermoplastic resin S2 forming the second skin layer, and the thermoplastic resin C forming the core layer include polymers containing alicyclic structures.

10. The touch sensor substrate according to claim 1 or 2, wherein,

the thermoplastic resin S1 forming the first skin layer, the thermoplastic resin S2 forming the second skin layer, and the thermoplastic resin C forming the core layer contain norbornene-based polymers.

11. The touch sensor substrate according to claim 1 or 2, wherein,

the thermoplastic resin C contains a laser absorber.

12. The touch sensor substrate of claim 11, wherein,

the laser absorber is a compound capable of absorbing laser light having a wavelength in the range of 9 to 11 μm.

13. A method for manufacturing a touch sensor substrate according to any one of claims 1 to 12, wherein,

the temperature of the mold is 150 ℃ or higher than the glass transition temperature Tg (C) of the thermoplastic resin C, 100 ℃ or higher than the glass transition temperature Tg (S1) of the thermoplastic resin S1, and 100 ℃ or higher than the glass transition temperature Tg (S2) of the thermoplastic resin S2.

14. A touch sensor component comprising, in order:

a first conductive layer;

a substrate selected from the touch sensor substrate of any one of claims 1 to 12 and a substrate sheet cut from the touch sensor substrate; and

and a second conductive layer.

15. The touch sensor assembly of claim 14, wherein,

a first photosensitive resin layer is included between the substrate and the first conductive layer,

a second photosensitive resin layer is included between the substrate and the second conductive layer.

16. A method of manufacturing a touch sensor component, comprising:

a step of forming a first conductive layer on one surface of a substrate selected from the touch sensor substrate according to any one of claims 1 to 12 and a substrate sheet cut out from the touch sensor substrate;

Forming a second conductive layer on the other surface of the base material;

exposing the first resist layer and the second resist layer simultaneously with ultraviolet rays through a pattern mask;

a step of removing the first resist layer covering the first conductive layer; and

and removing the second resist layer covering the second conductive layer.

17. A display device comprising the touch sensor assembly of claim 14 or 15.