TWI799158B - Retardation film, circular polarizing plate and manufacturing method of retardation film - Google Patents

Retardation film, circular polarizing plate and manufacturing method of retardation film Download PDF

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TWI799158B
TWI799158B TW111107145A TW111107145A TWI799158B TW I799158 B TWI799158 B TW I799158B TW 111107145 A TW111107145 A TW 111107145A TW 111107145 A TW111107145 A TW 111107145A TW I799158 B TWI799158 B TW I799158B
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retardation
film
polarizing plate
heating
retardation film
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TW202223460A (en
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鈴木暢
角村浩
高松秀行
清水享
柳沼寛教
友久寛
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日商日東電工股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C55/00Shaping by stretching, e.g. drawing through a die; Apparatus therefor
    • B29C55/02Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets
    • B29C55/04Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets uniaxial, e.g. oblique
    • B29C55/06Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets uniaxial, e.g. oblique parallel with the direction of feed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C55/00Shaping by stretching, e.g. drawing through a die; Apparatus therefor
    • B29C55/02Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets
    • B29C55/04Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets uniaxial, e.g. oblique
    • B29C55/08Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets uniaxial, e.g. oblique transverse to the direction of feed
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Polarising Elements (AREA)
  • Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

本發明提供一種可抑制高溫高濕環境下之相位差值之變化之相位差膜。本發明之製造方法係獲得面內相位差滿足Re(450)<Re(550)之關係之相位差膜之製造方法,其包含將延伸膜於105℃以上之溫度下加熱2分鐘以上之加熱處理步驟,該延伸膜於將自30℃升溫至Tg-25℃並再次冷卻至30℃之步驟反覆進行3個循環之加熱TMA試驗中,遲相軸方向之收縮率為0.4%以下,或者於使環境按25℃/25%RH、85℃/2%RH、85℃/85%RH、85℃/2%RH之順序變化之加濕TMA試驗中,遲相軸方向之收縮率為0.7%以下。The invention provides a retardation film capable of suppressing the change of the retardation value in a high-temperature and high-humidity environment. The production method of the present invention is a production method for obtaining a retardation film whose in-plane retardation satisfies the relationship of Re(450)<Re(550), which includes heating the stretched film at a temperature above 105°C for 2 minutes or more step, the stretched film is heated from 30°C to Tg-25°C and then cooled to 30°C for 3 cycles of heating TMA test, the shrinkage rate in the direction of the slow axis is 0.4% or less, or when using In the humidified TMA test where the environment is changed in the order of 25°C/25%RH, 85°C/2%RH, 85°C/85%RH, 85°C/2%RH, the shrinkage rate in the slow axis direction is less than 0.7% .

Description

相位差膜、圓偏光板及相位差膜之製造方法Retardation film, circular polarizing plate and manufacturing method of retardation film

本發明係關於一種相位差膜、圓偏光板及相位差膜之製造方法。The invention relates to a retardation film, a circular polarizing plate and a manufacturing method of the retardation film.

近年來,隨著薄型顯示器之普及,提出一種搭載了有機EL(Electroluminescence,電致發光)面板之顯示器。有機EL面板具有反射性較高之金屬層,容易發生外界光反射或背景之映入等問題。因此,已知藉由將具有λ/4板之圓偏光板設置於視認側而防止該等問題。 另外,關於用於上述圓偏光板之相位差膜,通常相位差值根據波長之不同而不同,根據波長之不同,有時無法獲得充分之抗反射效果,導致褪色成為問題。因此,提出一種波長越長則相位差值越大之所謂逆分散性之相位差膜(例如,專利文獻1)。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特開2006-171235號公報 In recent years, with the popularity of thin displays, a display equipped with an organic EL (Electroluminescence, electroluminescence) panel has been proposed. The organic EL panel has a highly reflective metal layer, which is prone to problems such as reflection of external light or reflection of the background. Therefore, it is known to prevent these problems by disposing a circular polarizing plate having a λ/4 plate on the viewing side. In addition, in the retardation film used for the above-mentioned circular polarizing plate, the retardation value generally varies depending on the wavelength, and depending on the wavelength, a sufficient antireflection effect may not be obtained, causing discoloration to become a problem. Therefore, a so-called inversely dispersed retardation film in which the retardation value becomes larger as the wavelength becomes longer has been proposed (for example, Patent Document 1). [Prior Art Literature] [Patent Document] [Patent Document 1] Japanese Patent Laid-Open No. 2006-171235

[發明所欲解決之問題] 然而,如上所述之先前之逆分散性之相位差膜存在於高溫環境下及/或高濕環境下使用時相位差值發生變化之情況,其結果為,存在產生相位差不均之情況。 本發明係為了解決上述先前之問題而成者,其主要目的在於提供一種高溫高濕環境下之相位差值之變化得到抑制之相位差膜、具有此種相位差膜之圓偏光板、及此種相位差膜之製造方法。 [解決問題之技術手段] 本發明之相位差膜之製造方法係獲得面內相位差滿足Re(450)<Re(550)之關係之相位差膜之製造方法,其包含將延伸膜於105℃以上之溫度下加熱2分鐘以上之加熱處理步驟,該延伸膜於將自30℃升溫至Tg-25℃並再次冷卻至30℃之步驟反覆進行3個循環之加熱TMA(Thermomechanical Analysis,熱機械分析)試驗中,遲相軸方向之收縮率為0.4%以下,或者於使環境按25℃/25%RH、85℃/2%RH、85℃/85%RH、85℃/2%RH之順序變化之加濕TMA試驗中,遲相軸方向之收縮率為0.7%以下。 於一實施形態中,將上述加熱處理步驟中之加熱溫度設為T 1(℃),將上述加熱處理步驟中之加熱時間設為t 1(分鐘),將上述加熱處理步驟前之上述延伸膜之於上述加熱TMA試驗中之上述收縮率設為A 1時,滿足10×t 1/{(Tg-T 1) 2×A 1 2}>2。 於一實施形態中,將上述加熱處理步驟中之加熱溫度設為T 1(℃),將上述加熱處理步驟中之加熱時間設為t 1(分鐘),將上述加熱處理步驟前之上述延伸膜之於上述加濕TMA試驗中之上述收縮率設為A 2時,滿足10×t 1/{(Tg-T 1) 2×A 2 2}>0.9。 本發明之相位差膜之製造方法係獲得面內相位差滿足Re(450)<Re(550)之關係之相位差膜之製造方法,其包含將延伸膜浸漬於60℃以上之溫水中3分鐘以上之溫水處理步驟,該延伸膜於使環境按25℃/25%RH、85℃/2%RH、85℃/85%RH、85℃/2%RH之順序變化之加濕TMA試驗中,遲相軸方向之收縮率為0.7%以下。 於一實施形態中,將上述溫水處理步驟中之浸漬時間設為t 2(分鐘),將上述溫水處理步驟前之上述延伸膜之於上述加濕TMA試驗中之上述收縮率設為A 3時,滿足t 2/A 3 2>20。 根據本發明之另一態樣,提供一種相位差膜。關於該相位差膜,面內相位差滿足Re(450)<Re(550)之關係,於將自30℃升溫至Tg-25℃並再次冷卻至30℃之步驟反覆進行3個循環之加熱TMA試驗中,遲相軸方向之收縮率為0.1%以下,且於使環境按25℃/25%RH、85℃/2%RH、85℃/85%RH、85℃/2%RH之順序變化之加濕TMA試驗中,遲相軸方向之收縮率為0.2%以下。 於一實施形態中,上述相位差膜係由選自聚碳酸酯樹脂及聚酯碳酸酯系樹脂中之樹脂形成。 於一實施形態中,上述相位差膜之Re(450)/Re(550)為0.8~0.9。 於一實施形態中,上述相位差膜之光彈性係數為1×10 -12(m 2/N)~40×10 -12(m 2/N)。 根據本發明之另一態樣,提供一種圓偏光板。該圓偏光板具有包含上述相位差膜之相位差層、及偏光元件,上述相位差層之遲相軸與上述偏光元件之吸收軸所成之角度為35°~55°。 於一實施形態中,上述圓偏光板為單片狀,將上述相位差層之中心部之面內相位差值設為R A0,將頂點部分之面內相位差值設為R B0,將在兩面貼合玻璃並於85℃下保持240小時之後之上述相位差層之中心部之面內相位差值設為R A1,將在兩面貼合玻璃並於85℃下保持240小時之後之上述頂點部分之面內相位差值設為R B1,將在兩面貼合玻璃並於65℃/90%RH下保持240小時之後之上述相位差層之上述中心部之面內相位差值設為R A2,將在兩面貼合玻璃並於65℃/90%RH下保持240小時之後之上述頂點部分之面內相位差值設為R B2時,(R A1-R B1)-(R A0-R B0)之絕對值為3 nm以下,且(R A2-R B2)-(R A0-R B0)之絕對值為3 nm以下。 於一實施形態中,上述圓偏光板依序具有保護膜、上述相位差層、上述偏光元件、及折射率橢球具有nz>nx=ny之關係之另一相位差層。 [發明之效果] 根據本發明之製造方法,藉由包含將於加熱TMA試驗中遲相軸方向之收縮率為0.4%以下,或者於加濕TMA試驗中遲相軸方向之收縮率為0.7%以下之延伸膜於105℃以上之溫度下加熱2分鐘以上之加熱處理步驟,可獲得一種高溫高濕環境下之相位差值之變化得到抑制之相位差膜。 [Problems to be Solved by the Invention] However, the above-mentioned conventional retardation films with reverse dispersion properties may change the retardation value when used in a high-temperature environment and/or a high-humidity environment. As a result, there is Uneven phase difference occurs. The present invention is made in order to solve the above-mentioned previous problems, and its main purpose is to provide a retardation film that suppresses the change of the retardation value under a high-temperature and high-humidity environment, a circular polarizing plate with such a retardation film, and the present invention. A method of manufacturing a retardation film. [Technical means to solve the problem] The manufacturing method of the retardation film of the present invention is a manufacturing method of obtaining a retardation film whose in-plane retardation satisfies the relation of Re(450)<Re(550), which comprises stretching the film at 105°C The heat treatment step of heating at the above temperature for more than 2 minutes, the stretched film is heated from 30°C to Tg-25°C and then cooled to 30°C again for 3 cycles of heating TMA (Thermomechanical Analysis, thermomechanical analysis ) test, the shrinkage rate in the slow axis direction is less than 0.4%, or in the order of 25°C/25%RH, 85°C/2%RH, 85°C/85%RH, 85°C/2%RH In the changing humidified TMA test, the shrinkage rate in the slow axis direction is 0.7% or less. In one embodiment, the heating temperature in the above heat treatment step is set as T 1 (°C), the heating time in the above heat treatment step is set as t 1 (minutes), and the stretched film before the above heat treatment step is When the above-mentioned shrinkage rate in the above-mentioned heating TMA test is A1 , it satisfies 10×t 1 /{(Tg-T 1 ) 2 ×A 1 2 }>2. In one embodiment, the heating temperature in the above heat treatment step is set as T 1 (°C), the heating time in the above heat treatment step is set as t 1 (minutes), and the stretched film before the above heat treatment step is When the aforementioned shrinkage rate in the aforementioned humidified TMA test is A 2 , 10×t 1 /{(Tg−T 1 ) 2 ×A 2 2 }>0.9 is satisfied. The manufacturing method of the retardation film of the present invention is a method of obtaining a retardation film whose in-plane retardation satisfies the relationship of Re(450)<Re(550), which includes immersing the stretched film in warm water above 60°C for 3 minutes In the warm water treatment step above, the stretched film is subjected to a humidified TMA test in which the environment is changed in the order of 25°C/25%RH, 85°C/2%RH, 85°C/85%RH, and 85°C/2%RH , The shrinkage rate in the slow axis direction is below 0.7%. In one embodiment, the immersion time in the warm water treatment step is t 2 (minutes), and the shrinkage ratio of the stretched film before the warm water treatment step in the humidified TMA test is A 3 , satisfy t 2 /A 3 2 >20. According to another aspect of the present invention, a retardation film is provided. Regarding the retardation film, the in-plane retardation satisfies the relationship of Re(450)<Re(550), and the heating TMA is repeated for 3 cycles in the steps of heating from 30°C to Tg-25°C and cooling to 30°C again. In the test, the shrinkage rate in the slow axis direction is less than 0.1%, and the environment is changed in the order of 25°C/25%RH, 85°C/2%RH, 85°C/85%RH, 85°C/2%RH In the humidified TMA test, the shrinkage rate in the slow axis direction is 0.2% or less. In one embodiment, the retardation film is formed of a resin selected from polycarbonate resins and polyester carbonate-based resins. In one embodiment, Re(450)/Re(550) of the retardation film is 0.8-0.9. In one embodiment, the photoelastic coefficient of the retardation film is 1×10 −12 (m 2 /N) to 40×10 −12 (m 2 /N). According to another aspect of the present invention, a circular polarizing plate is provided. The circular polarizing plate has a retardation layer comprising the above-mentioned retardation film and a polarizing element, and the angle formed by the retardation axis of the above-mentioned retardation layer and the absorption axis of the above-mentioned polarizing element is 35°-55°. In one embodiment, the above-mentioned circular polarizing plate is a single piece, and the in-plane retardation value of the center part of the above-mentioned retardation layer is set to R A0 , and the in-plane retardation value of the apex part is set to R B0 . The in-plane retardation value of the central part of the retardation layer after laminating glass on both sides and holding at 85°C for 240 hours is R A1 , and the above-mentioned vertex after laminating glass on both sides and holding at 85°C for 240 hours The partial in-plane retardation value is set to R B1 , and the in-plane retardation value of the above-mentioned central part of the above-mentioned retardation layer after laminating glass on both sides and maintaining at 65°C/90%RH for 240 hours is set to R A2 , when the in-plane retardation value of the above-mentioned vertex after laminating glass on both sides and keeping it at 65°C/90%RH for 240 hours is R B2 , (R A1 -R B1 )-(R A0 -R B0 ) is less than 3 nm in absolute value, and the absolute value of (R A2 -R B2 ) - (R A0 -R B0 ) is less than 3 nm. In one embodiment, the circular polarizing plate includes a protective film, the retardation layer, the polarizing element, and another retardation layer in which a refractive index ellipsoid has a relationship of nz>nx=ny in this order. [Effects of the Invention] According to the production method of the present invention, the shrinkage rate in the slow axis direction in the heating TMA test is 0.4% or less, or the shrinkage rate in the slow axis direction in the humidified TMA test is 0.7%. In the heat treatment step of heating the stretched film at a temperature above 105° C. for 2 minutes or more, a retardation film in which the change of the retardation value in a high-temperature and high-humidity environment is suppressed can be obtained.

