CN110535021B - Wavelength width tuning deep ultraviolet laser system with unchanged direction - Google Patents

Wavelength width tuning deep ultraviolet laser system with unchanged direction Download PDF

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Publication number
CN110535021B
CN110535021B CN201810509336.9A CN201810509336A CN110535021B CN 110535021 B CN110535021 B CN 110535021B CN 201810509336 A CN201810509336 A CN 201810509336A CN 110535021 B CN110535021 B CN 110535021B
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ultraviolet laser
deep ultraviolet
laser
frequency
light waves
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CN110535021A (en
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张申金
许凤良
宗楠
许祖彦
王志敏
杨峰
张丰丰
彭钦军
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Technical Institute of Physics and Chemistry of CAS
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Technical Institute of Physics and Chemistry of CAS
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/355Non-linear optics characterised by the materials used
    • G02F1/3551Crystals
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/37Non-linear optics for second-harmonic generation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/108Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
    • H01S3/109Frequency multiplication, e.g. harmonic generation

Abstract

The invention relates to the field of all-solid-state deep ultraviolet laser, and discloses a wavelength width tuning deep ultraviolet laser system with invariable direction, which comprises: the system comprises a fundamental frequency laser source, an ultraviolet laser emitting system, a deep ultraviolet laser emitting system, a vacuum system and a control device; the ultraviolet laser emission system includes: the first frequency doubling angle adjuster is arranged on the first frequency doubling angle adjuster; the deep ultraviolet laser emission system includes: a second frequency multiplying angle regulator and a second frequency multiplier arranged on the second frequency multiplying angle regulator. The wavelength width tuning deep ultraviolet laser system with the unchanged pointing direction can ensure that the pointing direction of deep ultraviolet output laser with different wavelengths is accurate, and has the characteristic that the pointing direction of the laser is unchanged when the wavelength of the deep ultraviolet laser is repeatedly tuned.

Description

Wavelength width tuning deep ultraviolet laser system with unchanged direction
Technical Field
The invention relates to the technical field of all-solid-state deep ultraviolet laser, in particular to a wavelength width tuning deep ultraviolet laser system with invariable direction.
Background
The deep ultraviolet light source generally refers to an electromagnetic radiation wave band with a wavelength between 40nm and 200nm, and has important application value in various fields such as high-resolution imaging, spectrum application, micro-machining, laser lithography and the like due to the short wavelength and high single photon energy, and is one of the most important development directions in the laser field. The nonlinear crystal frequency conversion technology is adopted at present, and high-beam-quality, short-pulse and narrow-linewidth deep ultraviolet laser can be generated. However, the deep ultraviolet band is invisible to human eyes, so that the optical path adjustment is inconvenient, and the current optical path adjustment means mainly depends on manual repeated adjustment.
Disclosure of Invention
Technical problem to be solved
The invention aims to solve the technical problem that in the prior art, the deep ultraviolet laser cannot be seen by human eyes and cannot be pointed accurately due to the fact that manual adjustment is needed, and provides a wavelength width tuning deep ultraviolet laser system with unchanged pointing direction.
