CN1103676A - Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology - Google Patents
Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology Download PDFInfo
- Publication number
- CN1103676A CN1103676A CN 93120621 CN93120621A CN1103676A CN 1103676 A CN1103676 A CN 1103676A CN 93120621 CN93120621 CN 93120621 CN 93120621 A CN93120621 A CN 93120621A CN 1103676 A CN1103676 A CN 1103676A
- Authority
- CN
- China
- Prior art keywords
- target
- mcralx
- cladding
- coating
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
The present invention provides new technique for MCrAlX cladding and features its magnetically sputtered gradient cladding. By means of double-target MCrAlX/Al magnetically-sputtering process. MCrAlX and Al are deposited simultaneously on high-temp. alloy. During deposition, target power changes gradually and the sample rotates continuously, so as to obtain even MCrAlX cladding with gradually-changed Al density. Heat treatment after deposition can increase the binding force between the cladding and the base. The cladding of the present invention has fine crystal grains, high static oxidation resistance and excellent thermal corrosion resistance.
Description
The invention belongs to the top coat guard technology, a kind of MCrAlX type coating technology particularly is provided.
High-temperature protection coating has aluminized coating (first-generation), remodeling aluminized coating (s-generation), MCrAlX cladded type coating (third generation) and the 4th generation of heat shield layer TBC().The invention belongs to MCrAlX coating one class, wherein M represents Fe, Ni, Co, Ni-Co, Co-Ni etc., and X represents Y, La, Ce, Hf, Si, Zr, Ta etc.The MCrAlX coated component is various, adjusts according to concrete needs, is not subjected to the matrix composition influence, and this is one of its advantage.Another advantage of MCrAlX coating is that its plasticity ratio is oozed Al layer etc. and will be got well, and coating is incrust, long service life.Generally all use electro beam physics vapour deposition (EB-PVD) and low-voltage plasma spraying (LppS) technology to prepare this type coating both at home and abroad, occasionally the also report of useful magnetron sputtered deposition technology.But do not see magnetron sputtering MCrAlX gradient cladding report.
The MCrAlX type gradient cladding that the object of the present invention is to provide a kind of aluminum concentration constantly to change, it is reasonably unified that antioxidant property and hot corrosion resistance, plasticity and fragility are obtained, thereby, also can be applicable to other high temperature component for aircraft engine, all kinds of turbine blade of gas turbine provide a kind of high-temperature protection coating of high comprehensive performance.
Formation of the present invention:
1. use target (two target) MCrAlX/Al magnetron sputtering deposition method is deposited on MCrAlX and Al on the superalloy (turbine blade) simultaneously, target power output gradually changes during deposition, sample constantly rotates, thereby obtains the uniform MCrAlX coating of the thickness gradient cladding that Al concentration gradually changes.Should heat-treat after the deposition with enhancing and be coated with/basic bonding force, improve the coating structure state.
2. two target chemistry compositions (seeing Table) (wt%)
| The target title | M | Cr | Al | X | |||
| Ni | Co | Cr | Al | Si | Hf | Y | |
| The NiCoCrAlSiHfY target | Base | 18～ 22 | 16～ 20 | 10～ 15 | 0.2～ 1.0 | 0.1～ 1.0 | 0.1～ 1.0 |
| The Al target | - | - | - | ≥ 99.9 | - | - | - |
The MCrAlX target adopts two vacuum meltings and cast, and serious casting flaw does not have.The Al target processes with the forging material.
3. sputter equipment adopts JCKD-400 type facing-target magnetron sputtering system device, and it allows sample (blade) to carry out the vacuum high-temperature heating, two target magnetic control sputterings, Workpiece Rotating etc., and these parameters are absolutely necessary to preparation high quality MCrAlX/Al gradient cladding.Also can utilize other proximate device.
4. magnetron sputtering technique
1. shove charge and vacuumize and reach 1.33～4.0 * 10
-2Pa
2. Ar(1.33～4.0Pa), bombarding voltage 600～1500V, bombarding current 0.1～1.0A are adopted in high pressure bombardment
3. the sample heating is 600～1000 ℃
4. sputtering bias-voltage-100～400V(negative bias)
5. magnetizing current, voltage magnetizing current 10～20A; Driving voltage 15～30V
6. sputter gas is that its pressure of Ar PAr is 1.33～10.67 * 10
-1Pa
7. target current, the two target power outputs of voltage (or target power output) over time curve referring to synoptic diagram
Workpiece Rotating was to guarantee that coating is even when 8. Workpiece Rotating deposited
9. diffusion annealing is carried out under vacuum or protective atmosphere, 700～1000 ℃ of temperature, time 1～4h; columanar structure when diffusion annealing can be eliminated deposition; obtain uniform recrystallize (equiax crystal) tissue, and be coated with/basic interface forms diffusion layer (internal layer), improves bonding force.
