CN110489018A - A kind of photosensitive pore structure, sensitive component, touch control panel device and display device - Google Patents
A kind of photosensitive pore structure, sensitive component, touch control panel device and display device Download PDFInfo
- Publication number
- CN110489018A CN110489018A CN201910666246.5A CN201910666246A CN110489018A CN 110489018 A CN110489018 A CN 110489018A CN 201910666246 A CN201910666246 A CN 201910666246A CN 110489018 A CN110489018 A CN 110489018A
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- Prior art keywords
- hole
- pore structure
- microns
- shield layer
- light
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/042—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by opto-electronic means
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
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- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Human Computer Interaction (AREA)
- Laminated Bodies (AREA)
Abstract
The present invention provides a kind of photosensitive pore structure, sensitive component, touch device and display device.The photosensitive pore structure includes transparent substrate, light shield layer, the transparent substrate has the first surface and second surface being oppositely arranged, the light shield layer is formed on the first surface of the transparent substrate, and the light shield layer has light transmission effect of several through-holes to expose first surface to realize photosensitive pore structure.By the way that aperture, the through-hole distance of the through-hole of different zones is arranged, environment light can be accurately detected, so that the uniformity and accuracy of the environment light of sensing are all higher.
Description
Technical field
The present invention relates to touch-control and field of display technology, a kind of photosensitive pore structure, sensitive component, touch surface are related to
Panel assembly and display device.
Background technique
With the development of science and technology the electronic products such as smart phone, tablet computer have become it is indispensable in for people's lives
Part.Electronic product now by communication, network, take pictures, game, the functions such as data processing combine, multi-functional to set
The electronic product of meter is obviously market trend.Since electronic product outfit has the function of diversification, therefore, it is necessary to using various
Sensing device carries out the detectings of surrounding enviroment, to carry out corresponding application.Common sensing device includes ambient light sensing
Device, proximity sensor etc..Wherein, ambient light sensor can detect environment light using photosensory assembly, and the light intensity detected is simultaneously
Corresponding signal is converted to, then carries out follow-up signal processing.
In order to accurately detect environment light, the optical specification of corresponding environment light sensation unthreaded hole requires high.At present
Photographic hole requirement on electronic product: appearance color is uniform, has concealment, it is seen that transmitance in light and infrared light wave-length coverage
There is particular requirement etc..Common process realizes photographic hole function by silk-screen function ink or laser engraving technique.Due to silk
Print technological effect is relatively rough, and precision is low, and there is more problems for silk screen printing process: including problem of appearance, the function ink of silk-screen
The concealment of uneven color, photographic hole is inadequate, the unstable problem of transmitance, is often possible to also need to carry out multiple or more
Layer silk screen printing process can be only achieved ideal optical specification requirement.Laser engraving technique can reach required optical specification requirement, but
It is that laser engraving technique manufacturing cost is very expensive.
Summary of the invention
The present invention provides a kind of photosensitive pore structure, sensitive component, touch device and display device.The photosensitive pore structure
Including transparent substrate, light shield layer, the transparent substrate has the first surface and second surface being oppositely arranged, the light shield layer shape
On the first surface of transparent substrate described in Cheng Yu, the light shield layer has several through-holes to expose first surface to realize photographic hole
The light transmission of structure acts on.
Further, the light shield layer can use print process, rubbing method or other suitable modes and be formed in transparent base
On plate.The light shield layer includes multiple through-holes, and the through-hole can be circle, and the concentric circular array of arrays of openings is described logical
Hole can realize that preferred scheme is to exist by yellow light photoetching process by laser engraving, silk screen printing process and yellow light photoetching process
Above-mentioned through-hole structure is formed on the light shield layer.
Further, the through-hole can be round, rectangular, rectangle and other regular figures, and preferred through-hole is circle,
The concentric circular array of the arrays of openings, rectangular array, concentric circles and rectangle combination array and other regular figure arrays.