以下,對本發明之實施形態進行說明,但本發明並不限定於該等實施形態。 (用語及記號之定義) 本說明書中之用語及記號之定義如下所述。 (1)折射率(nx、ny、nz) 「nx」係面內之折射率變得最大之方向(即,遲相軸方向)之折射率,「ny」係於面內與遲相軸正交之方向(即,進相軸方向)之折射率,「nz」係厚度方向之折射率。 (2)面內相位差(Re) 「Re(λ)」係23℃下之利用波長λ nm之光測得之面內相位差。例如,「Re(550)」係23℃下之利用波長550 nm之光測得之面內相位差。Re(λ)係將層(膜)之厚度設為d(nm)時,由式:Re=(nx-ny)×d求出。 (3)厚度方向之相位差(Rth) 「Rth(λ)」係23℃下之利用波長λ nm之光測得之厚度方向之相位差。例如,「Rth(550)」係23℃下之利用波長550 nm之光測得之厚度方向之相位差。Rth(λ)係將層(膜)之厚度設為d(nm)時,由式:Rth=(nx-nz)×d求出。 (4)Nz係數 Nz係數係由Nz=Rth/Re求出。 A.相位差膜之製造方法 本發明之製造方法係面內相位差滿足Re(450)<Re(550)之關係之表現出所謂逆分散之波長相依性之相位差膜之製造中所使用之製造方法。本發明之一實施形態之相位差膜之製造方法包含將延伸膜於105℃以上之溫度下加熱2分鐘以上之加熱處理步驟。上述延伸膜於將自30℃升溫至Tg-25℃並再次冷卻至30℃之步驟反覆進行3個循環之加熱TMA試驗中,遲相軸方向之收縮率為0.4%以下,或者於使環境按25℃/25%RH、85℃/2%RH、85℃/85%RH、85℃/2%RH之順序變化之加濕TMA試驗中,遲相軸方向之收縮率為0.7%以下。將加熱處理步驟中之加熱溫度設為T 1(℃),將加熱處理步驟中之加熱時間設為t 1(分鐘),將加熱處理步驟前之延伸膜之於加熱TMA試驗中之收縮率設為A 1時,較佳為滿足10×t 1/{(Tg-T 1) 2×A 1 2}>2。將加熱處理步驟前之延伸膜之於加濕TMA試驗中之收縮率設為A 2時,較佳為滿足10×t 1/{(Tg-T 1) 2×A 2 2}>0.9。 本發明之另一實施形態之相位差膜之製造方法包含將延伸膜浸漬於60℃以上之溫水中3分鐘以上之溫水處理步驟。上述延伸膜於使環境按25℃/25%RH、85℃/2%RH、85℃/85%RH、85℃/2%RH之順序變化之加濕TMA試驗中,遲相軸方向之收縮率為0.7%以下。將溫水處理步驟中之浸漬時間設為t 2(分鐘),將溫水處理步驟前之延伸膜之於加濕TMA試驗中之收縮率設為A 3時,較佳為滿足t 2/A 3 2>20。 於先前之製造方法中,根據構成相位差膜之材料之不同,而存在耐久性不充分,結果於高溫高濕環境下相位差值發生變化之情況。與此相對,根據本發明之製造方法,可不依存於構成相位差膜之材料而獲得耐久性較高且於高溫高濕環境下尺寸變化率(收縮率)較小之相位差膜。此種相位差膜可抑制高溫高濕環境下之相位差值之變化。 A-1.延伸膜 如上所述,延伸膜於將自30℃升溫至Tg-25℃並再次冷卻至30℃之步驟反覆進行3個循環之加熱TMA試驗中,遲相軸方向之收縮率為0.4%以下,或者於使環境按25℃/25%RH、85℃/2%RH、85℃/85%RH、85℃/2%RH之順序變化之加濕TMA試驗中,遲相軸方向之收縮率為0.7%以下。 代表性而言,延伸膜係藉由將樹脂膜向至少一個方向延伸而製作。 只要可藉由實施延伸處理而獲得表現出所謂逆分散之波長相依性之延伸膜(相位差膜),則樹脂膜由任意之適當之樹脂形成。作為形成樹脂膜之樹脂,例如可列舉:聚碳酸酯樹脂、聚乙烯醇縮醛樹脂、纖維素酯系樹脂、聚酯系樹脂、聚酯碳酸酯系樹脂。該等樹脂可單獨使用,亦可根據所需之特性而組合使用。 作為上述聚碳酸酯系樹脂,使用任意之適當之聚碳酸酯系樹脂。例如,較佳為包含來自二羥基化合物之結構單元之聚碳酸酯樹脂。作為二羥基化合物之具體例,可列舉:9,9-雙(4-羥基苯基)茀、9,9-雙(4-羥基-3-甲基苯基)茀、9,9-雙(4-羥基-3-乙基苯基)茀、9,9-雙(4-羥基-3-正丙基苯基)茀、9,9-雙(4-羥基-3-異丙基苯基)茀、9,9-雙(4-羥基-3-正丁基苯基)茀、9,9-雙(4-羥基-3-第二丁基苯基)茀、9,9-雙(4-羥基-3-第三丁基苯基)茀、9,9-雙(4-羥基-3-環己基苯基)茀、9,9-雙(4-羥基-3-苯基苯基)茀、9,9-雙(4-(2-羥基乙氧基)苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-甲基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-異丙基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-異丁基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-第三丁基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-環己基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-苯基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3,5-二甲基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-第三丁基-6-甲基苯基)茀、9,9-雙(4-(3-羥基-2,2-二甲基丙氧基)苯基)茀等。除了來自上述二羥基化合物之結構單元以外,聚碳酸酯樹脂亦可包含來自異山梨糖醇、異甘露糖醇、異艾杜糖醇、螺二醇、二㗁烷二醇、二乙二醇、三乙二醇、聚乙二醇、雙酚類等二羥基化合物之結構單元。 如上所述之聚碳酸酯樹脂之詳細內容例如記載於日本專利特開2012-67300號公報、日本專利第3325560號及WO2014/061677號中。該專利文獻之記載係作為參考而援用於本說明書中。 聚碳酸酯樹脂之玻璃轉移溫度(Tg)較佳為110℃以上且250℃以下,更佳為120℃以上且230℃以下。若玻璃轉移溫度過低,則處於耐熱性變差之傾向,存在膜成形後引起尺寸變化之可能性。若玻璃轉移溫度過高,則存在膜成形時之成形穩定性變差之情況,又,存在損害膜之透明性之情況。再者,玻璃轉移溫度係依據JIS K 7121(1987)而求出。 作為上述樹脂膜之形成方法,可採用任意之適當之方法。例如,可列舉:熔融擠出法(例如,T模成形法)、鑄塗法(例如,流延法)、壓延成形法、熱壓法、共擠出法、共熔融法、多層擠出、吹脹成形法等。較佳為使用T模成形法、流延法及吹脹成形法。 樹脂膜(未延伸膜)之厚度可根據所需之光學特性、下述延伸條件等而設定為任意之適當之值。較佳為50 μm~300 μm,更佳為80 μm~250 μm。 只要可獲得上述延伸膜,則上述延伸可採用任意之適當之延伸方向、延伸條件(例如,延伸溫度、延伸倍率、延伸方向)。具體而言,可單獨使用自由端延伸、固定端延伸-自由端收縮、固定端收縮等各種延伸方法,亦可同時或逐次使用該等延伸方法。關於延伸方向,亦可於水平方向、垂直方向、厚度方向、對角方向等各個方向或維度進行。延伸之溫度較佳為樹脂膜之玻璃轉移溫度(Tg)±20℃之範圍。 藉由適當選擇上述延伸方法、延伸條件,可最終獲得具有所需之光學特性(例如,折射率橢球、面內相位差、Nz係數)之相位差膜。 於一實施形態中,延伸膜係藉由將樹脂膜進行單軸延伸或固定端單軸延伸而製作。作為單軸延伸之具體例,可列舉一面使樹脂膜向長條方向移行,一面向長度方向(縱向)延伸之方法。延伸倍率較佳為10%~500%。 於另一實施形態中,延伸膜係藉由將長條狀之樹脂膜向相對於長條方向角度為θ之方向連續地斜向延伸而製作。藉由採用斜向延伸,可獲得具有相對於膜之長條方向角度為θ之配向角之長條狀之延伸膜,例如與偏光元件進行積層時可實行卷對卷,而可簡化製造步驟。 作為用於斜向延伸之延伸機,例如可列舉可對橫向及/或縱向附加左右不同速度之進給力或拉伸力或牽引力之拉幅式延伸機。拉幅式延伸機有橫單軸延伸機、同時雙軸延伸機等,只要可將長條狀之樹脂膜連續地斜向延伸,則可使用任意之適當之延伸機。 作為斜向延伸之方法,例如可列舉:日本專利特開昭50-83482號公報、日本專利特開平2-113920號公報、日本專利特開平3-182701號公報、日本專利特開2000-9912號公報、日本專利特開2002-86554號公報、日本專利特開2002-22944號公報等中記載之方法。 延伸膜之厚度較佳為20 μm~100 μm,更佳為30 μm~80 μm。 作為延伸膜,可直接使用市售之膜,亦可根據目的對市售之膜進行2次加工(例如,延伸處理、表面處理)而使用。作為市售之膜之具體例,可列舉帝人公司製造之商品名「PURE-ACE RM」。 於一實施形態中,對上述延伸膜實施緩和處理。藉此,可緩和由延伸所產生之應力,可使上述加熱TMA試驗中之遲相軸方向之收縮率為0.4%以下,或者使上述加濕TMA試驗中之遲相軸方向之收縮率為0.7%以下。作為緩和處理條件,可採用任意之適當之條件。例如,使延伸膜沿著延伸方向以特定之緩和溫度及特定之緩和率(收縮率)收縮。緩和溫度較佳為60℃~150℃。緩和率較佳為3%~6%。 A-2.加熱處理步驟 如上所述,於加熱處理步驟中,將延伸膜於105℃以上之溫度下加熱2分鐘以上。 於一實施形態中,將加熱處理步驟中之加熱溫度設為T 1(℃),將加熱處理步驟中之加熱時間設為t 1(分鐘),將加熱處理步驟前之延伸膜之於加熱TMA試驗中之收縮率設為A 1時,較佳為10×t 1/{(Tg-T 1) 2×A 1 2}所表示之值大於2。上述值較佳為大於2且未達150,更佳為3~50,尤佳為3~10。再者,(Tg-T 1)較佳為5以上。 另一實施形態中,將加熱處理步驟前之延伸膜之於加濕TMA試驗中之收縮率設為A 2時,較佳為10×t 1/{(Tg-T 1) 2×A 2 2}所表示之值大於0.9。上述值較佳為1~60,更佳為1~20,尤佳為1~10。 加熱溫度較佳為105℃~140℃,更佳為110℃~130℃,尤佳為115℃~125℃。加熱時間較佳為2分鐘~150分鐘,更佳為3分鐘~120分鐘,尤佳為5分鐘~60分鐘。 於加熱處理步驟中,只要可將延伸膜於上述加熱條件下加熱,則可使用任意之適當之加熱機構。代表性而言,上述加熱機構為烘箱。於藉由一面使長條狀之樹脂膜向長條方向移行一面將其延伸而獲得延伸膜之情形時,亦可一面使所獲得之延伸膜保持該狀態移行,一面實施加熱處理。 A-3.溫水處理步驟 如上所述,於溫水處理步驟中,將延伸膜浸漬於60℃以上之溫水中3分鐘以上。 將溫水處理步驟中之浸漬時間設為t 2(分鐘),將溫水處理步驟前之延伸膜之於加濕TMA試驗中之收縮率設為A 3時,較佳為t 2/A 3 2所表示之值大於20。上述值較佳為大於20且1000以下,更佳為25~500,尤佳為30~150。 溫水之溫度較佳為60℃~90℃,更佳為65℃~85℃,尤佳為68℃~82℃。浸漬時間較佳為3分鐘~60分鐘,更佳為3分鐘~30分鐘,尤佳為5分鐘~20分鐘。 於溫水處理步驟中,只要可將延伸膜於上述加熱條件下加熱,則可使用任意之適當之溫水處理機構。代表性而言,上述溫水處理機構為調整為適當之溫度之溫水浴。於藉由一面使長條狀之樹脂膜向長條方向移行一面將其延伸而獲得延伸膜之情形時,亦可一面使所獲得之延伸膜保持該狀態移行,一面實施溫水處理。 B.相位差膜 本發明之相位差膜係面內相位差滿足Re(450)<Re(550)之關係之表現出所謂逆分散之波長相依性之相位差膜。上述相位差膜於將自30℃升溫至Tg-25℃並再次冷卻至30℃之步驟反覆進行3個循環之加熱TMA試驗中,遲相軸方向之收縮率為0.1%以下,且於使環境按25℃/25%RH、85℃/2%RH、85℃/85%RH、85℃/2%RH之順序變化之加濕TMA試驗中,遲相軸方向之收縮率為0.2%以下。上述加熱TMA試驗中之遲相軸方向之收縮率較佳為0%~0.08%,更佳為0%~0.05%。上述加濕TMA試驗中之遲相軸方向之收縮率較佳為0%~0.15%,更佳為0%~0.10%。如上所述之相位差膜可抑制高溫高濕環境下之相位差值之變化。 相位差膜之Re(450)/Re(550)之值較佳為0.8~0.9,更佳為0.83~0.87。 相位差膜之面內相位差Re(550)較佳為100 nm~180 nm,更佳為135 nm~155 nm。 相位差膜之光彈性係數較佳為1×10 -12(m 2/N)~40×10 -12(m 2/N),更佳為1×10 -12(m 2/N)~30×10 -12(m 2/N),尤佳為1×10 -12(m 2/N)~20×10 -12 (m 2/N)。 如上所述之相位差膜例如可藉由A項中說明之製造方法而獲得。相位差膜可用於圓偏光板。 C.圓偏光板 本發明之圓偏光板具有包含上述相位差膜之相位差層、及偏光元件。相位差層之遲相軸與偏光元件之吸收軸所成之角度為35°~55°,較佳為40°~50°,尤佳為43~47°,最佳為約45°。 圖1係本發明之一實施形態之圓偏光板之概略剖視圖。圓偏光板100依序具備保護層10、偏光元件20、相位差層30、及折射率橢球具有nz>nx=ny之關係之另一相位差層40(有時稱為第2相位差層)。 於一實施形態中,圓偏光板100為單片狀。將圓偏光板100加熱時之相位差層30之相位差不均(加熱相位差不均)為3 nm以下。進而,將圓偏光板100加濕時之相位差層30之相位差不均(加濕相位差不均)為3 nm以下。加熱相位差不均及加濕相位差不均較佳為0 nm~2 nm,更佳為0 nm~1 nm。 上述加熱相位差不均例如可於在圓偏光板100之兩面貼合玻璃並進行加熱(於85℃下保持240小時)時,作為由以下之式算出之值之絕對值而決定。 (R A1-R B1)-(R A0-R B0) 此處,R A0係相位差層30之中心部之面內相位差值,R B0係相位差層30之頂點部分之面內相位差值,R A1係上述加熱後之相位差層30之中心部之面內相位差值,R B1係上述加熱後之上述頂點部分之面內相位差值。 上述加濕相位差不均例如可於在圓偏光板100之兩面貼合玻璃並進行加濕(於65℃/90%RH下保持240小時)時,作為由以下之式算出之值之絕對值而決定。 (R A2-R B2)-(R A0-R B0) 此處,R A2係上述加濕後之相位差層30之中心部之面內相位差值,R B2係上述加濕後之上述頂點部分之面內相位差值。 