CN110534393B - Antenna, plasma processing apparatus and plasma processing method - Google Patents
Antenna, plasma processing apparatus and plasma processing method Download PDFInfo
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- CN110534393B CN110534393B CN201910422476.7A CN201910422476A CN110534393B CN 110534393 B CN110534393 B CN 110534393B CN 201910422476 A CN201910422476 A CN 201910422476A CN 110534393 B CN110534393 B CN 110534393B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/12—Supports; Mounting means
- H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
- H01Q1/26—Supports; Mounting means by structural association with other equipment or articles with electric discharge tube
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
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- Engineering & Computer Science (AREA)
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- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The invention provides a technology for increasing the density of turns of a spiral antenna which can be used for generating inductively coupled plasma. The antenna of the present invention is an antenna that can be used for generating inductively coupled plasma, and has a plurality of antenna components. Each of the plurality of antenna components is formed in a plate shape and connected in series to form a polygonal spiral shape. In addition, of the 2 antenna components to be connected to each other among the plurality of antenna components, one of the 2 antenna components has a convex portion protruding in the plate surface direction and the other has a concave portion recessed in the plate surface direction, and the 2 antenna components are connected to each other by combining the concave portion and the convex portion and soldering or welding.
Description
Technical Field
The invention relates to an antenna, a plasma processing apparatus and a plasma processing method
Background
Conventionally, a technique of performing Plasma processing on a target object by using an Inductively Coupled Plasma (ICP) is known. Inductively coupled plasma is generated by causing a high-frequency current to flow through a helical antenna to generate a magnetic field around the antenna, and causing high-frequency discharge by an induced electric field induced by the generated magnetic field.
Documents of the prior art
Patent document
Patent document 1: japanese laid-open patent publication No. 62-210051
Disclosure of Invention
Technical problem to be solved by the invention
The present invention provides a technique for increasing the density of turns of a helical antenna that can be used for generating inductively coupled plasma.
Technical solution for solving technical problem
An antenna according to an aspect of the present invention is an antenna that can be used to generate inductively coupled plasma, and includes a plurality of antenna components. Each of the plurality of antenna components is formed in a plate shape and connected in series to form a polygonal spiral shape. In addition, of the 2 antenna components to be connected to each other among the plurality of antenna components, one of the 2 antenna components has a convex portion protruding in the plate surface direction and the other has a concave portion recessed in the plate surface direction, and the 2 antenna components are connected to each other by combining the concave portion and the convex portion and soldering or welding.
Effects of the invention
According to the present invention, the number of turns of the helical antenna that can be used to generate the inductively coupled plasma can be increased in density.
Drawings
Fig. 1 is a diagram showing an example of the configuration of a plasma processing apparatus according to the embodiment.
Fig. 2 is a perspective view showing an example of the antenna according to the embodiment.
Fig. 3 is an exploded perspective view showing an example of the antenna according to the embodiment.
Fig. 4 is an enlarged perspective view showing an example of a connection portion in the antenna according to the embodiment.
Fig. 5 is a plan view showing an example of the convex portion of the embodiment.
Fig. 6 is a plan view showing an example of the concave portion of the embodiment.
Fig. 7 is a plan view showing an example of the convex portion of the first modification.
Fig. 8 is a plan view showing an example of a convex portion according to a second modification.
Fig. 9 is a plan view showing an example of a concave portion according to a third modification.
Fig. 10 is an exploded perspective view showing an example of an antenna according to a fourth modification.
Fig. 11 is an exploded perspective view showing an example of an antenna according to a fifth modification.
Fig. 12 is a perspective view showing an example of an antenna according to a sixth modification.
Fig. 13 is an enlarged perspective view showing an example of a connection portion in the antenna according to the sixth modification.
Description of the reference numerals
G glass substrate
1 plasma processing apparatus
10 Chamber
11 treatment chamber
12 antenna chamber
20 dielectric window
30 base
40 gas supply part
50 control device
100 antenna
110 antenna component
111 convex part
111a first narrow part
111b first wide part
111c contact part
112 recess
112a second narrow width portion
112b second wide width part
113 first straight line part
114 second straight line part
115 corner
116 inclined part
117 first parallel portion
118 second parallel portion.