Since via design is too small, it is too low to will lead to light transmittance, it is difficult to external environmental light is sensed, and via design is excessive,
It is not unobvious to will lead to the environment equation of light that through-hole senses in the environment of different luminous intensities, influences to sense accuracy.In order to protect
Card sensing effect, in some electronic products, the light transmission of photographic hole requires infrared light as follows: greater than 70% that can be transmitted through
The visible light of photographic hole, 1%-15% can be transmitted through photographic hole.
In order to realize the light transmission and sensing effect of photographic hole, pass through through-hole length and width or the spacing of aperture design and adjacent through-holes
Distance design is to realize.Specifically, between the length and width of the through-hole or aperture L1 are set to 20 microns to 70 microns, it will be adjacent
Through-hole distance L2, be set as between 10 microns to 100 microns.
Further, the material of the light shield layer of the photosensitive pore structure can be for the ornament materials and shading for hiding optical activity
Material, e.g. ink or photoresist, but the material of light shield layer is not limited to ink and photoresist by the present invention, but
Elaboration is able to achieve shaded effect.
Further, the material of the light shield layer of the photosensitive pore structure can be for the ornament materials and shading for hiding optical activity
Material, the light shield layer include fringe region and middle section.
Due to being provided with a large amount of through-holes on photographic hole, positioned at the onesize of through-hole and the centrally located region of fringe region
Through-hole light transmittance it is not identical, the through-hole light transmittance of the specially described middle section is higher than the through-hole of the fringe region,
The reason of influencing above-mentioned light transmittance, is generally environment light for the shading pore structure and penetrates light shield layer by transparent substrate incidence
Through-hole, due to the effect of transparent substrate, the light for penetrating the through-hole of middle section includes a large amount of direct lines, and penetration edges area
The light of domain through-hole includes a large amount of refracted lights, and the light transmittance of an equal amount of fringe region through-hole is necessarily caused to compare middle section
The light transmittance of through-hole is low, and then influences the uniformity and accuracy of the sense ambient light of sensitive component.
Meanwhile because of pinhole difiration phenomenon, a large amount of light by fringe region through-hole are deviateed based on pinhole difiration principle
Former opticpath, the light for overlapping to middle section, and being overlapped based on diffraction principle to fringe region, which compares middle section, to be lacked,
The uniformity and accuracy of the same sense ambient light for influencing sensitive component.
Further, in order to realize sensing component to the uniformity and accuracy of sensing environment light, the light shield layer exists
Fringe region is different from the aperture opening ratio of lightproof area, and the aperture opening ratio of the specially described light shield layer edge region is greater than the shading
Aperture opening ratio of the layer in middle section.The difference of the aperture opening ratio of the different zones can be by adjusting fringe region and middle section
Via densities realize, if the distance between adjacent through-holes is sequentially increased from fringe region toward middle section, so that edge
The through-hole in region is distributed more dense than the through-hole of middle section.
Further, component is sensed to the uniformity and accuracy of sensing environment light in order to realize, can also pass through tune
It saves the light shield layer and realizes that the aperture of the specially through-hole of fringe region is big in the pore size of the through-hole of different zones, in
Entreat the aperture of the through-hole in region small, to realize that the aperture opening ratio of fringe region is greater than middle section.
Increase the pore size of fringe region through-hole it is possible to further simultaneous selection, or increases the logical of fringe region
Hole density.
Further, the material of the transparent substrate can be glass or plastics, but not to be limited.Specifically, glass
Material may include made by sapphire, crystal or the glazed other materials of property class；Plastic material may include poly- terephthaldehyde
Sour second diester (PET), polycarbonate (PC), polymethyl methacrylate (PMMA), epoxy resin (Epoxy), polyimides
(PI) and/or made by the organic polymer materials of bismaleimide/tri- nitrogen traps (BT) etc..
