CN1034350C - Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology - Google Patents
Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology Download PDFInfo
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- CN1034350C CN1034350C CN 93120621 CN93120621A CN1034350C CN 1034350 C CN1034350 C CN 1034350C CN 93120621 CN93120621 CN 93120621 CN 93120621 A CN93120621 A CN 93120621A CN 1034350 C CN1034350 C CN 1034350C
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Abstract
The present invention provides the new technology of MCrAlX coating, which is characterized in that magnetron sputtering an MCrAlX gradient coating is used, that is, MCrAlX and Al are codeposited on a high-temperature alloy by a double-target MCrAlX/Al magnetron sputtering deposition method; when in deposition, target power is gradually changed, samples are continuously rotated. Thus, an MCrAlX covering gradient coating with uniform thickness and gradually changed Al concentration is obtained. After being deposited, hot treatment is carried out for reinforcing the bonding force between the coating and the base. The new technology has the advantages of small coating crystal grains, high dynamic oxidizing resistance and good heat-corrosion resistant performance.
Description
The invention belongs to the top coat guard technology; A kind of preparation technology of MCrAlX class gradient cladding particularly is provided.
High-temperature protection coating has aluminized coating (first-generation), remodeling aluminized coating (s-generation), MCrAlX coating (third generation) and heat shield layer TBC (the 4th generation) to the invention belongs to MCrAlX coating one class, wherein M represents Fe, Ni, Co, Ni-Co, Co-Ni etc., and X represents Y, La, Ce, Hf, Si, Zr, Ta etc.The MCrAlX coated component is various, adjusts according to concrete needs, is not subjected to the matrix composition influence, and this is one of its advantage.Another advantage of MCrAlX coating is that its plasticity ratio is oozed Al layer etc. and will be got well, coating is incrust, long service life, generally all use electro beam physics vapour deposition (EB-PVD) and low-voltage plasma spraying (LPPS) technology to prepare this type coating both at home and abroad, occasionally the also report of useful magnetron sputtering technique.But do not see magnetron sputtering MCrAlX gradient cladding report.
The MCrAlX type gradient cladding preparation method who the object of the present invention is to provide a kind of aluminum concentration constantly to change, make coating obtain aspect antioxidant property and hot corrosion resistance, plasticity and the fragility reasonably unified, thereby, also can be applicable to other high temperature parts in addition for aircraft engine, all kinds of turbine blade of gas turbine provide a kind of high-temperature protection coating of high comprehensive performance.
Formation of the present invention:
1. two target magnetic control sputtering depositing operations of forming with NiCoCrAlSiHfY target and Al target are deposited on NiCoCrAlSiHfY and Al on the superalloy (turbine blade) simultaneously, the NiCoCrAlSiHfY target power output reduces gradually during deposition, the Al target power output increases gradually simultaneously, sample constantly rotates, thereby obtains the uniform MCrAlX coating of thickness that Al concentration gradually changes.Should heat-treat after the deposition with enhancing and be coated with/basic bonding force, improve the coating structure state.
2. two target chemistry compositions (seeing Table) (wt%)
The NiCoCrAlSiHfY target adopts two vacuum meltings and casting, and serious casting flaw does not have.The Al target processes with the forging material.
| The target title | Ni | Co | Cr | Al | Si | Hf | ?Y |
| The NiCoCrAlSiHfY target | Base | 18～22 | 16～20 | 10～15 | 0.1～1.0 | 0.1～1.0 | ?0.1～1.0 |
| The Al target | - | - | - | ≥99.9 | - | - | ?- |
3. sputter equipment adopts JCKD-400 type facing-target magnetron sputtering system device or similarly installs, it allows sample (blade) to carry out vacuum high-temperature heating, two target magnetic control sputtering, Workpiece Rotating etc., and these parameters are absolutely necessary to preparation high quality MCrAlX class gradient cladding.
4. magnetron sputtering technique
(1) shove charge and vacuumize and reach 1.33～4.0 * 10
-2Pa
(2) high pressure bombardment adopt Ar (1.33～4.0Pa), bombarding voltage 600～1500V, bombarding current 0.1～1.0A
(3) the sample heating is 600～1000 ℃
(4) sputtering bias-voltage-100～-400V (negative bias)
(5) magnetizing current 10～20A; Driving voltage 15～30V
(6) sputter gas is Ar, its pressure P
ArBe 1.33～10.67 * 10
-1Pa
(7) two target power outputs over time curve referring to synoptic diagram 1
Workpiece Rotating was to guarantee that coating is even when (8) Workpiece Rotating deposited
(9) diffusion annealing is carried out under vacuum or protective atmosphere, 700～1000 ℃ of temperature, time 1～4h; columanar structure when diffusion annealing can be eliminated deposition; obtain uniform recrystallize (equiax crystal) tissue, and be coated with/basic interface forms diffusion layer (internal layer), improves bonding force.