Detailed Description
Hereinafter, a mode (hereinafter, referred to as "embodiment") for carrying out the antenna, the plasma processing apparatus, and the plasma processing method according to the present invention will be described in detail with reference to the drawings. The antenna, the plasma processing apparatus, and the plasma processing method of the present invention are not limited to the embodiments. In addition, the embodiments can be appropriately combined within a range in which the processing contents are not contradictory. In the following embodiments, the same portions are denoted by the same reference numerals, and redundant description thereof is omitted.
For example, in a process for manufacturing a Flat Panel Display (FPD), a glass substrate as an object to be processed may be subjected to Plasma processing using Inductively Coupled Plasma (ICP) as a Plasma source. Inductively coupled plasma is generated by causing a high-frequency current to flow through a helical antenna to generate a magnetic field around the antenna, and generating a high-frequency discharge by an induced electric field induced by the generated magnetic field.
Conventionally, a plurality of antenna components constituting a helical antenna are connected to each other by screws or the like. In such a connection method, the end portions of the 2 antenna components connected to each other are overlapped with each other, and the overlapped portions are fixed with screws or the like. Therefore, the thickness increases at the connecting portion, and the distance between the adjacent antenna components cannot be reduced to a certain degree or more. Therefore, in a connection method using a screw or the like, it is difficult to increase the density of the number of turns of the helical antenna, in other words, it is difficult to increase the number of turns per unit length in the axial direction of the helix.
Therefore, it is desirable to provide a technique for increasing the density of turns of a helical antenna that can be used for generating inductively coupled plasma.
[ Structure of plasma processing apparatus ]
First, the structure of the plasma processing apparatus according to the embodiment will be described with reference to fig. 1. Fig. 1 is a diagram showing an example of the configuration of a plasma processing apparatus according to the embodiment.
The plasma processing apparatus 1 shown in fig. 1 performs plasma processing such as etching processing, film forming processing, and the like using inductively coupled plasma on a glass substrate G for an FPD as an object to be processed. The object to be processed is not limited to a glass substrate, and may be a semiconductor substrate or another substrate. The object to be processed may be an object other than a substrate
As shown in fig. 1, the plasma processing apparatus 1 has a chamber 10 formed of a conductive material such as aluminum. A not-shown feed-in/feed-out port for feeding in/out a glass substrate G (hereinafter simply referred to as "substrate G") is formed in a side surface of the chamber 10. The feed/discharge port can be opened and closed by a gate valve not shown. The chamber 10 is grounded.
The inside of the chamber 10 is divided into 2 spaces by a dielectric window 20 formed of a dielectric. Specifically, the interior of the chamber 10 is divided into a processing chamber 11 in a space below the dielectric window 20 and an antenna chamber 12 in a space above the dielectric window 20. The dielectric forming the dielectric window 20 is made of, for example, ceramics such as Alumina (Alumina) or quartz.
A susceptor 30 for placing a substrate G is disposed in the processing chamber 11. The base 30 is formed of an electric conductor such as aluminum. The susceptor 30 includes, for example, an electrostatic chuck not shown, and can hold the substrate G placed on the upper surface by the electrostatic chuck. The electrostatic chuck is controlled by a control device 50 described later.
The susceptor 30 also functions as an electrode for ions introduced into the plasma (for biasing). The susceptor 30 is connected to a high-frequency power supply 33 via a power supply line 31 and a matching box 32, and high-frequency power having a frequency of, for example, 13MHz is supplied from the high-frequency power supply 33 via the power supply line 31 and the matching box 32. When high-frequency power is applied to the susceptor 30, ions in the plasma generated in the processing chamber 11 are efficiently introduced into the substrate G by the self-bias generated by the high-frequency power. The matching unit 32 and the high-frequency power supply 33 are controlled by a control device 50 described later.
The processing chamber 11 is connected to a gas supply unit 40. The gas supply unit 40 includes, for example, a gas supply pipe 41 having one end connected to the process chamber 11, a gas supply source 42 connected to the other end of the gas supply pipe 41, a valve 43 and an MFC (Mass Flow Controller) 44 provided in the middle of the gas supply pipe 41. The gas supply source 42 supplies, for example, CF4Gas, chlorine gas, or the like. The process gas supplied from the gas supply source 42 is supplied into the process chamber 11 through the valve 43 and the gas supply pipe 41, with its flow rate being controlled by the MFC 44. The MFC44 and the valve 43 are controlled by a control device 50 described later.