(II) technical scheme
In order to solve the above technical problem, the present invention provides a wavelength-width-tunable deep ultraviolet laser system with a constant direction, comprising: the system comprises a fundamental frequency laser source, an ultraviolet laser emitting system, a deep ultraviolet laser emitting system, a vacuum system and a control device; the ultraviolet laser emission system includes: an ultraviolet laser generating unit including: the frequency multiplier comprises a first frequency doubling angle regulator and a first frequency multiplier arranged on the first frequency doubling angle regulator; the deep ultraviolet laser emission system comprises: a deep ultraviolet laser generating unit, the deep ultraviolet laser generating unit comprising: the second frequency doubling angle regulator and a second frequency multiplier are arranged on the second frequency doubling angle regulator; the vacuum system is provided with an ultraviolet laser input window and a deep ultraviolet laser output window which penetrate through an inner cavity, and the deep ultraviolet laser emitting system is arranged in the inner cavity of the vacuum system; the fundamental frequency laser source emits fundamental frequency light waves to the first frequency multiplier, and the fundamental frequency light waves are received and converted into ultraviolet light waves by the first frequency multiplier; the first frequency multiplier transmits ultraviolet light waves, the ultraviolet light waves enter the vacuum system through an ultraviolet laser input window, the ultraviolet light waves are received and converted into deep ultraviolet light waves by the second frequency multiplier, and the deep ultraviolet light waves are output through a deep ultraviolet laser output window; the first frequency doubling angle regulator and the second frequency doubling angle regulator are respectively electrically connected with the control device; the control device controls the first frequency doubling angle regulator to rotate so that the ultraviolet light waves emitted by the first frequency doubling angle regulator are aligned to the ultraviolet laser input window; the control device controls the second frequency doubling angle regulator to rotate so that the deep ultraviolet light wave emitted by the second frequency doubling device is output by aiming at the deep ultraviolet laser output window.
Further, the first frequency multiplier is a BBO crystal; the second frequency multiplier is a KBBF crystal.
Further, the fundamental frequency laser source emits fundamental frequency light waves with wavelengths of 750-820 nm.
Further, the ultraviolet laser emission system further includes: an ultraviolet laser transmission unit, the ultraviolet laser transmission unit comprising: a first electrically adjustable mirror mount; the first electric adjusting mirror frames are respectively provided with ultraviolet laser high-reflection lenses for reflecting ultraviolet light waves emitted by the first frequency multiplier into the ultraviolet laser input window; the control device is electrically connected with the first electric adjusting mirror bracket and used for controlling and adjusting the angle of the first electric adjusting mirror bracket so as to enable the reflected ultraviolet light waves to be aligned to the ultraviolet laser input window.
Further, the deep ultraviolet laser emission system further includes: a deep ultraviolet laser transmission unit, the deep ultraviolet laser transmission unit comprising: a second electrically adjustable mirror mount; a deep ultraviolet laser high-reflection lens is arranged on the second electric adjusting mirror frame and used for reflecting deep ultraviolet light waves emitted by the second frequency multiplier to the deep ultraviolet laser output window; the control device is electrically connected with the second electric adjusting mirror bracket and used for controlling and adjusting the angle of the second electric adjusting mirror bracket so as to enable the reflected deep ultraviolet light waves to be aligned to the deep ultraviolet laser output window.
Further, the deep ultraviolet laser transmission unit further includes: a lens; the lens is arranged between the second electric adjusting mirror bracket and the deep ultraviolet laser output window and is used for collimating deep ultraviolet light waves.
Furthermore, a first photoelectric detector is arranged between the ultraviolet laser input window and the ultraviolet laser generating unit, and a second photoelectric detector is arranged between the deep ultraviolet laser transmission unit and the deep ultraviolet laser output window.
Further, the first frequency doubling angle adjuster, the second frequency doubling angle adjuster, the first electric adjusting mirror bracket and the second electric adjusting mirror bracket are respectively in closed-loop feedback electric control.
Further, the ultraviolet laser emission system is in a vacuum environment.
Further, the inner cavity of the vacuum system is filled with nitrogen with the purity of more than 99.9 percent.
Furthermore, the vacuum system is also provided with an observation window penetrating through the inner cavity.
Furthermore, an ultraviolet light output window penetrating through the inner cavity is further arranged on the vacuum system.
(III) advantageous effects
According to the wavelength width tuning deep ultraviolet laser system with the unchanged pointing direction, the ultraviolet laser input window and the deep ultraviolet laser output window are set to point at the output direction of deep ultraviolet light, meanwhile, the angle of the second frequency doubling angle regulator under different wavelengths is controlled through the control device, so that the matched angle of the second frequency doubling device is accurately controlled, the repeatability of generation and transmission pointing of the deep ultraviolet laser under different wavelengths is ensured, the pointing accuracy of the deep ultraviolet output laser with different wavelengths is ensured, and the characteristic that the laser pointing direction is unchanged when the wavelength of the deep ultraviolet laser is repeatedly tuned is achieved.