Further, the photosensitive pore structure includes transparent substrate, light shield layer, the transparent substrate with opposite first
Surface and second surface, the light shield layer are formed on the first surface of the transparent substrate, and the light shield layer has several logical
Light transmission effect of the hole to expose first surface to realize photosensitive pore structure.The photosensitive pore structure further includes a light modulation layer, described
Light modulation layer is formed on the second surface of the transparent substrate.The light modulation layer has the function of adjusting reduction light intensity.
Further, the photosensitive pore structure includes transparent substrate, light shield layer, the transparent substrate with opposite first
Surface and second surface, the light shield layer are formed on the first surface of the transparent substrate, and the light shield layer has several logical
Light transmission effect of the hole to expose first surface to realize photosensitive pore structure.The photosensitive pore structure further includes a light modulation layer, described
Light modulation layer is formed on the light shield layer.The light modulation layer has the function of adjusting reduction light intensity.
In addition, the sensitive component includes above-mentioned photosensitive pore structure the invention also includes a kind of sensitive component, also wrap
Optical sensor (Ambient light sensor) is included, the optical sensor can be directly arranged at the light modulation of the photosensitive pore structure
On layer or light shield layer, the side far from the incidence of environment light, and it is directed at the through-hole of light shield layer, to receive environment light.
In addition, photosensitive pore structure of the invention can also continue to and other component combinations, such as drive module, touch-control sensing
Device, transparent electrode, colored filter, black matrix" and/or backlight etc., by combination touch-control component to form touch panel
Device shows component to form display device by combination.When environment light passes through photographic hole (Ambient light
Sensing hole) reach optical sensor when, luminous energy can be quantified by the analog-to-digital conversion process of optical sensor, further be passed through
Other controllers are adjusted, so that the brightness of system adjust automatically display panel.Specifically, if the light of user region
Darker, then system can reduce the backlight illumination of display panel, to save electric power, and provide the more comfortable brightness of user.Instead
, if user position is in brighter environment, system will increase the backlight illumination of display panel.
Photosensitive pore structure, sensitive component, touch device and display device provided by the invention, by the way that different zones are arranged
The aperture of through-hole, through-hole distance, environment light can be accurately detected, so that the uniformity and accuracy of the environment light of sensing are all
It is higher.
Detailed description of the invention
Fig. 1 is the photographic hole cross-sectional view of the structure of one embodiment of the invention；
Fig. 2 is the photographic hole structural plan figure of one embodiment of the invention；
Fig. 3 is the photographic hole structural plan figure of one embodiment of the invention；
Fig. 4 is the photographic hole structural plan figure of one embodiment of the invention；
Fig. 5 is the photographic hole cross-sectional view of the structure of one embodiment of the invention；
Fig. 6 is the photographic hole cross-sectional view of the structure of one embodiment of the invention.
Appended drawing reference
1: transparent substrate, 1a: first surface, 1b: second surface, 2: barrier bed, 21: through-hole, 3: light modulation layer, L1: aperture,
L2: through-hole spacing.
Specific embodiment
In order to which the content that describes of the present invention is more clearly understood, hereafter attached drawing through the invention and specific embodiment pair
Particular content of the invention is described, but this not implements or use the unique forms of the specific embodiment of the invention.It needs
Bright, in the absence of conflict, the feature in embodiment and embodiment in the present invention can be combined with each other.It below will ginseng
It examines attached drawing and the present invention will be described in detail in conjunction with the embodiments.
It should be noted that term used herein above is merely to describe specific embodiment, and be not intended to restricted root evidence
Exemplary embodiment of the present invention.As used herein, unless the context clearly indicates otherwise, otherwise singular is also anticipated
Figure includes plural form, additionally, it should be understood that, when the term " comprising " and/or " including " is used in this specification,
It indicates existing characteristics, step, operation, device, component and/or their combination.