The gas supply unit 40 supplies the process gas not only from the side wall of the process chamber 11 but also from the dielectric window 20 which is the ceiling of the process chamber 11. In this case, for example, a shower housing having a plurality of discharge ports arranged in a cross shape in a plan view is provided in the dielectric window 20, and the gas supply pipe 41 is connected to the shower housing.
The bottom of the processing chamber 11 is connected to an exhaust device 14 such as a vacuum pump through an exhaust pipe 13. The processing chamber 11 is evacuated by the evacuation device 14, and thereby the inside of the processing chamber 11 is maintained in a desired vacuum atmosphere (for example, 1.33Pa) during the plasma processing. The exhaust device 14 is controlled by a control device 50 described later.
The antenna 100 is housed in the antenna chamber 12. The antenna 100 is formed of a conductor such as copper. The antenna chamber 12 is covered with a shield case made of an electric conductor such as aluminum, and the antenna 100 is housed in the shield case.
One end of the antenna 100 is connected to a high-frequency power supply 63 via a feeder 61 and a matching box 62, and the other end is grounded. The radio-frequency power supply 63 supplies radio-frequency power for plasma generation (for example, radio-frequency power having a frequency of 27 MHz) to the antenna 100 via the power supply line 61 and the matching box 62. The matching unit 62 and the high-frequency power supply 63 are controlled by a control device 50 described later.
The antenna 100 generates a high-frequency magnetic field by high-frequency power supplied from the high-frequency power supply 63. This generates a high-frequency induced electric field in the processing chamber 11. The process gas supplied into the process chamber 11 from the gas supply unit 40 is excited by the induced electric field generated in the process chamber 11, and plasma of the process gas is generated in the process chamber 11. Then, plasma processing such as etching is performed on the substrate G on the susceptor 30 by using ions and active species contained in the plasma. As described above, the antenna 100 of the embodiment can be used for generation of inductively coupled plasma.
The plasma processing apparatus 1 includes a control device 50 that controls each part of the plasma processing apparatus 1. The control device 50 includes a Memory such as a ROM (Read Only Memory) or a RAM (Random Access Memory) and a processor such as a CPU (Central Processing Unit). The memory in the control device 50 stores data such as recipes and programs. The processor in the control device 50 reads and executes a program stored in the memory in the control device 50, and controls each part of the plasma processing apparatus 1 based on data such as a recipe stored in the memory in the control device 50.
The program may be stored in a computer-readable storage medium, or may be installed from the storage medium to a storage unit of the control device 50. Examples of the computer-readable storage medium include a Hard Disk (HD), a Flexible Disk (FD), an optical disk (CD), a magneto-optical disk (MO), and a memory card.
[ Structure of antenna ]
Next, the structure of the antenna 100 will be described with reference to fig. 2 and 3. Fig. 2 is a perspective view showing an example of the antenna 100 according to the embodiment. Fig. 3 is an exploded perspective view showing an example of the antenna 100 according to the embodiment.
As shown in fig. 2, the antenna 100 of the embodiment has a polygonal spiral shape. The antenna 100 includes a plurality of antenna constituent members 110. Each of the plurality of antenna components 110 is formed in a plate shape and is connected in series to form a polygonal spiral shape. The polygonal shape preferably corresponds to the shape of the substrate, and since the glass substrate used in the FPD manufacturing process is rectangular, rectangular antennas are often used in FPD manufacturing apparatuses.
Each antenna component 110 is formed in a substantially L-shape in a plan view viewed in the axial direction of the spiral (in this case, the Z-axis direction), and as shown in fig. 3, a convex portion 111 is formed at one end portion and a concave portion 112 is formed at the other end portion.
Specifically, each antenna configuration member 110 includes: a first straight line portion 113 extending in a first direction (for example, the Y-axis direction in fig. 3) in a plan view; and a second straight portion 114 extending in a second direction (for example, the X-axis direction in fig. 3) orthogonal to the first direction in a plan view. Each antenna component 110 includes a corner 115 connecting the first straight portion 113 and the second straight portion 114. The first linear portion 113 has a convex portion 111 at an end portion opposite to the corner portion 115, and the second linear portion 114 has a concave portion 112 at an end portion opposite to the corner portion 115. Further, a concave portion 112 may be provided at an end portion of the first linear portion 113 on the side opposite to the corner portion 115, and a convex portion 111 may be provided at an end portion of the second linear portion 114 on the side opposite to the corner portion 115. In addition, the convex portion 111 and the concave portion 112 are both disposed in the same direction of the first direction or the second direction.