Drawings
FIG. 1 is a general schematic diagram of a constant-orientation wavelength-width-tuned deep ultraviolet laser system of the present invention;
FIG. 2 is a schematic structural diagram of the UV light generating unit in FIG. 1;
FIG. 3 is a schematic diagram of the vacuum system of FIG. 1;
FIG. 4 is a schematic structural diagram of the deep ultraviolet light generating unit in FIG. 1;
fig. 5 is a schematic structural diagram of the deep ultraviolet light transmission unit in fig. 1.
Detailed Description
The following detailed description of embodiments of the present invention is provided in connection with the accompanying drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
FIG. 1 is a schematic diagram of a constant-directivity wavelength-width-tunable DUV laser system according to the present invention; FIG. 2 is a schematic structural diagram of the UV light generating unit in FIG. 1; FIG. 3 is a schematic diagram of the vacuum system of FIG. 1; FIG. 4 is a schematic structural diagram of the deep ultraviolet light generating unit in FIG. 1; fig. 5 is a schematic structural diagram of the deep ultraviolet light transmission unit in fig. 1. As shown in fig. 1 to 5, a wavelength-width-tunable deep ultraviolet laser system with constant directivity according to an embodiment of the present invention includes: a fundamental frequency laser source 5, an ultraviolet laser emitting system 1, a deep ultraviolet laser emitting system 2, a vacuum system 3 and a control device 4; the ultraviolet laser emission system 1 includes: an ultraviolet laser generating unit 11, the ultraviolet laser generating unit 11 comprising: a first frequency doubling angle adjuster 112 and a first frequency multiplier 111 arranged on the first frequency doubling angle adjuster 112; the deep ultraviolet laser emission system 2 includes: a deep ultraviolet laser generating unit 21, the deep ultraviolet laser generating unit 21 comprising: a second frequency multiplying angle adjuster 212 and a second frequency multiplier 211 disposed on the second frequency multiplying angle adjuster 212; the vacuum system 3 is provided with an ultraviolet laser input window 31 and a deep ultraviolet laser output window 32 which penetrate through an inner cavity, and the deep ultraviolet laser emitting system 2 is arranged in the inner cavity of the vacuum system 3; the fundamental frequency laser source 5 emits fundamental frequency light waves to the first frequency multiplier 111, and the fundamental frequency light waves are received and converted into ultraviolet light waves by the first frequency multiplier 111; the first frequency multiplier 111 emits ultraviolet light waves, enters the vacuum system 3 through the ultraviolet laser input window 31, is received and converted into deep ultraviolet light waves by the second frequency multiplier 211, and the deep ultraviolet light waves are output through the deep ultraviolet laser output window 32; the first frequency doubling angle adjuster 112 and the second frequency doubling angle adjuster 212 are electrically connected to the control device 4, respectively; the control device 4 controls the first frequency doubling angle adjuster 112 to rotate so that the ultraviolet light waves emitted by the first frequency doubler 111 are directed at the ultraviolet laser input window 31; the control device 4 controls the second frequency doubling angle adjuster 212 to rotate, so that the duv wave emitted by the second frequency doubler 211 is output in alignment with the duv laser output window 32.
Specifically, the fundamental frequency laser source 5 generally emits fundamental frequency light waves with a wavelength in the range of 750-820 nm.
