CN110426768A - A kind of infrared double wave peak coated filter and coating process - Google Patents
A kind of infrared double wave peak coated filter and coating process Download PDFInfo
- Publication number
- CN110426768A CN110426768A CN201910636875.3A CN201910636875A CN110426768A CN 110426768 A CN110426768 A CN 110426768A CN 201910636875 A CN201910636875 A CN 201910636875A CN 110426768 A CN110426768 A CN 110426768A
- Authority
- CN
- China
- Prior art keywords
- central wavelength
- membrane stack
- optical filter
- coating process
- infrared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 21
- 239000012528 membrane Substances 0.000 claims abstract description 30
- 230000003287 optical effect Effects 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 12
- 230000000149 penetrating effect Effects 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052681 coesite Inorganic materials 0.000 claims description 6
- 229910052906 cristobalite Inorganic materials 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 229910052682 stishovite Inorganic materials 0.000 claims description 6
- 229910052905 tridymite Inorganic materials 0.000 claims description 6
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 230000000747 cardiac effect Effects 0.000 claims description 2
- 238000009510 drug design Methods 0.000 abstract 1
- 230000009977 dual effect Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000004297 night vision Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
Abstract
The invention discloses a kind of infrared double wave peak coated filter and coating process, including optical filter, the coated filter formed after optical filter coating is equipped with 2 penetrating regions at central wavelength 850nm, central wavelength 940nm；Center wavelength shift amount is less than 12nm；Filming equipment carries out the cut-off, anti-reflection of different-waveband to optical filter respectively in coating process using the first membrane stack, the second membrane stack in infrared region, wherein, first membrane stack is superimposed by high low-index material to ending before central wavelength 820nm, is carried out between central wavelength 820-1100nm anti-reflection；Second membrane stack is anti-reflection to carrying out before central wavelength 1070nm by the superposition of high low-index material, is ended between central wavelength 1100-1200nm.The present invention has rational design, simple process, and optical filter can be made to form 2 infrared penetrating regions in plated film.
Description
Technical field
The present invention relates to optical filter coating technical field more particularly to a kind of infrared double wave peak coated filter and plated film works
Skill.
Background technique
Dual waves on the market are all the dual waves in visible light region now, can not apply to infrared region.Infrared lamp
The light of sending, wavelength are 850nm and 940nm2 kind, are all black light, have the characteristics that hidden, energy saving, are pacifying in the past 10 years
Anti- monitoring field is widely used.Advantage is can entirely without red sudden and violent (using 940~950nm wavelength infrared tube) or only
Faint red sudden and violent (using 850nm wavelength infrared tube)；Also have the characteristics that the service life long, therefore, development and production infrared double wave peak plated film
Optical filter has bright prospects.
Summary of the invention
The present invention provide it is a kind of design rationally, the infrared double wave peak coating process of simple process can be such that optical filter is plating
2 infrared penetrating regions are formed in film.
To achieve the goals above, the present invention use following technical scheme, a kind of infrared double wave peak coated filter, including
Optical filter, the coated filter formed after the optical filter coating are equipped with 2 at central wavelength 850nm, central wavelength 940nm
A penetrating region.
Preferably, the center wavelength shift amount is less than 12nm.
A kind of coating process of infrared double wave peak coated filter, including filming equipment, optical filter, using magnetron sputtering
Membrane process, the filming equipment use the first membrane stack, the second membrane stack in infrared region respectively to optical filter in coating process
Carry out the cut-off, anti-reflection of different-waveband, wherein first membrane stack is by the superposition of high low-index material to central wavelength
Ended before 820nm, is carried out between central wavelength 820-1100nm anti-reflection；Second membrane stack passes through high low-refraction
Material superposition is anti-reflection to carrying out before central wavelength 1070nm, is ended between central wavelength 1100-1200nm.
Preferably, first membrane stack uses SiH4And SiO2。
Preferably, second membrane stack uses SiH4And SiO2。
This programme carries out the membrane system front and back sides plated film of dual waves on the optical filter of buying, and the plated film for finally plating out filters
Piece reaches infrared double wave peak, infrared double wave peak be using multiple membrane stacks infrared penetrating region occur it is high thoroughly, by filming equipment,
The cut-off and transmission of high low-index material (using particularity materials such as high refractive indexes) Lai Shixian specific band, in central wavelength
850 and central wavelength 940 or so occur 2 penetrating regions.
The prewave of this programme infrared double wave peak coated filter dual waves in 850 postwaves 940, by phase the advantages of dual wavelength
It mutually combines, reaching not only can be entirely without feature that is red sudden and violent, but also being grown with the service life.30 degree of offsets are small, can be in wide-angle situation
Lower imaging clearly is not in that angle is excessive and cause image that can not identify, occurs limitation in actual products.With infrared
The rapid development of night vision system, infrared lamp production and supply producer also will increase, but red light product is not that imagined as somebody
Sample is easy, and condition is also different in terms of technology, detecting instrument, our dual waves can solve most of technical aspect
Problem, the product that can be used for more requiring will have bigger market in future, hold an advantageous market position.
Therefore, the invention has the following beneficial effects: designs rationally, and simple process can make optical filter shape in plated film
At 2 infrared penetrating regions.
Detailed description of the invention
Fig. 1 is the schematic diagram of the infrared penetrating region light transmittance after optical filter coating of the present invention.
Specific embodiment
The present invention will be further described below.
A kind of infrared double wave peak coated filter, including optical filter, the coated filter formed after optical filter coating is in
2 penetrating regions are equipped at the long 850nm of cardiac wave, central wavelength 940nm；Center wavelength shift amount is less than 12nm；
A kind of coating process of infrared double wave peak coated filter, including filming equipment, optical filter, using magnetron sputtering
Membrane process, filming equipment respectively carry out not optical filter in infrared region using the first membrane stack, the second membrane stack in coating process
With the cut-off, anti-reflection of wave band, wherein the first membrane stack is superimposed by high low-index material and is carried out to before central wavelength 820nm
End, is carried out between central wavelength 820-1100nm anti-reflection；Second membrane stack is superimposed by high low-index material to central wavelength
It carries out before 1070nm anti-reflection, is ended between central wavelength 1100-1200nm；
First membrane stack uses SiH4And SiO2；
Second membrane stack uses SiH4And SiO2。
Specifically used process is to get out optical filter, and filming equipment uses the first membrane stack, the second membrane stack in coating process
Carry out the cut-off, anti-reflection of different-waveband to optical filter respectively in infrared region, wherein the first membrane stack passes through high low-index material
Superposition carries out anti-reflection to ending before central wavelength 820nm between central wavelength 820-1100nm；Second membrane stack passes through height
Low-index material superposition is anti-reflection to carrying out before central wavelength 1070nm, is ended between central wavelength 1100-1200nm；
As shown in Figure 1, coated filter is equipped with 2 in central wavelength 850nm, central wavelength 940nm after the completion of coating process
A penetrating region.
Claims (5)
1. a kind of infrared double wave peak coated filter, including optical filter, which is characterized in that formed after the optical filter coating
Coated filter is equipped with 2 penetrating regions at central wavelength 850nm, central wavelength 940nm.
2. a kind of infrared double wave peak coated filter according to claim 1, characterized in that the center wavelength shift
Amount is less than 12nm.
3. a kind of coating process of infrared double wave peak coated filter, including filming equipment, optical filter, using magnetron sputtering plating
Technique, which is characterized in that the filming equipment is distinguished using the first membrane stack, the second membrane stack in infrared region in coating process
The cut-off, anti-reflection of different-waveband is carried out to optical filter, wherein first membrane stack passes through the superposition centering of high low-index material
Ended before the long 820nm of cardiac wave, is carried out between central wavelength 820-1100nm anti-reflection；Second membrane stack passes through height
Refraction materials superposition is anti-reflection to carrying out before central wavelength 1070nm, is ended between central wavelength 1100-1200nm.
4. coating process according to claim 3, characterized in that first membrane stack uses SiH4And SiO2。
5. coating process according to claim 3, characterized in that second membrane stack uses SiH4And SiO2。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910636875.3A CN110426768A (en) | 2019-07-15 | 2019-07-15 | A kind of infrared double wave peak coated filter and coating process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910636875.3A CN110426768A (en) | 2019-07-15 | 2019-07-15 | A kind of infrared double wave peak coated filter and coating process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110426768A true CN110426768A (en) | 2019-11-08 |
Family
ID=68409507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910636875.3A Pending CN110426768A (en) | 2019-07-15 | 2019-07-15 | A kind of infrared double wave peak coated filter and coating process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110426768A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111638572A (en) * | 2019-11-29 | 2020-09-08 | 苏州京浜光电科技股份有限公司 | 3D structured light 940nm narrow-band filter and preparation method thereof |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1518671A (en) * | 2000-08-21 | 2004-08-04 | 3M | Loss enhanced reflective optical-filters |
| CN1556420A (en) * | 2004-01-06 | 2004-12-22 | 同济大学 | Broad cut-off band bipassage bandpass optical filter and its preparation method |
| CN202512258U (en) * | 2012-04-23 | 2012-10-31 | 中山大学 | Triple-band band-pass filtering device |
| CN204462435U (en) * | 2015-03-17 | 2015-07-08 | 苏州鼎旺科技有限公司 | A kind of two waveband filter sheet structure |
| CN108873135A (en) * | 2018-08-06 | 2018-11-23 | 信阳舜宇光学有限公司 | A kind of near-infrared narrow band filter and infrared imaging system |
| CN108897085A (en) * | 2018-08-06 | 2018-11-27 | 信阳舜宇光学有限公司 | Optical filter and infrared image sensing system comprising the optical filter |
| US20190219750A1 (en) * | 2016-08-10 | 2019-07-18 | Cambridge Display Technology Limited | Light filter and sensor |
-
2019
- 2019-07-15 CN CN201910636875.3A patent/CN110426768A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1518671A (en) * | 2000-08-21 | 2004-08-04 | 3M | Loss enhanced reflective optical-filters |
| CN1556420A (en) * | 2004-01-06 | 2004-12-22 | 同济大学 | Broad cut-off band bipassage bandpass optical filter and its preparation method |
| CN202512258U (en) * | 2012-04-23 | 2012-10-31 | 中山大学 | Triple-band band-pass filtering device |
| CN204462435U (en) * | 2015-03-17 | 2015-07-08 | 苏州鼎旺科技有限公司 | A kind of two waveband filter sheet structure |
| US20190219750A1 (en) * | 2016-08-10 | 2019-07-18 | Cambridge Display Technology Limited | Light filter and sensor |
| CN108873135A (en) * | 2018-08-06 | 2018-11-23 | 信阳舜宇光学有限公司 | A kind of near-infrared narrow band filter and infrared imaging system |
| CN108897085A (en) * | 2018-08-06 | 2018-11-27 | 信阳舜宇光学有限公司 | Optical filter and infrared image sensing system comprising the optical filter |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111638572A (en) * | 2019-11-29 | 2020-09-08 | 苏州京浜光电科技股份有限公司 | 3D structured light 940nm narrow-band filter and preparation method thereof |
| CN111638572B (en) * | 2019-11-29 | 2021-03-05 | 苏州京浜光电科技股份有限公司 | 3D structured light 940nm narrow-band filter and preparation method thereof |
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| PB01 | Publication | ||
| PB01 | Publication | ||
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| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20191108 |