By above processing parameter control, can prepare the MCrAlX gradient material.
The invention has the advantages that:
1. the facing-target magnetron sputtering system technology that constantly changes by target power output obtains MCrAlX/Al cladded type gradient cladding.Can prepare various metal gradient materials according to this thought.
2. prepared MCrAlX/Al cladded type gradient cladding is obtaining rational unification on antioxidant property and the corrosion resistance and on fragility and plasticity.This gradient cladding guarantees that Al concentration increases from inside to outside gradually, outer Al height, and internal layer Al low (Cr height), thus make skin have good antioxidant property, internal layer has good hot corrosion resistance.Solved the contradiction of last oxidation drag of coated component design and heat etching drag opposition dexterously.
3. ooze the Al layer with vacuum and compare, NiCoCrAlSiHfY/Al gradient cladding of the present invention has following good performance:
1. the crystal grain of gradient cladding is very tiny, thereby plasticity is good;
2. 950 ℃/500h static oxidation resistance ratio oozes the Al floor height and goes out 1.25 times;
3. You Yi hot corrosion resistance shows as 700 ℃/100h fused salt corrosion test-results, and the gradient cladding weightening finish is 0.52mg/cm
2, reach-2.25mg/cm and ooze Al layer weightlessness
2The corrosion test result of same 850 ℃/30h also is that gradient cladding is superior more than oozing the Al layer.
Examples of implementation
Adopt magnetically controlled sputter method the NiCoCrAlSiHfY/Al gradient cladding to be deposited on certain aircraft engine one-level moving turbine blade (GH220 alloy) coat-thickness 40～50 μ m.Sputter on the JCKD-400 type facing-target magnetron sputtering system device and carry out.Target chemical ingredients ginseng sees the above table, and main technologic parameters is seen component part of the present invention on the page 1.
Embodiment:
1. install JCKD-400 type facing-target magnetron sputtering system instrument.
2. target NiCoCrAlSiHfY/Al, concrete composition (wt%).
1. Ni20Col8Crl2,5Al0,6Si0,4Hf0,6Y alloys target.
2. pure Al target.
3. base material ni-base wrought superalloy GH220(blade).
4. facing-target magnetron sputtering system technology
1. shove charge and be evacuated down to 2.67 * 10
-2Pa;
2. high pressure bombards PAr2.67Pa, voltage 800V, electric current 0.5A;
3. blade heats 900～950 ℃/2～3h;
4. sputter negative bias-200V;
5. magnetizing current 15A, driving voltage 20V;
6. sputter gas is an Ar gas, PAr1.33 * 10
-1Pa;
7. target power output in time change curve be shown in Fig. 1: (figure vides infra)
8. Workpiece Rotating during sputtering sedimentation;
9. deposition is heat-treated 900～950 ℃ of temperature, time 2～3h after finishing.
By above-mentioned processing parameter control, prepare the NiCoCrAlSiHfY gradient cladding that a kind of aluminum concentration from inside to outside constantly changes.Tissue and performance that this coating is main are as follows.
1. organize ultra-fine crystalline substance, (Ni, Co) Al and γ-NiCo sosoloid is formed by β.The about 40 μ m of coat-thickness, optionally adjustable.
2. 950 ℃/500h of oxidation susceptibility weightening finish is 0.44mg/cm
2, oxide film is α-Al
2O
3
3. hot corrosion resistance salt component 75%Na
2SO
4-25%NaCl, the 700 ℃/100h 0.52mg/cm that increases weight
2
4. coating does not have obvious influence to alloy mechanical property, all meets GH220 alloy technology conditional request.For example room temperature instantaneous stretching σ b is 1106MPa; 950 ℃ of drawing by high temperature σ b are 536MPa; 940 ℃ of 22Kgf/mm
2Following creep rupture life nearly 45h; 900 ℃ of 17Kgf/mm
2The creep residual set is 0.1119%; 850 ℃ 10
7Following fatigue strength is 343MPa; Cold and hot fatigue crack length after 30 circulations of 20 ℃ of 20 ℃ of 900 ℃ ()/() and 975 ℃ ()/() is respectively 0.155 and 0.32mm.Above-mentioned performance index all meet the technical qualification requirement, and cold and hot fatigue property improves significantly.Coating does not also have influence to the vibrational frequency characteristic of turbine blade.
The present invention is further described below in conjunction with accompanying drawing:
Fig. 1 is time (in minute) for SiHfY-Al coating sputtering power curve abscissa of the present invention, and ordinate is a power, and unit is KW.