The first frequency multiplier 111 is a BBO crystal, and can be configured with a plurality of BBO crystals, as shown in fig. 2, in this embodiment, two BBO crystals with completely consistent cutting angles are disposed on the two first frequency multiplier angle adjusters 112, respectively. The first frequency doubling angle adjuster 112 may be a closed-loop electric rotating table structure, but is not limited thereto. The control device 4 is provided with a coding control program, and the angle of the first frequency doubling angle adjuster 112 under different wavelengths is set, so that the matching angle of the BBO crystal can be accurately controlled, and the repeatability of generation and transmission pointing of ultraviolet laser under different wavelengths is ensured. The ultraviolet laser generating unit 11 converts the fundamental frequency light wave emitted from the fundamental frequency laser source 5 into an ultraviolet light wave, thereby emitting the ultraviolet light wave outward.
The second frequency multiplier 211 is a KBBF crystal and is disposed on the second frequency multiplying angle adjuster 212. The second frequency doubling angle adjuster 212 may be a two-dimensional adjuster, including two-dimensional high-precision adjustment in y and θ directions, the adjustment precision is higher than 0.1mm, and the adjustment precision is higher than 0.1 ° through one-dimensional rotation adjustment, but not limited thereto. Similarly, the control device 4 is provided with a coding control program to set the angle of the second frequency doubling angle adjuster 212 at different wavelengths, so that the matching angle of the KBBF crystal can be accurately controlled, and the repeatability of generation and transmission direction of the ultraviolet laser at different wavelengths can be ensured. The deep ultraviolet laser generating unit 21 converts the ultraviolet light waves emitted by the ultraviolet laser emitting system 1 into deep ultraviolet light waves with a wide tuning wavelength, thereby emitting the deep ultraviolet light waves outwards.
The vacuum system 3 is a sealed cavity, the inner cavity is in a vacuum environment, the inner cavity can be filled with nitrogen with the purity of more than 99.9 percent, and the vacuum system 3 can be provided with a gas inlet 35 and a gas outlet 36, so that the gas in the inner cavity can be conveniently replaced. The ultraviolet laser input window 31 and the deep ultraviolet laser output window 32 can both transmit light waves, the ultraviolet light waves emitted by the first frequency multiplier 111 are transmitted into the inner cavity of the vacuum system 3 through the ultraviolet laser input window 31, and the deep ultraviolet light waves emitted by the second frequency multiplier 211 are transmitted out of the inner cavity of the vacuum system 3 through the deep ultraviolet laser output window 31. The vacuum system 3 is also provided with an observation window 34 penetrating through the inner cavity, so that observation is facilitated. The vacuum system 3 may further be provided with an ultraviolet light output window 33 penetrating the inner cavity to output a part of ultraviolet light waves.
According to the wavelength-width-tuned deep ultraviolet laser system with the unchanged pointing direction, the ultraviolet laser input window 31 and the deep ultraviolet laser output window 32 are set to point to the output direction of deep ultraviolet light, meanwhile, the angle of the second frequency multiplier angle regulator 212 under different wavelengths is controlled through the control device 4, so that the matched angle of the second frequency multiplier 211 is accurately controlled, the repeatability of generation and transmission pointing of deep ultraviolet laser under different wavelengths is ensured, the deep ultraviolet output laser with different wavelengths is ensured to point accurately, and the characteristic that the laser pointing direction is unchanged when the wavelength of the deep ultraviolet laser is repeatedly tuned is achieved.
Based on the above-mentioned embodiment, as a preferred embodiment, referring to fig. 1, the ultraviolet laser emitting system 1 further includes: an ultraviolet laser transmission unit 12, the ultraviolet laser transmission unit 12 comprising: a first electrically adjustable mirror mount 121; the first electric adjusting mirror holder 121 is provided with an ultraviolet laser high-reflection lens, and is configured to reflect ultraviolet light waves emitted by the first frequency multiplier 111 into the ultraviolet laser input window 31; the control device 4 is electrically connected to the first electrically adjustable lens holder 121, and is configured to control and adjust an angle of the first electrically adjustable lens holder 121, so that the reflected ultraviolet light wave is directed at the ultraviolet laser input window 31.
