CN101791893B - Two-layer MCrAlY bonding layer and preparation method thereof - Google Patents
Two-layer MCrAlY bonding layer and preparation method thereof Download PDFInfo
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Abstract
The invention discloses a two-layer MCrAlY bonding layer and a preparation method thereof, which uses the plasma-assisted electron beam physical vapor deposition technology to prepare a coating with the following structure: the bottom layer is a low-aluminum (3-5wt.%) MCrAlY layer with a preferential-growing equiaxed crystal structure with the thickness of 5-20 micro meters and the crystal size of 20-50 micro meters; and the upper layer is a high-aluminum (8-12wt.%) MCrAlY layer with a columnar crystal structure, the thickness of 20-100 micro meters and the crystal size less than 1 micro meter. The two-layer structure can reduce the element interdiffusion between the MCrAlY coating and a high-temperature alloy matrix, therefore, the coating has better high-temperature oxidation resistance. Besides, the two-layer structure can inhibit the recrystallization, the TCP phase separation and the formation of a secondary reaction zone (SRZ) of the directionally solidified high-temperature alloy, the single-crystal high-temperature alloy and the like due to the deposition of an oxidation resistant coating.
Description
Technical field
The invention belongs to the Thermal Barrier Coating Technologies field; Relate to a kind of double-deck MCrAlY protective coating that has; In particular, be a kind of method of using plasma auxiliary electron bundle physical vapour deposition (PVD) (EB-PVD) technology preparation with double-deck MCrAlY coating.
Background technology
For modern gas turbine engines, main means that improve its operating efficiency are exactly to promote the whole burning operating temperature of engine.Thereby need be at the surface-coated high-temperature protection coating of hot operation parts, to improve the anti-oxidant and corrosion resistance of hot operation parts.MCrAlY (M=Co, or Ni, or Co+Ni) coating has been the widely used coating of beginning since the nineties.The MCrAlY coating has good resistance to high temperature oxidation and hot corrosion resistance, and has good plasticity, and composition selects to have diversity.Like list of references [1] Bezencon; C.; A.Schnell, et al. (2003). " Epitaxialdeposition of MCrAlY coatings on a Ni-base superalloy by laser cladding. " ScriptaMaterialia 49 (7): 705-709.List of references [2] Knotek, O., E.Lugscheider, et al. (1995). " Arcevaporation of multicomponent MCrAlY cathodes. " Surface and CoatingsTechnology 74-75 (Part 1): 118-122.List of references [3] Schmitt-Thomas, K.G.and M.Hertter (1999). " Improved oxidation resistance of thermal barrier coatings. " Surface& Coatings Technology 121:84-88.
When the MCrAlY coating system was on active service in the following time of hot environment that surpasses 1273K; Between alloy and the coating serious element counterdiffusion can take place: the Al element in the coating can cause the reduction of the Al content in the coating to the diffusion of high temperature alloy matrix; Thereby make providing that coating can not continue generate the needed Al of protective oxide film (TGO), cause the premature failure of coating; On the other hand, intensified element in the high temperature alloy such as W, Mo, Ta, external diffusions such as Ti and Hf can destroy the integrality of oxide-film to coating surface, reduce the protective value of coating; More severe problem is; After preparation MCrAlY coating on directed high temperature alloy and the single crystal super alloy; The counterdiffusion of element between coating and the matrix; Especially the interior diffusion of Al element can cause the crystallization again of alloy substrate to produce and TCP separates out mutually and secondary response district (SRZ) produces, and has greatly reduced the mechanical property of high temperature alloy.
Preparation one deck diffusion impervious layer is a kind of effective ways that stop coating and alloy phase counterdiffusion between matrix and coating, also is the focus of studying in the world at present.As, layer of precious metal, α-Al such as oxynitride layers such as nitride layers such as TiN, Al-O-N, Ru
2O
3The compound resistance diffusion layer that ceramic layer and some are relevant etc.Reduced problems such as counterdiffusion or thermal coefficient of expansion between coating and the matrix do not match but these diffusion barrier layer systems tend to, caused that adhesion descends between coating and the matrix, be easy to peel off; On the other hand, part hinders the diffusion material system unstability decomposition takes place when high temperature, causes the reduction of resistance diffusivity.