先前之圓偏光板於在兩面貼合玻璃等並使用於圖像顯示裝置等之情形時,相位差層之中心部不易受到高溫高濕環境之影響,另一方面,相位差層之端部受到高溫高濕環境之影響。其結果為,相位差層之中心部之面內相位差值之變化較小,相位差層之端部之面內相位差值之變化變大,可能產生相位差不均。與此相對,本發明之圓偏光板藉由使相位差層包含上述相位差膜,可抑制相位差層之端部之面內相位差之變化,而可抑制相位差不均。 C-1.偏光元件 作為偏光元件,可採用任意之適當之偏光元件。例如,形成偏光元件之樹脂膜可為單層之樹脂膜,亦可為兩層以上之積層體。 作為包含單層之樹脂膜之偏光元件之具體例,可列舉:對聚乙烯醇(PVA)系膜、部分縮甲醛化PVA系膜、乙烯-乙酸乙烯酯共聚物系部分皂化膜等親水性高分子膜實施利用碘或二色性染料等二色性物質之染色處理及延伸處理而成者、PVA之脫水處理物或聚氯乙烯之脫氯化氫處理物等多烯系配向膜等。就光學特性優異之方面而言,較佳為使用利用碘將PVA系膜染色並進行單軸延伸而獲得之偏光元件。 上述利用碘之染色例如藉由將PVA系膜浸漬於碘水溶液中而進行。上述單軸延伸之延伸倍率較佳為3~7倍。延伸可於染色處理後進行,亦可一面進行染色一面進行。又,亦可於延伸之後進行染色。視需要對PVA系膜實施膨潤處理、交聯處理、洗淨處理、乾燥處理等。例如,藉由在染色之前將PVA系膜浸漬於水中進行水洗,不僅可將PVA系膜表面之污垢或抗黏連劑洗淨,而且可使PVA系膜膨潤而防止染色不均等。 作為使用積層體所獲得之偏光元件之具體例,可列舉:使用樹脂基材與積層於該樹脂基材之PVA系樹脂層(PVA系樹脂膜)之積層體、或樹脂基材與塗佈形成於該樹脂基材之PVA系樹脂層之積層體所獲得之偏光元件。使用樹脂基材與塗佈形成於該樹脂基材之PVA系樹脂層之積層體所獲得之偏光元件例如可藉由如下步驟而製作:將PVA系樹脂溶液塗佈於樹脂基材,使其乾燥而於樹脂基材上形成PVA系樹脂層,而獲得樹脂基材與PVA系樹脂層之積層體;將該積層體進行延伸及染色而將PVA系樹脂層製成偏光元件。於本實施形態中,代表性而言,延伸包含使積層體浸漬於硼酸水溶液中而將其延伸之步驟。進而,延伸可視需要進而包含在進行硼酸水溶液中之延伸之前將積層體於高溫(例如,95℃以上)下進行空中延伸之步驟。所獲得之樹脂基材/偏光元件之積層體可直接使用(即,可將樹脂基材作為偏光元件之保護層),亦可自樹脂基材/偏光元件之積層體將樹脂基材剝離,並於該剝離面積層根據目的之任意之適當之保護層而使用。此種偏光元件之製造方法之詳細內容例如記載於日本專利特開2012-73580號公報中。該公報之整體之記載係作為參考而援用於本說明書中。 偏光元件之厚度例如為1 μm~80 μm。於一實施形態中,偏光元件之厚度較佳為1 μm~15 μm,進而較佳為3 μm~10 μm,尤佳為3 μm~8 μm。若偏光元件之厚度為此種範圍,則可良好地抑制加熱時之捲曲,及獲得良好之加熱時之外觀耐久性。 C-2.第2相位差層 關於第2相位差層,如上所述,折射率橢球具有nz>nx=ny之關係,可作為所謂陽極C板而發揮功能。具有此種第2相位差層之圓偏光板可抑制用於有機EL面板之情形時之反射率及反射色相之變化。 第2相位差層之厚度方向之相位差Rth(550)較佳為-50 nm~-300 nm,更佳為-70 nm~-250 nm,進而較佳為-90 nm~-200 nm,尤佳為 -100 nm~-180 nm。此處,「nx=ny」不僅包括nx與ny嚴格相等之情況,而且亦包括nx與ny實質上相等之情況。即,第2相位差層之面內相位差Re(550)可未達10 nm。 具有nz>nx=ny之折射率特性之第2相位差層可由任意之適當之材料形成。第2相位差層較佳為可包含固定為垂直配向之液晶材料。可垂直配向之液晶材料(液晶化合物)可為液晶單體,亦可為液晶聚合物。作為該液晶化合物及該第2相位差層之形成方法之具體例,可列舉日本專利特開2002-333642號公報之[0020]~[0028]中記載之液晶化合物及相位差膜之形成方法。於此情形時,第2相位差層之厚度較佳為0.5 μm~10 μm,更佳為0.5 μm~8 μm,進而較佳為0.5 μm~5 μm。 作為另一較佳之具體例,第2相位差層亦可包含日本專利特開2012-32784號公報中記載之由反丁烯二酸二酯系樹脂形成之相位差膜。於此情形時,厚度較佳為5 μm~80 μm,更佳為10 μm~50 μm。 C-3.保護層 保護層係由可用作保護偏光元件之膜之任意之適當之保護膜形成。作為成為該保護膜之主成分之材料之具體例,可列舉:三乙醯纖維素(TAC)等纖維素系樹脂、或聚酯系、聚乙烯醇系、聚碳酸酯系、聚醯胺系、聚醯亞胺系、聚醚碸系、聚碸系、聚苯乙烯系、聚降𦯉烯系、聚烯烴系、(甲基)丙烯酸系、乙酸酯系等之透明樹脂等。又,亦可列舉:(甲基)丙烯酸系、胺基甲酸酯系、(甲基)丙烯酸胺基甲酸酯系、環氧系、矽酮系等之熱硬化型樹脂或紫外線硬化型樹脂等。除此以外,例如亦可列舉矽氧烷系聚合物等玻璃質系聚合物。又,亦可使用日本專利特開2001-343529號公報(WO01/37007)中記載之聚合物膜。作為該膜之材料,例如可使用含有側鏈具有經取代或未經取代之醯亞胺基之熱塑性樹脂、及側鏈具有經取代或未經取代之苯基及腈基之熱塑性樹脂之樹脂組合物,例如可列舉具有包含異丁烯及N-甲基順丁烯二醯亞胺之交替共聚物、以及丙烯腈-苯乙烯共聚物之樹脂組合物。該聚合物膜例如可為上述樹脂組合物之擠出成形物。 保護膜之厚度較佳為10 μm~100 μm。保護膜可經由接著層(具體而言,為接著劑層、黏著劑層)而積層於偏光元件,亦可密接(不經由接著層)積層於偏光元件。接著劑層係由任意之適當之接著劑形成。作為接著劑,例如可列舉以聚乙烯醇系樹脂為主成分之水溶性接著劑。以聚乙烯醇系樹脂為主成分之水溶性接著劑較佳為可進而含有金屬化合物膠體。金屬化合物膠體可為金屬化合物微粒子分散於分散介質中者,可為因微粒子之同種電荷之相互排斥而靜電穩定化且持久地具有穩定性者。形成金屬化合物膠體之微粒子之平均粒徑只要不對偏光特性等光學特性造成不良影響,則可為任意之適當之值。較佳為1 nm~100 nm,進而較佳為1 nm~50 nm。其原因在於,可使微粒子均勻地分散於接著劑層中,可確保接著性且抑制裂點。再者,「裂點」係指於偏光元件與保護膜之界面產生之局部之凹凸缺陷。黏著劑層包含任意之適當之黏著劑。 亦可視需要對保護膜之與偏光元件相反之側之表面實施硬塗處理、抗反射處理、抗黏處理、防眩處理等表面處理。代表性而言,保護膜之厚度為5 mm以下,較佳為1 mm以下,更佳為1 μm~500 μm,進而較佳為5 μm~150 μm。 [實施例] 以下,藉由實施例而對本發明具體地進行說明,但本發明並不受到該等實施例限定。各特性之測定方法如下所述。再者,只要無特別明示,則實施例及比較例中之「份」及「%」係重量基準。 (1)厚度 使用針盤量規(PEACOCK公司製造,製品名「DG-205 type pds-2」)進行測定。 (2)相位差值 使用Axometrics公司製造之Axoscan進行測定。 (3)由加熱所引起之尺寸變化率(加熱TMA試驗) 將實施例及比較例中所獲得之延伸膜或相位差膜切斷為20 mm(遲相軸方向)×4 mm(進相軸方向)而製成測定樣本。使用熱機械分析裝置(Hitachi High-Tech Science公司製造,型號「TMA7100」),將使測定樣本自30℃升溫至Tg-25℃並再次冷卻至30℃之步驟反覆進行3個循環之後,對測定樣本之長度方向(遲相軸方向)上之尺寸變化率(收縮率)進行測定。再者,升溫速度係設為5℃/min,各溫度下之保持時間係設為10分鐘。 (4)由加濕所引起之尺寸變化率(加濕TMA試驗) 將實施例及比較例中所獲得之延伸膜或相位差膜切斷為20 mm(遲相軸方向)×5 mm(進相軸方向)而製成測定樣本。使用熱機械分析裝置,使環境按25℃/25%RH、85℃/2%RH、85℃/85%RH、85℃/2%RH之順序變化之後,對測定樣本之長度方向(遲相軸方向)上之尺寸變化率(收縮率)進行測定。再者,25℃/25%RH下之保持時間係設為60分鐘,85℃/2%RH下之保持時間係設為60分鐘,85℃/85%RH下之保持時間係設為300分鐘。 (5)加熱相位差不均 將實施例及比較例中所獲得之圓偏光板以偏光元件之吸收軸成為短邊方向之方式切為75 mm×150 mm,並經由黏著劑將玻璃基板貼合於圓偏光板之兩側,而製成測定樣本。 對於測定樣本,測定中央部之面內相位差值R A0、中心部至位於遲相軸方向之頂點部分之面內相位差值R B01、及中心部至位於進相軸方向之頂點部分之面內相位差值R B02。 繼而,將測定樣本於85℃之烘箱中加熱240小時,對於加熱後之測定樣本,測定中央部之面內相位差值R A1、中心部至位於遲相軸方向之頂點部分之面內相位差值R B11、及中心部至位於進相軸方向之頂點部分之面內相位差值R B12。 將由以下之式獲得之值A及B之絕對值之中較大之值作為加熱相位差不均。 A=(R A1-R B11)-(R A0-R B01) B=(R A1-R B12)-(R A0-R B02) (6)加濕相位差不均 與上述(5)同樣地製作圓偏光板之測定樣本,並測定中央部之面內相位差值R A0、中心部至位於遲相軸方向之頂點部分之面內相位差值R B01、及中心部至位於進相軸方向之頂點部分之面內相位差值R B02。 繼而,將測定樣本於65℃/90%之烘箱中加濕240小時,對於加濕後之測定樣本,測定中央部之面內相位差值R A2、中心部至位於遲相軸方向之頂點部分之面內相位差值R B21、及中心部至位於進相軸方向之頂點部分之面內相位差值R B22。 將由以下之式獲得之值C及D之絕對值之中較大之值作為加濕相位差不均。 C=(R A2-R B21)-(R A0-R B01) D=(R A2-R B22)-(R A0-R B02) <實施例1> 1.相位差膜之製作 (聚碳酸酯樹脂) 使用分批聚合裝置進行聚合,該分批聚合裝置包含具備攪拌翼及控制為100℃之回流冷卻器之立式反應器兩個。添加雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷29.60質量份(0.046 mol)、ISB(Isosorbide,異山梨糖醇)29.21質量份(0.200 mol)、SPG(Spiroglycol,螺二醇)42.28質量份(0.139 mol)、DPC(Diphenyl Carbonate,碳酸二苯酯)63.77質量份(0.298 mol)及作為觸媒之乙酸鈣一水合物1.19×10 -2質量份(6.78×10 -5mol)。對反應器內進行減壓氮氣置換之後,利用熱媒進行加溫,於內溫成為100℃之時點開始攪拌。升溫開始40分鐘後使內溫達到220℃,以保持該溫度之方式進行控制,同時開始減壓,達到220℃之後,用90分鐘使其成為13.3 kPa。將隨聚合反應副生成之苯酚蒸氣導入至100℃之回流冷卻器,使苯酚蒸氣中包含之若干量之單體成分返回至反應器,未冷凝之苯酚蒸氣則導入至45℃之冷凝器加以回收。向第1反應器中導入氮氣暫時複壓至大氣壓之後,將第1反應器內之經低聚物化之反應液移至第2反應器。繼而,開始第2反應器內之升溫及減壓,用50分鐘使其達到內溫240℃、壓力0.2 kPa。其後,進行聚合直至成為特定之攪拌動力為止。於達到特定動力之時點向反應器中導入氮氣進行複壓,將所生成之聚酯碳酸酯擠出至水中,並將線料切割,而獲得顆粒。 (樹脂膜) 將所獲得之聚碳酸酯樹脂於80℃下真空乾燥5小時之後,使用具備單軸擠出機(東芝機械公司製造,缸體設定溫度:250℃)、T模(寬度200 mm,設定溫度:250℃)、冷卻輥(設定溫度:120~130℃)及卷取機之膜製膜裝置,製作厚度135 μm之樹脂膜。 (相位差膜) 將所獲得之長條狀之樹脂膜以延伸溫度134℃、延伸倍率2.8倍於寬度方向延伸,繼而,對延伸後之膜之寬度方向實施緩和處理,藉此製作延伸膜。緩和處理之條件係設為緩和溫度130℃、緩和率4.5%。將該延伸膜供於上述(4)之加濕TMA試驗,結果尺寸變化率為0.30%。又,將該延伸膜供於上述(3)之加熱TMA試驗,結果尺寸變化率為0.05%。 繼而,藉由將上述延伸膜於125℃下加熱(加熱處理)2分鐘,而獲得厚度48 μm之相位差膜。 2.圓偏光板之製作 (偏光元件) 準備長條狀之非晶質聚對苯二甲酸乙二酯(A-PET)膜(三菱樹脂公司製造,商品名「Novaclear」,厚度:100 μm)作為基材,於60℃下於基材之單面進行聚乙烯醇(PVA)樹脂(日本合成化學工業公司製造,商品名「Gohsenol(註冊商標)NH-26」)之水溶液之塗佈及乾燥,而形成厚度7 μm之PVA系樹脂層。使以此方式獲得之積層體浸漬於液溫30℃之不溶化浴30秒鐘(不溶化步驟)。繼而,使其浸漬於液溫30℃之染色浴60秒鐘(染色步驟)。繼而,使其浸漬於液溫30℃之交聯浴30秒鐘(交聯步驟)。其後,一面使積層體浸漬於液溫60℃之硼酸水溶液中,一面於周速不同之輥間於縱向(長條方向)進行單軸延伸。浸漬於硼酸水溶液中之時間係120秒,延伸至積層體即將斷裂之前為止。其後,使積層體浸漬於洗淨浴之後,利用60℃之溫風使其乾燥(洗淨、乾燥步驟)。以此方式獲得於基材上形成有厚度5 μm之偏光元件之長條狀之積層體(偏光元件積層體)。 (偏光板) 經由黏著劑將作為保護膜之環烯烴系樹脂膜(日本瑞翁股份有限公司製造,商品名「ZEONOR FILM」,厚度25 μm)貼合於上述積層體之偏光元件側之面,並自偏光元件將上述基材剝離,藉此獲得偏光板。 (第2相位差層) 將下述化學式(I)所表示之側鏈型液晶聚合物20重量份、表現出向列型液晶相之聚合性液晶(BASF公司製造:商品名Paliocolor LC242)80重量份及光聚合起始劑(BASF公司製造:商品名Irgacure 907)5重量份溶解於環戊酮400重量份中,而製備液晶塗佈液。然後,藉由棒式塗佈機將該塗佈液塗佈於基材膜(降𦯉烯系樹脂膜:日本瑞翁(股)製造,商品名「ZEONOR」)之後,於70℃下加熱乾燥4分鐘,藉此使液晶配向。對該液晶層照射紫外線,而使液晶層硬化,藉此於基材上形成成為相位差膜之液晶固化層(厚度:1 μm)。該層之Re(550)為0 nm,Rth(550)為-71 nm(nx:1.5326,ny:1.5326,nz:1.6550)。 [化1]