It should be noted that description and claims of this specification and term " first " in above-mentioned attached drawing, "
Two " etc. be to be used to distinguish similar objects, without being used to describe a particular order or precedence order.It should be understood that using in this way
Data be interchangeable under appropriate circumstances, so that the embodiment of the present invention described herein those of is illustrated or is described herein
Sequence in addition is implemented.In addition, term " includes " and " having " and their any deformation, meaning are non-exclusive packet
Contain, for example, what the process, method, system, product or equipment for containing a series of steps or units were not necessarily limited to be clearly listed
Those step or units, but may include be not clearly listed or it is intrinsic for these process, methods, product or equipment
Other step or units.
In the following description, many specific details be will be described in detail so that reader can fully understand embodiment below.
However, the embodiment of the present invention can be practiced without these specific details.It in other cases, is simplification figure, it is known
Structure and device be only symbolically in figure.
As shown in Figure 1, being a kind of diagrammatic cross-section of photosensitive pore structure 10, the photosensitive pore structure 10 includes transparent substrate
1, light shield layer 2, the transparent substrate 1 has opposite first surface 1a and second surface 1b, and the light shield layer 2 is formed in described
On the first surface 1a of transparent substrate 1, the light shield layer 2 has several through-holes 21 to expose first surface 1a to realize photographic hole
The light transmission of structure 10 acts on.In certain embodiments, the length and width of each through-hole 21 or aperture L1 can be between 20 microns to 70 microns
Between, the distance L2 of adjacent through-hole 21, between 10 microns to 100 microns.
As shown in Fig. 2, be a kind of floor map of photosensitive pore structure 10, the light shield layer 2 of the photosensitive pore structure 10
Material can be ornament materials and light screening material with screening optical activity, e.g. ink or photoresist, but the present invention will
The material of light shield layer 2 is limited to ink and photoresist, but illustrates and be able to achieve shaded effect.In the present embodiment, the screening
Photosphere 2 includes multiple through-holes 21, and the through-hole 21 can be circle, the concentric circular array of arrays of openings.
In other embodiments, the through-hole 21 can also be rectangular, rectangle and other regular figures, preferred through-hole 21
For circle, the concentric circular array of the arrays of openings, rectangular array, concentric circles and rectangle combination array and other rule schemas
Shape array.
As shown in figure 3, be a kind of floor map of photosensitive pore structure 10, the light shield layer 2 of the photosensitive pore structure 10
Material can be for the ornament materials and light screening material for hiding optical activity, the light shield layer 2 includes multiple through-holes 21, the through-hole 21
It can be circle, the concentric circular array of arrays of openings, the 21 aperture L1 of circular through hole is identical, between 20 microns to 70 microns
Between.It is less than the adjacent through-hole 21 in centrally located region positioned at the distance of the adjacent through-hole 21 of fringe region
Distance.The distance L2 that specifically can be set to adjacent through-hole 21 successively increases from fringe region toward middle section
Greatly, the distance L2 that may be set to be between the concentric circles being made of through-hole 21 successively increases from fringe region toward middle section
Greatly, i.e. the through-hole 21 of fringe region is distributed more dense than the through-hole 21 of middle section.It should be noted that circular dashed line in Fig. 3
Middle section and fringe region position are distinguished only for facilitating, in actual product and this lines is not present.
For example, the aperture L1 of through-hole 21 is between 20 microns to 70 microns, aperture L1 is identical, positioned at fringe region
The distance L2 of adjacent through-hole 21, between 10 microns to 50 microns, between the adjacent through-hole 21 in centrally located region
Away from distance L2 between 80 microns to 100 microns, the distance L2 of adjacent through-hole 21 from fringe region toward middle section according to
Secondary increase.