Summary of the invention
The method that the purpose of this invention is to provide the preparation of a kind of double-deck MCrAlY coating and using plasma auxiliary electron bundle physical gas phase deposition technology thereof.Coating structure is: bottom is that 5～20 μ m are thick, and grain size is low aluminium (3～5wt.%) the MCrAlY layers of the equiax crystal structure of 20～50 μ m preferential growths; The upper strata is that 20～100 μ m are thick, grain size less than the columnar crystal structure high alumina of 1 μ m (8～12wt.%) MCrAlY layers, described bottom contacts with matrix, the upper strata contacts with ceramic layer.This double-decker can reduce the element counterdiffusion between MCrAlY coating and the high temperature alloy matrix; Thereby the coating high temperature oxidation resistance is better, and can suppress directionally solidified superalloy, DS superalloy and single crystal super alloy etc. separate out the formation with secondary response district (SRZ) mutually because of the deposition crystallization again that causes of ORC and TCP.
The invention discloses a kind of double-decker MCrAlY coating of using plasma auxiliary electron bundle physical vapour deposition (PVD) preparation, comprise the following step:
(1) prepare the evaporation charge bar, subsequent use;
The composition of MCrAlY charge bar is M, chromium, aluminium and yttrium, and wherein M is nickel or cobalt or (nickel+cobalt), and its percentage by weight is 19～35% chromium, 8～12% aluminium, 0.07～1.5% yttrium, and all the other are M, and above-mentioned each composition total amount is 100%;
(2) prepare matrix material, and it is installed on the electro beam physics vapour deposition equipment rotary plate frame;
(3) the MCrAlY charge bar is placed in the water jacketed copper crucible;
(4) vacuum chamber is evacuated to required is lower than 5 * 10
-3Pa vacuum;
(5) setting rotary plate frame rotating speed is 10～20rpm, and with 850～1020 ℃ of electron beam heated substrates, substrate applies-100～-300V direct current or dutycycle be greater than 50% pulsed bias, electron-beam voltage 17～19kV;
(6) preheating evaporation charge bar is regulated electronic beam current 1.4～1.8A, and the charge bar rate of climb is 0.8～1.0mm/min;
(7) after evaporation is stablized, connect crucible top anode circle type water-cooled copper electrode, ignitor discharge electric arc, the adjustment discharge voltage is 10～30V, discharge current is 100～500A;
(8) open baffle plate, carry out the coating deposition, the ion current density that obtain on the substrate this moment is approximately 10～100mA/cm
2, keep substrate temperature to maintain 850～1020 ℃ simultaneously, this moment, deposit was double-deck bottom;
(9) when layer deposition thickness is approximately 5～50 μ m; The extinguish arcs discharge is also closed substrate bias, keeps the electron gun line constant, continues about 20～100 μ m of deposition; Keep substrate temperature to maintain 850～1020 ℃ simultaneously, this moment, deposit was double-deck upper strata;
(10) closing device takes out and deposits the matrix material that finishes;
(11) coating that deposition is finished is carried out vacuum heat, temperature: 1000～1100 ℃, and time 2～6h, preparation finishes.
The advantage of the MCrAlY coating that employing the inventive method makes is:
(1) be big crystallite dimension (20～50 μ m) equiax crystal near high temperature alloy matrix place; The preferential growth direction is (111) solid matter face; Reduced number of grain boundaries effectively, reduced and difficultly in the alloy substrate melted the passage and the speed of prolonging the lattice external diffusion that element prolongs the crystal boundary external diffusion, can reduce difficulty and melt the destruction of matrix element external diffusion the coating surface oxide-film; Prolong the active time of protective oxide film, improved antioxygenic property and corrosion resistance;
(2) because the selectivity reverse sputtering that bias voltage is introduced; When the deposition bottom; The deposition efficiency of each element is different; Lower near high temperature alloy matrix place coating aluminium content, reduced the trend of aluminium to the matrix diffusion, thus the high temperature alloy matrix that can prevent to cause crystallization and TCP separates out mutually and secondary response district (SRZ) forms that performance is learned by the side that causes and high-temperature stability descends again because of the aluminium diffusion.
Description of drawings
Fig. 1 is a plasma auxiliary electron bundle Pvd equipment sketch map;
Fig. 2 is the XRD figure spectrum of double-decker bottom provided by the invention;
Fig. 3 is the surface topography of double-decker bottom provided by the invention;
Fig. 4 is a double-decker NiCoCrAlY coating deposited fracture apperance provided by the invention;
Fig. 5 is 1373K oxidation 100h rear oxidation film cross section pattern (a) double-decker NiCoCrAlY coating (b) conventional monolayers NiCoCrAlY coating;
Fig. 6 is that 1323K vacuum diffusion 100h is coated with layer cross section pattern (a) double-layer structure coating (b) single layer structure coating.