Figure 02_image001
(圓偏光板) 經由黏著劑將上述相位差膜以偏光元件之吸收軸與相位差膜之遲相軸所成之角度成為45°之方式貼合於上述偏光板之偏光元件側。繼而,將上述液晶固化層轉印於相位差膜之與偏光元件相反之側之面,藉此製作具有保護層/偏光元件/相位差層/第2相位差層之構成之圓偏光板。 <實施例2> 將延伸膜於125℃下加熱10分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例3> 將延伸膜於125℃下加熱30分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例4> 將延伸膜於125℃下加熱60分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例5> 將延伸膜於125℃下加熱120分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例6> 將緩和溫度設為110℃,除此以外,與實施例1同樣地製作延伸膜。將該延伸膜供於上述(4)之加濕TMA試驗,結果尺寸變化率為0.50%。又,將該延伸膜供於上述(3)之加熱TMA試驗,結果尺寸變化率為0.08%。 使用上述延伸膜,除此以外,與實施例2同樣地製作相位差膜及圓偏光板。 <實施例7> 將緩和溫度設為80℃,除此以外,與實施例1同樣地製作延伸膜。將該延伸膜供於上述(4)之加濕TMA試驗,結果尺寸變化率為0.70%。又,將該延伸膜供於上述(3)之加熱TMA試驗,結果尺寸變化率為0.13%。 使用上述延伸膜,除此以外,與實施例2同樣地製作相位差膜及圓偏光板。 <實施例8> 將延伸膜於105℃下加熱10分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例9> 將延伸膜於110℃下加熱10分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例10> 將延伸膜於115℃下加熱10分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例11> 將延伸膜於120℃下加熱10分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例12> 將延伸膜於130℃下加熱10分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例13> 代替上述加熱處理,將延伸膜浸漬於60℃之溫水中3分鐘(溫水處理),除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例14> 代替上述加熱處理,將延伸膜浸漬於60℃之溫水中10分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例15> 代替上述加熱處理,將延伸膜浸漬於60℃之溫水中30分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例16> 代替上述加熱處理,將延伸膜浸漬於60℃之溫水中60分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <實施例17> 代替上述加熱處理,將延伸膜浸漬於60℃之溫水中10分鐘,除此以外,與實施例6同樣地製作相位差膜及圓偏光板。 <實施例18> 代替上述加熱處理,將延伸膜浸漬於60℃之溫水中10分鐘,除此以外,與實施例7同樣地製作相位差膜及圓偏光板。 <實施例19> 使用市售之聚碳酸酯樹脂膜(帝人股份有限公司製造,製品名「PURE-ACE RM」,厚度50 μm)作為延伸膜。將該延伸膜供於上述(3)之加熱TMA試驗,結果尺寸變化率為0.22%。又,將該延伸膜供於上述(4)之加濕TMA試驗,結果尺寸變化率為0.10%。 繼而,將上述延伸膜於125℃下加熱(加熱處理)2分鐘,藉此獲得相位差膜。進而,使用上述相位差膜,除此以外,與實施例1同樣地製作圓偏光板。 <實施例20> 將延伸膜於125℃下加熱10分鐘,除此以外,與實施例19同樣地製作相位差膜及圓偏光板。 <實施例21> 將延伸膜於125℃下加熱30分鐘,除此以外,與實施例19同樣地製作相位差膜及圓偏光板。 <實施例22> 將延伸膜於125℃下加熱60分鐘,除此以外,與實施例19同樣地製作相位差膜及圓偏光板。 <實施例23> 將延伸膜於125℃下加熱120分鐘,除此以外,與實施例19同樣地製作相位差膜及圓偏光板。 <實施例24> 將延伸膜於105℃下加熱10分鐘,除此以外,與實施例19同樣地製作相位差膜及圓偏光板。 <實施例25> 將延伸膜於110℃下加熱10分鐘,除此以外,與實施例19同樣地製作相位差膜及圓偏光板。 <實施例26> 將延伸膜於115℃下加熱10分鐘,除此以外,與實施例19同樣地製作相位差膜及圓偏光板。 <實施例27> 將延伸膜於120℃下加熱10分鐘,除此以外,與實施例19同樣地製作相位差膜及圓偏光板。 <比較例1> 將延伸膜於125℃下加熱1分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <比較例2> 將延伸膜於100℃下加熱10分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <比較例3> 將緩和溫度設為80℃,將緩和率設為0%,除此以外,與實施例1同樣地製作延伸膜。將該延伸膜供於上述(4)之加濕TMA試驗,結果尺寸變化率為0.90%。又,將該延伸膜供於上述(3)之加熱TMA試驗,結果尺寸變化率為0.18%。 使用上述延伸膜,除此以外,與實施例2同樣地製作相位差膜及圓偏光板。 <比較例4> 代替上述加熱處理,將延伸膜浸漬於60℃之溫水中1分鐘,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <比較例5> 代替上述加熱處理,將延伸膜浸漬於60℃之溫水中10分鐘,除此以外,與比較例3同樣地製作相位差膜及圓偏光板。 <比較例6> 不實施加熱處理,除此以外,與實施例1同樣地製作相位差膜及圓偏光板。 <比較例7> 將延伸膜於100℃下加熱10分鐘,除此以外,與實施例19同樣地製作相位差膜及圓偏光板。 <比較例8> 將延伸膜於125℃下加熱1分鐘,除此以外,與實施例19同樣地製作相位差膜及圓偏光板。 <比較例9> 不實施加熱處理,除此以外,與實施例19同樣地製作相位差膜及圓偏光板。 <評價> 關於實施例1~12、實施例19~27、比較例1~3、及比較例7~8,作為加熱處理條件之指標,算出 10×t 1/{(Tg-T 1) 2×A 1 2} 及 10×t 1/{(Tg-T 1) 2×A 2 2}。 此處,T 1係設為加熱處理步驟中之加熱溫度(℃),t 1係設為加熱處理步驟中之加熱時間(分鐘),A 1係設為加熱處理步驟前之延伸膜之於加熱TMA試驗中之收縮率(%),A 2係設為加熱處理步驟前之延伸膜之於加濕TMA試驗中之收縮率(%)。 關於實施例13~18及比較例4~5,作為溫水處理條件之指標,算出 t 2/A 3 2。 此處,t 2係設為溫水處理步驟中之浸漬時間(分鐘),A 3係設為溫水處理步驟前之延伸膜之於加濕TMA試驗中之收縮率(%)。 將實施例1~27及比較例1~9之相位差膜供於加濕TMA試驗及加熱TMA試驗,並測定由各個試驗所得之尺寸變化率。 進而,對於實施例1~27及比較例1~9,測定加濕相位差不均及加熱相位差不均。 將各個結果示於表1中。 [表1]    相位差膜 處理條件 尺寸變化率(%) 相位差不均(nm) 加熱TMA試驗 加濕TMA試驗 種類 溫度(℃) 時間(分鐘) 指標 處理前 處理後 處理前 處理後 加熱後 加濕後 實施例1 PC樹脂 加熱 125 2 0.99 0.05 0.02 0.30 0.18 0.9 2.6 實施例2 PC樹脂 加熱 125 10 4.94 0.05 0.02 0.30 0.14 0.7 2 實施例3 PC樹脂 加熱 125 30 14.81 0.05 0.01 0.30 0.10 0.6 1.5 實施例4 PC樹脂 加熱 125 60 29.63 0.05 0.01 0.30 0.07 0.4 1.3 實施例5 PC樹脂 加熱 125 120 59.26 0.05 0.00 0.30 0.04 0.4 1 實施例6 PC樹脂 加熱 125 10 1.78 0.08 0.03 0.50 0.17 1 2.5 實施例7 PC樹脂 加熱 125 10 0.91 0.13 0.04 0.70 0.20 1.2 2.9 實施例8 PC樹脂 加熱 105 10 0.91 0.05 0.04 0.30 0.20 1.2 2.9 實施例9 PC樹脂 加熱 110 10 1.23 0.05 0.03 0.30 0.18 1.1 2.6 實施例10 PC樹脂 加熱 115 10 1.78 0.05 0.03 0.30 0.16 1 2.4 實施例11 PC樹脂 加熱 120 10 2.78 0.05 0.02 0.30 0.14 0.8 2.1 實施例12 PC樹脂 加熱 130 10 11.11 0.05 0.01 0.30 0.11 0.7 1.8 實施例13 PC樹脂 溫水 60 3 33.33 0.05 0.03 0.30 0.18 1 2.5 實施例14 PC樹脂 溫水 60 10 111.11 0.05 0.02 0.30 0.13 0.9 1.9 實施例15 PC樹脂 溫水 60 30 333.33 0.05 0.01 0.30 0.08 0.7 1.2 實施例16 PC樹脂 溫水 60 60 666.67 0.05 0.00 0.30 0.06 0.5 0.8 實施例17 PC樹脂 溫水 60 10 40.00 0.08 0.03 0.50 0.17 1 2.4 實施例18 PC樹脂 溫水 60 10 20.41 0.13 0.05 0.70 0.20 1.3 2.9 實施例19 PURE-ACE RM 加熱 125 2 1.84 0.22 0.10 0.10 0.07 2.4 1.2 實施例20 PURE-ACE RM 加熱 125 10 9.18 0.22 0.07 0.10 0.06 1.6 0.9 實施例21 PURE-ACE RM 加熱 125 30 27.55 0.22 0.04 0.10 0.05 0.9 0.8 實施例22 PURE-ACE RM 加熱 125 60 55.10 0.22 0.03 0.10 0.04 0.8 0.5 實施例23 PURE-ACE RM 加熱 125 120 110.19 0.22 0.03 0.10 0.03 0.7 0.5 實施例24 PURE-ACE RM 加熱 105 10 1.69 0.22 0.10 0.10 0.09 2.9 1.5 實施例25 PURE-ACE RM 加熱 110 10 2.30 0.22 0.09 0.10 0.08 2.6 1.3 實施例26 PURE-ACE RM 加熱 115 10 3.31 0.22 0.09 0.10 0.07 2.3 1.2 實施例27 PURE-ACE RM 加熱 120 10 5.17 0.22 0.08 0.10 0.06 2 0.9 比較例1 PC樹脂 加熱 125 1 0.49 0.05 0.04 0.30 0.25 1.3 4.2 比較例2 PC樹脂 加熱 100 10 0.69 0.05 0.04 0.30 0.22 1.4 3.5 比較例3 PC樹脂 加熱 125 10 0.55 0.18 0.05 0.90 0.24 1.5 3.7 比較例4 PC樹脂 溫水 60 1 11.11 0.05 0.04 0.30 0.25 1.4 3.8 比較例5 PC樹脂 溫水 60 10 12.35 0.18 0.05 0.90 0.24 1.4 3.5 比較例6 PC樹脂 - - - 0.05 0.05 0.30 0.30 1.6 4.8 比較例7 PURE-ACE RM 加熱 100 10 1.29 0.22 0.16 0.10 0.10 3.5 1.6 比較例8 PURE-ACE RM 加熱 125 1 0.92 0.22 0.16 0.10 0.09 3.5 1.6 比較例9 PURE-ACE RM - - - 0.22 0.22 0.10 0.10 4.7 1.7 由表1可明確,實施例之相位差膜與比較例之相位差膜相比,加熱處理或溫水處理後之TMA試驗中之尺寸變化率較小,用於圓偏光板之情形之相位差不均亦較小。 [產業上之可利用性] 本發明之相位差膜可較佳地用於圓偏光板,本發明之圓偏光板可較佳地用於有機EL面板。 Hereinafter, embodiments of the present invention will be described, but the present invention is not limited to these embodiments. (Definitions of terms and symbols) The definitions of terms and symbols in this specification are as follows. (1) Refractive index (nx, ny, nz) "nx" is the refractive index in the direction in which the in-plane refractive index becomes maximum (that is, the direction of the retardation axis), and "ny" is in the plane positive to the retardation axis. The refractive index in the intersecting direction (that is, the direction of the phase axis), "nz" is the refractive index in the thickness direction. (2) In-plane retardation (Re) "Re(λ)" is the in-plane retardation measured with light of wavelength λ nm at 23°C. For example, "Re(550)" is the in-plane retardation measured by light with a wavelength of 550 nm at 23°C. Re(λ) is obtained from the formula: Re=(nx-ny)×d when the thickness of the layer (film) is d (nm). (3) Retardation in the thickness direction (Rth) "Rth(λ)" is the retardation in the thickness direction measured by light with a wavelength of λ nm at 23°C. For example, "Rth(550)" is the phase difference in the thickness direction measured with light with a wavelength of 550 nm at 23°C. Rth(λ) is obtained from the formula: Rth=(nx-nz)×d when the thickness of the layer (film) is d (nm). (4) Nz Coefficient The Nz coefficient is obtained by Nz=Rth/Re. A. Manufacturing method of retardation film The manufacturing method of the present invention is used in the manufacture of a retardation film exhibiting so-called inverse dispersion wavelength dependence in which the in-plane retardation satisfies the relationship of Re(450)<Re(550). Manufacturing method. The manufacturing method of the retardation film which concerns on one Embodiment of this invention includes the heat processing process of heating a stretched film at the temperature of 105 degreeC or more for 2 minutes or more. In the heating TMA test of the above-mentioned stretched film, the steps of heating from 30°C to Tg-25°C and then cooling to 30°C are repeated for 3 cycles, the shrinkage rate in the direction of the slow axis is 0.4% or less, or when the environment is controlled In the humidified TMA test with sequential changes of 25°C/25%RH, 85°C/2%RH, 85°C/85%RH, and 85°C/2%RH, the shrinkage rate in the slow axis direction is 0.7% or less. Set the heating temperature in the heat treatment step as T1 (°C), set the heating time in the heat treatment step as t1 (minutes), and set the shrinkage rate of the stretched film before the heat treatment step in the heating TMA test as When A 1 is used, it is preferable to satisfy 10×t 1 /{(Tg−T 1 ) 2 ×A 1 2 }>2. When the shrinkage rate in the humidified TMA test of the stretched film before the heat treatment step is A2 , it is preferable to satisfy 10×t 1 /{(Tg−T 1 ) 2 ×A 2 2 }>0.9. The manufacturing method of the retardation film of another embodiment of this invention includes the warm water treatment process of immersing a stretched film in warm water of 60 degreeC or more for 3 minutes or more. Shrinkage in the slow axis direction of the stretched film above in a humidified TMA test in which the environment is changed in the order of 25°C/25%RH, 85°C/2%RH, 85°C/85%RH, 85°C/2%RH The rate is below 0.7%. When the immersion time in the warm water treatment step is set to t 2 (minutes), and the shrinkage rate of the stretched film before the warm water treatment step in the humidified TMA test is set to A 3 , it is preferable to satisfy t 2 /A 3 2 >20. In the conventional manufacturing method, depending on the material constituting the retardation film, the durability may not be sufficient, and as a result, the retardation value may change in a high-temperature and high-humidity environment. On the other hand, according to the production method of the present invention, a retardation film having high durability and a small dimensional change rate (shrinkage rate) in a high-temperature and high-humidity environment can be obtained independently of the material constituting the retardation film. This kind of retardation film can suppress the change of the retardation value under high temperature and high humidity environment. A-1. Stretched film As mentioned above, the shrinkage rate in the slow axis direction of the stretched film is repeated in the heating TMA test for 3 cycles of heating from 30°C to Tg-25°C and then cooling to 30°C. Below 0.4%, or in the humidified TMA test where the environment is changed in the order of 25°C/25%RH, 85°C/2%RH, 85°C/85%RH, 85°C/2%RH, the direction of the slow axis The shrinkage rate is below 0.7%. Typically, stretched films are produced by stretching a resin film in at least one direction. The resin film is formed of any appropriate resin as long as a stretched film (retardation film) exhibiting wavelength dependence of so-called reverse dispersion can be obtained by performing stretching treatment. Examples of the resin forming the resin film include polycarbonate resins, polyvinyl acetal resins, cellulose ester resins, polyester resins, and polyester carbonate resins. These resins may be used alone or in combination according to required properties. Any appropriate polycarbonate-based resin is used as the above-mentioned polycarbonate-based resin. For example, a polycarbonate resin containing a structural unit derived from a dihydroxy compound is preferable. Specific examples of dihydroxy compounds include: 9,9-bis(4-hydroxyphenyl) fluorene, 9,9-bis(4-hydroxy-3-methylphenyl) fluorene, 9,9-bis( 4-Hydroxy-3-ethylphenyl) fluorene, 9,9-bis(4-hydroxy-3-n-propylphenyl) fluorene, 9,9-bis(4-hydroxy-3-isopropylphenyl) ) terrene, 9,9-bis(4-hydroxy-3-n-butylphenyl) terrene, 9,9-bis(4-hydroxy-3-second butylphenyl) terrene, 9,9-bis( 4-Hydroxy-3-tert-butylphenyl) fluorine, 9,9-bis(4-hydroxy-3-cyclohexylphenyl) fluorine, 9,9-bis(4-hydroxy-3-phenylphenyl) ) fennel, 9,9-bis(4-(2-hydroxyethoxy) phenyl) terrene, 9,9-bis(4-(2-hydroxyethoxy)-3-methylphenyl) terrene, 9,9-bis(4-(2-hydroxyethoxy)-3-isopropylphenyl) fluorene, 9,9-bis(4-(2-hydroxyethoxy)-3-isobutylbenzene Base) terrene, 9,9-bis(4-(2-hydroxyethoxy)-3-tert-butylphenyl) terrene, 9,9-bis(4-(2-hydroxyethoxy)-3 -cyclohexylphenyl) fluorine, 9,9-bis(4-(2-hydroxyethoxy)-3-phenylphenyl) fluorine, 9,9-bis(4-(2-hydroxyethoxy) -3,5-Dimethylphenyl) fluorine, 9,9-bis(4-(2-hydroxyethoxy)-3-tert-butyl-6-methylphenyl) fluorine, 9,9- Bis(4-(3-hydroxy-2,2-dimethylpropoxy)phenyl) fennel, etc. In addition to the structural units derived from the above-mentioned dihydroxy compounds, polycarbonate resins may also contain units derived from isosorbide, isomannitol, isoidide, spirodiol, dioxanediol, diethylene glycol, Structural units of dihydroxy compounds such as triethylene glycol, polyethylene glycol, and bisphenols. The details of the above-mentioned polycarbonate resin are described in, for example, JP-A-2012-67300, JP-A-3325560 and WO2014/061677. The description of this patent document is used as a reference in this specification. The glass transition temperature (Tg) of the polycarbonate resin is preferably from 110°C to 250°C, more preferably from 120°C to 230°C. If the glass transition temperature is too low, the heat resistance tends to deteriorate, and there is a possibility of dimensional change after film formation. When the glass transition temperature is too high, the molding stability at the time of film molding may be deteriorated, and the transparency of the film may be impaired. In addition, glass transition temperature was calculated|required based on JISK7121 (1987). Arbitrary appropriate methods can be employ|adopted as a formation method of the said resin film. For example, melt extrusion method (for example, T-die forming method), cast coating method (for example, casting method), calender forming method, hot pressing method, co-extrusion method, co-melting method, multi-layer extrusion, Inflation molding method, etc. Preferably, T-die molding, tape casting, and inflation molding are used. The thickness of the resin film (unstretched film) can be set to any appropriate value according to required optical characteristics, stretching conditions described below, and the like. Preferably it is 50 μm to 300 μm, more preferably 80 μm to 250 μm. Any appropriate stretching direction and stretching conditions (for example, stretching temperature, stretching ratio, stretching direction) may be employed for the stretching as long as the stretched film is obtained. Specifically, various stretching methods such as free-end extension, fixed-end extension-free-end shrinkage, and fixed-end shrinkage can be used alone, or these stretching methods can be used simultaneously or sequentially. Regarding the extending direction, it can also be performed in various directions or dimensions such as the horizontal direction, the vertical direction, the thickness direction, and the diagonal direction. The stretching temperature is preferably within the range of the glass transition temperature (Tg) of the resin film ±20°C. By properly selecting the above-mentioned stretching method and stretching conditions, a retardation film with desired optical properties (for example, refractive index ellipsoid, in-plane retardation, Nz coefficient) can be finally obtained. In one embodiment, the stretched film is produced by uniaxially stretching a resin film or uniaxially stretching a fixed end. As a