Each antenna component 110 is configured as described above, and the operation of fitting the convex portion 111 of one antenna component 110 into the concave portion 112 of the other antenna component 110 is repeated, thereby configuring the antenna 100 having a polygonal spiral shape.
Specifically, one of the 2 antenna components 110 connected to each other is inverted with respect to the other of the two, and the convex portion 111 of one antenna component 110 is fitted into the concave portion 112 of the other antenna component 110. Thereby, a rectangle is formed in a plan view. Here, the second linear portion 114 of the antenna component member 110 has an inclined portion 116 inclined at a predetermined angle with respect to a direction (here, a horizontal direction) orthogonal to the axial direction of the spiral. Therefore, the convex portion 111 of the other antenna component member 110 is offset in the spiral axial direction (here, downward) with respect to the concave portion 112 of the antenna component member 110. Therefore, the convex portion 111 of one antenna component 110 is repeatedly fitted into the concave portion 112 of the other antenna component 110, thereby forming a spiral shape having a rectangular shape in a plan view. In this way, by forming the plurality of antenna components 110 in the same shape, the manufacturing cost of the antenna 100 can be suppressed. The inclined portion 116 may be vertically erected in the axial direction of the spiral. In this case, the antenna components need to be arranged so as to be shifted from the vertical positions thereof.
The second linear portion 114 includes a first parallel portion 117 and a second parallel portion 118 each having a plate surface parallel to the plate surface of the first linear portion 113, and the inclined portion 116 is disposed between the first parallel portion 117 and the second parallel portion 118. The concave portion 112 is formed at the end of the second parallel portion 118, and thus the convex portion 111 and the concave portion 112 are each in a plane parallel to each other.
The 2 antenna constituent members 110 to be joined to each other are joined together by fitting one convex portion 111 into the other concave portion 112 and soldering or welding. Brazing is performed using a brazing solder. The brazing solder is, for example, silver solder, and penetrates into the gap between the convex portion 111 and the concave portion 112 by capillary action in a molten state, and then solidifies again to join the convex portion 111 and the concave portion 112. The melting point of the brazing solder is lower than the melting point of the antenna constituent member 110. Therefore, by performing soldering, the 2 antenna component members 110 can be joined together without melting. Brazing also includes soldering. In addition, welding is not performed using a welding rod. This can reduce the weld deposit. For example, Tig (Tungsten Inert Gas) welding can be used as the welding method.
Fig. 4 is an enlarged perspective view showing an example of a connection portion in the antenna 100 according to the embodiment. As described above, the 2 antenna components 110 to be connected to each other are connected by fitting the convex portions 111 protruding in the plate surface direction of the antenna component 110 into the concave portions 112 recessed in the plate surface direction of the antenna component 110 and soldering or welding. Therefore, as shown in fig. 4, according to the antenna 100 of the embodiment, the 2 antenna components 110 can be connected together without overlapping in the direction orthogonal to the plate surface direction (in this case, the Z-axis direction). That is, the 2 antenna components 110 can be connected without a step.
Therefore, according to the antenna 100 of the embodiment, the distance C between the antenna components 110 stacked in the axial direction of the spiral (in this case, the Z-axis direction) can be shortened as compared with the connection method using screws. That is, the number of turns of the helical antenna 100 can be increased in density. Specifically, the distance C between the antenna components 110 stacked in the axial direction of the spiral can be made as close as possible to the spatial insulation distance. The spatial insulation distance is a distance between conductive members that can ensure electrical insulation.
The antenna 100 of the embodiment is configured by a plurality of antenna components 110 formed in a long plate shape. Therefore, the surface area is increased as compared with the case where the antenna component is formed in a linear shape, for example, and therefore a high heat dissipation effect can be obtained.
[ Structure of convex portion and concave portion ]
Next, specific configurations of the convex portions 111 and the concave portions 112 will be described with reference to fig. 5 and 6. Fig. 5 is a plan view showing an example of the convex portion 111 of the embodiment, and fig. 6 is a plan view showing an example of the concave portion 112 of the embodiment.