The specific embodiment
Below in conjunction with accompanying drawing double-decker MCrAlY tack coat provided by the invention and preparation method thereof is elaborated.
Shown in Figure 1 is plasma auxiliary electron bundle Pvd equipment sketch map.Promptly 1～5cm position is placed one as anode circle type water-cooled copper electrode 2 above traditional E B-PVD equipment water jacketed copper crucible 1, and applies the DC voltage of 10～30V, electric arc 3 discharges of igniting when being used to deposit; Negative electrode is a device housings; On substrate 4, apply one-100V～-direct current or the pulsed negative bias of 300V, if use pulsed bias then dutycycle is greater than 50%.
Double-decker MCrAlY tack coat provided by the invention comprises bottom and upper strata two parts; Wherein, Underlayer thickness 5～20 μ m; Be that grain size is that (3～5wt.%) MCrAlY layers, upper thickness is 20～100 μ m, is columnar crystal structure high alumina (8～12wt.%) the MCrAlY layers of grain size less than 1 μ m for the low aluminium of the equiax crystal structure of 20～50 μ m preferential growths.Each composition percentage by weight is respectively in the MCrAlY layer of bottom: 19～25% chromium, 3～5% aluminium, 0.07～1.5% yttrium, and all the other are M, M can be nickel or cobalt or (nickel+cobalt); Each composition percentage by weight is respectively in the MCrAlY layer on upper strata: 19～25% chromium, 8～12% aluminium, 0.07～1.5% yttrium, and all the other are M, M can be nickel or cobalt or nickel+cobalt.
Above-mentioned double-decker MCrAlY coating is the preparation of using plasma auxiliary electron bundle physical gas-phase deposite method, specifically comprises the following step:
(1) prepare evaporation charge bar 5, subsequent use;
The composition of MCrAlY charge bar 5 is (is example with NiCoCrAlY) nickel, cobalt, chromium, aluminium and yttrium; Its percentage by weight is 40～60% nickel; 19～22% cobalt, 19～25% chromium, 8～12% aluminium, 0.07～1.5% yttrium, above-mentioned each composition total amount is 100%;
(2) prepare matrix material, and it is installed on the electro beam physics vapour deposition equipment rotary plate frame;
(3) NiCoCrAlY charge bar 5 is placed in the water jacketed copper crucible 1;
(4) vacuum chamber is evacuated to required is lower than 5 * 10
-3Pa vacuum;
(5) setting rotary plate frame rotating speed is 10～20rpm, and to use electron beam heated substrates 4 temperature be 850～1020 ℃,, substrate 4 applies-100～-300V direct current or dutycycle be greater than 50% pulsed bias, electron-beam voltage 17～19kV;
(6) preheating evaporation charge bar 5 is regulated electronic beam current 1.4～1.8A, and charge bar 5 rates of climb are 0.8～1.0mm/min;
(7) after evaporation is stablized, connect the voltage of crucible 1 top anode circle type water-cooled copper electrode 2, ignitor discharge electric arc 3, the adjustment discharge voltage is 10～30V, discharge current is 100～500A.
(8) open baffle plate, carry out the coating deposition, the ion current density that obtain on the substrate 4 this moment is approximately 10～100mA/cm
2, keep substrate 4 temperature maintenance at 850～1020 ℃ simultaneously, this moment, deposit was double-deck bottom;
(9) when layer deposition thickness is approximately 5～20 μ m; The extinguish arcs discharge is also closed substrate bias, keeps electron beam evaporation power constant, continues about 20～100 μ m of deposition; Keep substrate 4 temperature maintenance at 850～1020 ℃ simultaneously, this moment, deposit was double-deck upper strata;
(10) closing device takes out and deposits the matrix material that finishes,
(11) coating that deposition is finished is carried out vacuum heat, temperature: 1000～1100 ℃, and time 2～6h, preparation finishes.
(SEM, FEI Holland) carry out the XRD test to the sample that only deposits bottom and find that this coating bottom is strong, as shown in Figure 2 along (111) direction orientation to adopt ESEM.Surface to bottom is observed, and is as shown in Figure 3, can see that coated grains is of a size of 20～50 μ m, much larger than the crystallite dimension of traditional E B-PVD coating.Can find out that from the observation of coating fracture shown in Figure 4, the bottom of this double-layer structure coating is the equiax crystal structure, the upper strata is a columnar crystal structure.Double-deck each composition of layer is as shown in table 1.