Equally, for example, the aperture L1 of through-hole 21 can be between 20 microns to 70 microns, aperture L1 is identical, is located at side
The adjacent through-hole 21 in edge region constitutes the distance L2 of concentric circles, between 10 microns to 50 microns, centrally located region
The distance L2 of concentric circles that constitutes of adjacent through-hole 21 between 80 microns to 100 microns, through-hole 21 is constituted concentric
Distance L2 between circle is sequentially increased from fringe region toward middle section.
As shown in figure 4, the distance L2 of adjacent through-hole 21, between 10 microns to 100 microns.Different zones are led to
The aperture L1 in hole is different, and the aperture of the specially through-hole 21 of fringe region is big, and the aperture of the through-hole 21 of middle section is small.It needs to infuse
It anticipates, circular dashed line distinguishes middle section and fringe region position only for facilitating in Fig. 3, does not deposit in actual product
In this lines.
Concrete example is as follows, the distance L2 of adjacent through-hole 21, between 10 microns to 100 microns.Middle section
Through-hole 21 aperture L1, between 20 microns to 30 microns, the aperture L1 of the through-hole 21 of fringe region, between 40 microns to 70
Between micron.
In other examples, the pore size of fringe region through-hole 21 can be increased with simultaneous selection and increase marginal zone
21 density of through-hole in domain.
As shown in figure 5, being a kind of photosensitive pore structure 10 of one embodiment of the invention.The photosensitive pore structure 10 includes saturating
Bright substrate 1, light shield layer 2, the transparent substrate 1 have opposite first surface 1a and second surface 1b, the formation of light shield layer 2
In on the first surface 1a of the transparent substrate 1, the light shield layer 2 has several through-holes 21 to expose first surface 1a to realize
The light transmission of photosensitive pore structure 10 acts on.The photosensitive pore structure further includes a light modulation layer 3, and the light modulation layer is formed in described transparent
On the second surface 1b of substrate 1.
As shown in fig. 6, being a kind of photosensitive pore structure 10 of another embodiment of the present invention.The photosensitive pore structure 10 includes
Transparent substrate 1, light shield layer 2, the transparent substrate 1 have opposite first surface 1a and second surface 1b, 2 shape of light shield layer
On the first surface 1a of transparent substrate 1 described in Cheng Yu, the light shield layer 2 has several through-holes 21 to expose first surface 1a with reality
The light transmission effect of existing photosensitive pore structure 10.The photosensitive pore structure further includes a light modulation layer 3, and the light modulation layer is formed in the screening
On photosphere 2, the side far from the transparent substrate 1.
Embodiment of the present invention, is not intended to limit the invention, anyone skilled in the art, is not departing from the present invention
In the range of the principle of the technical solution illustrated, slightly modified and adjustment, therefore this may be all carried out to the embodiment of the present invention
The protection scope of invention should be subject to range described in claim.
Claims (10)
1. a kind of photosensitive pore structure, comprising: transparent substrate (1), light shield layer (2), the transparent substrate (1) have opposite first
Surface (1a) and second surface (1b), the light shield layer (2) are formed on the first surface (1a) of the transparent substrate (1), institute
Light shield layer (2) are stated with several through-holes (21)；
It is characterized in that, the aperture of the through-hole (21) is between 20 microns to 70 microns, the distance of adjacent through-hole (21)
Between 10 microns to 100 microns；
The light shield layer (2) includes fringe region and middle section, and the aperture opening ratio of light shield layer (2) edge region is greater than institute
Light shield layer (2) is stated in the aperture opening ratio of middle section.
2. photosensitive pore structure as described in claim 1, which is characterized in that the distance between adjacent through-holes (21) is by edge
Region is sequentially increased toward middle section.
3. photosensitive pore structure as described in claim 1, which is characterized in that in the aperture ratio of the through-hole (21) of the fringe region
Entreat the aperture of the through-hole in region big.
4. photosensitive pore structure as claimed in claim 2, which is characterized in that between the adjacent through-hole (21) of fringe region
Away from distance between 10 microns to 50 microns, the distance of the adjacent through-hole (21) in centrally located region between 80 microns extremely
Between 100 microns.