The angle of the first electric adjusting mirror bracket 121 is controlled by the control device 4, so that ultraviolet light waves emitted by the first frequency multiplier 111 can be conveniently and accurately transmitted to the ultraviolet laser input window 31, and the design flexibility of the device can be improved. Similarly, a high reflection mirror may be disposed between the fundamental frequency laser source 5 and the first frequency multiplier 111 for reflecting the fundamental frequency light wave emitted from the fundamental frequency laser source 5.
Based on the above embodiment, as a preferred embodiment, referring to fig. 5, the deep ultraviolet laser emission system 2 further includes: a deep ultraviolet laser transmission unit 22, the deep ultraviolet laser transmission unit 22 comprising: a second electrically adjustable mirror mount 221; a deep ultraviolet laser high-reflection lens is arranged on the second electric adjusting mirror bracket 221 and is used for reflecting deep ultraviolet light waves emitted by the second frequency multiplier 211 to the deep ultraviolet laser output window 32; the control device 4 is electrically connected to the second electric adjusting frame 221, and is configured to control and adjust an angle of the second electric adjusting frame 221, so that the reflected deep ultraviolet light wave is directed at the deep ultraviolet laser output window 32.
The angle of the second electric adjusting mirror bracket 221 is controlled by the control device 4, so that the deep ultraviolet light waves emitted by the second frequency multiplier 211 can be conveniently and accurately transmitted to the deep ultraviolet laser output window 32, and the design flexibility of the device can be improved. A plurality of second electric adjusting mirror frames 221 can be arranged between the deep ultraviolet laser generating unit 21 and the deep ultraviolet laser output window 32, the number of the second electric adjusting mirror frames is not limited, as shown in fig. 4, the deep ultraviolet laser high reflection lens of the present embodiment is a deep ultraviolet 45 ° high reflection mirror, and is installed on the second electric adjusting mirror frames 221, and in the present embodiment, three second electric adjusting mirror frames 221 are arranged, so that the deep ultraviolet light wave emitted by the second frequency multiplier 211 is reflected for three times and reaches the deep ultraviolet laser output window 32. Further, a lens may be disposed between the second electric adjusting mirror bracket 221 and the duv laser output window 32 to collimate the reflected duv light wave. The lens may be disposed behind a second motorized adjustment mirror mount 221 along the direction of the transmission of the deep ultraviolet laser light; or behind the third second motorized adjustment mirror mount 221.
It should be noted that the first frequency doubling angle adjuster 112, the second frequency doubling angle adjuster 212, the first electric adjusting mirror holder 121, and the second electric adjusting mirror holder 221 are respectively controlled by closed-loop feedback electric control. The ultraviolet laser emitting system 1 may also be operated in a vacuum environment.
Based on the above embodiment, as a preferred embodiment, referring to fig. 5, a small glass aperture diaphragm 222 may be further disposed between two adjacent high-reflection deep ultraviolet laser lenses, a circular small aperture is disposed in the middle of the small glass aperture diaphragm 222, and the diameter of the small aperture is 0.5 to 10mm, so that the deep ultraviolet laser generates fluorescence on the small glass aperture diaphragm 222, and the deep ultraviolet laser is adjusted to pass through the center of the small glass aperture diaphragm 222, thereby ensuring that the deep ultraviolet laser is transmitted according to a pre-designed optical path. The number of the small glass aperture stops 222 is not limited, and the number in this embodiment is 4, and may be other numbers. Still can set up between two dark ultraviolet laser high reflection lenses and remove glass 223 for observe the fluorescence that dark ultraviolet laser produced, adjust dark ultraviolet laser light path, its quantity is not limited, and this embodiment removes glass 223 and is 1. The glass aperture stop 222 and the moving glass 223 are materials having fluorescence generating ability in the deep ultraviolet band, such as quartz and the like.
Specifically, a first photodetector 6 may be further disposed between the ultraviolet laser input window 31 and the ultraviolet laser generating unit 11, and a second photodetector 7 may be further disposed between the deep ultraviolet laser transmitting unit 22 and the deep ultraviolet laser output window 32.