Table 1 double-decker NiCoCrAlY coating each layer elementary composition percentage (wt.%)
Embodiment 1:DZ 125 qualitative solidifying prepare the NiCoCrAlY coating on the high temperature alloy matrix
(1) prepare the evaporation charge bar, subsequent use;
The composition of NiCoCrAlY charge bar is nickel, cobalt, chromium, aluminium and yttrium, and its percentage by weight is 47.8% nickel, 20% cobalt, and 22% chromium, 8.8% aluminium, 1.4% yttrium, above-mentioned each composition total amount is 100%;
(2) DZ125 (composition is seen table 2) the alloy coupon line of Φ 16 is cut into the 2mm disk and polish smooth in order, make its surface roughness Ra＜0.8 with 150#, 300#, 400#, 800# sand paper.Put into acetone then and carry out ultrasonic waves for cleaning 30min, and it is installed on the electro beam physics vapour deposition equipment rotary plate frame;
The chemical component table (wt.%) of table 2 DZ125 alloy
(3) the NiCoCrAlY charge bar is placed in the water jacketed copper crucible;
(4) vacuum chamber is evacuated to required is lower than 5 * 10
-3Pa vacuum;
(5) setting rotary plate frame rotating speed is 13rpm, and with 900 ℃ of electron beam heated substrates, substrate applies-the 120V Dc bias, electron-beam voltage 17～19kV;
(6) preheating evaporation charge bar is regulated electronic beam current 1.5A, and the charge bar rate of climb is 0.85mm/min, the control evaporation capacity;
(7) after evaporation is stablized, connect crucible top anode circle type water-cooled copper electrode, ignitor discharge electric arc, the adjustment discharge voltage is 15V, discharge current is 200A
(8) open baffle plate, carry out the coating deposition, the ion current density that obtain on the substrate this moment is approximately 35mA/cm
2, keep substrate temperature to maintain 900 ℃ simultaneously, this moment, deposit was double-deck bottom;
(9) when layer deposition thickness is approximately 15 μ m, the extinguish arcs discharge is also closed substrate bias, keeps the electron beam line constant, continues the about 50 μ m of deposition, keeps substrate temperature to maintain 900 ℃ simultaneously, and this moment, deposit was double-deck upper strata;
(10) closing device takes out and deposits the matrix material that finishes,
(11) coating that deposition is finished is carried out vacuum heat, temperature: 1020 ℃, and time 4h, preparation finishes.
Adopt tube furnace that above-mentioned coating is carried out static oxidation weightening finish test with traditional EB-PVD coating.Temperature is 1373K, time 100h.Sample is observed the oxide-film pattern after the oxidation after nickel plating, the polishing of edge appearance, can find out that the oxide thickness of double-layer structure coating is about the oxide-film (Fig. 5 a, 5b) that 3 μ m are starkly lower than about 6 μ m of comparative sample (conventional monolayers NiCoCrAlY).Explain that the double-layer structure coating oxide growth is slow, antioxygenic property is more excellent.
Preparation NiCrAlY coating on the embodiment 2:DD6 single crystal super alloy matrix
(1) prepare the evaporation charge bar, subsequent use.
The composition of NiCrAlY charge bar is nickel, chromium, aluminium and yttrium, and its percentage by weight is 62.3% nickel, 25% chromium, 12% aluminium, 0.7% yttrium, and above-mentioned each composition total amount is 100%;
(2) DD6 (composition is seen table 3) the alloy coupon line of Φ 16 is cut into the 2mm disk and polish smooth in order, make its surface roughness Ra＜0.8 with 150#, 300#, 400#, 800# sand paper.Put into acetone then and carry out ultrasonic waves for cleaning 30min, and it is installed on the electro beam physics vapour deposition equipment rotary plate frame;
The chemical component table (wt.%) of table 3 DD6 alloy
(3) the NiCrAlY charge bar is placed in the water jacketed copper crucible;
(4) vacuum chamber is evacuated to required is lower than 5 * 10
-3Pa vacuum;
(5) setting rotary plate frame rotating speed is 15rpm, and with 1020 ℃ of electron beam heated substrates,, substrate applies-pulsed bias of 200V dutycycle 80%, electron-beam voltage 19kV;
(6) preheating evaporation charge bar is regulated electronic beam current 1.8A, and the charge bar rate of climb is 1.0mm/min, the control evaporation capacity;
(7) after evaporation is stablized, connect the voltage of crucible top water cooled electrode circle, ignitor discharge electric arc, the adjustment discharge voltage is 25V, discharge current is 400A.
(8) open baffle plate, carry out the coating deposition, the ion current density that obtain on the substrate this moment is approximately 65mA/cm
2, keep substrate temperature to maintain 1020 ℃ simultaneously, this moment, deposit was double-deck bottom;
(9) when layer deposition thickness is approximately 20 μ m; The extinguish arcs discharge is also closed substrate bias, keeps electron beam evaporation power constant, continues the about 100 μ m of deposition; Keep substrate temperature to maintain 850～1020 ℃ simultaneously, this moment, deposit was double-deck upper strata;
(10) closing device takes out and deposits the matrix material that finishes,
(11) coating that deposition is finished is carried out vacuum heat, temperature: 1100 ℃, and time 6h, preparation finishes.
Above-mentioned coating sample is enclosed quartz ampoule with traditional EB-PVD Coatings in Vacuum spread, temperature is 1323K, time 100h.Sample takes out after the cross section pattern is observed in edge appearance polishing back, can find out that double-layer structure coating does not have obvious recrystallization zone to produce, and the about 20 μ m recrystallization zones (Fig. 6) of thickness appears in comparative sample.Explain that double-layer structure coating can suppress the crystalline polamer again of DD6 single crystal super alloy.
According to preparing the double-layer structure coating of following parameter, like table 3 with embodiment 2 identical test methods.Various coatings have good antioxygenic property in the table, and can suppress the crystalline polamer again of high temperature alloy.
Table 3 double-layer structure coating
| Charge bar | Underlayer thickness (μ m) | Bottom composition (wt.%) | Upper thickness (μ m) | Upper component (wt.%) |
| ? |
5 | 53Ni-23Co-19Cr-4Al-1Y | 20 | 49Ni-20Co-20Cr-10Al-1Y |
| ?NiCrAlY | 10 | 61.5Ni-33Cr-5Al-0.5Y | 80 | 52.5Ni-35Cr-12Al-0.5Y |
| ?CoCrAlY | 15 | 76.2Co-19Cr-4Al-0.8Y | 100 | 69.2Ni-20Cr-10Al-0.8Y |
Claims (4)
1. double-decker MCrAlY tack coat, it is characterized in that: described tack coat comprises bottom and upper strata, described bottom is the equiax crystal structure MCrAlY layer of preferential growth, thickness 5～20 μ m, grain size is 20～50 μ m; Described upper strata is a columnar crystal structure MCrAlY layer, thickness 20～100 μ m, and grain size is less than 1 μ m, and wherein M is Ni or Co or Ni+Co;
Aluminium content is 3～5wt.% in the described bottom; Aluminium content is 8～12wt.% in the upper strata.
2. double-decker MCrAlY tack coat according to claim 1; It is characterized in that: the upper strata composition in the described MCrAlY tack coat is M, chromium, aluminium and yttrium; Its percentage by weight is 19～25% chromium, 8～12% aluminium, 0.07～1.5% yttrium, and all the other are M; The bottom composition is M, chromium, aluminium and yttrium, and its percentage by weight is 19～25% chromium, 3～5% aluminium, 0.07～1.5% yttrium, and all the other are M, and M is nickel, cobalt or nickel+cobalt.
3. the preparation method of the described double-decker MCrAlY of claim 1 tack coat is characterized in that: the preparation of using plasma auxiliary electron bundle physical vapour deposition (PVD) comprises the following step:
(1) prepare MCrAlY evaporation charge bar, subsequent use;
(2) prepare matrix material, and it is installed on the electro beam physics vapour deposition equipment rotary plate frame;
(3) the MCrAlY charge bar is placed in the water jacketed copper crucible;
(4) vacuum chamber is evacuated to required is lower than 5 * 10
-3Pa vacuum;
(5) setting rotary plate frame rotating speed is 10～20rpm, and with 850～1020 ℃ of electron beam heated substrates, substrate applies-100～-300V direct current or dutycycle be greater than 50% pulsed bias, electron-beam voltage 17～19kV;
(6) preheating evaporation charge bar is regulated electronic beam current 1.4～1.8A, and the charge bar rate of climb is 0.8～1.0mm/min;
(7) after evaporation is stablized, connect the voltage of crucible top water cooled electrode circle, ignitor discharge electric arc, the adjustment discharge voltage is 10～30V, discharge current is 100～500A;
(8) open baffle plate, carry out the coating deposition, the ion current density that obtain on the substrate this moment is 10～100mA/cm
2, keep substrate temperature to maintain 850～1020 ℃ simultaneously, this moment, deposit was double-deck bottom;
(9) when layer deposition thickness is 5～50 μ m; The extinguish arcs discharge is also closed substrate bias, keeps electron beam evaporation power constant, continues deposition 20～100 μ m; Keep substrate temperature to maintain 850～1020 ℃ simultaneously, this moment, deposit was double-deck upper strata;
(10) closing device takes out and deposits the matrix material that finishes,
(11) coating that deposition is finished is carried out vacuum heat, temperature: 1000～1100 ℃, and time 2～6h, preparation finishes.
4. equipment of realizing the described method of claim 3; It is characterized in that: 1～5cm position is placed one as anode circle type water-cooled copper electrode above traditional E B-PVD equipment crucible; And applying the DC voltage of 10～30V, arc discharge ignites when being used to deposit; Negative electrode is a device housings; On substrate, apply one-100V～-direct current or the pulsed negative bias of 300V, if use pulsed bias then dutycycle is greater than 50%.
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| CN102343391A (en) * | 2011-06-14 | 2012-02-08 | 昆山市瑞捷精密模具有限公司 | Nickel-based superheat resisting alloy stamping die with hard film structure |
| CN102492924A (en) * | 2011-12-14 | 2012-06-13 | 哈尔滨工业大学 | Autologous ion bombardment assisted electron beam evaporation device, and method for coating film by using same |
| EP2682488A1 (en) * | 2012-07-05 | 2014-01-08 | Siemens Aktiengesellschaft | Coating system with NiCoCrAlY double-protection coat with varying chromium content and alloy |
| US9855599B2 (en) * | 2015-11-15 | 2018-01-02 | General Electric Company | Casting methods and articles |
| CN105951030B (en) * | 2016-04-28 | 2018-12-21 | 中国农业机械化科学研究院 | Single crystal alloy surface double-layer structure adhesive layer and preparation method thereof |
| FR3064648B1 (en) * | 2017-03-30 | 2019-06-07 | Safran | SUPERALLIATION TURBINE PIECE AND METHOD OF MANUFACTURING THE SAME |
| CN110079770B (en) * | 2019-04-28 | 2020-11-13 | 北京理工大学 | Thermal barrier coating for thermal protection of single crystal high-temperature alloy and preparation method thereof |
| CN111593399B (en) * | 2020-05-22 | 2022-01-07 | 深圳市万泽航空科技有限责任公司 | Method for controlling recrystallization of single crystal high-temperature alloy |
| CN114645241B (en) * | 2022-03-04 | 2023-04-18 | 北京航空航天大学 | Preparation method of thermal barrier coating with composite structure |
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| CN1103676A (en) * | 1993-12-07 | 1995-06-14 | 北京科技大学 | Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology |
| CN1846985A (en) * | 2005-04-05 | 2006-10-18 | 中国科学院金属研究所 | Nanometer crystalline compound coating and its prepn process |
| CN1986889A (en) * | 2005-12-21 | 2007-06-27 | 联合工艺公司 | Platinum modified nicocraly bondcoat for thermal barrier coating |
| CN101037755A (en) * | 2007-04-20 | 2007-09-19 | 上海工程技术大学 | Rare earth appended surfacing alloy and surfacing technique for preparation of aluminium matrix composite material |
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| CN1103676A (en) * | 1993-12-07 | 1995-06-14 | 北京科技大学 | Gradient Ni, Co, Cr, Al, Si Hf, Yt/Al cladding and double-target sputtering technology |
| CN1846985A (en) * | 2005-04-05 | 2006-10-18 | 中国科学院金属研究所 | Nanometer crystalline compound coating and its prepn process |
| CN1986889A (en) * | 2005-12-21 | 2007-06-27 | 联合工艺公司 | Platinum modified nicocraly bondcoat for thermal barrier coating |
| CN101037755A (en) * | 2007-04-20 | 2007-09-19 | 上海工程技术大学 | Rare earth appended surfacing alloy and surfacing technique for preparation of aluminium matrix composite material |
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