5. photosensitive pore structure as claimed in claim 3, which is characterized in that the aperture of the through-hole (21) of middle section is micro- between 20
Rice is between 30 microns, and the aperture of the through-hole (21) of fringe region is between 40 microns to 70 microns.
6. photosensitive pore structure as described in claim 1, which is characterized in that the photosensitive pore structure further includes a light modulation layer 3, institute
Light modulation layer is stated to be formed on the second surface (1b) of the transparent substrate (1).
7. photosensitive pore structure as described in claim 1, which is characterized in that the through-hole (21) is formed by yellow light photoetching process
In on the light shield layer (2).
8. a kind of sensitive component, which is characterized in that including one of photosensitive pore structure described in claim 1-7, further include
Optical sensor, the optical sensor are set on the light shield layer (2) of the photosensitive pore structure, the side far from the incidence of environment light,
And it is directed at the through-hole of light shield layer.
9. a kind of touch control panel device, which is characterized in that further include touch-control member including sensitive component according to any one of claims 8
Device.
10. a kind of display device, which is characterized in that further include display member including sensitive component according to any one of claims 8
Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910666246.5A CN110489018A (en) | 2019-07-23 | 2019-07-23 | A kind of photosensitive pore structure, sensitive component, touch control panel device and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910666246.5A CN110489018A (en) | 2019-07-23 | 2019-07-23 | A kind of photosensitive pore structure, sensitive component, touch control panel device and display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110489018A true CN110489018A (en) | 2019-11-22 |
Family
ID=68547949
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910666246.5A Pending CN110489018A (en) | 2019-07-23 | 2019-07-23 | A kind of photosensitive pore structure, sensitive component, touch control panel device and display device |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111028678A (en) * | 2019-12-31 | 2020-04-17 | 武汉天马微电子有限公司 | Display panel and display device |
| CN111273441A (en) * | 2020-02-25 | 2020-06-12 | 业成科技（成都）有限公司 | Optical module and electronic equipment |
| CN111754875A (en) * | 2020-06-28 | 2020-10-09 | 合肥维信诺科技有限公司 | Display module and display device |
| CN112395982A (en) * | 2020-11-17 | 2021-02-23 | 京东方科技集团股份有限公司 | Backlight module and fingerprint identification device |
| CN113362703A (en) * | 2021-07-05 | 2021-09-07 | 业成科技（成都）有限公司 | Display device and terminal equipment |
| WO2023128364A1 (en) * | 2021-12-30 | 2023-07-06 | 삼성전자 주식회사 | Display panel for under display camera (udc), and electronic device comprising same |
-
2019
- 2019-07-23 CN CN201910666246.5A patent/CN110489018A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111028678A (en) * | 2019-12-31 | 2020-04-17 | 武汉天马微电子有限公司 | Display panel and display device |
| CN111028678B (en) * | 2019-12-31 | 2022-05-17 | 武汉天马微电子有限公司 | Display panel and display device |
| CN111273441A (en) * | 2020-02-25 | 2020-06-12 | 业成科技（成都）有限公司 | Optical module and electronic equipment |
| CN111754875A (en) * | 2020-06-28 | 2020-10-09 | 合肥维信诺科技有限公司 | Display module and display device |
| CN112395982A (en) * | 2020-11-17 | 2021-02-23 | 京东方科技集团股份有限公司 | Backlight module and fingerprint identification device |
| CN113362703A (en) * | 2021-07-05 | 2021-09-07 | 业成科技（成都）有限公司 | Display device and terminal equipment |
| CN113362703B (en) * | 2021-07-05 | 2022-10-18 | 业成科技（成都）有限公司 | Display device and terminal equipment |
| WO2023128364A1 (en) * | 2021-12-30 | 2023-07-06 | 삼성전자 주식회사 | Display panel for under display camera (udc), and electronic device comprising same |
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