By above processing parameter control, can prepare MCrAlX class gradient cladding.
The invention has the advantages that:
1. the facing-target magnetron sputtering system technology that constantly changes by target power output obtains MCrAlX class cladded type gradient cladding.Can prepare various metal gradient materials according to this process thought.
2. obtaining rational unification on antioxidant property and the corrosion resistance and on fragility and plasticity by the prepared MCrAlX class of this technology cladded type gradient cladding.This gradient cladding guarantees that Al concentration increases from inside to outside gradually, outer Al height, and internal layer Al low (Cr height), thus make skin have good antioxidant property, internal layer has good hot corrosion resistance.Solved the contradiction of last oxidation drag of coated component design and heat etching drag opposition dexterously.
3. ooze the Al layer with vacuum and compare, the NiCoCrAlSiHfY class gradient cladding of this prepared has following good performance:
(1) crystal grain of gradient cladding is very tiny, thereby plasticity is good;
(2) 950 ℃/500h static oxidation resistance ratio oozes the Al floor height and goes out 1.25 times;
(3) You Yi hot corrosion resistance shows as 700 ℃/100h fused salt corrosion test-results, and gradient cladding weightlessness is 0.52mg/cm
2, reach 2.25mg/cm and ooze Al layer weightlessness
2The corrosion test result of same 850 ℃/30h also is that gradient cladding is superior more than oozing the Al layer.
The present invention is further described below in conjunction with accompanying drawing:
Fig. 1 is a NiCoCrAlSiHfY class gradient cladding sputtering power curve of the present invention, and X-coordinate is time (in minute), and ordinate zou is a power, and unit is kilowatt.
Adopt magnetically controlled sputter method NiCoCrAlSiHfY class gradient coating to be deposited on certain aero-engine one-level moving turbine blade (GH220 alloy) coating layer thickness 40～50 μ m. Sputter on the JCKD-400 type facing-target magnetron sputtering system device and carry out. Target chemical composition ginseng sees the above table, and main technologic parameters is seen component part of the present invention on the first page.
Embodiment:
1. install JCKD-400 type facing-target magnetron sputtering system instrument.
2. target NiCoCrAlSiHfY-Al, concrete composition (wt%).
(1) Ni-20Co-18Cr-12.5Al-0.6Si-0.4Hf-0.6Y alloys target.
(2) pure Al target.
3. base material ni-base wrought superalloy GH220 (blade), composition are (wt%): Ni (base)-10.5Cr-15.0Co-5.8W-6.0Mo-4.5Al-2.5Ti-0.5V-trace C, B, Mg.
4. facing-target magnetron sputtering system technology
(1) shove charge and be evacuated down to 2.67 * 10
-2Pa;
(2) high pressure bombardment P
Ar2.67Pa, voltage 800V, electric current 0.5A;
(3) 900 ℃/2h of blade heating;
(4) sputter negative bias-200V;
(5) magnetizing current 15A, driving voltage 20V;
(6) sputter gas is an Ar gas, P
Ar1.33 * 10
-1Pa;
(7) target power output in time change curve be shown in Fig. 1;
(8) Workpiece Rotating during sputtering sedimentation;
(9) deposition is heat-treated 950 ℃ of temperature, time 2.5h after finishing.
By above-mentioned processing parameter control, prepare the NiCoCrAlSiHfY class gradient cladding that a kind of aluminum concentration from inside to outside constantly changes.Tissue and performance that this coating is main are as follows.
(1) the ultra-fine crystalline substance of tissue, by β (Ni, Co) Al and γ-NiCo sosoloid form, the about 40 μ m of coat-thickness are optionally adjustable.