The wavelength width tuning deep ultraviolet laser system with invariable direction provided by the invention has the working principle that: the high repetition precision of the closed-loop electric device is utilized to determine the position of the electric device under different output wavelengths of the deep ultraviolet wide tuning laser, so that the pointing accuracy of the deep ultraviolet output laser with different wavelengths is ensured, and the characteristic that the pointing direction of the laser is unchanged when the wavelength of the deep ultraviolet laser is repeatedly tuned is achieved.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.

Claims (12)

1. A constant-directivity wavelength-width-tunable deep ultraviolet laser system comprising: the system comprises a fundamental frequency laser source, an ultraviolet laser emitting system, a deep ultraviolet laser emitting system, a vacuum system and a control device;
the ultraviolet laser emission system includes: an ultraviolet laser generating unit including: the frequency multiplier comprises a first frequency doubling angle regulator and a first frequency multiplier arranged on the first frequency doubling angle regulator;
the deep ultraviolet laser emission system comprises: a deep ultraviolet laser generating unit, the deep ultraviolet laser generating unit comprising: the second frequency doubling angle regulator and a second frequency multiplier are arranged on the second frequency doubling angle regulator;
the vacuum system is provided with an ultraviolet laser input window and a deep ultraviolet laser output window which penetrate through an inner cavity, and the deep ultraviolet laser emitting system is arranged in the inner cavity of the vacuum system;
the fundamental frequency laser source emits fundamental frequency light waves to the first frequency multiplier, and the fundamental frequency light waves are received and converted into ultraviolet light waves by the first frequency multiplier; the first frequency multiplier transmits ultraviolet light waves, the ultraviolet light waves enter the vacuum system through an ultraviolet laser input window, the ultraviolet light waves are received and converted into deep ultraviolet light waves by the second frequency multiplier, and the deep ultraviolet light waves are output through a deep ultraviolet laser output window;
the first frequency doubling angle regulator and the second frequency doubling angle regulator are respectively electrically connected with the control device; the control device controls the first frequency doubling angle regulator to rotate so that the ultraviolet light waves emitted by the first frequency doubling angle regulator are aligned to the ultraviolet laser input window; the control device controls the second frequency doubling angle regulator to rotate so that the deep ultraviolet light wave emitted by the second frequency doubling device is output by aiming at the deep ultraviolet laser output window;
the second frequency doubling angle regulator is a two-dimensional regulator;
the first frequency doubling angle regulator can be in a closed-loop electric rotating table structure; the control device is provided with a coding control program, and the control device is used for setting the angles of the first frequency doubling angle regulator under different wavelengths and setting the angles of the second frequency doubling angle regulator under different wavelengths.
2. The direction-invariant wavelength width-tuned deep ultraviolet laser system of claim 1, wherein the first frequency multiplier is a BBO crystal; the second frequency multiplier is a KBBF crystal.
3. The constant-direction, wavelength-width-tunable DUV laser system of claim 1, wherein said fundamental laser source emits fundamental light waves having wavelengths of 750-820 nm.
4. The direction-invariant wavelength width-tuned deep ultraviolet laser system of claim 1, wherein the ultraviolet laser emitting system further comprises: an ultraviolet laser transmission unit, the ultraviolet laser transmission unit comprising: a first electrically adjustable mirror mount; the first electric adjusting mirror frame is provided with an ultraviolet laser high-reflection lens used for reflecting ultraviolet light waves emitted by the first frequency multiplier into the ultraviolet laser input window;
the control device is electrically connected with the first electric adjusting mirror bracket and used for controlling and adjusting the angle of the first electric adjusting mirror bracket so as to enable the reflected ultraviolet light waves to be aligned to the ultraviolet laser input window.