specific example of uniaxial stretching, a method of stretching a resin film in the longitudinal direction (vertical direction) while running in the elongated direction is mentioned. The elongation ratio is preferably from 10% to 500%. In another embodiment, the stretched film is produced by continuously stretching a long resin film obliquely in a direction having an angle θ with respect to the long direction. By adopting oblique stretching, a long stretched film having an alignment angle of θ with respect to the long direction of the film can be obtained. For example, when laminating with a polarizing element, roll-to-roll can be implemented, and the manufacturing steps can be simplified. As a stretching machine used for diagonal stretching, for example, a tenter stretching machine that can apply a feed force, a stretching force, or a traction force at a lateral and/or longitudinal direction at different speeds can be mentioned. The tenter stretching machine includes a horizontal uniaxial stretching machine and a simultaneous biaxial stretching machine, and any suitable stretching machine can be used as long as the long resin film can be continuously stretched obliquely. As a method of oblique extension, for example, Japanese Patent Laid-Open No. 50-83482, Japanese Patent Laid-Open No. 2-113920, Japanese Patent Laid-Open No. 3-182701, and Japanese Patent Laid-Open No. 2000-9912 The method described in the gazette, Japanese Patent Laid-Open No. 2002-86554, Japanese Patent Laid-Open No. 2002-22944, etc. The thickness of the stretched film is preferably from 20 μm to 100 μm, more preferably from 30 μm to 80 μm. As the stretched film, a commercially available film may be used as it is, or a commercially available film may be subjected to secondary processing (for example, stretching treatment, surface treatment) according to the purpose. As a specific example of a commercially available film, Teijin Corporation's product name "PURE-ACE RM" is mentioned. In one embodiment, relaxation treatment is performed on the stretched film. Thereby, the stress generated by stretching can be relaxed, and the shrinkage rate in the direction of the slow axis in the above-mentioned heating TMA test can be reduced to 0.4%, or the shrinkage rate in the direction of the slow axis in the above-mentioned humidified TMA test can be reduced to 0.7. %the following. Arbitrary appropriate conditions can be adopted as the mild treatment conditions. For example, the stretched film is shrunk at a specific relaxation temperature and a specific relaxation rate (shrinkage rate) along the stretching direction. The relaxation temperature is preferably from 60°C to 150°C. The relaxation rate is preferably 3% to 6%. A-2. Heat treatment step As described above, in the heat treatment step, the stretched film is heated at a temperature of 105° C. or higher for 2 minutes or more. In one embodiment, the heating temperature in the heat treatment step is set to T 1 (° C.), the heating time in the heat treatment step is set to t 1 (minutes), and the stretched film before the heat treatment step is heated to TMA When the shrinkage rate in the test is set to A 1 , the value represented by 10×t 1 /{(Tg-T 1 ) 2 ×A 1 2 } is preferably greater than 2. The above-mentioned value is preferably greater than 2 and less than 150, more preferably 3-50, and especially preferably 3-10. Furthermore, (Tg-T 1 ) is preferably 5 or more. In another embodiment, when the shrinkage rate of the stretched film before the heat treatment step in the humidified TMA test is A 2 , it is preferably 10×t 1 /{(Tg-T 1 ) 2 ×A 2 2 } indicates a value greater than 0.9. The said value is preferably 1-60, more preferably 1-20, and especially preferably 1-10. The heating temperature is preferably from 105°C to 140°C, more preferably from 110°C to 130°C, especially preferably from 115°C to 125°C. The heating time is preferably from 2 minutes to 150 minutes, more preferably from 3 minutes to 120 minutes, and especially preferably from 5 minutes to 60 minutes. In the heat treatment step, any appropriate heating mechanism can be used as long as the stretched film can be heated under the above heating conditions. Typically, the heating mechanism is an oven. When a stretched film is obtained by stretching a long resin film while moving it in the longitudinal direction, heat treatment may be performed while moving the obtained stretched film in this state. A-3. Warm water treatment step As described above, in the warm water treatment step, the stretched film is immersed in warm water of 60° C. or higher for 3 minutes or more. When the immersion time in the warm water treatment step is set to t 2 (minutes), and the shrinkage rate of the stretched film before the warm water treatment step in the humidified TMA test is set to A 3 , it is preferably t 2 /A 3 2 represents a value greater than 20. The above-mentioned value is preferably greater than 20 and not more than 1000, more preferably 25-500, and especially preferably 30-150. The temperature of warm water is preferably from 60°C to 90°C, more preferably from 65°C to 85°C, especially preferably from 68°C to 82°C. The dipping time is preferably from 3 minutes to 60 minutes, more preferably from 3 minutes to 30 minutes, and especially preferably from 5 minutes to 20 minutes. In the warm water treatment step, any appropriate warm water treatment mechanism can be used as long as the stretched film can be heated under the above-mentioned heating conditions. Typically, the above-mentioned warm water treatment means is a warm water bath adjusted to an appropriate temperature. When a stretched film is obtained by stretching a long resin film while moving it in the longitudinal direction, warm water treatment may be performed while moving the obtained stretched film in this state. B. Retardation film The retardation film of the present invention is a retardation film exhibiting wavelength dependence of so-called inverse dispersion in which the in-plane retardation satisfies the relationship of Re(450)<Re(550). In the heating TMA test of the above-mentioned retardation film, the steps of heating from 30°C to Tg-25°C and then cooling to 30°C were repeated for 3 cycles, the shrinkage rate in the direction of the retardation axis was 0.1% or less, and the shrinkage rate in the environment In the humidified TMA test changing in the order of 25°C/25%RH, 85°C/2%RH, 85°C/85%RH, 85°C/2%RH, the shrinkage rate in the slow axis direction is 0.2% or less. The shrinkage rate in the slow axis direction in the heating TMA test is preferably from 0% to 0.08%, more preferably from 0% to 0.05%. The shrinkage rate in the slow axis direction in the above-mentioned humidified TMA test is preferably from 0% to 0.15%, more preferably from 0% to 0.10%. The retardation film as described above can suppress the change of the retardation value in a high-temperature and high-humidity environment. The value of Re(450)/Re(550) of the retardation film is preferably from 0.8 to 0.9, more preferably from 0.83 to 0.87. The in-plane retardation Re(550) of the retardation film is preferably from 100 nm to 180 nm, more preferably from 135 nm to 155 nm. The photoelastic coefficient of the retardation film is preferably 1×10 -12 (m 2 /N) to 40×10 -12 (m 2 /N), more preferably 1×10 -12 (m 2 /N) to 30 ×10 -12 (m 2 /N), especially preferably 1×10 -12 (m 2 /N) to 20×10 -12 (m 2 /N). Such a retardation film can be obtained by the manufacturing method demonstrated in A term, for example. Retardation films can be used for circular polarizers. C. Circular Polarizing Plate The circular polarizing plate of the present invention has a retardation layer including the aforementioned retardation film, and a polarizing element. The angle formed by the retardation axis of the retardation layer and the absorption axis of the polarizing element is 35°-55°, preferably 40°-50°, especially 43-47°, most preferably about 45°. Fig. 1 is a schematic cross-sectional view of a circular polarizing plate according to an embodiment of the present invention. The circular polarizing plate 100 sequentially includes a protective layer 10, a polarizing element 20, a retardation layer 30, and another retardation layer 40 (sometimes referred to as a second retardation layer) whose refractive index ellipsoid has a relationship of nz>nx=ny. ). In one embodiment, the circular polarizing plate 100 is in the shape of a single sheet. The retardation unevenness of the retardation layer 30 when the circular polarizing plate 100 is heated (heating retardation unevenness) is 3 nm or less. Furthermore, the retardation unevenness of the retardation layer 30 when the circular polarizing plate 100 is humidified (wetting retardation unevenness) is 3 nm or less. The uneven heating phase difference and the uneven humidifying phase difference are preferably from 0 nm to 2 nm, more preferably from 0 nm to 1 nm. The heating retardation unevenness can be determined as the absolute value of the value calculated by the following formula when, for example, glass is bonded to both sides of the circular polarizing plate 100 and heated (maintained at 85° C. for 240 hours). (R A1 - R B1 ) - (R A0 - R B0 ) Here, R A0 is the in-plane retardation value at the center of the retardation layer 30, and R B0 is the in-plane retardation at the apex of the retardation layer 30 R A1 is the in-plane retardation value of the central part of the retardation layer 30 after the above-mentioned heating, and R B1 is the in-plane retardation value of the above-mentioned apex part after the above-mentioned heating. The aforementioned humidity retardation unevenness can be used as the absolute value of the value calculated by the following formula when, for example, glass is attached to both sides of the circular polarizing plate 100 and humidified (maintained at 65°C/90%RH for 240 hours) And decided. (R A2 - R B2 ) - (R A0 - R B0 ) Here, R A2 is the in-plane retardation value of the central part of the retardation layer 30 after the above-mentioned humidification, and R B2 is the above-mentioned vertex after the above-mentioned humidification Partial in-plane phase difference. When the conventional circular polarizing plate is used in an image display device by laminating glass on both sides, the central portion of the retardation layer is less likely to be affected by the high-temperature and high-humidity environment. On the other hand, the end portion of the retardation layer is affected by The influence of high temperature and high humidity environment. As a result, the variation in the in-plane retardation value in the central part of the retardation layer is small, and the variation in the in-plane retardation value in the edge part of the retardation layer becomes large, which may cause uneven retardation. On the other hand, in the circular polarizing plate of the present invention, since the retardation layer includes the above-mentioned retardation film, variations in the in-plane retardation at the end of the retardation layer can be suppressed, and retardation unevenness can be suppressed. C-1. Polarizer As the polarizer, any appropriate polarizer can be used. For example, the resin film forming the polarizing element may be a single-layer resin film, or may be a laminate of two or more layers. Specific examples of polarizing elements including a single-layer resin film include highly hydrophilic polyvinyl alcohol (PVA)-based films, partially formalized PVA-based films, and ethylene-vinyl acetate copolymer-based partially saponified films. Molecular film dyed with dichroic substances such as iodine or dichroic dyes and stretched, polyene-based alignment films such as dehydrated PVA or dehydrochlorinated polyvinyl chloride, etc. It is preferable to use a polarizing element obtained by dyeing a PVA-based film with iodine and uniaxially stretching it in terms of excellent optical characteristics. The above-mentioned dyeing with iodine is performed, for example, by immersing a PVA-based film in an iodine aqueous solution. The stretching ratio of the uniaxial stretching is preferably 3 to 7 times. The stretching can be performed after the dyeing treatment, or can be performed while dyeing. In addition, dyeing may be performed after elongation. Swelling treatment, crosslinking treatment, washing treatment, drying treatment, etc. are performed on the PVA-based film as necessary. For example, by immersing the PVA-based film in water for washing before dyeing, not only can the dirt and anti-blocking agent on the surface of the PVA-based film be washed, but also the PVA-based film can be swollen to prevent uneven dyeing. Specific examples of polarizing elements obtained by using a laminate include: a laminate using a resin base material and a PVA-based resin layer (PVA-based resin film) laminated on the resin base material, or a resin base material formed by coating A polarizing element obtained from a laminate of PVA-based resin layers on the resin substrate. A polarizing element obtained by using a laminate of a resin base material and a PVA-based resin layer coated and formed on the resin base material can be produced, for example, by applying a PVA-based resin solution to the resin base material and drying it. A PVA-based resin layer is formed on the resin substrate to obtain a laminate of the resin substrate and the PVA-based resin layer; the laminate is stretched and dyed to make the PVA-based resin layer into a polarizing element. In this embodiment, typically, extending|stretching includes the process of immersing a laminated body in boric-acid aqueous solution, and extending it. Furthermore, the stretching may further include a step of stretching the laminate in air at a high temperature (for example, 95° C. or higher) before stretching in a boric acid aqueous solution, if necessary. The obtained resin substrate/polarizer laminate can be used directly (that is, the resin substrate can be used as a protective layer for the polarizer), or the resin substrate can be peeled off from the resin substrate/polarizer laminate, and An arbitrary appropriate protective layer according to the purpose is used on the peeling surface layer. The details of the manufacturing method of such a polarizing element are described in, for example, Japanese Patent Application Laid-Open No. 2012-73580. The entire description of this publication is incorporated in this specification as a reference. The thickness of the polarizing element is, for example, 1 μm˜80 μm. In one embodiment, the thickness of the polarizing element is preferably 1 μm˜15 μm, further preferably 3 μm˜10 μm, especially preferably 3 μm˜8 μm. When the thickness of the polarizing element is within such a range, curling during heating can be favorably suppressed, and favorable appearance durability during heating can be obtained. C-2. Second Retardation Layer Regarding