As shown in fig. 5, the convex portion 111 has a first narrow width portion 111a and a first wide width portion 111 b. The first narrow-width portion 111a has a first width dimension D1. The first wide portion 111b is provided on the projecting direction distal end side of the projection 111 with respect to the first narrow portion 111a, and has a second width dimension D2 larger than the first width dimension. The first width D1, the second width D2, and the third width D3 to the fifth width D5 described later are widths in a plan view when viewed from the axial direction of the spiral (here, the Z-axis direction).
On the other hand, the concave portion 112 has a shape corresponding to the convex portion 111. Specifically, as shown in fig. 6, the recess 112 has a second narrow width portion 112a and a second wide width portion 112 b. The second narrow-width portion 112a has a third width dimension D3. The second wide portion 112b is provided further to the recessed direction inner side than the second narrow portion 112a, and has a fourth width D4 larger than the third width D3.
The convex portion 111 and the concave portion 112 are configured as described above, and the convex portion 111 can be fitted into the concave portion 112 from the spiral axial direction (here, the Z-axis direction). By fitting the convex portion 111 into the concave portion 112, 2 antenna component members 110 can be coupled on one surface. Further, by fitting the convex portion 111 into the concave portion 112, when a force in a direction other than the axial direction of the spiral is applied to the antenna component member 110, the convex portion 111 is fastened to the concave portion 112, and the antenna component member 110 can be prevented from being detached from another antenna component member 110. For example, when the antenna 100 is placed in a vertical position, that is, when the antenna 100 is placed with the axis of the spiral oriented in the horizontal direction, a force in the direction of gravity, which is a force in a direction other than the axial direction of the spiral, is easily applied to the connection portion of the antenna component 110. However, according to the antenna 100 of the embodiment, even when the antenna component 110 is placed vertically, the antenna component 110 can be prevented from being detached from another antenna component 110.
Fig. 5 shows an imaginary line V along the inner periphery of the second wide width portion 112 b. As shown in fig. 5, the first wide width portion 111b of the convex portion 111 is similar to the second wide width portion 112b of the concave portion 112. Here, the first wide width part 111b and the second wide width part 112b are formed to be circular in a plan view. By forming the first wide width portion 111b and the second wide width portion 112b in a circular shape in this manner, ease of manufacturing the convex portion 111 and the concave portion 112 can be improved.
The first wide portion 111b of the convex portion 111 is smaller than the second wide portion 112b of the concave portion 112. Therefore, in a state where the convex portion 111 is fitted into the concave portion 112, a gap-like gap is formed between the convex portion 111 and the concave portion 112. Therefore, the molten brazing solder is easily infiltrated between the joining surfaces. Further, the brazing solder penetrates the gap, and thereby the increase in thickness of the connection portion of the 2 antenna component members 110 can be suppressed. In the welding, the gap formed between the convex portion 111 and the concave portion 112 may be small, and the thickness of the welded portion can be suppressed from decreasing.
As shown in fig. 5, the convex portion 111 has a plurality of contact portions 111c that protrude from a part of the outer periphery of the first wide portion 111b in the plate surface direction to contact the inner periphery of the second wide portion 112b of the concave portion 112. Here, 1 (3 in total) contact portions 111c are provided at the front end and the left and right ends of the first wide portion 111b, respectively.
As described above, by providing the contact portion 111c, 2 antenna component members 110 can be pre-fixed before soldering. This eliminates the need for fixing 2 antenna components 110 by, for example, a jig, and thus improves the ease of assembling antenna 100.
The first width dimension D1 is, for example, 5mm, and the second width dimension D2 is, for example, 6.85 mm. The third width dimension D3 is 5mm, for example, and the fourth width dimension D4 is 7 mm. The fifth width D5, which is the width from the contact portion 111c provided at the left end of the first wide portion 111b to the contact portion 111c provided at the right end, is, for example, 7.15mm, and is slightly larger than the fourth width D4. Thus, when the convex portion 111 is fitted into the concave portion 112, the contact portion 111c is slightly pressed, and the 2 antenna component members 110 can be preliminarily fixed. The width dimension of the contact portion 111c is, for example, 1 mm.