5. The constant-orientation, wavelength-width-tuned DUV laser system according to claim 4, wherein said DUV laser emitting system further comprises: a deep ultraviolet laser transmission unit, the deep ultraviolet laser transmission unit comprising: a second electrically adjustable mirror mount; a deep ultraviolet laser high-reflection lens is arranged on the second electric adjusting mirror frame and used for reflecting deep ultraviolet light waves emitted by the second frequency multiplier to the deep ultraviolet laser output window;
the control device is electrically connected with the second electric adjusting mirror bracket and used for controlling and adjusting the angle of the second electric adjusting mirror bracket so as to enable the reflected deep ultraviolet light waves to be aligned to the deep ultraviolet laser output window.
6. The constant-orientation, wavelength-width-tuned DUV laser system of claim 5, wherein said DUV laser delivery unit further comprises: a lens; the lens is arranged between the second electric adjusting mirror bracket and the deep ultraviolet laser output window and is used for collimating deep ultraviolet light waves.
7. The invariable-orientation wavelength-width-tuned DUV laser system according to claim 5, wherein a first photodetector is disposed between said UV laser input window and said UV laser generating unit, and a second photodetector is disposed between said DUV laser transmitting unit and said DUV laser output window.
8. The constant-directivity wavelength-width-tunable deep ultraviolet laser system of claim 5, wherein the first frequency doubling angle adjuster, the second frequency doubling angle adjuster, the first electrically adjustable mirror mount, and the second electrically adjustable mirror mount are each closed-loop feedback electrically controlled.
9. The constant-orientation, wavelength-width-tuned deep ultraviolet laser system of any of claims 1-8, wherein the ultraviolet laser emitting system is in a vacuum environment.
10. The constant-orientation, wavelength-width-tuned deep ultraviolet laser system of any of claims 1-8, wherein the interior cavity of the vacuum system is filled with nitrogen having a purity of greater than 99.9%.
11. The constant-orientation, wavelength-width-tuned DUV laser system according to any of claims 1-8, wherein said vacuum system further comprises a viewing window through said cavity.
12. The constant-orientation, wavelength-width-tuned deep ultraviolet laser system of any of claims 1-8, wherein the vacuum system further comprises an ultraviolet light output window through the cavity.
CN201810509336.9A 2018-05-24 2018-05-24 Wavelength width tuning deep ultraviolet laser system with unchanged direction Active CN110535021B (en)

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CN111106507A (en) * 2019-11-25 2020-05-05 苏州英谷激光有限公司 Laser directivity adjusting assembly, laser and laser light directivity adjusting method

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CN102324689A (en) * 2011-08-25 2012-01-18 中国科学院理化技术研究所 A kind of direct frequency multiplication produces the device of narrow linewidth deep ultraviolet laser
CN104064949A (en) * 2014-05-30 2014-09-24 中国科学院理化技术研究所 Generation and transmission device for deep ultraviolet laser
CN104104006A (en) * 2013-04-02 2014-10-15 中国科学院理化技术研究所 Device for generation of high-power vacuum ultraviolet laser by direct frequency multiplication and method thereof
CN105305214A (en) * 2015-12-03 2016-02-03 哈尔滨工业大学 Method for acquiring high repetition frequency and large energy ultraviolet tunable laser pulses

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US5260953A (en) * 1992-09-08 1993-11-09 Alcon Surgical, Inc. Tunable solid-state laser
CN102324689A (en) * 2011-08-25 2012-01-18 中国科学院理化技术研究所 A kind of direct frequency multiplication produces the device of narrow linewidth deep ultraviolet laser
CN104104006A (en) * 2013-04-02 2014-10-15 中国科学院理化技术研究所 Device for generation of high-power vacuum ultraviolet laser by direct frequency multiplication and method thereof
CN104064949A (en) * 2014-05-30 2014-09-24 中国科学院理化技术研究所 Generation and transmission device for deep ultraviolet laser
CN105305214A (en) * 2015-12-03 2016-02-03 哈尔滨工业大学 Method for acquiring high repetition frequency and large energy ultraviolet tunable laser pulses

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