the second retardation layer, as described above, the refractive index ellipsoid has the relationship of nz>nx=ny, and can function as a so-called anode C plate. When the circular polarizing plate having such a second retardation layer is used in an organic EL panel, changes in reflectance and reflection hue can be suppressed. The retardation Rth(550) in the thickness direction of the second retardation layer is preferably -50 nm to -300 nm, more preferably -70 nm to -250 nm, further preferably -90 nm to -200 nm, especially The best range is -100 nm to -180 nm. Here, "nx=ny" includes not only the case where nx and ny are strictly equal, but also the case where nx and ny are substantially equal. That is, the in-plane retardation Re(550) of the second retardation layer may be less than 10 nm. The second retardation layer having the refractive index characteristic of nz>nx=ny can be formed of any appropriate material. Preferably, the second retardation layer can include a liquid crystal material fixed in a vertical alignment. The vertically aligned liquid crystal material (liquid crystal compound) can be a liquid crystal monomer or a liquid crystal polymer. Specific examples of the method of forming the liquid crystal compound and the second retardation layer include the method of forming the liquid crystal compound and the retardation film described in [0020] to [0028] of JP-A-2002-333642. In this case, the thickness of the second retardation layer is preferably from 0.5 μm to 10 μm, more preferably from 0.5 μm to 8 μm, and still more preferably from 0.5 μm to 5 μm. As another preferred specific example, the second retardation layer may also include a retardation film made of fumaric diester resin described in Japanese Patent Laid-Open No. 2012-32784. In this case, the thickness is preferably from 5 μm to 80 μm, more preferably from 10 μm to 50 μm. C-3. Protective Layer The protective layer is formed of any appropriate protective film that can be used as a film for protecting a polarizing element. Specific examples of the material used as the main component of the protective film include cellulose-based resins such as triacetyl cellulose (TAC), polyester-based, polyvinyl alcohol-based, polycarbonate-based, and polyamide-based resins. , Polyimide-based, polyether-based, poly-based, polystyrene-based, polynorthylene-based, polyolefin-based, (meth)acrylic-based, acetate-based transparent resins, etc. Also, thermosetting resins such as (meth)acrylic, urethane, (meth)acrylic urethane, epoxy, silicone, etc. or ultraviolet curable resins can be mentioned. wait. In addition, glassy polymers, such as a siloxane polymer, are mentioned, for example. Moreover, the polymer film described in Unexamined-Japanese-Patent No. 2001-343529 (WO01/37007) can also be used. As the material of the film, for example, a resin combination including a thermoplastic resin having a substituted or unsubstituted imide group in a side chain, and a thermoplastic resin having a substituted or unsubstituted phenyl group and a nitrile group in a side chain can be used. As an example, the resin composition which has the alternating copolymer containing isobutylene and N-methylmaleimide, and an acrylonitrile-styrene copolymer is mentioned. The polymer film may be, for example, an extruded product of the aforementioned resin composition. The thickness of the protective film is preferably from 10 μm to 100 μm. The protective film may be laminated on the polarizing element via an adhesive layer (specifically, an adhesive layer or an adhesive layer), or may be laminated on the polarizing element in close contact (without an adhesive layer). The adhesive layer is formed of any appropriate adhesive. As an adhesive agent, the water-soluble adhesive agent whose main component is a polyvinyl-alcohol-type resin is mentioned, for example. The water-soluble adhesive mainly composed of a polyvinyl alcohol-based resin may further contain a metal compound colloid. The metal compound colloid may be one in which metal compound fine particles are dispersed in a dispersion medium, and may be electrostatically stabilized and permanently stable due to mutual repulsion of the same charges of the fine particles. The average particle size of the fine particles forming the metal compound colloid may be any appropriate value as long as it does not adversely affect optical properties such as polarization properties. It is preferably 1 nm to 100 nm, and more preferably 1 nm to 50 nm. This is because fine particles can be uniformly dispersed in the adhesive layer, adhesiveness can be ensured, and cracks can be suppressed. Furthermore, "crack point" refers to a local concave-convex defect generated at the interface between the polarizer and the protective film. The adhesive layer contains any suitable adhesive. Surface treatment such as hard coating treatment, anti-reflection treatment, anti-adhesion treatment, anti-glare treatment, etc. can also be performed on the surface of the protective film opposite to the polarizing element as required. Typically, the thickness of the protective film is 5 mm or less, preferably 1 mm or less, more preferably 1 μm to 500 μm, further preferably 5 μm to 150 μm. EXAMPLES Hereinafter, although an Example demonstrates this invention concretely, this invention is not limited to these Examples. The measuring method of each characteristic is as follows. In addition, unless otherwise indicated, "part" and "%" in an Example and a comparative example are based on weight. (1) Thickness was measured using a dial gauge (manufactured by PEACOCK, product name "DG-205 type pds-2"). (2) The retardation value was measured using Axoscan manufactured by Axometrics. (3) Dimensional change rate caused by heating (heating TMA test) The stretched film or retardation film obtained in the examples and comparative examples was cut into 20 mm (delay axis direction) × 4 mm (phase axis direction) direction) to make a measurement sample. Using a thermomechanical analysis device (manufactured by Hitachi High-Tech Science, model "TMA7100"), the steps of heating the measurement sample from 30°C to Tg-25°C and cooling to 30°C were repeated for 3 cycles. The dimensional change rate (shrinkage rate) in the longitudinal direction (slow axis direction) of the sample is measured. Furthermore, the heating rate was set at 5° C./min, and the holding time at each temperature was set at 10 minutes. (4) Dimensional change rate caused by humidification (humidification TMA test) The stretched film or retardation film obtained in the examples and comparative examples was cut into 20 mm (retardation axis direction) × 5 mm (further phase axis direction) to make measurement samples. Using a thermomechanical analysis device, after the environment is changed in the order of 25°C/25%RH, 85°C/2%RH, 85°C/85%RH, 85°C/2%RH, the longitudinal direction of the measured sample (late phase) The dimensional change rate (shrinkage rate) in the axial direction) is measured. Furthermore, the holding time at 25°C/25%RH is set to 60 minutes, the holding time at 85°C/2%RH is set to 60 minutes, and the holding time at 85°C/85%RH is set to 300 minutes . (5) Heating retardation unevenness The circular polarizing plates obtained in Examples and Comparative Examples were cut into 75 mm×150 mm in such a way that the absorption axis of the polarizing element becomes the short side direction, and the glass substrates were bonded together with an adhesive On both sides of the circular polarizing plate, make a measurement sample. For the measurement sample, measure the in-plane retardation value R A0 from the central part, the in-plane retardation value R B01 from the central part to the vertex in the slow axis direction, and the plane from the central part to the vertex in the advancing axis direction Internal phase difference R B02 . Then, heat the measurement sample in an oven at 85°C for 240 hours. For the heated measurement sample, measure the in-plane retardation value R A1 at the center, and the in-plane retardation from the center to the apex in the direction of the slow axis. value R B11 , and the in-plane phase difference value R B12 from the center part to the apex part located in the direction of the phase advance axis. The larger value among the absolute values of the values A and B obtained from the following formula was regarded as the heating phase difference unevenness. A=(R A1 -R B11 )-(R A0 -R B01 ) B=(R A1 -R B12 )-(R A0 -R B02 ) (6) Humidification phase difference is the same as (5) above Make a measurement sample of a circular polarizing plate, and measure the in-plane retardation value R A0 from the central part, the in-plane retardation value R B01 from the central part to the vertex in the direction of the retardation axis, and the in-plane retardation value R B01 from the central part to the direction of the advancing axis The in-plane phase difference value R B02 of the vertex part. Next, humidify the measurement sample in an oven at 65°C/90% for 240 hours. For the humidified measurement sample, measure the in-plane retardation value R A2 in the central part, and measure the in-plane retardation value R A2 from the central part to the apex in the slow axis direction. The in-plane phase difference value R B21 , and the in-plane phase difference value R B22 from the center part to the apex part in the direction of the phase advance axis. The greater value among the absolute values of the values C and D obtained from the following formula was regarded as the humidification phase difference unevenness. C=(R A2 -R B21 )-(R A0 -R B01 ) D=(R A2 -R B22 )-(R A0 -R B02 ) <Example 1> 1. Production of retardation film (polycarbonate Resin) Polymerization was performed using a batch polymerization device, which included two vertical reactors equipped with stirring blades and a reflux cooler controlled at 100°C. Add 29.60 parts by mass (0.046 mol) of bis[9-(2-phenoxycarbonylethyl) fluorine-9-yl]methane, 29.21 parts by mass (0.200 mol) of ISB (Isosorbide, isosorbide), SPG (Spiroglycol , spirodiol) 42.28 parts by mass (0.139 mol), DPC (Diphenyl Carbonate, diphenyl carbonate) 63.77 parts by mass (0.298 mol) and calcium acetate monohydrate as a catalyst 1.19×10 -2 parts by mass (6.78× 10 -5 mol). After the inside of the reactor was replaced with nitrogen under reduced pressure, it was heated with a heat medium, and stirring was started when the internal temperature became 100°C. 40 minutes after the start of the temperature rise, the internal temperature was brought to 220° C., and the temperature was controlled to maintain the temperature. At the same time, the pressure was reduced, and after reaching 220° C., it was brought to 13.3 kPa over 90 minutes. The phenol vapor produced by the polymerization reaction is introduced into the reflux cooler at 100°C, so that a certain amount of monomer components contained in the phenol vapor are returned to the reactor, and the uncondensed phenol vapor is introduced into the condenser at 45°C for recovery . After introducing nitrogen gas into the first reactor and temporarily restoring the pressure to atmospheric pressure, the oligomerized reaction liquid in the first reactor was transferred to the second reactor. Then, temperature rise and pressure reduction in the second reactor were started, and it took 50 minutes to bring the inner temperature to 240° C. and the pressure to 0.2 kPa. Thereafter, polymerization is carried out until a specific stirring power is obtained. When the specific power is reached, nitrogen gas is introduced into the reactor for repressurization, the polyester carbonate produced is extruded into water, and the strands are cut to obtain pellets. (Resin film) After vacuum-drying the obtained polycarbonate resin at 80° C. for 5 hours, use a single-screw extruder (manufactured by Toshiba Machine Co., Ltd., cylinder set temperature: 250° C.), T-die (width 200 mm , set temperature: 250°C), cooling roll (set temperature: 120-130°C) and the film-making device of the coiler to produce a resin film with a thickness of 135 μm. (Retardation Film) The obtained elongated resin film was stretched in the width direction at a stretching temperature of 134° C. and a stretching ratio of 2.8 times, and then the stretched film was subjected to relaxation treatment in the width direction to produce a stretched film. The conditions of the relaxation treatment were set at a relaxation temperature of 130°C and a relaxation rate of 4.5%. When this stretched film was subjected to the humidified TMA test of (4) above, the dimensional change rate was 0.30%. Also, when this stretched film was subjected to the heating TMA test of (3) above, the dimensional change rate was 0.05%. Next, by heating (heat-processing) the said stretched film at 125 degreeC for 2 minutes, the retardation film of thickness 48 micrometers was obtained. 2. Production of circular polarizing plate (polarizing element) Prepare long amorphous polyethylene terephthalate (A-PET) film (manufactured by Mitsubishi Plastics Corporation, trade name "Novaclear", thickness: 100 μm) As a substrate, an aqueous solution of polyvinyl alcohol (PVA) resin (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name "Gohsenol (registered trademark) NH-26") is applied and dried on one side of the substrate at 60°C. , and a PVA-based resin layer with a thickness of 7 μm was formed. The laminate obtained in this way was immersed in an insolubilization bath having a liquid temperature of 30° C. for 30 seconds (insolubilization step). Then, it was immersed in a dyeing bath having a liquid temperature of 30° C. for 60 seconds (dyeing step). Next, it was immersed in a crosslinking bath having a liquid temperature of 30° C. for 30 seconds (crosslinking step). Thereafter, while the laminate was immersed in a boric acid aqueous solution having a liquid temperature of 60° C., it was uniaxially stretched in the longitudinal direction (longitudinal direction) between rolls having different circumferential speeds. The time of immersion in the boric acid aqueous solution was 120 seconds, extending until just before the laminate was broken. Thereafter, after immersing the laminate in a cleaning bath, it was dried with warm air at 60° C. (washing and drying steps). In this manner, a long laminate (polarizer laminate) in which a polarizing element having a thickness of 5 μm was formed on a substrate was obtained. (Polarizing plate) A cycloolefin-based resin film (manufactured by ZEONOR Co., Ltd., trade name “ZEONOR FILM”, thickness: 25 μm) as a protective film was bonded to the surface of the above-mentioned laminate on the polarizing element side through an adhesive. And the said base material was peeled off from a polarizing element, and the polarizing plate was obtained by this. (The second retardation layer) 20 parts by weight of the side chain type liquid crystal polymer represented by the following chemical formula (I), and 80 parts by weight of a polymerizable liquid crystal (manufactured by BASF Corporation: trade name Paliocolor LC242) showing a nematic liquid crystal phase 5 parts by weight of a photopolymerization initiator (manufactured by BASF Corporation: trade name Irgacure 907) was dissolved in 400 parts by weight of cyclopentanone to prepare a liquid crystal coating liquid. Then, this coating solution was applied to a base film (northylene-based resin film: manufactured by Nippon Zeon Co., Ltd., trade name "ZEONOR") with a bar coater, and then heated and dried at 70°C. 4 minutes, thereby aligning the liquid crystal. The liquid crystal layer was irradiated with ultraviolet rays to harden the liquid crystal layer, thereby forming a liquid crystal solidified layer (thickness: 1 μm) serving as a retardation film on the substrate. Re(550) of this layer is 0 nm, Rth(550) is -71 nm (nx: 1.5326, ny: 1.5326, nz: 1.6550). [chemical 1]