Claims (3)
- A kind of MCrAlX coating novel process is characterized in that adopting magnetron sputtering MCrAlX gradient cladding, that is:1, uses target (two target) MCrAlX/Al magnetron sputtering deposition method is deposited on MCrAlX and Al on the superalloy (turbine blade) simultaneously, target power output gradually changes during deposition, sample constantly rotates, thereby obtains the uniform MCrAlX coating of the thickness gradient cladding that Al concentration gradually changes; Heat-treat after the deposition, be coated with/basic bonding force, improve the coating structure state with enhancing.
- 2, MCrAlX coating process according to claim 1, it is characterized in that the MCrAlX target adopts vacuum melting and cast, the Al target processes with the forging material, the composition of MCrAlX target (being the NiCoCrAlSiHfY target) is Co:18～22%, Cr:16～20%, Al:10～15%, Si:0.2～1.0%, Hf:0.1～1.0%, Y:0.1～1.0%, matrix are Ni, and the Al target contains Al 〉=99.9% and all is weight percentage).
- 3, MCrAlX coating process according to claim 1 and 2, it is characterized in that: sputter equipment adopts JCKD-400 type facing-target magnetron sputtering system device, it allows sample (blade) to carry out the vacuum high-temperature heating, and two target magnetic control sputterings, Workpiece Rotating etc. also can be utilized other proximate device; Magnetron sputtering technique is: shove charge and vacuumize and reach 1.33～4.0 * 10 -2Pa, high pressure bombardment employing Ar(1.33～4.0Pa), and bombarding voltage 600～1500V, bombarding current 0.1～1.0A, the sample Heating temperature is 600～1000 ℃, sputtering bias-voltage-100～-the 400V(negative bias), magnetizing current, voltage, magnetizing current 10～20A; Driving voltage 15～30V, sputter gas are that its pressure of Ar PAr is 1.33～10.67 * 10 -1Pa, target current, the two target power outputs of voltage (or target power output) they are curve over time, Workpiece Rotating is to guarantee that coating is even during deposition.Carry out under vacuum or protective atmosphere, its temperature of diffusion annealing is 700～1000 ℃, time 1～4h.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 93120621 CN1034350C (en) | 1993-12-07 | 1993-12-07 | Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 93120621 CN1034350C (en) | 1993-12-07 | 1993-12-07 | Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1103676A true CN1103676A (en) | 1995-06-14 |
| CN1034350C CN1034350C (en) | 1997-03-26 |
Family
ID=4993372
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 93120621 Expired - Fee Related CN1034350C (en) | 1993-12-07 | 1993-12-07 | Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1034350C (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001094664A3 (en) * | 2000-06-08 | 2002-08-01 | Surface Engineered Products Co | Coating system for high temperature stainless steel |
| CN100439567C (en) * | 1997-11-06 | 2008-12-03 | 铬合金气体涡轮公司 | Method for producing abrasive tips for gas turbine blades ` |
| CN101791893B (en) * | 2010-01-22 | 2012-12-19 | 北京航空航天大学 | Two-layer MCrAlY bonding layer and preparation method thereof |
| CN1813078B (en) * | 2003-04-28 | 2013-03-20 | 奥尔利康贸易股份公司（特吕巴赫） | Workpiece comprising an alcr-containing hard material layer and production method |
| CN103898440A (en) * | 2012-12-28 | 2014-07-02 | 北京有色金属研究总院 | Method for improving binding force between anti-emission film and molybdenum grid substrate |
| CN104630706A (en) * | 2015-01-21 | 2015-05-20 | 北京科技大学 | High-property optothermal transformation multiple-element alloy nitride film and preparation method thereof |
| CN107858657A (en) * | 2017-12-04 | 2018-03-30 | 北京科技大学 | Tissue modulation preparation method and device of the external energy field module to high flux film |
| CN108914074A (en) * | 2018-07-03 | 2018-11-30 | 东南大学 | A kind of high-resistivity alloy thin-film material and its preparation method and application |
| CN111020500A (en) * | 2019-11-11 | 2020-04-17 | 安徽建筑大学 | FeCrAlY coating resistant to high temperature liquid lead or lead bismuth corrosion and preparation method thereof |
| CN114959561A (en) * | 2022-06-29 | 2022-08-30 | 中国航发动力股份有限公司 | MCrAlX bonding layer with gradient change of Al content and preparation method thereof |
-
1993
- 1993-12-07 CN CN 93120621 patent/CN1034350C/en not_active Expired - Fee Related
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100439567C (en) * | 1997-11-06 | 2008-12-03 | 铬合金气体涡轮公司 | Method for producing abrasive tips for gas turbine blades ` |
| WO2001094664A3 (en) * | 2000-06-08 | 2002-08-01 | Surface Engineered Products Co | Coating system for high temperature stainless steel |
| CN1813078B (en) * | 2003-04-28 | 2013-03-20 | 奥尔利康贸易股份公司（特吕巴赫） | Workpiece comprising an alcr-containing hard material layer and production method |