[ modified examples ]
Next, a modification of the antenna 100 of the embodiment will be described. First, a modification of the convex portion 111 and the concave portion 112 will be described with reference to fig. 7 to 9. Fig. 7 is a plan view showing an example of the convex portion 111 of the first modification, and fig. 8 is a plan view showing an example of the convex portion 111 of the second modification. Fig. 9 is a plan view showing an example of the concave portion 112 according to the third modification.
In the above-described embodiment, the case where the first wide width portion 111b of the convex portion 111 has a perfect circular shape in a plan view is given as an example, but the shape of the first wide width portion 111b is not necessarily a perfect circular shape. For example, as shown in fig. 7, the first wide width portion 111b may have an elliptical shape in plan view. In this case, the second wide portion 112b of the concave portion 112 is also formed in an elliptical shape in plan view corresponding to the convex portion 111. Here, the shape of the first wide portion 111b is an ellipse having a major axis in a direction orthogonal to the protruding direction of the convex portion 111, but may be an ellipse having a major axis in the protruding direction of the convex portion 111.
The first wide portion 111b may have a width larger than at least the first narrow portion 111a, and is not necessarily circular (perfect circle, ellipse). For example, as shown in fig. 8, the first wide portion 111b may have a substantially inverted triangular shape that gradually narrows from both ends of the linear distal end portion toward the first narrow portion 111a in a plan view. In this case, the second wide portion 112b of the concave portion 112 is also formed in a substantially inverted triangular shape in plan view corresponding to the convex portion 111. The first wide width part 111b and the second wide width part 112b may have a polygonal shape (e.g., a square shape or a pentagonal shape) other than a triangular shape in plan view.
In the above-described embodiment, the case where the plurality of contact portions 111c are provided on the convex portion 111 has been described, but the plurality of contact portions 111c may be provided on the concave portion 112. For example, as shown in fig. 9, the concave portion 112 may have a plurality of contact portions 111c that protrude from a part of the inner periphery of the second wide portion 112b in the plate surface direction so as to contact the outer periphery of the first wide portion 111b of the convex portion 111. The contact portion 111c may be provided in both the convex portion 111 and the concave portion 112.
In the above-described embodiment and the modifications, the case where the convex portion 111 or the concave portion 112 has the plurality of contact portions 111c has been described, but the convex portion 111 or the concave portion 112 may have at least 1 contact portion 111 c.
Next, a modification of the antenna component 110 will be described with reference to fig. 10 and 11. Fig. 10 is an exploded perspective view showing an example of an antenna 100 according to a fourth modification, and fig. 11 is an exploded perspective view showing an example of an antenna 100 according to a fifth modification.
As shown in fig. 10, each of the antenna constituent members 110 may be divided into a first antenna constituent member 110A and a second antenna constituent member 110B having a straight line shape. The first antenna component 110A has a first straight portion 113, and a convex portion 111 is formed at one end portion of the first straight portion 113 and a concave portion 112 is formed at the other end portion. The second antenna component 110B has a second linear portion 114, and a convex portion 111 is formed at one end of the second linear portion 114 and a concave portion 112 is formed at the other end. The antenna 100 is configured by alternately and serially connecting a first antenna component 110A and a second antenna component 110B.
As described above, the antenna 100 may include 2 types of components, i.e., the first antenna component 110A and the second antenna component 110B.
As shown in fig. 11, the antenna 100 may include a third antenna component 110C and a fourth antenna component 110D. Each of the third antenna component 110C and the fourth antenna component 110D is formed in a substantially L-shape in plan view. The third antenna component 110C has projections 111 formed at both ends thereof. Accordingly, the concave portions 112 are formed at both end portions of the fourth antenna component member 110D. The antenna 100 is configured by alternately and serially connecting the third antenna component 110C and the fourth antenna component 110D.
As described above, the antenna 100 may include the third antenna component 110C having the convex portions 111 at both ends and the fourth antenna component 110D having the concave portions 112 at both ends.
Here, an example is given in which the antenna 100 is configured by 2 types of antenna constituent members, but the antenna 100 may be configured by 3 or more types of antenna constituent members. For example, the antenna 100 may include 4 types of elements, i.e., the first antenna element 110A, the second antenna element 110B, the third antenna element 110C, and the fourth antenna element 110D.
In the above-described embodiment and the modifications, the antenna 100 having a rectangular shape in a plan view is exemplified, but the shape of the antenna 100 does not necessarily have to be a rectangular shape in a plan view, and may be a pentagonal shape in a plan view, for example. That is, the antenna 100 may have a polygonal spiral shape.