Figure 02_image001
(Circular Polarizing Plate) The retardation film was bonded to the polarizing element side of the polarizing plate through an adhesive so that the angle formed by the absorption axis of the polarizing element and the retardation axis of the retardation film was 45°. Then, transfer the above-mentioned liquid crystal solidified layer to the surface of the retardation film opposite to the polarizing element, thereby producing a circular polarizing plate having a composition of protective layer/polarizing element/retardation layer/second retardation layer. <Example 2> Except having heated the stretched film at 125 degreeC for 10 minutes, it carried out similarly to Example 1, and produced the retardation film and circularly polarizing plate. <Example 3> Except having heated the stretched film at 125 degreeC for 30 minutes, it carried out similarly to Example 1, and produced the retardation film and circularly polarizing plate. <Example 4> Except having heated the stretched film at 125 degreeC for 60 minutes, it carried out similarly to Example 1, and produced the retardation film and circularly polarizing plate. <Example 5> Except having heated the stretched film at 125 degreeC for 120 minutes, it carried out similarly to Example 1, and produced the retardation film and circularly polarizing plate. <Example 6> Except having set relaxation temperature as 110 degreeC, it carried out similarly to Example 1, and produced the stretched film. When this stretched film was subjected to the humidified TMA test of (4) above, the dimensional change rate was 0.50%. When this stretched film was subjected to the heating TMA test of (3) above, the dimensional change rate was 0.08%. Except having used the said stretched film, it carried out similarly to Example 2, and produced the retardation film and circularly polarizing plate. <Example 7> Except having set the relaxation temperature at 80 degreeC, it carried out similarly to Example 1, and produced the stretched film. When this stretched film was subjected to the humidified TMA test of (4) above, the dimensional change rate was 0.70%. Furthermore, when this stretched film was subjected to the heating TMA test of (3) above, the dimensional change rate was 0.13%. Except having used the said stretched film, it carried out similarly to Example 2, and produced the retardation film and circularly polarizing plate. <Example 8> Except having heated the stretched film at 105 degreeC for 10 minutes, it carried out similarly to Example 1, and produced the retardation film and circularly polarizing plate. <Example 9> Except having heated the stretched film at 110 degreeC for 10 minutes, it carried out similarly to Example 1, and produced the retardation film and circularly polarizing plate. <Example 10> Except having heated the stretched film at 115 degreeC for 10 minutes, it carried out similarly to Example 1, and produced the retardation film and circular polarizing plate. <Example 11> Except having heated the stretched film at 120 degreeC for 10 minutes, it carried out similarly to Example 1, and produced the retardation film and circularly polarizing plate. <Example 12> Except having heated the stretched film at 130 degreeC for 10 minutes, it carried out similarly to Example 1, and produced the retardation film and circular polarizing plate. <Example 13> Instead of the above heat treatment, a retardation film and a circular polarizing plate were produced in the same manner as in Example 1 except that the stretched film was immersed in 60° C. warm water for 3 minutes (warm water treatment). <Example 14> Instead of the above heat treatment, except having immersed the stretched film in 60 degreeC warm water for 10 minutes, it carried out similarly to Example 1, and produced the retardation film and circular polarizing plate. <Example 15> Instead of the above heat treatment, except having immersed the stretched film in 60 degreeC warm water for 30 minutes, it carried out similarly to Example 1, and produced the retardation film and circular polarizing plate. <Example 16> Instead of the above heat treatment, except having immersed the stretched film in 60 degreeC warm water for 60 minutes, it carried out similarly to Example 1, and produced the retardation film and circular polarizing plate. <Example 17> Instead of the above heat treatment, except having immersed the stretched film in 60 degreeC warm water for 10 minutes, it carried out similarly to Example 6, and produced the retardation film and circular polarizing plate. <Example 18> Instead of the above heat treatment, except having immersed the stretched film in 60 degreeC warm water for 10 minutes, it carried out similarly to Example 7, and produced the retardation film and circular polarizing plate. <Example 19> A commercially available polycarbonate resin film (manufactured by Teijin Co., Ltd., product name "PURE-ACE RM", thickness 50 μm) was used as a stretched film. When this stretched film was subjected to the heating TMA test of (3) above, the dimensional change rate was 0.22%. When this stretched film was subjected to the humidified TMA test of (4) above, the dimensional change rate was 0.10%. Next, the said stretched film was heated (heat-processed) at 125 degreeC for 2 minutes, and the retardation film was obtained. Furthermore, except having used the said retardation film, it carried out similarly to Example 1, and produced the circular polarizing plate. <Example 20> Except having heated the stretched film at 125 degreeC for 10 minutes, it carried out similarly to Example 19, and produced the retardation film and circular polarizing plate. <Example 21> Except having heated the stretched film at 125 degreeC for 30 minutes, it carried out similarly to Example 19, and produced the retardation film and circularly polarizing plate. <Example 22> Except having heated the stretched film at 125 degreeC for 60 minutes, it carried out similarly to Example 19, and produced the retardation film and circularly polarizing plate. <Example 23> Except having heated the stretched film at 125 degreeC for 120 minutes, it carried out similarly to Example 19, and produced the retardation film and circular polarizing plate. <Example 24> Except having heated the stretched film at 105 degreeC for 10 minutes, it carried out similarly to Example 19, and produced the retardation film and circularly polarizing plate. <Example 25> Except having heated the stretched film at 110 degreeC for 10 minutes, it carried out similarly to Example 19, and produced the phase difference film and circularly polarizing plate. <Example 26> Except having heated the stretched film at 115 degreeC for 10 minutes, it carried out similarly to Example 19, and produced the retardation film and circularly polarizing plate. <Example 27> Except having heated the stretched film at 120 degreeC for 10 minutes, it carried out similarly to Example 19, and produced the phase difference film and circularly polarizing plate. <Comparative example 1> Except having heated the stretched film at 125 degreeC for 1 minute, it carried out similarly to Example 1, and produced the retardation film and circularly polarizing plate. <Comparative example 2> Except having heated the stretched film at 100 degreeC for 10 minutes, it carried out similarly to Example 1, and produced the retardation film and circularly polarizing plate. <Comparative example 3> The stretched film was produced similarly to Example 1 except having made relaxation temperature into 80 degreeC and relaxation rate into 0%. When this stretched film was subjected to the humidified TMA test of (4) above, the dimensional change rate was 0.90%. Furthermore, when this stretched film was subjected to the heating TMA test of (3) above, the dimensional change rate was 0.18%. Except having used the said stretched film, it carried out similarly to Example 2, and produced the retardation film and circularly polarizing plate. <Comparative example 4> Instead of the above heat treatment, except having immersed the stretched film in 60 degreeC warm water for 1 minute, it carried out similarly to Example 1, and produced the retardation film and circular polarizing plate. <Comparative example 5> Instead of the above heat treatment, except having immersed the stretched film in 60 degreeC warm water for 10 minutes, it carried out similarly to the comparative example 3, and produced the retardation film and circular polarizing plate. <Comparative example 6> Except not having heat-processed, it carried out similarly to Example 1, and produced the retardation film and circularly polarizing plate. <Comparative example 7> Except having heated the stretched film at 100 degreeC for 10 minutes, it carried out similarly to Example 19, and produced the retardation film and circularly polarizing plate. <Comparative example 8> Except having heated the stretched film at 125 degreeC for 1 minute, it carried out similarly to Example 19, and produced the retardation film and circular polarizing plate. <Comparative example 9> Except not having heat-processed, it carried out similarly to Example 19, and produced the retardation film and circularly polarizing plate. <Evaluation> Regarding Examples 1 to 12, Examples 19 to 27, Comparative Examples 1 to 3, and Comparative Examples 7 to 8, 10×t 1 /{(Tg−T 1 ) 2 was calculated as an index of heat treatment conditions. ×A 1 2 } and 10×t 1 /{(Tg-T 1 ) 2 ×A 2 2 }. Here, T1 is set as the heating temperature (°C) in the heat treatment step, t1 is set as the heating time (minutes) in the heat treatment step, and A1 is set as the heating time of the stretched film before the heat treatment step. The shrinkage rate (%) in the TMA test, A2 is set as the shrinkage rate (%) of the stretched film before the heat treatment step in the humidified TMA test. Regarding Examples 13 to 18 and Comparative Examples 4 to 5, t 2 /A 3 2 was calculated as an index of warm water treatment conditions. Here, t2 is the immersion time (minutes) in the warm water treatment step, and A3 is the shrinkage rate (%) of the stretched film before the warm water treatment step in the humidified TMA test. The retardation films of Examples 1 to 27 and Comparative Examples 1 to 9 were subjected to a humidified TMA test and a heated TMA test, and the dimensional change rates obtained by the respective tests were measured. Furthermore, about Examples 1-27 and Comparative Examples 1-9, the humidification phase difference unevenness and the heating phase difference unevenness were measured. Each result is shown in Table 1. [Table 1] Retardation film processing conditions Dimensional change rate (%) Uneven phase difference (nm) Heated TMA test Humidified TMA test type temperature(℃) time (minutes) index before processing after treatment before processing after treatment after heating After humidification Example 1 PC resin heating 125 2 0.99 0.05 0.02 0.30 0.18 0.9 2.6 Example 2 PC resin heating 125 10 4.94 0.05 0.02 0.30 0.14 0.7 2 Example 3 PC resin heating 125 30 14.81 0.05 0.01 0.30 0.10 0.6 1.5 Example 4 PC resin heating 125 60 29.63 0.05 0.01 0.30 0.07 0.4 1.3 Example 5 PC resin heating 125 120 59.26 0.05 0.00 0.30 0.04 0.4 1 Example 6 PC resin heating 125 10 1.78 0.08 0.03 0.50 0.17 1 2.5 Example 7 PC resin heating 125 10 0.91 0.13 0.04 0.70 0.20 1.2 2.9 Example 8 PC resin heating 105 10 0.91 0.05 0.04 0.30 0.20 1.2 2.9 Example 9 PC resin heating 110 10 1.23 0.05 0.03 0.30 0.18 1.1 2.6 Example 10 PC resin heating 115 10 1.78 0.05 0.03 0.30 0.16 1 2.4 Example 11 PC resin heating 120 10 2.78 0.05 0.02 0.30 0.14 0.8 2.1 Example 12 PC resin heating 130 10 11.11 0.05 0.01 0.30 0.11 0.7 1.8 Example 13 PC resin warm water 60 3 33.33 0.05 0.03 0.30 0.18 1 2.5 Example 14 PC resin warm water 60 10 111.11 0.05 0.02 0.30 0.13 0.9 1.9 Example 15 PC resin warm water 60 30 333.33 0.05 0.01 0.30 0.08 0.7 1.2 Example 16 PC resin warm water 60 60 666.67 0.05 0.00 0.30 0.06 0.5 0.8 Example 17 PC resin warm water 60 10 40.00 0.08 0.03 0.50 0.17 1 2.4 Example 18 PC resin warm water 60 10 20.41 0.13 0.05 0.70 0.20 1.3 2.9 Example 19 PURE-ACE RM heating 125 2 1.84 0.22 0.10 0.10 0.07 2.4 1.2 Example 20 PURE-ACE RM heating 125 10 9.18 0.22 0.07 0.10 0.06 1.6 0.9 Example 21 PURE-ACE RM heating 125 30 27.55 0.22 0.04 0.10 0.05 0.9 0.8 Example 22 PURE-ACE RM heating 125 60 55.10 0.22 0.03 0.10 0.04 0.8 0.5 Example 23 PURE-ACE RM heating 125 120 110.19 0.22 0.03 0.10 0.03 0.7 0.5 Example 24 PURE-ACE RM heating 105 10 1.69 0.22 0.10 0.10 0.09 2.9 1.5 Example 25 PURE-ACE RM heating 110 10 2.30 0.22 0.09 0.10 0.08 2.6 1.3 Example 26 PURE-ACE RM heating 115 10 3.31 0.22 0.09 0.10 0.07 2.3 1.2 Example 27 PURE-ACE RM heating 120 10 5.17 0.22 0.08 0.10 0.06 2 0.9 Comparative example 1 PC resin heating 125 1 0.49 0.05 0.04 0.30 0.25 1.3 4.2 Comparative example 2 PC resin heating 100 10 0.69 0.05 0.04 0.30 0.22 1.4 3.5 Comparative example 3 PC resin heating 125 10 0.55 0.18 0.05 0.90 0.24 1.5 3.7 Comparative example 4 PC resin warm water 60 1 11.11 0.05 0.04 0.30 0.25 1.4 3.8 Comparative Example 5 PC resin warm water 60 10 12.35 0.18 0.05 0.90 0.24 1.4 3.5 Comparative Example 6 PC resin none - - - 0.05 0.05 0.30 0.30 1.6 4.8 Comparative Example 7 PURE-ACE RM heating 100 10 1.29 0.22 0.16 0.10 0.10 3.5 1.6 Comparative Example 8 PURE-ACE RM heating 125 1 0.92 0.22 0.16 0.10 0.09 3.5 1.6 Comparative Example 9 PURE-ACE RM none - - - 0.22 0.22 0.10 0.10 4.7 1.7 As can be seen from Table 1, compared with the retardation film of the comparative example, the retardation film of the embodiment has a smaller dimensional change rate in the TMA test after heat treatment or warm water treatment. The unevenness is also small. [Industrial Applicability] The retardation film of the present invention can be preferably used for a circular polarizing plate, and the circular polarizing plate of the present invention can be preferably used for an organic EL panel.

10:保護層 20:偏光元件 30:相位差層 40:第2相位差層 100:圓偏光板 10: Protective layer 20: polarizing element 30: Retardation layer 40: The second retardation layer 100: circular polarizer

圖1係本發明之一實施形態之圓偏光板之概略剖視圖。Fig. 1 is a schematic cross-sectional view of a circular polarizing plate according to an embodiment of the present invention.

10:保護層 10: Protective layer

20:偏光元件 20: polarizing element

30:相位差層 30: Retardation layer

40:第2相位差層 40: The second retardation layer

100:圓偏光板 100: circular polarizer

Claims (7)

一種圓偏光板,其為單片狀,具有包含相位差膜之相位差層、及偏光元件,上述相位差層之遲相軸與上述偏光元件之吸收軸所成之角度為35°~55°,將上述相位差層之中心部之面內相位差值設為RA0,將頂點部分之面內相位差值設為RB0,將在兩面貼合玻璃並於85℃下保持240小時之後之上述相位差層之中心部之面內相位差值設為RA1,將在兩面貼合玻璃並於85℃下保持240小時之後之上述頂點部分之面內相位差值設為RB1,將在兩面貼合玻璃並於65℃/90%RH下保持240小時之後之上述相位差層之上述中心部之面內相位差值設為RA2,將在兩面貼合玻璃並於65℃/90%RH下保持240小時之後之上述頂點部分之面內相位差值設為RB2時,(RA1-RB1)-(RA0-RB0)之絕對值為3nm以下,(RA2-RB2)-(RA0-RB0)之絕對值為3nm以下,上述相位差膜係:面內相位差滿足Re(450)<Re(550)之關係,於將自30℃升溫至Tg-25℃並再次冷卻至30℃之步驟反覆進行3個循環之加熱TMA試驗中,遲相軸方向之收縮率為0.1%以下,且於使環境按25℃/25%RH、85℃/2%RH、85℃/85%RH、85℃/2%RH之順序變化之加濕TMA試驗中,遲相軸方向之收縮率為0.2%以下者, 此處,Re(450)及Re(550)分別表示23℃下之利用波長450nm及550nm之光測得之面內相位差。 A circular polarizing plate, which is in the shape of a single sheet, has a retardation layer comprising a retardation film, and a polarizing element, and the angle formed by the retardation axis of the retardation layer and the absorption axis of the polarizing element is 35° to 55° , set the in-plane retardation value at the center of the retardation layer as R A0 , and set the in-plane retardation value at the apex as R B0 , after laminating glass on both sides and keeping it at 85°C for 240 hours The in-plane retardation value of the central portion of the above-mentioned retardation layer is set as R A1 , and the in-plane retardation value of the above-mentioned apex portion after bonding glass on both sides and maintaining at 85°C for 240 hours is set as R B1 , and the The in-plane retardation value of the above-mentioned central part of the above-mentioned retardation layer after laminating glass on both sides and keeping it at 65°C/90%RH for 240 hours is set to R A2 . When the in-plane retardation value of the above-mentioned apex after being kept under RH for 240 hours is set to R B2 , the absolute value of (R A1 -R B1 )-(R A0 -R B0 ) is 3nm or less, (R A2 -R B2 )-(R A0 -R B0 ) has an absolute value of 3nm or less. The above retardation film system: the in-plane retardation satisfies the relationship of Re(450)<Re(550), and the temperature will rise from 30°C to Tg-25°C And the step of cooling to 30°C was repeated for 3 cycles in the heating TMA test, the shrinkage rate in the slow axis direction was less than 0.1%, and the environment was 25°C/25%RH, 85°C/2%RH, In the humidified TMA test with sequential changes of 85°C/85%RH and 85°C/2%RH, the shrinkage rate in the slow axis direction is 0.2% or less. Here, Re(450) and Re(550) respectively represent The in-plane retardation measured by light with wavelengths of 450nm and 550nm at 23°C. 如請求項1之圓偏光板,其中該相位差膜係由選自聚碳酸酯樹脂及聚酯碳酸酯系樹脂中之樹脂形成。 The circular polarizing plate according to claim 1, wherein the retardation film is formed of a resin selected from polycarbonate resins and polyester carbonate resins. 如請求項1之圓偏光板,其中該相位差膜之Re(450)/Re(550)為0.8~0.9。 The circular polarizing plate according to claim 1, wherein Re(450)/Re(550) of the retardation film is 0.8~0.9. 如請求項2之圓偏光板,其中該相位差膜之Re(450)/Re(550)為0.8~0.9。 The circular polarizing plate according to claim 2, wherein Re(450)/Re(550) of the retardation film is 0.8~0.9. 如請求項1至4中任一項之圓偏光板,其中該相位差膜之光彈性係數為1×10-12(m2/N)~40×10-12(m2/N)。 The circular polarizing plate according to any one of claims 1 to 4, wherein the photoelastic coefficient of the retardation film is 1×10 -12 (m 2 /N) to 40×10 -12 (m 2 /N). 如請求項1至4中任一項之圓偏光板,其依序具有保護膜、上述相位差層、上述偏光元件、及折射率橢球具有nz>nx=ny之關係之另一相位差層。 The circular polarizing plate according to any one of claims 1 to 4, which sequentially has a protective film, the aforementioned retardation layer, the aforementioned polarizing element, and another retardation layer whose refractive index ellipsoid has a relationship of nz>nx=ny . 如請求項5之圓偏光板,其依序具有保護膜、上述相位差層、上述偏光元件、及折射率橢球具有nz>nx=ny之關係之另一相位差層。 The circular polarizing plate according to claim 5, which sequentially has a protective film, the aforementioned retardation layer, the aforementioned polarizing element, and another retardation layer whose refractive index ellipsoid has a relationship of nz>nx=ny.
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