(2) 950 ℃/500h of oxidation susceptibility weightening finish is 0.44mg/cm
2, oxide film is α-Al
2O
3
(3) hot corrosion resistance salt component 75%Na
2SO
4-25%NaCl, the weightless 0.52mg/cm of 700 ℃/100h
2
(4) coating does not have obvious influence to alloy mechanical property, all meets GH220 alloy technology conditional request.Room temperature instantaneous stretching σ for example
bBe 1106MPa; 950 ℃ of drawing by high temperature σ
bBe 536MPa; 940 ℃ of 22Kgf/mm
2Following creep rupture life nearly 45h; 900 ℃ of 17Kgf/mm
2The creep residual set is 0.1119%; 850 ℃ of 107 times fatigue strength are 343MPa; Cold and hot fatigue crack length after each the 30 times circulations of 900 ℃=20 ℃ and 975 ℃=20 ℃ is respectively 0.155 and 0.32mm.Above-mentioned performance index meet the technical qualification requirement, and cold and hot fatigue property improves significantly.Coating does not also have influence to the vibrational frequency characteristic of turbine blade.
Claims (1)
1. the preparation method of a NiCoCrAlSiHfY class gradient cladding is characterized in that adopting two target magnetic control sputtering sedimentations, and one of them target is NiCoCrAlSiHfY, and composition is (weight percentage): 18～22 Co; 16～20 Cr; 10～15 Al; 0.2～1.0 Si; 0.1～1.0 Hf; 0.1～1.0 Y, surplus is Ni, and another target is the Al of 〉=99.9% (weight), and the power of NiCoCrAlSiHfY target reduces gradually during deposition, and the Al target power output increases gradually simultaneously, and sample constantly rotates, and deposition parameter is: vacuum tightness: 1.33～4.0 * 10
-2Pa, high pressure bombardment employing Ar (1.33～4.0Pa), bombarding voltage 600～1500V, bombarding current 0.1～1.0A, the sample Heating temperature is 600～1000 ℃, sputtering bias-voltage-100～-400V (negative bias), magnetizing current 10～20A; Driving voltage 15～30V, sputter gas are Ar, its pressure P
ArBe 1.33～10.67 * 10
-1Pa, sedimentation rate is 20～50 μ m/hr, and diffusion annealing is carried out in the deposition back under vacuum or protective atmosphere, and its temperature is 700～1000 ℃, time 1～4h.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 93120621 CN1034350C (en) | 1993-12-07 | 1993-12-07 | Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 93120621 CN1034350C (en) | 1993-12-07 | 1993-12-07 | Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology |
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| Publication Number | Publication Date |
|---|---|
| CN1103676A CN1103676A (en) | 1995-06-14 |
| CN1034350C true CN1034350C (en) | 1997-03-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 93120621 Expired - Fee Related CN1034350C (en) | 1993-12-07 | 1993-12-07 | Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology |
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Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5935407A (en) * | 1997-11-06 | 1999-08-10 | Chromalloy Gas Turbine Corporation | Method for producing abrasive tips for gas turbine blades |
| EP1292721A2 (en) * | 2000-06-08 | 2003-03-19 | Surface Engineered Products Corporation | Coating system for high temperature stainless steel |
| CN101550529B (en) * | 2003-04-28 | 2015-02-11 | 奥尔利康贸易股份公司（特吕巴赫） | A workpiece provided with aluminum and chromium hard material layer and a preparation method thereof |
| CN101791893B (en) * | 2010-01-22 | 2012-12-19 | 北京航空航天大学 | Two-layer MCrAlY bonding layer and preparation method thereof |
| CN103898440B (en) * | 2012-12-28 | 2016-08-24 | 北京有色金属研究总院 | A kind of method improving anti-transmitting thin film and molybdenum gate screen substrate caking power |
| CN104630706B (en) * | 2015-01-21 | 2017-08-25 | 北京科技大学 | A kind of many primitive alloy nitride films of high-performance optical thermal transition and preparation method thereof |
| CN107858657A (en) * | 2017-12-04 | 2018-03-30 | 北京科技大学 | Tissue modulation preparation method and device of the external energy field module to high flux film |
| CN108914074B (en) * | 2018-07-03 | 2020-07-07 | 东南大学 | High-resistivity alloy thin film material and preparation method and application thereof |
| CN111020500A (en) * | 2019-11-11 | 2020-04-17 | 安徽建筑大学 | FeCrAlY coating resistant to high temperature liquid lead or lead bismuth corrosion and preparation method thereof |
| CN114959561B (en) * | 2022-06-29 | 2024-02-27 | 中国航发动力股份有限公司 | MCrAlX bonding layer with gradient Al content change and preparation method thereof |
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