In the above-described embodiment and the modifications, the case where the antenna 100 is placed horizontally in the antenna chamber 12, that is, the case where the axis of the spiral is disposed so as to face the vertical direction, has been described. However, the present invention is not limited to this, and the antenna 100 may be disposed so that the axis of the spiral is oriented in the horizontal direction. That is, the antenna 100 may be disposed vertically in the antenna chamber 12.
Fig. 12 is a perspective view showing an example of an antenna 100 according to a sixth modification. Fig. 13 is an enlarged perspective view showing an example of a connection portion in the antenna 100 according to the sixth modification. As shown in fig. 12 and 13, the antenna 100 disposed vertically is formed in a spiral shape by connecting a plurality of antenna components 110 in series, similarly to the antenna 100 disposed horizontally. That is, the operation of fitting the convex portion 111 of one antenna component 110 into the concave portion 112 of the other antenna component 110 is repeated, whereby the antenna 100 having a polygonal spiral shape is configured.
Although the example in which the antenna 100 shown in fig. 2 is disposed vertically is given here, the antennas 100 of the first to fifth modifications may be disposed vertically.
The plasma processing apparatus 1 may have a plurality of antennas 100. The antenna 100 can increase the density of turns. In other words, since miniaturization can be achieved, the number of antennas that can be configured per unit area can be increased. Thus, for example, when the plurality of antennas 100 are individually controlled to control the density of plasma by region, finer region control can be performed.
As described above, the antenna 100 according to the embodiment is an antenna that can be used to generate inductively coupled plasma, and includes a plurality of antenna components (for example, the antenna component 110, and the first antenna component 110A to the fourth antenna component 110D). Each of the plurality of antenna components is formed in a plate shape and connected in series to form a polygonal spiral shape. In addition, of the 2 antenna components to be connected to each other among the plurality of antenna components, one of the 2 antenna components has a convex portion 111 protruding in the plate surface direction and the other has a concave portion 112 recessed in the plate surface direction, and the 2 antenna components are connected by combining the concave portion 112 and the convex portion 111 and soldering or welding.
This makes it possible to reduce the thickness of the connection portion as compared with a connection method using a screw, and thus to shorten the distance between the antenna components stacked in the axial direction of the spiral. Therefore, the number of turns of the helical antenna 100 can be increased in density.
The convex portion 111 may include: a first narrow-width portion 111a having a first width dimension D1; and a first wide width portion 111b provided on the projecting direction front end side of the first narrow width portion 111a and having a second width dimension D2 larger than the first width dimension D1. Further, the recess 112 may include: a second narrow-width portion 112a having a third width dimension D3; and a second wide portion 112b provided further to the recessed direction inner side than the second narrow portion 112a and having a fourth width D4 larger than the third width D3.
When a force in a direction other than the axial direction of the spiral is applied to the antenna component by fitting the convex portion 111 into the concave portion 112, the convex portion is fastened to the concave portion, and the antenna component can be prevented from being detached from another antenna component.
The first wide width part 111b may have a shape similar to the second wide width part 112b and smaller than the second wide width part 112b when viewed from a direction orthogonal to the plate surface direction. In this case, at least one of the first wide width part 111b and the second wide width part 112b may have at least 1 contact part 111c protruding in the plate surface direction to contact the second wide width part 112b or the first wide width part 111 b.
As described above, by providing the contact portion 111c, 2 antenna component parts can be preliminarily fixed before soldering or welding. This eliminates the need for fixing 2 antenna components by a jig or the like, for example, and thus can improve the ease of assembling the antenna 100.
The 2 antenna components to be connected to each other are connected to each other without overlapping in a direction orthogonal to the plate surface direction by combining the concave portion 112 and the convex portion 111 and performing soldering or welding.
Thus, 2 antenna components can be connected to one surface, and therefore, the distance between the antenna components stacked in the axial direction of the spiral can be shortened. Therefore, the number of turns of the helical antenna 100 can be increased in density.
At least 2 or more antenna components among the plurality of antenna components may have the same shape. This can suppress the manufacturing cost of the antenna 100.
The present embodiments are to be considered in all respects as illustrative and not restrictive. Indeed, the above-described embodiments may be embodied in a variety of ways. The above-described embodiments may be omitted, replaced, or changed in various ways without departing from the scope and spirit of the appended claims.
Claims (7)
1. An antenna usable for generating an inductively coupled plasma, the antenna characterized by:
has a plurality of antenna components each formed in a plate shape and connected in series to form a polygonal spiral shape,
in the 2 antenna components to be connected to each other among the plurality of antenna components, one of the 2 antenna components has a convex portion protruding in a plate surface direction, and the other has a concave portion recessed in the plate surface direction, and the 2 antenna components are connected to each other by combining the concave portion and the convex portion and performing soldering or welding.
2. The antenna of claim 1, wherein:
the convex portion includes:
a first narrow-width portion having a first width dimension; and
a first wide width portion provided on a front end side in a protruding direction than the first narrow width portion and having a second width dimension larger than the first width dimension,
the recess includes:
a second narrow-width portion having a third width dimension; and
and a second wide portion provided further to the recessed direction inner side than the second narrow portion and having a fourth width dimension larger than the third width dimension.
3. The antenna of claim 2, wherein:
a shape of the first wide width portion as viewed from a direction orthogonal to the plate surface direction is similar to and smaller than the second wide width portion,
the first wide width part has at least 1 contact part protruding in the board surface direction to be in contact with the second wide width part, or the second wide width part has at least 1 contact part protruding in the board surface direction to be in contact with the first wide width part, or the first wide width part has at least 1 contact part protruding in the board surface direction to be in contact with the second wide width part and the second wide width part has at least 1 contact part protruding in the board surface direction to be in contact with the first wide width part.
4. An antenna according to any of claims 1 to 3, wherein:
the 2 antenna components to be connected to each other are connected to each other without overlapping in a direction orthogonal to the plate surface direction by combining the concave portion and the convex portion and soldering or welding the same.
5. An antenna according to any of claims 1 to 3, wherein:
at least 2 or more antenna components among the plurality of antenna components have the same shape.
6. A plasma processing apparatus, comprising:
a chamber capable of accommodating an object to be processed; and
an antenna for generating an inductively coupled plasma within the chamber,
the antenna has a plurality of antenna components each formed in a plate shape and connected in series to form a polygonal spiral shape,
one of 2 antenna components to be connected to each other among the plurality of antenna components has a convex portion protruding in a plate surface direction, and the other has a concave portion recessed in the plate surface direction, and the 2 antenna components are connected to each other by combining the concave portion and the convex portion and performing soldering or welding.
7. A plasma processing method, comprising:
a housing step of housing the object to be processed in the chamber; and
a plasma generating step in which an inductively coupled plasma is generated within the chamber using an antenna,
wherein the antenna includes a plurality of antenna constituent members each formed in a plate shape and constituting a polygonal spiral shape by connecting them in series, one of 2 antenna constituent members to be connected to each other among the plurality of antenna constituent members has a convex portion protruding in a plate surface direction and the other has a concave portion recessed in the plate surface direction, and the 2 antenna constituent members are connected together by combining the concave portion and the convex portion and soldering or welding.
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| JP2018099393 | 2018-05-24 | ||
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| JP2019020391A JP7138582B2 (en) | 2018-05-24 | 2019-02-07 | Antenna, plasma processing apparatus and plasma processing method |
| JP2019-020391 | 2019-02-07 |
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| JP (1) | JP7138582B2 (en) |
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| JP7403348B2 (en) * | 2020-02-21 | 2023-12-22 | 東京エレクトロン株式会社 | Antenna segment and inductively coupled plasma processing equipment |
| CN111785605A (en) * | 2020-06-23 | 2020-10-16 | 北京北方华创微电子装备有限公司 | Coil structure and semiconductor processing equipment |
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- 2019-02-07 JP JP2019020391A patent/JP7138582B2/en active Active
- 2019-05-10 TW TW108116161A patent/TWI809099B/en active
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| KR102188410B1 (en) | 2020-12-08 |
| CN110534393A (en) | 2019-12-03 |
| JP2019207862A (en) | 2019-12-05 |
| TW202008856A (en) | 2020-02-16 |
| KR20190134499A (en) | 2019-12-04 |
| JP7138582B2 (en) | 2022-09-16 |
| TWI809099B (en) | 2023-07-21 |
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