| CN101550529B (en) * | 2003-04-28 | 2015-02-11 | 奥尔利康贸易股份公司（特吕巴赫） | A workpiece provided with aluminum and chromium hard material layer and a preparation method thereof |
| CN101791893B (en) * | 2010-01-22 | 2012-12-19 | 北京航空航天大学 | Two-layer MCrAlY bonding layer and preparation method thereof |
| CN103898440B (en) * | 2012-12-28 | 2016-08-24 | 北京有色金属研究总院 | A kind of method improving anti-transmitting thin film and molybdenum gate screen substrate caking power |
| CN103898440A (en) * | 2012-12-28 | 2014-07-02 | 北京有色金属研究总院 | Method for improving binding force between anti-emission film and molybdenum grid substrate |
| CN104630706A (en) * | 2015-01-21 | 2015-05-20 | 北京科技大学 | High-property optothermal transformation multiple-element alloy nitride film and preparation method thereof |
| CN104630706B (en) * | 2015-01-21 | 2017-08-25 | 北京科技大学 | A kind of many primitive alloy nitride films of high-performance optical thermal transition and preparation method thereof |
| CN107858657A (en) * | 2017-12-04 | 2018-03-30 | 北京科技大学 | Tissue modulation preparation method and device of the external energy field module to high flux film |
| CN108914074A (en) * | 2018-07-03 | 2018-11-30 | 东南大学 | A kind of high-resistivity alloy thin-film material and its preparation method and application |
| CN108914074B (en) * | 2018-07-03 | 2020-07-07 | 东南大学 | High-resistivity alloy thin film material and preparation method and application thereof |
| CN111020500A (en) * | 2019-11-11 | 2020-04-17 | 安徽建筑大学 | FeCrAlY coating resistant to high temperature liquid lead or lead bismuth corrosion and preparation method thereof |
| CN114959561A (en) * | 2022-06-29 | 2022-08-30 | 中国航发动力股份有限公司 | MCrAlX bonding layer with gradient change of Al content and preparation method thereof |
| CN114959561B (en) * | 2022-06-29 | 2024-02-27 | 中国航发动力股份有限公司 | MCrAlX bonding layer with gradient Al content change and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1034350C (en) | 1997-03-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0386386B1 (en) | Process for producing Yttrium enriched aluminide coated superalloys | |
| CA1128820A (en) | Method for altering the composition and structure of aluminum bearing overlay alloy coatings during deposition from metallic vapor | |
| CN113789503B (en) | In-situ synthesis method of high-entropy silicide film with antioxidant property | |
| US5556713A (en) | Diffusion barrier for protective coatings | |
| CN1034350C (en) | Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology | |
| US20160326607A1 (en) | Magnesium-aluminum coated steel sheet and manufacturing method thereof | |
| EP1226030B1 (en) | Forming members for shaping a reactive metal and methods for their fabrication | |
| US6143141A (en) | Method of forming a diffusion barrier for overlay coatings | |
| EP0298309B1 (en) | Metallic coating of improved life | |
| US4944858A (en) | Method for applying diffusion aluminide coating | |
| US11473185B2 (en) | Method for the protection of a hafnium-free, nickel-based monocrystalline superalloy part against corrosion and oxidation | |
| US5098540A (en) | Method for depositing chromium coatings for titanium oxidation protection | |
| CN112708860B (en) | Composite coating material, preparation method and application thereof | |
| JPH0211753A (en) | Tial-type composite member and its production | |
| CN108796443A (en) | A kind of nitridation of hot die steel low-temperature plasma plates compounding method with cathode ion | |
| RU2728117C1 (en) | Method for deposition of gradient heat-resistant coatings y-mo-o of plasma of vacuum-arc discharge | |
| Zhilkashinova et al. | Features of structural-phase states of Co-Cr-Al-Y composite coatings after heat treatment | |
| CN1760406A (en) | Method for preparing multilaminar metal sheets in dispersion-strongthened metal/oxide | |
| CN115198229A (en) | Multilayer ultralow-stress hard film with alternating layer-columnar microstructure and preparation method thereof | |
| CN117328019A (en) | AlCrON coating capable of effectively blocking element diffusion and preparation process and application thereof | |
| KR960010165B1 (en) | Method for forming aluminide-yttrium composites coatings of nickel base superalloy | |
| CN116356249A (en) | Zr nano-phase reinforced FeMnCoCr high-entropy alloy composite material and preparation method thereof | |
| CN117265479A (en) | AlCrO diffusion barrier layer and application thereof in MCrAlYSi protective coating | |
| CN113957403A (en) | High-strength Al-Cr metallic glass coating and preparation method thereof | |
| KR20200037652A (en) | Metal film coated having excellent oxidation resistance at high temperature and corrosion resistance and the steel sheet, and method for manufacturing the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |